CN204177994U - The camera substrate that a kind of transmittance is high - Google Patents

The camera substrate that a kind of transmittance is high Download PDF

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Publication number
CN204177994U
CN204177994U CN201420555504.5U CN201420555504U CN204177994U CN 204177994 U CN204177994 U CN 204177994U CN 201420555504 U CN201420555504 U CN 201420555504U CN 204177994 U CN204177994 U CN 204177994U
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China
Prior art keywords
film
layer
transmittance
substrate
cut
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Active
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CN201420555504.5U
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Chinese (zh)
Inventor
周群飞
饶桥兵
卢湘武
刘宇嵘
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Lens Technology Co Ltd
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Lens Technology Co Ltd
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Priority to CN201420555504.5U priority Critical patent/CN204177994U/en
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Abstract

The camera substrate that transmittance is high, comprises lens substrate, and the one side of described lens substrate is coated with IR-CUT film, and another side is coated with AR film, and described IR-CUT film is by multilayer SiO 2layer and Nb 2o 5layer circulation superposition is formed, and described AR film is by multilayer SiO 2layer and SI 3n 4layer circulation superposition is formed.The utility model makes the average transmittance of visible region reach more than 95%, and little on the transmissivity impact in IR-cut district, and cost is lower.

Description

The camera substrate that a kind of transmittance is high
Technical field
The utility model relates to the high camera substrate of a kind of transmittance.
Background technology
Modern number code product uses CCD (Charge Couple Device) or CMOS (ComplementaryMetal-Oxide Semiconductor) device, and its sensitive volume comprises visible ray, region of ultra-red.And infrared light can cause the colour temperature deviation of picture and acutance to decline.Simultaneously when using CCD or cmos image sensor to take colored scenery, because they are different from human eye to the reaction of color, for the reaction to color in adjustment visible-range, the color that image is presented meets the sensation of human eye, must between CCD and camera lens module installation infrared cutoff filter (lens surface plating IR-CUT film), thus " filtration " falls infrared light.Cutoff filter also can increase contrast and the resolution of infrared imaging in infrared lens.
The reflection of optical element surface, not only affects the logical luminous energy of optical element; And these reflected light also can form parasitic light in instrument, affect the image quality of optical instrument.In order to address these problems, certain thickness multilayer film on the plated surface of optical element usually, object is the reflected light in order to reduce element surface, and such film is optical anti-reflective film (or antireflective film, i.e. AR film).Generally, when light is incident on the optical element of given material surperficial, the reflected light produced and transmitted light energy are determined, when not considering other factors such as absorption, scattering, the gross energy of reflected light and transmitted light equals the energy of incident light.And the effect of institute's plated film makes the energy of reflected light and transmitted light redistribute.For anti-reflection film, the result of distribution makes the energy of reflected light reduce, and the energy of transmitted light increases.
Utility model content
The purpose of this utility model is to provide a kind of average transmittance of visible region that makes to reach more than 95% for the deficiencies in the prior art, and little on the transmissivity impact in IR-cut district, the camera substrate that lower-cost transmittance is high.
The utility model is achieved through the following technical solutions above-mentioned purpose:
The camera substrate that transmittance is high, comprises lens substrate, and the one side of described lens substrate is coated with IR-CUT film, and another side is coated with AR film.
The thickness of described AR film is about 450 ~ 500nm, and the thickness of IR-CUT film is about 5000 ~ 5500nm.
Described IR-CUT film is by multilayer SiO 2layer and Nb 2o 5layer circulation superposition is formed.
Described AR film is by multilayer SiO 2layer and SI 3n 4layer circulation superposition is formed.
Described AR rete number is 6 ~ 9 layers, and the thickness of IR-CUT film is 60 ~ 90 layers.
Due to adopt such scheme camera substrate one side plate IR-CUT another side plate AR film can make the average transmittance of visible region (380nm-780nm wave band) that more than 95% can be reached (all there is the distinctive reflection of material on camera baseplate material two sides, reach corresponding surface reflection energy by substrate plating surface antireflecting film to lower, reach anti-reflection effect, IR-CUT membrane interaction is simultaneously increasing visible light transmissivity cut-off infrared light in addition), and the transmissivity of IR-cut district (900-1100nm wave band) does not almost affect (being all less than 2% before plating AR film with after plating AR film), and adopt this infrastructure cost lower, efficiency is high, and very easily apply, there is larger marketable value.
Accompanying drawing explanation
Fig. 1 is the structural representation of this patent.
Embodiment
Below by example, further describe the embodiment of this patent.
As shown in Figure 1, the camera substrate that a kind of transmittance is high, comprises camera lens substrate 1, camera lens substrate 1 one side be coated with IR-CUT film 2, another side is coated with AR film 3, described IR-CUT film 2 for ground floor be SiO 2, the second layer is Nb 2o 5, circulate successively, AR film 3 ground floor is SiO 2, the second layer is SI 3n 4, circulate successively.In this example, described IR-CUT film has 79 layers, and described AR film has 9 layers.

Claims (6)

1. the camera substrate that transmittance is high, comprises lens substrate, it is characterized in that: the one side of described lens substrate is coated with IR-CUT film, and another side is coated with AR film.
2. the camera substrate that transmittance according to claim 1 is high, is characterized in that: the thickness of described AR film is about 450 ~ 500nm, and the thickness of IR-CUT film is about 5000 ~ 5500nm.
3. the camera substrate that transmittance according to claim 1 and 2 is high, is characterized in that: described IR-CUT film is by multilayer SiO 2layer and Nb 2o 5layer circulation superposition is formed.
4. the camera substrate that transmittance according to claim 1 and 2 is high, is characterized in that: described AR film is by multilayer SiO 2layer and SI 3n 4layer circulation superposition is formed.
5. the camera substrate that transmittance according to claim 3 is high, is characterized in that: described AR film is by multilayer SiO 2layer and SI 3n 4layer circulation superposition is formed.
6. the camera substrate that transmittance according to claim 5 is high, is characterized in that: described AR rete number is 6 ~ 9 layers, and the thickness of IR-CUT film is 60 ~ 90 layers.
CN201420555504.5U 2014-09-25 2014-09-25 The camera substrate that a kind of transmittance is high Active CN204177994U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201420555504.5U CN204177994U (en) 2014-09-25 2014-09-25 The camera substrate that a kind of transmittance is high

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201420555504.5U CN204177994U (en) 2014-09-25 2014-09-25 The camera substrate that a kind of transmittance is high

Publications (1)

Publication Number Publication Date
CN204177994U true CN204177994U (en) 2015-02-25

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105353435A (en) * 2015-12-10 2016-02-24 广州市佳禾光电科技有限公司 Absorption type filtering protection glass
CN111580193A (en) * 2020-06-08 2020-08-25 华天慧创科技(西安)有限公司 Ultrathin film-coated optical wafer and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105353435A (en) * 2015-12-10 2016-02-24 广州市佳禾光电科技有限公司 Absorption type filtering protection glass
CN111580193A (en) * 2020-06-08 2020-08-25 华天慧创科技(西安)有限公司 Ultrathin film-coated optical wafer and preparation method thereof

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