CN204400829U - A kind of novel etching machine - Google Patents
A kind of novel etching machine Download PDFInfo
- Publication number
- CN204400829U CN204400829U CN201520038539.6U CN201520038539U CN204400829U CN 204400829 U CN204400829 U CN 204400829U CN 201520038539 U CN201520038539 U CN 201520038539U CN 204400829 U CN204400829 U CN 204400829U
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- CN
- China
- Prior art keywords
- bubbling
- water
- etching
- plc
- etching bath
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- Expired - Fee Related
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- ing And Chemical Polishing (AREA)
Abstract
A kind of novel etching machine, it is characterized in that it comprise frame (1), etching bath (2), No. two bubbling primary launders (3), No. three bubbling rinse tanks (4), No. four bubbling fine purifiation grooves (5), well heater (6), water-cooled coil pipe (7), three bubblers (8, gantry-type mechanical arm (9), temperature sensor (10) and PLC (11).Advantage is: change original pair of etching bath design into single etching, make circulation more clear, can meet complicated etch process demand, and single loop etching runs more stable.
Description
Technical field
The utility model relates to glass thinning apparatus field, is specifically related to a kind of novel etching machine.
Background technology
At present, glasses for LCD substrate attenuation adopts the mode of chemical milling to realize usually, existing etching machine adopts the design of two etching bath, such design original intention wishes to be formed the object of Two-way Cycle etching, and because process requirements needs the situation repeating to etch to be allocated by mechanical manipulator with regard to bad in actual production process, can not process requirements be completed.
Utility model content
The purpose of this utility model is exactly at present, glasses for LCD substrate attenuation adopts the mode of chemical milling to realize usually, existing etching machine adopts the design of two etching bath, such design original intention wishes to be formed the object of Two-way Cycle etching, and because process requirements needs the situation repeating to etch to be allocated by mechanical manipulator with regard to bad in actual production process, the deficiency of process requirements can not be completed, and a kind of novel etching machine is provided.
The utility model comprises frame, an etching bath, No. two bubbling primary launders, No. three bubbling rinse tanks, No. four bubbling fine purifiation grooves, well heater, water-cooled coil pipe, three bubblers, gantry-type mechanical arm, temperature sensor and PLC, an etching bath, No. two bubbling primary launders, No. three bubbling rinse tanks and No. four bubbling fine purifiation grooves are arranged in order, and respectively by support installing in frame, and an etching bath is respectively equipped with acid inlet tube, water inlet pipe and water shoot, No. two bubbling primary launders, No. three bubbling rinse tanks and No. four bubbling fine purifiation grooves are respectively equipped with water inlet pipe and water shoot, and well heater and water-cooled coil pipe are arranged on an etching bath inside respectively, and three bubblers are arranged on No. two bubbling primary launders respectively, No. three bubbling rinse tanks and No. four bubbling fine purifiation trench bottoms, and the escape pipe of three bubblers is positioned at groove inside, gantry-type mechanical arm by support installing in frame, and the mechanical arm of gantry-type mechanical arm moves above four grooves by track, the probe of temperature sensor is positioned at an etching bath inside, and temperature sensor is connected with PLC communication by Analog input mModule, PLC is respectively by solenoid control acid inlet tube, water inlet pipe, the break-make of water shoot and water-cooled coil pipe, and the start and stop of PLC difference control heater and three bubblers and working hour.
The utility model advantage is: change original pair of etching bath design into single etching, make circulation more clear, can meet complicated etch process demand, and single loop etching runs more stable.
accompanying drawing explanation
Fig. 1 is the utility model structural representation.
Embodiment
As shown in Figure 1, the utility model comprises frame 1, an etching bath 2, No. two bubbling primary launders 3, No. three bubbling rinse tanks 4, No. four bubbling fine purifiation grooves 5, well heater 6, water-cooled coil pipe 7, three bubblers 8, gantry-type mechanical arm 9, temperature sensor 10 and PLC 11, etching bath 2, No. two bubbling primary launders 3, No. three bubbling rinse tanks 4 and No. four bubbling fine purifiation grooves 5 are arranged in order, and respectively by support installing in frame, and an etching bath 2 is respectively equipped with acid inlet tube, water inlet pipe and water shoot, No. two bubbling primary launders 3, No. three bubbling rinse tanks 4 and No. four bubbling fine purifiation grooves 5 are respectively equipped with water inlet pipe and water shoot, and it is inner that well heater 6 and water-cooled coil pipe 7 are arranged on an etching bath 2 respectively, and three bubblers 8 are arranged on No. two bubbling primary launders 3 respectively, bottom No. three bubbling rinse tanks 4 and No. four bubbling fine purifiation grooves 5, and the escape pipe of three bubblers 8 is positioned at groove inside, gantry-type mechanical arm 9 by support installing in frame 1, and the mechanical arm of gantry-type mechanical arm 9 moves above four grooves by track, the probe of temperature sensor 10 is positioned at etching bath 2 inside, and temperature sensor 10 is connected with PLC 11 communication by Analog input mModule, PLC 11 is respectively by solenoid control acid inlet tube, water inlet pipe, the break-make of water shoot and water-cooled coil pipe 7, and the start and stop of PLC 11 difference control heater 6 and three bubblers 8 and working hour.
Principle of work: add hydrofluoric acid solution in an etching bath 2, the temperature that PLC 11 controls hydrofluoric acid solution by well heater 6 and water-cooled coil pipe 7 meets processing requirement, after glass substrate has etched in an etching bath 2, PLC 11 controls gantry-type mechanical arm 9 and glass substrate is moved to previous cleaning in No. two bubbling primary launders 3, after previous cleaning completes, PLC 11 controls gantry-type mechanical arm 9 and is moved to by glass substrate in No. three bubbling rinse tanks 4 and carry out rinsing, PLC 11 controls gantry-type mechanical arm 9 toward equipped with glass substrate in an etching bath 2 simultaneously, after rinsing completes, PLC 11 controls gantry-type mechanical arm 9 and is moved to by glass substrate in No. four bubbling fine purifiation grooves 5 meticulous, namely the thinning etching operation of glass substrate is completed.
Claims (1)
1. a novel etching machine, it is characterized in that it comprises frame (1), an etching bath (2), No. two bubbling primary launders (3), No. three bubbling rinse tanks (4), No. four bubbling fine purifiation grooves (5), well heater (6), water-cooled coil pipe (7), three bubblers (8, gantry-type mechanical arm (9), temperature sensor (10) and PLC (11), an etching bath (2), No. two bubbling primary launders (3), No. three bubbling rinse tanks (4) and No. four bubbling fine purifiation grooves (5) are arranged in order, and respectively by support installing in frame, and an etching bath (2) is respectively equipped with acid inlet tube, water inlet pipe and water shoot, No. two bubbling primary launders (3), No. three bubbling rinse tanks (4) and No. four bubbling fine purifiation grooves (5) are respectively equipped with water inlet pipe and water shoot, it is inner that well heater (6) and water-cooled coil pipe (7) are arranged on an etching bath (2) respectively, three bubblers (8) are arranged on No. two bubbling primary launders (3) respectively, No. three bubbling rinse tanks (4) and No. four bubbling fine purifiation groove (5) bottoms, and the escape pipe of three bubblers (8) is positioned at groove inside, gantry-type mechanical arm (9) by support installing in frame (1), and the mechanical arm of gantry-type mechanical arm (9) moves above four grooves by track, the probe of temperature sensor (10) is positioned at etching bath (2) inside, and temperature sensor (10) is connected with PLC (11) communication by Analog input mModule, PLC (11) is respectively by solenoid control acid inlet tube, water inlet pipe, the break-make of water shoot and water-cooled coil pipe (7), and the start and stop of PLC (11) difference control heater (6) and three bubblers (8) and working hour.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520038539.6U CN204400829U (en) | 2015-01-21 | 2015-01-21 | A kind of novel etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520038539.6U CN204400829U (en) | 2015-01-21 | 2015-01-21 | A kind of novel etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204400829U true CN204400829U (en) | 2015-06-17 |
Family
ID=53424708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520038539.6U Expired - Fee Related CN204400829U (en) | 2015-01-21 | 2015-01-21 | A kind of novel etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204400829U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107699895A (en) * | 2017-08-28 | 2018-02-16 | 上海利正卫星应用技术有限公司 | A kind of etch process of magnesium alloy etched plate |
| CN109622506A (en) * | 2019-02-11 | 2019-04-16 | 内江恒博机械制造有限公司 | A kind of supersonic wave cleaning machine |
| CN111018360A (en) * | 2019-12-31 | 2020-04-17 | 重庆永信科技有限公司 | TFT-LCD liquid crystal plywood etching bubbling method |
-
2015
- 2015-01-21 CN CN201520038539.6U patent/CN204400829U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107699895A (en) * | 2017-08-28 | 2018-02-16 | 上海利正卫星应用技术有限公司 | A kind of etch process of magnesium alloy etched plate |
| CN107699895B (en) * | 2017-08-28 | 2019-10-29 | 上海利正卫星应用技术有限公司 | A kind of etch process of magnesium alloy etched plate |
| CN109622506A (en) * | 2019-02-11 | 2019-04-16 | 内江恒博机械制造有限公司 | A kind of supersonic wave cleaning machine |
| CN111018360A (en) * | 2019-12-31 | 2020-04-17 | 重庆永信科技有限公司 | TFT-LCD liquid crystal plywood etching bubbling method |
| CN111018360B (en) * | 2019-12-31 | 2022-07-08 | 重庆永信科技有限公司 | TFT-LCD liquid crystal plywood etching bubbling method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150617 Termination date: 20200121 |