CN109390435B - Nitrogen and oxygen unidirectional mixing device for PID (potential induced degradation) resistant equipment of solar cell - Google Patents
Nitrogen and oxygen unidirectional mixing device for PID (potential induced degradation) resistant equipment of solar cell Download PDFInfo
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- CN109390435B CN109390435B CN201811468761.4A CN201811468761A CN109390435B CN 109390435 B CN109390435 B CN 109390435B CN 201811468761 A CN201811468761 A CN 201811468761A CN 109390435 B CN109390435 B CN 109390435B
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- horizontal partition
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- mixing body
- nitrogen
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 98
- 239000001301 oxygen Substances 0.000 title claims abstract description 49
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 49
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 229910052757 nitrogen Inorganic materials 0.000 title claims abstract description 48
- 230000015556 catabolic process Effects 0.000 title description 2
- 238000006731 degradation reaction Methods 0.000 title description 2
- 239000007789 gas Substances 0.000 claims abstract description 68
- 238000007789 sealing Methods 0.000 claims abstract description 38
- 230000001105 regulatory effect Effects 0.000 claims abstract description 20
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract 3
- 238000005192 partition Methods 0.000 claims description 108
- 238000009423 ventilation Methods 0.000 claims description 14
- 210000004027 cell Anatomy 0.000 description 13
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000003850 cellular structure Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1868—Passivation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
The invention discloses a nitrogen and oxygen unidirectional mixing device for solar cell PID-resistant equipment, which can prevent gas from being blown through and can uniformly mix oxygen and nitrogen. A unidirectional mixing device for nitrogen and oxygen of PID-resistant equipment of a solar cell comprises a gas mixing body; the gas mixing body is provided with an inner cavity with two open ends; the two ends of the gas mixing body are respectively provided with a first sealing plate and a second sealing plate, and an oxygen inlet cavity and a nitrogen inlet cavity are arranged in the gas mixing body; an air outlet nozzle is arranged on the second sealing plate; the air outlet nozzle is connected with an air distribution cylinder; one end of the air distribution cylinder is communicated with the air outlet nozzle, and the other end of the air distribution cylinder is provided with a sealing plate; an air outlet pipe is arranged on the sealing plate; and a third one-way valve and a third flow regulating valve are arranged on the air outlet pipe. Adopt this in the unidirectional mixing arrangement of nitrogen gas and oxygen of the anti PID equipment of solar cell, can effectually avoid gaseous backward flow and cross gas, can accurate flow of adjusting various gases.
Description
Technical Field
The invention relates to a PID-resistant gas mixing device for a solar cell, in particular to a nitrogen and oxygen unidirectional mixing device for PID-resistant equipment of the solar cell.
Background
It is well known that: the solar panel needs to be subjected to PID resistance treatment, so that the PID phenomenon of the solar panel is avoided; the existing PID-resistant equipment for the solar cell panel needs to mix oxygen and nitrogen and then produce ozone through an ozone generator, and the mixed gas of the ozone, the oxygen and the nitrogen is covered on the surface of a silicon wafer to ensure that a high-purity compact silicon dioxide layer is formed on the surface of the silicon wafer, and the thickness is approximately 10-20nm, so that the potential induction effect caused by sodium ions generated by glass in a cell component is solved.
The flow of nitrogen and oxygen can not be adjusted in real time by the existing nitrogen and oxygen mixing device, and meanwhile, the cross gas of oxygen and nitrogen can not be prevented, and meanwhile, the backflow phenomenon is easy to occur.
Disclosure of Invention
The technical problem to be solved by the invention is to provide the nitrogen and oxygen unidirectional mixing device for the PID-resistant equipment of the solar cell, which can prevent gas from being mixed uniformly and can ensure that oxygen and nitrogen are mixed uniformly.
The technical scheme adopted for solving the technical problems is as follows: a unidirectional mixing device for nitrogen and oxygen of PID-resistant equipment of a solar cell comprises a gas mixing body; the gas mixing body is provided with an inner cavity with two open ends;
one end of the gas mixing body is provided with a first sealing plate, and the other end of the gas mixing body is provided with a second sealing plate; the upper part of the cavity of the gas mixing body is provided with a first horizontal partition plate, and the lower part of the cavity of the gas mixing body is provided with a second horizontal partition plate; an oxygen inlet cavity is formed between the first horizontal partition plate and the top of the gas mixing body cavity; a nitrogen inlet cavity is formed between the two horizontal partition plates and the bottom of the gas mixing body cavity;
the first sealing plate is provided with a nitrogen inlet pipe communicated with the nitrogen inlet cavity, and the nitrogen inlet pipe is provided with a first one-way valve and a first flow regulating valve;
an oxygen inlet pipe communicated with the oxygen inlet cavity is arranged on the upper surface of the gas mixing body; the oxygen inlet pipe is provided with a second one-way valve and a second flow regulating valve;
a first ventilation hole is formed in the first horizontal partition plate; the lower surface of the first horizontal partition plate is provided with first vertical partition plates which are uniformly distributed along the transverse direction; a second ventilation opening is formed in the second horizontal partition plate; the upper surface of the second horizontal partition plate is provided with second vertical partition plates which are uniformly distributed along the transverse direction;
the second vertical partition plates on the second horizontal partition plates are positioned right below the gaps between two adjacent first vertical partition plates on the first horizontal partition plates;
the second sealing plate is provided with an air outlet nozzle of which the face is communicated with a cavity between the first horizontal partition plate and the second horizontal partition plate; the air outlet nozzle is connected with an air distribution cylinder; one end of the air distribution cylinder is communicated with the air outlet nozzle, and the other end of the air distribution cylinder is provided with a sealing plate; an air distribution plate is arranged in the air distribution cylinder; the sealing plate is provided with an air outlet pipe communicated with the air distribution cylinder; and a third one-way valve and a third flow regulating valve are arranged on the air outlet pipe.
Further, a first slot matched with the first horizontal partition plate is formed in the upper portion of the side wall of the inner cavity of the gas mixing body, and a second slot matched with the second horizontal partition plate is formed in the lower portion of the side wall of the inner cavity of the gas mixing body; the first horizontal partition plate is installed in the first slot; the second horizontal partition plate is installed in the second slot.
Further, sealing gaskets are arranged between the first sealing plate and the gas mixing body and between the second sealing plate and the gas mixing body.
Further, at least two mutually parallel air distribution plates are arranged in the air distribution cylinder, and the air distribution plates are vertically arranged.
The beneficial effects of the invention are as follows: according to the nitrogen and oxygen unidirectional mixing device for the PID resistant equipment of the solar cell, as the first unidirectional valve and the first flow regulating valve are arranged on the nitrogen inlet pipe; the oxygen inlet pipe is provided with a second one-way valve and a second flow regulating valve; meanwhile, a third one-way valve and a third flow regulating valve are arranged on the air outlet pipe; thus, the backflow and series flow of the gas can be effectively avoided;
secondly, an oxygen inlet cavity is formed between the first horizontal partition plate and the top of the gas mixing body cavity; a nitrogen inlet cavity is formed between the two horizontal partition plates and the bottom of the gas mixing body cavity; a first ventilation hole is formed in the first horizontal partition plate; the lower surface of the first horizontal partition plate is provided with first vertical partition plates which are uniformly distributed along the transverse direction; a second ventilation opening is formed in the second horizontal partition plate; the upper surface of the second horizontal partition plate is provided with second vertical partition plates which are uniformly distributed along the transverse direction; the second vertical partition plates on the second horizontal partition plates are positioned right below the gaps between two adjacent first vertical partition plates on the first horizontal partition plates; so that the oxygen and the nitrogen can be fully and uniformly mixed between the first horizontal partition plate and the second horizontal partition plate; and the reverse flow of the gas can be avoided.
Drawings
FIG. 1 is an exploded schematic view of a nitrogen and oxygen unidirectional mixing device for a PID resistant apparatus for a solar cell according to an embodiment of the invention;
FIG. 2 is a perspective view of a nitrogen and oxygen unidirectional mixing device for a PID resistant apparatus for a solar cell according to an embodiment of the invention;
FIG. 3 is a front view of a nitrogen and oxygen unidirectional mixing device for a solar cell anti-PID apparatus according to an embodiment of the invention;
FIG. 4 is a top view of a nitrogen and oxygen unidirectional mixing device for a solar cell anti-PID apparatus according to an embodiment of the invention;
FIG. 5 is a cross-sectional view A-A of FIG. 4;
FIG. 6 is a B-B cross-sectional view of FIG. 3;
the figures indicate: the device comprises a 1-gas mixing body, a 2-first sealing plate, a 3-second sealing plate, a 4-nitrogen inlet pipe, a 5-first one-way valve, a 51-first flow regulating valve, a 6-oxygen inlet pipe, a 7-second one-way valve, a 71-second flow regulating valve, an 8-air distribution cylinder, a 9-sealing plate, a 10-air outlet pipe, an 11-third one-way valve and a 111-third flow regulating valve; 12-first horizontal partition plates, 13-first ventilation holes, 14-first vertical partition plates, 15-second horizontal partition plates, 16-second vertical partition plates, 17-second ventilation holes and 18-air distribution plates.
Detailed Description
The invention will be further described with reference to the drawings and examples.
As shown in fig. 1 to 6, the unidirectional mixing device for nitrogen and oxygen for the anti-PID device of a solar cell according to the present invention comprises a gas mixing body 1; the gas mixing body 1 is provided with an inner cavity with two open ends;
one end of the gas mixing body 1 is provided with a first sealing plate 2, and the other end is provided with a second sealing plate 3; the upper part of the cavity of the gas mixing body 1 is provided with a first horizontal partition plate 12, and the lower part is provided with a second horizontal partition plate 15; an oxygen inlet cavity is formed between the first horizontal partition plate 12 and the top of the cavity of the gas mixing body 1; a nitrogen inlet cavity is formed between the two horizontal partition plates 15 and the bottom of the cavity of the gas mixing body 1;
a nitrogen inlet pipe 4 communicated with a nitrogen inlet cavity is arranged on the first sealing plate 2, and a first one-way valve 5 and a first flow regulating valve 51 are arranged on the nitrogen inlet pipe 4;
an oxygen inlet pipe 6 communicated with an oxygen inlet cavity is arranged on the upper surface of the gas mixing body 1; the oxygen inlet pipe 6 is provided with a second one-way valve 7 and a second flow regulating valve 71;
a first ventilation hole 13 is formed in the first horizontal partition plate 12; the lower surface of the first horizontal partition plate 12 is provided with first vertical partition plates 14 which are uniformly distributed along the transverse direction; the second horizontal partition plate 15 is provided with a second ventilation opening 17; the upper surface of the second horizontal partition plate 15 is provided with second vertical partition plates 16 which are uniformly distributed along the transverse direction;
the second vertical partition plates 16 on the second horizontal partition plates 15 are positioned right below the gap between two adjacent first vertical partition plates 14 on the first horizontal partition plates 12;
the second sealing plate 3 is provided with an air outlet nozzle 31 which is communicated with the cavity between the first horizontal partition plate 12 and the second horizontal partition plate 15; the air outlet nozzle 31 is connected with an air distribution cylinder 18; one end of the air distribution cylinder 18 is communicated with the air outlet nozzle 31, and the other end of the air distribution cylinder is provided with a sealing plate 9; an air distribution plate 18 is arranged in the air distribution cylinder 18; the sealing plate 9 is provided with an air outlet pipe 10 communicated with an air distribution cylinder 18; the air outlet pipe 10 is provided with a third one-way valve 11 and a third flow rate regulating valve 111.
In the working process, firstly, a pure oxygen supply device is communicated with an oxygen inlet pipe 6, and a pure nitrogen supply device is communicated with a nitrogen inlet pipe 4; in operation, the first and second flow valves 51 and 71 are opened; then, the pure oxygen supply device supplies air into the oxygen inlet cavity; the pure nitrogen supply device supplies air into the nitrogen inlet cavity; oxygen flows from the upper oxygen inlet cavity to the cavity between the first horizontal partition plate 12 and the second horizontal partition plate 15 through the first air holes 13 on the first horizontal partition plate; the nitrogen flows from the lower nitrogen inlet cavity to the cavity between the first horizontal partition plate 12 and the second horizontal partition plate 15 through the second air holes 17 on the second horizontal partition plate 15;
as the first horizontal partition plate 12 is provided with the first ventilation holes 13; the lower surface of the first horizontal partition plate 12 is provided with first vertical partition plates 14 which are uniformly distributed along the transverse direction; the second horizontal partition plate 15 is provided with a second ventilation opening 17; the upper surface of the second horizontal partition plate 15 is provided with second vertical partition plates 16 which are uniformly distributed along the transverse direction; the second vertical partition plates 16 on the second horizontal partition plates 15 are positioned right below the gap between two adjacent first vertical partition plates 14 on the first horizontal partition plates 12; thus allowing the nitrogen and oxygen to be uniformly mixed in the cavity between the first horizontal partition 12 and the second horizontal partition 15.
Oxygen and nitrogen are mixed and then enter the gas cylinder 8 through the gas outlet nozzle 31 on the second sealing plate 3, gas uniformly flows through the gas distribution plate 18 in the gas cylinder 8, then the mixed gas is discharged through the gas outlet pipe 10 on the sealing plate 9, the flow is regulated through the third flow valve 11 on the outlet pipe 10, and the gas backflow is avoided through the third one-way valve 111.
In summary, according to the nitrogen and oxygen unidirectional mixing device for the PID resistant equipment of the solar cell, the first unidirectional valve and the first flow regulating valve are arranged on the nitrogen inlet pipe; the oxygen inlet pipe is provided with a second one-way valve and a second flow regulating valve; meanwhile, a third one-way valve and a third flow regulating valve are arranged on the air outlet pipe; thus, the backflow and series flow of the gas can be effectively avoided;
secondly, an oxygen inlet cavity is formed between the first horizontal partition plate and the top of the gas mixing body cavity; a nitrogen inlet cavity is formed between the two horizontal partition plates and the bottom of the gas mixing body cavity; a first ventilation hole is formed in the first horizontal partition plate; the lower surface of the first horizontal partition plate is provided with first vertical partition plates which are uniformly distributed along the transverse direction; a second ventilation opening is formed in the second horizontal partition plate; the upper surface of the second horizontal partition plate is provided with second vertical partition plates which are uniformly distributed along the transverse direction; the second vertical partition plates on the second horizontal partition plates are positioned right below the gaps between two adjacent first vertical partition plates on the first horizontal partition plates; so that the oxygen and the nitrogen can be fully and uniformly mixed between the first horizontal partition plate and the second horizontal partition plate; and the reverse flow of the gas can be avoided.
In order to facilitate installation and simplify the structure, further, a first slot matched with the first horizontal partition plate 12 is arranged at the upper part of the side wall of the inner cavity of the gas mixing body 1, and a second slot matched with the second horizontal partition plate 15 is arranged at the lower part of the side wall of the inner cavity of the gas mixing body 1; the first horizontal partition 12 is installed in the first slot; the second horizontal partition 15 is mounted in the second slot.
In order to make the sealing performance of the device better, further, sealing gaskets are arranged between the first sealing plate 2 and the gas mixing body 1 and between the second sealing plate 3 and the gas mixing body 1.
In order to make the gas flow uniformly, further, at least two mutually parallel gas distribution plates 18 are arranged in the gas distribution cylinder 8, and the gas distribution plates 18 are vertically arranged.
Claims (1)
1. A unidirectional mixing arrangement of nitrogen gas and oxygen for anti PID equipment of solar cell, its characterized in that: comprising a gas mixing body (1); the gas mixing body (1) is provided with an inner cavity with two open ends;
one end of the gas mixing body (1) is provided with a first sealing plate (2), and the other end of the gas mixing body is provided with a second sealing plate (3); the upper part of a cavity of the gas mixing body (1) is provided with a first horizontal partition plate (12), and the lower part of the cavity is provided with a second horizontal partition plate (15); an oxygen inlet cavity is formed between the first horizontal partition plate (12) and the top of the cavity of the gas mixing body (1); a nitrogen gas inlet cavity is formed between the two horizontal partition plates (15) and the bottom of the cavity of the gas mixing body (1);
a nitrogen inlet pipe (4) communicated with the nitrogen inlet cavity is arranged on the first sealing plate (2), and a first one-way valve (5) and a first flow regulating valve (51) are arranged on the nitrogen inlet pipe (4);
an oxygen inlet pipe (6) communicated with the oxygen inlet cavity is arranged on the upper surface of the gas mixing body (1); the oxygen inlet pipe (6) is provided with a second one-way valve (7) and a second flow regulating valve (71);
a first ventilation hole (13) is formed in the first horizontal partition plate (12); the lower surface of the first horizontal partition plate (12) is provided with first vertical partition plates (14) which are uniformly distributed along the transverse direction; a second ventilation opening (17) is formed in the second horizontal partition plate (15); the upper surface of the second horizontal partition plate (15) is provided with second vertical partition plates (16) which are uniformly distributed along the transverse direction;
a second vertical partition plate (16) on the second horizontal partition plate (15) is positioned right below a gap between two adjacent first vertical partition plates (14) on the first horizontal partition plate (12);
an air outlet nozzle (31) is arranged on the second sealing plate (3); the air outlet nozzle (31) is connected with an air distribution cylinder (8); one end of the air distribution cylinder (8) is communicated with the air outlet nozzle (31), and the other end of the air distribution cylinder is provided with a sealing plate (9); an air distribution plate (18) is arranged in the air distribution cylinder (8); the sealing plate (9) is provided with an air outlet pipe (10) communicated with the air distribution cylinder (8); a third one-way valve (11) and a third flow regulating valve (111) are arranged on the air outlet pipe (10);
the upper part of the side wall of the inner cavity of the gas mixing body (1) is provided with a first slot matched with the first horizontal partition plate (12), and the lower part of the side wall of the inner cavity of the gas mixing body (1) is provided with a second slot matched with the second horizontal partition plate (15); the first horizontal partition plate (12) is arranged in the first slot; the second horizontal partition plate (15) is arranged in the second slot;
sealing gaskets are arranged between the first sealing plate (2) and the gas mixing body (1) and between the second sealing plate (3) and the gas mixing body (1);
at least two mutually parallel air distribution plates (18) are arranged in the air distribution cylinder (8), and the air distribution plates (18) are vertically arranged.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811468761.4A CN109390435B (en) | 2018-12-03 | 2018-12-03 | Nitrogen and oxygen unidirectional mixing device for PID (potential induced degradation) resistant equipment of solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811468761.4A CN109390435B (en) | 2018-12-03 | 2018-12-03 | Nitrogen and oxygen unidirectional mixing device for PID (potential induced degradation) resistant equipment of solar cell |
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| Publication Number | Publication Date |
|---|---|
| CN109390435A CN109390435A (en) | 2019-02-26 |
| CN109390435B true CN109390435B (en) | 2024-01-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201811468761.4A Active CN109390435B (en) | 2018-12-03 | 2018-12-03 | Nitrogen and oxygen unidirectional mixing device for PID (potential induced degradation) resistant equipment of solar cell |
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| CN107086255A (en) * | 2017-06-09 | 2017-08-22 | 常州比太科技有限公司 | Solar cell filming equipment and solar cell chain type production equipment |
| CN208986007U (en) * | 2018-12-03 | 2019-06-14 | 乐山新天源太阳能科技有限公司 | Nitrogen and the unidirectional mixing arrangement of oxygen for the anti-PID equipment of solar battery |
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