CN205096179U - Silicon material cleaning device - Google Patents
Silicon material cleaning device Download PDFInfo
- Publication number
- CN205096179U CN205096179U CN201520937963.4U CN201520937963U CN205096179U CN 205096179 U CN205096179 U CN 205096179U CN 201520937963 U CN201520937963 U CN 201520937963U CN 205096179 U CN205096179 U CN 205096179U
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- inlet pipe
- pure water
- air inlet
- silicon material
- gas
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Abstract
The utility model discloses an enough reduce the silicon material cleaning device that the silicon material washd the cost. This silicon material cleaning device includes the casing, be provided with the baffle in the casing, baffle and bottom plate parallel arrangement, the baffle encloses into a confined cavity with the curb plate apron jointly, be provided with rotatory barrel in the cavity, rotatory barrel bottom is connected with the rotation axis, the rotation axis passes the baffle, and the rotation axis lower extreme is connected with drive axis of rotation's driving motor, be provided with the wash port on the baffle, be connected with intake pipe and inlet tube on the apron, be provided with gaseous heating device in the intake pipe, be provided with a plurality of holes that leak on the lateral wall of rotatory barrel, the end -to -end connection of drain pipe has a pure water recovery unit, through set up pure water recovery unit alright carry out recycle with the waste water to producing in the cleaning process, can reduce the use amount of pure water to reduction in production cost. Be fit for popularizing and applying at the solar cell production field.
Description
Technical field
The utility model relates to manufacture of solar cells field, especially a kind of silicon material cleaning equipment.
Background technology
Solar cell principle is mainly matrix with Semiconducting Silicon Materials, utilizes diffusion technique to mix impurity in silicon crystal: after mixing pentad (as phosphorus), will there is electronics in silicon crystal, forms n-type semiconductor; Equally, after mixing triad (as boron), just there will be hole in silicon crystal, form p-type semiconductor, p-type semiconductor and n-type semiconductor are combined together to form pn and tie, when after sunlight silicon crystal, in pn knot, the electronics of n-type semiconductor moves toward p-type area, and the hole in p-type area is moved toward n-type area, thus forms the electric current from n-type area to p-type area, in pn knot, form electrical potential difference, which forms solar cell.
Silicon material needs to clean with pure water before processing, the impurity on removing silicon material surface, thermostatic drying chamber is utilized to toast silicon material after the cleaning of silicon material, then carry out sorting packing of weighing to the complete silicon material of baking to seal up for safekeeping, when producing polycrystal silicon ingot or silicon single crystal rod, carry out thawing processing by sealing up for safekeeping in packed silicon material input polycrystalline furnace or single crystal growing furnace.At present, cleaning for silicon material is all utilize silicon material cleaning equipment to carry out, existing silicon material cleaning equipment comprises base plate, side plate, the housing of cover plate group layer, dividing plate is provided with in described housing, described dividing plate and base plate be arranged in parallel, described dividing plate and side plate cover plate surround a closed cavity jointly, rotary barrel is provided with in described cavity, rotating shaft is connected with bottom described rotary barrel, described rotating shaft is through dividing plate, rotating shaft lower end is connected with the drive motors driving rotating shaft to rotate, described dividing plate is provided with osculum, described osculum is connected with drainpipe, described drainpipe is provided with drain stop valve, described cover plate is connected with air inlet pipe for passing into inert gas with for passing into the water inlet pipe of pure water, described air inlet pipe is provided with gas-heating apparatus, described air inlet pipe, water inlet pipe is each passed through cover plate and extends in cavity, described water inlet pipe is provided with into water stop valve, described air inlet pipe is provided with air inlet stop valve, the sidewall of described rotary barrel is provided with multiple leaking hole, this silicon material cleaning equipment in use, only need put into rotary barrel by needing the silicon material of cleaning, then cover plate is covered, first the drain stop valve that drainpipe is arranged cuts out, then open and in rotary barrel, inject pure water into water stop valve, after injecting a certain amount of pure water, close water inlet stop valve, starting drive motors makes rotary barrel rotate, rotary barrel can drive silicon material to rotate in rotary course, silicon material fully contacts cleaning with pure water in rotary course, its cleaning performance is better, after cleaning, open drain stop valve, pure water in rotary barrel is discharged, then the drying stage is entered, when entering the drying stage, open air inlet stop valve, inert gas is passed in rotary barrel, and inert gas was first heated to uniform temperature by gas-heating apparatus before entering rotary barrel, cured effect can be improved, shorten baking time, the moisture on silicon material surface gets rid of on side plate inwall from leaking hole, and then flow out from drainpipe along side plate inwall to downstream to osculum, in use there is following problem in this equipment: existing silicon material cleaning equipment will use a large amount of pure water in cleaning process, a large amount of waste water can be produced after cleaned, these waste water due to the harmful substance contained less, mostly directly emit, and the complex manufacturing of pure water, cost is higher, directly discharge of wastewater is fallen to cause unnecessary waste, cause silicon material to clean cost greatly to increase.
Utility model content
Technical problem to be solved in the utility model is to provide a kind of silicon material cleaning equipment that can reduce silicon material cleaning cost.
The utility model solves the technical scheme that its technical problem adopts: this silicon material cleaning equipment comprises base plate, side plate, the housing of cover plate group layer, dividing plate is provided with in described housing, described dividing plate and base plate be arranged in parallel, described dividing plate and side plate cover plate surround a closed cavity jointly, rotary barrel is provided with in described cavity, rotating shaft is connected with bottom described rotary barrel, described rotating shaft is through dividing plate, rotating shaft lower end is connected with the drive motors driving rotating shaft to rotate, described dividing plate is provided with osculum, described osculum is connected with drainpipe, described drainpipe is provided with drain stop valve, described cover plate is connected with air inlet pipe for passing into inert gas with for passing into the water inlet pipe of pure water, described air inlet pipe is provided with gas-heating apparatus, described air inlet pipe, water inlet pipe is each passed through cover plate and extends in cavity, described water inlet pipe is provided with into water stop valve, described air inlet pipe is provided with air inlet stop valve, the sidewall of described rotary barrel is provided with multiple leaking hole, the end of described drainpipe is connected with pure water retracting device, described pure water retracting device comprises the first storage tank, first-stage reverse osmosis parts are connected with bottom first storage tank, the port of export of first-stage reverse osmosis parts is provided with one-level DI and the dirty mouth of one-level concentrated water drainage, the tail end of one-level DI is provided with the second storage tank, two-pass reverse osmosis parts are connected with bottom second storage tank, the port of export of two-pass reverse osmosis parts is provided with pure water drainage tube and the dirty mouth of secondary concentrated water drainage, described pure water drainage tube is connected with water inlet pipe.
Be further, described gas-heating apparatus comprises columnar shape basal, columniform gas-heated cavity is provided with in described columnar shape basal, described columnar shape basal is provided with and the air inlet of gas-heated cavity connects and gas outlet, described air inlet is communicated with inert gas source by tracheae, described gas outlet is communicated with air inlet pipe, and the surface wrap of described columnar shape basal has heater strip, and described heater strip is connected on power supply.
Further, be provided with temp controlled meter between described heater strip and power supply, be provided with thermocouple thermometer in described gas-heated cavity, described thermocouple thermometer is connected with temp controlled meter.
Further, described inert gas source is nitrogen.
The beneficial effects of the utility model are: this silicon material cleaning equipment is by arranging pure water retracting device at the end of drainpipe, be introduced into the first storage tank from the waste water of drainpipe discharge to collect, then waste water enters in first-stage reverse osmosis parts from the outlet bottom the first storage tank and tentatively filters, one-level pure water after filtration enters in the second storage tank by one-level DI, the primary wastewater produced in filter process is then emitted by the dirty mouth of one-level concentrated water drainage, the one-level pure water entering the second storage tank enters in two-pass reverse osmosis parts and carries out filtration treatment again bottom the second storage tank, the pure water obtained after secondary filter is flowed in water inlet pipe by pure water drainage tube and then is flowed in rotary barrel and reuses, so just, can the waste water produced in cleaning process be recycled, the use amount of pure water can be reduced, thus reduction production cost, the dense water of the secondary produced in secondary filter process then emits.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model silicon material cleaning equipment;
Be labeled as in figure: housing 1, base plate 101, side plate 102, cover plate 103, dividing plate 2, cavity 3, rotary barrel 4, rotating shaft 5, drive motors 6, osculum 7, drainpipe 8, drain stop valve 9, air inlet pipe 10, water inlet pipe 11, gas-heating apparatus 12, columnar shape basal 121, gas-heated cavity 122, inert gas source 123, heater strip 124, power supply 125, temp controlled meter 126, thermocouple thermometer 127, water inlet stop valve 13, air inlet stop valve 14, leaking hole 15, pure water retracting device 16, first storage tank 161, first-stage reverse osmosis parts 162, one-level DI 163, the dirty mouth 164 of one-level concentrated water drainage, second storage tank 165, two-pass reverse osmosis parts 166, pure water drainage tube 167, the dirty mouth 168 of secondary concentrated water drainage.
Detailed description of the invention
Below in conjunction with Figure of description, the utility model is described further.
As shown in Figure 1, this silicon material cleaning equipment comprises base plate 101, side plate 102, the housing 1 of cover plate 103 groups of layers, dividing plate 2 is provided with in described housing 1, described dividing plate 2 be arranged in parallel with base plate 101, described dividing plate 2 and side plate 102 cover plate 103 surround a closed cavity 3 jointly, rotary barrel 4 is provided with in described cavity 3, rotating shaft 5 is connected with bottom described rotary barrel 4, described rotating shaft 5 is through dividing plate 2, rotating shaft 5 lower end is connected with the drive motors 6 driving rotating shaft 5 to rotate, described dividing plate 2 is provided with osculum 7, described osculum 7 is connected with drainpipe 8, described drainpipe 8 is provided with drain stop valve 9, described cover plate 103 is connected with air inlet pipe 10 for passing into inert gas with for passing into the water inlet pipe 11 of pure water, described air inlet pipe 10 is provided with gas-heating apparatus 12, described air inlet pipe 10, water inlet pipe 11 is each passed through cover plate 103 and extends in cavity 3, described water inlet pipe 11 is provided with into water stop valve 13, described air inlet pipe 10 is provided with air inlet stop valve 14, the sidewall of described rotary barrel 4 is provided with multiple leaking hole 15, the end of described drainpipe 8 is connected with pure water retracting device 16, described pure water retracting device comprises the first storage tank 161, first-stage reverse osmosis parts 162 are connected with bottom first storage tank 161, the port of export that first-stage reverse osmosis portion is 162 is provided with one-level DI 163 and the dirty mouth 164 of one-level concentrated water drainage, the tail end of one-level DI 163 is provided with the second storage tank 165, two-pass reverse osmosis parts 166 are connected with bottom second storage tank 165, the port of export of two-pass reverse osmosis parts 166 is provided with pure water drainage tube 167 and the dirty mouth 168 of secondary concentrated water drainage, described pure water drainage tube 167 is connected with water inlet pipe 11.This silicon material cleaning equipment in use, only need put into rotary barrel 4 by needing the silicon material of cleaning, then cover plate 103 is covered, first the drain stop valve 9 that drainpipe 8 is arranged cuts out, then open and in rotary barrel 4, inject pure water into water stop valve 13, after injecting a certain amount of pure water, close water inlet stop valve 13, starting drive motors 6 makes rotary barrel 4 rotate, rotary barrel 4 can drive silicon material to rotate in rotary course, silicon material fully contacts cleaning with pure water in rotary course, its cleaning performance is better, after cleaning, open drain stop valve 9, pure water in rotary barrel 4 is discharged, then the drying stage is entered, when entering the drying stage, open air inlet stop valve 14, inert gas is passed in rotary barrel 4, and inert gas was first heated to uniform temperature by gas-heating apparatus 12 before entering rotary barrel 4, cured effect can be improved, shorten baking time, the moisture on silicon material surface gets rid of on side plate 102 inwall from leaking hole 15, and then flow out from drainpipe 8 along side plate 102 inwall to downstream to osculum 7, owing to arranging pure water retracting device 16 at the end of drainpipe 8, be introduced into the first storage tank 161 from the waste water of drainpipe 8 discharge to collect, then waste water enters in first-stage reverse osmosis parts 162 from the outlet bottom the first storage tank 161 and tentatively filters, one-level pure water after filtration enters in the second storage tank 165 by one-level DI 163, the primary wastewater produced in filter process is then emitted by the dirty mouth 164 of one-level concentrated water drainage, the one-level pure water entering the second storage tank 165 enters in two-pass reverse osmosis parts 166 and carries out filtration treatment again bottom the second storage tank 165, the pure water obtained after secondary filter is flowed in water inlet pipe 11 by pure water drainage tube 167 and then is flowed in rotary barrel 4 and reuses, so just, can the waste water produced in cleaning process be recycled, the use amount of pure water can be reduced, thus reduction production cost, the dense water of the secondary produced in secondary filter process then emits.
Be further, described gas-heating apparatus 12 comprises columnar shape basal 121, columniform gas-heated cavity 122 is provided with in described columnar shape basal 121, described columnar shape basal 121 is provided with the air inlet be communicated with gas-heated cavity 122 and gas outlet, described air inlet is communicated with inert gas source 123 by tracheae, described gas outlet is communicated with air inlet pipe 10, and the surface wrap of described columnar shape basal 121 has heater strip 124, and described heater strip 124 is connected on power supply 125.Utilize heater strip 124 can Fast Heating, and gas-heated cavity 122 is cylindrical, thus, can ensure that compressed air has enough heat times, all compressed air can be made to be heated to same temperature, and heating effect be better.Be further, temp controlled meter 126 is provided with between described heater strip 124 and power supply 125, temp probe 127 is provided with in described gas-heated cavity 122, described temp probe 127 is connected with temp controlled meter 126, the temperature in gas-heated cavity 122 can be adjusted by temp controlled meter 126, the temperature of inert gas freely can be adjusted according to different situations, very easy to use.
Described inert gas source 123 can be argon gas, helium etc.; in order to reduce production cost; described inert gas source 123 is preferably nitrogen; because nitrogen is a kind of gas that in air, content is maximum; thus extract conveniently; cost is low, and nitrogen is not easy to react with silicon material simultaneously, can play the object of starvation protection silicon material.
Claims (3)
1. a silicon material cleaning equipment, comprise base plate (101), side plate (102), the housing (1) of cover plate (103) group layer, dividing plate (2) is provided with in described housing (1), described dividing plate (2) and base plate (101) be arranged in parallel, described dividing plate (2) and side plate (102) cover plate (103) surround a closed cavity (3) jointly, rotary barrel (4) is provided with in described cavity (3), described rotary barrel (4) bottom is connected with rotating shaft (5), described rotating shaft (5) is through dividing plate (2), rotating shaft (5) lower end is connected with the drive motors (6) driving rotating shaft (5) to rotate, described dividing plate (2) is provided with osculum (7), described osculum (7) is connected with drainpipe (8), described drainpipe (8) is provided with drain stop valve (9), described cover plate (103) is connected with air inlet pipe (10) for passing into inert gas with for passing into the water inlet pipe (11) of pure water, described air inlet pipe (10) is provided with gas-heating apparatus (12), described air inlet pipe (10), water inlet pipe (11) is each passed through cover plate (103) and extends in cavity (3), described water inlet pipe (11) is provided with into water stop valve (13), described air inlet pipe (10) is provided with air inlet stop valve (14), the sidewall of described rotary barrel (4) is provided with multiple leaking hole (15), it is characterized in that: the end of described drainpipe (8) is connected with pure water retracting device (16), described pure water retracting device (16) comprises the first storage tank (161), first storage tank (161) bottom is connected with first-stage reverse osmosis parts (162), the port of export of first-stage reverse osmosis portion (162) part is provided with one-level DI (163) and the dirty mouth (164) of one-level concentrated water drainage, the tail end of one-level DI (163) is provided with the second storage tank (165), second storage tank (165) bottom is connected with two-pass reverse osmosis parts (166), the port of export of two-pass reverse osmosis parts (166) is provided with pure water drainage tube (167) and the dirty mouth (168) of secondary concentrated water drainage, described pure water drainage tube (167) is connected with water inlet pipe (11).
2. silicon material cleaning equipment as claimed in claim 1, it is characterized in that: described gas-heating apparatus (12) comprises columnar shape basal (121), columniform gas-heated cavity (122) is provided with in described columnar shape basal (121), described columnar shape basal (121) is provided with the air inlet and gas outlet that are communicated with gas-heated cavity (122), described air inlet is communicated with inert gas source (123) by tracheae, described gas outlet is communicated with air inlet pipe (10), the surface wrap of described columnar shape basal (121) has heater strip (124), described heater strip (124) is connected on power supply (125).
3. silicon material cleaning equipment as claimed in claim 2, it is characterized in that: between described heater strip (124) and power supply (125), be provided with temp controlled meter (126), be provided with temp probe (127) in described gas-heated cavity (122), described temp probe (127) is connected with temp controlled meter (126).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520937963.4U CN205096179U (en) | 2015-11-20 | 2015-11-20 | Silicon material cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520937963.4U CN205096179U (en) | 2015-11-20 | 2015-11-20 | Silicon material cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205096179U true CN205096179U (en) | 2016-03-23 |
Family
ID=55511990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520937963.4U Expired - Fee Related CN205096179U (en) | 2015-11-20 | 2015-11-20 | Silicon material cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205096179U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106623211A (en) * | 2016-11-30 | 2017-05-10 | 重庆速腾机械制造有限公司 | Automobile part cleaning device |
| CN108526163A (en) * | 2018-05-25 | 2018-09-14 | 江苏中德电子材料科技有限公司 | Multistation bottle automatic cleaning system and method |
-
2015
- 2015-11-20 CN CN201520937963.4U patent/CN205096179U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106623211A (en) * | 2016-11-30 | 2017-05-10 | 重庆速腾机械制造有限公司 | Automobile part cleaning device |
| CN108526163A (en) * | 2018-05-25 | 2018-09-14 | 江苏中德电子材料科技有限公司 | Multistation bottle automatic cleaning system and method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160323 Termination date: 20201120 |