CN204247610U - A kind of silicon material cleaning equipment - Google Patents
A kind of silicon material cleaning equipment Download PDFInfo
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- CN204247610U CN204247610U CN201420724403.6U CN201420724403U CN204247610U CN 204247610 U CN204247610 U CN 204247610U CN 201420724403 U CN201420724403 U CN 201420724403U CN 204247610 U CN204247610 U CN 204247610U
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- silicon material
- inlet pipe
- air inlet
- dividing plate
- rotating shaft
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Abstract
The utility model discloses a kind of silicon material cleaning equipment avoiding being formed on silicon material surface silicon dioxide layer when cleaning silicon material.This silicon material cleaning equipment comprises housing, dividing plate is provided with in described housing, described dividing plate and base plate be arranged in parallel, described dividing plate and side plate cover plate surround a closed cavity jointly, rotary barrel is provided with in described cavity, rotating shaft is connected with bottom described rotary barrel, described rotating shaft is through dividing plate, rotating shaft lower end is connected with the drive motors driving rotating shaft to rotate, described dividing plate is provided with osculum, described cover plate is connected with air inlet pipe and water inlet pipe, described air inlet pipe is provided with gas-heating apparatus, the sidewall of described rotary barrel is provided with multiple leaking hole.Utilize this silicon material cleaning equipment silicon material surface to form silicon dioxide layer, and then when needing to melt silicon material in subsequent technique, can silicon dioxide layer silicon material do not had on surface easily to melt, reduce energy consumption.Be adapted at area of solar cell to apply.
Description
Technical field
The utility model relates to area of solar cell, especially a kind of silicon material cleaning equipment.
Background technology
Solar cell principle is mainly matrix with Semiconducting Silicon Materials, utilizing diffusion technique to mix impurity in silicon crystal: when mixing the impurity such as boron, phosphorus, will there is a hole in silicon crystal, forms n-type semiconductor; Equally, after mixing phosphorus atoms, just have an electronics in silicon crystal, form p-type semiconductor, p-type semiconductor and n-type semiconductor are combined together to form pn and tie, when after sunlight silicon crystal, in pn knot, the hole of n-type semiconductor is moved toward p-type area, and the electronics in p-type area moves toward n-type area, thus forms the electric current from n-type area to p-type area, in pn knot, form electrical potential difference, which forms solar cell.
Silicon material needs to clean with pure water before processing, the impurity on removing silicon material surface, thermostatic drying chamber is utilized to toast silicon material after the cleaning of silicon material, then carry out sorting packing of weighing to the complete silicon material of baking to seal up for safekeeping, when producing polycrystal silicon ingot or silicon single crystal rod, carry out thawing processing by sealing up for safekeeping in packed silicon material input polycrystalline furnace or single crystal growing furnace.At present, cleaning for silicon material is all first utilize pure water to clean, then put into constant temperature baking box to toast, although this silicon material cleaning can remove the impurity on silicon material surface, but in the process of baking silicon material, silicon material surface is easy to be formed silicon dioxide layer by secondary oxidation, the silicon dioxide layer on silicon material surface is difficult to melt, in follow-up technique, the silicon material needing very high temperature surface could be had silicon dioxide layer for a long time melts, so just need to consume more electric energy, energy consumption is higher, causes production cost higher.
Utility model content
Technical problem to be solved in the utility model is to provide a kind of silicon material cleaning equipment avoiding being formed on silicon material surface silicon dioxide layer when cleaning silicon material.
The utility model solves the technical scheme that its technical problem adopts: this silicon material cleaning equipment comprises base plate, side plate, the housing of cover plate composition, dividing plate is provided with in described housing, described dividing plate and base plate be arranged in parallel, described dividing plate and side plate cover plate surround a closed cavity jointly, rotary barrel is provided with in described cavity, rotating shaft is connected with bottom described rotary barrel, described rotating shaft is through dividing plate, rotating shaft lower end is connected with the drive motors driving rotating shaft to rotate, described dividing plate is provided with osculum, described osculum is connected with drainpipe, described drainpipe is provided with drain stop valve, described cover plate is connected with air inlet pipe for passing into inert gas with for passing into the water inlet pipe of pure water, described air inlet pipe is provided with gas-heating apparatus, described air inlet pipe, water inlet pipe is each passed through cover plate and extends in cavity, described water inlet pipe is provided with into water stop valve, described air inlet pipe is provided with air inlet stop valve, the sidewall of described rotary barrel is provided with multiple leaking hole.
Be further, described gas-heating apparatus comprises columnar shape basal, columniform gas-heated cavity is provided with in described columnar shape basal, described columnar shape basal is provided with and the air inlet of gas-heated cavity connects and gas outlet, described air inlet is communicated with inert gas source by tracheae, described gas outlet is communicated with air inlet pipe, and the surface wrap of described columnar shape basal has heater strip, and described heater strip is connected on power supply.
Further, be provided with temp controlled meter between described heater strip and power supply, be provided with temp probe in described gas-heated cavity, described temp probe is connected with temp controlled meter.
Further, described inert gas source is nitrogen.
The beneficial effects of the utility model are: this silicon material cleaning equipment in use, only need put into rotary barrel by needing the silicon material of cleaning, then cover plate is covered, first the drain stop valve that drainpipe is arranged cuts out, then open and in rotary barrel, inject pure water into water stop valve, after injecting a certain amount of pure water, close water inlet stop valve, starting drive motors makes rotary barrel rotate, rotary barrel can drive silicon material to rotate in rotary course, silicon material fully contacts cleaning with pure water in rotary course, its cleaning performance is better, after cleaning, open drain stop valve, pure water in rotary barrel is discharged, then the drying stage is entered, when entering the drying stage, open air inlet stop valve, inert gas is passed in rotary barrel, and inert gas was first heated to uniform temperature by gas-heating apparatus before entering rotary barrel, cured effect can be improved, shorten baking time, the moisture on silicon material surface gets rid of on side plate inwall from leaking hole, and then flow out from drainpipe along side plate inwall to downstream to osculum, in the stage of whole drying, silicon material is all under the protection of inert gas, silicon material can not contact with oxygen, therefore, in drying process, silicon material surface can not form silicon dioxide layer, and then when needing to melt silicon material in subsequent technique, can silicon dioxide layer silicon material do not had on surface easily to melt, the a large amount of electric energy of waste is not needed to go to melt silicon dioxide layer, reduce energy consumption, and then also reduce production cost, achieve the object of energy-saving and emission-reduction.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model silicon material cleaning equipment;
Be labeled as in figure: housing 1, base plate 101, side plate 102, cover plate 103, dividing plate 2, cavity 3, rotary barrel 4, rotating shaft 5, drive motors 6, osculum 7, drainpipe 8, drain stop valve 9, air inlet pipe 10, water inlet pipe 11, gas-heating apparatus 12, columnar shape basal 121, gas-heated cavity 122, inert gas source 123, heater strip 124, power supply 125, temp controlled meter 126, temp probe 127, water inlet stop valve 13, air inlet stop valve 14, leaking hole 15.
Detailed description of the invention
Below in conjunction with Figure of description, the utility model is described further.
As shown in Figure 1, this silicon material cleaning equipment comprises base plate 101, side plate 102, the housing 1 that cover plate 103 forms, dividing plate 2 is provided with in described housing 1, described dividing plate 2 be arranged in parallel with base plate 101, described dividing plate 2 and side plate 102 cover plate 103 surround a closed cavity 3 jointly, rotary barrel 4 is provided with in described cavity 3, rotating shaft 5 is connected with bottom described rotary barrel 4, described rotating shaft 5 is through dividing plate 2, rotating shaft 5 lower end is connected with the drive motors 6 driving rotating shaft 5 to rotate, described dividing plate 2 is provided with osculum 7, described osculum 7 is connected with drainpipe 8, described drainpipe 8 is provided with drain stop valve 9, described cover plate 103 is connected with air inlet pipe 10 for passing into inert gas with for passing into the water inlet pipe 11 of pure water, described air inlet pipe 10 is provided with gas-heating apparatus 12, described air inlet pipe 10, water inlet pipe 11 is each passed through cover plate 103 and extends in cavity 3, described water inlet pipe 11 is provided with into water stop valve 13, described air inlet pipe 10 is provided with air inlet stop valve 14, the sidewall of described rotary barrel 4 is provided with multiple leaking hole 15.This silicon material cleaning equipment in use, only need put into rotary barrel 4 by needing the silicon material of cleaning, then cover plate 103 is covered, first the drain stop valve 9 that drainpipe 8 is arranged cuts out, then open and in rotary barrel 4, inject pure water into water stop valve 13, after injecting a certain amount of pure water, close water inlet stop valve 13, starting drive motors 6 makes rotary barrel 4 rotate, rotary barrel 4 can drive silicon material to rotate in rotary course, silicon material fully contacts cleaning with pure water in rotary course, its cleaning performance is better, after cleaning, open drain stop valve 9, pure water in rotary barrel 4 is discharged, then the drying stage is entered, when entering the drying stage, open air inlet stop valve 14, inert gas is passed in rotary barrel 4, and inert gas was first heated to uniform temperature by gas-heating apparatus 12 before entering rotary barrel 4, cured effect can be improved, shorten baking time, the moisture on silicon material surface gets rid of on side plate 102 inwall from leaking hole 15, and then flow out from drainpipe 8 along side plate 102 inwall to downstream to osculum 7, in the stage of whole drying, silicon material is all under the protection of inert gas, silicon material can not contact with oxygen, therefore, in drying process, silicon material surface can not form silicon dioxide layer, and then when needing to melt silicon material in subsequent technique, can silicon dioxide layer silicon material do not had on surface easily to melt, the a large amount of electric energy of waste is not needed to go to melt silicon dioxide layer, reduce energy consumption, and then also reduce production cost, achieve the object of energy-saving and emission-reduction.
Be further, described gas-heating apparatus 12 comprises columnar shape basal 121, columniform gas-heated cavity 122 is provided with in described columnar shape basal 121, described columnar shape basal 121 is provided with the air inlet be communicated with gas-heated cavity 122 and gas outlet, described air inlet is communicated with inert gas source 123 by tracheae, described gas outlet is communicated with air inlet pipe 10, and the surface wrap of described columnar shape basal 121 has heater strip 124, and described heater strip 124 is connected on power supply 125.Utilize heater strip 124 can Fast Heating, and gas-heated cavity 122 is cylindrical, thus, can ensure that compressed air has enough heat times, all compressed air can be made to be heated to same temperature, and heating effect be better.Be further, temp controlled meter 126 is provided with between described heater strip 124 and power supply 125, temp probe 127 is provided with in described gas-heated cavity 122, described temp probe 127 is connected with temp controlled meter 126, the temperature in gas-heated cavity 122 can be adjusted by temp controlled meter 126, the temperature of inert gas freely can be adjusted according to different situations, very easy to use.
Described inert gas source 123 can be argon gas, helium etc.; in order to reduce production cost; described inert gas source 123 is preferably nitrogen; because nitrogen is a kind of gas that in air, content is maximum; thus extract conveniently; cost is low, and nitrogen is not easy to react with silicon material simultaneously, can play the object of starvation protection silicon material.
Claims (4)
1. a silicon material cleaning equipment, it is characterized in that: comprise base plate (101), side plate (102), the housing (1) that cover plate (103) forms, dividing plate (2) is provided with in described housing (1), described dividing plate (2) and base plate (101) be arranged in parallel, described dividing plate (2) and side plate (102) cover plate (103) surround a closed cavity (3) jointly, rotary barrel (4) is provided with in described cavity (3), described rotary barrel (4) bottom is connected with rotating shaft (5), described rotating shaft (5) is through dividing plate (2), rotating shaft (5) lower end is connected with the drive motors (6) driving rotating shaft (5) to rotate, described dividing plate (2) is provided with osculum (7), described osculum (7) is connected with drainpipe (8), described drainpipe (8) is provided with drain stop valve (9), described cover plate (103) is connected with air inlet pipe (10) for passing into inert gas with for passing into the water inlet pipe (11) of pure water, described air inlet pipe (10) is provided with gas-heating apparatus (12), described air inlet pipe (10), water inlet pipe (11) is each passed through cover plate (103) and extends in cavity (3), described water inlet pipe (11) is provided with into water stop valve (13), described air inlet pipe (10) is provided with air inlet stop valve (14), the sidewall of described rotary barrel (4) is provided with multiple leaking hole (15).
2. silicon material cleaning equipment as claimed in claim 1, it is characterized in that: described gas-heating apparatus (12) comprises columnar shape basal (121), columniform gas-heated cavity (122) is provided with in described columnar shape basal (121), described columnar shape basal (121) is provided with the air inlet and gas outlet that are communicated with gas-heated cavity (122), described air inlet is communicated with inert gas source (123) by tracheae, described gas outlet is communicated with air inlet pipe (10), the surface wrap of described columnar shape basal (121) has heater strip (124), described heater strip (124) is connected on power supply (125).
3. silicon material cleaning equipment as claimed in claim 2, it is characterized in that: between described heater strip (124) and power supply (125), be provided with temp controlled meter (126), be provided with temp probe (127) in described gas-heated cavity (122), described temp probe (127) is connected with temp controlled meter (126).
4. silicon material cleaning equipment as claimed in claim 3, is characterized in that: described inert gas source (123) is nitrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420724403.6U CN204247610U (en) | 2014-11-26 | 2014-11-26 | A kind of silicon material cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420724403.6U CN204247610U (en) | 2014-11-26 | 2014-11-26 | A kind of silicon material cleaning equipment |
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| Publication Number | Publication Date |
|---|---|
| CN204247610U true CN204247610U (en) | 2015-04-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201420724403.6U Expired - Fee Related CN204247610U (en) | 2014-11-26 | 2014-11-26 | A kind of silicon material cleaning equipment |
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| Country | Link |
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| CN (1) | CN204247610U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104438201A (en) * | 2014-11-26 | 2015-03-25 | 乐山新天源太阳能科技有限公司 | Silicon material cleaning technology and equipment |
| CN109390435A (en) * | 2018-12-03 | 2019-02-26 | 乐山新天源太阳能科技有限公司 | Nitrogen and the unidirectional mixing arrangement of oxygen for the anti-PID equipment of solar battery |
| CN110201941A (en) * | 2019-07-15 | 2019-09-06 | 乐山新天源太阳能科技有限公司 | The ultrasonic rinsing device of secondary silicon material |
| CN114226334A (en) * | 2021-12-29 | 2022-03-25 | 有研半导体硅材料股份公司 | Polycrystalline silicon rod cleaning device and method |
-
2014
- 2014-11-26 CN CN201420724403.6U patent/CN204247610U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104438201A (en) * | 2014-11-26 | 2015-03-25 | 乐山新天源太阳能科技有限公司 | Silicon material cleaning technology and equipment |
| CN109390435A (en) * | 2018-12-03 | 2019-02-26 | 乐山新天源太阳能科技有限公司 | Nitrogen and the unidirectional mixing arrangement of oxygen for the anti-PID equipment of solar battery |
| CN109390435B (en) * | 2018-12-03 | 2024-01-26 | 乐山新天源太阳能科技有限公司 | Nitrogen and oxygen unidirectional mixing device for PID (potential induced degradation) resistant equipment of solar cell |
| CN110201941A (en) * | 2019-07-15 | 2019-09-06 | 乐山新天源太阳能科技有限公司 | The ultrasonic rinsing device of secondary silicon material |
| CN114226334A (en) * | 2021-12-29 | 2022-03-25 | 有研半导体硅材料股份公司 | Polycrystalline silicon rod cleaning device and method |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150408 Termination date: 20201126 |