CN103077876B - The magnetic focusing arrangement of electron beam process equipment and control method thereof - Google Patents
The magnetic focusing arrangement of electron beam process equipment and control method thereof Download PDFInfo
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- CN103077876B CN103077876B CN201310009916.9A CN201310009916A CN103077876B CN 103077876 B CN103077876 B CN 103077876B CN 201310009916 A CN201310009916 A CN 201310009916A CN 103077876 B CN103077876 B CN 103077876B
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Abstract
The present invention discloses a kind of magnetic focusing arrangement and control method thereof of electron beam process equipment, its magnetic focusing arrangement has two groups of independently windings, wherein A winding is main winding, the number of turn is more, pass into adjustable direct current, its power supply adoption rate-integral adjustment mode and have and carry out demagnetization function to magnetic circuit, makes excited work electric current and magnetic flux density single-valued relationship, ensures the repeatability of beam spot focal length.B winding is auxiliary winding, and the number of turn is less, and corresponding inductance value is less, its power supply adoption rate FEEDBACK CONTROL, for quick fine tuning beam spot focal length.The present invention can eliminate the impact of magnetic hysteresis line, makes the exciting current of magnetic focusing arrangement and the magnetic flux density of its generation there is single-valued relationship; The function of rapid adjustment electron beam focal length can be realized simultaneously.
Description
Technical field
The present invention relates to electron beam process equipment field, be specifically related to a kind of magnetic focusing arrangement and control method thereof of electron beam process equipment.
Background technology
With magnetic lens magnetic field, Lorentz force is produced to electron beam in electron beam process equipment, electron beam is led and regulates its profile, thus reach and allow the object of electron-beam convergence.At present, magnetic lens magnetic field, in general produced by magnetic focusing arrangement, and this magnetic focusing system is primarily of excitation winding and power supply composition.The direction of magnetic field in electron beam channel that excitation winding produces is parallel with electron beam heading, and excitation winding is connected with power supply.Power supply is adjustable DC power supply, because excitation winding is for the precision General Requirements higher (deviation≤0.1%) of exciting current, therefore the detecting element adopting Low Drift Temperature precision resistance as exciting current is needed in power supply, and coordinate employing constant current control method, just can reach the required precision of exciting current.But there are two shortcomings in actual applications in this magnetic focusing arrangement:
Although the precision of 1 exciting current and repeatability, its electric power supply control system can ensure, the repeatability of the focal length of beam spot is difficult to the repeatability precision reaching exciting current.Main cause is that the magnetic circuit of focusing arrangement has ferromagnetic material, and the exciting current of ferromagnetic material and the magnetic flux density of generation are not linear relationships, but a kind of magnetic hysteresis line relation that people know, the exciting current of same size can produce multiple magnetic flux density.
2, excitation winding circuit inductance amount is comparatively large, is unfavorable for the quick adjustment of exciting current, can not meets the quick-adjustsing requirement of beam spot focal length.
Visible, require, in higher electron beam process equipment (as precise electronic bundle welding machine, electron beam quick forming fabri-cation equipment), to be necessary further improvement to the shortcoming of existing magnetic focusing arrangement in accuracy.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of magnetic focusing arrangement and control method thereof of electron beam process equipment, and it can eliminate the impact of magnetic hysteresis line, makes the exciting current of magnetic focusing arrangement and the magnetic flux density of its generation there is single-valued relationship; The function of rapid adjustment electron beam focal length can be realized simultaneously.
For solving the problem, the present invention is achieved by the following scheme:
The magnetic focusing arrangement of a kind of electron beam process equipment of the present invention, primarily of excitation winding and power supply composition.
Described excitation winding comprises main excitation winding and additive excitation winding, and the number of turn of main excitation winding is more than the number of turn of additive excitation winding.The direction of the magnetic field that main excitation winding and additive excitation winding produce in electron beam channel is all parallel with electron beam heading.
Described power supply comprises main electricity and auxiliary electric power supply.Main electricity is the adjustable DC power supply of adoption rate-integral adjustment, and is connected with main excitation winding.Auxiliary electric power supply is adjustable DC power supply or the alternating source of adoption rate feedback regulation, and is connected with additive excitation winding.
Above-mentioned main electricity includes the first current rectifying and wave filtering circuit, power Correctional tube, the first fly-wheel diode, the first sample resistance, throw over relay, the first adjuster and the second fly-wheel diode.The input of the first current rectifying and wave filtering circuit is connected with the AC power of outside, and the positive output end of the first current rectifying and wave filtering circuit is connected with the collector electrode of power Correctional tube, and the negative output terminal of the first current rectifying and wave filtering circuit is connected with the anode of the first fly-wheel diode.The emitter of power Correctional tube is connected with the negative electrode of the first fly-wheel diode, and connects with the common port of the control circuit of electron beam process equipment.The negative electrode of the first fly-wheel diode is connected via the common port of the first sample resistance with one group of three-terminal contact of throw over relay, and the anode of the first fly-wheel diode is directly connected with another common port organizing three-terminal contact of throw over relay.The normally opened contact of one group of three-terminal contact of throw over relay is connected, as output respectively with another normally-closed contact organizing three-terminal contact.The two ends of main excitation winding are connected on 2 outputs of throw over relay contact respectively.Second fly-wheel diode is attempted by the controlled winding two ends of throw over relay, and the anode of the second fly-wheel diode is connected with the common port of electron beam process equipment control circuit, the negative electrode of the second fly-wheel diode is connected with the output of electron beam process equipment central controller.One end of the controlled winding of throw over relay connects electron beam process equipment central controller, and the other end of the controlled winding of throw over relay is connected with the common port of electron beam process equipment control circuit.First adjuster receives the output main exciting current sampled signal of the first sample resistance and the main exciting current Setting signal of electron beam process equipment central controller output, by comparing, proportional, integral computing and after amplifying process, output signal is connected to the base stage of power Correctional tube.
Above-mentioned auxiliary electric power supply includes the second current rectifying and wave filtering circuit, N-type power tube, N-type power tube anti-paralleled diode, P type power tube, P type power tube anti-paralleled diode, the second sample resistance and the second adjuster.The input of the second current rectifying and wave filtering circuit is connected with 2 of outside groups of AC power, and the positive output end of the second current rectifying and wave filtering circuit connects the collector electrode of N-type power tube, and the negative output terminal of the second current rectifying and wave filtering circuit connects the collector electrode of P type power tube.The anode of N-type power tube anti-paralleled diode is connected on the emitter of N-type power tube, and the negative electrode of N-type power tube anti-paralleled diode is then connected on the collector electrode of N-type power tube.The negative electrode of P type power tube anti-paralleled diode is connected on the emitter of P type power tube, and the anode of P type power tube anti-paralleled diode is then connected on the collector electrode of P type power tube.Be connected to the common port of electron beam process equipment control circuit after the emitter of N-type power tube and the emitter of P type power tube are interconnected, and be connected through the second sample resistance one end with additive excitation winding.The other end of additive excitation winding is connected with the common port of the output positive-negative power of the second current rectifying and wave filtering circuit.Second adjuster receives the output additive excitation current sampling signal of the second sample resistance and the additive excitation given value of current signal of electron beam process equipment central controller output, by compare and amplify process after, output signal be connected to the base stage of N-type power tube and the base stage of P type power tube.
In such scheme, be also serially connected with in the current circuit of main excitation winding for suppressing faradic linear reactor.
In such scheme, main excitation winding and additive excitation winding are contained in the inside that one offers the airtight armor of magnetic gap respectively, and above-mentioned magnetic gap is opened in electron beam channel side.
The control method of the magnetic focusing arrangement of a kind of electron beam process equipment of the present invention, comprises following process:
When main electricity is started working, the main exciting current I of forward
fAset point is raised to, main exciting current I by zero
fAbe stable at set point, main excitation winding normally works; After normal end-of-job, main excitation winding enters demagnetization operating state, electron beam process equipment central controller, by controlling the Setting signal of exciting current of main excitation winding and the break-make of the controlled winding of throw over relay, completes demagnetization job step below: the main exciting current I of (1) forward
fArated value I is risen to by work at present value
fAN; (2) the main exciting current I of forward
fAbe down to zero; (3) oppositely throw over relay is switched; (4) reverse main exciting current I
fA0.5I is risen to by zero
fAN; (5) reverse main exciting current I
fAbe down to zero; (6) forward switches throw over relay; (7) the main exciting current I of forward
fA0.25I is risen to by zero
fAN; (8) the main exciting current I of forward
fAbe down to zero; (9) oppositely throw over relay is switched; (10) reverse main exciting current I
fA0.125I is risen to by zero
fAN; (11) reverse main exciting current I
fAbe down to zero; (12) forward switches throw over relay, and demagnetization terminates; Power supply can be closed or wait for the beginning that next time works.
When normally working, additive excitation electric current I
fBfollow the additive excitation given value of current signal intensity that electron beam process equipment central controller exports fast, additive excitation given value of current signal intensity waveform is set by technological requirement; Demagnetization operating state, additive excitation electric current I
fBbe zero.
Compared with prior art, embodiment of the present invention magnetic focusing arrangement has two groups of independently windings, wherein A winding is main winding, the number of turn is more, pass into adjustable direct current, its power supply adoption rate-integral adjustment mode and have and carry out demagnetization function to magnetic circuit, makes excited work electric current and magnetic flux density single-valued relationship, ensures the repeatability of beam spot focal length.B winding is auxiliary winding, and the number of turn is less, and corresponding inductance value is less, its power supply adoption rate FEEDBACK CONTROL, for quick fine tuning beam spot focal length.
Accompanying drawing explanation
Fig. 1 is the structural representation of the magnetic focusing arrangement of electron beam process equipment.Mark in figure: 1, armor; 2, magnetic gap; 3, electron beam channel; 2-7, main excitation winding; 4-7, additive excitation winding.
Fig. 2 is the circuit theory diagrams of main excitation winding power supply.Mark in figure: 2-1, the first current rectifying and wave filtering circuit; 2-2, power Correctional tube; 2-3, the first fly-wheel diode; 2-4, the first sample resistance; 2-5, linear reactor; 2-6, throw over relay (comprising contact and controlled winding two parts); 2-7, main excitation winding; 2-8, electron beam process equipment central controller; 2-9, the first adjuster; 2-10, the second fly-wheel diode.
Fig. 3 is the main exciting current I of main excitation winding
fAworking waveform figure.
Fig. 4 is the circuit theory diagrams of additive excitation winding power power supply.Mark in figure: 4-1, the second current rectifying and wave filtering circuit; 4-2, N-type power; The anti-paralleled diode of 4-3, N-type power tube; 4-4, P type power tube; The anti-paralleled diode of 4-5, P type power tube; 4-6, the second sample resistance; 4-7, additive excitation winding; 4-8, the second adjuster; 2-8 electron beam process equipment central controller.
Embodiment
A magnetic focusing arrangement for electron beam process equipment, primarily of excitation winding and power supply composition.Described excitation winding comprises 2 groups of excitation winding, and the direction of magnetic field in electron beam channel 3 that these 2 groups of excitation winding produce is parallel with electron beam heading.2 groups of excitation winding are arranged on the inside that one offers the airtight armor 1 of magnetic gap 2, and magnetic gap 2 is opened in electron beam channel 3 side.A wherein excitation winding number of turn in 2 groups of excitation winding is more, as main winding 2-7, passes into adjustable direct current; Another excitation winding number of turn is less, as auxiliary winding 4-7, can pass into change ratio alternating current faster, for dynamic focusing.In the present invention, the number of turn of main excitation winding 2-7 is 5 ~ 10 times of the number of turn of additive excitation winding 4-7.See Fig. 1.
Above-mentioned power supply comprises main electricity and auxiliary electric power supply.Main electricity is the adjustable DC power supply that adoption rate-integration (PI) regulates, and is connected with main excitation winding 2-7, and main electricity also has demagnetization work functions.The feedback regulation of auxiliary electric power supply adoption rate can be adjustable DC power supply or alternating source, and is connected with additive excitation winding 4-7.
A kind of main electricity as shown in Figure 2, forms primarily of the first current rectifying and wave filtering circuit 2-1, power Correctional tube 2-2, the first fly-wheel diode 2-3, the first sample resistance 2-4, linear reactor 2-5, throw over relay 2-6, the first adjuster 2-9 and the second fly-wheel diode 2-10.The input of the first current rectifying and wave filtering circuit 2-1 is connected with the AC power of outside, the positive output end of the first current rectifying and wave filtering circuit 2-1 is connected with the collector electrode c of power Correctional tube 2-2, and the negative output terminal of the first current rectifying and wave filtering circuit 2-1 is connected with the anode of the first fly-wheel diode 2-3.The emitter e of power Correctional tube 2-2 is connected with the negative electrode of the first fly-wheel diode 2-3, and connects with the common port of electron beam process equipment control circuit.The negative electrode of the first fly-wheel diode 2-3 is connected with the common port of one group of three-terminal contact of throw over relay 2-6 via after the first sample resistance 2-4 and the linear reactor 2-5 of serial connection, and the anode of the first fly-wheel diode 2-3 is directly connected with another common port organizing three-terminal contact of throw over relay 2-6.The normally opened contact of one group of three-terminal contact of throw over relay 2-6 is connected, as output respectively with another normally-closed contact organizing three-terminal contact.The two ends of main excitation winding 2-7 are connected on 2 outputs of throw over relay 2-6 contact respectively.The anode of the second fly-wheel diode 2-10 is connected with the common port of electron beam process equipment control circuit, second fly-wheel diode 2-10 is attempted by the controlled winding two ends of throw over relay 2-6, and the negative electrode of the second fly-wheel diode 2-10 is connected with the commutation signal output of electron beam process equipment central controller 2-8.First adjuster 2-9 receives the output main exciting current sampled signal of the first sample resistance 2-4 and the main exciting current Setting signal of electron beam process equipment central controller 2-8 output, by comparing, proportional, integral computing and after amplifying process, output signal is connected to the base stage b of power Correctional tube 2-2.
First current rectifying and wave filtering circuit 2-1 becomes alternating current into uncontrollable stable direct current.Power Correctional tube 2-2 works in amplification region, adjusts its emitter e electric current by adjusting its base stage b electric current.First fly-wheel diode 2-3 when power Correctional tube 2-2 emitter e electric current declines, main exciting current I
fAby this diode 2-3 afterflow.First sample resistance 2-4 is for the exciting current I of main excitation winding of sampling
fA, export and be proportional to main exciting current I
fAvoltage signal U
fA.When the additive excitation electric current I of additive excitation winding 4-7
fBwhen changing, by transformer action, make to induce electromotive force in winner's excitation winding, suppress induced current by linear reactor 2-5.Electron beam process equipment central controller 2-8 exports the Setting signal of the exciting current of main excitation winding 2-7
with the control signal of throw over relay.First adjuster 2-9 accepts main field circuit I
fAsampled signal U
fAwith main field circuit I
fAsetting signal
u
fAtwo signals by comparing, PI regulate computing and amplify process after output signal to the base stage b of power Correctional tube 2-2, regulate main exciting current I
fAsize.Throw over relay 2-6 is made up of contact and controlled winding.When throw over relay 2-6 controlled winding obtains electric, contact reversing switches, and main excitation winding 2-7 passes through reverse current; When throw over relay 2-6 controlled winding dead electricity, there is forward and switch in contact, main excitation winding 2-7 passes through forward current.Second fly-wheel diode 2-10 passes through this second fly-wheel diode 2-10 afterflow when throw over relay 2-6 controlled winding dead electricity.
Fig. 3 is the main exciting current I of main excitation winding 2-7
fAworking waveform figure.Forward main exciting current I during beginning
fAset point 0-t is raised to by zero
1section, then main exciting current I
fAbe stable at set point, t
1-t
2section is normal active section; After normal end-of-job, main excitation winding 2-7 enters demagnetization operating state, t
2-t
14section, electron beam process equipment central controller 2-8 is by controlling the Setting signal of the exciting current of main excitation winding 2-7
demagnetization job step is below completed: the main exciting current I of (1) forward with the controlled winding of throw over relay 2-6
fArated value I is risen to by work at present value
fAN, t
2-t
3section; (2) the main exciting current I of forward
fAbe down to zero, t
3-t
4section; (3) oppositely throw over relay is switched, t
4-t
5section; (4) reverse main exciting current I
fA0.5I is risen to by zero
fAN, t
5-t
6section (5) reverse main exciting current I
fAbe down to zero, t
6-t
7section; (6) forward switches throw over relay, t
7-t
8section; (7) the main exciting current I of forward
fA0.25I is risen to by zero
fAN, t
8-t
9section; (8) the main exciting current I of forward
fAbe down to zero, t
9-t
10section; (9) oppositely throw over relay is switched, t
10-t
11section; (10) reverse main exciting current I
fA0.125I is risen to by zero
fAN, t
11-t
12section, (11) reverse main exciting current I
fAbe down to zero, t
12-t
13section; (12) forward transfer relay, t
13-t
14section, demagnetization terminates; Power supply can be closed or wait for the beginning that next time works.
A kind of auxiliary electric power supply as shown in Figure 4, forms primarily of anti-paralleled diode 4-5, the second sample resistance 4-6 of anti-paralleled diode 4-3, P type power tube 4-4, P type power tube of the second current rectifying and wave filtering circuit 4-1, N-type power tube 4-2, N-type power tube and the second adjuster 4-8.The input of the second current rectifying and wave filtering circuit 4-1 is connected with 2 groups of AC power of outside, the positive output end of the second current rectifying and wave filtering circuit 4-1 connects the collector electrode of N-type power tube 4-2, and the negative output terminal of the second current rectifying and wave filtering circuit 4-1 connects the collector electrode of P type power tube 4-4.The negative electrode of N-type power tube anti-paralleled diode 4-3 is connected on the emitter of N-type power tube 4-2, and the anode of N-type power tube anti-paralleled diode 4-3 is then connected on the collector electrode of N-type power tube 4-2.The anode of P type power tube anti-paralleled diode 4-5 is connected on the emitter of P type power tube 4-4, and the negative electrode of P type power tube anti-paralleled diode 4-5 is then connected on the collector electrode of P type power tube 4-4.Be connected to the common port of electron beam process equipment control circuit after the emitter of N-type power tube 4-2 and the emitter of P type power tube 4-4 are interconnected, and be connected with one end of additive excitation winding 4-7 through the second sample resistance 4-6.The other end of additive excitation winding 4-7 is connected with the common port of the output positive-negative power of the second current rectifying and wave filtering circuit 4-1.Second adjuster 4-8 receives the output additive excitation electric current I of the second sample resistance 4-6
fBsampled signal U
fBwith the additive excitation given value of current signal that electron beam process equipment central controller 2-8 exports
by compare and amplify process after, output signal be connected to the base stage of N-type power tube 4-2 and the base stage of P type power tube 4-4.
Second current rectifying and wave filtering circuit 4-1 becomes two groups of alternating currents into uncontrollable straight positive and negative direct current.N-type power tube 4-2 regulates additive excitation winding 4-7 forward current.The anti-paralleled diode 4-3 of N-type power tube is as the fly-wheel diode of reverse current.P type power tube 4-4 regulates additive excitation winding 4-7 reverse current.The anti-paralleled diode 4-5 of P type power tube is as the fly-wheel diode of forward current.Second sample resistance 4-6 is for the additive excitation electric current I of the additive excitation winding 4-7 that samples
fB, export and be proportional to additive excitation electric current I
fBvoltage signal U
fB.Electron beam process equipment central controller 2-8 exports the additive excitation electric current I of additive excitation winding 4-7
fBsetting signal
second adjuster 4-8 accepts I
fBfeedback signal U
fBand I
fBsetting signal
two signals, after comparing, amplifying computing, output signal is to the base stage of N-type power tube 4-2 and P type power tube 4-4.
When normally working, additive excitation electric current I
fBfollow the additive excitation given value of current signal that electron beam process equipment central controller (2-8) exports fast
change, the change of additive excitation given value of current signal waveform is set by technological requirement; Demagnetization operating state, additive excitation electric current I
fBbe zero.
The present embodiment adopts two groups of three-terminal contacts to realize focusing on the forward and reverse energising of excitation winding to demagnetize, but scope is not limited thereto, and all giving focuses on excitation winding and alternately pass into the method that positive counter current carries out demagnetizing and namely belong to this patent protection range; This enforcement carries out demagnetization work after the normal end-of-job of excitation, but scope is not limited thereto, before or after excitation normally works, carry out demagnetization work, all belongs to this patent protection range.
Claims (5)
1. the magnetic focusing arrangement of electron beam process equipment, primarily of excitation winding and power supply composition; It is characterized in that:
Excitation winding comprises main excitation winding (2-7) and additive excitation winding (4-7), and the number of turn of main excitation winding (2-7) is more than the number of turn of additive excitation winding (4-7); The direction of the magnetic field that main excitation winding (2-7) and additive excitation winding (4-7) produce in electron beam channel is all parallel with electron beam heading;
Power supply comprises main electricity and auxiliary electric power supply; Main electricity is the adjustable DC power supply of adoption rate-integral adjustment, and is connected with main excitation winding (2-7); Auxiliary electric power supply is adjustable DC power supply or the alternating source of adoption rate feedback regulation, and is connected with additive excitation winding (4-7);
Above-mentioned main electricity includes the first current rectifying and wave filtering circuit (2-1), power Correctional tube (2-2), the first fly-wheel diode (2-3), the first sample resistance (2-4), throw over relay, the first adjuster (2-9) and the second fly-wheel diode (2-10); The input of the first current rectifying and wave filtering circuit (2-1) is connected with the AC power of outside, the positive output end of the first current rectifying and wave filtering circuit (2-1) is connected with the collector electrode of power Correctional tube (2-2), and the negative output terminal of the first current rectifying and wave filtering circuit (2-1) is connected with the anode of the first fly-wheel diode (2-3); The emitter of power Correctional tube (2-2) is connected with the negative electrode of the first fly-wheel diode (2-3), and connects with the common port of electron beam process equipment control circuit; Second fly-wheel diode (2-10) is attempted by the controlled winding two ends of throw over relay (2-6), and the negative electrode of the first fly-wheel diode (2-3) is connected via the common port of the first sample resistance (2-4) with one group of three-terminal contact of throw over relay (2-6), the anode of the first fly-wheel diode (2-3) is directly connected with another common port organizing three-terminal contact of throw over relay (2-6); The normally opened contact of one group of three-terminal contact of throw over relay (2-6) is connected with another normally-closed contact organizing three-terminal contact, the normally-closed contact of one group of three-terminal contact of throw over relay (2-6) is connected with another normally opened contact organizing three-terminal contact, as 2 outputs; The two ends of main excitation winding (2-7) are connected on above-mentioned 2 outputs of throw over relay (2-6) contact respectively; The anode of the second fly-wheel diode (2-10) is connected with the common port of electron beam process equipment control circuit, and the negative electrode of the second fly-wheel diode (2-10) is connected with the output of electron beam process equipment central controller (2-8); One end of the controlled winding of throw over relay (2-6) connects electron beam process equipment central controller (2-8), and the other end of the controlled winding of throw over relay (2-6) is connected with the common port of electron beam process equipment control circuit; First adjuster (2-9) receives the main exciting current Setting signal that the output main exciting current sampled signal of the first sample resistance (2-4) and electron beam process equipment central controller (2-8) export, by comparing, proportional, integral computing and after amplifying process, output signal is connected to the base stage of power Correctional tube (2-2).
2. the magnetic focusing arrangement of electron beam process equipment according to claim 1, is characterized in that:
Above-mentioned auxiliary electric power supply includes the second current rectifying and wave filtering circuit (4-1), N-type power tube (4-2), N-type power tube anti-paralleled diode (4-3), P type power tube (4-4), P type power tube anti-paralleled diode (4-5), the second sample resistance (4-6) and the second adjuster (4-8); The input of the second current rectifying and wave filtering circuit (4-1) is connected with 2 groups of AC power of outside, the positive output end of the second current rectifying and wave filtering circuit (4-1) connects the collector electrode of N-type power tube (4-2), and the negative output terminal of the second current rectifying and wave filtering circuit (4-1) connects the collector electrode of P type power tube (4-4); The anode of N-type power tube anti-paralleled diode (4-3) is connected on the emitter of N-type power tube (4-2), and the negative electrode of N-type power tube anti-paralleled diode (4-3) is then connected on the collector electrode of N-type power tube (4-2); The negative electrode of P type power tube anti-paralleled diode (4-5) is connected on the emitter of P type power tube (4-4), and the anode of P type power tube anti-paralleled diode (4-5) is then connected on the collector electrode of P type power tube (4-4); Be connected to the common port of electron beam process equipment control circuit after the emitter of N-type power tube (4-2) and the emitter of P type power tube (4-4) are interconnected, and be connected through the second sample resistance (4-6) one end with additive excitation winding (4-7); The other end of additive excitation winding (4-7) is connected with the common port of the output positive-negative power of the second current rectifying and wave filtering circuit (4-1); Second adjuster (4-8) receives the additive excitation given value of current signal that the output additive excitation current sampling signal of the second sample resistance (4-6) and electron beam process equipment central controller (2-8) export, by compare and amplify process after, output signal be connected to the base stage of N-type power tube (4-2) and the base stage of P type power tube (4-4).
3. the magnetic focusing arrangement of electron beam process equipment according to claim 1 and 2, is characterized in that: be also serially connected with in the current circuit of main excitation winding (2-7) for suppressing faradic linear reactor (2-5).
4. the magnetic focusing arrangement of electron beam process equipment according to claim 1, it is characterized in that: main excitation winding (2-7) and additive excitation winding (4-7) are contained in the inside that one offers the airtight armor (1) of magnetic gap (2) respectively, and above-mentioned magnetic gap (2) is opened in electron beam channel (3) side.
5. the control method of the magnetic focusing arrangement of electron beam process equipment that realizes of the magnetic focusing arrangement of electron beam process equipment according to claim 1, is characterized in that:
When main electricity is started working, the main exciting current I of forward
fAset point is raised to, main exciting current I by zero
fAbe stable at set point, main excitation winding normally works; After normal end-of-job, main excitation winding (2-7) enters demagnetization operating state, the Setting signal of exciting current of electron beam process equipment central controller (2-8) by the main excitation winding of control (2-7) and the break-make of the controlled winding of throw over relay (2-6), complete demagnetization job step below: the main exciting current I of (1) forward
fArated value I is risen to by work at present value
fAN; (2) the main exciting current I of forward
fAbe down to zero; (3) oppositely throw over relay is switched; (4) reverse main exciting current I
fA0.5I is risen to by zero
fAN; (5) reverse main exciting current I
fAbe down to zero; (6) forward switches throw over relay; (7) the main exciting current I of forward
fA0.25I is risen to by zero
fAN; (8) the main exciting current I of forward
fAbe down to zero; (9) oppositely throw over relay is switched; (10) reverse main exciting current I
fA0.125I is risen to by zero
fAN; (11) reverse main exciting current I
fAbe down to zero; (12) forward switches throw over relay, and demagnetization terminates; Powered-down or wait for works beginning next time;
When normally working, additive excitation electric current I
fBfollow the additive excitation given value of current signal intensity that electron beam process equipment central controller (2-8) exports fast, the change of additive excitation given value of current signal waveform is set by technological requirement; Demagnetization operating state, additive excitation electric current I
fBbe zero.
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| US20150090905A1 (en) * | 2013-09-27 | 2015-04-02 | Dmitri E. Nikonov | Micromagnet Based Extreme Ultra-Violet Radiation Source |
| CN104658842B (en) * | 2014-08-06 | 2017-02-01 | 桂林狮达机电技术工程有限公司 | Focusing system and control method for electron beam quick melting manufacturing equipment |
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Address after: No. A24, National High-tech Zone, Guilin City, Guangxi Zhuang Autonomous Region Patentee after: Guilin Shida Technology Co., Ltd. Address before: No. A24, National High-tech Zone, Guilin City, Guangxi Zhuang Autonomous Region Patentee before: Guilin Shida Electrical and Mechanical Technology Engineering Co., Ltd. |