CN204167255U - A kind of electron beam quick forming fabri-cation equipment focusing system - Google Patents
A kind of electron beam quick forming fabri-cation equipment focusing system Download PDFInfo
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- CN204167255U CN204167255U CN201420440656.0U CN201420440656U CN204167255U CN 204167255 U CN204167255 U CN 204167255U CN 201420440656 U CN201420440656 U CN 201420440656U CN 204167255 U CN204167255 U CN 204167255U
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Abstract
The utility model relates to a kind of electron beam quick forming fabri-cation equipment focusing system and comprises focusing arrangement, prime focus power supply, secondary focusing power supply, computer control unit; Electron beam quick forming fabri-cation equipment adopts short magnetic lens to focus on, and described focusing arrangement is cylindrical structural, is installed on time nearly position of electron gun electron beam outlet, described prime focus power supply, itself and prime focus winding switching; Described secondary focusing power supply, it focuses on winding switching with secondary; Described computer control unit is connected with prime focus power supply and secondary focusing power supply respectively.Hinge structure, the utility model has the dynamic loss reducing magnetic field, introduces dynamic compensation function and suppresses the dynamic supplementary load loss of full magnetic circuit on advantages such as the impacts of focusing accuracy.
Description
Technical field
The utility model relates to electron beam process equipment technical field, particularly a kind of electron beam quick forming fabri-cation equipment focusing system.
Background technology
Electron beam rapid shaping is the desirable rapid prototyping & manufacturing technology of the complicated metal parts of high-performance, has vast potential for future development in fields such as Aero-Space, automobile and biomedicines.Electron beam rapid prototyping & manufacturing technology adopts electron beam under control of the computer by the information deposite metal powder selectively of part section profile, and by piling up layer by layer, until whole part has all melted, finally remove unnecessary powder and just obtained required three-dimensional objects.Compared with laser and beam-plasma rapid shaping, electron beam rapid shaping has obviously advantage, and as high in capacity usage ratio, rapidoprint extensively, areflexia, process velocity are fast, vacuum environment is pollution-free and operating cost is low etc.And electron beam quick forming fabri-cation equipment is a kind of high-tech product combining the multiple technologies such as physical vacuum, precision optical machinery, electronic technology, electron optics, high voltage technique, computer and control technology.
The effect of electron beam quick forming fabri-cation equipment focusing arrangement ensures that the beam spot of each scanning element of electron beam in same plane is in the same size.Electron beam quick forming fabri-cation equipment relies on the movement locus being used for operating electron beam in magnetic field, requires that electron beam can accurately movement fast.If the focus current of electron beam keeps constant, is change to some extent in the beam spot of electron beam fast moving process each point, namely produce and defocus.In order to suppress to defocus, focusing arrangement exciting current must carry out dynamic corrections.Magnetic flux density and the exciting current in focusing arrangement static process magnetic field have approximate linear relationship, but dynamic process is due to the impact of the factors such as magnetic circuit additional dynamic loss, in very complicated non-linear relation between the magnetic flux density in magnetic field and exciting current, therefore in the focusing system and control system thereof of electron beam quick forming fabri-cation equipment, emphasis will solve Rapid Variable Design and the dynamic precision compensation problem in magnetic field.
Summary of the invention
Technical problem to be solved in the utility model is to provide and a kind ofly can reduces magnetic circuit dynamic loss and introduce dynamic exciting current compensate function to offset the electron beam quick forming fabri-cation equipment focusing system of the dynamic supplementary load loss of magnetic circuit on the impact of focusing accuracy.
The technical scheme that the utility model solves the problems of the technologies described above is as follows: a kind of electron beam quick forming fabri-cation equipment focusing system, comprises focusing arrangement, prime focus power supply, secondary focusing power supply, computer control unit;
Electron beam quick forming fabri-cation equipment adopts short magnetic lens to focus on, described focusing arrangement is cylindrical structural, be installed on time nearly position of electron gun electron beam outlet, comprise magnetic conduction outside framework, magnetic conduction inner frame, electron beam channel, prime focus winding, secondary focusing winding, magnetic gap; Described magnetic conduction inner frame is hollow cylinder, and described magnetic conduction outside framework is placed in the cylindrical side of magnetic conduction inner frame, and magnetic conduction outside framework and magnetic conduction inner frame form a cavity; Described electron beam channel is the hollow cylindrical that magnetic conduction inner frame cylindrical inner wall surrounds; Described prime focus winding and the secondary winding that focuses on, all around between the cylindrical side and inner circle side of magnetic conduction inner frame cylinder, are positioned at the cavity of magnetic conduction outside framework and magnetic conduction inner frame formation; Described magnetic gap is be embedded in the annulus pillar on magnetic conduction inner frame cylinder, the disjunction magnetic conduction passage of magnetic conduction inner frame column part; Described magnetic conduction outside framework and magnetic conduction inner frame are by permeability magnetic material powder and organic insulation glue moulding by casting, and described magnetic gap is insulating material;
Described prime focus power supply, itself and prime focus winding switching, will to determining voltage signal
with sampling voltage signal U
fby comparing, PI regulates computing and after amplifying process, adjustment output voltage, to the prime focus electric current I of prime focus winding stable output
f;
Described secondary focusing power supply, itself and prime focus winding switching, will to determining voltage signal
and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U
fby compare and amplify process after, adjustment output voltage, to pair focus on winding export secondary focus current I
f;
Described computer control unit bears the master control task of electron beam quick forming fabri-cation equipment, and it is connected with prime focus power supply and secondary focusing power supply respectively, exports to determining voltage signal comprising respectively to prime focus power supply and secondary focusing power supply
with
.
The beneficial effects of the utility model are: magnetic conduction outside framework, magnetic conduction inner frame are by permeability magnetic material powder and organic insulation glue moulding by casting, and magnetic gap is insulating material, reduces the dynamic loss in magnetic field.
On the basis of technique scheme, the utility model can also do following improvement.
Further technical scheme, described prime focus power supply comprises current rectifying and wave filtering circuit ZL1, power Correctional tube T1, diode D1, inductance L 1, sample resistance R6, resistance R1 ~ R5, electric capacity C1 and operational amplifier IC1;
The input of described current rectifying and wave filtering circuit ZL1 connects the alternating current of outside input, and the cathode output end of current rectifying and wave filtering circuit ZL1 is connected to the collector electrode of NPN type power Correctional tube T1, and cathode output end is connected to the anode of diode D1;
Described power Correctional tube T1 base stage is connected to the output of operational amplifier IC1 through resistance R5, power Correctional tube T1 emitter is connected with diode D1 negative electrode, and being connected to sample resistance R6 one end and resistance R3 one end, the described resistance R3 other end is connected to the inverting input of operational amplifier IC1;
Output voltage signal U on described sample resistance R6
ffor feedback signal, sample resistance R6 other end ground connection, and be connected with prime focus winding one end, the prime focus winding other end is connected to the anode of diode D1 by inductance L 1;
The in-phase input end of described operational amplifier IC1 is through resistance R1 ground connection, and the inverting input of operational amplifier IC1 connects computer control unit voltage given signal through resistance R2
output, the output of operational amplifier IC1 is connected to the inverting input of operational amplifier IC1 through resistance R4 and electric capacity C1.
Adopt the beneficial effect of above-mentioned further scheme to be: tandem electric inductance L1 in prime focus winding loop, suppress secondary and focus on winding dynamic current affects prime focus winding electric current by transformer action.
Further technical scheme, described secondary focusing power supply comprises current rectifying and wave filtering circuit ZL2, power Correctional tube T2 and T3, diode D2 and D3, sample resistance R13, resistance R7 ~ R12, electric capacity C2 and operational amplifier IC2;
The input of described current rectifying and wave filtering circuit ZL2 connects two groups of alternating currents of outside input, one end that output common port and the pair of current rectifying and wave filtering circuit ZL2 focus on winding connects, cathode output end is connected to the collector electrode of NPN type power Correctional tube T2, and cathode output end is connected to the collector electrode of positive-negative-positive power Correctional tube T3;
The in-phase input end of described operational amplifier IC2 is through resistance R7 ground connection, and the inverting input of described operational amplifier IC2 connects computer control unit voltage given signal through resistance R9, resistance R8
output, described electric capacity C2 is in parallel with resistance R9, described resistance R8, resistance R9 and electric capacity C2 form the input circuit of operational amplifier IC2, the inverting input of described resistance R11 two ends difference concatenation operation amplifier IC2 and output, the output of described operational amplifier IC2 is connected with the base stage of power Correctional tube T2 and power Correctional tube T3 respectively through resistance R12, and the inverting input of operational amplifier IC2 connects sample resistance R13 one end through resistance R10;
Be connected to one end of resistance R13 after the emitter of described power Correctional tube T2 and power Correctional tube T3 is connected together, the other end ground connection of resistance R13, and connect with the other end that pair focuses on winding; Sample resistance R13 exports secondary focus current I
f, voltage signal U
ffor feedback signal, the negative electrode of described diode D2 connects with the collector electrode of power Correctional tube T2, the anode of diode D2 connects with the emitter of power Correctional tube T2, the anode of diode D3 connects with the collector electrode of power Correctional tube T3, and the negative electrode of diode D3 connects with the emitter of power Correctional tube T3.
The beneficial effect of above-mentioned further scheme is adopted to be: magnetic field exists dynamic loss, when static excitation electric current is equal with dynamic exciting current instantaneous value, the magnetic flux density instantaneous value of the focusing magnetic field produced does not wait, the input circuit of the operational amplifier IC2 be made up of R8, R9 and C2, voltage given signal is
and the linear combination of rate of change is as total Setting signal, secondary focusing power supply is made to have dynamic corrections function,
instantaneous value is identical and rate of change is different, and the magnetic flux density instantaneous value of focusing magnetic field remains unchanged substantially.
Accompanying drawing explanation
Fig. 1 is the utility model focusing arrangement cutaway view;
Fig. 2 is prime focus power principle figure;
Fig. 3 is secondary focusing power supply schematic diagram;
Fig. 4 is electron gun structure schematic diagram.
In accompanying drawing, the list of parts representated by each label is as follows:
1, magnetic conduction outside framework, 2, magnetic conduction inner frame, 3, electron beam channel, 4, secondaryly winding is focused on, 5, prime focus winding, 6, magnetic gap, 7, prime focus power supply, 8, secondary focusing power supply, 9, negative electrode, 10, inclined grid, 11, anode, 12, focusing arrangement, 13, partially sweeping device, 14, electron beam, 15, partially put down face.
Embodiment
Be described principle of the present utility model and feature below in conjunction with accompanying drawing, example, only for explaining the utility model, is not intended to limit scope of the present utility model.
As shown in Figures 1 to 4, a kind of electron beam quick forming fabri-cation equipment focusing system, comprises focusing arrangement 12, prime focus power supply 7, secondary focusing power supply 8, computer control unit;
Electron beam quick forming fabri-cation equipment adopts short magnetic lens to focus on, described focusing arrangement 12 is cylindrical structural, be installed on time nearly position that electron gun electron beam 14 exports, comprise magnetic conduction outside framework 1, magnetic conduction inner frame 2, electron beam channel 3, secondary focusing winding 4, prime focus winding 5, magnetic gap 6; Described magnetic conduction inner frame 2 is hollow cylinder, and described magnetic conduction outside framework 1 is placed in the cylindrical side of magnetic conduction inner frame 2, and magnetic conduction outside framework 1 and magnetic conduction inner frame 2 form a cavity; Described electron beam channel 3 is the hollow cylindrical that magnetic conduction inner frame 2 cylindrical inner wall surrounds; Described prime focus winding 5 and the secondary winding 4 that focuses on, all around between the cylindrical side and inner circle side of magnetic conduction inner frame 2 cylinder, are positioned at the cavity of magnetic conduction outside framework 1 and magnetic conduction inner frame 2 formation; Described magnetic gap 6 for being embedded in the annulus pillar on magnetic conduction inner frame 2 cylinder, the disjunction magnetic conduction passage of magnetic conduction inner frame 2 column part; Described magnetic conduction outside framework 1 and magnetic conduction inner frame 2 are by permeability magnetic material powder and organic insulation glue moulding by casting, and described magnetic gap 6 is insulating material;
Described prime focus power supply 7, it is connected with prime focus winding 5, will to determining voltage signal
with sampling voltage signal U
fby comparing, PI regulates computing and after amplifying process, adjustment output voltage, to the prime focus electric current I of prime focus winding 4 stable output
f;
Described secondary focusing power supply 8, it is connected with prime focus winding 4, will to determining voltage signal
and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U
fby compare and amplify process after, adjustment output voltage, to pair focus on winding 4 export secondary focus current I
f;
Described computer control unit bears the master control task of electron beam quick forming fabri-cation equipment, and it is connected with prime focus power supply 7 and secondary focusing power supply 8 respectively, exports to determining voltage signal comprising respectively to prime focus power supply 7 and secondary focusing power supply 8
with
.
Described prime focus power supply 7 comprises current rectifying and wave filtering circuit ZL1, power Correctional tube T1, diode D1, inductance L 1, sample resistance R6, resistance R1 ~ R5, electric capacity C1 and operational amplifier IC1;
The input of described current rectifying and wave filtering circuit ZL1 connects the alternating current of outside input, and the cathode output end of current rectifying and wave filtering circuit ZL1 is connected to the collector electrode of NPN type power Correctional tube T1, and cathode output end is connected to the anode of diode D1;
Described power Correctional tube T1 base stage is connected to the output of operational amplifier IC1 through resistance R5, power Correctional tube T1 emitter is connected with diode D1 negative electrode, and being connected to sample resistance R6 one end and resistance R3 one end, the described resistance R3 other end is connected to the inverting input of operational amplifier IC1;
Output voltage signal U on described sample resistance R6
ffor feedback signal, sample resistance R6 other end ground connection, and be connected with prime focus winding 5 one end, prime focus winding 5 other end is connected to the anode of diode D1 by inductance L 1;
The in-phase input end of described operational amplifier IC1 is through resistance R1 ground connection, and the inverting input of operational amplifier IC1 connects computer control unit voltage given signal through resistance R2
output, the output of operational amplifier IC1 is connected to the inverting input of operational amplifier IC1 through resistance R4 and electric capacity C1.
Described secondary focusing power supply 8 comprises current rectifying and wave filtering circuit ZL2, power Correctional tube T2 and T3, diode D2 and D3, sample resistance R13, resistance R7 ~ R12, electric capacity C2 and operational amplifier IC2;
The input of described current rectifying and wave filtering circuit ZL2 connects two groups of alternating currents of outside input, one end that output common port and the pair of current rectifying and wave filtering circuit ZL2 focus on winding 4 connects, cathode output end is connected to the collector electrode of NPN type power Correctional tube T2, and cathode output end is connected to the collector electrode of positive-negative-positive power Correctional tube T3;
The in-phase input end of described operational amplifier IC2 is through resistance R7 ground connection, and the inverting input of described operational amplifier IC2 connects computer control unit voltage given signal through resistance R9, resistance R8
output, described electric capacity C2 is in parallel with resistance R9, described resistance R8, resistance R9 and electric capacity C2 form the input circuit of operational amplifier IC2, the inverting input of described resistance R11 two ends difference concatenation operation amplifier IC2 and output, the output of described operational amplifier IC2 is connected with the base stage of power Correctional tube T2 and power Correctional tube T3 respectively through resistance R12, and the inverting input of operational amplifier IC2 connects sample resistance R13 one end through resistance R10;
Be connected to one end of resistance R13 after the emitter of described power Correctional tube T2 and power Correctional tube T3 is connected together, the other end ground connection of resistance R13, and connect with the other end that pair focuses on winding 4; Sample resistance R13 exports secondary focus current I
f, voltage signal U
ffor feedback signal, the negative electrode of described diode D2 connects with the collector electrode of power Correctional tube T2, the anode of diode D2 connects with the emitter of power Correctional tube T2, the anode of diode D3 connects with the collector electrode of power Correctional tube T3, and the negative electrode of diode D3 connects with the emitter of power Correctional tube T3.
The operation principle of this device, described computer control unit exports to determining voltage signal comprising respectively to prime focus power supply 7 and secondary focusing power supply 8
with
, prime focus power supply 7 will to determining voltage signal
with sampling voltage signal U
fby comparing, PI regulates computing and after amplifying process, adjustment output voltage, to the prime focus electric current I of prime focus winding 4 stable output
f; Secondary focusing power supply 8, will to determining voltage signal
and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U
fby compare and amplify process after, adjustment output voltage, to pair focus on winding 4 export secondary focus current I
f.
The foregoing is only preferred embodiment of the present utility model, not in order to limit the utility model, all within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection range of the present utility model.
Claims (3)
1. an electron beam quick forming fabri-cation equipment focusing system, comprises focusing arrangement (12), prime focus power supply (7), secondary focusing power supply (8), computer control unit;
Electron beam quick forming fabri-cation equipment adopts short magnetic lens to focus on, described focusing arrangement (12) is cylindrical structural, be installed on time nearly position that electron gun electron beam (14) exports, it comprises magnetic conduction outside framework (1), magnetic conduction inner frame (2), electron beam channel (3), prime focus winding (5), secondary focusing winding (4), magnetic gap (6); Described magnetic conduction inner frame (2) is hollow cylinder, described magnetic conduction outside framework (1) is placed in the cylindrical side of magnetic conduction inner frame (2), and magnetic conduction outside framework (1) and magnetic conduction inner frame (2) form a cavity; The hollow cylindrical that described electron beam channel (3) surrounds for magnetic conduction inner frame (2) cylindrical inner wall; Described prime focus winding (5) and the secondary winding (4) that focuses on, all around between the cylindrical side and inner circle side of magnetic conduction inner frame (2) cylinder, are positioned at the cavity that magnetic conduction outside framework (1) and magnetic conduction inner frame (2) are formed; Described magnetic gap (6) for being embedded in the annulus pillar on magnetic conduction inner frame (2) cylinder, the disjunction magnetic conduction passage of magnetic conduction inner frame (2) column part; Described magnetic conduction outside framework (1) and magnetic conduction inner frame (2) are by permeability magnetic material powder and organic insulation glue moulding by casting, and described magnetic gap (6) is insulating material;
Described prime focus power supply (7), it is connected with prime focus winding (5), will to determining voltage signal
with sampling voltage signal U
fby comparing, PI regulates computing and after amplifying process, adjustment output voltage, to the prime focus electric current I of prime focus winding (5) stable output
f;
Described secondary focusing power supply (8), it focuses on winding (4) with pair and is connected, will to determining voltage signal
and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U
fby compare and amplify process after, adjustment output voltage, to pair focus on winding (4) export secondary focus current I
f;
Described computer control unit bears the master control task of electron beam quick forming fabri-cation equipment, it is connected with prime focus power supply (7) and secondary focusing power supply (8) respectively, exports to determining voltage signal respectively to prime focus power supply (7) and secondary focusing power supply (8)
with
2. a kind of electron beam quick forming fabri-cation equipment focusing system according to claim 1, is characterized in that: described prime focus power supply (7) comprises current rectifying and wave filtering circuit ZL1, power Correctional tube T1, diode D1, inductance L 1, sample resistance R6, resistance R1 ~ R5, electric capacity C1 and operational amplifier IC1;
The input of described current rectifying and wave filtering circuit ZL1 connects the alternating current of outside input, and the cathode output end of current rectifying and wave filtering circuit ZL1 is connected to the collector electrode of NPN type power Correctional tube T1, and cathode output end is connected to the anode of diode D1;
Described power Correctional tube T1 base stage is connected to the output of operational amplifier IC1 through resistance R5, power Correctional tube T1 emitter is connected with diode D1 negative electrode, and being connected to sample resistance R6 one end and resistance R3 one end, the described resistance R3 other end is connected to the inverting input of operational amplifier IC1;
Output voltage signal U on described sample resistance R6
ffor feedback signal, sample resistance R6 other end ground connection, and be connected with prime focus winding (5) one end, prime focus winding (5) other end is connected to the anode of diode D1 by inductance L 1;
The in-phase input end of described operational amplifier IC1 is through resistance R1 ground connection, and the inverting input of operational amplifier IC1 connects computer control unit voltage given signal through resistance R2
output, the output of operational amplifier IC1 is connected to the inverting input of operational amplifier IC1 through resistance R4 and electric capacity C1.
3. a kind of electron beam quick forming fabri-cation equipment focusing system according to claim 1, is characterized in that: described secondary focusing power supply (8) comprises current rectifying and wave filtering circuit ZL2, power Correctional tube T2 and T3, diode D2 and D3, sample resistance R13, resistance R7 ~ R12, electric capacity C2 and operational amplifier IC2;
The input of described current rectifying and wave filtering circuit ZL2 connects two groups of alternating currents of outside input, one end that output common port and the pair of current rectifying and wave filtering circuit ZL2 focus on winding (4) connects, cathode output end is connected to the collector electrode of NPN type power Correctional tube T2, and cathode output end is connected to the collector electrode of positive-negative-positive power Correctional tube T3;
The in-phase input end of described operational amplifier IC2 is through resistance R7 ground connection, and the inverting input of described operational amplifier IC2 connects computer control unit voltage given signal through resistance R9, resistance R8
output, described electric capacity C2 is in parallel with resistance R9, described resistance R8, resistance R9 and electric capacity C2 form the input circuit of operational amplifier IC2, the inverting input of described resistance R11 two ends difference concatenation operation amplifier IC2 and output, the output of described operational amplifier IC2 is connected with the base stage of power Correctional tube T2 and power Correctional tube T3 respectively through resistance R12, and the inverting input of operational amplifier IC2 connects sample resistance R13 one end through resistance R10;
Be connected to one end of resistance R13 after the emitter of described power Correctional tube T2 and power Correctional tube T3 is connected together, the other end ground connection of resistance R13, and connect with the other end that pair focuses on winding (4); Sample resistance R13 exports secondary focus current I
f, voltage signal U
ffor feedback signal, the negative electrode of described diode D2 connects with the collector electrode of power Correctional tube T2, the anode of diode D2 connects with the emitter of power Correctional tube T2, the anode of diode D3 connects with the collector electrode of power Correctional tube T3, and the negative electrode of diode D3 connects with the emitter of power Correctional tube T3.
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| CN201420440656.0U CN204167255U (en) | 2014-08-06 | 2014-08-06 | A kind of electron beam quick forming fabri-cation equipment focusing system |
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| CN201420440656.0U CN204167255U (en) | 2014-08-06 | 2014-08-06 | A kind of electron beam quick forming fabri-cation equipment focusing system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104658842A (en) * | 2014-08-06 | 2015-05-27 | 桂林狮达机电技术工程有限公司 | Focusing system and control method for electron beam quick melting manufacturing equipment |
| CN104900469A (en) * | 2015-06-25 | 2015-09-09 | 武汉大学 | Real-time monitoring and rapidly-prototyped equipment based on electron beam and ion beam composite technology and method for manufacturing component using the same |
-
2014
- 2014-08-06 CN CN201420440656.0U patent/CN204167255U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104658842A (en) * | 2014-08-06 | 2015-05-27 | 桂林狮达机电技术工程有限公司 | Focusing system and control method for electron beam quick melting manufacturing equipment |
| CN104658842B (en) * | 2014-08-06 | 2017-02-01 | 桂林狮达机电技术工程有限公司 | Focusing system and control method for electron beam quick melting manufacturing equipment |
| CN104900469A (en) * | 2015-06-25 | 2015-09-09 | 武汉大学 | Real-time monitoring and rapidly-prototyped equipment based on electron beam and ion beam composite technology and method for manufacturing component using the same |
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