CN204790305U - 接近式曝光用光掩膜 - Google Patents

接近式曝光用光掩膜 Download PDF

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Publication number
CN204790305U
CN204790305U CN201520328358.7U CN201520328358U CN204790305U CN 204790305 U CN204790305 U CN 204790305U CN 201520328358 U CN201520328358 U CN 201520328358U CN 204790305 U CN204790305 U CN 204790305U
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CN
China
Prior art keywords
photomask
semi
pattern
permeable film
transmittance section
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CN201520328358.7U
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English (en)
Chinese (zh)
Inventor
齐藤隆史
美作昌宏
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SK Electronics Co Ltd
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SK Electronics Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
CN201520328358.7U 2014-06-17 2015-05-20 接近式曝光用光掩膜 Active CN204790305U (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014124833A JP5668168B1 (ja) 2014-06-17 2014-06-17 プロキシミティ露光用フォトマスク
JP2014-124833 2014-06-17

Publications (1)

Publication Number Publication Date
CN204790305U true CN204790305U (zh) 2015-11-18

Family

ID=52569528

Family Applications (1)

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CN201520328358.7U Active CN204790305U (zh) 2014-06-17 2015-05-20 接近式曝光用光掩膜

Country Status (4)

Country Link
JP (1) JP5668168B1 (ko)
KR (1) KR101593366B1 (ko)
CN (1) CN204790305U (ko)
TW (1) TWI499861B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105892142A (zh) * 2016-06-29 2016-08-24 武汉华星光电技术有限公司 黑色矩阵光罩、制备黑色矩阵的方法及其应用
CN113805428A (zh) * 2020-06-15 2021-12-17 株式会社Sk电子 接近式曝光用光掩模

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6557638B2 (ja) * 2016-07-06 2019-08-07 株式会社エスケーエレクトロニクス ハーフトーンマスクおよびハーフトーンマスクブランクス
TW201823855A (zh) * 2016-09-21 2018-07-01 日商Ｈｏｙａ股份有限公司 光罩之製造方法、光罩、及顯示裝置之製造方法
TWI712851B (zh) * 2018-10-22 2020-12-11 日商Ｈｏｙａ股份有限公司 光罩、光罩之製造方法及電子元件之製造方法
KR102367141B1 (ko) * 2019-02-27 2022-02-23 호야 가부시키가이샤 포토마스크, 포토마스크의 제조 방법, 및 표시 장치의 제조 방법

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
US7045255B2 (en) * 2002-04-30 2006-05-16 Matsushita Electric Industrial Co., Ltd. Photomask and method for producing the same
KR100676651B1 (ko) * 2004-12-03 2007-01-31 주식회사 에스앤에스텍 액정표시장치용 블랭크 마스크 제조방법
JP4848932B2 (ja) 2006-11-13 2011-12-28 大日本印刷株式会社 プロキシミティ露光用階調マスク
JP5702920B2 (ja) * 2008-06-25 2015-04-15 Hoya株式会社 位相シフトマスクブランク、位相シフトマスクおよび位相シフトマスクブランクの製造方法
TWI461833B (zh) * 2010-03-15 2014-11-21 Hoya Corp 多調式光罩、多調式光罩之製造方法及圖案轉印方法
KR101151685B1 (ko) * 2011-04-22 2012-07-20 주식회사 에스앤에스텍 블랭크 마스크 및 포토마스크
JP2011186506A (ja) * 2011-07-01 2011-09-22 Sk Electronics:Kk 中間調フォトマスク
CN110083008A (zh) * 2011-10-21 2019-08-02 大日本印刷株式会社 大型相移掩模及大型相移掩模的制造方法
JP2013246339A (ja) * 2012-05-28 2013-12-09 Toppan Printing Co Ltd フォトマスクおよびそれを用いるパターン露光方法
JP5690023B2 (ja) * 2012-07-13 2015-03-25 Hoya株式会社 マスクブランク及び位相シフトマスクの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105892142A (zh) * 2016-06-29 2016-08-24 武汉华星光电技术有限公司 黑色矩阵光罩、制备黑色矩阵的方法及其应用
US10324325B2 (en) 2016-06-29 2019-06-18 Wuhan China Star Optoelectronics Technology Co., Ltd. Black matrix mask, method for manufacturing black matrix, and application thereof
CN113805428A (zh) * 2020-06-15 2021-12-17 株式会社Sk电子 接近式曝光用光掩模

Also Published As

Publication number Publication date
KR20150144684A (ko) 2015-12-28
KR101593366B1 (ko) 2016-02-11
TWI499861B (zh) 2015-09-11
JP5668168B1 (ja) 2015-02-12
JP2016004174A (ja) 2016-01-12
TW201531794A (zh) 2015-08-16

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