CN104570918A - Deflection scanning system of electron beam rapid forming manufacturing device and control method - Google Patents

Abstract

The invention relates to a deflection scanning system of an electron beam rapid forming manufacturing device and a control method. The method comprises the following steps: determining the angle of deviation between an included angle of scanning traces of scanning axes s and t and a right angle by a test, and storing the value of the angle of deviation; dividing an electron beam scanning area according to a sector or a rectangular rule; determining the value of deflection current of each cell feature point by a test and recording an oblique coordinate deflection instruction of each feature point; converting the oblique coordinate deflection instruction of each feature point into a rectangular coordinate deflection instruction, and storing the rectangular coordinate deflection instruction of each feature point; calculating the rectangular coordinate deflection instruction of each scanning point in sequence according to the scanning trace of an electron beam; during running, converting the rectangular coordinate deflection instruction into the oblique coordinate instruction and sending the oblique coordinate instruction which is subjected to D/A conversion to a deflection scanning power supply. Compared with the prior art, the invention can reduce the dynamic loss of a magnetic field and introduces a dynamic compensation function to restrain the effect of the dynamic additional loss of a perfect magnetic circuit on the accuracy of deflection scanning.

Description

A kind of electron beam quick forming fabri-cation equipment sweeps system and control method partially

Technical field

The present invention relates to electron Beam Machining field, particularly a kind of electron beam quick forming fabri-cation equipment sweeps system and control method partially.

Background technology

Electron beam rapid shaping is the desirable rapid prototyping & manufacturing technology of the complicated metal parts of high-performance, has vast potential for future development in fields such as Aero-Space, automobile and biomedicines; Electron beam rapid prototyping & manufacturing technology adopts electron beam under control of the computer by the information deposite metal powder selectively of part section profile, and by piling up layer by layer, until whole part has all melted, finally remove unnecessary powder and just obtained required three-dimensional objects.Compared with laser and beam-plasma rapid shaping, electron beam rapid shaping has obviously advantage, and as high in capacity usage ratio, rapidoprint extensively, no reflection events, process velocity are fast, vacuum environment is pollution-free and operating cost is low etc.And electron beam quick forming fabri-cation equipment is a kind of high-tech product combining the multiple technologies such as physical vacuum, precision optical machinery, electronic technology, electron optics, High-Voltage Technology, computing machine and control technology.

The electronics light path of electron gun is formed primarily of focalizer and inclined sweeping device, 3D element manufacture process z-axis is completed by mechanical motion, x-y plane is completed by inclined sweeping device, the working mechanism of inclined sweeping device and mechanical motion have basic difference, and inclined sweeping device relies on the movement locus being used for operating electron beam in magnetic field.

Electron beam by the deflection angle that produces after scanister, pass between accelerating potential and the ampere turns partially sweeping winding exciting current is:

In formula, N _dfor scanning umber of turn; I _dfor scanning winding exciting current; B is inclined sweeping device distance between two poles; A is the net thickness of inclined sweeping device magnetic pole pole shoe; for deflection angle; In a certain plane being parallel to principal plane at focalizer image space, electron beam departs from the distance of center (zero sweeps current electron beam spot position partially) and is:

In formula, δ is electron beam off-centered distance in certain plane; H is the distance at this plane and scanister center.

In electron beam quick forming fabri-cation equipment, require that electron beam can accurately movement fast, and the magnetic induction density in magnetic field is driven by exciting current, the magnetic induction density in static process magnetic field and exciting current have approximate linear relationship, dynamic process is due to the impact of the factors such as magnetic circuit additional dynamic loss, the track while scan that partially sweeping device two sweeps axle partially in addition can not be accomplished completely vertical by manufacturing process restriction, in very complicated nonlinear relationship between the magnetic induction density in magnetic field and exciting current, therefore in the inclined sweeping device and their control system of electron beam quick forming fabri-cation equipment, emphasis will solve Rapid Variable Design and the dynamic precision compensation problem in magnetic field.

Summary of the invention

Technical matters to be solved by this invention is to provide a kind of dynamic loss, the introducing dynamic compensation function that can reduce magnetic field, suppresses the electron beam quick forming fabri-cation equipment of the dynamic added losses of full magnetic circuit on the impact of partially sweeping precision partially to sweep system and control method.

The technical scheme that the present invention solves the problems of the technologies described above is as follows: a kind of electron beam quick forming fabri-cation equipment sweeps the control method of system partially, comprises the steps:

Step 1: the actual angle measuring s, t scan axis track while scan, calculates the actual angle of s, t scan axis track while scan and the deviation angle α at 90 °, right angle, the numerical value of storage deviation angle α.

Step 2: by fan-shaped or rectangle rule, subregion is carried out to electron beam scanning region;

Step 3: the t winding power supply current value I determining each cell characteristic point _t, s winding power supply current value I _s, controlled the exciting current of inclined sweeping device by computer control unit, make deflection of a beam of electrons on cell characteristic point (the marginal intersection point in community), writing beam deflects into cell characteristic point top rade deflection current instruction (s, t);

Step 4: by each unique point top rade coordinate deflection current instruction (s, t) by coordinate transform coordinate deflection current at a right angle instruction (x, y), rectangular coordinate deflection current instruction (x, y) is stored in computer control unit;

Step 5: the rectangular coordinate deflection current instruction (x calculating each analyzing spot according to sweep trace of electron beam successively, y), the rectangular coordinate deflection current instruction (x of the analyzing spot on separatrix, y) be that dependent variable linearly changes and calculates with scanning coordinate by this marginal unique point numerical value, the rectangular coordinate deflection current instruction (x of each analyzing spot in community, y) be that dependent variable linearly changes and calculates with scanning coordinate by the unique point numerical value of this community, the rectangular coordinate deflection current instruction (x of each analyzing spot of calculated off-line is carried out before operation, y), and record is stored in computer control unit successively, or operationally online calculating in real time,

Step 6: during operation, computer control unit according to sweep trace of electron beam successively by the rectangular coordinate deflection current instruction (x of each analyzing spot, y) by coordinate transform bevel coordinate deflection current instruction (s, t), the instruction of s axle converts voltage given signal to through D/A deliver to s winding power supply, the instruction of t axle converts voltage given signal to through D/A deliver to t winding power supply.

Described step 6 comprises the following steps:

Step 6.1:s winding power supply is by detecting to determining voltage signal rate of change, will to determining voltage signal and rate of change carries out linear superposition as total Setting signal, total Setting signal and sampling voltage signal U _safter comparing and amplifying process, adjustment output voltage, exports s winding current I to s winding _s;

Step 6.2:t winding power supply is by detecting to determining voltage signal rate of change, will to determining voltage signal and rate of change carries out linear superposition as total Setting signal, total Setting signal and sampling voltage signal U _tafter comparing and amplifying process, adjustment output voltage, exports t winding current I to t winding _t.

A kind of electron beam quick forming fabri-cation equipment sweeps system partially, comprises inclined sweeping device, s winding power supply, t winding power supply and computer control unit;

Electron beam quick forming fabri-cation equipment adopts magnetic field partially to sweep, described inclined sweeping device is cylindrical-shaped structure, be installed on the position of electron gun electron beam outlet, comprise magnetic conduction framework, partially sweep winding and electron beam channel, described magnetic conduction framework is circular, inwall has equally distributed slot for winding, described winding of partially sweeping comprises described s winding and t winding, described s winding and t winding are all arranged in the slot for winding of magnetic conduction framework, described s winding and t winding are symmetric i.e. their axis difference 90 degree in the plane in Vertical electron beam passage direction, described s winding and t winding are on this plane respectively by sinusoidal and cosine distribution coiling, described electron beam channel is placed in describedly to be swept in winding inner circle partially, magnetic conduction framework is made up of the combined material of permeability magnetic material powder and organic insulation glue,

Described s winding power supply, itself and described s winding switching, will to determining voltage signal and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U _safter comparing and amplifying process, adjustment output voltage, exports s winding current I to s winding _s;

Described t winding power supply, itself and described t winding switching, will to determining voltage signal and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U _tafter comparing and amplifying process, adjustment output voltage, exports t winding current I to t winding _t;

Described computer control unit bears the master control task of electron beam quick forming fabri-cation equipment, and it is connected with s winding power supply, t winding power supply respectively, exports to determining voltage signal respectively to s winding power supply and t winding power supply with

The invention has the beneficial effects as follows: scanning area is divided into some communities according to certain rules, test obtains the accurate deflection current parameter of every cell characteristic point, in each community, the deflection current parameter of each analyzing spot is dependent variable linearly change calculations by this cell characteristic point parameter with scanning coordinate, and in scanning area, the deflection current parameter of every bit can accurately be revised; Magnetic conduction framework, by permeability magnetic material powder and organic insulation glue moulding by casting, reduces the dynamic loss in magnetic field.

On the basis of technique scheme, the present invention can also do following improvement.

Further technical scheme, described s winding power supply comprises current rectifying and wave filtering circuit ZLs, power Correctional tube T1s and T2s, diode D1s and D2s, sample resistance R7s, resistance R1s ~ R6s, electric capacity C1s and operational amplifier ICs;

The input end of described current rectifying and wave filtering circuit ZLs connects two groups of alternating currents of outside input, the output common port of current rectifying and wave filtering circuit ZLs connects with one end of s winding, cathode output end is connected to the collector of NPN type power Correctional tube T1s, and cathode output end is connected to the collector of positive-negative-positive power Correctional tube T2s;

The in-phase input end of described operational amplifier ICs is through resistance R1s ground connection, and the inverting input of described operational amplifier ICs connects computer control unit voltage given signal through resistance R3s, resistance R2s output terminal, described electric capacity C1s is in parallel with resistance R3s, described resistance R2s, resistance R3s and electric capacity C1s form the input circuit of operational amplifier ICs, the inverting input of described R5s two ends difference concatenation operation amplifier ICs and output terminal, the output terminal of described operational amplifier ICs is connected with the base stage of power Correctional tube T1s and power Correctional tube T2s respectively through resistance R6s, and the inverting input of operational amplifier ICs connects sample resistance R7s one end through resistance R4s;

Be connected to one end of resistance R7s after the emitter of described power Correctional tube T1s and power Correctional tube T2s is connected together, the other end ground connection of resistance R7s, and connect with the other end of s winding; Sample resistance R7s exports s winding current I _svoltage signal U _sfor feedback signal, the negative electrode of described diode D1s connects with the collector of power Correctional tube T1s, the anode of diode D1s connects with the emitter of power Correctional tube T1s, the anode of diode D2s connects with the collector of power Correctional tube T2s, and the negative electrode of diode D2s connects with the emitter of power Correctional tube T2s.

The beneficial effect of above-mentioned further scheme is adopted to be: magnetic field exists dynamic loss, when static excitation electric current is equal with dynamic exciting current instantaneous value, the induction instantaneous value of the magnetic deflection field magnetic produced does not wait, the input circuit of the operational amplifier ICs be made up of R2s, R3s and C1s, voltage given signal is and the linear combination of rate of change is as total Setting signal, s winding power supply is made to have dynamic corrections function, instantaneous value is identical and rate of change is different, and the induction instantaneous value of s axle magnetic deflection field remains unchanged substantially.

Further technical scheme, described t winding power supply comprises current rectifying and wave filtering circuit ZLt, power Correctional tube T1t and T2t, diode D1t and D2t, sample resistance R7t, resistance R1t ~ R6t, electric capacity C1t and operational amplifier ICt;

The input end of described current rectifying and wave filtering circuit ZLt connects two groups of alternating currents of outside input, the output common port of current rectifying and wave filtering circuit ZLt connects with one end of t winding, cathode output end is connected to the collector of NPN type power Correctional tube T1t, and cathode output end is connected to the collector of positive-negative-positive power Correctional tube T2t;

The in-phase input end of described operational amplifier ICt is through resistance R1t ground connection, and the inverting input of described operational amplifier ICt connects computer control unit voltage given signal through resistance R3t, resistance R2t output terminal, described electric capacity C1t is in parallel with resistance R3t, described resistance R2t, resistance R3t and electric capacity C1t form the input circuit of operational amplifier ICt, the inverting input of described R5t two ends difference concatenation operation amplifier ICt and output terminal, the output terminal of described operational amplifier ICt is connected with the base stage of power Correctional tube T1t and power Correctional tube T2t respectively through resistance R6t, and the inverting input of operational amplifier ICt connects sample resistance R7t one end through resistance R4t;

Be connected to one end of resistance R7t after the emitter of described power Correctional tube T1t and power Correctional tube T2t is connected together, the other end ground connection of resistance R7t, and connect with the other end of t winding; Sample resistance R7t exports t winding current I _tvoltage signal U _tfor feedback signal, the negative electrode of described diode D1t connects with the collector of power Correctional tube T1t, the anode of diode D1t connects with the emitter of power Correctional tube T1t, the anode of diode D2t connects with the collector of power Correctional tube T2t, and the negative electrode of diode D2t connects with the emitter of power Correctional tube T2t.

The beneficial effect of above-mentioned further scheme is adopted to be: magnetic field exists dynamic loss, when static excitation electric current is equal with dynamic exciting current instantaneous value, the induction instantaneous value of the magnetic deflection field produced does not wait, the input circuit of the operational amplifier ICt be made up of R2t, R3t and C1t, voltage given signal is and the linear combination of rate of change is as total Setting signal, t winding power supply is made to have dynamic corrections function, instantaneous value is identical and rate of change is different, and the induction instantaneous value of t axle magnetic deflection field remains unchanged substantially.

Accompanying drawing explanation

Fig. 1 is that electron beam of the present invention sweeps system control process figure partially;

Fig. 2 is inclined sweeping device structural representation;

Fig. 3 is the vertical view of Fig. 2;

Fig. 4 is s winding power supply schematic diagram;

Fig. 5 is t winding power supply schematic diagram;

Fig. 6 is electron gun structure schematic diagram;

Fig. 7 is coordinate transform schematic diagram;

Fig. 8 is sweep limit fanned partition figure;

Fig. 9 is sweep limit rectangular sub-area figure.

In accompanying drawing, the list of parts representated by each label is as follows:

1, magnetic conduction framework, 2, partially sweep winding, 3, electron beam channel, 4, s winding power supply, 5, t winding power supply, 2-1, s winding, 2-2, t winding, 6, negative electrode, 7, partially grid, 8, anode, 9, focalizer, 10, partially sweeping device, 11, electron beam, 12, partially put down face.

Embodiment

Be described principle of the present invention and feature below in conjunction with accompanying drawing, example, only for explaining the present invention, is not intended to limit scope of the present invention.

As shown in Figure 1, a kind of electron beam quick forming fabri-cation equipment sweeps the control method of system partially, comprises the steps:

Step 1: the actual angle measuring s, t scan axis track while scan, calculates the actual angle of s, t scan axis track while scan and the deviation angle α at 90 °, right angle, the numerical value of storage deviation angle α;

Step 2: by fan-shaped or rectangle rule, subregion is carried out to electron beam 11 scanning area;

Step 3: the t winding power supply 5 current value I determining each cell characteristic point _t, s winding power supply 4 current value I _s, controlled the exciting current of inclined sweeping device 10 by computer control unit, electron beam 11 is deflected on cell characteristic point, and writing beam 11 deflects into cell characteristic point top rade deflection current instruction (s, t);

Step 4: by each unique point top rade coordinate deflection current instruction (s, t) by coordinate transform coordinate deflection current at a right angle instruction (x, y), rectangular coordinate deflection current instruction (x, y) is stored in computer control unit;

Step 5: the rectangular coordinate deflection current instruction (x calculating each analyzing spot according to electron beam 11 track while scan successively, y), the rectangular coordinate deflection current instruction (x of the analyzing spot on separatrix, y) be that dependent variable linearly changes and calculates with scanning coordinate by this marginal unique point numerical value, the rectangular coordinate deflection current instruction (x of each analyzing spot in community, y) be that dependent variable linearly changes and calculates with scanning coordinate by the unique point numerical value of this community, the rectangular coordinate deflection current instruction (x of each analyzing spot of calculated off-line is carried out before operation, y), and record is stored in computer control unit successively, or operationally online calculating in real time,

Step 6: during operation, computer control unit according to electron beam 11 track while scan successively by the rectangular coordinate deflection current instruction (x of each analyzing spot, y) by coordinate transform bevel coordinate deflection current instruction (s, t), the instruction of s axle converts voltage given signal to through D/A deliver to the instruction of s winding power supply 4, t axle and convert voltage given signal to through D/A deliver to t winding power supply 5.

Described step 6 comprises the following steps:

Step 6.1:s winding power supply 4 is by detecting to determining voltage signal rate of change, will to determining voltage signal and rate of change carries out linear superposition as total Setting signal, total Setting signal and sampling voltage signal U _safter comparing and amplifying process, adjustment output voltage, exports s winding current I to s winding 2-1 _s;

Step 6.2:t winding power supply 5 is by detecting to determining voltage signal rate of change, will to determining voltage signal and rate of change carries out linear superposition as total Setting signal, total Setting signal and sampling voltage signal U _tafter comparing and amplifying process, adjustment output voltage, exports t winding current I to t winding 2-2 _t.

In described step 1 and step 6, the initial point of oblique coordinates and the initial point of rectangular coordinate are coincided with 0 point by the method for described coordinate transform, overlapped with the x-axis of rectangular coordinate by the s axle of oblique coordinates, as shown in Figure 7, the computing formula of oblique coordinates Parameter Switch coordinate parameters at a right angle is simultaneously

$\left\{\begin{array}{c}x=s+t\·\sin \mathrm{\α}\\ y=t\·\cos \mathrm{\α}\end{array}\right.;$

The computing formula of rectangular coordinate Parameter Switch bevel coordinate parameters is $\left\{\begin{array}{c}s=x-y\·\tan \mathrm{\α}\\ t=\frac{y}{\cos \mathrm{\α}}\end{array}\right..$

As shown in Figures 2 to 6, a kind of electron beam quick forming fabri-cation equipment sweeps system partially, comprises inclined sweeping device 10, s winding power supply 4, t winding power supply 5 and computer control unit;

Electron beam quick forming fabri-cation equipment adopts magnetic field partially to sweep, described inclined sweeping device 10 is cylindrical-shaped structure, be installed on the position that electron gun electron beam 11 exports, comprise magnetic conduction framework 1, partially sweep winding 2 and electron beam channel 3, described magnetic conduction framework 1 is in circular, inwall has equally distributed slot for winding, described partially sweeping described in winding 2 comprises s winding 2-1 and t winding 2-2, described s winding 2-1 and t winding 2-2 is all arranged in the slot for winding of magnetic conduction framework 1, described s winding 2-1 and t winding 2-2 is symmetric i.e. their axis difference 90 degree in the plane in Vertical electron beam passage direction, described s winding 2-2 and t winding 2-1 is on this plane respectively by sinusoidal and cosine distribution coiling, described electron beam channel 3 is placed in describedly to be swept in winding 2 inner circle partially, magnetic conduction framework 1 is made up of the combined material of permeability magnetic material powder and organic insulation glue,

Described s winding power supply 4, it is connected with described s winding 2-1, will to determining voltage signal and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U _safter comparing and amplifying process, adjustment output voltage, exports s winding current I to s winding _s;

Described t winding power supply 5, it is connected with described t winding 2-2, will to determining voltage signal and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U _tafter comparing and amplifying process, adjustment output voltage, exports t winding current I to t winding _t;

Described computer control unit bears the master control task of electron beam quick forming fabri-cation equipment, and it is connected with s winding power supply 4, t winding power supply 5 respectively, exports to determining voltage signal respectively to s winding power supply 4 and t winding power supply 5 with

Described s winding power supply 4 comprises current rectifying and wave filtering circuit ZLs, power Correctional tube T1s and T2s, diode D1s and D2s, sample resistance R7s, resistance R1s ~ R6s, electric capacity C1s and operational amplifier ICs;

The input end of described current rectifying and wave filtering circuit ZLs connects two groups of alternating currents of outside input, the output common port of current rectifying and wave filtering circuit ZLs connects with one end of s winding 2-1, cathode output end is connected to the collector of NPN type power Correctional tube T1s, and cathode output end is connected to the collector of positive-negative-positive power Correctional tube T2s;

The in-phase input end of described operational amplifier ICs is through resistance R1s ground connection, and the inverting input of described operational amplifier ICs connects computer control unit voltage given signal through resistance R3s, resistance R2s output terminal, described electric capacity C1s is in parallel with resistance R3s, described resistance R2s, resistance R3s and electric capacity C1s form the input circuit of operational amplifier ICs, the inverting input of described R5s two ends difference concatenation operation amplifier ICs and output terminal, the output terminal of described operational amplifier ICs is connected with the base stage of power Correctional tube T1s and power Correctional tube T2s respectively through resistance R6s, and the inverting input of operational amplifier ICs connects sample resistance R7s one end through resistance R4s;

Be connected to one end of resistance R7s after the emitter of described power Correctional tube T1s and power Correctional tube T2s is connected together, the other end ground connection of resistance R7s, and connect with the other end of s winding 2-1; Sample resistance R7s exports s winding current I _svoltage signal U _sfor feedback signal, the negative electrode of described diode D1s connects with the collector of power Correctional tube T1s, the anode of diode D1s connects with the emitter of power Correctional tube T1s, the anode of diode D2s connects with the collector of power Correctional tube T2s, and the negative electrode of diode D2s connects with the emitter of power Correctional tube T2s.

Described t winding power supply 5 comprises current rectifying and wave filtering circuit ZLt, power Correctional tube T1t and T2t, diode D1t and D2t, sample resistance R7t, resistance R1t ~ R6t, electric capacity C1t and operational amplifier ICt;

The input end of described current rectifying and wave filtering circuit ZLt connects two groups of alternating currents of outside input, the output common port of current rectifying and wave filtering circuit ZLt connects with one end of t winding 2-2, cathode output end is connected to the collector of NPN type power Correctional tube T1t, and cathode output end is connected to the collector of positive-negative-positive power Correctional tube T2t;

The in-phase input end of described operational amplifier ICt is through resistance R1t ground connection, and the inverting input of described operational amplifier ICt connects computer control unit voltage given signal through resistance R3t, resistance R2t output terminal, described electric capacity C1t is in parallel with resistance R3t, described resistance R2t, resistance R3t and electric capacity C1t form the input circuit of operational amplifier ICt, the inverting input of described R5t two ends difference concatenation operation amplifier ICt and output terminal, the output terminal of described operational amplifier ICt is connected with the base stage of power Correctional tube T1t and power Correctional tube T2t respectively through resistance R6t, and the inverting input of operational amplifier ICt connects sample resistance R7t one end through resistance R4t;

Be connected to one end of resistance R7t after the emitter of described power Correctional tube T1t and power Correctional tube T2t is connected together, the other end ground connection of resistance R7t, and connect with the other end of t winding 2-2; Sample resistance R7t exports t winding current I _tvoltage signal U _tfor feedback signal, the negative electrode of described diode D1t connects with the collector of power Correctional tube T1t, the anode of diode D1t connects with the emitter of power Correctional tube T1t, the anode of diode D2t connects with the collector of power Correctional tube T2t, and the negative electrode of diode D2t connects with the emitter of power Correctional tube T2t.

Embodiment 1: fanned partition as shown in Figure 8, partially putting down on face 12 in electron beam 11 scanning field, draw m (m be not less than 3 integer) individual concentric circles, e ₁, e ₂..., e _i..., e _m, the annulus area equation that two adjacent concentric circless are formed also equals e ₁area, by the center of circle 0 (initial point of electron beam 11) draw n (n be not less than 3 integer) bar ray l ₁, l ₂..., l _j..., l _neach concentric circles is divided into n sector, m concentric circles and n bar ray have m × n intersection point, find oblique coordinates deflection current instruction s (q) and the t (q) of each intersection point by experiment, convert rectangular coordinate deflection current instruction x (q) and y (q) again to and store, in scanning field rectangular coordinate deflection current instruction x (p) of any point p and y (p) computing method as follows:

1. determine the community at p point place, calculate and compare ray l _j-1angle < ray angle < ray l _jangle, calculate compare e _i-1radius < | | <e _iradius, then determine that p point is positioned at by e _i-1, e _i, l _j-1and l _jin the zonule formed, in this zonule, unique point is q _{i-1, j-1}, q _{i-1, j}, q _{i, j-1}and q _i,jpoint, corresponding rectangular coordinate deflection current instruction is respectively x (q _{i-1, j-1}) and y (q _{i-1, j-1}), x (q _{i-1, j}) and y (q _{i-1, j}), x (q _{i, j-1}) and y (q _{i, j-1}), x (q _i,j) and y (q _i,j);

2. with initial point be the center of circle, | | draw circle for radius and hand over ray l respectively _j-1and l _jin p _j-1and p _jpoint, p _j-1the instruction of some rectangular coordinate deflection current is x (p _j-1) and y (p _j-1) at line segment q _{i-1, j-1}q _{i, j-1}on linearly change, that is:

$\left\{\begin{array}{c}x\left(p_{j-1}\right)=x\left(q_{i-1,j-1}\right)+[x\left(q_{i,j-1}\right)-x\left(q_{i-1,j-1}\right)]\frac{\left|q_{i-1,j-1}{p}_{j-1}\right|}{\left|q_{i-1,j-1}{q}_{i,j-1}\right|}\\ y\left(p_{j-1}\right)=y\left(q_{i-1,j-1}\right)+[y\left(q_{i,j-1}\right)-y\left(q_{i-1,j-1}\right)]\frac{\left|q_{i-1,j-1}{p}_{j-1}\right|}{\left|q_{i-1,j-1}{q}_{i,j-1}\right|}\end{array}\right.$

P _jthe instruction of some rectangular coordinate deflection current is x (p _j) and y (p _j) at line segment q _{i-1, j}q _i,jon linearly change, that is:

$\left\{\begin{array}{c}x\left(u_j\right)=x\left(v_{i-1,j}\right)+[x\left(v_{i,j}\right)-x\left(v_{i-1,j}\right)]\frac{\left|v_{i-1,j}{u}_j\right|}{\left|v_{i-1,j}{v}_{i,j}\right|}\\ y\left(u_j\right)=y\left(v_{i-1,j}\right)+[y\left(v_{i,j}\right)-y\left(v_{i-1,j}\right)]\frac{\left|v_{i-1,j}{u}_j\right|}{\left|v_{i-1,j}{v}_{i,j}\right|}\end{array}\right.$

3. by 0, p draws ray hand over e respectively _i-1and e _iin p _i-1and p _i2 points.P _i-1the instruction of some rectangular coordinate deflection current is x (p _i-1) and y (p _i-1) at circular arc on linearly change, then:

The instruction of pi point rectangular coordinate deflection current is that x (pi) and y (pi) is at circular arc on linearly change, then:

The instruction of 4.p point rectangular coordinate deflection current is that x (p) and y (p) is at line segment p _i-1p _ion linearly change income value and at circular arc on linearly change the mean value of income value, then:

If 5.p point is positioned on the ray minute area under a person's administration of community, its rectangular coordinate deflection current instruction x (p) and y (p) calculate by above 2. methods; If p point is positioned on the circular arc boundary line segment of community, its rectangular coordinate deflection current instruction x (p) and y (p) calculate by above 3. methods.

Embodiment 2: rectangular sub-area as shown in Figure 9, by m (m be not less than 3 integer) bar horizontal line x ₀, x ₁..., x _mwith n (n be not less than 3 integer) bar perpendicular line y ₀, y ₁..., y _nscanning field is divided into m × n little rectangular area, m bar horizontal line and n bar perpendicular line have m × n intersection point, find oblique coordinates deflection current instruction s (v) and the t (v) of each intersection point by experiment, then convert rectangular coordinate deflection current instruction x (v) and y (v) to _,and store _,in scanning field, rectangular coordinate deflection current instruction x (u) of any point u is as follows with y (u) computing method:

1. determine the community at u point place, calculate rectangular coordinate deflection current instruction x (u) comparing u point and y (u), x respectively _i-1<x (u) < x _i, and y _j-1<y (u) < y _j, then determine that u point is positioned at by horizontal line x _i-1, x _iwith perpendicular line y _j-1, y _jin the zonule formed, in this zonule, unique point is v _{i-1, j-1}, v _{i-1, j}, v _{i, j-1}and v _i,jpoint, corresponding rectangular coordinate deflection current instruction is respectively x (v _{i-1, j-1}) and y (v _{i-1, j-1}), x (v _{i-1, j}) and y (v _{i-1, j}), x (v _{i, j-1}) and y (v _{i, j-1}), x (v _i,j) and y (v _i,j);

2. by u point with the finger or gesticulate horizontal line respectively with perpendicular line y _j-1, y _jmeet at u _j-1, u _j, u _j-1point rectangular coordinate deflection current instruction x (u _j-1) and y (u _j-1) at line segment v _{i-1, j-1}v _{i, j-1}on linearly change, then:

$\left\{\begin{array}{c}x\left(u_{j-1}\right)=x\left(v_{i-1,j-1}\right)+[x\left(v_{i,j-1}\right)-x\left(v_{i-1,j-1}\right)]\frac{\left|v_{i-1,j-1}{u}_{j-1}\right|}{\left|v_{i-1,j-1}{u}_{i,j-1}\right|}\\ y\left(u_{j-1}\right)=y\left(v_{i-1,j-1}\right)+[y\left(v_{i,j-1}\right)-y\left(v_{i-1,j-1}\right)]\frac{\left|v_{i-1,j-1}{u}_{j-1}\right|}{\left|v_{i-1,j-1}{u}_{i,j-1}\right|}\end{array}\right.$

U _jpoint rectangular coordinate deflection current instruction x (u _j) and y (u _j) at line segment v _{i-1, j}v _i,jon linearly change, then:

$\left\{\begin{array}{c}x\left(u_j\right)=x\left(v_{i-1,j}\right)+[x\left(v_{i,j}\right)-x\left(v_{i-1,j}\right)]\frac{\left|v_{i-1,j}{u}_j\right|}{\left|v_{i-1,j}{v}_{i,j}\right|}\\ y\left(u_j\right)=y\left(v_{i-1,j}\right)+[y\left(v_{i,j}\right)-y\left(v_{i-1,j}\right)]\frac{\left|v_{i-1,j}{u}_j\right|}{\left|v_{i-1,j}{v}_{i,j}\right|}\end{array}\right.$

3. by u point with the finger or gesticulate perpendicular line respectively with horizontal line x _i-1, x _imeet at u _i-1, u _i, u _i-1point rectangular coordinate deflection current instruction x (u _i-1) and y (u _i-1) at line segment v _{i-1, j-1}v _{i-1, j}on linearly change, then:

$\left\{\begin{array}{c}x\left(u_{i-1}\right)=x\left(v_{i-1,j-1}\right)+[x\left(v_{i-1,j}\right)-x\left(v_{i-1,j-1}\right)]\frac{\left|v_{i-1,j-1}{u}_{i-1}\right|}{\left|v_{i-1,j-1}{u}_{i-1,j}\right|}\\ y\left(u_{i-1}\right)=y\left(v_{i-1,j-1}\right)+[y\left(v_{i-1,j}\right)-y\left(v_{i-1,j-1}\right)]\frac{\left|v_{i-1,j-1}{u}_{i-1}\right|}{\left|v_{i-1,j-1}{u}_{i-1,j}\right|}\end{array}\right.$

U _ipoint rectangular coordinate deflection current instruction x (u _i) and y (u _i) at line segment v _{i, j-1}v _i,jon linearly change, then:

$\left\{\begin{array}{c}x\left(u_i\right)=x\left(v_{i,j-1}\right)+[x\left(v_{i,j}\right)-x\left(v_{i,j-1}\right)]\frac{\left|v_{i,j-1}{u}_i\right|}{\left|v_{i,j-1}{v}_{i,j}\right|}\\ y\left(u_i\right)=y\left(v_{i,j-1}\right)+[y\left(v_{i,j}\right)-y\left(v_{i,j-1}\right)]\frac{\left|v_{i,j-1}{u}_i\right|}{\left|v_{i,j-1}{v}_{i,j}\right|}\end{array}\right.$

4.u point rectangular coordinate deflection current instruction x (u) is respectively at line segment u _i-1u _i, u _j-1u _jon linearly change the mean value of income value, then:

$\left\{\begin{array}{c}x\left(u\right)=\frac{1}{2}[x\left(u_{i-1}\right)+(x\left(u_i\right)-x\left(u_{i-1}\right))\frac{\left|u_{i-1}u\right|}{\left|u_{i-1}{u}_i\right|}]+\frac{1}{2}[x\left(u_{j-1}\right)+(x\left(u_j\right)-x\left(u_{j-1}\right))\frac{\left|u_{j-1}u\right|}{\left|u_{j-1}{u}_j\right|}]\\ y\left(u\right)=\frac{1}{2}[y\left(u_{i-1}\right)+(y\left(u_i\right)-y\left(u_{i-1}\right))\frac{\left|u_{i-1}u\right|}{\left|u_{i-1}{u}_i\right|}]+\frac{1}{2}[y\left(u_{j-1}\right)+(y\left(u_j\right)-y\left(u_{j-1}\right))\frac{\left|u_{j-1}u\right|}{\left|u_{j-1}{u}_j\right|}]\end{array}\right.$

If 5.u point is positioned in the horizontal dividing lines section of community, its rectangular coordinate deflection current instruction x (u) calculates by above 2. methods; If u point is positioned on the vertical boundary line segment of community, its rectangular coordinate deflection current instruction x (u) calculates by above 3. methods.

The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (5)

1. a control method for the inclined sweeping device of electron beam quick forming fabri-cation equipment, is characterized in that: comprise the steps:

Step 1: the actual angle measuring s, t scan axis track while scan, calculates the actual angle of s, t scan axis track while scan and the deviation angle α at 90 °, right angle, the numerical value of storage deviation angle α;

Step 2: by fan-shaped or rectangle rule, subregion is carried out to electron beam (11) scanning area;

Step 3: t winding power supply (5) the current value I determining each cell characteristic point _t, s winding power supply (4) current value I _sthe exciting current of inclined sweeping device (10) is controlled by computer control unit, make electron beam (11) deflect on cell characteristic point, writing beam (11) deflects into cell characteristic point top rade deflection current instruction (s, t);

Step 4: by each unique point top rade coordinate deflection current instruction (s, t) by coordinate transform coordinate deflection current at a right angle instruction (x, y), rectangular coordinate deflection current instruction (x, y) is stored in computer control unit;

Step 5: the rectangular coordinate deflection current instruction (x calculating each analyzing spot according to electron beam (11) track while scan successively, y), the rectangular coordinate deflection current instruction (x of the analyzing spot on separatrix, y) be that dependent variable linearly changes and calculates with scanning coordinate by this marginal unique point numerical value, the rectangular coordinate deflection current instruction (x of each analyzing spot in community, y) be that dependent variable linearly changes and calculates with scanning coordinate by the unique point numerical value of this community, the rectangular coordinate deflection current instruction (x of each analyzing spot of calculated off-line is carried out before operation, y), and record is stored in computer control unit successively, or operationally online calculating in real time,

Step 6: during operation, computer control unit according to electron beam (11) track while scan successively by the rectangular coordinate deflection current instruction (x of each analyzing spot, y) by coordinate transform bevel coordinate deflection current instruction (s, t), the instruction of s axle converts voltage given signal to through D/A deliver to s winding power supply (4), the instruction of t axle converts voltage given signal to through D/A deliver to t winding power supply (5).

2. the control method of the inclined sweeping device of a kind of electron beam quick forming fabri-cation equipment according to claim 1, it is characterized in that, described step 6 comprises the following steps:

Step 6.1:s winding power supply (4) is by detecting to determining voltage signal rate of change, will to determining voltage signal and rate of change carries out linear superposition as total Setting signal, total Setting signal and sampling voltage signal U _sby compare and amplify process after, adjustment output voltage, export s winding current I to s winding (2-1) _s;

Step 6.2:t winding power supply (5) is by detecting to determining voltage signal rate of change, will to determining voltage signal and rate of change carries out linear superposition as total Setting signal, total Setting signal and sampling voltage signal U _tby compare and amplify process after, adjustment output voltage, export t winding current I to t winding (2-2) _t.

3. electron beam quick forming fabri-cation equipment sweeps a system partially, it is characterized in that: comprise inclined sweeping device (10), s winding power supply (4), t winding power supply (5) and computer control unit;

Electron beam quick forming fabri-cation equipment adopts magnetic field partially to sweep, described inclined sweeping device (10) is cylindrical-shaped structure, be installed on the position that electron gun electron beam (11) exports, comprise magnetic conduction framework (1), partially sweep winding (2) and electron beam channel (3), described magnetic conduction framework (1) is in circular, inwall has equally distributed slot for winding, described winding (2) of partially sweeping comprises described s winding (2-1) and t winding (2-2), described s winding (2-1) and t winding (2-2) are all arranged in the slot for winding of magnetic conduction framework (1), described s winding (2-1) and t winding (2-2) are symmetric i.e. their axis difference 90 degree in the plane in Vertical electron beam passage direction, described s winding (2-2) and t winding (2-1) are on this plane respectively by sinusoidal and cosine distribution coiling, described electron beam channel (3) is placed in describedly to be swept in winding (2) inner circle partially, magnetic conduction framework (1) is made up of the combined material of permeability magnetic material powder and organic insulation glue,

Described s winding power supply (4), it is connected with described s winding (2-1), will to determining voltage signal and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U _safter comparing and amplifying process, adjustment output voltage, exports s winding current I to s winding _s;

Described t winding power supply (5), it is connected with described t winding (2-2), will to determining voltage signal and rate of change carries out linear combination as total Setting signal, total Setting signal and sampling voltage signal U _tafter comparing and amplifying process, adjustment output voltage, exports t winding current I to t winding _t;

Described computer control unit bears the master control task of electron beam quick forming fabri-cation equipment, it is connected with s winding power supply (4), t winding power supply (5) respectively, exports to determining voltage signal respectively to s winding power supply (4) and t winding power supply (5) with

4. a kind of electron beam quick forming fabri-cation equipment sweeps system partially according to claim 3, it is characterized in that: described s winding power supply (4) comprises current rectifying and wave filtering circuit ZLs, power Correctional tube T1s and T2s, diode D1s and D2s, sample resistance R7s, resistance R1s ~ R6s, electric capacity C1s and operational amplifier ICs;

The input end of described current rectifying and wave filtering circuit ZLs connects two groups of alternating currents of outside input, the output common port of current rectifying and wave filtering circuit ZLs connects with one end of s winding (2-1), cathode output end is connected to the collector of NPN type power Correctional tube T1s, and cathode output end is connected to the collector of positive-negative-positive power Correctional tube T2s;

The in-phase input end of described operational amplifier ICs is through resistance R1s ground connection, and the inverting input of described operational amplifier ICs connects computer control unit voltage given signal through resistance R3s, resistance R2s output terminal, described electric capacity C1s is in parallel with resistance R3s, described resistance R2s, resistance R3s and electric capacity C1s form the input circuit of operational amplifier ICs, the inverting input of described R5s two ends difference concatenation operation amplifier ICs and output terminal, the output terminal of described operational amplifier ICs is connected with the base stage of power Correctional tube T1s and power Correctional tube T2s respectively through resistance R6s, and the inverting input of operational amplifier ICs connects sample resistance R7s one end through resistance R4s;

Be connected to one end of resistance R7s after the emitter of described power Correctional tube T1s and power Correctional tube T2s is connected together, the other end ground connection of resistance R7s, and connect with the other end of s winding (2-1); Sample resistance R7s exports s winding current I _svoltage signal U _sfor feedback signal, the negative electrode of described diode D1s connects with the collector of power Correctional tube T1s, the anode of diode D1s connects with the emitter of power Correctional tube T1s, the anode of diode D2s connects with the collector of power Correctional tube T2s, and the negative electrode of diode D2s connects with the emitter of power Correctional tube T2s.

5. a kind of electron beam quick forming fabri-cation equipment sweeps system partially according to claim 3, it is characterized in that: described t winding power supply (5) comprises current rectifying and wave filtering circuit ZLt, power Correctional tube T1t and T2t, diode D1t and D2t, sample resistance R7t, resistance R1t ~ R6t, electric capacity C1t and operational amplifier ICt;

The input end of described current rectifying and wave filtering circuit ZLt connects two groups of alternating currents of outside input, the output common port of current rectifying and wave filtering circuit ZLt connects with one end of t winding (2-2), cathode output end is connected to the collector of NPN type power Correctional tube T1t, and cathode output end is connected to the collector of positive-negative-positive power Correctional tube T2t;

The in-phase input end of described operational amplifier ICt is through resistance R1t ground connection, and the inverting input of described operational amplifier ICt connects computer control unit voltage given signal through resistance R3t, resistance R2t output terminal, described electric capacity C1t is in parallel with resistance R3t, described resistance R2t, resistance R3t and electric capacity C1t form the input circuit of operational amplifier ICt, the inverting input of described R5t two ends difference concatenation operation amplifier ICt and output terminal, the output terminal of described operational amplifier ICt is connected with the base stage of power Correctional tube T1t and power Correctional tube T2t respectively through resistance R6t, and the inverting input of operational amplifier ICt connects sample resistance R7t one end through resistance R4t;

Be connected to one end of resistance R7t after the emitter of described power Correctional tube T1t and power Correctional tube T2t is connected together, the other end ground connection of resistance R7t, and connect with the other end of t winding (2-2); Sample resistance R7t exports t winding current I _tvoltage signal U _tfor feedback signal, the negative electrode of described diode D1t connects with the collector of power Correctional tube T1t, the anode of diode D1t connects with the emitter of power Correctional tube T1t, the anode of diode D2t connects with the collector of power Correctional tube T2t, and the negative electrode of diode D2t connects with the emitter of power Correctional tube T2t.