CN203535981U - Touch screen conductive film with obverse/reverse structure - Google Patents
Touch screen conductive film with obverse/reverse structure Download PDFInfo
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- CN203535981U CN203535981U CN201320638239.2U CN201320638239U CN203535981U CN 203535981 U CN203535981 U CN 203535981U CN 201320638239 U CN201320638239 U CN 201320638239U CN 203535981 U CN203535981 U CN 203535981U
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Abstract
The utility model relates to the touch screen conductive film technology field, and specifically relates to a touch screen conductive film with an obverse/reverse structure. A first zinc oxide layer and a second zinc oxide layer are respectively disposed at the obverse side and the reverse side of a resin substrate, so that transmittance of the touch screen conductive film is good. A first ITO layer and a second ITO layer are disposed at the obverse side of the resin substrate, a third ITO layer and a fourth ITO layer are disposed at the reverse side of the resin substrate, ITO can be crystallized twice, crystallization of the ITO layers can be improved, and good transmittance, low resistivity and good chemical stability of the touch screen conductive film are achieved. A first silicon dioxide layer and a second silicon dioxide layer are relatively high in hardness, so that the touch screen conductive film is very high in abrasive resistance and can be prevented from being scratched. In conclusion, with the obverse side and reverse side double-layer structure, the problem of low yield rates of printing and applying during a single-layer conductive film processing process can be effectively prevented, and the prepared conductive film can be high in transmittance, low in resistivity and good in chemical stability.
Description
Technical field
The utility model relates to touch-screen conducting film technical field, is specifically related to a kind of touch-screen conducting film with positive antistructure.
Background technology
Touch-screen is a kind of remarkable input equipment that improves man machine operation interface, have intuitively, simply, advantage efficiently.Touch-screen obtains a wide range of applications in many electronic products, such as mobile phone, PDA, multimedia, public information inquiry system etc.Touch-screen is commonly used ITO conducting film in making, and ITO conducting film refers to the method that adopts magnetron sputtering, the high-tech product that sputter transparent indium tin oxide (ITO) conductive film coating obtains on transparent organic film material.ITO(Indium Tin Oxides, indium tin metal oxide), as a kind of typical N type oxide semiconductor, be used in widely the fields such as mobile phone, MP3, MP4, digital camera.
Existing ITO conducting film only completes the making of conducting film on a face of resin matrix, the two layers of one-sided ITO conducting film and process for manufacturing touch panel need to be reached the standard grade and roll off the production line, easily in the course of processing, occur that the printing of product and binding yield are lower, can not meet normal production requirement.
Summary of the invention
The purpose of this utility model is for the deficiencies in the prior art, and a kind of touch-screen conducting film with positive antistructure is provided, and can effectively avoid occurring printing and the lower problem of binding yield of product in the course of processing.
To achieve these goals, the utility model adopts following technical scheme:
A kind of touch-screen conducting film with positive antistructure, comprise resin matrix, the front of resin matrix is provided with the first zinc oxide film successively, the one ITO layer, the 2nd ITO layer, the first silicon dioxide layer, the reverse side of resin matrix is provided with the second zinc oxide film successively, the 3rd ITO layer, the 4th ITO layer, the second silicon dioxide layer.
The thickness of described resin matrix is 150-250 micron, and described resin matrix is pet resin matrix.
The thickness of described resin matrix is 150-250 micron, and the first pet resin matrix that described resin matrix is 1:3:1 by Thickness Ratio, poly-imide resin matrix, the second pet resin matrix pressing form.
The thickness of described the first zinc oxide film and the second zinc oxide film is equal, and the thickness of an ITO layer and the 3rd ITO layer is equal, and the thickness of the 2nd ITO layer and the 4th ITO layer is equal, and the thickness of the first silicon dioxide layer and the second silicon dioxide layer equates.
The thickness of described the first zinc oxide film and the second zinc oxide film is 50-100 nanometer; The thickness of the one ITO layer and the 3rd ITO layer is 15-25 nanometer; The thickness of the 2nd ITO layer and the 4th ITO layer is 8-15 nanometer; The thickness of the first silicon dioxide layer and the second silicon dioxide layer is 50-100 micron.
The utility model compared with prior art, beneficial effect is: the utility model arranges respectively the first zinc oxide film and the second zinc oxide film by the obverse and reverse at resin matrix, make the utility model light transmission good, the one ITO layer, the 2nd ITO layer are set in the front of resin matrix, reverse side at resin matrix arranges the 3rd ITO layer and the 4th ITO layer, make ITO through two times of crystallization, the crystallization of ITO layer is more perfect, makes that the utility model light transmission is good, resistivity is low, chemical stability good; The hardness of the first silicon dioxide layer and the second silicon dioxide layer is higher, has very strong resistance to wear, can prevent that the utility model is scratched; To sum up, conducting film of the present utility model has obverse and reverse double-decker, not only effectively avoided individual layer conducting film in the course of processing, to occur printing and the lower problem of binding yield of product, and made that the touch-screen that makes is high by ITO conducting film transmitance, resistivity is low, chemical stability good.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
reference numeral
1---resin matrix
2---the first zinc oxide film
3---an ITO layer
4---the 2nd ITO layer
5---the first silicon dioxide layer
6---the second zinc oxide film
7---the 3rd ITO layer
8---the 4th ITO layer
9---the second silicon dioxide layer.
Embodiment
For the ease of those skilled in the art's understanding, below in conjunction with embodiment and accompanying drawing, the utility model is further described, the content that execution mode is mentioned is not to restriction of the present utility model.
embodiment 1.
See Fig. 1, a kind of touch-screen conducting film with positive antistructure, comprise resin matrix 1, the front of resin matrix 1 is provided with the first zinc oxide film 2 successively, the one ITO layer 3, the 2nd ITO layer 4, the first silicon dioxide layer 5, the reverse side of resin matrix 1 is provided with the second zinc oxide film 6, the three ITO layers 7, the 4th ITO layer 8, the second silicon dioxide layer 9 successively.The utility model arranges respectively the first zinc oxide film 2 and the second zinc oxide film 6 by the obverse and reverse at resin matrix 1, make the utility model light transmission good, the one ITO layer 3, the 2nd ITO layer 4 are set in the front of resin matrix 1, reverse side at resin matrix 1 arranges the 3rd ITO layer 7 and the 4th ITO layer 8, make ITO through two times of crystallization, the crystallization of ITO layer is more perfect, makes that the utility model light transmission is good, resistivity is low, chemical stability good; The hardness of the first silicon dioxide layer 5 and the second silicon dioxide layer 9 is higher, has very strong resistance to wear, can prevent that the utility model is scratched; To sum up, conducting film of the present utility model has obverse and reverse double-decker, not only effectively avoided individual layer conducting film in the course of processing, to occur printing and the lower problem of binding yield of product, and made that the touch-screen that makes is high by ITO conducting film transmitance, resistivity is low, chemical stability good.
The thickness of described resin matrix 1 is 150-250 micron, and described resin matrix 1 is pet resin matrix, within the scope of this, can meet process requirements.
The thickness of described the first zinc oxide film 2 and the second zinc oxide film 6 equates, the thickness of the one ITO layer 3 and the 3rd ITO layer 7 equates, the thickness of the 2nd ITO layer 4 and the 4th ITO layer 8 equates, the thickness of the first silicon dioxide layer 5 and the second silicon dioxide layer 9 equates, to facilitate follow-up process requirements, certainly, also can, according to the needs of the requirement of producer and product, be set as different thickness.
The thickness of described the first zinc oxide film 2 and the second zinc oxide film 6 is 50-100 nanometer; The thickness of the one ITO layer 3 and the 3rd ITO layer 7 is 15-25 nanometer; The thickness of the 2nd ITO layer 4 and the 4th ITO layer 8 is 8-15 nanometer; The thickness of the first silicon dioxide layer 5 and the second silicon dioxide layer 9 is 50-100 micron, can reach the balance of result of use and cost within the scope of this, certainly, in actual production process, can be according to the needs of the requirement of producer and product, choose reasonable thickness, meets the different needs.
embodiment 2.
The difference of the present embodiment and embodiment 1 is: the thickness of described resin matrix 1 is 150-250 micron, the first pet resin matrix that described resin matrix 1 is 1:3:1 by Thickness Ratio, poly-imide resin matrix, the second pet resin matrix pressing form, by the design of this sandwich structure, can give full play to every kind of properties of materials, pliability of the present utility model can be kept, the adhesion of resin matrix 1 and the first zinc oxide film 2 and the second zinc oxide film 6 can be guaranteed again.
Finally should be noted that; above embodiment is only in order to illustrate the technical solution of the utility model; but not restriction to the utility model protection range; although the utility model has been done to explain with reference to preferred embodiment; those of ordinary skill in the art is to be understood that; can modify or be equal to replacement the technical solution of the utility model, and not depart from essence and the scope of technical solutions of the utility model.
Claims (5)
1. a touch-screen conducting film with positive antistructure, it is characterized in that: comprise resin matrix, the front of resin matrix is provided with the first zinc oxide film successively, the one ITO layer, the 2nd ITO layer, the first silicon dioxide layer, the reverse side of resin matrix is provided with the second zinc oxide film successively, the 3rd ITO layer, the 4th ITO layer, the second silicon dioxide layer.
2. a kind of touch-screen conducting film with positive antistructure according to claim 1, is characterized in that: the thickness of described resin matrix is 150-250 micron, and described resin matrix is pet resin matrix.
3. a kind of touch-screen conducting film with positive antistructure according to claim 1, it is characterized in that: the thickness of described resin matrix is 150-250 micron, the first pet resin matrix that described resin matrix is 1:3:1 by Thickness Ratio, poly-imide resin matrix, the second pet resin matrix pressing form.
4. a kind of touch-screen conducting film with positive antistructure according to claim 1, it is characterized in that: the thickness of described the first zinc oxide film and the second zinc oxide film equates, the thickness of the one ITO layer and the 3rd ITO layer equates, the thickness of the 2nd ITO layer and the 4th ITO layer is equal, and the thickness of the first silicon dioxide layer and the second silicon dioxide layer equates.
5. a kind of touch-screen conducting film with positive antistructure according to claim 1, is characterized in that: the thickness of described the first zinc oxide film and the second zinc oxide film is 50-100 nanometer; The thickness of the one ITO layer and the 3rd ITO layer is 15-25 nanometer; The thickness of the 2nd ITO layer and the 4th ITO layer is 8-15 nanometer; The thickness of the first silicon dioxide layer and the second silicon dioxide layer is 50-100 micron.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320638239.2U CN203535981U (en) | 2013-10-16 | 2013-10-16 | Touch screen conductive film with obverse/reverse structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320638239.2U CN203535981U (en) | 2013-10-16 | 2013-10-16 | Touch screen conductive film with obverse/reverse structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203535981U true CN203535981U (en) | 2014-04-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320638239.2U Expired - Fee Related CN203535981U (en) | 2013-10-16 | 2013-10-16 | Touch screen conductive film with obverse/reverse structure |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107863182A (en) * | 2016-11-04 | 2018-03-30 | 江苏日久光电股份有限公司 | A kind of touch-screen double-deck ITO conductive films and preparation method thereof |
-
2013
- 2013-10-16 CN CN201320638239.2U patent/CN203535981U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107863182A (en) * | 2016-11-04 | 2018-03-30 | 江苏日久光电股份有限公司 | A kind of touch-screen double-deck ITO conductive films and preparation method thereof |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140409 Termination date: 20211016 |