CN204174269U - A kind of rotatingfield planar cathode - Google Patents
A kind of rotatingfield planar cathode Download PDFInfo
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- CN204174269U CN204174269U CN201420566865.XU CN201420566865U CN204174269U CN 204174269 U CN204174269 U CN 204174269U CN 201420566865 U CN201420566865 U CN 201420566865U CN 204174269 U CN204174269 U CN 204174269U
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- magnet steel
- target
- insulating base
- rotatingfield
- cooling pool
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Abstract
The utility model discloses a kind of rotatingfield planar cathode, comprise shielding case, insulating base, cooling pool, magnet steel swivel arrangement, target stand and target, the top of the insulating base being connected on disc-shape twisted by described shielding case, described cooling pool is arranged in shielding case, and be fixed on the top of insulating base, in described cooling pool, suspension has magnet steel swivel arrangement, described target stand is fixed on the top of cooling pool, and be provided with rubber seal with the contact surface of cooling pool, described target is fitted in the top of target stand by heat conductive silica gel, the border of described target is also provided with metal pressure ring, described metal pressure ring is used for target, target stand is fixed.Rotatingfield planar cathode of the present utility model, expands the uniform sputter area of target with tradition compared with rotating circular planar target, thus improves target utilization and sputter rate further, realizes Large-Area-Uniform fast deposition film, has a good application prospect.
Description
Technical field
The utility model relates to a kind of rotatingfield planar cathode, belongs to magnetron sputtering technique field.
Background technology
Magnetic control sputtering device has been widely used in the plated film fields such as various electronics, decoration as a kind of film coating apparatus, and it has, and plated film speed is fast, low temperature depositing, the advantage such as pollution-free.
Along with the development of magnetron sputtering technology, researchist proposes the Method and Technology of the method raising planar cathode target utilization of various employing rotatingfield, patent 200510021648.8 proposes many rings magnetic field asymmetric distribution structure, it improves the utilization ratio of target to a certain extent, but because its Distribution of Magnetic Field is stronger in central loop region, all more weak in magnetic field that is peripheral and center, cause target utilization to promote not high; Patent 201010277532.1 proposes and allows seat rotary random motion in magnetic field to realize the utilization ratio of target, equally because its Distribution of Magnetic Field is not well optimized, thus also less to the effect improving target utilization.
In order to improve target utilization and sputter rate more significantly, realize Large-Area-Uniform fast deposition film, needs improve and strengthen the Distribution of Magnetic Field of existing circular planar target.
Utility model content
The technical problem that the utility model solves is the circular flat negative electrode of existing magnetic control sputtering device, and magnetic field is weak, the problem that target utilization is low.Rotatingfield planar cathode of the present utility model, expands the uniform sputter area of target with tradition compared with rotating circular planar target, thus improves target utilization and sputter rate significantly, realizes Large-Area-Uniform fast deposition film, has a good application prospect.
In order to achieve the above object, the technical scheme that the utility model adopts is:
A kind of rotatingfield planar cathode, it is characterized in that: comprise shielding case, insulating base, cooling pool, magnet steel swivel arrangement, target stand and target, the top of the insulating base being connected on disc-shape twisted by described shielding case, described cooling pool is arranged in shielding case, and be fixed on the top of insulating base, in described cooling pool, suspension has magnet steel swivel arrangement, described target stand is fixed on the top of cooling pool, and be provided with rubber seal with the contact surface of cooling pool, described target is fitted in the top of target stand by heat conductive silica gel, the border of described target is also provided with metal pressure ring, described metal pressure ring is used for target, target stand is fixed,
Described magnet steel swivel arrangement comprises magnet steel and settles base, magnet steel, cooling water inlet pipe, water coolant perforate, described cooling water inlet pipe is welded on the bottom that base settled by magnet steel, described water coolant perforate is positioned at magnet steel and settles base, and be connected with cooling water inlet pipe, being connected of the outer buttons rotary device that cooling pool is extended in the downward side of described cooling water inlet pipe, insulating base rotates with control magnet steel swivel arrangement as driving stem;
The bottom of described cooling pool is also provided with cathode electrode, cooling water outlet pipe, and extends insulating base.
Aforesaid a kind of rotatingfield planar cathode, it is characterized in that: the top being connected on insulating base threadedly twisted by described shielding case, described shielding case adopts conductive metallic material to make, and the inwall of shielding case to the space distance of cooling pool, target and metal pressure ring between 1-5mm, the cover body of described shielding case is connected with the earth.
Aforesaid a kind of rotatingfield planar cathode, it is characterized in that: described insulating base adopts tetrafluoroethylene to make, thickness is 5-20mm, described insulating base is provided with perforate, pass through for cathode electrode, cooling water outlet pipe and cooling water inlet pipe, space is provided with, the perforate of described insulating base and cathode electrode, cooling water outlet pipe close contact between the perforate of described insulating base and cooling water inlet pipe.
Aforesaid a kind of rotatingfield planar cathode, it is characterized in that: described cooling pool adopts red copper conductor material to make, described cooling pool inwall and cooling water inlet pipe contact position be provided with the shaft seal cover being socketed in cooling water inlet pipe, described cooling pool is connected by high temperature resistant glue or screw with insulating base.
Aforesaid a kind of rotatingfield planar cathode, is characterized in that: between the upper surface of described magnet steel swivel arrangement and target stand lower surface, gap is 1-4mm.
Aforesaid a kind of rotatingfield planar cathode, is characterized in that: described metal pressure ring adopts red copper or aluminium conductor material to make, and be inverted L-shaped shape, horizontal side is connected with target, target stand by screw, and the Distances Between Neighboring Edge Points of perpendicular side and target is 1-2mm.
Aforesaid a kind of rotatingfield planar cathode, it is characterized in that: described magnet steel comprises opposite polarity first magnet steel and the second magnet steel, the upper surface of base settled by described first magnet steel and the second magnet steel by snapping fit onto magnet steel, and adopt waterproof glue to fix, described first magnet steel is right cylinder, and be provided with two pieces, be symmetrically distributed in the upper surface that base settled by magnet steel, described second magnet steel is arc body, and be provided with two, be symmetrically distributed in the upper surface that base settled by magnet steel, and between two piece of first magnet steel, article two, center mutually circumscribed of the second magnet steel, and distribute with concentric(al) circles with the first magnet steel of respective side respectively, concentric(al) circles can be approximately.
Aforesaid a kind of rotatingfield planar cathode, is characterized in that: described magnet steel settles base to adopt red copper material to make, and thickness is 30-100mm, is provided with circular deep trouth, arc deep trouth for clamping first magnet steel and the second magnet steel.
The beneficial effects of the utility model are: rotatingfield planar cathode of the present utility model, the uniform sputter area of target is expanded compared with rotating circular planar target with tradition, thus improve target utilization and sputter rate further, realize Large-Area-Uniform fast deposition film, have a good application prospect.
Accompanying drawing explanation
Fig. 1 is the structural representation of rotatingfield planar cathode of the present utility model.
Fig. 2 is the structural representation of magnet steel swivel arrangement of the present utility model.
The implication marked in accompanying drawing is as follows:
1: shielding case; 2: insulating base; 3: cooling pool; 31: cathode electrode; 32: cooling water outlet pipe; 33: shaft seal cover; 34: rubber seal; 4: magnet steel swivel arrangement; 41: base settled by magnet steel; 42: magnet steel; 43: cooling water inlet pipe; 44: water coolant perforate; 421: the first magnet steel; 422: the second magnet steel; 5: target stand; 6: target 7: metal pressure ring.
Embodiment
Below in conjunction with Figure of description, the utility model is further described.
As shown in Figure 1, a kind of rotatingfield planar cathode, comprise shielding case 1, insulating base 2, cooling pool 3, magnet steel swivel arrangement 4, target stand 5 and target 6, the top being connected on the insulating base 2 of disc-shape twisted by shielding case 1, cooling pool 3 is arranged in shielding case 1, and be fixed on the top of insulating base 2, in cooling pool 3, suspension has magnet steel swivel arrangement 4, target stand 5 is fixed on the top of cooling pool 3, and be provided with rubber seal 34 with the contact surface of cooling pool 3, target 6 is fitted in the top of target stand 5 by heat conductive silica gel, the two ends of target 6 are also provided with metal pressure ring 7, metal pressure ring 7 is for by target 6, target stand 5 is fixed,
Described magnet steel swivel arrangement 4 comprises magnet steel and settles base 41, magnet steel 42, cooling water inlet pipe 43, water coolant perforate 44, cooling water inlet pipe 43 is welded on the bottom that base 41 settled by magnet steel, water coolant perforate 44 is positioned at magnet steel and settles base 41, and be connected with cooling water inlet pipe 43, being connected of the cooling water inlet pipe 43 outer buttons rotary device that cooling pool 3 is extended in side downwards, insulating base 2 rotates with control magnet steel swivel arrangement 4 as driving stem;
The bottom of described cooling pool 3 is also provided with cathode electrode 31, cooling water outlet pipe 32, and extends insulating base 2.
The top being connected on insulating base 2 threadedly twisted by described shielding case 1, shielding case 1 adopts conductive metallic material to make, and the inwall of shielding case 1 to the space distance of cooling pool 3, target 6 and metal pressure ring 7 between 1-5mm, the cover body of shielding case 1 is connected with the earth.
Described insulating base 2 adopts the insulating material such as tetrafluoroethylene to make, thickness is 5-20mm, insulating base 2 is provided with perforate, pass through for cathode electrode 31, cooling water outlet pipe 32 and cooling water inlet pipe 43, space is provided with between the perforate of described insulating base 2 and cooling water inlet pipe 43, what facilitate cooling water inlet pipe 43 rotarily drives magnet steel swivel arrangement 4, and the perforate of insulating base 2 and cathode electrode 31, cooling water outlet pipe 32 close contact, water coolant perforate 44 is two.
Described cooling pool 3 adopts red copper conductor material to make; the shaft seal being socketed in cooling water inlet pipe 43 that is provided with of cooling pool 3 inwall and cooling water inlet pipe 43 contact position overlaps 33; shaft seal cover 33 is for the protection of cooling water inlet pipe 43; and forming dynamic seal, cooling pool 3 is connected by high temperature resistant glue or screw with insulating base 2.
Between the upper surface of described magnet steel swivel arrangement 4 and target stand 5 lower surface, gap is 1-4mm, to ensure that magnet steel swivel arrangement 4 can rotate smoothly while target stand 5 as far as possible.
Described metal pressure ring 7 adopts red copper or aluminium conductor material to make, and be inverted L-shaped shape, horizontal side is connected with target 6, target stand 5 by screw, and the Distances Between Neighboring Edge Points of perpendicular side and target 6 is 1-2mm.
As shown in Figure 2, described magnet steel 42 comprises the first magnet steel 421 and the second magnet steel 422, the upper surface of base 41 settled by described first magnet steel 421 and the second magnet steel 422 by snapping fit onto magnet steel, and adopt waterproof glue to fix, described first magnet steel 421 is right cylinder, and be provided with two pieces, be symmetrically distributed in the upper surface that base 41 settled by magnet steel, described second magnet steel 422 is arc body, and be provided with two, be symmetrically distributed in the upper surface that base 41 settled by magnet steel, and between two piece of first magnet steel 421, article two, center mutually circumscribed of the second magnet steel 422, distribute with concentric(al) circles with the first magnet steel of respective side, concentric(al) circles can be approximately, wherein the first magnet steel 421 is contrary with the second magnet steel 422 polarity, magnet steel settles base 41 to adopt red copper material to make, thickness is 30-100mm, be provided with the circular deep trouth for clamping first magnet steel 421 and the second magnet steel 422, arc deep trouth.
The working process of rotatingfield planar cathode of the present utility model is as follows, during magnetron sputtering, the target 6 of magnet steel swivel arrangement 4 rotation sweep circular flat under the effect of outside swivel arrangement motivating force, form wider annular etching runway, the uniform sputter area of target is expanded compared with rotating circular planar target with tradition, thus improve target utilization and sputter rate further, realize Large-Area-Uniform fast deposition film.
More than show and describe ultimate principle of the present utility model and principal character and advantage of the present utility model.The technician of the industry should understand; the utility model is not restricted to the described embodiments; what describe in above-described embodiment and specification sheets just illustrates principle of the present utility model; under the prerequisite not departing from the utility model spirit and scope; the utility model also has various changes and modifications, and these changes and improvements all fall within the scope of claimed the utility model.The claimed scope of the utility model is defined by appending claims and equivalent thereof.
Claims (8)
1. a rotatingfield planar cathode, it is characterized in that: comprise shielding case (1), insulating base (2), cooling pool (3), magnet steel swivel arrangement (4), target stand (5) and target (6), the top being connected on the insulating base (2) of disc-shape twisted by described shielding case (1), described cooling pool (3) is arranged in shielding case (1), and be fixed on the top of insulating base (2), in described cooling pool (3), suspension has magnet steel swivel arrangement (4), described target stand (5) is fixed on the top of cooling pool (3), and be provided with rubber seal (34) with the contact surface of cooling pool (3), described target (6) is fitted in the top of target stand (5) by heat conductive silica gel, the border of described target (6) is also provided with metal pressure ring (7), described metal pressure ring (7) is for by target (6), target stand (5) is fixed,
Described magnet steel swivel arrangement (4) comprises magnet steel and settles base (41), magnet steel (42), cooling water inlet pipe (43), water coolant perforate (44), described cooling water inlet pipe (43) is welded on the bottom that base (41) settled by magnet steel, described water coolant perforate (44) is positioned at magnet steel and settles base (41), and be connected with cooling water inlet pipe (43), being connected of described cooling water inlet pipe (43) the outer buttons rotary device that cooling pool (3) is extended in side downwards, insulating base (2) rotates with control magnet steel swivel arrangement (4) as driving stem;
The bottom of described cooling pool (3) is also provided with cathode electrode (31), cooling water outlet pipe (32), and extends insulating base (2).
2. a kind of rotatingfield planar cathode according to claim 1, it is characterized in that: the top being connected on insulating base (2) threadedly twisted by described shielding case (1), described shielding case (1) adopts conductive metallic material to make, and the inwall of shielding case (1) to the space distance of cooling pool (3), target (6) and metal pressure ring (7) between 1-5mm, the cover body of described shielding case (1) is connected with the earth.
3. a kind of rotatingfield planar cathode according to claim 1, it is characterized in that: described insulating base (2) adopts tetrafluoroethylene to make, thickness is 5-20mm, described insulating base (2) is provided with perforate, pass through for cathode electrode (31), cooling water outlet pipe (32) and cooling water inlet pipe (43), space is provided with, the perforate of described insulating base (2) and cathode electrode (31), cooling water outlet pipe (32) close contact between the perforate of described insulating base (2) and cooling water inlet pipe (43).
4. a kind of rotatingfield planar cathode according to claim 1, it is characterized in that: described cooling pool (3) adopts red copper conductor material to make, described cooling pool (3) and cooling water inlet pipe (43) contact position are provided with the shaft seal cover (33) be socketed on cooling water inlet pipe (43), and described cooling pool (3) is connected by high temperature resistant glue or screw with insulating base (2).
5. a kind of rotatingfield planar cathode according to claim 1, is characterized in that: between the upper surface of described magnet steel swivel arrangement (4) and target stand (5) lower surface, gap is 1-4mm.
6. a kind of rotatingfield planar cathode according to claim 1, it is characterized in that: described metal pressure ring (7) adopts red copper or aluminium conductor material to make, for inverted L-shaped shape, horizontal side is connected with target (6), target stand (5) by screw, and the Distances Between Neighboring Edge Points of perpendicular side and target (6) is 1-2mm.
7. a kind of rotatingfield planar cathode according to claim 1, it is characterized in that: described magnet steel (42) comprises opposite polarity first magnet steel (421) and the second magnet steel (422), the upper surface of base (41) settled by described first magnet steel (421) and the second magnet steel (422) by snapping fit onto magnet steel, and adopt waterproof glue to fix and encapsulate, described first magnet steel (421) is right cylinder, and be provided with two pieces, be symmetrically distributed in the upper surface that base (41) settled by magnet steel, described second magnet steel (422) is arc body, and be provided with two, be symmetrically distributed in the upper surface that base (41) settled by magnet steel, and be positioned between two piece of first magnet steel (421), article two, the center of the second magnet steel (422) is mutually circumscribed, and first magnet steel (421) of respective side distributes in concentric(al) circles.
8. a kind of rotatingfield planar cathode according to claim 1 or 7, it is characterized in that: described magnet steel settles base (41) to adopt red copper material to make, thickness is 30-100mm, is provided with circular deep trouth, arc deep trouth for clamping first magnet steel (421) and the second magnet steel (422).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420566865.XU CN204174269U (en) | 2014-09-29 | 2014-09-29 | A kind of rotatingfield planar cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420566865.XU CN204174269U (en) | 2014-09-29 | 2014-09-29 | A kind of rotatingfield planar cathode |
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| Publication Number | Publication Date |
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| CN204174269U true CN204174269U (en) | 2015-02-25 |
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| CN201420566865.XU Expired - Fee Related CN204174269U (en) | 2014-09-29 | 2014-09-29 | A kind of rotatingfield planar cathode |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104278244A (en) * | 2014-09-29 | 2015-01-14 | 苏州求是真空电子有限公司 | Rotating magnetic field plane cathode |
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2014
- 2014-09-29 CN CN201420566865.XU patent/CN204174269U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104278244A (en) * | 2014-09-29 | 2015-01-14 | 苏州求是真空电子有限公司 | Rotating magnetic field plane cathode |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150225 Termination date: 20200929 |
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| CF01 | Termination of patent right due to non-payment of annual fee |