CN203554774U - Annular space type dielectric blocking discharge plasma generating device - Google Patents
Annular space type dielectric blocking discharge plasma generating device Download PDFInfo
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- CN203554774U CN203554774U CN201320593045.5U CN201320593045U CN203554774U CN 203554774 U CN203554774 U CN 203554774U CN 201320593045 U CN201320593045 U CN 201320593045U CN 203554774 U CN203554774 U CN 203554774U
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Abstract
The utility model provides an annular space type dielectric blocking discharge plasma generating device. A high-voltage electrode is composed of a quartz tube, wherein a conductive silk screen, a coating film or a printed circuit is attached onto the outer surface of the quartz tube. A low-voltage electrode is also composed of a quartz tube, wherein aluminum powders or magnesium powders are filled inside the quartz tube. The two ends of the tubular high-voltage electrode and the two ends of the low-voltage electrode are connected with a shunt bracket. The other end of the shut bracket is connected with a variable-diameter flange and a spure spreader. In this way, a fluid passage is formed. An annular space of a certain with, functioning as a discharge area, is formed between the high-voltage electrode and the low-voltage electrode. The high-voltage electrode is connected with the high-voltage end of a power supply through a lead. The low-voltage electrode is led out of a shut bracket passage to be grounded by a lead. During operation, the fluid flows in through the variable-diameter flange and then is centrally shunted by the spure spreader to enter the annular space formed by the variable-diameter flange and the spure spreader. After flowing a certain distance to be stabilized , the fluid enters a discharge annular space formed by the high-voltage electrode and the low-voltage electrode. The fluid is then subjected to the electro discharge treatment, converges and flows out through the annular space formed by the variable-diameter flange and the spure spreader.
Description
Technical field
The utility model belongs to plasma apparatus field, relates in particular to a kind of annular space dielectric barrier discharge plasma generating means.
Background technology
Dielectric barrier discharge (Dielectric Barrier Discharge, DBD) cry again silent discharge, dielectric barrier discharge is to be that 50 hertz of ac high voltages to megahertz level start by frequency, inserts a kind of gas discharge of dielectric at discharge space.Dielectric barrier discharge reactor is connected with High Level AC Voltage mostly, and reactor comprises high-field electrode, dielectric and grounding electrode three parts.Due to dielectric existence, in discharge process, can avoid the generation of electric arc, make that gas discharge keeps evenly, fills the air, the state of stable multiple micro-current filaments, be a kind of stable gas discharge.Dielectric barrier discharge is at 1 atmospheric pressure (10
5pa left and right) lower generation, can under the condition that approaches room temperature, realize again, therefore be widely used in chemistry subject aspect, the plasma chemistry (Plasma Chemist ry) of meaning, plasma chemistry is to utilize the activity chemistry group generating in plasma space to carry out the technology of effective chemical reaction.From chemical terms, ion, electronics, atom and the free radical of plasma space enrichment, as lively as a cricket high activity species, these high activity species are difficult to obtain in common thermal chemical reaction, and in plasma, can produce continuously, current this plasma technique at sewage disposal, air treating, chemical reaction, the industrial circle such as catalyze and synthesize and be all widely used.
Chinese patent CN101835336 discloses a kind of double-dielectric barrier discharge low-temperature plasma generator, this generator is mainly used in the processing of industrial waste gas and vehicle exhaust, mainly solve effective enhancing energy density of plasma, avoided the problems such as the corrosion of pernicious gas to high-field electrode.Can be to the problem of electrode corrosion although this pair of medium generator solved that pernicious gas does not directly contact high-field electrode, but this generator is unreasonable on runner design, the import of this generator and Way out are at generator radially, in runner, there is the variation of flow velocity and direction in fluid, be unfavorable for the stable of processing and reaction, if contain solid particle in fluid, also can easily be deposited on import and export, pollution medium surface, guiding discharge is inhomogeneous; And, there is dead angle in runner in this structure, also can cause solid particle deposition, stop up reaction channel, be unfavorable for long-time running, this generator can not adapt to gas-solid phase fluid.
Summary of the invention
The utility model provides a kind of circular-gap dielectric barrier discharge plasma generating means, can in toroidal cavity, produce uniform dielectric barrier discharge, can meet processing and the reaction of mutually arbitrary or the two three's of gas phase, liquid phase, gas-solid fluid-mixing.
The technical scheme that the utility model is taked is, a kind of circular-gap dielectric barrier discharge plasma generating means, comprise adapter flange, spreader, shunting support, high-field electrode, low-field electrode, high-field electrode is that quartz ampoule outer surface adheres to conduction silk screen or plated film, printed circuit, low-field electrode is inner aluminium powder or the magnesium powder of filling of quartz ampoule, tubulose high-field electrode and the low-field electrode of different tube diameters are coaxially installed, two ends are fixed on the shunting support at two ends, the shunting support other end is connected with spreader with adapter flange, between high-field electrode and low-field electrode, form a fluid passage, form the annular space region of discharge of certain width, high-field electrode is by the high-pressure side of wire connecting power, low-field electrode is drawn ground connection by wire by shunting support passage, during work, fluid is entered by adapter flange, by spreader, carry out center shunting and enter the annular space being formed by adapter flange and spreader, after one section of current stabilization, enter by high-field electrode and low-field electrode and form electric discharge annular space, after discharge process, the outflow of confluxing after the annular space of adapter flange and spreader composition.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, its import, outlet, discharge channel are on same axis.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, the sectional area of its import, outlet, annular space equates, makes flowing in plasma atmosphere of fluid stable.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, the width of its annular space is 1-10mm, can form stable, lasting dielectric barrier discharge.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, high-field electrode by outer surface adhere to conduction silk screen, plated film or printed circuit wherein a kind of quartz ampoule form.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, its low-field electrode is arbitrary electric conductor in the inner filling of quartz ampoule aluminium powder, magnesium powder.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, its discharge channel and the outside and inner maintenance sealing of low-field electrode, prevent fluid leakage in annular space.
Above-mentioned a kind of circular-gap dielectric barrier discharge plasma generating means, can be used, to increase the time of fluid under plasma ambient in multi-stage series assembling.
The utility model can be used for gas solid method plasma chliorinated polyvinyl chloride, also can be used for air-treatment, the processing of two-phase or multiphase fluid such as water treatment and reaction.
The utlity model has following advantage and effect:
1, simple in structure, easy to operate, adapt to multiple fluid.
2, this apparatus structure does not have enlarge-effect, the width that the critical technical parameter of device is annular space, as long as keep the width of annular space, just can guarantee the stable of DBD flash-over characteristic, and the treatment scale that quantity by change annular space internal-and external diameter value or device just can modifier.
3, the import and export of this structure runner and discharge channel are on same axis, like this passage do not turn round, dead angle, fluid has shunting and steady flow segment before entering region of discharge, assurance enters the stable of electric discharge section rate of flow of fluid and density, it is stable that this is also conducive to dielectric barrier discharge, finally guaranteed the stable of whole processing and course of reaction.
4, this frame mode can be used alone, and also can, according to instructions for uses such as processing and reaction time, this device multi-stage series assembling be used, or multistage discharge portion is connected to use.
Accompanying drawing explanation
Fig. 1 is the utility model embodiment 1 axial section.
Fig. 2 is the utility model shunting support radial section figure.
Fig. 3 is the utility model embodiment 2 axial sections.
Fig. 4 is the utility model embodiment 3 axial sections.
Drawing reference numeral illustrates: 1 is that adapter flange, 2 is that spreader, 3 is that high-field electrode, 5 is that low-field electrode, 6 is that conduction silk screen, 7 is that magnesium powder, 8 is that quartz ampoule, 9 is spreader support passage for shunting support, 4.
Embodiment
Below in conjunction with accompanying drawing, the utility model is further illustrated.
Embodiment 1
Accompanying drawing 1 is the axial section of the utility model embodiment 1, a kind of circular-gap dielectric barrier discharge plasma generating means, comprise adapter flange 1, spreader 2, shunting support 3, high-field electrode 4, low-field electrode 5, quartz ampoule 8, its import and export mix is identical, wherein high-field electrode 4 adheres to conduction silk screen 6 quartz ampoules 8 by outer surface, and connecting the high-pressure side of power supply, the quartz ampoule 8 that low-field electrode 5 is filled aluminium powder by inside is made, and by spreader support passage 9, by shunting support passage, draws ground connection.Tubulose high-field electrode 4 and low-field electrode 4 two ends and 3 connections of shunting support, shunting support 3 other ends are connected with spreader 2 with adapter flange 1, spreader 2 use quartz ampoules 8 are connected on shunting support 3, accompanying drawing 2 is shunting support 3 axial sections, hole on external diameter is communicated with zone line end face, for low-field electrode wire, connects.During work, fluid is entered by import adapter flange 1, carries out center shunting and enters shunting support 3 annular spaces, by just entering the electric discharge annular space region being comprised of high-field electrode 4 and low-field electrode 5 after shunting support 3 by spreader 2, after discharge process, then flowed out by shunting support 3, adapter flange 1.
Embodiment 2
The utility model embodiment 2 is by two or many circular-gap dielectric barrier discharge plasma generating meanss be cascaded (as accompanying drawing 3), not only can increase the time of processing fluid, and fluid is through repeatedly shunting, confluxing, the uniformity of processing is better, is particularly suitable for two phase flow and multiphase flow.
Embodiment 3
The utility model embodiment 3 is that many high-field electrodes 4 and low-field electrode 5 link together by (as accompanying drawing 4) by shunting support 3, the generating means that composition has multiple electric discharge sections to link together, and this assembling mode can increase the time and intensity of processing fluid.
Claims (7)
1. a circular-gap dielectric barrier discharge plasma generating means, a kind of circular-gap dielectric barrier discharge plasma generating means, comprise adapter flange, spreader, shunting support, high-field electrode, low-field electrode, high-field electrode is that quartz ampoule outer surface adheres to conduction silk screen, low-field electrode is the inner aluminium powder of filling of quartz ampoule, tubulose high-field electrode and the low-field electrode of different tube diameters are coaxially installed, two ends are fixed on the shunting support at two ends, the shunting support other end is connected with spreader with adapter flange, between high-field electrode and low-field electrode, form a fluid passage, high-field electrode is by the high-pressure side of wire connecting power, low-field electrode is drawn ground connection by wire by shunting support passage, during work, fluid is entered by adapter flange, by spreader, carry out center shunting and enter the annular space being formed by adapter flange and spreader, after one section of current stabilization, enter by high-field electrode and low-field electrode and form electric discharge annular space, after discharge process, the outflow of confluxing after the annular space of adapter flange and spreader composition, is characterized in that by the annular space region of discharge that forms certain width between high-field electrode and low-field electrode.
2. by a kind of circular-gap dielectric barrier discharge plasma generating means claimed in claim 1, it is characterized in that import, outlet, discharge channel are on same axis.
3. by a kind of circular-gap dielectric barrier discharge plasma generating means claimed in claim 1, it is characterized in that the sectional area of its import, outlet, annular space equates.
4. by a kind of circular-gap dielectric barrier discharge plasma generating means claimed in claim 1, the width that it is characterized in that its annular space is 1-10mm, can form stable dielectric barrier discharge.
5. by a kind of circular-gap dielectric barrier discharge plasma generating means claimed in claim 1, it is characterized in that in discharge channel and the outside and inner maintenance sealing of low-field electrode.
6. by a kind of circular-gap dielectric barrier discharge plasma generating means claimed in claim 1, it is characterized in that high-field electrode by outer surface adhere to conduction silk screen, plated film or printed circuit wherein a kind of quartz ampoule form.
7. by a kind of circular-gap dielectric barrier discharge plasma generating means claimed in claim 1, it is characterized in that low-field electrode is arbitrary electric conductor in the inner filling of quartz ampoule aluminium powder, magnesium powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320593045.5U CN203554774U (en) | 2013-09-25 | 2013-09-25 | Annular space type dielectric blocking discharge plasma generating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320593045.5U CN203554774U (en) | 2013-09-25 | 2013-09-25 | Annular space type dielectric blocking discharge plasma generating device |
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| Publication Number | Publication Date |
|---|---|
| CN203554774U true CN203554774U (en) | 2014-04-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320593045.5U Expired - Fee Related CN203554774U (en) | 2013-09-25 | 2013-09-25 | Annular space type dielectric blocking discharge plasma generating device |
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| CN (1) | CN203554774U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105699359A (en) * | 2016-01-18 | 2016-06-22 | 大连理工大学 | Experimental device and method for obtaining annular uniform plasmas in barometric pressure air |
| CN109675417A (en) * | 2019-02-14 | 2019-04-26 | 南京珀斯佩特电子科技有限公司 | A kind of system type low temperature plasma gas processing tandem arrangement |
| CN110433748A (en) * | 2019-08-24 | 2019-11-12 | 广东省水源美农业科技有限公司 | Reaction of low temperature plasma device |
-
2013
- 2013-09-25 CN CN201320593045.5U patent/CN203554774U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105699359A (en) * | 2016-01-18 | 2016-06-22 | 大连理工大学 | Experimental device and method for obtaining annular uniform plasmas in barometric pressure air |
| CN109675417A (en) * | 2019-02-14 | 2019-04-26 | 南京珀斯佩特电子科技有限公司 | A kind of system type low temperature plasma gas processing tandem arrangement |
| CN110433748A (en) * | 2019-08-24 | 2019-11-12 | 广东省水源美农业科技有限公司 | Reaction of low temperature plasma device |
| CN110433748B (en) * | 2019-08-24 | 2024-06-07 | 江门市智平台科技有限公司 | Low temperature plasma reactor |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140416 Termination date: 20210925 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |