CN204102865U - A kind of to locating tab assembly structure - Google Patents
A kind of to locating tab assembly structure Download PDFInfo
- Publication number
- CN204102865U CN204102865U CN201420581041.XU CN201420581041U CN204102865U CN 204102865 U CN204102865 U CN 204102865U CN 201420581041 U CN201420581041 U CN 201420581041U CN 204102865 U CN204102865 U CN 204102865U
- Authority
- CN
- China
- Prior art keywords
- alignment mark
- tab assembly
- locating tab
- assembly structure
- exposing unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Wire Bonding (AREA)
- Structure Of Printed Boards (AREA)
Abstract
The utility model provides a kind of to locating tab assembly structure, describedly exposing unit is comprised to locating tab assembly structure and divides the first alignment mark, the second alignment mark, the 3rd alignment mark and the 4th alignment mark that are arranged at described exposing unit four angular zones respectively, wherein, the distance between described 3rd alignment mark and the 4th alignment mark is greater than the distance between described first alignment mark and the second alignment mark.The utility model is by changing the position relationship of four alignment marks of exposing unit angular zone, substantially increase OVL and aim at board to the identification of four alignment marks and resolution capability, thus the accuracy improved locating tab assembly, improve product yield and save human cost.The utility model structure is simple, is applicable to industrial detection.
Description
Technical field
The utility model belongs to field of semiconductor manufacture, particularly relates to a kind of to locating tab assembly structure.
Background technology
In recent years, along with the continuous progress of semiconductor technology, the function of device is also gradually become strong, but the thing followed also grows with each passing day for the requirement of semiconductor fabrication.Photoetching is one of critical process manufacturing advanced semiconductor devices and large scale integrated circuit, and is usually used in the accurate strain line of ruled grating, linear scale and scale etc.Photoetching is the technology utilizing photocopying to combine with chemical corrosion, the chemical processes of precision, fine and complicated thin layer figure is produced at surface of the work, it utilizes, and photoresist (or claim photoresist) is photosensitive forms corrosion proof feature afterwards because of photochemical reaction, and the litho pattern on light shield is scribed workpiece to be machined on the surface.The key step of lithographic semiconductor wafer silicon dioxide is: first, at workpiece to be machined surface painting photoresist; Then, aligned mask and wafer, and carry out exposure-processed; Again by the photoresist oxidant layer that developing solution dissolution is not photosensitive; Then, the silicon dioxide layer without photoresist protection is dissolved with corrosive liquid; Finally, remove photosensitive photoresist oxidant layer, single photoetching terminates.
In photoetching process, the deviation of the alignment of light shield and wafer can cause the electrical characteristic of device and metal connecting line to change, extremely important to the manufacture of semiconductor chip, therefore, lithography alignment accuracy must be well controlled, especially, more and more higher at making technology, live width is more and more less, the requirement of lithography alignment accuracy is also more and more higher.Utilize OVL (Overlay to locating tab assembly in traditional handicraft, aim at and measure) board completes, its S.O.P. (Standard Operation Procedure) is 4 aligning measurement points A1, A2, A3 and A4 that the standard adopting OVL to aim at measurement board measures that detector lens aims at the angular zone of exposing unit 101 successively, as shown in Figure 1.
But, make mistakes if lithography alignment measuring program is arranged, follow-up alignment information also can be made mistakes, and will cause the deviation of test data in FT (Final Test) and MRB (Material Review Board, the anomalous event that namely learies is larger) occur.As shown in Figure 2, the measurement point arranging requirement is A1, A2, A3, A4, if lithography alignment measuring program arrange measurement point be respectively A1, A2, A3 ', A4 ', now camera lens measured some A1, A2, A3 ', A4 ' surround, be difficult to pinpoint the problems from position detection process, this will cause follow-up error to increase, and then affect follow-up performance and product yield.
In view of the above defect of prior art, how to carry can provide a kind of effectively avoid aim at measuring error be those skilled in the art's problem demanding prompt solutions to locating tab assembly structure.
Utility model content
The shortcoming of prior art in view of the above, the purpose of this utility model is to provide a kind of to locating tab assembly structure, for solving in prior art the problem that locating tab assembly easily makes a mistake.
For achieving the above object and other relevant objects, the utility model provides a kind of to locating tab assembly structure, describedly exposing unit is comprised to locating tab assembly structure and divides the first alignment mark, the second alignment mark, the 3rd alignment mark and the 4th alignment mark that are arranged at described exposing unit four angular zones respectively, wherein, the distance between described 3rd alignment mark and the 4th alignment mark is greater than the distance between described first alignment mark and the second alignment mark.
As a kind of preferred version to locating tab assembly structure of the present utility model, the shape of described exposing unit is rectangle.
As a kind of preferred version to locating tab assembly structure of the present utility model, the figure that described first alignment mark, the second alignment mark, the 3rd alignment mark and the 4th alignment mark are linked to be is trapezoidal.
As a kind of preferred version to locating tab assembly structure of the present utility model, described first alignment mark and the second alignment mark are positioned at the first side of described exposing unit, described 3rd alignment mark and the 4th alignment mark are positioned at the second side of described exposing unit, wherein, described first side and the second side are the relative both sides of described exposing unit.
As a kind of preferred version to locating tab assembly structure of the present utility model, the distance between described first alignment mark and the second alignment mark is not more than the length of side of the first side of described exposing unit.
As a kind of preferred version to locating tab assembly structure of the present utility model, the distance between described 3rd alignment mark and the 4th alignment mark is not more than the length of side of the second side of described exposing unit.
As mentioned above, the utility model provides a kind of to locating tab assembly structure, describedly exposing unit is comprised to locating tab assembly structure and divides the first alignment mark, the second alignment mark, the 3rd alignment mark and the 4th alignment mark that are arranged at described exposing unit four angular zones respectively, wherein, the distance between described 3rd alignment mark and the 4th alignment mark is greater than the distance between described first alignment mark and the second alignment mark.The utility model is by changing the position relationship of four alignment marks of exposing unit angular zone, substantially increase OVL and aim at board to the identification of four alignment marks and resolution capability, thus the accuracy improved locating tab assembly, improve product yield and save human cost.The utility model structure is simple, is applicable to industrial detection.
Accompanying drawing explanation
Fig. 1 is shown as a kind of structural representation to locating tab assembly structure of the prior art.
Fig. 2 is shown as the schematic diagram to locating tab assembly structure alignment error example of the prior art.
Fig. 3 is shown as the structural representation to locating tab assembly structure of the present utility model.
Fig. 4 is shown as the schematic diagram of a kind of exemplifying embodiment to locating tab assembly structure of the present utility model.
Fig. 5 is shown as the schematic diagram of the another kind of exemplifying embodiment to locating tab assembly structure of the present utility model.
Element numbers explanation
101 exposing units
201 first alignment marks
202 second alignment marks
203 the 3rd alignment marks
204 the 4th alignment marks
Embodiment
Below by way of specific instantiation, execution mode of the present utility model is described, those skilled in the art the content disclosed by this specification can understand other advantages of the present utility model and effect easily.The utility model can also be implemented or be applied by embodiments different in addition, and the every details in this specification also can based on different viewpoints and application, carries out various modification or change not deviating under spirit of the present utility model.
Refer to Fig. 3 ~ Fig. 5.It should be noted that, the diagram provided in the present embodiment only illustrates basic conception of the present utility model in a schematic way, then only the assembly relevant with the utility model is shown in graphic but not component count, shape and size when implementing according to reality is drawn, it is actual when implementing, and the kenel of each assembly, quantity and ratio can be a kind of change arbitrarily, and its assembly layout kenel also may be more complicated.
As shown in Fig. 3 ~ Fig. 5, the present embodiment provides a kind of to locating tab assembly structure, describedly exposing unit 101 is comprised to locating tab assembly structure and divides the first alignment mark 201, second alignment mark 202, the 3rd alignment mark 203 and the 4th alignment mark 204 that are arranged at described exposing unit 101 4 angular zones respectively, wherein, the distance between described 3rd alignment mark 203 and the 4th alignment mark 204 is greater than the distance between described first alignment mark 201 and the second alignment mark 202.
Exemplarily, the shape of described exposing unit 101 is rectangle.Certainly, described exposing unit 101 can be the shape that square waits other, is not limited thereto a kind of example that place is enumerated.
Exemplarily, the figure that described first alignment mark 201, second alignment mark 202, the 3rd alignment mark 203 and the 4th alignment mark 204 are linked to be is trapezoidal.In the present embodiment, the figure that described first alignment mark 201, second alignment mark 202, the 3rd alignment mark 203 and the 4th alignment mark 204 are linked to be is isosceles trapezoid.
Exemplarily, described first alignment mark 201 and the second alignment mark 202 are positioned at the first side of described exposing unit 101, described 3rd alignment mark 203 and the 4th alignment mark 204 are positioned at the second side of described exposing unit 101, wherein, described first side and the second side are the relative both sides of described exposing unit 101.Wherein, distance between described first alignment mark 201 and the second alignment mark 202 is not more than the length of side of the first side of described exposing unit 101, and the distance between described 3rd alignment mark 203 and the 4th alignment mark 204 is not more than the length of side of the second side of described exposing unit 101.
Fig. 4 and Fig. 5 is shown as the use example to locating tab assembly structure of the present embodiment.
As shown in Figure 4, for the aligning of adjacent two exposing units 101 in left and right, during proper alignment, the figure that four alignment marks are linked to be for A1-A2-A4-A3 be linked to be trapezoidal, when OVL aligning board aligning is made mistakes, possible four alignment marks that it is aimed at are A1, A2, A5, A6, and the figure that these alignment marks are linked to be is rectangle, has very large difference with figure during proper alignment.Like this, just easily can identify aligning from the profile of alignment patterns and occur mistake, aligning can be re-started in time.
As shown in Figure 5, for the aligning of neighbouring two exposing units 101, during proper alignment, the figure that four alignment marks are linked to be for A1-A2-A4-A3 be linked to be trapezoidal, when OVL aligning board aligning is made mistakes, possible four alignment marks that it is aimed at are A1, A3, A7, A8, and the figure that these alignment marks are linked to be is parallelogram, has very large difference with figure during proper alignment.Like this, just easily can identify aligning from the profile of alignment patterns and occur mistake, aligning can be re-started in time.
As mentioned above, the utility model provides a kind of to locating tab assembly structure, describedly exposing unit 101 is comprised to locating tab assembly structure and divides the first alignment mark 201, second alignment mark 202, the 3rd alignment mark 203 and the 4th alignment mark 204 that are arranged at described exposing unit 101 4 angular zones respectively, wherein, the distance between described 3rd alignment mark 203 and the 4th alignment mark 204 is greater than the distance between described first alignment mark 201 and the second alignment mark 202.The utility model is by changing the position relationship of four alignment marks of exposing unit 101 angular zone, substantially increase OVL and aim at board to the identification of four alignment marks and resolution capability, thus the accuracy improved locating tab assembly, improve product yield and save human cost.So the utility model effectively overcomes various shortcoming of the prior art and tool high industrial utilization.
Above-described embodiment is illustrative principle of the present utility model and effect thereof only, but not for limiting the utility model.Any person skilled in the art scholar all without prejudice under spirit of the present utility model and category, can modify above-described embodiment or changes.Therefore, such as have in art and usually know that the knowledgeable modifies or changes not departing from all equivalences completed under the spirit and technological thought that the utility model discloses, must be contained by claim of the present utility model.
Claims (6)
1. one kind to locating tab assembly structure, it is characterized in that, describedly exposing unit is comprised to locating tab assembly structure and divides the first alignment mark, the second alignment mark, the 3rd alignment mark and the 4th alignment mark that are arranged at described exposing unit four angular zones respectively, wherein, the distance between described 3rd alignment mark and the 4th alignment mark is greater than the distance between described first alignment mark and the second alignment mark.
2. according to claim 1 to locating tab assembly structure, it is characterized in that: the shape of described exposing unit is rectangle.
3. according to claim 1 to locating tab assembly structure, it is characterized in that: the figure that described first alignment mark, the second alignment mark, the 3rd alignment mark and the 4th alignment mark are linked to be is trapezoidal.
4. according to claim 1 to locating tab assembly structure, it is characterized in that: described first alignment mark and the second alignment mark are positioned at the first side of described exposing unit, described 3rd alignment mark and the 4th alignment mark are positioned at the second side of described exposing unit, wherein, described first side and the second side are the relative both sides of described exposing unit.
5. according to claim 4 to locating tab assembly structure, it is characterized in that: the distance between described first alignment mark and the second alignment mark is not more than the length of side of the first side of described exposing unit.
6. according to claim 4 to locating tab assembly structure, it is characterized in that: the distance between described 3rd alignment mark and the 4th alignment mark is not more than the length of side of the second side of described exposing unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420581041.XU CN204102865U (en) | 2014-10-09 | 2014-10-09 | A kind of to locating tab assembly structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420581041.XU CN204102865U (en) | 2014-10-09 | 2014-10-09 | A kind of to locating tab assembly structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204102865U true CN204102865U (en) | 2015-01-14 |
Family
ID=52271271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420581041.XU Expired - Fee Related CN204102865U (en) | 2014-10-09 | 2014-10-09 | A kind of to locating tab assembly structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204102865U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105954985A (en) * | 2016-06-30 | 2016-09-21 | 上海华力微电子有限公司 | Method for measuring overlay precision of photoetching process, and mask plate |
| CN109950165A (en) * | 2019-02-19 | 2019-06-28 | 长江存储科技有限责任公司 | Test structure and test method |
| JP2022503370A (en) * | 2018-10-30 | 2022-01-12 | 京東方科技集團股▲ふん▼有限公司 | Display board motherboard and its manufacturing method |
-
2014
- 2014-10-09 CN CN201420581041.XU patent/CN204102865U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105954985A (en) * | 2016-06-30 | 2016-09-21 | 上海华力微电子有限公司 | Method for measuring overlay precision of photoetching process, and mask plate |
| JP2022503370A (en) * | 2018-10-30 | 2022-01-12 | 京東方科技集團股▲ふん▼有限公司 | Display board motherboard and its manufacturing method |
| CN109950165A (en) * | 2019-02-19 | 2019-06-28 | 长江存储科技有限责任公司 | Test structure and test method |
| CN109950165B (en) * | 2019-02-19 | 2021-06-04 | 长江存储科技有限责任公司 | Test structure and test method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103744214B (en) | A kind of exposure method of the glass substrate of liquid crystal display | |
| CN103995438B (en) | The optimization method of exposing wafer layout | |
| KR0168772B1 (en) | Photomask and fabricating method using it | |
| CN109828440A (en) | Alignment mark and overlay error measurement method based on diffraction | |
| CN103307983A (en) | Wafer edge exposure process detecting method | |
| CN204102865U (en) | A kind of to locating tab assembly structure | |
| CN102466977B (en) | Mark structure used for measuring distortion of projection object lens and its method | |
| CN204303805U (en) | A kind of alignment precision measuring structure based on two-dimentional diffraction | |
| CN106154768A (en) | A kind of ic substrate re-expose method based on mask plate | |
| CN201740972U (en) | Measurement structure for measuring registering precision | |
| TWI547918B (en) | Panel device and detecting method thereof | |
| CN103676464B (en) | Modeling litho pattern and method for measurement thereof | |
| CN103869603B (en) | A kind of reticle assembly and the method for detection lithography alignment accuracy | |
| US20130182255A1 (en) | Overlay mark and application thereof | |
| KR20180033971A (en) | Overlay mark, overlay measurement method and semiconductor device manufacturing method using the overlay mark | |
| CN102569113B (en) | Edging width detection method | |
| CN102749815A (en) | Detection method for alignment precision | |
| CN103832966B (en) | Formation method and the detection method of semiconductor devices | |
| CN105446090B (en) | It is directed at measurement method | |
| CN101982880A (en) | Registration measurement pattern | |
| CN203787419U (en) | Testing structure used for detecting aligning deviation | |
| CN203825357U (en) | Structure for identifying to-be measured graph of photomask | |
| CN105607308A (en) | Measurement scale, manufacturing method and using method | |
| JPH03269433A (en) | Projection exposing mask | |
| JP2015206927A (en) | Photo mask and manufacturing method of semiconductor device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150114 Termination date: 20191009 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |