CN203346476U - Single cavity coating equipment - Google Patents
Single cavity coating equipment Download PDFInfo
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- CN203346476U CN203346476U CN 201320414050 CN201320414050U CN203346476U CN 203346476 U CN203346476 U CN 203346476U CN 201320414050 CN201320414050 CN 201320414050 CN 201320414050 U CN201320414050 U CN 201320414050U CN 203346476 U CN203346476 U CN 203346476U
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- chamber
- corrugated tube
- cavity
- flange
- vacuum
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Abstract
The utility model relates to single cavity coating equipment and mainly solves the problems that the existing product is complex in structure, production cost is high and debugging is inflexible. The single cavity coating equipment comprises a frame structure, wherein a reaction cavity part, a gas tank, an electronic control part and a touch screen are arranged on the frame structure, and the electronic control part is arranged below the frame structure and used for controlling each parameter of the single cavity coating equipment and providing power.The single cavity coating equipment has the advantages that a full-automatic transmission process of a wafer from a front-end module to a reaction cavity via a wafer transmission cavity, the wafer is taken and placed by hands, automatic operation is changed into manual operation, and cost can be saved in certain extent; the single cavity coating equipment achieves industrialized film-forming quality with low cost and highly intensive volume and is convenient for small scale production by a small FAB (fabrication) factory and flexible debugging by a research and development institution.
Description
Technical field
The utility model is a kind of manually operated single chamber filming equipment, can carry out thin film deposition to the wafer of plurality of specifications, belongs to semiconductor film deposition technique field.
Background technology
At present, semiconductor coated film equipment is 12 inches semiconductor coated film equipment especially, mainly by major portions such as front equipment end module (EFEM:equipment front-end module), wafer transmission system (WTS:wafer transfer system), load chamber (Load Lock), reaction chambers (Process Chamber), formed, be applicable to the production in enormous quantities of IC factory.For chasing the Moore's Law of semicon industry, each large IC equipment manufacturers concentrate on the focus of equipment development in the production in enormous quantities of single wafer specification in the world, and production efficiency is high, but equipment cost also non-enterprise at the early-stage can accept.And the China in the IC industry development stage, more medium-sized and small enterprises are in the face of IC equipment fancy price, real difficult unmatch.
Summary of the invention
The purpose of this utility model is for above-mentioned the deficiencies in the prior art, and provide a kind of with low cost and can debug flexibly, be applicable to novel single chamber filming equipment that small-sized FAB factory's small serial production and R&D institution are used, this equipment has carried out following improvement to existing installation:
1, remove front-end module, wafer transfer system, pass sheet chamber and auxiliary facility thereof, centered by reaction chamber, device height is integrated, adopt manual mode to carry out the loading and unloading of wafer, with the short run trial-production that adapts to small-sized Fab factory and R&D institution, the demand of producing, and cutting down cost significantly.
2, heating plate adopts 12 cun designs leading in the world, coordinates corresponding processing parameter, can load the wafer of all size of 2 cun to 12 cun (comprising 12 cun), applies the quality of forming film that ripe coating process can reach industrialized standard.
3, for the adjustment of the important parameter-interpole gap in coating process (between upper and lower two battery lead plates distance), adopt manual adjustment mechanism, can adjust in real time interpole gap and obtain accurate numerical value, facilitating the scientific research personnel repeatedly to adjust interpole gap, and significantly reduce costs.
For achieving the above object, the utility model adopts following technical proposals: single chamber filming equipment, comprise skeleton construction (4), upper reaction chamber part (1), gas tank (6), automatically controlled part (7) and the touch-screen (8) installed of skeleton construction (4), described automatically controlled part (7) is installed on the below of skeleton construction (4), for the operating device parameters, provide power supply.
Above-mentioned reaction chamber part (1), comprise cavity assembly (17), shield assemblies (10), vacuum pipeline assembly (19) and plenum chamber (20).
Above-mentioned reaction chamber part (1) is provided with viewing window (5), the aura state when observing that cavity assembly (17) is inner, and thin film deposition occurs.
At the bottom of above-mentioned cavity assembly (17) and chamber, (31) form chamber, and heating plate (32) is installed on the moving flange (28) of corrugated tube in plenum chamber (20) through (31) at the bottom of chamber.Handle (37) is housed on described cavity assembly (17), and while upwards promoting handle (37), cavity assembly (17) rotates and opens around hinge (2), and nitrogen spring (3) provides supplemental support and the power-assisted of cavity (17).
Ceramic platen (15), it is upper that shower plate (33) is fixed on shower nozzle upper plate (13) by same group of screw, shower nozzle upper plate (13) and ceramic ring (14) pass through insulation covering (35), by screw fastening on cavity (17).
It is upper that ceramics seat (12) is arranged on shower nozzle upper plate (13), and it is upper that mixing chamber (36) is arranged on ceramics seat (12), and multichannel process pipeline (11) is through (31) and cavity (17) at the bottom of chamber, and bout becomes a road, is connected on mixing chamber (36).The below of (31) at the bottom of vacuum gauge (30) is connected in chamber.
It is upper that above-mentioned shield assemblies (10) is arranged on cavity assembly (17), the radio frequency component that supports and be fixed thereon (9).
At the bottom of plenum chamber (20) is installed on chamber, (31) are upper, and the pore on it (18) is aligned.Plenum chamber (20) bottom connects corrugated tube and determines flange (27), corrugated tube moves flange (28) and is enclosed within regulating sleeve (40), regulating sleeve (40) is enclosed within corrugated tube to be determined in flange (27), corrugated tube is determined flange (27) and is connected with corrugated tube (29) with the moving flange (28) of corrugated tube, reaches the effect of sealing.Regulating sleeve (40) is determined flange (27) with corrugated tube and is used screw fastening.
Support tube (24) is fixing with regulating sleeve (40), and leading screw (23) is connected with handwheel (22) through support tube (24), and it is upper that screw (25) is fixed on the moving flange (28) of corrugated tube, and leading screw (23) is connected by screw thread pair with screw (25).
During rotation hand wheel (22), leading screw (23) rotation, corrugated tube moves flange (28) and moves up and down with screw (25), and then reaches the purpose of regulating the distance between heating plate (32) upper surface and shower plate (33).
Above-mentioned vacuum pipeline assembly (19) comprising: angle valve (39), and regulating sleeve (40) and vacuum pipeline (38), angle valve (39) connects plenum chamber (20).Angle valve (39) is for opening or turn-offing vacuum system, and throttling valve (21) is connected with angle valve (39), and regulating sleeve (40) forms feedback, conditioning equipment vacuum tightness with vacuum gauge (30).Vacuum pipeline (38) connects vacuum pump.
Process gas connects gas tank (6), and the multipath gas pipeline, after inside completes connection, integration, is connected to the inside of cavity assembly (17) by process pipeline (11).
Characteristics of the present utility model and beneficial effect:
The utility model simplified wafer from front-end module through passing the full-automatic transmitting procedure of sheet chamber to reaction chamber, change the manual manipulation sheet into, changing be manual automatically, is the cost-saving space that provides.Cheap cost for the utility model, highly intensive volume, reach industrialized quality of forming film, facilitates the flexible debugging of small-sized FAB factory's small serial production and R&D institution.
The accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
Fig. 2 is cavity assembly sectional axonometric drawing in Fig. 1
Fig. 3 is the structural representation of vacuum pipeline assembly in Fig. 1.
Embodiment
Embodiment
With reference to Fig. 1-3, single chamber filming equipment, comprise skeleton construction 4, and reaction chamber part 1, gas tank 6, automatically controlled part 7 and touch-screen 8 are installed on skeleton construction 4, and described automatically controlled part 7 is installed on the below of skeleton construction 4, for the operating device parameters, provides power supply.
Above-mentioned reaction chamber part 1, comprise cavity assembly 17, shield assemblies 10, vacuum pipeline assembly 19 and plenum chamber 20.
At the bottom of above-mentioned cavity assembly 17 and chamber, 31 form chamber, and heating plate 32 is through on the 31 moving flanges 28 of corrugated tube that are installed in plenum chamber 20 at the bottom of chamber.On described cavity assembly 17, handle 37 is housed, while upwards promoting handle 37, cavity assembly 17 rotates and opens around hinge 2, and nitrogen spring 3 provides supplemental support and the power-assisted of cavity 17.
The aura state of viewing window 5 when observing that cavity assembly 17 is inner, and thin film deposition occurs.
Above-mentioned shield assemblies 10 is arranged on cavity assembly 17, the radio frequency component 9 that supports and be fixed thereon.
Above-mentioned plenum chamber 20 is installed at the bottom of chamber on 31, and the pore 18 on it is aligned.Plenum chamber 20 bottoms connect corrugated tube and determine flange 27, and the moving flange 28 of corrugated tube is enclosed within regulating sleeve 40, and regulating sleeve 40 is enclosed within corrugated tube to be determined in flange 27, and corrugated tube is determined flange 27 and is connected with the moving flange 28 use corrugated tubes 29 of corrugated tube, reaches the effect of sealing.Regulating sleeve 40 is determined flange 27 with corrugated tube and is used screw fastening.
During rotation hand wheel 22, leading screw 23 rotations, the moving flange 28 of corrugated tube moves up and down with screw 25, and then reaches the purpose of regulating the distance between heating plate 32 upper surfaces and shower plate 33.
Above-mentioned vacuum pipeline assembly 19 comprises: angle valve 39, and regulating sleeve 40 and vacuum pipeline 38, angle valve 39 connects plenum chamber 20.Angle valve 39 is for opening or turn-offing vacuum system, and throttling valve 21 is connected with angle valve 39, and regulating sleeve 40 forms feedback, conditioning equipment vacuum tightness with vacuum gauge 30.Vacuum pipeline 38 connects vacuum pump.
Process gas connects gas tank 6, and the multipath gas pipeline, after inside completes connection, integration, is connected to the inside of cavity assembly 17 by process pipeline 11.
Operating process of the present utility model:
1, first upwards promote handle 37, open cavity 17, place the wafer for thin film deposition on heating plate 32, close afterwards cavity;
2, by touch-screen 8 setup parameters and control film deposition process;
3, rotate handwheel 22, but the distance between flexible heating plate 32 and shower plate 33, and electrical control system 7 can be controlled the temperature of heating plate 32;
4, participate in the gas of reaction, by process pipeline 11, mixing chamber 36, ceramics seat 12, shower nozzle upper plate 13, come cavity 17 inside, after baffle plate 34 is adjusted the air-flow distribution, through shower plate 33, evenly be sprayed at crystal column surface.
5, heating plate 32 ground connection, as bottom crown, as top crown, form plasma field between upper bottom crown, assisted film deposition after shower plate 33 loading high-power RFs.
Claims (6)
1. single chamber filming equipment, comprise skeleton construction (4), it is characterized in that: upper reaction chamber part (1), gas tank (6), automatically controlled part (7) and the touch-screen (8) installed of skeleton construction (4), described automatically controlled part (7) is installed on the below of skeleton construction (4).
2. single chamber as claimed in claim 1 filming equipment, it is characterized in that: described reaction chamber part (1), comprise cavity assembly (17), shield assemblies (10), vacuum pipeline assembly (19) and plenum chamber (20), at the bottom of cavity assembly (17) and chamber, (31) form chamber, and heating plate (32) is installed on the moving flange (28) of corrugated tube in plenum chamber (20) through (31) at the bottom of chamber.
3. single chamber as claimed in claim 2 filming equipment, it is characterized in that: handle (37) is housed on described cavity assembly (17), while upwards promoting handle (37), cavity assembly (17) rotates and opens around hinge (2), nitrogen spring (3) provides supplemental support and the power-assisted of cavity (17), ceramic platen (15), shower plate (33) is fixed on shower nozzle upper plate (13) by same group of screw, shower nozzle upper plate (13) and ceramic ring (14) are by insulation covering (35), by screw fastening on cavity (17), ceramics seat (12) is arranged on shower nozzle upper plate (13), mixing chamber (36) is arranged on ceramics seat (12), multichannel process pipeline (11) is through (31) and cavity (17) at the bottom of chamber, bout becomes a road, be connected on mixing chamber (36), the below of (31) at the bottom of vacuum gauge (30) is connected in chamber.
4. single chamber as claimed in claim 2 filming equipment, it is characterized in that: described shield assemblies (10) is arranged on cavity assembly (17), the radio frequency component that supports and be fixed thereon (9), at the bottom of plenum chamber (20) is installed on chamber on (31), and the pore on it (18) is aligned, above-mentioned plenum chamber (20) bottom connects corrugated tube and determines flange (27), corrugated tube moves flange (28) and is enclosed within regulating sleeve (40), regulating sleeve (40) is enclosed within corrugated tube to be determined in flange (27), corrugated tube is determined flange (27) and is connected with corrugated tube (29) with the moving flange (28) of corrugated tube, above-mentioned regulating sleeve (40) is determined flange (27) with corrugated tube and is used screw fastening, support tube (24) is fixing with regulating sleeve (40), leading screw (23) is connected with handwheel (22) through support tube (24), screw (25) is fixed on the moving flange (28) of corrugated tube, leading screw (23) is connected by screw thread pair with screw (25).
5. single chamber as claimed in claim 2 filming equipment, it is characterized in that: described vacuum pipeline assembly (19), comprise angle valve (39), regulating sleeve (40) and vacuum pipeline (38), angle valve (39) connects plenum chamber (20), angle valve (39) is for opening or turn-off vacuum system, throttling valve (21) is connected with angle valve (39), regulating sleeve (40) forms feedback with vacuum gauge (30), conditioning equipment vacuum tightness, vacuum pipeline (38) connects vacuum pump, process gas connects gas tank (6), the multipath gas pipeline completes connection in inside, after integration, be connected to the inside of cavity assembly (17) by process pipeline (11).
6. single chamber as claimed in claim 1 filming equipment is characterized in that: described reaction chamber part (1) is provided with viewing window (5), the aura state when observing that cavity assembly (17) is inner, and thin film deposition occurs.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320414050 CN203346476U (en) | 2013-07-12 | 2013-07-12 | Single cavity coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320414050 CN203346476U (en) | 2013-07-12 | 2013-07-12 | Single cavity coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203346476U true CN203346476U (en) | 2013-12-18 |
Family
ID=49746398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320414050 Expired - Lifetime CN203346476U (en) | 2013-07-12 | 2013-07-12 | Single cavity coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203346476U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016033972A1 (en) * | 2014-09-01 | 2016-03-10 | 沈阳拓荆科技有限公司 | Cavity air flow direction variable structure |
| CN113136564A (en) * | 2020-12-31 | 2021-07-20 | 拓荆科技股份有限公司 | Single-cavity film coating system |
-
2013
- 2013-07-12 CN CN 201320414050 patent/CN203346476U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016033972A1 (en) * | 2014-09-01 | 2016-03-10 | 沈阳拓荆科技有限公司 | Cavity air flow direction variable structure |
| CN113136564A (en) * | 2020-12-31 | 2021-07-20 | 拓荆科技股份有限公司 | Single-cavity film coating system |
| CN113136564B (en) * | 2020-12-31 | 2023-02-24 | 拓荆科技股份有限公司 | Single-cavity film coating system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: No.900 Shuijia, Hunnan District, Shenyang City, Liaoning Province Patentee after: Tuojing Technology Co.,Ltd. Address before: 110179 3rd floor, No.1-1 Xinyuan street, Hunnan New District, Shenyang City, Liaoning Province Patentee before: SHENYANG PIOTECH Co.,Ltd. |
|
| CP03 | Change of name, title or address | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131218 |
|
| CX01 | Expiry of patent term |