CN203535380U - Shutter device and photoetching equipment - Google Patents
Shutter device and photoetching equipment Download PDFInfo
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- CN203535380U CN203535380U CN201320672375.3U CN201320672375U CN203535380U CN 203535380 U CN203535380 U CN 203535380U CN 201320672375 U CN201320672375 U CN 201320672375U CN 203535380 U CN203535380 U CN 203535380U
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- blade
- shutter device
- rotating shaft
- lithographic equipment
- light beam
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Abstract
The utility model provides a shutter device. The shutter device comprises a light tunnel enabling light beams to pass through, and a first blade rotating around a first rotating shaft, wherein the first rotating shaft is arranged beside the light tunnel; when the first blade is arranged at a first resting position, the light beams pass through the light tunnel completely; when the first blade is arranged at a second resting position, all the light beams do not pass through the light tunnel; the shutter device further comprises a first detector capable of detecting the light transmission of the first blade. The utility model also provides photoetching equipment comprising the shutter device. According to the shutter device and the photoetching equipment, the first detector can discover whether the first blade is broken through or not in time by detecting the light transmission of the first blade, so that the situation that the first blade can completely resist the light beams can be guaranteed to improve the photoetching accuracy and product yield.
Description
Technical field
The utility model relates to field of semiconductor manufacture, relates in particular to a kind of shutter device and lithographic equipment.
Background technology
The essence of photoetching is to will carry out on the wafer (wafer) of etching or Implantation later patch structure replication.First these structures are produced on mask plate with graphic form.Ultraviolet light sees through mask plate figure is transferred on the photo-conductive film of crystal column surface.
Fig. 1 is the schematic diagram of lithographic equipment in prior art.Lithographic equipment 1 comprises that one can produce the light source 11 of light beam 101, and described light beam 101 is regulated by lay the grain system 12 after being sent by described light source 11, and the irradiation that makes to enter the light beam 101 of shutter device 13 meets the requirements.Then, light beam 101, after condenser 14, is irradiated on mask plate 15, and by graph copying to wafer 16, so that described wafer 16 is carried out to photoetching process.
Wherein, described shutter device 13 is for controlling the amount that is irradiated to the light beam 101 on described mask plate 15.At this, the I-Line board of ASML of take is specifically described as example, and in conjunction with Fig. 2, described shutter device 13 has a housing 131, and a side of described housing 131 has a stationary plane 132, has the optical channel 133 that light beam 101 is passed through in described housing 131.On described stationary plane 132, be fixed with the first blade 134 and the second blade 136, described the first blade 134 is lighttight plate, described the first blade 134 is around the first rotating shaft 135 rotations, when described the first blade 134 rotates in the light path of described light beam 101 (top of described optical channel 133), described the first blade 134 blocks described light beam 101, described light beam 101 can not be passed, thereby realize described light beam 101, on described mask plate 15, there is 0% amount; When described the first blade 134 rotates to beyond the light path of described light beam 101 (not being positioned at the top of described optical channel 133), described the first blade 134 can not block described light beam 101, now, need to coordinate the rotation of described the second blade 136 on described mask plate 15, to there is how many amounts to control described light beam 101.
Described the second blade 136 in the I-Line board of ASML is around the second rotating shaft 137 rotations, described the second blade 136 has three the first blades 136a, the second blades 136b and the 3rd blades 136c, on the first blades 136a, the second blades 136b and the 3rd blades 136c, there is the light hole differing in size, make the transmittance of the first blades 136a, the second blades 136b and the 3rd blades 136c respectively be 25%, 50% and 75%.When described the first blade 134 rotates to beyond the light path of described light beam 101: when described the first blades 136a stops in the light path of described light beam 101, the amount of described light beam 101 on described mask plate 15 is 25%; When described the second blades 136b stops in the light path of described light beam 101, the amount of described light beam 101 on described mask plate 15 is 50%; When described the 3rd blades 136c stops in the light path of described light beam 101, the amount of described light beam 101 on described mask plate 15 is 75%; When described the second blade 136 rotates, the light path that makes described light beam 101 is between described the first blades 136a and the 3rd blades 136c time, and the amount of described light beam 101 on described mask plate 15 is 100%.
Yet in use, described the first blade 134 usually can be punctured by described light beam 101 the I-Line board of ASML, thereby can not stop described light beam 101 completely, makes described light beam 101 cannot reach 0% amount on described mask plate 15; In addition, during the rotation of described the second blade 136, by motor, control, but there will be described second rotation of blade 136 and the rotation of motor nonsynchronous abnormal, thereby cannot accurately control the amount of described light beam 101 on described mask plate 15.But in prior art, cannot monitor in real time above-mentioned abnormal conditions, often need to monitor by the measurement of the critical size in subsequent technique (CD), thereby affect production capacity.
Utility model content
The purpose of this utility model is to provide a kind of shutter device and lithographic equipment, can effectively monitor abnormality common in shutter device, reduces the impact on product.
To achieve these goals, the utility model proposes a kind of shutter device and lithographic equipment, described shutter device has an optical channel that light beam is passed through, and the first blade rotating around one first rotating shaft, wherein, described the first rotating shaft is positioned at by described optical channel, described the first blade has the first rest position and the second rest position, when described the first blade is positioned at described the first rest position, described light beam is completely by described optical channel, when described the first blade is positioned at described the second rest position, described light beam is not entirely by described optical channel, described shutter device also has first detector that can detect described the first blade light transmission.
Further, in the shutter device of described lithographic equipment, described the first rest position is positioned at the side that described the first rotating shaft deviates from described optical channel.
Further, in the shutter device of described lithographic equipment, described the first detector is positioned at the side that described the first rotating shaft deviates from described optical channel.
Further, in the shutter device of described lithographic equipment, described shutter device has the second blade of the described light beam percent of pass of a control, described the second blade shroud rotates around one second rotating shaft, described the second blade has n stop position, described shutter device also has second detector that can detect described the second leaf position, and n is positive integer.
Further, in the shutter device of described lithographic equipment, described shutter device also has a catch, described catch rotates around described the second rotating shaft with described the second blade synchronization, on described catch, there is n mutually different mark, the corresponding described stop position of mark described in each, described the second blade stop position described in each, described the second detector detects a corresponding described mark.
Further, in the shutter device of described lithographic equipment, described the second blade has four stop positions, described the second blade has the first blades, the second blades and the 3rd blades, the light beam percent of pass of described the first blades, the second blades and the 3rd blades is different, described catch has four described marks, is labeled as the permutation and combination of some figures respectively described in four, and described figure is surveyed in described the second detector inspection.
Further, in the shutter device of described lithographic equipment, be labeled as the permutation and combination of two figures respectively described in four, described the second detector has two signal sensors of corresponding two described figures.
Further, in the shutter device of described lithographic equipment, described the first rotating shaft and the second rotating shaft lay respectively at the both sides of described optical channel.
Further, in the shutter device of described lithographic equipment, described shutter device has a stationary plane, and described the first blade and the second blade are fixed on described stationary plane by described the first rotating shaft and the second rotating shaft rotation respectively.
According to another side of the present utility model, the utility model also provides a kind of lithographic equipment, and described lithographic equipment has shutter device as above.
Compared with prior art, the beneficial effects of the utility model are mainly reflected in:
1, in shutter device of the present utility model and lithographic equipment, described calibrating installation has first detector that can detect described the first blade light transmission, compared with prior art, described the first detector is by detecting described the first blade light transmission, can find in time that whether described the first blade is breakdown, thereby can guarantee that described the first blade can stop described light beam completely, thereby improve the accuracy of photoetching, improve the yield of product.
2, in shutter device of the present utility model and lithographic equipment, described shutter device also has second detector that can detect described the second leaf position, thereby the rotation that detects described the second blade whether with the rotary synchronous of motor, accurately to monitor the amount of described light beam on described mask plate, thereby further improve the accuracy of photoetching, improve the yield of further product.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of lithographic equipment in prior art;
Fig. 2 is the schematic diagram of shutter device in prior art;
Fig. 3 is the schematic diagram of shutter device in the utility model one embodiment;
Fig. 4 is the schematic diagram of baffle plate in shutter device in the utility model one embodiment.
Embodiment
Below in conjunction with schematic diagram, shutter device of the present utility model and lithographic equipment are described in more detail, wherein represented preferred embodiment of the present utility model, should be appreciated that those skilled in the art can revise the utility model described here, and still realize advantageous effects of the present utility model.Therefore, following description is appreciated that extensively knowing for those skilled in the art, and not as to restriction of the present utility model.
For clear, whole features of practical embodiments are not described.They in the following description, are not described in detail known function and structure, because can make the utility model chaotic due to unnecessary details.Will be understood that in the exploitation of any practical embodiments, must make a large amount of implementation details to realize developer's specific objective, for example, according to the restriction of relevant system or relevant business, by an embodiment, change into another embodiment.In addition, will be understood that this development may be complicated and time-consuming, but be only routine work to those skilled in the art.
In the following passage, with reference to accompanying drawing, with way of example, the utility model is more specifically described.According to the following describes and claims, advantage of the present utility model and feature will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the object of aid illustration the utility model embodiment lucidly.
Please refer to Fig. 3, illustrate the present embodiment and propose a kind of shutter device, described shutter device 23 has an optical channel 233 that light beam is passed through, and the first blade 234 rotating around one first rotating shaft 235, wherein, it is other that described the first rotating shaft 235 is positioned at described optical channel 233, described the first blade 234 has the first rest position and the second rest position, in the present embodiment, described the first rest position is positioned at the side that described the first rotating shaft deviates from described optical channel, to avoid the impact on the second blade rotary.When described the first blade 234 is positioned at described the first rest position, described the first blade 234 can not stop described light beam, and described light beam is completely by described optical channel 233; When described the first blade 234 is positioned at described the second rest position, described the first blade 234 stops described light beam, and described light beam is not entirely by described optical channel 233.Described shutter device 23 also has first detector 211 that can detect described the first blade 234 light transmissions, described the first detector 211 is by detecting the light transmission of described the first blade 234, can find in time that whether described the first blade 234 is breakdown, thereby can guarantee that described the first blade 234 can stop described light beam completely, thereby improve the accuracy of photoetching, improve the yield of product.
In the present embodiment, described the first detector 211 detects when described the first blade 234 is positioned at described the first rest position, so described the first detector 211 is positioned at described the first rotating shaft 235 and deviates from a side of described optical channel 233.Wherein, described the first detector 211 can be reflective detector, by sending light wave, described light wave is received by described the first detector 211 after described the first blade 234 reflections, thereby judge the light transmission of described the first blade 234, but described the first detector 211 is not limited to as reflective detector, it can also be the light transmission of contrast formula.
Preferably, described shutter device 23 has the second blade 236 of the described light beam percent of pass of a control, described the second blade 236 is around one second rotating shaft 237 rotations, described the second blade 236 has n stop position, and described shutter device 23 also has second detector that can detect described the second blade 236 positions.The rotation that described the second detector can detect described the second blade 236 whether with the rotary synchronous of motor, accurately to monitor the amount of described light beam on described mask plate, thereby further improve the accuracy of photoetching, improve the yield of further product.
In the present embodiment, described shutter device 23 has a catch 222, and described catch 222 synchronously rotates around described the second rotating shaft 237 with described the second blade 236.On described catch 222, there is n mutually different mark, the corresponding described stop position of mark described in each, described the second blade 236 stop position described in each, described the second detector detects a corresponding described mark, to judge the position of described the second blade 236.
The I-Line board of ASML of take illustrates as example, described the second blade 236 has the first blades 236a, the second blades 236b and the 3rd blades 236c, the light beam percent of pass of described the first blades 236a, the second blades 236b and the 3rd blades 236c is respectively 25%, 50% and 75%, described the second blade 236 has four stop positions (in other embodiments, n can also be the positive integers such as 2,3,5): when described the first blades 236a stops in the light path of described light beam, the amount of described light beam on described mask plate is 25%; When described the second blades 236b stops in the light path of described light beam, the amount of described light beam on described mask plate is 50%; When described the 3rd blades 236c stops in the light path of described light beam, the amount of described light beam on described mask plate is 75%; When described the second blade 236 rotates, the light path that makes described light beam is between described the first blades 236a and the 3rd blades 236c time, and the amount of described light beam on described mask plate is 100%.
As shown in Figure 4, described catch 222 have 251,252,253,254, four described marks 251,252,253,254 of four described marks respectively one by one corresponding described the second blade 236 there are four stop positions.In the present embodiment, four permutation and combination that described mark 251,252,253,254 is two figures of difference, for example, two figures can be two squares side by side, described mark 251 is for have two figures simultaneously, described mark 252 is for having a figure, and described mark 253 is for having another figure, and described mark 254 does not have any one figure.Described the second detector 220 has two signal sensors 223,224 of corresponding two described figures.When the signal of two signal sensors 223,224 is respectively 1,1, what described the second detector 220 detected is described mark 251, and described the first blades 236a stops in the light path of described light beam; When the signal of two signal sensors 223,224 is respectively 1,1, what described the second detector 220 detected is described mark 251, and described the first blades 236a stops in the light path of described light beam; When the signal of two signal sensors 223,224 is respectively 0,1, what described the second detector 220 detected is described mark 252, and described the second blades 236b stops in the light path of described light beam; When the signal of two signal sensors 223,224 is respectively 1,0, what described the second detector 220 detected is described mark 253, and described the 3rd blades 236c stops in the light path of described light beam; When the signal of two signal sensors 223,224 is respectively 0,0, what described the second detector 220 detected is described mark 254, and the light path of described light beam is between described the first blades 236a and the 3rd blades 236c.
But it is the permutation and combination of two figures that four described marks are not limited to, it can also be the permutation and combination of three, four or more figure, described the second detector 220 can also be surveyed the position of rotation that described figure judges described catch 222 by inspection, thereby judges the position of rotation of described the second blade 236.
In the present embodiment, described the first rotating shaft 235 and the second rotating shaft 237 lay respectively at the both sides of described optical channel 233, to avoid influencing each other between described the first blade 234 and described the second blade 236.
In the present embodiment, described the first blade 234 and described the second blade 236 are fixed on stationary plane 232 by described the first rotating shaft 235 and the second rotating shaft 237 respectively.Described the first detector 211 can be positioned at described the first blade 234 towards or deviate from a side of described stationary plane 232, specifically do not limit; In like manner, described the second detector 220 can be positioned at described the second blade 236 towards or deviate from a side of described stationary plane 232, specifically do not limit.
Described shutter device 23 of the present utility model can be for lithographic equipment, and wherein, described shutter device 23 and lithographic equipment can also comprise some other necessary parts, this common practise that is this area, and therefore not to repeat here.
To sum up, core concept at the utility model embodiment is to provide a kind of shutter device and lithographic equipment, described shutter device has an optical channel that light beam is passed through, and the first blade rotating around one first rotating shaft, wherein, described the first rotating shaft is positioned at by described optical channel, described the first blade has the first rest position and the second rest position, when described the first blade is positioned at described the first rest position, described light beam is completely by described optical channel, when described the first blade is positioned at described the first rest position, described light beam is not entirely by described optical channel, described shutter device also has first detector that can detect described the first blade light transmission.Compared with prior art, the beneficial effects of the utility model are mainly reflected in:
1, in shutter device of the present utility model and lithographic equipment, described calibrating installation has first detector that can detect described the first blade light transmission, compared with prior art, described the first detector is by detecting described the first blade light transmission, can find in time that whether described the first blade is breakdown, thereby can guarantee that described the first blade can stop described light beam completely, thereby improve the accuracy of photoetching, improve the yield of product.
2, in shutter device of the present utility model and lithographic equipment, described shutter device also has second detector that can detect described the second leaf position, thereby the rotation that detects described the second blade whether with the rotary synchronous of motor, accurately to monitor the amount of described light beam on described mask plate, thereby further improve the accuracy of photoetching, improve the yield of further product.
Above are only preferred embodiment of the present utility model, the utility model is not played to any restriction.Any person of ordinary skill in the field; within not departing from the scope of the technical solution of the utility model; the technical scheme that the utility model is disclosed and technology contents are made any type of changes such as replacement or modification that are equal to; all belong to the content that does not depart from the technical solution of the utility model, within still belonging to protection domain of the present utility model.
Claims (10)
1. the shutter device of a lithographic equipment, it is characterized in that, described shutter device has an optical channel that light beam is passed through, and one first blade rotating around the first rotating shaft, wherein, described the first rotating shaft is positioned at by described optical channel, described the first blade has the first rest position and the second rest position, when described the first blade is positioned at described the first rest position, described light beam is completely by described optical channel, when described the first blade is positioned at described the second rest position, described light beam is not entirely by described optical channel, described shutter device also has first detector that can detect described the first blade light transmission.
2. the shutter device of lithographic equipment as claimed in claim 1, is characterized in that, described the first rest position is positioned at the side that described the first rotating shaft deviates from described optical channel.
3. the shutter device of lithographic equipment as claimed in claim 2, is characterized in that, described the first detector is positioned at the side that described the first rotating shaft deviates from described optical channel.
4. the shutter device of the lithographic equipment as described in any one in claim 1-3, it is characterized in that, described shutter device has the second blade of the described light beam percent of pass of a control, described the second blade shroud rotates around the second rotating shaft, described the second blade has n stop position, described shutter device also has second detector that can detect described the second leaf position, and n is positive integer.
5. the shutter device of lithographic equipment as claimed in claim 4, it is characterized in that, described shutter device also has a catch, described catch rotates around described the second rotating shaft with described the second blade synchronization, on described catch, there is n mutually different mark, the corresponding described stop position of mark described in each, described the second blade stop position described in each, described the second detector detects a corresponding described mark.
6. the shutter device of lithographic equipment as claimed in claim 5, it is characterized in that, described the second blade has four stop positions, described the second blade has the first blades, the second blades and the 3rd blades, the light beam percent of pass of described the first blades, the second blades and the 3rd blades is different, described catch has four described marks, is labeled as the permutation and combination of some figures respectively described in four, and described figure is surveyed in described the second detector inspection.
7. the shutter device of lithographic equipment as claimed in claim 6, is characterized in that, is labeled as the permutation and combination of two figures respectively described in four, and described the second detector has two signal sensors of corresponding two described figures.
8. the shutter device of lithographic equipment as claimed in claim 4, is characterized in that, described the first rotating shaft and the second rotating shaft lay respectively at the both sides of described optical channel.
9. the shutter device of lithographic equipment as claimed in claim 4, is characterized in that, described shutter device has a stationary plane, and described the first blade and the second blade are fixed on described stationary plane by described the first rotating shaft and the second rotating shaft rotation respectively.
10. a lithographic equipment, is characterized in that, described lithographic equipment has the shutter device as described in any one in claim 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320672375.3U CN203535380U (en) | 2013-10-29 | 2013-10-29 | Shutter device and photoetching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320672375.3U CN203535380U (en) | 2013-10-29 | 2013-10-29 | Shutter device and photoetching equipment |
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| Publication Number | Publication Date |
|---|---|
| CN203535380U true CN203535380U (en) | 2014-04-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320672375.3U Expired - Fee Related CN203535380U (en) | 2013-10-29 | 2013-10-29 | Shutter device and photoetching equipment |
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| CN (1) | CN203535380U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017167259A1 (en) * | 2016-03-31 | 2017-10-05 | 上海微电子装备（集团）股份有限公司 | Shutter device used for exposure in lithography machine, and method for use thereof |
| CN110196532A (en) * | 2018-02-27 | 2019-09-03 | 上海微电子装备（集团）股份有限公司 | Litho machine safety shutter device |
-
2013
- 2013-10-29 CN CN201320672375.3U patent/CN203535380U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017167259A1 (en) * | 2016-03-31 | 2017-10-05 | 上海微电子装备（集团）股份有限公司 | Shutter device used for exposure in lithography machine, and method for use thereof |
| US10712668B2 (en) | 2016-03-31 | 2020-07-14 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Shutter device used for exposure in lithography machine, and method for use thereof |
| CN110196532A (en) * | 2018-02-27 | 2019-09-03 | 上海微电子装备（集团）股份有限公司 | Litho machine safety shutter device |
| WO2019165904A1 (en) * | 2018-02-27 | 2019-09-06 | 上海微电子装备（集团）股份有限公司 | Safety shutter device for photoetching machine |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140409 Termination date: 20191029 |