CN203999906U - Be applied to the graphite plate of Crius type, graphite plate structure, reaction chamber - Google Patents
Be applied to the graphite plate of Crius type, graphite plate structure, reaction chamber Download PDFInfo
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- CN203999906U CN203999906U CN201420468504.1U CN201420468504U CN203999906U CN 203999906 U CN203999906 U CN 203999906U CN 201420468504 U CN201420468504 U CN 201420468504U CN 203999906 U CN203999906 U CN 203999906U
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- graphite plate
- groove
- circle
- center
- film releasing
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 365
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 365
- 239000010439 graphite Substances 0.000 title claims abstract description 365
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 79
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
The application discloses the graphite plate that is applied to Crius type, graphite plate structure, reaction chamber.This graphite plate, has the groove for placing substrate, and the number that groove arranges in the outer ring of graphite plate is 18; Groove is 12 at the number of the centre circle setting of graphite plate; Groove is six at the number of the inner ring setting of graphite plate; The number that groove arranges at the center of graphite plate is one; Groove is of a size of in the outer ring of graphite plate: graphite plate surface is 0.43mm to the vertical range of step upper surface in film releasing groove; In film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm; In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm; In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.02mm.The utility model can solve the problem of the wavelength lack of homogeneity existing in production reality.
Description
Technical field
The utility model belongs to chemical vapor depsotition equipment technical field, is particularly applied to the graphite plate of Crius type, and reaction chamber.
Background technology
MOCVD (Metal-Organic Chemical Vapor Deposition) is the source material using the hydride of the organic compound of III family, II family element and V, VI family element etc. as crystal growth, on graphite plate, carry out depositing operation in pyrolysis mode, the thin layer monocrystal material of grow various III-V family, II-VI compound semiconductor and their multivariate solid solution.
The chemical vapor deposition method equipment of prior art generally comprises: the spray header being oppositely arranged and graphite plate, described spray header is used for providing reactant gases, in it, multiple apertures can be set, in graphite plate, there are multiple grooves, in each groove, corresponding a slice substrate of placing also has heating unit, so that graphite plate is heated below graphite plate, the graphite plate intensification of being heated, can heat substrate with thermal radiation and heat exchange pattern.In the time carrying out MOCVD technique, reactant gases enters the conversion zone of graphite plate top from the aperture of spray header, substrate is because the thermal conduction heating of heating unit has certain temperature, and this temperature makes to carry out between reactant gases chemical reaction, thereby at substrate surface deposition epitaxial material layer.
Notification number is that the patent documentation of CN103074608A discloses a kind of graphite plate, in described graphite plate, layout has main substrate and fills substrate, the layout of described main substrate is the corresponding layout of main substrate that can place maximum numbers in graphite plate, the diameter of described filling substrate is less than the diameter of main substrate, and described filling substrate is for filling up the surface of graphite plate.What epitaxial device more often adopted is Aixtron Crius I type, it is all upgraded to 37 machines (use diameter is the substrate of 2 inches) from 31 machines gradually, due to the defect of hardware, being heated of outmost turns always can be affected, present the outside part of outmost turns with the be heated inhomogeneous and inconsistent phenomenon of epitaxial structure that grow of substrate center, homogeneity and the yield of chip are had a strong impact on, each position of the graphite plate that each producer provides is at present consistent, the routine adjustment of carrying out on this basis does not all reach good effect, can not fundamentally solve the inhomogeneity problem of wavelength.
Utility model content
The purpose of this utility model is to overcome above-mentioned deficiency, and a kind of graphite plate of the Crius of being applied to type is provided, and it can solve the problem of the wavelength lack of homogeneity existing in production reality.
To achieve these goals, the technical solution adopted in the utility model is:
Be applied to a graphite plate for Crius type, there is the groove for placing substrate, it is characterized in that:
The number that described groove arranges in the outer ring of graphite plate is 18;
Described groove is 12 at the number of the centre circle setting of graphite plate;
Described groove is six at the number of the inner ring setting of graphite plate;
The number that described groove arranges at the center of graphite plate is one;
Described groove is of a size of in the outer ring of graphite plate:
Described graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.02mm.
Preferably, wherein, described groove is of a size of at the centre circle of graphite plate:
Described graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.03mm.
Preferably, wherein, described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.04mm.
Preferably, wherein, described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.03mm.
Preferably, wherein, the interior graphite plate of the described groove footpath upwards vertical height of the step of one end near apart from the graphite plate center of circle is 0.03mm.
Preferably, wherein, described described film releasing groove center point is 0.015mm with the vertical range at the interior step of this film releasing groove base angle.
A kind of graphite plate structure, is characterized in that: be provided with the first substrate at the center of graphite plate, centered by described the first substrate, be evenly placed with from inside to outside the substrate that multi-turn number does not wait.
Preferably, wherein, centered by described the first substrate, be evenly placed with from inside to outside the substrate that four number of turns orders do not wait, wherein,
The substrate number of described first lap is 1;
The substrate number of described the second circle is 6;
The substrate number of described the 3rd circle is 12;
The substrate number of described the 4th circle is 18.
A kind of reaction chamber, is characterized in that, has as the graphite plate that is applied to Crius type as described in any one in claim 1 to 4.
The beneficial effects of the utility model are:
First, directly apply to Aixtron Crius type, 37 machines are divided into the groove setting of inside and outside four circles, the different positions of graphite plate is carried out to the different designs of film releasing position, to realize, each position is heated and the manual control in flow field, the level that easily departs from more position and be withdrawn into most of position is come up, realize the inhomogeneity raising of whole dish.
Second, improve monolithic wavelength and electrical homogeneity, the upwards upwards difference of altitude from center to step apart from one end far away, the graphite plate center of circle of graphite plate footpath in the difference of altitude from center to step and film releasing groove apart near one end, the graphite plate center of circle of graphite plate footpath in film releasing groove, meet the setting of wavelength rule according to outer ring, centre circle, inner ring and center, can improve the situation of being heated of substrate.
Brief description of the drawings
Accompanying drawing described herein is used to provide further understanding of the present application, forms the application's a part, and the application's schematic description and description is used for explaining the application, does not form the improper restriction to the application.In the accompanying drawings:
Fig. 1 is the structural representation of the graphite plate of the Crius of being applied to type of the present utility model;
Fig. 2 is the dimensional structure schematic diagram of film releasing groove of the present utility model.
Embodiment
Censure specific components as used some vocabulary in the middle of specification sheets and claim.Those skilled in the art should understand, and hardware manufacturer may be called same assembly with different nouns.This specification and claims are not used as distinguishing the mode of assembly with the difference of title, but the difference in function is used as the criterion of distinguishing with assembly.If " comprising " mentioned in the middle of specification sheets and claim is in the whole text an open language, therefore should be construed to " comprise but be not limited to "." roughly " refer to that in receivable limit of error, those skilled in the art can solve the technical problem within the scope of certain error, reach described technique effect substantially.Specification sheets subsequent descriptions is to implement the application's preferred embodiments, and right described description is to illustrate that the application's rule is object, not in order to limit the application's scope.The application's protection domain is when being as the criterion depending on the claims person of defining.
Embodiment 1
Please refer to Fig. 1, the graphite plate that is applied to Crius type of the present utility model, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
As shown in Figure 2, A is the vertical range of graphite plate surface to the interior step upper surface of film releasing groove, B is the vertical range at step base angle in film releasing groove center point and groove, C1 is the upwards step vertical height of one end near apart from the graphite plate center of circle of graphite plate footpath in film releasing groove, and C2 is the upwards right angle step vertical height of one end far away apart from the graphite plate center of circle of graphite plate footpath in film releasing groove.In addition, step vertical height gradual change between C1 and C2 of other positions.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.015mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.03mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.02mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.015mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.03mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.03mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.015mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.03mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.04mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.015mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.03mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.03mm.
The present embodiment also provides a kind of reaction chamber, has the described graphite plate that is applied to Crius type.
As specific embodiment, a kind of graphite plate structure is also provided, be provided with the first substrate at the center of graphite plate, centered by described the first substrate, be evenly placed with from inside to outside the substrate that multi-turn number does not wait.
Preferably, centered by described the first substrate, be evenly placed with from inside to outside the substrate that four number of turns orders do not wait, wherein, the substrate number of described first lap is 1; The substrate number of described the second circle is 6; The substrate number of described the 3rd circle is 12; The substrate number of described the 4th circle is 18.
Embodiment 2
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.014mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.025mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.015mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.014mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.025mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.025mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.014mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.025mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.035mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.014mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.025mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.025mm.
Embodiment 3
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.013mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.01mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.013mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.02mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.013mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.03mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.013mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.02mm.
The present embodiment also provides a kind of reaction chamber, has the described graphite plate that is applied to Crius type.
As specific embodiment, a kind of graphite plate structure is also provided, be provided with the first substrate at the center of graphite plate, centered by described the first substrate, be evenly placed with from inside to outside the substrate that multi-turn number does not wait.
Preferably, centered by described the first substrate, be evenly placed with from inside to outside the substrate that four number of turns orders do not wait, wherein, the substrate number of described first lap is 1; The substrate number of described the second circle is 6; The substrate number of described the 3rd circle is 12; The substrate number of described the 4th circle is 18.
Embodiment 4
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.012mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.012mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.01mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.012mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.02mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.012mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.01mm.
Embodiment 5
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.01mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.03mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.02mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.02mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.03mm.
The present embodiment also provides a kind of reaction chamber, has the described graphite plate that is applied to Crius type.
As specific embodiment, a kind of graphite plate structure is also provided, be provided with the first substrate at the center of graphite plate, centered by described the first substrate, be evenly placed with from inside to outside the substrate that multi-turn number does not wait.
Preferably, centered by described the first substrate, be evenly placed with from inside to outside the substrate that four number of turns orders do not wait, wherein, the substrate number of described first lap is 1; The substrate number of described the second circle is 6; The substrate number of described the 3rd circle is 12; The substrate number of described the 4th circle is 18.
Embodiment 6
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.001mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.001mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.01mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.001mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.02mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.001mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.01mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.01mm.
Embodiment 7
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.005mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.015mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.005mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.005mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.015mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.015mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.005mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.015mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.025mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.005mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.015mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.015mm.
Embodiment 8
The graphite plate that is applied to Crius type of the present embodiment, has the groove for placing substrate, and the number that described groove arranges in the outer ring of graphite plate is 18; Described groove is 12 at the number of the centre circle setting of graphite plate; Described groove is six at the number of the inner ring setting of graphite plate; The number that described groove arranges at the center of graphite plate is one.
Described groove is of a size of in the outer ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.007mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.019mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.009mm.
Described groove is of a size of at the centre circle of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.008mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.019mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.019mm.
Described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.006mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.019mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.029mm.
Described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range A of the interior step upper surface of film releasing groove;
Film releasing groove center point is 0.008mm with the vertical range B at the interior step of groove base angle;
The interior graphite plate of the groove footpath upwards vertical height C1 of the step of one end near apart from the graphite plate center of circle is 0.019mm;
The interior graphite plate of the groove footpath upwards right angle step vertical height C2 of one end far away apart from the graphite plate center of circle is 0.019mm.
The present embodiment also provides a kind of reaction chamber, has the described graphite plate that is applied to Crius type.
As specific embodiment, a kind of graphite plate structure is also provided, be provided with the first substrate at the center of graphite plate, centered by described the first substrate, be evenly placed with from inside to outside the substrate that multi-turn number does not wait.
Preferably, centered by described the first substrate, be evenly placed with from inside to outside the substrate that four number of turns orders do not wait, wherein, the substrate number of described first lap is 1; The substrate number of described the second circle is 6; The substrate number of described the 3rd circle is 12; The substrate number of described the 4th circle is 18.
The beneficial effects of the utility model are:
First, directly apply to Aixtron Crius type, 37 machines are divided into the groove setting of inside and outside four circles, the different positions of graphite plate is carried out to the different designs of film releasing position, to realize, each position is heated and the manual control in flow field, the level that easily departs from more position and be withdrawn into most of position is come up, realize the inhomogeneity raising of whole dish.
Second, improve monolithic wavelength and electrical homogeneity, the upwards upwards difference of altitude from center to step apart from one end far away, the graphite plate center of circle of graphite plate footpath in the difference of altitude from center to step and film releasing groove apart near one end, the graphite plate center of circle of graphite plate footpath in film releasing groove, meet the setting of wavelength rule according to outer ring, centre circle, inner ring and center, can improve the situation of being heated of substrate.
Above-mentioned explanation illustrates and has described some preferred embodiments of the application, but as previously mentioned, be to be understood that the application is not limited to disclosed form herein, should not regard the eliminating to other embodiment as, and can be used for various other combinations, amendment and environment, and can, in application contemplated scope described herein, change by technology or the knowledge of above-mentioned instruction or association area.And the spirit and scope that the change that those skilled in the art carry out and variation do not depart from the application, all should be in the protection domain of the application's claims.
Claims (9)
1. be applied to a graphite plate for Crius type, there is the groove for placing substrate, it is characterized in that:
The number that described groove arranges in the outer ring of graphite plate is 18;
Described groove is 12 at the number of the centre circle setting of graphite plate;
Described groove is six at the number of the inner ring setting of graphite plate;
The number that described groove arranges at the center of graphite plate is one;
Described groove is of a size of in the outer ring of graphite plate:
Described graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.02mm.
2. the graphite plate that is applied to Crius type according to claim 1, is characterized in that: described groove is of a size of at the centre circle of graphite plate:
Described graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.03mm.
3. the graphite plate that is applied to Crius type according to claim 2, is characterized in that: described groove is of a size of at the inner ring of graphite plate:
Graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.04mm.
4. the graphite plate that is applied to Crius type according to claim 3, is characterized in that: described groove is of a size of at the center of graphite plate:
Graphite plate surface is 0.43mm to the vertical range of the interior step upper surface of film releasing groove;
In described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0 to 0.015mm;
In groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0 to 0.03mm;
In groove graphite plate footpath upwards the right angle step vertical height of one end far away apart from the graphite plate center of circle be 0 to 0.03mm.
5. according to the graphite plate that is applied to Crius type described in any one in claim 1 to 4, it is characterized in that, in described groove graphite plate footpath upwards the vertical height of the step of one end near apart from the graphite plate center of circle be 0.03mm.
6. according to the graphite plate that is applied to Crius type described in any one in claim 1 to 4, it is characterized in that: in described described film releasing groove center point and this film releasing groove, the vertical range at step base angle is 0.015mm.
7. a graphite plate structure, is characterized in that: be provided with the first substrate at the center of graphite plate, centered by described the first substrate, be evenly placed with from inside to outside the substrate that multi-turn number does not wait.
8. graphite plate structure according to claim 7, is characterized in that, centered by described the first substrate, is evenly placed with from inside to outside the substrate that four number of turns orders do not wait, wherein,
The substrate number of described first lap is 1;
The substrate number of described the second circle is 6;
The substrate number of described the 3rd circle is 12;
The substrate number of described the 4th circle is 18.
9. a reaction chamber, is characterized in that, has as the graphite plate that is applied to Crius type as described in any one in claim 1 to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420468504.1U CN203999906U (en) | 2014-08-19 | 2014-08-19 | Be applied to the graphite plate of Crius type, graphite plate structure, reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420468504.1U CN203999906U (en) | 2014-08-19 | 2014-08-19 | Be applied to the graphite plate of Crius type, graphite plate structure, reaction chamber |
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| Publication Number | Publication Date |
|---|---|
| CN203999906U true CN203999906U (en) | 2014-12-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420468504.1U Expired - Fee Related CN203999906U (en) | 2014-08-19 | 2014-08-19 | Be applied to the graphite plate of Crius type, graphite plate structure, reaction chamber |
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| CN (1) | CN203999906U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105568371A (en) * | 2015-12-30 | 2016-05-11 | 晶能光电（常州）有限公司 | Graphite disc for improving mean value of wavelengths of all rings of silicon-based nitride |
| CN112144113A (en) * | 2019-06-28 | 2020-12-29 | 聚灿光电科技股份有限公司 | Graphite carrying disc and MOCVD (metal organic chemical vapor deposition) reaction device with same |
-
2014
- 2014-08-19 CN CN201420468504.1U patent/CN203999906U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105568371A (en) * | 2015-12-30 | 2016-05-11 | 晶能光电（常州）有限公司 | Graphite disc for improving mean value of wavelengths of all rings of silicon-based nitride |
| CN112144113A (en) * | 2019-06-28 | 2020-12-29 | 聚灿光电科技股份有限公司 | Graphite carrying disc and MOCVD (metal organic chemical vapor deposition) reaction device with same |
| WO2020258676A1 (en) * | 2019-06-28 | 2020-12-30 | 聚灿光电科技股份有限公司 | Graphite carrier and mocvd reaction apparatus having same |
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