CN204869893U - Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment - Google Patents
Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment Download PDFInfo
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- CN204869893U CN204869893U CN201520611357.3U CN201520611357U CN204869893U CN 204869893 U CN204869893 U CN 204869893U CN 201520611357 U CN201520611357 U CN 201520611357U CN 204869893 U CN204869893 U CN 204869893U
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- China
- Prior art keywords
- layer
- rete
- heat treatment
- film layer
- coated glass
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000011521 glass Substances 0.000 title claims abstract description 59
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 26
- 239000004332 silver Substances 0.000 title claims abstract description 26
- 238000010438 heat treatment Methods 0.000 title claims abstract description 25
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910008328 ZrNx Inorganic materials 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 239000012528 membrane Substances 0.000 claims description 6
- 239000002131 composite material Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 88
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 32
- 238000001755 magnetron sputter deposition Methods 0.000 description 22
- 229910052786 argon Inorganic materials 0.000 description 16
- 239000007789 gas Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 13
- 238000005496 tempering Methods 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 238000005336 cracking Methods 0.000 description 3
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
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- Surface Treatment Of Glass (AREA)
Abstract
The utility model discloses a double-silver low-emissivity coated glass capable of carrying out high-temperature heat treatment, which comprises a glass substrate, wherein twenty membranous layers are adjacently compounded on the compound surface of the glass substrate from inside to outside in sequence, wherein the first membranous layer is SiO2Layer, the second film layer is Si3N4A layer of a material selected from the group consisting of,the third film layer is an AZO layer, the fourth film layer is an Ag layer, the fifth film layer is a NiCrOx layer, and the sixth film layer is Si3N4The seventh film layer is an AZO layer, the eighth film layer is an Ag layer, the ninth film layer is a NiCrOx layer, and the tenth film layer is Si3N4The outermost layer of the eleventh film layer is a ZrNx layer. The utility model provides a can carry out high temperature thermal treatment's two silver low emissivity coated glass, its heat treatment back colour changes for a short time, and the transmissivity is higher, can prevent that glass from adding the fracture of rete in high temperature processing, makes it keep integrality, homogeneity, stability, can use on the building curtain wall better.
Description
[technical field]
The utility model relates to a kind of two silver low-radiation coated glass, is more particularly a kind of two silver low-radiation coated glass carrying out high-temperature heat treatment.
[background technology]
Glass plays key player in the production and life in the present age, and coated glass becomes a kind of good glass curtain wall material and is widely applied.And along with the diversity of modern building design and aestheticism, many curtain wall outward appearances need curved surface and cambered design, but before and after existing pair of silver low-radiation coated glass heat treatment, color change is huge, and transmitance is lower, in production process, easy cracking damage, can not be applied on building curtain wall.
[utility model content]
The utility model object overcomes the deficiencies in the prior art, a kind of two silver low-radiation coated glass carrying out high-temperature heat treatment are provided, after its heat treatment, color change is little, transmitance is higher, the cracking of glass rete when high temperature process can be prevented, make it keep integrality, uniformity, stability, can be applied on building curtain wall better.
The utility model is achieved through the following technical solutions:
Carry out two silver low-radiation coated glass for high-temperature heat treatment, include glass substrate 1, the composite surface of described glass substrate 1 is adjacent to from inside to outside be successively compounded with 20 retes, wherein the first rete and innermost layer are SiO
2layer the 2, second rete is Si
3n
4layer 3, third membrane layer is AZO layer the 4, four rete be Ag layer the 5, five rete be NiCrOx layer the 6, six rete is Si
3n
4layer the 7, seven rete be AZO layer the 8, eight rete is Ag layer the 9, nine rete is NiCrOx layer 10, and the tenth rete is Si
3n
4layer the 11, the 11 rete and outermost layer are ZrNx layer 12.
Prepare a method for two silver low-radiation coated glass that can carry out high-temperature heat treatment, comprise the steps:
(1) magnetron sputtering SiO
2layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and oxygen, and argon oxygen is than being 1:1.5;
(2) magnetron sputtering Si
3n
4layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and nitrogen, and argon nitrogen is than being 1:1.2;
(3) magnetron sputtering AZO layer, adopts ceramic zinc target to sputter under argon oxygen atmosphere, and argon oxygen is than being 10:1;
(4) magnetron sputtering Ag layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 3.5 × 10
-3mbar;
(5) magnetron sputtering NiCrOx layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 6 × 10
-3mba;
(6) magnetron sputtering Si
3n
4layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and nitrogen, and argon nitrogen is than being 1:1.2;
(7) magnetron sputtering AZO layer, adopts ceramic zinc target to sputter under argon oxygen atmosphere, and argon oxygen is than being 10:1;
(8) magnetron sputtering Ag layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 3.5 × 10
-3mbar;
(9) magnetron sputtering NiCrOx layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 6 × 10
-3mbar;
(10) magnetron sputtering Si
3n
4layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and nitrogen, and argon nitrogen is than being 1:1.2;
(11) magnetron sputtering ZrNx layer, adopts and rotates twin cathode sputtering, and argon nitrogen is than being 1:1.2.
Compared with prior art, the utility model has the following advantages:
1, the utility model is by the improvement to glass-film architecture, after making its heat treatment, color change is little, and transmitance is higher, can prevent glass from adding the cracking of rete in man-hour in high-temperature heat treatment, make it keep integrality, uniformity, stability, can be applied on building curtain wall better.
2, the utility model is plated in the first tunic silicon dioxide layer on glass, possesses the sodium ion be blocked in high-temperature heat treatment process in glass and diffuses to function in rete.
3, each rete of the utility model all possesses resistant to elevated temperatures performance, and adjacent different retes have the ability mutually stoping diffusion.
4, the utility model is by being embedded in the middle of effective barrier layer by silver layer, to avoid silverskin to be oxidized in high-temperature process, makes silver layer in toughening process, keep its uniformity and slickness.
[accompanying drawing explanation]
Fig. 1 is the utility model structural representation.
[detailed description of the invention]
Carry out two silver low-radiation coated glass for high-temperature heat treatment, include glass substrate 1, the composite surface of described glass substrate 1 is adjacent to from inside to outside be successively compounded with 20 retes, wherein the first rete and innermost layer are SiO
2layer the 2, second rete is Si
3n
4layer 3, third membrane layer is AZO layer the 4, four rete be Ag layer the 5, five rete be NiCrOx layer the 6, six rete is Si
3n
4layer the 7, seven rete be AZO layer the 8, eight rete is Ag layer the 9, nine rete is NiCrOx layer 10, and the tenth rete is Si
3n
4layer the 11, the 11 rete and outermost layer are ZrNx layer 12.
The first described rete SiO
2layer 2 is a kind of acidic oxide silicon dioxide layers, for adhesion enhancement layer with prevent sodium ion in glass from diffusing to the base film layer of whole rete, and the first rete SiO
2layer 2 thickness are 10 ~ 20nm.
The second described rete Si
3n
4layer 3, i.e. silicon nitride is low absorptivity dielectric membranous layer, and its function is effectively reduce rete to visible light reflectance, reaches high saturating, low anti-effect.Second rete Si
3n
4the thickness of layer 3 is 40 ~ 50nm, the tenth described rete Si
3n
4the thickness of layer 11 is 40 ~ 50nm, the 6th described rete Si
3n
4the thickness of layer 7 is 80 ~ 100nm.
Described third membrane layer AZO layer 4 is Al-Doped ZnO layer, is silverskin grown layer, can, by the rete flat smooth of low absorptivity dielectric layer, make silver layer on the basis of flat smooth, form the rete of uniformity.The thickness of third membrane layer AZO layer 4 is 3 ~ 5nm, and the thickness of the 7th described rete AZO layer 8 is 3 ~ 5nm.
The 4th described rete Ag layer 5 is low radiation functions rete silver layer, can preferably absorb reaching within the scope of solar irradiation and obtain the highest reflectivity in infra-red range, the thickness of the 4th rete Ag layer 5 is 8 ~ 12nm, and the thickness of the 8th described rete Ag layer 9 is 8 ~ 12nm.
The 5th described rete NiCrOx layer 6 is nickel oxide layers of chrome, is silver layer protective layer, silver layer can be protected to make it not oxidized, and the thickness of the 5th rete NiCrOx layer 6 is 5 ~ 15nm, and the thickness of the 9th described rete NiCrOx layer 10 is 5 ~ 15nm.
The 11 described rete ZrNx layer 12 is zirconium nitride layer, is outermost layer, possesses the protective layer of resistant to mechanical damage ability, and glass can be avoided to add man-hour rete and be destroyed carrying out high-temperature heat treatment, and the thickness of the 11 rete ZrNx layer 12 is 10 ~ 25nm.
Preparation can carry out the method for two silver low-radiation coated glass of high-temperature heat treatment, comprises the steps:
(1) magnetron sputtering SiO
2layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and oxygen, and argon oxygen is than being 1:1.5;
(2) magnetron sputtering Si
3n
4layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and nitrogen, and argon nitrogen is than being 1:1.2;
(3) magnetron sputtering AZO layer, adopts ceramic zinc target to sputter under argon oxygen atmosphere, and argon oxygen is than being 10:1;
(4) magnetron sputtering Ag layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 3.5 × 10
-3mbar;
(5) magnetron sputtering NiCrOx layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 6 × 10
-3mba;
(6) magnetron sputtering Si
3n
4layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and nitrogen, and argon nitrogen is than being 1:1.2;
(7) magnetron sputtering AZO layer, adopts ceramic zinc target to sputter under argon oxygen atmosphere, and argon oxygen is than being 10:1;
(8) magnetron sputtering Ag layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 3.5 × 10
-3mbar;
(9) magnetron sputtering NiCrOx layer, adopt planar cathode sputtering, pure argon state, air pressure range is 3 × 10
-3mbar ~ 6 × 10
-3mbar;
(10) magnetron sputtering Si
3n
4layer, adopt and rotate twin cathode SiAl target, Si:Al ratio is 90%:10%, and process gas is argon gas and nitrogen, and argon nitrogen is than being 1:1.2;
(11) magnetron sputtering ZrNx layer, adopts and rotates twin cathode sputtering, and argon nitrogen is than being 1:1.2.
Optical property is as follows before its tempering of glass adopting the utility model process parameters design to go out and after tempering:
| Performance | Before tempering | After tempering |
| Glass visible light transmissivity T vis | 48 | 54 |
| Visible ray glass surface reflectivity R out | 18.7 | 19 |
| Glass surface color coordinates a* | 0.8 | 1.8 |
| Glass surface color coordinates b* | -2.3 | -3 |
| Glass surface radiance | 2.55 | 1.8 |
Adopt glass of the present utility model to make double glazing that empty space is 12mm, data measured by UV-3600 ultraviolet light spectrophotometer, according to the JGJ/T151-2008 criterion calculation out white glass of 6mmLOW-E glass+12A+6mm, its optics and thermal property as follows:
| Performance indications | Data before tempering | Data after tempering |
| Visible light transmissivity T vis | 44 | 48 |
| Visible ray glass surface reflectivity R out | 18.2 | 18.8 |
| Solar energy transmitance T sol | 23 | 25 |
| Solar reflectance R out | 27 | 30 |
| Heat transfer coefficient U | 1.65 | 1.62 |
| Shading coefficient Sc | 0.331 | 0.338 |
| Choosing coefficient | 1.329 | 1.42 |
The contrast of the resistance to film properties of glass film layers before and after tempering:
The two silver low-radiation coated glass advantages can carrying out high-temperature heat treatment are that it has superior processability, not easily scratch, not easily demoulding, and the color characteristics change before and after heat treatment is little, meets high visible through the feature request with low visible light reflection.
After this glass tempering, optical property change is little, the visible light transmissivity T of glass after tempering
vis54 are become, the visible ray glass surface reflectivity R of glass after tempering from 48
outbecome 19 from 18.7, after tempering, the glass surface color coordinates a* of glass becomes 1.8 from 0.8, and after tempering, the glass surface color coordinates b* of glass becomes-3 from-2.3, and after tempering, the glass surface radiance of glass becomes 1.8 from 2.55.
Claims (7)
1. one kind can be carried out two silver low-radiation coated glass of high-temperature heat treatment, include glass substrate (1), the composite surface of described glass substrate (1) is adjacent to be compounded with 20 retes from inside to outside successively, it is characterized in that: wherein the first rete and innermost layer are SiO
2layer (2), the second rete is Si
3n
4layer (3), third membrane layer is AZO layer (4), and the 4th rete is Ag layer (5), and the 5th rete is NiCrOx layer (6), and the 6th rete is Si
3n
4layer (7), the 7th rete is AZO layer (8), and the 8th rete is Ag layer (9), and the 9th rete is NiCrOx layer (10), and the tenth rete is Si
3n
4layer (11), the 11 rete and outermost layer are ZrNx layer (12).
2. the two silver low-radiation coated glass carrying out high-temperature heat treatment according to claim 1, is characterized in that: the first described rete SiO
2the thickness of layer (2) is 10 ~ 20nm.
3. the two silver low-radiation coated glass carrying out high-temperature heat treatment according to claim 1, is characterized in that: the second described rete Si
3n
4the thickness of layer (3) is 40 ~ 50nm, the tenth described rete Si
3n
4the thickness of layer (11) is 40 ~ 50nm, the 6th described rete Si
3n
4the thickness of layer (7) is 80 ~ 100nm.
4. the two silver low-radiation coated glass carrying out high-temperature heat treatment according to claim 1, it is characterized in that: the thickness of described third membrane layer AZO layer (4) is 3 ~ 5nm, the thickness of the 7th described rete AZO layer (8) is 3 ~ 5nm.
5. the two silver low-radiation coated glass carrying out high-temperature heat treatment according to claim 1, it is characterized in that: the thickness of the 4th described rete Ag layer (5) is 8 ~ 12nm, the thickness of the 8th described rete Ag layer (9) is 8 ~ 12nm.
6. the two silver low-radiation coated glass carrying out high-temperature heat treatment according to claim 1, it is characterized in that: the thickness of the 5th described rete NiCrOx layer (6) is 5 ~ 15nm, the thickness of the 9th described rete NiCrOx layer (10) is 5 ~ 15nm.
7. the two silver low-radiation coated glass carrying out high-temperature heat treatment according to claim 1, is characterized in that: the thickness of the 11 described rete ZrNx layer (12) is 10 ~ 25nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520611357.3U CN204869893U (en) | 2015-08-14 | 2015-08-14 | Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520611357.3U CN204869893U (en) | 2015-08-14 | 2015-08-14 | Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204869893U true CN204869893U (en) | 2015-12-16 |
Family
ID=54814312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520611357.3U Expired - Fee Related CN204869893U (en) | 2015-08-14 | 2015-08-14 | Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204869893U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105058922A (en) * | 2015-08-14 | 2015-11-18 | 中山市格兰特实业有限公司 | Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment and preparation method thereof |
| CN106277838A (en) * | 2016-08-18 | 2017-01-04 | 河南安彩高科股份有限公司 | A kind of Adhesion enhancement type radiation coated glass capable of being toughened |
-
2015
- 2015-08-14 CN CN201520611357.3U patent/CN204869893U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105058922A (en) * | 2015-08-14 | 2015-11-18 | 中山市格兰特实业有限公司 | Double-silver low-emissivity coated glass capable of being subjected to high-temperature heat treatment and preparation method thereof |
| CN106277838A (en) * | 2016-08-18 | 2017-01-04 | 河南安彩高科股份有限公司 | A kind of Adhesion enhancement type radiation coated glass capable of being toughened |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151216 Termination date: 20200814 |