CN204668276U - Bushing unit for plasma reaction apparatus - Google Patents
Bushing unit for plasma reaction apparatus Download PDFInfo
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- CN204668276U CN204668276U CN201520264626.3U CN201520264626U CN204668276U CN 204668276 U CN204668276 U CN 204668276U CN 201520264626 U CN201520264626 U CN 201520264626U CN 204668276 U CN204668276 U CN 204668276U
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
Abstract
A bushing unit for a plasma reactor having a first chamber and a second chamber, the bushing unit comprising: the first connecting part is used for being connected with the first cavity, and the second connecting part is used for being butted with the butting part of the second cavity. The first connecting part is complementary with the inner side wall of the first cavity in structure, and the transverse side lengths of the first connecting part and the second connecting part are different.
Description
Technical field
The utility model relates to a kind of lining unit for plasma reaction device, particularly relates to a kind of replaceable lining unit.
Background technology
Now, plasma reaction technology has been widely used in the various industries such as such as semiconductor fabrication process, display floater manufacturing process, solar cell fabrication process.Generally speaking; plasma reaction device is made up of multiple cavity (material comprises aluminium alloy or stainless steel); and be coated with diaphragm or coating alumina layer or ceramic layer at the inwall of cavity, to reach the effect of insulation and plasma resistant erosion.
Plasma reaction cavity is used in various electronic device fabrication processes usually, such as etch process, chemical vapour deposition (CVD) (CVD) technique and other technique relevant to manufacturing electronic component on substrate.Profit generates in many ways and/or controls the electric characteristic in plasma density, shape and reaction cavity, is such as generally used in the capacitive character in Conventional plasma cavity or inductive couplings RF source.Such as, during plasma enhanced chemical vapor deposition (PECVD) technique, reacting gas through capacitive couplings shower nozzle import reaction cavity, described nozzle layout of sprinkler by processing procedure accessory around semiconductor substrate above.Once plasma is formed at PECVD cavity, plasma and reacting gas and substrate react with the material layer of deposition of desired on substrate.Approximately, the isoionic feature formed in plasma generation region can improve the deposition performed by being arranged in the substrate in downstream, plasma generation region or a part for reaction chamber, etching and/or cleaning procedure.
In the design of general plasma reaction chamber, the plasma generated is arranged in above substrate surface, described design can cause non-required sputtering and the injury to substrate surface, and this is caused by the reciprocation of electronics owing to being formed in plasma and ion and substrate surface.The isoionic free electron ion generated and the parts of electrical grounding substantially can accumulation net charges.The net charge formed causes the exposed surface of electronics and/or Ions Bombardment substrate or the chamber part be formed in plasma, and may damage the exposed surface of substrate or chamber part.Therefore, in some applications, expect that formation has the gas radicals being enough to be easy to the energy reacted with substrate surface (or chamber part surface), effectively can not bombard substrate or chamber part surface, because non-ionic gas radicals not affected by the electric charge be formed on substrate or parts surface to strengthen reaction rate simultaneously.But find, when using the plasma reaction cavity of plater, serious process variation can occur.Described process variation may be caused through the surface interaction effect of the defect (such as coating porosity or crack) in coating with structural metal element by excited gas.Problem especially severe when plasma contains oxidation material or fluoridize material (this type of material is tending towards attacking most normally used metal material) of coating, especially the most easily occurs in unit junction.
In view of this, plasma reaction device must carry out regular maintenance, and is stripped thoroughly by the coating on the inwall of reaction cavity, such as, use the modes such as chemical etching, sandblasting, rubbing down or turnning and milling.But, when profit carries out strip in various manners, all likely cause the consume of reaction cavity, such as, cause the chamber wall thickness reduction of reaction cavity.On the other hand, the inwall of reaction cavity, under the shock suffering plasma ions for a long time, also likely can cause the damage of chamber, local wall.For these reasons, when plasma reaction device is after use certain hour, impaired cavity certainly will be needed to change.In addition, when the position that cavity damages occurs in the joint of cavity and cavity, Magnetic field shifts during the bad or plasma reaction of the air tightness between cavity will be caused, make it the generation reduction of usefulness of follow-up use plasma and the situation of uniformity deficiency produces.
Moreover please refer to Fig. 1, it illustrates a kind of traditional plasma reaction device 10.The wherein a part of of described plasma reaction device 10 is made up of the cavity of three-member type, the first cavity 11, second cavity 12 as shown in Figure 1 and the 3rd cavity 13.On market today, in order to the convenience of producing with assemble, described first cavity 11 of described plasma reaction device 10 is being usually designed to identical configuration with the joint face of described second cavity 12 and described 3rd cavity 13 respectively, such as two sides is all designed to male, with plug-in mounting to the inside of described second cavity 12 and described 3rd cavity 13, or two sides is all designed to female, to accommodate the some of described second cavity 12 and described 3rd cavity 13.
But according to plasma process principle, described plasma reaction device 10 operationally can produce the magnetic line of force of certain orientation, a two-sided wherein joint face with described first cavity 11 of identical configuration is easily made to cause damage.For these reasons, because the position that cavity damages occurs in the joint of cavity and cavity, so Magnetic field shifts when also can cause the bad or plasma reaction of the air tightness between cavity, make it follow-up use plasma and produce the reduction of usefulness and the situation of uniformity deficiency produces.Therefore, necessarily impaired cavity is changed after long-term use, cause production cost to improve.
Therefore be necessary to provide a kind of plasma reaction device, it can not be damaged because of the local interior wall of cavity, and cause the cavity that needs to change whole damaged part.On the other hand, described plasma reaction device can according to the magnetic line of force direction produced under actual production, the configuration of the cavity joint face that corresponding change is applicable to, and then the useful life of the cavity of increase plasma reaction device.
Utility model content
For solving the problem of above-mentioned prior art; the purpose of this utility model is to provide a kind of lining unit for plasma reaction device; it is arranged at the madial wall of the cavity of plasma reaction device; and described lining unit is replaceable; it can protect the madial wall of the cavity of plasma reaction device can not damage because of plasma bombardment on the one hand; or the consume of chamber wall is caused when carrying out striping; according to the demand of practical application, the joint face of cavity can be set to meet the magnetic line of force of plasma reaction and the configuration of gas field principle on the other hand.
In order to achieve the above object, the utility model provides a kind of lining unit for plasma reaction device, described plasma reaction device has one first cavity and one second cavity, described lining unit comprises: one first connecting portion, for being connected with described first cavity, and the complementary structure of a madial wall of described first connecting portion and described first cavity; And one second connecting portion, for docking with a docking part of described second cavity, wherein said first connecting portion and the horizontal size dimension both the second connecting portion different.
In one of them preferred embodiment of the utility model, the horizontal size dimension of described first connecting portion is less than the horizontal size dimension of described second connecting portion.
In one of them preferred embodiment of the utility model, after described first connecting portion of described lining unit is combined with described first cavity, described second connecting portion of described lining unit stretches out one first port of described first cavity, and described second connecting portion is contained within described second cavity.
In one of them preferred embodiment of the utility model, the horizontal size dimension of described first connecting portion is greater than the horizontal size dimension of described second connecting portion.
In one of them preferred embodiment of the utility model, after described first connecting portion of described lining unit is combined with described first cavity, the described docking section of described second cavity protrudes into described lining unit, and is contained within described lining unit.
In one of them preferred embodiment of the utility model, described plasma reaction device comprises one the 3rd cavity, and described lining unit comprises one the 3rd connecting portion further, relative to described second connecting portion, described lining unit links up described second cavity and described 3rd connecting portion for being connected with a docking part of described 3rd cavity.
In one of them preferred embodiment of the utility model, the horizontal size dimension of described first connecting portion and described 3rd both connecting portions is different.
In one of them preferred embodiment of the utility model, at least one of them comprises loop configuration or other geometries for described first connecting portion and described second connecting portion.
In one of them preferred embodiment of the utility model, described lining unit comprises one first lining and one second lining further, wherein said first lining and described second lining comprise described first connecting portion for being connected with described first cavity and described second connecting portion for being connected with another cavity respectively, the horizontal size dimension of both described first connecting portion of described first lining and the second connecting portion is different, and described first connecting portion of described second lining and the horizontal size dimension both the second connecting portion different.
In one of them preferred embodiment of the utility model, described first lining and described second lining comprise the 3rd connecting portion of complementary structure respectively, and after described first lining and described second lining are combined with described first cavity respectively, described several 3rd connecting portions of described first lining and described second lining engage each other.
In one of them preferred embodiment of the utility model, described lining unit comprises multiple lining further, wherein said multiple lining comprises described first connecting portion for being connected with described first cavity and described second connecting portion for being connected with another cavity respectively, described first connecting portion of described multiple lining and the horizontal size dimension difference both the second connecting portion.
In one of them preferred embodiment of the utility model, after described second connecting portion of described lining unit docks with the described docking section of described second cavity, an accommodation space is formed, for an accommodating airtight element between described second connecting portion and described second cavity.
In one of them preferred embodiment of the utility model, described second connecting portion of described lining unit is formed as one stepped, comprise one first rank, a second-order and one the 3rd rank, after described second connecting portion of described lining unit docks with the described docking section of described second cavity, the described docking section of described second cavity is connected with one the 3rd contour bench tread on the one first contour bench tread on described first rank and described 3rd rank, and jointly forms the described accommodation space of accommodating described airtight element with described second-order.
The utility model also provides a kind of lining unit for plasma reaction device, described plasma reaction device has one first cavity and multiple second cavity, described lining unit comprises: one first connecting portion, for being connected with described first cavity, and the complementary structure of a madial wall of described first connecting portion and described first cavity; And multiple second connecting portion, for docking with a docking part of described multiple second cavity respectively, the horizontal size dimension of wherein said first connecting portion and both the second connecting portions described in each is different.
Accompanying drawing explanation
Fig. 1 illustrates a kind of traditional plasma reaction device.
Fig. 2 illustrates a kind of according to the lining unit of the first embodiment of the present utility model and the assembling explosive view of plasma reaction device.
Fig. 3 illustrates the local assembled view of Fig. 2.
Fig. 4 illustrates the lining unit of Fig. 2 and the section explosive view of plasma reaction device.
Fig. 5 illustrates a kind of according to the lining unit of the second embodiment of the present utility model and the section explosive view of plasma reaction device.
Fig. 6 illustrates a kind of according to the lining unit of the 3rd embodiment of the present utility model and the section assembled view of plasma reaction device.
Fig. 7 illustrates a kind of according to the lining unit of the 4th embodiment of the present utility model and the assembling explosive view of plasma reaction device.
Fig. 8 illustrates the lining unit of Fig. 7 and the section explosive view of plasma reaction device.
Fig. 9 illustrates a kind of according to the lining unit of the 5th embodiment of the present utility model and the section explosive view of plasma reaction device.
Figure 10 illustrates the section assembled view of Fig. 9.
Figure 11 illustrates a kind of according to the lining unit of the 6th embodiment of the present utility model and the section explosive view of plasma reaction device.
Figure 12 illustrates a kind of partial enlarged view of the lining unit according to the 7th embodiment of the present utility model.
Figure 13 illustrates a kind of partial enlarged view of the lining unit according to the 8th embodiment of the present utility model.
Embodiment
In order to above-mentioned and other object of the present utility model, feature, advantage can be become apparent, hereafter especially exemplified by the utility model preferred embodiment, and accompanying drawing will be coordinated, be described in detail below.
Please refer to Fig. 2, Fig. 3 and Fig. 4, illustrate a kind of lining unit 110 for plasma reaction device 100 according to the first embodiment of the present utility model, wherein Fig. 2 illustrates the assembling explosive view of described lining unit 110 and described plasma reaction device 100, Fig. 3 illustrates the described lining unit 110 of Fig. 2 and the local assembled view of described plasma reaction device 100, and Fig. 4 illustrates the described lining unit 110 of Fig. 2 and the section explosive view of plasma reaction device 100.Described plasma reaction device 100 has one first cavity 120 and one second cavity 130, and described lining unit 110 comprises one first connecting portion 112 and one second connecting portion 114.
As shown in Figures 2 to 4, described first connecting portion 112 of described lining unit 110 is connected with described first cavity 120, and a madial wall be connected 122 complementary structure each other of the lateral wall of described first connecting portion 112 and described first cavity 120.As shown in the first embodiment of the present utility model, the lateral wall of described first connecting portion 112 and the madial wall 122 of described first cavity 120 are all the structure of annular.Be understandable that, the lateral wall of the first connecting portion be combined with each other in other embodiments and the first cavity 120 madial wall can be the geometry of various complementary structure each other.
On the other hand, in order to make to closely cooperate between the lateral wall of described first connecting portion 112 of described lining unit 110 and the madial wall 122 of described first cavity 120, the screw thread such as forming complementary structure at the joint face of the lateral wall of described first connecting portion 112 and the described madial wall 122 of described first cavity 120 respectively can be utilized, make can lock closely between the two, or both junction coated ceramic heat-conducting silicone grease or in modes such as vacuum screws, but be not limited to this.In addition, anyly the lateral wall of described first connecting portion 112 of described lining unit 110 and the described madial wall 122 of described first cavity 120 can be made to reach close-fitting method be also applicable in other embodiments of the present utility model.
As shown in Figures 2 to 4, when described first connecting portion 112 of described lining unit 110 is installed into described first cavity 120 by one first port 124 of described first cavity 120, and after combining with described first cavity 120, stretch out making described second connecting portion 114 of described lining unit 110 outside described first port 124 of described first cavity 120.Then, then by described lining unit 110 assemble with described second cavity 130.As shown in the figure, described second connecting portion 114 of described lining unit 110 is for docking with a docking part 132 of described second cavity 130.
As shown in Figures 2 to 4, the horizontal size dimension C1 of described first connecting portion 112 of described lining unit 110 is different from the horizontal size dimension C2 of described second connecting portion 114.More particularly, as as shown in the utility model first embodiment, the horizontal size dimension C1 of described first connecting portion 112 is less than the horizontal size dimension C2 of described second connecting portion 114, but also the horizontal size dimension C1 of the first connecting portion 112 can be designed to the horizontal size dimension C2 being greater than the second connecting portion 114 in other embodiments.
Moreover, before described second connecting portion 114 of described lining unit 110 and described second cavity 130 combine, around the lateral wall of described second connecting portion 114, preferably first place O type ring and/or ceramic ring and/or be coated with vacuum grease, after described first cavity 120 and described second cavity 130 are combined, there is preferred air tightness.In addition, any method can reaching preferred airtight effect is also applicable in other embodiments of the present utility model.
Please refer to Fig. 5, it illustrates a kind of according to the lining unit 210 of the second embodiment of the present utility model and the section explosive view of plasma reaction device 200.Described plasma reaction device 200 comprises one first cavity 130 ' and one second cavity 230, and described lining unit 210 comprises one first connecting portion 212 and one second connecting portion 132 '.
As shown in Figure 5, described first connecting portion 212 of described lining unit 210 is positioned at the lateral wall of described lining unit 210, and described second connecting portion 132 ' of described lining unit 210 is positioned at the madial wall of described lining unit 210, the horizontal size dimension C1 of described first connecting portion 212 of wherein said lining unit 210 is different from the horizontal size dimension C2 of described second connecting portion 132 '.More particularly, the horizontal size dimension C1 of described first connecting portion 212 is greater than the horizontal size dimension C2 of described second connecting portion 132 '.
As shown in Figure 5, described first connecting portion 212 of described lining unit 210 is structurally complimentary to one another with the madial wall of described first cavity 130 ', and both can be combined with each other.Because described second connecting portion 132 ' of described lining unit 210 is positioned at the madial wall of described lining unit 210, so after described first connecting portion 212 of described lining unit 210 combines with described first cavity 130 ', a docking part 232 of described second cavity 230 protrudes into described lining unit 210, and be contained within described lining unit 210, wherein said docking section 232 belongs to a part for described second cavity 230 lateral wall.Moreover as shown in the figure, described second cavity 230 can utilize single cavity and one second lining unit 210 ' mutually assemble and are formed.
On the other hand, single lining unit of the present utility model also can combine with the cavity of multiple plasma reaction device.For example, in a preferred embodiment, plasma reaction device can comprise one first cavity and multiple second cavity, and lining unit can comprise one first connecting portion and multiple second connecting portion, wherein said first connecting portion is used for being connected with described first cavity, and the complementary structure of a madial wall of described first connecting portion and described first cavity.In addition, described multiple second connecting portion is used for docking with a docking part of described multiple second cavity respectively.In order to more clearly demonstrate the technical scheme of above-described embodiment, please refer to the specific descriptions of following 3rd embodiment.
Please refer to Fig. 6, its illustrate a kind of lining unit 310 according to the 3rd embodiment of the present utility model combine with plasma reaction device 300 after part sectioned view.Described plasma reaction device 300 comprises one first cavity 320,1 second cavity 330 and one the 3rd cavity 340, and described lining unit 310 comprises one first connecting portion 312, second connecting portion 314 and the 3rd connecting portion 316.It should be noted that described second cavity 330 in the present embodiment and described 3rd cavity 340 are equivalent to above-mentioned multiple second cavitys, and described second connecting portion 314 in the present embodiment and the 3rd connecting portion 316 are equivalent to above-mentioned multiple second connecting portions.And, although described second cavity 330 shown in figure 6 and described 3rd cavity 340 have identical configuration and size, but, in other preferred embodiments, also can comprise multiple second cavitys with different configuration and size, and multiple second connecting portion is also set to have different configuration and size accordingly.
As shown in Figure 6, described second connecting portion 314 and the 3rd connecting portion 316 of described lining unit 310 lay respectively at the relative both sides of described first connecting portion 312, and described first connecting portion 312, described second connecting portion 314 and the 3rd connecting portion 316 are all formed at the lateral wall of described lining unit 310, described first connecting portion 312 is for combining with a madial wall 322 of described first cavity 320.And, described lining unit 310 is by combining described second connecting portion 314 a docking part 332 with described second cavity 330, described lining unit 310 is linked up described second cavity 330, and utilizes described 3rd connecting portion 316 to combine with a docking part 342 of described 3rd cavity 340 further.Described docking section 332 belongs to a part for described 3rd cavity 340 madial wall.
As shown in Figure 6, two opposite end lateral walls of described lining unit 310 are designed to the configuration of male equally.Namely, after being combined with the described madial wall 322 of described first cavity 320 by described first connecting portion 312 lateral wall of described lining unit 310, described second connecting portion 314 of described lining unit 310 and described 3rd connecting portion 316 is made to stretch out the relative two-port of described first cavity 320 respectively.It should be noted that, in another embodiment, can according to plasma process principle, according to the magnetic line of force direction that described plasma reaction device 300 is operationally produced, one of them of described second connecting portion 314 of the described lining unit 310 similar in appearance to the present embodiment and described 3rd connecting portion 316 is designed to the configuration of female.Afterwards, then the cavity docked with it is installed one second lining unit, one distal process stretches out the port (the second cavity 230 of the second embodiment as shown in Figure 5) of described cavity.That is, one of them connecting portion of described lining unit is arranged on the inner side wall portion of described lining unit, for accommodating the docking section of docking cavity.
As shown in Figure 6, the horizontal size dimension C1 of described first connecting portion 310 of described lining unit 310 is different from the horizontal size dimension C2 of described second connecting portion 314 and the 3rd connecting portion 316.More particularly, the horizontal size dimension C1 of described first connecting portion 310 is greater than the horizontal size dimension C2 of described second connecting portion 314 and the 3rd connecting portion 316.Should be noted that, the second cavity shown in the utility model the 3rd embodiment and the quantity of the 3rd cavity only exemplarily, further, should coordinate kind and the pattern of plasma reaction device, the cavity number that lining unit connects can be multiple, and is not intended to limit the utility model.
Please refer to Fig. 7 and Fig. 8, Fig. 7 illustrates a kind of according to the lining unit 410 of the 4th embodiment of the present utility model and the assembling explosive view of plasma reaction device 400, and Fig. 8 illustrates the section explosive view of the plasma reaction device 400 of Fig. 7.Described plasma reaction device 400 comprises one first cavity 420 with a madial wall 422, and described lining unit 410 comprises one first connecting portion 412 and one second connecting portion 414, wherein said one first connecting portion 412 for combine with described first cavity 420 and described second connecting portion 414 for combining with one second cavity (not show).
As shown in Figure 7 and Figure 8, the described madial wall 422 for described first cavity 420 combined with described first connecting portion 412 of described lining unit 410 presents long dish configuration, is different from the ring type structure in previous embodiment.Further, the size of the maximum horizontal length of side C1 of described first connecting portion 412 is greater than the size of the horizontal length of side C2 of described second connecting portion 414 of described lining unit 410.
Please refer to Fig. 9 and Figure 10, Fig. 9 illustrates a kind of according to the lining unit 510 of the 5th embodiment of the present utility model and the section explosive view of plasma reaction device 500, and Figure 10 illustrates the section assembled view of Fig. 9.Described plasma reaction device 500 comprises one first cavity 520 with a madial wall 522, and described lining unit 510 comprises one first lining 501 and one second lining 505, be divided into two opposite ends of described first cavity 520, wherein said first lining 501 and described second lining 505 comprise one first connecting portion 512 for being connected with described first cavity 520 and 512 ' and described second connecting portion 514 and 514 ' for being connected with another cavity (not show) respectively.
As shown in Figure 9 and Figure 10, described first lining 501 of described lining unit 510 and described second lining 505 are all irregular geometric configuration.Described first lining 501 and described second lining 505 comprise the 3rd connecting portion 516 and 516 ' of complementary structure respectively, and after described first lining 501 and described second lining 505 combine between the higher and lower levels with described first cavity 520 respectively, make described several 3rd connecting portions 516 and 516 ' of described first lining 501 and described second lining 505 engage each other further.It should be noted that described several 3rd connecting portion 516 and 516 ' comprises the configuration of various complementary structure, such as barb-like, inclination or like this.
As shown in Figure 9 and Figure 10, the maximum transversal size dimension of described first connecting portion 512 of described first lining 501 is defined as C1, the horizontal length of side dimension definitions of described second connecting portion 514 of described first lining 501 is C2, and the horizontal length of side dimension definitions of described 3rd connecting portion 516 of described first lining 501 is C3, wherein the size of C1, C2 and C3 is neither same.In like manner, the horizontal size dimension C1 ' of described first connecting portion 512 ' of described second lining 505 is different with the horizontal size dimension C3 ' of described 3rd connecting portion 516 ' from the horizontal size dimension C2 ' of described second connecting portion 514 ' respectively.
Please refer to Figure 11, illustrate a kind of according to the lining unit 610 of the 6th embodiment of the present utility model and the section explosive view of plasma reaction device 600.Described plasma reaction device 600 comprises one first cavity 620 with a madial wall 622, and described lining unit 610 comprises one first lining 602,1 second lining 604 and one the 3rd lining 606, one end of described first cavity 620 is located at by wherein said first lining 602 and the second lining 604, and the relative other end of described first cavity 620 is located at by described 3rd lining 606.Described first lining 602, described second lining 604 and described 3rd lining 606 comprise the first connecting portion 6022,6042,6062 for being connected with described first cavity 620 and the second connecting portion 6024,6044,6064 for being connected with another cavity (not show) respectively.
As shown in figure 11, the maximum transversal size dimension of described first connecting portion 6022 of described first lining 602 is defined as C1, the horizontal length of side dimension definitions of described second connecting portion 6024 is C2, and the horizontal length of side dimension definitions of described 3rd connecting portion 6026 is C3, wherein the size of C1 is different with the size of C2 and C3.In like manner, the horizontal size dimension C1 ' of described first connecting portion 6042 of described second lining 604 is different with the horizontal size dimension C3 ' of described 3rd connecting portion 6046 from the horizontal size dimension C2 ' of described second connecting portion 6044 respectively; And the horizontal size dimension C1 of described first connecting portion 6062 of described second lining 606 " respectively from the horizontal size dimension C2 of described second connecting portion 6064 " and the horizontal size dimension C3 of described 3rd connecting portion 6066 " different.
As shown in figure 11, described first lining 602, described second lining 604 and described 3rd lining 606 comprise the 3rd connecting portion 6026,6046,6066 of complementary structure respectively, and after described first lining 602, described second lining 604 and described 3rd lining 606 combine between the higher and lower levels with described first cavity 620 respectively, make described several 3rd connecting portions 6026,6046,6066 of described first lining 602, described second lining 604 and described 3rd lining 606 engage each other further.
Known by above-described embodiment, the utility model, except can utilizing the corresponding more than one cavity of the lining unit of single type, also can utilize corresponding single the cavity of the lining unit of multi-piece type.Such as according to the utility model the 5th embodiment, described lining unit 510 comprises the first lining 501 and the second lining 505, and described multiple lining is combined with same first cavity 520 respectively, or, as the lining unit 610 comprising three-member type of the 6th embodiment, but be not limited to this.
Please refer to Figure 12, it illustrates a kind of partial enlarged view of the lining unit 710 according to the 7th embodiment of the present utility model.In the present embodiment, the external form of the second connecting portion 714 of described lining unit 710 presents the stepped of two stepwises, comprises one first contour bench tread 7142 and one second contour bench tread 7144.After described second connecting portion 714 of described lining unit 710 docks with a docking part 732 of one second cavity 730, the described docking section 732 of described second cavity 730 is connected with the described first contour bench tread 7142 of part and described second contour bench tread 7144, and forms an airtight accommodation space between described second connecting portion 714 and described second cavity 730.Described accommodation space can be used for an accommodating airtight element 750, such as: gas-tight ring.
Please refer to Figure 13, it illustrates a kind of partial enlarged view of the lining unit 810 according to the 8th embodiment of the present utility model.The external form of described second connecting portion 814 of described lining unit 810 presents the stepped of three-stage type, comprises one first rank with one first contour bench tread 8142, a second-order with one second contour bench tread 8144 and has one the 3rd rank of one the 3rd contour bench tread 8146.After described second connecting portion 814 of described lining unit 810 docks with a docking part 832 of one second cavity 830, the described docking section 832 of described second cavity 830 is connected with the described first contour bench tread 8142 on described first rank of described lining unit 810 and the described 3rd contour bench tread 8146 on described 3rd rank, and the described docking section 832 of described second cavity 830 and described second-order form the accommodation space of an accommodating airtight element 850 jointly.Should be noted that, in the utility model, by being set to the airtight construction of pattern shown in above-mentioned Figure 12 or Figure 13, the utility model is made not need to arrange an additional ceramic ring, can guarantee, between the lining unit of the first cavity and the second cavity, there is good airtight effect, thus reduce manufacturing cost.In addition, gas leakage thermal deformation and distortion because of cavity also can being avoided to cause by above-mentioned setting and the problem of plasma etching.
Although the utility model discloses as above by preferred embodiment; so itself and be not used to limit the utility model; those of ordinary skill in the utility model art; not departing from spirit and scope of the present utility model; when being used for a variety of modifications and variations, the scope that therefore the utility model is claimed is when being as the criterion depending on Claims scope restriction person.
Claims (14)
1. for a lining unit for plasma reaction device, it is characterized in that, described plasma reaction device has one first cavity and one second cavity, and described lining unit comprises:
One first connecting portion, for being connected with described first cavity, and the complementary structure of a madial wall of described first connecting portion and described first cavity; And
One second connecting portion, for docking with a docking part of described second cavity, the horizontal size dimension of described first connecting portion and described both second connecting portions is different.
2. lining unit as claimed in claim 1, it is characterized in that, the horizontal size dimension of described first connecting portion is less than the horizontal size dimension of described second connecting portion.
3. lining unit as claimed in claim 1, it is characterized in that, after described first connecting portion of described lining unit is combined with described first cavity, described second connecting portion of described lining unit stretches out one first port of described first cavity, and described second connecting portion is contained within described second cavity.
4. lining unit as claimed in claim 1, it is characterized in that, the horizontal size dimension of described first connecting portion is greater than the horizontal size dimension of described second connecting portion.
5. lining unit as claimed in claim 1, is characterized in that, after described first connecting portion of described lining unit is combined with described first cavity, the described docking section of described second cavity protrudes into described lining unit, and is contained within described lining unit.
6. lining unit as claimed in claim 1, it is characterized in that, described plasma reaction device comprises one the 3rd cavity, and described lining unit comprises one the 3rd connecting portion further, relative to described second connecting portion, described lining unit links up described second cavity and described 3rd connecting portion for being connected with a docking part of described 3rd cavity.
7. lining unit as claimed in claim 6, is characterized in that, the horizontal size dimension of described first connecting portion and described 3rd both connecting portions is different.
8. lining unit as claimed in claim 1, it is characterized in that, at least one of them comprises loop configuration or other geometries for described first connecting portion and described second connecting portion.
9. lining unit as claimed in claim 1, it is characterized in that, described lining unit comprises one first lining and one second lining further, described first lining and described second lining comprise described first connecting portion for being connected with described first cavity and described second connecting portion for being connected with another cavity respectively, described first connecting portion of described first lining and the horizontal size dimension difference of described both second connecting portions, and the horizontal size dimension of described first connecting portion of described second lining and described both second connecting portions is different.
10. lining unit as claimed in claim 9, it is characterized in that, described first lining and described second lining comprise the 3rd connecting portion of complementary structure respectively, and after described first lining and described second lining are combined with described first cavity respectively, described several 3rd connecting portions of described first lining and described second lining engage each other.
11. lining unit as claimed in claim 1, it is characterized in that, described lining unit comprises multiple lining further, described multiple lining comprises described first connecting portion for being connected with described first cavity and described second connecting portion for being connected with another cavity respectively, described first connecting portion of described multiple lining and the horizontal size dimension difference both the second connecting portion.
12. lining unit as claimed in claim 1, it is characterized in that, after described second connecting portion of described lining unit docks with the described docking section of described second cavity, between described second connecting portion and described second cavity, form an accommodation space, for an accommodating airtight element.
13. lining unit as claimed in claim 12, it is characterized in that, described second connecting portion of described lining unit is formed as one stepped, comprise one first rank, a second-order and one the 3rd rank, after described second connecting portion of described lining unit docks with the described docking section of described second cavity, the described docking section of described second cavity is connected with one the 3rd contour bench tread on the one first contour bench tread on described first rank and described 3rd rank, and jointly forms the described accommodation space of accommodating described airtight element with described second-order.
14. 1 kinds, for the lining unit of plasma reaction device, is characterized in that, described plasma reaction device has one first cavity and multiple second cavity, and described lining unit comprises:
One first connecting portion, for being connected with described first cavity, and the complementary structure of a madial wall of described first connecting portion and described first cavity; And
Multiple second connecting portion, for docking with a docking part of described multiple second cavity respectively, the horizontal size dimension of described first connecting portion and both the second connecting portions described in each is different.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103213130 | 2014-07-24 | ||
| TW103213130 | 2014-07-24 | ||
| TW103223466 | 2014-12-31 | ||
| TW103223466U TWM503056U (en) | 2014-07-24 | 2014-12-31 | Bush unit using for plasma reaction device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204668276U true CN204668276U (en) | 2015-09-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520264626.3U Active CN204668276U (en) | 2014-07-24 | 2015-04-28 | Bushing unit for plasma reaction apparatus |
| CN201510442561.1A Active CN105304445B (en) | 2014-07-24 | 2015-07-24 | Bushing unit for plasma reaction apparatus |
| CN201710739775.4A Active CN107376800B (en) | 2014-07-24 | 2015-07-24 | Bushing unit for plasma reaction apparatus |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510442561.1A Active CN105304445B (en) | 2014-07-24 | 2015-07-24 | Bushing unit for plasma reaction apparatus |
| CN201710739775.4A Active CN107376800B (en) | 2014-07-24 | 2015-07-24 | Bushing unit for plasma reaction apparatus |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6638167B2 (en) |
| CN (3) | CN204668276U (en) |
| TW (1) | TWM503056U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105304445A (en) * | 2014-07-24 | 2016-02-03 | 科闳电子股份有限公司 | Bushing unit for plasma reaction apparatus |
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| US5597439A (en) * | 1994-10-26 | 1997-01-28 | Applied Materials, Inc. | Process gas inlet and distribution passages |
| JPH11135296A (en) * | 1997-07-14 | 1999-05-21 | Applied Materials Inc | Vacuum processing chamber having multi-mode access |
| US6772827B2 (en) * | 2000-01-20 | 2004-08-10 | Applied Materials, Inc. | Suspended gas distribution manifold for plasma chamber |
| JP2002118098A (en) * | 2000-10-10 | 2002-04-19 | Matsushita Electric Ind Co Ltd | Plasma-treating apparatus |
| US20030070620A1 (en) * | 2001-10-15 | 2003-04-17 | Cooperberg David J. | Tunable multi-zone gas injection system |
| KR100483886B1 (en) * | 2002-05-17 | 2005-04-20 | (주)엔피씨 | Plasma reaction apparatus |
| JP4418193B2 (en) * | 2003-08-22 | 2010-02-17 | 東京エレクトロン株式会社 | Particle removal apparatus, particle removal method, and plasma processing apparatus |
| JP4624856B2 (en) * | 2005-05-30 | 2011-02-02 | 東京エレクトロン株式会社 | Plasma processing equipment |
| KR101218114B1 (en) * | 2005-08-04 | 2013-01-18 | 주성엔지니어링(주) | Etching apparatus using the plasma |
| US7658802B2 (en) * | 2005-11-22 | 2010-02-09 | Applied Materials, Inc. | Apparatus and a method for cleaning a dielectric film |
| CN100595883C (en) * | 2007-12-18 | 2010-03-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing device and medium window thereof |
| CN102237246B (en) * | 2010-04-26 | 2013-06-05 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Exhaust plate and plasma processing equipment |
| US10984993B2 (en) * | 2010-09-27 | 2021-04-20 | Beijing Naura Microelectronics Equipment Co., Ltd. | Plasma processing apparatus |
| JP6171605B2 (en) * | 2013-06-18 | 2017-08-02 | 株式会社デンソー | Battery unit |
| TWM503056U (en) * | 2014-07-24 | 2015-06-11 | Wen-Hsin Chiang | Bush unit using for plasma reaction device |
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2014
- 2014-12-31 TW TW103223466U patent/TWM503056U/en unknown
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2015
- 2015-04-28 CN CN201520264626.3U patent/CN204668276U/en active Active
- 2015-07-24 CN CN201510442561.1A patent/CN105304445B/en active Active
- 2015-07-24 JP JP2015146634A patent/JP6638167B2/en active Active
- 2015-07-24 CN CN201710739775.4A patent/CN107376800B/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105304445A (en) * | 2014-07-24 | 2016-02-03 | 科闳电子股份有限公司 | Bushing unit for plasma reaction apparatus |
| CN105304445B (en) * | 2014-07-24 | 2017-08-25 | 科闳电子股份有限公司 | Bushing unit for plasma reaction apparatus |
| CN107376800A (en) * | 2014-07-24 | 2017-11-24 | 科闳电子股份有限公司 | Bushing unit for plasma reaction apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105304445B (en) | 2017-08-25 |
| CN107376800B (en) | 2019-11-05 |
| JP6638167B2 (en) | 2020-01-29 |
| TWM503056U (en) | 2015-06-11 |
| CN107376800A (en) | 2017-11-24 |
| CN105304445A (en) | 2016-02-03 |
| JP2016040768A (en) | 2016-03-24 |
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Effective date of registration: 20151208 Address after: Hsinchu County, Taiwan, China Hukou practice Road No. 10-1 Patentee after: TAIWAN SEMITEK CORP Address before: Taiwan, Tainan, China Yongkang District No. 328 Patentee before: Jiang Wenxing |