CN204537990U - A kind of substrate detection apparatus - Google Patents
A kind of substrate detection apparatus Download PDFInfo
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- CN204537990U CN204537990U CN201520235840.6U CN201520235840U CN204537990U CN 204537990 U CN204537990 U CN 204537990U CN 201520235840 U CN201520235840 U CN 201520235840U CN 204537990 U CN204537990 U CN 204537990U
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Abstract
The utility model provides a kind of substrate detection apparatus, be positioned at the cluster type vacuum equipment of central authorities for polygonal transfer chamber, described polygonal transfer chamber is circumscribed with 2 or multiple functional chamber, inside has the substrate corresponding with described functional chamber and detects station, described substrate detection apparatus comprises and overlaps transducer more, described transducer comprises the emission part of top or the bottom being positioned at described transmission cavity and is positioned at the bottom of described transmission cavity or the acceptance division at top, and at least a set of transducer can be right against the position a certain to be detected of substrate in two adjacent detection stations.The utility model in continuous process, when this substrate detection apparatus ensures to realize detection and localization and damage testing, can reduce transducer use amount, reduces equipment cost.
Description
technical field:
The substrate that the present invention relates in the vacuum equipment such as solar cell, flat panel display field detects, and particularly relates to a kind of substrate detection apparatus be applied in cluster type vacuum equipment.
technical background:
Carrying out in the vacuum equipment system of processing to large-area substrates, such as the system preparing large area film solar cell or display panel, in order to improve equipment capacity, needing substrate with speed operation faster and improving its operating efficiency as much as possible.Owing to generally involving the processing process of multiple function cavity in vacuum equipment system, substrate is made to have to pass in and out between each cavitys such as transmission cavity, process cavity, load cavity continually, and each being separated between substrate and the manipulator of bearing substrate all likely causes substrate to depart from original initial position with contacting again, substrate cannot accurately be located, on the other hand, due to the technological temperature of process cavity in vacuum equipment higher (200 DEG C-500 DEG C), easily make mechanical part produce distortion, also can have influence on the positioning precision of substrate.Aborning, the situation that this substrate cannot accurately be located directly can affect stability and the fail safe of equipment operation, and easily causes the decline of substrate process Disposal quality in function cavity.Therefore, substrate must carry out detection and localization substrate before and after turnover function cavity.
In addition, when substrate runs in vacuum equipment, substrate itself is also very possible there is breakage because of collision or the reason such as high temperature, therefore needs to carry out damage testing to substrate, can carry out maintenance down in time.
Generally speaking, 4 drift angles of rectangular substrate occur damaged probability higher and when substrate orientation occurs to offset 4 drift angles be also more easily detected, so usually realized by 4 summits the damage testing of substrate and detection and localization.But for the transducer unit price that detects costly, need use 4 transducers to detect if detect station for each of substrate, then can cause the increase of equipment cost.Therefore, when ensureing complete measuring ability, providing a kind of and reduce transducer use amount, to reduce the substrate detection apparatus of equipment cost very necessary.
utility model content:
In order to solve the problem, the utility model provides a kind of substrate detection apparatus, this substrate detection apparatus is mainly used in positioning detection and damage testing to the substrate in polygon cluster type vacuum equipment, in the utility model transmission cavity, two of arbitrary neighborhood detect in stations and are provided with a common substrate position to be detected, and correspond to this common position to be detected and a corresponding transducer is set, by this method, when the complete measuring ability of this substrate detection apparatus of guarantee, transducer use amount can be decreased thus reduces equipment cost.
The utility model provides a kind of substrate detection apparatus, be positioned at the cluster type vacuum equipment of central authorities for polygonal transfer chamber, described polygonal transfer chamber is circumscribed with 2 or multiple functional chamber, inside has the substrate corresponding with described functional chamber and detects station, described substrate detection apparatus comprises and overlaps transducer more, described transducer comprises the emission part of top or the bottom being positioned at described transmission cavity and is positioned at the bottom of described transmission cavity or the acceptance division at top, and at least a set of transducer can be right against the position a certain to be detected of substrate in two adjacent detection stations.
Alternatively, described substrate detection apparatus is used for detecting rectangular substrate, and the emission part of described transducer and acceptance division correspond to the corner position of described rectangular substrate.
Alternatively, described polygonal transfer chamber is circumscribed with the functional chamber of more than 3, and the limit of the described transmission cavity connected with described functional chamber is corresponding sides, then the angle formed between described 2 often adjacent corresponding sides is identical.
Alternatively, described rectangular substrate comprises first length of side and second length of side, and described first length of side is vertical with the direction of motion that substrate passes in and out functional chamber, and described second length of side is parallel with the direction of motion that substrate passes in and out functional chamber.
Alternatively, can build in described transmission cavity inside the inside regular polygon that is the length of side with the length of described substrate first length of side, its limit number should be corresponding with the angle formed between described functional chamber.
Preferably, described transmission cavity is regular polygon cavity, then centered by the center of this regular polygon, with the length of described substrate first length of side for the length of side constructs an inner regular polygon, the limit number of described inner regular polygon is identical with described transmission cavity limit number, has the vertex position place of the described inner regular polygon of described detection station to be provided with transducer in correspondence.
Preferably, described substrate is that area is greater than 1m
2rectangular substrate.
Relative to prior art, technique effect of the present utility model is: in continuous process, and this substrate detection apparatus can ensure, when realizing substrate orientation detection and damage testing function, to reduce transducer use amount, reduce equipment cost.
accompanying drawing illustrates:
Fig. 1 is the cluster type vacuum device structure schematic diagram of the first specific embodiment of the present utility model.
Fig. 2 is the substrate detection apparatus structural representation of first specific embodiment corresponding with Fig. 1.
Fig. 3 is the cluster type vacuum device structure schematic diagram of the second specific embodiment of the present utility model.
Fig. 4 is the cluster type vacuum device structure schematic diagram of the 3rd specific embodiment of the present utility model.
Fig. 5 be inner just polygonal be the cluster type vacuum device structure schematic diagram of 5 limit shapes.
Fig. 6 be inner just polygonal be the cluster type vacuum device structure schematic diagram of 7 limit shapes.
embodiment:
Below with reference to specific embodiment shown in the drawings, the utility model is described in detail.What deserves to be explained is, hereafter described embodiment does not limit the utility model, and the structure that those of ordinary skill in the art makes according to these embodiments, method or conversion functionally are all included in protection range of the present utility model.
Embodiment 1:
Fig. 1 is the structural representation of a specific embodiment in the utility model, as shown in the figure, cluster type vacuum equipment 200 includes orthohexagonal transmission cavity 300, its periphery is connected to six functional chamber 100-105, described functional chamber can be feed cavity, discharging chamber, process cavity, deposit cavity, etch chamber, preheating cavity, anneal chamber, cooling chamber, the various dissimilar cavity such as reserve chamber, as long as the operating path meeting substrate is successively through each neighboring chambers, if the limit of the described transmission cavity connected with described functional chamber is called corresponding sides, the angle then formed between described 2 often adjacent corresponding sides is identical, be 120 °.In the present embodiment, feed cavity/discharging chamber 100 has been set gradually in the periphery of described transmission cavity, first process cavity 101, second process cavity 102, 3rd process cavity 103, 4th process cavity 104, 5th process cavity 105, when substrate carries out processing process in cluster type vacuum equipment 200, first enter transmission cavity 300 from described feed cavity 100, then be sent to the first process cavity 101 and carry out first time technique, after technique completes, transmission cavity 300 passed again back by substrate, and then be sent to the second process cavity 102 and carry out second time technique, after technique completes, substrate is passed back transmission cavity 300 again, after having carried out the PROCESS FOR TREATMENT of several process cavity below successively like this, substrate is finally sent to vacuum equipment 200 from discharging chamber 100.In the present embodiment, described substrate is rectangular substrate.According to Fig. 1, the position corresponding to feed cavity/discharging chamber 100 in transmission cavity 300 is that substrate charging/discharging detects station 110, and it includes 4 positions 01 to be detected, 02,13,14, be the situation of rectangular substrate for substrate, position to be detected is set to four drift angles of rectangular substrate usually.Same reason, the position corresponding to the first to the 5th process cavity 101-105 is respectively first to the 5th of substrate and detects station 111-115, and the substrate position to be detected label 03-18 that these detection stations comprise refers to Fig. 1, repeats no longer one by one herein.It should be noted that, in the substrate position to be detected that two detection stations that described transmission cavity 300 is adjacent comprise, described position to be detected is always had to be overlap, such as, position 14 to be detected had both been arranged in charging/discharging and had detected station 110, was also arranged in the first detection station 111; And for example, position 15 to be detected had both been arranged in the first station 111, was also arranged in the second detection station 112; In like manner position 16-18 to be detected is arranged in two adjacent detection positions.Analyze the position characteristics of position 14-18 to be detected: if the length of side of rectangular substrate is respectively first length of side and second length of side, wherein first length of side is vertical with the direction of motion that substrate passes in and out functional chamber, second length of side is parallel with the direction of motion that substrate passes in and out functional chamber, then position 14-18 to be detected constructs one centered by the center of transmission cavity 300, and the length of described substrate first length of side is an inner regular hexagon of the length of side.
The utility model provides a kind of substrate detection apparatus, and this device contains the multiple transducers matched with described detection station 110-115, and described transducer can be laser sensor or other transducers.Described transducer comprises emission part and acceptance division, specifically can be shown in Figure 2, the emission part 40 of described transducer is arranged at the top of described transmission cavity 300, the acceptance division 50 of described transducer is arranged at the bottom of described transmission cavity 300, composition graphs 1 and Fig. 2, the emission part of each transducer and acceptance division are all corresponding to a position to be detected of substrate, namely the emission part of each transducer or the position of acceptance division to be just positioned at directly over a position to be detected or immediately below, for rectangular substrate situation, the emission part of described transducer and acceptance division correspond to the corner position of described rectangular substrate.Position to be detected due to substrate in Fig. 1 is 18, then the number of described transducer is also 18 covers, wherein, position 13-18 to be detected is corresponding 6 cover transducers, these 6 transducers are arranged at cavity top and bottom in the orthohexagonal mode in inside, similarly this orthohexagonal length of side is identical with the length of substrate first length of side, and the center of center and transmission cavity 300 is on same vertical curve.
In the present embodiment, can find out, in the continuous operation process of described cluster type vacuum equipment, for the 6 cover transducers being positioned at inner regular polygon, every suit transducer is equivalent to breakage or the positioning scenarios at two positions, place that have detected substrate, which enhances the utilization rate of transducer, thus when realizing the complete measuring ability of this substrate detection apparatus, decrease transducer use amount, reduce equipment cost.In fact, as long as described polygonal transfer chamber is circumscribed with the functional chamber of more than 2, just has 1 cover and above transducer and can be right against adjacent two positions a certain to be detected detecting substrate in stations, just can realize the object of minimizing transducer use amount.
Embodiment 2:
Fig. 3 is the schematic diagram of the utility model second embodiment, itself and the first embodiment are substantially similar, the two exists together mutually and repeats no more, the main distinction is that the transmission cavity 300 of this cluster type vacuum equipment 200 is no longer just polygonal, its periphery is connected to five-function chamber 100,101,102,104,105, and originally in Fig. 1, external connecting function chamber 106 place changes to maintenance window or does other purposes.In the present embodiment, described polygonal transfer chamber is circumscribed with 5 functional chamber, then the angle formed between often adjacent 2 functional chamber corresponding sides of this transmission cavity is identical, is 120 °.The motion path of substrate in described vacuum equipment 200 is similar to the first embodiment, now, in transmission cavity 300 first to the 5th of substrate detect station 111-115 and these detect the substrate position to be detected label 03-18 that comprises of station can be shown in Figure 3, in the substrate position to be detected that two detection stations that described transmission cavity 300 is adjacent comprise, two described positions to be detected are had to be overlap, such as, position 14 to be detected had both been arranged in charging/discharging and had detected station 110, was also arranged in the first detection station 111; And for example, position 15 to be detected had both been arranged in the first station 111, was also arranged in the second detection station 112.It should be noted that, because in the present embodiment, the 3rd detects the functional chamber that station 113 does not have correspondence, so the transducer corresponding to substrate position 07 and 08 to be detected place can not be arranged.The situation at two positions, place of substrate can be detected owing to there is a set of transducer in transmission cavity, therefore, it is possible to reduce transducer use amount, reduce equipment cost.
Embodiment 3:
Fig. 4 is the schematic diagram of the utility model the 3rd embodiment, in figure, the adjacent side length of the transmission cavity 300 of cluster type vacuum equipment 200 is different, the volume of external chamber not identical yet, as shown in Figure 4, function chamber 100,102, the volume of 104 is significantly less than function chamber 101, the volume of 103,105.Rectangular substrate first embodiment shown in job order with Fig. 1 in this vacuum equipment 200 is identical, and owing to being subject to function chamber 100,102, the restriction of 104 sizes, the size of described substrate should with less function chamber 100,102, and 104 adapt.First to the 5th of substrate station 111-115 is detected and these detect the substrate position to be detected label 03-18 that comprises of station and refer to Fig. 4 in the present embodiment in transmission cavity 300, in the substrate position to be detected that two detection stations that described transmission cavity 300 is adjacent comprise, two described positions to be detected are had to be overlap, such as, position 14 to be detected had both been arranged in charging/discharging and had detected station 110, was also arranged in the first detection station 111; And for example, position 15 to be detected had both been arranged in the first station 111, was also arranged in the second detection station 112.The situation at two positions, place of substrate can be detected owing to there is a set of transducer in transmission cavity, therefore, it is possible to reduce transducer use amount, reduce equipment cost.
Generally speaking, in above-mentioned specific embodiment, in the substrate position to be detected that the adjacent detection station in described transmission cavity comprises, there is the position to be detected of coincidence.
Be circumscribed with for the situation of the functional chamber of more than 3 for described polygonal transfer chamber, the angle formed between 2 often adjacent functional chamber corresponding sides of described transmission cavity is identical.Learn according to geometrical relationship, for having the rectangular substrate of first length of side, the inner regular polygon that always can to build with the length of described substrate first length of side be the length of side, its limit number should be corresponding with the angle formed between described functional chamber corresponding sides.Such as, just polygonal for inside is the situation of 6 limit shapes, and the angle between the adjacent functional chamber corresponding sides of transmission cavity is 120 °, as shown in Fig. 1, Fig. 3 and Fig. 4; Just polygonal for inside is the situation of 5 limit shapes, and the angle between the adjacent functional chamber corresponding sides of transmission cavity is 108 °, specifically can be shown in Figure 5; Just polygonal for inside is the situation of 7 limit shapes, and the angle between the adjacent functional chamber corresponding sides of transmission cavity is 128.57 °.The position to be detected of coincidence is there is just because of the adjacent detection station in transmission cavity, just make every suit transducer can detect two positions, place of substrate, thus improve the utilization rate of transducer, achieve under the condition of complete measuring ability meeting this substrate detection apparatus, reduce transducer use amount, reduce equipment cost.
Except above-mentioned several of giving embodiment of the present utility model, the utility model also has some other execution mode, such as: the limit number of described polygonal transmission does not limit, can be odd number also can be even number; Each limit length of side can be the same or different; The described each limit of polygonal transmission cavity also can connect non-functional chamber in external connecting function chamber, or is directly used as maintenance window or other purposes; The external functional chamber number in polygonal transfer chamber can be less than the limit number of described transmission cavity; On detection station, the position to be detected of described substrate can be 2 or multiple; Described transducer can be the detection and localization of substrate to the detection of substrate, also can be the damage testing of substrate; Described transducer can for carrying out the transducer of any other form of substrate detection; Described sensor emission portion or acceptance division can be arranged on inside transmission cavity bottom dome or the outside at top, also can be arranged on the outside of transmission cavity bottom inside or bottom.
Special instruction, substrate mentioned in the utility model can be rectangular substrate can be also non-rectangular substrate, and its size is also unrestricted.But, 1m is greater than for area
2rectangular substrate, due to the situation of corner breakage more easily can be there is in transmitting procedure, so it adopts the design effect disclosed by the utility model can be better.
Be to be understood that, although this specification is described according to execution mode, but not each execution mode only comprises an independently technical scheme, this narrating mode of specification is only for clarity sake, those skilled in the art should by specification integrally, technical scheme in each execution mode also through appropriately combined, can form other execution modes that it will be appreciated by those skilled in the art that.
A series of detailed description listed is above only illustrating for feasibility execution mode of the present utility model; they are also not used to limit protection range of the present utility model, all do not depart from the utility model skill equivalent implementations of doing of spirit or change all should be included within protection range of the present utility model.
Claims (7)
1. a substrate detection apparatus, be positioned at the cluster type vacuum equipment of central authorities for polygonal transfer chamber, described polygonal transfer chamber is circumscribed with 2 or multiple functional chamber, inside has the substrate corresponding with described functional chamber and detects station, described substrate detection apparatus comprises and overlaps transducer more, described transducer comprises the emission part of top or the bottom being positioned at described transmission cavity and is positioned at the bottom of described transmission cavity or the acceptance division at top, it is characterized in that: at least a set of transducer can be right against the position a certain to be detected of substrate in two adjacent detection stations.
2. a kind of substrate detection apparatus as claimed in claim 1, is characterized in that: described substrate detection apparatus is used for detecting rectangular substrate, and the emission part of described transducer and acceptance division correspond to the corner position of described rectangular substrate.
3. a kind of substrate detection apparatus as claimed in claim 2, it is characterized in that: described polygonal transfer chamber is circumscribed with the functional chamber of more than 3, the limit of the described transmission cavity connected with described functional chamber is corresponding sides, then the angle formed between described 2 often adjacent corresponding sides is identical.
4. a kind of substrate detection apparatus as claimed in claim 3, it is characterized in that: described rectangular substrate comprises first length of side and second length of side, described first length of side is vertical with the direction of motion that substrate passes in and out functional chamber, and described second length of side is parallel with the direction of motion that substrate passes in and out functional chamber.
5. a kind of substrate detection apparatus as claimed in claim 4, it is characterized in that: can build in described transmission cavity inside the inside regular polygon that is the length of side with the length of described substrate first length of side, its limit number should be corresponding with the angle formed between described functional chamber.
6. a kind of substrate detection apparatus as claimed in claim 4, it is characterized in that: described transmission cavity is regular polygon cavity, then centered by the center of this regular polygon, with the length of described substrate first length of side for the length of side builds an inner regular polygon, the limit number of described inner regular polygon is identical with described transmission cavity limit number, has the vertex position place of the described inner regular polygon of described detection station to be provided with transducer in correspondence.
7. a kind of substrate detection apparatus according to any one of claim 1-5, described substrate is that area is greater than 1m
2rectangular substrate.
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| CN201520235840.6U CN204537990U (en) | 2015-04-20 | 2015-04-20 | A kind of substrate detection apparatus |
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| CN201520235840.6U CN204537990U (en) | 2015-04-20 | 2015-04-20 | A kind of substrate detection apparatus |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112233992A (en) * | 2020-09-10 | 2021-01-15 | 上海华力集成电路制造有限公司 | Wafer fragment detection device and use method thereof |
| CN113877846A (en) * | 2021-12-08 | 2022-01-04 | 苏州佳祺仕信息科技有限公司 | Detection device and method for detecting magnetic flux |
-
2015
- 2015-04-20 CN CN201520235840.6U patent/CN204537990U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112233992A (en) * | 2020-09-10 | 2021-01-15 | 上海华力集成电路制造有限公司 | Wafer fragment detection device and use method thereof |
| CN113877846A (en) * | 2021-12-08 | 2022-01-04 | 苏州佳祺仕信息科技有限公司 | Detection device and method for detecting magnetic flux |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170401 Address after: 201203 Shanghai city Songjiang District Sixian Road No. 3255, building 3, Room 403 Patentee after: SHANGHAI LIXIANG WANLIHUI FILM EQUIPMENT Co.,Ltd. Address before: 201203 Pudong New Area Zhangjiang Road, Shanghai, No. 1 Curie Patentee before: SHANGHAI LIXIANG WANLIHUI FILM EQUIPMENT Co.,Ltd. Patentee before: Ideal Energy Equipment (Shanghai) Ltd. |
|
| TR01 | Transfer of patent right | ||
| CP03 | Change of name, title or address |
Address after: 201306 plant 3, Lane 2699, Jiangshan Road, Lingang xinpian District, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai Patentee after: Ideal Wanlihui Semiconductor Equipment (Shanghai) Co.,Ltd. Address before: Room 403, Building 3, No. 3255, Sixian Road, Songjiang District, Shanghai, March 2012 Patentee before: SHANGHAI LIXIANG WANLIHUI FILM EQUIPMENT Co.,Ltd. |
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| CP03 | Change of name, title or address |