CN204732430U - A kind of cavity body structure of reaction chamber of solar cell dry method process for etching - Google Patents
A kind of cavity body structure of reaction chamber of solar cell dry method process for etching Download PDFInfo
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- CN204732430U CN204732430U CN201520486855.XU CN201520486855U CN204732430U CN 204732430 U CN204732430 U CN 204732430U CN 201520486855 U CN201520486855 U CN 201520486855U CN 204732430 U CN204732430 U CN 204732430U
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- reaction chamber
- stainless steel
- aluminium alloy
- steel materials
- etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model relates to solar battery sheet manufacturing equipment, plasma etching, vacuum reaction chamber technical field, especially a kind of cavity body structure of reaction chamber of solar cell dry method process for etching.Chamber body is welded by polylith stainless steel materials is assembled, the surperficial spraying plating teflon coatings of stainless steel materials, the dismountable aluminium alloy lining armoured plate of teflon coatings surface inserting.Teflon coatings is PTFE, PFA, or FEP material.Stainless steel materials is the stainless steel through blasting treatment.Aluminium alloy lining armoured plate is aluminium sheet or the surface liner armoured plate through deep oxidation process.The utility model reduces difficulty of processing, reduces expense of handing over; Be out of shape little under the vacuum pressure bearing Large Enclosure; Easy accessibility, effectively can solve the problem that reaction chamber and the family of power and influence and other cavitys connect difficulty; Aluminium alloy lining armoured plate has resistance to chemical attack, effectively can stop the bombardment of high energy particle to coating, and can not cause metal ion pollution to silicon chip.
Description
Technical field
The utility model relates to solar battery sheet manufacturing equipment, plasma etching, vacuum reaction chamber technical field, especially a kind of cavity body structure of reaction chamber of solar cell dry method process for etching.
Background technology
Plasma etching (RIE) is widely used in microelectronic component manufacture, comprises semiconductor chip, liquid crystal display thin-film transistor (TFT) driver, electrical micro-machine system, the making herbs into wool of solar energy dry method etc.Its basic concept is antecedent gas (the such as SF containing fluorine and chlorine
6, CF
4, CCl
4, Cl
2deng) under plasma effect ionization produce that F and Cl etc. has the free radical of powerful chemical activity, ion pair substrate surface carries out etching reaction.For forming plasma, need to realize in vacuum cavity.Effective material that can bear vacuum pressure is in general steel.But steel or iron can produce chemical reaction with F or Cl, and can have a negative impact to its performance when being infected with on microelectronic component.
For contaminated solution problem, industry leads to the cavity material that Aluminium Alloys in Common Use or anodised aluminium do (RIE).But the bad welding of aluminium alloy, so processing must be emptied from the aluminium alloy castings of a monoblock.So not only material cost is high, and processing cost is high.Especially in the present invention's application, RIE is used for solar battery sheet surface wool manufacturing (claiming dry method making herbs into wool), need huge cavity, its length is more than more than 1 meter.Such processing cost is very high.
RIE technological reaction chamber must have following functions key element: 1, bearing vacuum pressure can not have large distortion; 2, resistance to chemical attack; 3, can not produce wafer contamination metal ion.At present, the manufacture method in the technological reaction chamber of overseas equipment is that it is shaping that entirety empties cut with single aluminium alloy castings.The major defect of the method is: (1) large-scale reaction cavity difficulty of processing is large, costly; (2) because Large Enclosure bears vacuum pressure, and the intensity of aluminium alloy is relatively low, and chamber wall thickness increases, outfit of equipment larger; (3) reaction chamber and the family of power and influence connect relative difficulty with other cavitys.
Utility model content
In order to overcome the deficiency of existing technology, the utility model provides a kind of cavity body structure of reaction chamber of solar cell dry method process for etching.
The utility model solves the technical scheme that its technical problem adopts: a kind of cavity body structure of reaction chamber of solar cell dry method process for etching, this chamber body is welded by polylith stainless steel materials is assembled, the surperficial spraying plating teflon coatings of stainless steel materials, the dismountable aluminium alloy lining armoured plate of teflon coatings surface inserting.
According to another embodiment of the present utility model, comprising described teflon coatings is further PTFE, PFA, or DuPond E.I.Du Pont Company of the FEP(U.S.) material.
According to another embodiment of the present utility model, comprising described stainless steel materials is further stainless steel through blasting treatment.
According to another embodiment of the present utility model, comprising described alloy lining armoured plate is further the liner armoured plate of surface through deep oxidation process.
The beneficial effects of the utility model are,
(1) compared to the processing of monoblock aluminium, the cavity that the welding of polylith stainless steel materials is formed and dismountable fritter aluminium alloy lining armoured plate reduce difficulty of processing, decrease the expense of handing over;
(2) polylith stainless steel materials and dismountable fritter aluminium alloy lining armoured plate be combined in the vacuum pressure bearing Large Enclosure under be out of shape little;
(3) the combination easy accessibility of polylith stainless steel materials and dismountable fritter aluminium alloy lining armoured plate, effectively can solve the problem that reaction chamber and the family of power and influence and other cavitys connect difficulty;
(4) aluminium alloy lining armoured plate has resistance to chemical attack, effectively can stop the bombardment of high energy particle to coating, and can not cause metal ion pollution to silicon chip.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the utility model is further illustrated.
Fig. 1 is RIE technological reaction chamber corrosion schematic diagram.
Fig. 2 is the anti-cavity configuration schematic diagram of overseas equipment technique.
Fig. 3 is the utility model reaction chamber structural representation.
Fig. 4 is that in Fig. 3, reaction chamber I portion structure amplifies diagram.
In figure, 1, process chemistry gas access, 2, technological reaction cavity, 3, upper parallel electrode plate, 4, RF radio-frequency power supply, 5, F, Cl free radical of producing of chemical gas may to the corrosion of cavity, 6, produce metal ion because of the corrosion of cavity and separate out and pollute, 7, F, Cl free radical of chemical gas generation, to the etching of silicon chip, 8, plasma, 9, vacuum pump, 10, lower parallel electrode plate, 11, wafer, 12, stainless steel materials, 13, Teflon (PTFE) coating, 14, aluminium alloy lining armoured plate, 15, aluminum alloy fastener.
Embodiment
As shown in Figure 1, plasma etching (RIE) technological reaction chamber corrosion schematic diagram.1, process chemistry gas access is represented; 2, be technological reaction cavity; 3, be upper parallel electrode plate; 4, be RF radio-frequency power supply; 5, represent that F, Cl free radical that chemical gas produces may to the corrosion of cavity; 6, represent that producing metal ion because of the corrosion of cavity separates out and pollute; 7, F, Cl free radical that chemical gas produces is represented, to the etching of silicon chip; 8, be plasma; 9, be vacuum pump; 10, be lower parallel electrode plate; 11, be wafer.RF radio-frequency power supply 4 is added to high frequency voltage on parallel electrode plate 3,10, produces plasma to low-pressure chemical vapor electric discharge in cavity.This have chemically active plasma 8, usually produced by chlorine and carbon fluorine gas discharge, and it, not only containing electronics, ion, also has a large amount of living radicals, as Cl, F, Cl-, F-etc.F, Cl free radical 7 that these chemical gas produce, under the effect of plasma arc voltage, bombards exposed wafer 11 surface thus anisotropic etching to wafer 11.On the other hand, when technique is carried out, cavity is in plasma, F, Cl free radical that chemical gas produces may react to go forward side by side to the Fe etc. of corrosion 5 meeting of cavity and chamber wall metal and go in atmosphere, Fe ion produces metal ion precipitation and pollutes 6 and is attached to substrate surface because of the corrosion of cavity, produce fatal metal ion pollution to substrate.
As shown in Figure 2, RIE technological reaction cavity of the prior art adopts single aluminium alloy castings, and it is shaping to be that entirety empties cut, processes cumbersome.Many machining feature of installing with carrier plate transmission, distribution of gas, vacuum suction, vacuum detecting, ion source are not main improvements of the present utility model, therefore not perfect representation on schematic diagram.
As shown in Figure 3,4, reaction chamber structural representation of the present utility model.Cavity main structure is welded by polylith stainless steel materials 12 is assembled.The surperficial spraying plating teflon coatings 13 of stainless steel materials 12.In order to strengthen the adhesion of teflon coatings 13 and stainless steel materials 12 surface, stainless steel materials 12 surface needs blasting treatment.Through the teflon coatings 13 of hot setting, can effectively prevent process activity gas to the chemical corrosion on stainless steel materials 12 surface.The dismountable aluminium alloy lining armoured plate 14 of teflon coatings 13 surface inserting.Aluminium alloy lining armoured plate 14 can be directly aluminium sheet, or surface is through the aluminum liner armoured plate of deep oxidation process.Socket type is made at aluminium alloy lining armoured plate 14 edge, and overlap joint does not each other have vertical straight joint, effectively can stop the direct bombardment of high energy particle to teflon coatings 13 like this.Aluminium alloy lining armoured plate 14, by aluminum alloy fastener 15, is fixed on stainless steel materials 12.If aluminium alloy lining armoured plate 14 needs cleaning or changes, dismountable aluminum alloy fastener 15, thus aluminium alloy lining armoured plate 14 for convenience detach.Aluminium alloy lining armoured plate of the present utility model has corrosion resistance, effectively can stop the bombardment of high energy particle to coating, and can not cause metal ion pollution to silicon chip.
Above content is in conjunction with concrete preferred implementation to the utility model, the further description done, and can not assert that concrete enforcement of the present utility model is confined to solar energy dry method making herbs into wool field.For relevant (RIE) etching apparatuss such as liquid crystal display, electronics IC manufactures; and without departing from the concept of the premise utility; the series of products derived from; such as possesses vacuum coating (PECVD) cavity strengthened with the plasma source of the automatic such cleaning chamber function of fluorine compounds; all should be considered as belonging to the utility model, the scope of patent protection that the claims submitted to are determined.
Claims (4)
1. a cavity body structure for the reaction chamber of solar cell dry method process for etching, is characterized in that,
This chamber body is welded by polylith stainless steel materials is assembled, the surperficial spraying plating teflon coatings of stainless steel materials, the dismountable aluminium alloy lining armoured plate of teflon coatings surface inserting.
2. the cavity body structure of the reaction chamber of solar cell dry method process for etching according to claim 1, is characterized in that, described teflon coatings is PTFE, PFA, or FEP material.
3. the cavity body structure of the reaction chamber of solar cell dry method process for etching according to claim 1, is characterized in that, described stainless steel materials is the stainless steel through blasting treatment.
4. the cavity body structure of the reaction chamber of solar cell dry method process for etching according to claim 1, is characterized in that, described aluminium alloy lining armoured plate is aluminium sheet or the surface liner armoured plate through deep oxidation process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520486855.XU CN204732430U (en) | 2015-07-08 | 2015-07-08 | A kind of cavity body structure of reaction chamber of solar cell dry method process for etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520486855.XU CN204732430U (en) | 2015-07-08 | 2015-07-08 | A kind of cavity body structure of reaction chamber of solar cell dry method process for etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204732430U true CN204732430U (en) | 2015-10-28 |
Family
ID=54390760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520486855.XU Withdrawn - After Issue CN204732430U (en) | 2015-07-08 | 2015-07-08 | A kind of cavity body structure of reaction chamber of solar cell dry method process for etching |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204732430U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104934505A (en) * | 2015-07-08 | 2015-09-23 | 常州比太科技有限公司 | Cavity structure of reaction chamber used in solar cell dry method texturing technology |
-
2015
- 2015-07-08 CN CN201520486855.XU patent/CN204732430U/en not_active Withdrawn - After Issue
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104934505A (en) * | 2015-07-08 | 2015-09-23 | 常州比太科技有限公司 | Cavity structure of reaction chamber used in solar cell dry method texturing technology |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20151028 Effective date of abandoning: 20171114 |