CN106814417B - Day and night dual-purpose optical low-pass filter and manufacturing method thereof - Google Patents
Day and night dual-purpose optical low-pass filter and manufacturing method thereof Download PDFInfo
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- CN106814417B CN106814417B CN201710151484.3A CN201710151484A CN106814417B CN 106814417 B CN106814417 B CN 106814417B CN 201710151484 A CN201710151484 A CN 201710151484A CN 106814417 B CN106814417 B CN 106814417B
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- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000005304 optical glass Substances 0.000 claims abstract description 56
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 22
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 13
- 238000004040 coloring Methods 0.000 claims abstract description 13
- 238000002360 preparation method Methods 0.000 claims abstract description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 19
- 239000004327 boric acid Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 16
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 15
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 15
- 239000003822 epoxy resin Substances 0.000 claims description 14
- 229920000647 polyepoxide Polymers 0.000 claims description 14
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- 229920005989 resin Polymers 0.000 claims description 8
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- 238000001035 drying Methods 0.000 claims description 6
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- 238000004140 cleaning Methods 0.000 claims description 5
- 229940044175 cobalt sulfate Drugs 0.000 claims description 5
- 229910000361 cobalt sulfate Inorganic materials 0.000 claims description 5
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 18
- 239000000377 silicon dioxide Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- 238000012544 monitoring process Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 6
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- 238000001444 catalytic combustion detection Methods 0.000 description 5
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- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
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- 230000003313 weakening effect Effects 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/226—Glass filters
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a day and night dual-purpose optical low-pass filter, which is formed by sequentially coating a metal ion coloring polymeric film (3) and an anti-reflection hardening film (4) on the upper surface of alkali-free optical glass I (1), coating a dielectric multilayer film (5) on the lower surface of alkali-free optical glass II (2), and connecting the lower surface of alkali-free optical glass I (1) and the upper surface of alkali-free optical glass II (2) through an optical bonding film (6). The invention also discloses a preparation method of the day-night dual-purpose optical low-pass filter.
Description
Technical Field
The invention relates to an optical filter and a manufacturing method thereof, in particular to a manufacturing method of an optical low-pass filter which can realize day and night dual-purpose of a camera by enabling the color of an image to be combined with the human eye feeling without using a switching device.
Background
In recent decades, photography and security monitoring system technologies are increasingly applied to daily life, and products related to digital photography, such as digital cameras (DSC), digital Video Cameras (DVC) and video cameras, need to adopt array type photoelectric imaging devices, such as CCDs and CMOS. The CCD and CMOS solid image sensors read images by adopting a discontinuous image capturing mode, when the CCD and CMOS solid image sensors acquire target image information, when the sampled images exceed the Nyquist limit frequency of the system, the images generate periodic spectrum overlapping confusion or beat phenomenon, and the aliasing signals influence the image definition and even generate color stripe interference. Therefore, a pre-processing pre-filtering technique, i.e., an optical low pass filter (Optical Low Pass Filter OLPF), must be used to reduce the bandwidth of the optical image on the CCD or CMOS photosurface, thereby reducing spectral aliasing.
The optical low-pass filter generally adopts a double-refraction sheet to divide a grid-shaped transmitted light into two beams of light, and the two beams of light are overlapped to slightly change the spatial distribution of the transmitted light, thereby changing the polarization state of an incident light book, forming the target frequency of a difference frequency and achieving the purpose of weakening or eliminating low-frequency interference fringes. However, in digital imaging, since the CCD and CMOS sensors are usually sensitive from ultraviolet to near infrared, the imaging color is different from that seen by the human eye, so that the infrared filter must be used to remove the infrared light which cannot be detected by the human eye, and adjust the response of the human eye to the color in the visible light range, and the blue glass can not penetrate the infrared light in the 800-1000nm band, so that the blue glass can be seen by the saturated color suitable for the human eye, and is favored by users in the camera industry.
However, blue glass cannot penetrate near infrared light with a wavelength of 800-1000nm, so that the imaging effect of the camera at night is poor, and the camera cannot be used for monitoring at night. At present, most of cameras and security industry adopt white glass which cannot penetrate infrared blue glass such as CM500S series and white glass at night, and the filters are switched back and forth through a switching device when the filters alternate day and night, but the whole monitoring system is often failed due to the severe use environment and the service life loss of the switching device. Patent CN203164462U discloses a day and night dual-purpose optical filter formed by alternately overlapping a low-refractive-index silicon dioxide film and a high-refractive-index titanium dioxide film, and patent CN201133963 discloses a day and night dual-purpose focusing lens with infrared night vision function by using four focusing lenses.
Disclosure of Invention
The invention aims to solve the technical problem of providing a day-night dual-purpose optical low-pass filter and a manufacturing method thereof, wherein the optical low-pass filter is provided with visible and infrared transmission bands at the same time, and can realize the day-night dual-purpose of a camera without a switching device.
In order to solve the technical problems, the invention provides a day and night dual-purpose optical low-pass filter, which is formed by sequentially coating a metal ion coloring polymeric film and an anti-reflection hardening film on the upper surface of alkali-free optical glass I, coating a dielectric multilayer film on the lower surface of alkali-free optical glass II, and connecting the lower surface of alkali-free optical glass I and the upper surface of alkali-free optical glass II through an optical bonding film.
The invention also provides a manufacturing method of the day-night dual-purpose optical low-pass filter, which comprises the following steps:
the metal ion coloring film is coated by a boric acid solution containing cobalt ions, and the thickness of the metal ion coloring film is 0.7-0.8 mu m;
the boric acid solution containing cobalt ions consists of 0.3-0.6 mol/L cobalt sulfate, 0.8-1.2 mol/L boric acid and the balance of water.
As an improvement of the manufacturing method of the day and night dual-purpose optical low-pass filter of the invention: and (3) spin-coating a boric acid solution containing cobalt ions on the upper surface of the alkali-free optical glass I, and then drying at 90-110 ℃ for 60+/-5 min, wherein the spin-coating rotating speed is 300-1000 r/min.
The metal ion-colored polymeric film has absorption characteristics for light near 620 nm.
Further improvement of the method for manufacturing the day-night dual-purpose optical low-pass filter of the present invention: the dielectric multilayer film has a composition of Ta 2 O 5 Or Ti (Ti) 3 O 5 The thickness is 0.7-0.8 mu m.
Further improvement of the method for manufacturing the day-night dual-purpose optical low-pass filter of the present invention: adopts a vacuum coating machine to heat Ta by electron beams generated by an electron gun under vacuum condition 2 O 5 Or Ti (Ti) 3 O 5 Plating material, thereby forming alkali-free optical glassThe lower surface of the glass II is formed with a dielectric multilayer film.
Description: the dielectric multilayer film has a transmittance of 90% or more with respect to visible light and can have a high selective transmittance in a wavelength range of 940nm or 850 nm.
Further improvement of the method for manufacturing the day-night dual-purpose optical low-pass filter of the present invention: the alkali-free optical glass I and the alkali-free optical glass II are floating glass which does not contain alkali metal elements, and the thickness is 0.2-0.3 mm. For example, D263T-type float glass manufactured by SCHOTT, inc., contains no alkali metal element.
Further improvement of the method for manufacturing the day-night dual-purpose optical low-pass filter of the present invention: the thickness of the anti-reflection hardening film is 1-2 mu m; it is silicon dioxide (SiO) 2 ) The resin as a base material is obtained by spin coating (spin coating rotating speed is 300-1000 r/min) on the surface of the metal ion coloring polymeric film (3) and then drying at 90-110 ℃ for 60-90 min. The Silica (SiO) 2 ) As the resin for the base material, for example, KL-2 resin manufactured by Ai Yaoda silicone oil company can be selected.
Further improvement of the method for manufacturing the day-night dual-purpose optical low-pass filter of the present invention: the optical cementing film is obtained by an ultraviolet light hardening process of epoxy resin glue arranged between the lower surface of the alkali-free optical glass I and the upper surface of the alkali-free optical glass II, and the thickness of the optical cementing film is 5-10 mu m.
Description: the optical cementing film is arranged according to the process method of substrate cleaning, coating photoresist, attaching and positioning and ultraviolet hardening, which belongs to the conventional technology.
The epoxy resin adhesive can be XVL-14L epoxy resin adhesive produced by the company of the tandem chemical company, and the epoxy resin adhesive has refractive index similar to that of optical glass.
Aiming at the problem that the filter needs to be switched back and forth when the monitoring system alternates day and night, so that the service life of the monitoring system is reduced and even the whole monitoring system is crashed, the invention designs the optical low-pass filter without a switching device, and the optical low-pass filter has two transmission bands of visible light and infrared light at the same time, so that the day and night dual-purpose of a camera can be realized without the switching device.
The optical low-pass filter has more than 90% transmittance in the wave band of 420-620nm and has almost 90% transmittance in the near infrared wave band of 850nm or 940 nm.
The optical low-pass filter has a composite structure in which the surfaces of two pieces of alkali-free optical glass are coated with films and bonded by using an optical bonding film.
In the present invention, the metal ion colored film has absorption characteristics for 620 nm-near light. The dielectric multilayer film is a film having a transmittance of 90% or more with respect to visible light and capable of having a high selective transmittance in a wavelength range of 940nm or 850 nm.
The invention adopts the light absorption characteristic of metal ions in the metal ion coloring film to generate infrared transmission characteristic for the first time, and an optical low-pass filter without the phenomenon of infrared storm is invented by controlling the thickness of the dielectric multilayer film and the type of the dielectric.
Drawings
The following describes the embodiments of the present invention in further detail with reference to the accompanying drawings.
FIG. 1 is a schematic cross-sectional view of a dual-purpose day and night optical low-pass filter according to the present invention;
FIG. 2 is a graph showing transmittance in 940nm wavelength band of the day-night dual-purpose optical low-pass filter obtained in example 1;
FIG. 3 is a graph showing transmittance in 850nm wavelength bands of the day-night dual-purpose optical low-pass filter obtained in example 2;
FIG. 4 is a graph of transmittance versus wavelength for a conventional white-day filter;
the 5 curves in the figure are 5 replicates of the setup.
Fig. 5 is a graph of transmittance versus wavelength for a conventional filter with different numbers of AR-plated anti-reflection layers.
Detailed Description
The invention will be further described with reference to the following specific examples, but the scope of the invention is not limited thereto:
in example 1, an optical low-pass filter for both day and night use was formed by coating a metal ion colored polymeric film 3 and an antireflection film 4 on the upper surface of an alkali-free optical glass i 1 in this order, coating a dielectric multilayer film 5 on the lower surface of an alkali-free optical glass ii 2, and connecting the lower surface of the alkali-free optical glass i 1 and the upper surface of the alkali-free optical glass ii 2 via an optical adhesive film 6.
The alkali-free optical glass I1 and the alkali-free optical glass II 2 can be selected from D263T type floating glass manufactured by SCHOTT company, and the thickness is 0.2mm.
The preparation method comprises the following steps:
1) Preparing a boric acid solution containing cobalt ions:
the cobalt ion-containing boric acid solution consisted of 0.5mol/L cobalt sulfate, 1.1mol/L boric acid and the balance of water.
The metal ion coloring film 3 is prepared from the boric acid solution containing cobalt ions, namely, the boric acid solution containing cobalt ions is spin-coated on the upper surface of the alkali-free optical glass I1 (spin-coating rotating speed is 800 r/min), and then the boric acid solution containing cobalt ions is dried at 90 ℃ for 60min; thereby forming a metal ion colored film 3 attached to the upper surface of the alkali-free optical glass i 1, the thickness of the metal ion colored film 3 being 0.7 μm.
2) Silica (SiO) 2 ) The resin as a base material was spin-coated (spin-coating rotation speed is 800 r/min) on the surface of the metal ion-colored polymeric film 3 and baked at 90℃for 60min, thereby forming an anti-reflection cured film 4 attached to the upper surface of the metal ion-colored polymeric film 3, and the thickness of the anti-reflection cured film 4 was 1. Mu.m.
The Silica (SiO) 2 ) The resin solution used as the base material is KL-2 resin.
3) Heating Ta by electron beam generated by electron gun under vacuum condition by adopting vacuum coating machine 2 O 5 Plating material, thereby forming a dielectric multilayer film 5 on the lower surface of the alkali-free optical glass ii 2. The thickness of the dielectric multilayer film 5 was 0.7. Mu.m.
4) According to the process method of substrate cleaning, coating optical cement, laminating and positioning and ultraviolet light hardening (the conventional technology), epoxy resin cement is arranged between the lower surface of the alkali-free optical glass I1 and the upper surface of the alkali-free optical glass II 2, and specifically: and cleaning the lower surface of the alkali-free optical glass I1 and the upper surface of the alkali-free optical glass II 2 according to a conventional basic cleaning mode, coating epoxy resin glue on the lower surface of the alkali-free optical glass I1, attaching the upper surface of the alkali-free optical glass II 2 to the epoxy resin glue, and curing for 3 hours under ultraviolet light. Thereby forming an optical adhesive film 6 between the lower surface of the alkali-free optical glass i 1 and the upper surface of the alkali-free optical glass ii 2, the thickness of the optical adhesive film 6 being 6 μm.
The epoxy resin adhesive can be XVL-14L epoxy resin adhesive produced by the company of the tandem chemical company, and the epoxy resin adhesive has refractive index similar to that of optical glass.
FIG. 2 is a graph of transmittance versus wavelength for the optical low pass filter obtained in example 1, having a transmittance of approximately 90% in the band range of 420nm to 600nm, and a near infrared narrow passband in the band around 940nm, with a transmittance of greater than 80%. Because the 940nm LED is adopted for light filling, the phenomenon of red storm cannot occur (namely, 940nm light is transmitted, and the light in the wave band is colorless, so that the phenomenon of red storm cannot occur), and the LED light filling device is suitable for night monitoring and use, and has the effect of day and night.
The detection method of the transmittance-wavelength curve is based on GB/T2828.
Example 2 the electrolyte multilayer film 5 in example 1 was changed to an electrolyte multilayer film 5 having an open wavelength band of 850nm suitable for an 850 light source illumination system, and the rest was the same as in example 1.
The 850nm electrolyte multilayer film is made of Ti 3 O 5 The film was deposited by electron beam heating under vacuum, and the thickness was 0.7. Mu.m.
Fig. 3 is a transmittance-wavelength curve of the optical low-pass filter obtained in example 2. The transmittance of the light source is higher than 90% at 420 nm-600 nm, a near infrared narrow passband is arranged near 850nm, and the transmittance is as high as 90% and the light source is suitable for an 850nm light source illumination system. The optical low-pass filter adopts 850nm LED light filling, obvious red storm phenomenon can occur, and the optical low-pass filter is easy to be monitored and perceived during night use, so the effect is inferior to that of the embodiment 1.
Comparative example 1: the electrolyte multilayer film 5 was provided according to a conventional technique, and the thickness was changed from 0.7 μm to 4 μm; fig. 4 is a graph showing the transmittance-wavelength curve of the optical low-pass filter after changing the thickness of the dielectric multilayer film, and only visible light of 420-650nm is transmitted, and the graph of fig. 4 shows the results of 5 repeated tests, which are applicable to only white-day visible light sources.
Comparative example 2: removing the anti-reflection hardened film 4 (AR anti-reflection film) in comparative example 1; plating an anti-reflection hardened film 4 on the lower surface of the dielectric multilayer film 5 of comparative example 1; in comparison with comparative example 1. The transmittance of the three materials to visible light was compared to obtain fig. 5.
As can be seen from fig. 5, the transmittance is significantly reduced after the AR antireflection film is removed, which indicates that the AR antireflection film can play a role in increasing transmittance and improving imaging brightness. However, the transmittance of the filter with the AR antireflection film coated on one side also meets the requirement, so that the cost is saved for simplifying the structure, and double-sided coating is not performed.
Comparative example 3-1, the formulation of the metal ion colored film 3 was changed to: the boric acid solution was not added with any cobalt ions, and the rest was the same as in example 1. As a result, infrared light having a wavelength of 800nm or more was not transmitted, and thus, it was not possible to use the infrared light for night imaging.
Comparative example 3-2 the concentration of cobalt sulfate in the formulation of the metal ion colored film 3 was changed from 0.5mol/L to 1mol/L, and the remainder was identical to example 1. The obtained result has lower infrared light transmittance, and the transmittance is far less than 90%.
Finally, it should also be noted that the above list is merely a few specific embodiments of the present invention. Obviously, the invention is not limited to the above embodiments, but many variations are possible. All modifications directly derived or suggested to one skilled in the art from the present disclosure should be considered as being within the scope of the present invention.
Claims (5)
1. The manufacturing method of the day and night dual-purpose optical low-pass filter is characterized in that:
the optical low-pass filter for both day and night comprises: the method comprises the steps of sequentially coating a metal ion coloring polymeric film (3) and an anti-reflection hardening film (4) on the upper surface of alkali-free optical glass I (1), coating a dielectric multilayer film (5) on the lower surface of alkali-free optical glass II (2), and connecting the lower surface of alkali-free optical glass I (1) and the upper surface of alkali-free optical glass II (2) through an optical bonding film (6), so that a day-night dual-purpose optical low-pass filter is formed;
the manufacturing method comprises the following steps:
the metal ion coloring film (3) is coated by a boric acid solution containing cobalt ions, and the thickness of the metal ion coloring film (3) is 0.7-0.8 mu m;
the boric acid solution containing cobalt ions consists of 0.3-0.6 mol/L cobalt sulfate, 0.8-1.2 mol/L boric acid and the balance of water;
spin-coating a boric acid solution containing cobalt ions on the upper surface of the alkali-free optical glass I (1), and then drying at 90-110 ℃ for 60+/-5 min, wherein the spin-coating speed is 300-1000 r/min;
the dielectric multilayer film (5) has a composition of Ta 2 O 5 Or Ti (Ti) 3 O 5 The thickness is 0.7-0.8 mu m;
the alkali-free optical glass I (1) and the alkali-free optical glass II (2) are floating glass which does not contain alkali metal elements, and the thickness is 0.2-0.3 mm.
2. The method for manufacturing an optical low-pass filter for both day and night according to claim 1, wherein:
adopts a vacuum coating machine to heat Ta by electron beams generated by an electron gun under vacuum condition 2 O 5 Or Ti (Ti) 3 O 5 Plating material, thereby forming a dielectric multilayer film (5) on the lower surface of the alkali-free optical glass II (2).
3. The method for manufacturing an optical low-pass filter for both day and night according to claim 1 or 2, characterized by:
the thickness of the anti-reflection hardening film (4) is 1-2 mu m; spin-coating KL-2 resin on the surface of the metal ion coloring polymeric film (3), and drying at 90-110 ℃ for 60-90 min.
4. The method for manufacturing an optical low-pass filter for both day and night according to claim 1 or 2, characterized by:
the optical cementing film (6) is obtained by ultraviolet curing an XVL-14L epoxy resin adhesive arranged between the lower surface of the alkali-free optical glass I (1) and the upper surface of the alkali-free optical glass II (2), and the thickness of the optical cementing film (6) is 5-10 mu m.
5. The method for manufacturing an optical low-pass filter for both day and night according to claim 1, wherein:
the alkali-free optical glass I (1) and the alkali-free optical glass II (2) are D263T type floating glass, and the thickness is 0.2mm;
the preparation method comprises the following steps:
1) Preparing a boric acid solution containing cobalt ions:
the boric acid solution containing cobalt ions consists of 0.5mol/L cobalt sulfate, 1.1mol/L boric acid and the balance of water;
spin-coating the boric acid solution containing cobalt ions on the upper surface of the alkali-free optical glass I (1), and then drying at 90 ℃ for 60min; thereby forming a metal ion colored film (3) attached to the upper surface of the alkali-free optical glass I (1), the thickness of the metal ion colored film (3) being 0.7 μm;
2) Spin-coating KL-2 resin on the surface of the metal ion coloring polymeric film (3), and drying at 90 ℃ for 60min to form an anti-reflection hardening film (4) attached to the upper surface of the metal ion coloring polymeric film (3), wherein the thickness of the anti-reflection hardening film (4) is 1 mu m;
3) Heating Ta by electron beam generated by electron gun under vacuum condition by adopting vacuum coating machine 2 O 5 Plating material to form a dielectric multilayer film (5) on the lower surface of the alkali-free optical glass II (2), wherein the thickness of the dielectric multilayer film (5) is 0.7 mu m;
4) An XVL-14L epoxy resin adhesive is arranged between the lower surface of the alkali-free optical glass I (1) and the upper surface of the alkali-free optical glass II (2), and specifically comprises the following steps: cleaning the lower surface of the alkali-free optical glass I (1) and the upper surface of the alkali-free optical glass II (2), coating XVL-14L epoxy resin adhesive on the lower surface of the alkali-free optical glass I (1), attaching the upper surface of the alkali-free optical glass II (2) to the XVL-14L epoxy resin adhesive, and curing for 3 hours under ultraviolet light; thereby forming an optical adhesive film (6) between the lower surface of the alkali-free optical glass I (1) and the upper surface of the alkali-free optical glass II (2), the thickness of the optical adhesive film (6) being 6 μm.
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| CN107254665A (en) * | 2017-06-13 | 2017-10-17 | 深圳市鼎新光电有限公司 | A kind of plating method of new day and night type product |
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| CN106814417A (en) | 2017-06-09 |
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