CN204803397U - Sputter coating device - Google Patents
Sputter coating device Download PDFInfo
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- CN204803397U CN204803397U CN201520489265.2U CN201520489265U CN204803397U CN 204803397 U CN204803397 U CN 204803397U CN 201520489265 U CN201520489265 U CN 201520489265U CN 204803397 U CN204803397 U CN 204803397U
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- cavity
- hole
- delivery roll
- baffle plate
- rectangular
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Abstract
The utility model discloses a sputter coating device, the screen panel passes through bolt and coating chamber room fixed connection, sun plate frame sets up the bottom at the cavity, the negative pole lid sets up the top at the cavity, vacuum air inlet unit sets up on the top of cavity, the upper portion on the cavity right side is installed to the controller. This sputter coating device, the baffle subassembly is used for sheltering from the bottom of cavity to and the lateral part of delivery roll, can be at the sputter in -process, the atom deposit that prevents the negative pole spill avoids the deposit to pollute articles such as positive pole or delivery roll on the delivery roll or the bottom of cavity, guarantees glass's coating film efficiency and yield from this, the controller can be to the electric current size control among the sputter coating device of vacuum to the velocity of movement and the orbit of particle is controlled, therefore the effect of best coating film can be reached, through the internally mounted in the coating chamber room with the screen panel of dismantled and assembled mode, reduce fall the sediment in, cleaner, the maintenance cost is low.
Description
Technical field
The utility model belongs to sputter coating technical field, is specifically related to a kind of Sputting film-plating apparatus.
Background technology
Sputter coating is widely used in the fields such as glass, pottery, semi-conductor.A kind of existing vacuum sputtering coating device is provided with sputtering cavity, is arranged on the delivery roll in cavity, is arranged on the baffle plate be connected between delivery roll and with cavity bottom, and is arranged on the cathode targets in cavity.Cavity bottom is as anode, and under the effect of impact of discharge gas, the atom in cathode targets splashes out towards anode and is deposited on the glass on delivery roll, to complete the plated film processing of glass.The baffle plate be arranged between delivery roll is metal material, can tackle atom or molecule that cathode targets spills, the atom preventing cathode targets from spilling or molecule deposit to from the space between delivery roll or the space between two glass and transmit roll surface or on other devices.The cross section of this baffle plate takes the shape of the letter U, and needs to arrange in insulating with cavity bottom, otherwise easily causes cathode targets generation electric discharge to beat the phenomenons such as arc, thus badly influences glass coating quality and production efficiency.
At present, existing way adopts L shaped plate that baffle plate is fixed on cavity bottom, but this mode still easily causes the conducting of baffle plate and cavity.
Meanwhile, large-scale magnetron sputtering plating chamber on the market at present, adopts surface through the stainless steel baffle plate of sanding and polishing process usually in the bottom of sputtering chamber sidewall, because glazed surface is to sputtering thing limited sorption capacity.Operationally, the target only having small part to sputter is attracted to the stainless steel baffle surface of polishing in sputtering chamber inside, and adsorptive capacity is also little, and most of target waste residue accumulates on lower side shield and base plate; After sputtering chamber quits work, sputtering chamber temperature can slowly reduce, and is adsorbed on the sputtering material of glazed surface, because absorption is firm not, very easily takes off from surface and splits, splash down near roller-way.There is the problem that slag is serious, accumulated slag is easily piled up in said structure, when having product through this sputtering chamber, the material splashed down easily drops at product surface, causes rete sputtering not below to be attached on product completely, directly cause product rejection.Meanwhile, stainless (steel) wire is welded in inside, sputtering zone, dismantles constant, and coating wire needs to stop production continually and cleans for a long time in inside, sputtering zone, and maintenance cost is higher.
Utility model content
The purpose of this utility model is to provide a kind of Sputting film-plating apparatus, to solve the problem proposed in above-mentioned background technology.
For achieving the above object, the utility model provides following technical scheme: a kind of Sputting film-plating apparatus, comprises cavity, guard, plated film chamber, target, delivery roll, baffle plate assembly, negative electrode lid, anode sheet frame, sealing member, import, outlet, vacuum diffuser, controller, described plated film chamber is arranged on the inside of cavity, and described guard is by junction steel plate, connecting hole, rectangular through-hole and stainless (steel) wire composition, described guard is fixedly connected with plated film chamber by bolt, described connecting hole is arranged on the end face of junction steel plate, described rectangular through-hole is arranged on the end face of junction steel plate, and rectangular through-hole is disposed between connecting hole, described stainless (steel) wire is fixedly connected with junction steel plate by welding, described anode sheet frame is arranged on the bottom of cavity, described delivery roll and baffle plate assembly are all arranged in anode sheet frame, and baffle plate assembly is disposed between delivery roll, described negative electrode lid is arranged on the top of cavity, described target is arranged in negative electrode lid, described sealing member is arranged between negative electrode lid and anode sheet frame, described import is arranged on the middle part on the left of cavity, described outlet is arranged on the right side of cavity, described vacuum diffuser is arranged on the top of cavity, described controller is arranged on the top on the right side of cavity.
Preferably, described rectangular through-hole is uniformly distributed in the end face of junction steel plate along the bearing of trend of junction steel plate, and the threaded securing bores one_to_one corresponding on described rectangular through-hole and plated film chamber, the inside of described rectangular through-hole is provided with joint bolt.
Preferably, described vacuum diffuser is made up of cylinder valve, under meter and intake valve, described cylinder valve, under meter and intake valve be arranged on successively from top to bottom lead to plated film chamber intake ducting on.
Preferably, described baffle plate assembly is made up of retaining plate, insulating part and baffle plate.
Preferably, described import and outlet are equipped with sealing fixture.
Preferably, described controller is made up of display screen, central processing unit, push button, trip switch and current control device.
Technique effect of the present utility model and advantage: this Sputting film-plating apparatus, be provided with sealing member between negative electrode lid and anode sheet frame, and the seal enables cavity keep vacuum environment; Baffle plate assembly is for blocking the bottom of cavity, and the sidepiece of delivery roll, can in sputter process, the atomic deposition preventing negative electrode from spilling is on delivery roll or the bottom of cavity, avoid the objects such as sediment pollution anode or delivery roll, ensure plated film efficiency and the yield of glass thus; When this vacuum sputtering coating device works, the bottom of anode sheet frame is as anode, negative electrode lid is as negative electrode, vacuum environment is kept in cavity, and by the anticathode shock of discharge gas, cathode atoms is spilt and towards anode movement, thus be deposited on the glass surface be positioned on delivery roll, to complete, the plated film of workpiece is processed; Controller can control the size of current in vacuum sputtering coating device, thus controls movement velocity and the track of particle, therefore, it is possible to reach the effect of best plated film; By having installed guard detachably in the inside of plated film chamber, while slag is fallen in minimizing, more easy cleaning, when the clean guard of needs, only need guard to pull down, and undertaken by sandblasting or other operations clean, cleaning speed is fast, efficiency is high, and maintenance cost is low; By doing modularized design to baffle plate assembly, and by the setting of insulating part, not only can ensure the insulating property of baffle plate and cavity, the packaging efficiency of baffle plate assembly can also be optimized, make baffle plate assembly dismounting more convenient.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is net cover structure schematic diagram of the present utility model.
In figure: 1 cavity, 2 guards, 21 junction steel plates, 22 connecting holes, 23 rectangular through-hole, 24 stainless (steel) wires, 3 plated film chambers, 4 targets, 5 delivery rolls, 6 baffle plate assemblies, 7 negative electrode lids, 8 anode sheet frames, 9 sealing members, 10 imports, 11 outlets, 12 vacuum diffusers, 13 controllers.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, be clearly and completely described the technical scheme in the utility model embodiment, obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the utility model protection.
The utility model provides a kind of Sputting film-plating apparatus as depicted in figs. 1 and 2, comprise cavity 1, guard 2, plated film chamber 3, target 4, delivery roll 5, baffle plate assembly 6, negative electrode lid 7, anode sheet frame 8, sealing member 9, import 10, outlet 11, vacuum diffuser 12, controller 13, described plated film chamber 3 is arranged on the inside of cavity 1, described guard 2 is by junction steel plate 21, connecting hole 22, rectangular through-hole 23 and stainless (steel) wire 24 form, described guard 2 is fixedly connected with plated film chamber 3 by bolt, described connecting hole 22 is arranged on the end face of junction steel plate 21, described rectangular through-hole 23 is arranged on the end face of junction steel plate 21, and rectangular through-hole 23 is disposed between connecting hole 22, described rectangular through-hole 23 is uniformly distributed in the end face of junction steel plate 21 along the bearing of trend of junction steel plate 21, described rectangular through-hole 23 and the threaded securing bores one_to_one corresponding on plated film chamber 3, the inside of described rectangular through-hole 23 is provided with joint bolt, described stainless (steel) wire 24 is fixedly connected with junction steel plate 21 by welding, described anode sheet frame 8 is arranged on the bottom of cavity 1, described delivery roll 5 and baffle plate assembly 6 are all arranged in anode sheet frame 8, and baffle plate assembly 6 is disposed between delivery roll 5, described baffle plate assembly 6 is by retaining plate, insulating part and baffle plate composition, described negative electrode lid 7 is arranged on the top of cavity 1, described target 4 is arranged in negative electrode lid 7, described sealing member 9 is arranged between negative electrode lid 7 and anode sheet frame 8, described import 10 is arranged on the middle part on the left of cavity 1, described outlet 11 is arranged on the right side of cavity 1, : described import 10 and outlet 11 are equipped with sealing fixture, described vacuum diffuser 12 is arranged on the top of cavity 1, described vacuum diffuser 12 is by cylinder valve, under meter and intake valve composition, described cylinder valve, under meter and intake valve be arranged on successively from top to bottom lead to plated film chamber 3 intake ducting on, described controller 13 is arranged on the top on the right side of cavity 1, described controller 13 is by display screen, central processing unit, push button, trip switch and current control device composition.
Principle of work: sputter coating carries out in vacuum sputtering groove, vacuum tightness will reach 10x10
-3above, be filled with a certain amount of rare gas element, using target as negative electrode, workpiece, as anode, adds that high pressure makes ionized inert gas, Ar between two electrodes
+ion is accelerated by the negative high voltage (-500v) of negative electrode, with high velocity bombardment target, the particle splashing out from target surface fly to anode workpiece with enough speed and deposition in its surface, form coating; When this vacuum sputtering coating device works, the bottom of anode sheet frame 8 is as anode, negative electrode lid 7 is as negative electrode, vacuum environment is kept in cavity 1, and by the anticathode shock of discharge gas, cathode atoms is spilt and towards anode movement, thus be deposited on the glass surface be positioned on delivery roll, to complete the plated film processing of glass; Workpiece enters in cavity 1 from the import 10 of cavity 1, and runs on delivery roll 5, and in the process passing through cavity 1, workpiece surface, by plated film, then arrives cavity 1 outside to enter subsequent processing from the outlet 11 of cavity 1.
Last it is noted that the foregoing is only preferred embodiment of the present utility model; be not limited to the utility model; although be described in detail the utility model with reference to previous embodiment; for a person skilled in the art; it still can be modified to the technical scheme described in foregoing embodiments; or equivalent replacement is carried out to wherein portion of techniques feature; all within spirit of the present utility model and principle; any amendment of doing, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.
Claims (6)
1. a Sputting film-plating apparatus, comprise cavity (1), guard (2), plated film chamber (3), target (4), delivery roll (5), baffle plate assembly (6), negative electrode lid (7), anode sheet frame (8), sealing member (9), import (10), outlet (11), vacuum diffuser (12), controller (13), it is characterized in that: described plated film chamber (3) is arranged on the inside of cavity (1), described guard (2) is by junction steel plate (21), connecting hole (22), rectangular through-hole (23) and stainless (steel) wire (24) composition, described guard (2) is fixedly connected with plated film chamber (3) by bolt, described connecting hole (22) is arranged on the end face of junction steel plate (21), described rectangular through-hole (23 establish) is put on the end face of junction steel plate (21), and rectangular through-hole (23) is disposed between connecting hole (22), described stainless (steel) wire (24) is fixedly connected with junction steel plate (21) by welding, described anode sheet frame (8) is arranged on the bottom of cavity (1), described delivery roll (5) and baffle plate assembly (6) are all arranged in anode sheet frame (8), and baffle plate assembly (6) is disposed between delivery roll (5), described negative electrode lid (7) is arranged on the top of cavity (1), described target (4) is arranged in negative electrode lid (7), described sealing member (9) is arranged between negative electrode lid (7) and anode sheet frame (8), described import (10) is arranged on the middle part in cavity (1) left side, described outlet (11) is arranged on the right side of cavity (1), described vacuum diffuser (12) is arranged on the top of cavity (1), described controller (13) is arranged on the top on cavity (1) right side.
2. a kind of Sputting film-plating apparatus according to claim 1, it is characterized in that: described rectangular through-hole (23) is uniformly distributed in the end face of junction steel plate (21) along the bearing of trend of junction steel plate (21), described rectangular through-hole (23) and the threaded securing bores one_to_one corresponding on plated film chamber (3), the inside of described rectangular through-hole (23) is provided with joint bolt.
3. a kind of Sputting film-plating apparatus according to claim 1, it is characterized in that: described vacuum diffuser (12) is made up of cylinder valve, under meter and intake valve, described cylinder valve, under meter and intake valve are arranged on successively from top to bottom and lead to plated film chamber (on the intake ducting of 3.
4. a kind of Sputting film-plating apparatus according to claim 1, is characterized in that: described baffle plate assembly (6) is made up of retaining plate, insulating part and baffle plate.
5. a kind of Sputting film-plating apparatus according to claim 1, is characterized in that: described import (10) and outlet (11) are equipped with sealing fixture.
6. a kind of Sputting film-plating apparatus according to claim 1, is characterized in that: described controller (13) is made up of display screen, central processing unit, push button, trip switch and current control device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520489265.2U CN204803397U (en) | 2015-07-09 | 2015-07-09 | Sputter coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520489265.2U CN204803397U (en) | 2015-07-09 | 2015-07-09 | Sputter coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204803397U true CN204803397U (en) | 2015-11-25 |
Family
ID=54588249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520489265.2U Expired - Fee Related CN204803397U (en) | 2015-07-09 | 2015-07-09 | Sputter coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204803397U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112159961A (en) * | 2020-09-06 | 2021-01-01 | 湖北亿钧耀能新材股份公司 | Sputtering chamber of glass coating equipment |
-
2015
- 2015-07-09 CN CN201520489265.2U patent/CN204803397U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112159961A (en) * | 2020-09-06 | 2021-01-01 | 湖北亿钧耀能新材股份公司 | Sputtering chamber of glass coating equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151125 Termination date: 20190709 |
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| CF01 | Termination of patent right due to non-payment of annual fee |