CN204459148U

CN204459148U - Seal ring

Info

Publication number: CN204459148U
Application number: CN201520089078.5U
Authority: CN
Inventors: 栾大为
Original assignee: Beijing North Microelectronics Co Ltd
Current assignee: Beijing North Microelectronics Co Ltd
Priority date: 2015-02-09
Filing date: 2015-02-09
Publication date: 2015-07-08
Anticipated expiration: 2025-02-09

Abstract

The utility model discloses a kind of seal ring, sealing circle is installed on the chuck surface of etching apparatus, in order to form seal space between chuck and pallet, the section of described seal ring has the warp architecture being convenient to be compressed by described pallet, to make the gap between described chuck and described pallet enough little.The utility model has the special-shaped seal ring of warp architecture by adopting section, ensure that can be fully compressed under pallet applies to be no more than 25kgf pressure, eliminates the helium layer thickness existed in prior art excessive, the problem of heat conduction efficiency deficiency.

Description

Seal ring

Technical field

The utility model relates to a kind of seal ring in order to form confined space between the chuck and pallet of etching apparatus.

Background technique

Graphical sapphire substrate (Patterned Sapphire Substrates) is a kind of method improving GaN base LED component light extraction efficiency generally adopted at present.Graphical sapphire substrate adopts dry etching technology, etches, thus obtain the Sapphire Substrate with certain figure to the Sapphire Substrate that there is mask pattern.

In etching technics, in order to improve production capacity, be generally that multi-disc sapphire sheet (many employings is 2 inches and 4 inch plaques at present) etches simultaneously.During technique, the pallet that sapphire sheet is housed is imported into processing chamber by mechanism hand, then be put on the pedestal (being commonly referred to chuck) of plasma etch apparatus, after passing into etching reaction gas, by the mode glow discharge of inductive, produce living radical, metastable particle, atom etc. and the chemical interaction between them, these active particles and base surface interact and etch.Required figure will be etched like this at sapphire surface.

Chuck as the carrier of pallet, simultaneously for pallet and wafer provide cooling.Because intrinsic machining accuracy limit, pallet and chuck surface of contact cannot be accomplished to fit completely, for improving heat conduction efficiency, can pass into helium in a cooling system, and helium is sealed between pallet and chuck in using.

As shown in Figure 1, in this cooling system, helium enters pallet 1 bottom by the helium passages 4 of chuck 3 inside distribution, pallet 1 is pressed on seal ring 2 by directed force F (being generally 25kgf), form seal space, ensure that helium is sealed between pallet 1 and chuck 3, thus improve heat conduction efficiency.The chuck sealed circle of current employing is generally O-ring seals, and material is F108 fluorine rubber.

Because directed force F is limited, the existing O-ring seals used cannot compress completely under its effect, causes the thickness D excessive (being generally 0.3mm) of the helium layer 5 formed, and heat conduction efficiency is not enough, cannot meet new etching technics demand.

Model utility content

For prior art Problems existing, the purpose of this utility model is to provide a kind of helium seal ring being installed on chuck surface.

For achieving the above object, the utility model technical solution is as follows:

A kind of seal ring, sealing circle is installed on the chuck surface of etching apparatus, in order to form seal space between chuck and pallet, the section of described seal ring has the warp architecture being convenient to be compressed by described pallet, to make the gap between described chuck and described pallet enough little.

Further, the surface of described chuck is provided with boss, described ring set is on this boss, and the lower surface of seal ring is pressed on the chuck surface outside boss.

Further, the section of described seal ring has opening towards the radial inboard warp architecture of seal ring.

Further, the section configuration of described seal ring is roughly C shape, and the lower surface of this C shape section is plane.

Further, the section configuration of described seal ring is the crotch shape with the neck of hook and gib head, wherein, the lower surface of the neck of hook is plane, and the inboard oblique upper of gib head from neck of hook outboard end to the neck of hook extends, and, gib head is connected with neck of hook round-corner transition, and gib head free end end is circular arc.

Further, the inboard oblique upper of described gib head along circular arc to the described neck of hook extends, and the thickness of gib head reduces from the neck of hook gradually to gib head free end.

Further, described neck of hook free end protrudes from described gib head free end along the radial inboard of described seal ring.

Further, the end face of described neck of hook free end is plane, round-corner transition between this plane and the upper and lower surface of the neck of hook, and the angle of neck of hook free end end face and Vertical direction is 5 °; Round-corner transition between described gib head circular arc outer surface and neck of hook lower surface, and the angle of the tangent line of gib head outer surface and knuckle intersection and Vertical direction is 5 °.

The utility model has the special-shaped seal ring of warp architecture by adopting section, ensure that can be fully compressed under pallet applies to be no more than 25kgf pressure, eliminates the helium layer thickness existed in prior art excessive, the problem of heat conduction efficiency deficiency.

Accompanying drawing explanation

Fig. 1 be existing PSS etching technics tray support on chuck time view;

Fig. 2 is the utility model seal ring section configuration schematic diagram;

Fig. 3 is pallet after adopting the utility model seal ring and chuck technique view.

Embodiment

Below in conjunction with preferred embodiment, the utility model is described.

Figure 2 shows that the section configuration schematic diagram of the utility model seal ring preferred embodiment.As shown in FIG., the section configuration of seal ring 2 is the crotch shape with the neck of hook and gib head, the lower surface of the neck of hook 22 is plane, the inboard oblique upper of gib head 21 from the neck of hook 22 outboard end along circular arc to the neck of hook 22 extends, the thickness of gib head 21 reduces from the neck of hook gradually to gib head free end, gib head 21 is connected with the neck of hook 22 round-corner transition, and gib head 21 free end end is circular arc.

The neck of hook 22 free end protrudes from gib head 21 free end along the radial direction inboard of seal ring.The end face of the neck of hook 22 free end is plane, round-corner transition between this plane and the upper and lower surface of the neck of hook 22, and the angle of the neck of hook 22 free end end face and Vertical direction is 5 °.Round-corner transition between gib head 21 circular arc outer surface and the neck of hook 22 lower surface, the tangent line of gib head 21 outer surface and knuckle intersection and the angle of Vertical direction are 5 °.

As shown in Figure 3, in etching technics, seal ring 2 is sleeved on the boss that chuck 3 arranges on the surface, and the lower surface of seal ring 2 is pressed on the surface of the chuck 3 outside boss.

During technique, pallet 1 is pressed on seal ring 2, and the helium passages that helium is arranged on chuck 3 enters in the seal space of seal ring 2 inboard, forms heat transfer helium layer 5.

Because helium gas inside pressure is 8Torr, outside is vacuum environment, and be thus aduncate crotch shape by the Section Design of seal ring, seal ring 2 is externally expanded under interior pressure effect, contributes to forming excellent sealing face with pallet 1 lower surface.By the Section Design embayment hook-type of seal ring 2, facilitate seal ring 2 compressive deformation, ensure that seal ring 2 is when pallet 1 applied pressure is less, as 25kgf, can be fully compressed, thus make the gap between chuck 3 and pallet 1 enough little, ensure the hot transmission efficiency of helium layer 5.

In a word, the thin portion structure of hooked section global shape and the neck of hook 22, gib head 21 and shape ensure that the realization of seal ring 2 function.

The purpose of this utility model designs both to ensure effective sealing, the seal ring that can be fully compressed under pallet 1 is oppressed again, for reaching this object, the utility model is provided with the warp architecture being convenient to compressive strain on the section of seal ring, and the crotch shape section configuration in above preferred embodiment is a kind of concrete form of this warp architecture, in addition, the section configuration of seal ring can also be opening towards the C shape in the radial inboard or outside of seal ring, also can be the setback shape of similar bellows, etc., and these shapes are all those of ordinary skill in the art can make based on the basic skills of related domain, therefore do not repeat them here.

In addition, be understandable that, the illustrative embodiments that above mode of execution is only used to principle of the present utility model is described and adopts, but the utility model is not limited thereto.For those skilled in the art, when not departing from principle of the present utility model and essence, can make various modification and improvement, these modification and improvement are also considered as protection domain of the present utility model.

Claims

1. a seal ring, sealing circle is installed on the chuck surface of etching apparatus, in order to form seal space between chuck and pallet, it is characterized in that, the section of described seal ring has the warp architecture being convenient to be compressed by described pallet, to make the gap between described chuck and described pallet enough little.

2. seal ring as claimed in claim 1, it is characterized in that, the surface of described chuck is provided with boss, described ring set is on this boss, and the lower surface of seal ring is pressed on the chuck surface outside boss.

3. seal ring as claimed in claim 1, is characterized in that, the section of described seal ring has opening towards the radial inboard warp architecture of seal ring.

4. seal ring as claimed in claim 3, it is characterized in that, the section configuration of described seal ring is roughly C shape, and the lower surface of this C shape section is plane.

5. seal ring as claimed in claim 3, it is characterized in that, the section configuration of described seal ring is the crotch shape with the neck of hook and gib head, wherein, the lower surface of the neck of hook is plane, and the inboard oblique upper of gib head from neck of hook outboard end to the neck of hook extends, and, gib head is connected with neck of hook round-corner transition, and gib head free end end is circular arc.

6. seal ring as claimed in claim 5, is characterized in that, the inboard oblique upper of described gib head along circular arc to the described neck of hook extends, and the thickness of gib head reduces from the neck of hook gradually to gib head free end.

7. seal ring as claimed in claim 5, is characterized in that, described neck of hook free end protrudes from described gib head free end along the radial inboard of described seal ring.

8. seal ring as claimed in claim 7, it is characterized in that, the end face of described neck of hook free end is plane, round-corner transition between this plane and the upper and lower surface of the neck of hook, and the angle of neck of hook free end end face and Vertical direction is 5 °; Round-corner transition between described gib head circular arc outer surface and neck of hook lower surface, and the angle of the tangent line of gib head outer surface and knuckle intersection and Vertical direction is 5 °.