CN203329640U - Standard gas mixing device for gas testing system - Google Patents
Standard gas mixing device for gas testing system Download PDFInfo
- Publication number
- CN203329640U CN203329640U CN2013203763922U CN201320376392U CN203329640U CN 203329640 U CN203329640 U CN 203329640U CN 2013203763922 U CN2013203763922 U CN 2013203763922U CN 201320376392 U CN201320376392 U CN 201320376392U CN 203329640 U CN203329640 U CN 203329640U
- Authority
- CN
- China
- Prior art keywords
- gas
- carrier
- vaporization chamber
- carrier gas
- mixing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Abstract
The utility model relates to a standard gas mixing device for a gas testing system. The standard gas mixing device comprises a carrier gas cylinder for supplying a carrier gas, and at least one feed gas cylinder for supplying a feed gas, wherein a gas outlet of the feed gas cylinder is communicated with a mixing chamber through a feed gas conveying tube; a feed gas mass flow controller for adjusting and controlling the conveying flow of the feed gas is arranged on the feed gas conveying tube; a gas outlet of the carrier gas cylinder is communicated with the mixing chamber through a carrier gas conveying tube; a gas outlet of the carrier gas cylinder is further communicated with the mixing chamber through a liquid saturated steam conveying mechanism which is capable of conveying liquid saturated steam into the mixing chamber a carrier gas mass flow controller for adjusting and controlling the carrier gas conveying flow is arranged on the carrier gas conveying tube; the mixing chamber is used for uniformly mixing the carrier gas, the feed gas and/or the liquid saturated steam, and used for outputting an expected standard gas. The standard gas mixing device is compact in structure, high in automation degree, wide in application range, and safe and reliable, and a plurality of standard gases can be mixed up.
Description
Technical field
The utility model relates to a kind of air distributing device, and especially a kind of gas test system device for distributing standard gas belongs to the technical field of gas test.
Background technology
Calibrating gas is one or more the accurate characteristic values with metering traceability with certificate, for calibration, estimate measuring method or to the gas of material assignment.Calibrating gas belongs to standard substance, be widely used in industries such as iron and steel, oil, chemical industry, medical treatment, semiconductor, electric power, metal processing, can be applicable to the evaluation of gas analysis instrument and calibration, scientific research, environment measuring control, petroleum chemicals quality analysis, labour health detection, blood gas mensuration etc.
Along with the progress of modern science and technology, every profession and trade also improves constantly the requirement of calibrating gas; As gas tester, the evaluation of high-precision gas apparatus measures etc. under the Linear Comparison in the evaluation of the linear multi of instrument and a certain range ability, complex environment, except working standard gas can be supplied by the raw material gas cylinder, some volatility or severe corrosive gas may be deposited with liquid form, but the device for distributing standard gas that these situations need a kind of automation control, while dispense liquid saturated vapor calibrating gas and gaseous state calibrating gas, accurately control.
The collocation method of existing standard gas can be divided into static method and dynamic method.Static distribution method is that the unstripped gas of a certain amount of gaseous state or steam state is added in the container of known volume, then is filled with diluent gas, mixes and makes.But, for Standard Gases large usage quantity or longer situation of logical Standard Gases time, static distribution method can't meet the demands.Devince By Dynamic Gas Ration Method is the unstripped gas of concentration known continuously to be sent into to blender with carrier gas by constant ratio mix, thereby realizes the continuous preparation of Standard Gases.Devince By Dynamic Gas Ration Method can adopt the whole bag of tricks such as pressure flow hybrid control method, nozzle flow control method, electrolysis distribution method to carry out outfit standard gas, and the concentration of the calibrating gas that these methods obtain not accurately, purposes is single maybe can not realize the whole-course automation distribution.
Summary of the invention
The purpose of this utility model is to overcome the deficiencies in the prior art, and a kind of gas test system device for distributing standard gas is provided, and its compact conformation can realize that multiple standards gas carries out distribution, and automaticity is high, and wide accommodation is safe and reliable.
The technical scheme provided according to the utility model, described gas test system device for distributing standard gas, comprise the gas bottle system, described gas bottle system comprises carrier gas bottle and at least one gas cylinder of the raw material for the gas of supplying raw materials for carrier gas is provided; The gas outlet of described raw material gas cylinder is connected with mixing chamber by the unstripped gas carrier pipe, and is provided for regulating the unstripped gas mass flow controller of controlling the unstripped gas feed flow on described unstripped gas carrier pipe.The gas outlet of carrier gas bottle is connected with mixing chamber by the carrier gas carrier pipe, and the gas outlet of carrier gas bottle also by carrying the hold-up steam conveying mechanism of liquid saturated vapor to be connected with mixing chamber in mixing chamber; The carrier gas carrier pipe is provided with the carrier gas mass flow controller of controlling the carrier gas feed flow for regulating; Described mixing chamber can evenly mix carrier gas, unstripped gas and/or hold-up steam, and exports required calibrating gas.
Described hold-up steam conveying mechanism comprises that at least one is for providing the vaporization chamber of hold-up steam, the air inlet of described vaporization chamber is connected with the gas outlet of carrier gas bottle by gas-carrying evaporation chamber carrier pipe, and the gas outlet of vaporization chamber is connected with mixing chamber by the hold-up vapor pipe; The hold-up vapor pipe is provided with the vaporization chamber discharge control valve; Gas-carrying evaporation chamber carrier pipe is provided with for controlling the vaporization chamber carrier gas wide range mass flow controller of carrier gas feed flow, and the two ends of described vaporization chamber carrier gas wide range mass flow controller are provided with and logical vaporization chamber carrier gas small-range mass flow controller in succession, and the hold-up vapor pipe is provided with the vaporization chamber discharge control valve.
Described carrier gas carrier pipe is provided with the carrier gas control valve of carrying switch for controlling carrier gas; Described unstripped gas carrier pipe is provided with for controlling the unstripped gas control valve of unstripped gas switch.
Described vaporization chamber comprises for the thermostatted water bathtub of steady temperature is provided, and in described thermostatted water bathtub, is provided with fluid reservoir, in described fluid reservoir, is provided with volatile liquid, in described volatile liquid, is provided with for slowing down the bubble deceleration body of bubble velocity; Fluid reservoir is provided with vaporization chamber air inlet pipe and vaporization chamber escape pipe, and described vaporization chamber air inlet pipe and vaporization chamber escape pipe all are connected with fluid reservoir, and an end of vaporization chamber air inlet pipe stretches into the bottom of fluid reservoir, and is positioned at the below of described bubble deceleration body.
The top of described fluid reservoir is provided with addition funnel, and described addition funnel is provided with charging valve, and volatile liquid comprises water or ethanol.
The gas outlet of described mixing chamber is connected with emptying output channel and application output channel, and described emptying output channel is provided with emptying control valve.
Described mixing chamber comprises the mixing chamber housing, is provided with the rotary body system for gas uniform is mixed in described mixing chamber housing.
Described rotating system turnkey is drawn together and is installed on the rotating cylinder in the mixing chamber housing and is positioned at the pivoting leaf on described rotating cylinder, rotating cylinder and pivoting leaf all can rotate in the mixing chamber housing, and the two ends of described rotating cylinder are provided with the electro-motor for driving rotating cylinder to rotate.
The shape of described bubble deceleration body comprises helical form or netted.The carrier gas that described carrier gas bottle provides comprises that carrier gas can be mixture not containing High Purity Nitrogen or the clean air of composition to be measured or interfering material, but must, not containing remaining lateral element or interfering material, can contain and measure irrelevant composition.The unstripped gas that the raw material gas cylinder provides comprises sulfur dioxide, hydrogen sulfide or nitric oxide.
Advantage of the present utility model:
1, adopt solenoid electric valve, gas control valve system and vaporization chamber carrier gas wide range mass flow controller, vaporization chamber carrier gas small-range mass flow controller co-controlling to enter the air-flow of vaporization chamber, realization combines with fine setting to the coarse adjustment of air-flow, more accurately control gas flow, for accurate configuration standard gas creates favorable conditions.
2, the structure by vaporization chamber can realize the configuration to hold-up steam calibrating gas, and then makes air distributing device that the configuration of hold-up steam calibrating gas and gaseous state calibrating gas is provided simultaneously.
3, by mixing chamber, the Stirring technology is introduced to mixing in operation of mixing chamber gas, by realizing the even rapid mixing of gas under rotating cylinder and pivoting leaf mating reaction, guarantee the accurate concentration of calibrating gas.
4, by the switch of solenoid electric valve and gas control valve system, and the uninterrupted of control vaporization chamber carrier gas wide range mass flow controller, vaporization chamber carrier gas small-range mass flow controller, carrier gas mass flow controller, the first unstripped gas mass flow controller and the second unstripped gas mass flow controller, realized whole-course automation control, convenient operation.
The accompanying drawing explanation
Fig. 1 is a kind of concrete structural representation in real time of the present utility model.
The structural representation that Fig. 2 is the utility model vaporization chamber.
The structural representation that Fig. 3 is the utility model mixing chamber.
Description of reference numerals: 10-gas bottle system, the 11-carrier gas bottle, 12-the first raw material gas cylinder, 13-the second raw material gas cylinder, 20-gas control valve system, 21-carrier gas control valve, 22-the first unstripped gas control valve, 23-the second unstripped gas control valve, 24-the first vaporization chamber discharge control valve, 25-the second vaporization chamber discharge control valve, the emptying control valve of 26-, the 30-gas distribution pipeline, the emptying output channel of 31-, 32-application output channel, 33-the first unstripped gas carrier pipe, 34-the second unstripped gas carrier pipe, 35-carrier gas carrier pipe, 36-the first gas-carrying evaporation chamber carrier pipe, 37-carries arm in the first gas-carrying evaporation chamber, 38-the second gas-carrying evaporation chamber carrier pipe, 39-carries arm in the second gas-carrying evaporation chamber, the 40-solenoid electric valve, the 50-mass flow controller system, 51-the first vaporization chamber carrier gas wide range mass flow controller, 52-the second vaporization chamber carrier gas wide range mass flow controller, 53-carrier gas mass flow controller, 54-the first unstripped gas mass flow controller, 55-the second unstripped gas mass flow controller, 56-the first vaporization chamber carrier gas small-range mass flow controller, 57-the second vaporization chamber carrier gas small-range mass flow controller, 60-the first vaporization chamber, 61-the second vaporization chamber, 62-thermostatted water bathtub, 63-vaporization chamber air inlet pipe, 64-vaporization chamber escape pipe, the 65-fluid reservoir, the 66-volatile liquid, 67-bubble deceleration body, the 68-addition funnel, the 69-charging valve, the 70-mixing chamber, 71-mixing chamber air inlet pipe, 72-the first mixing chamber escape pipe, 73-the second mixing chamber escape pipe, 74-mixing chamber housing, 75-rotary body system, 76-the first electro-motor, 77-the second electro-motor, 78-rotating cylinder and 79-pivoting leaf.
The specific embodiment
Below in conjunction with concrete drawings and Examples, the utility model is described in further detail.
As shown in Figure 1: in order to solve existing air distribution system, can only provide single working standard gas or liquid escaping gas, but reach the purpose of while dispense liquid saturated vapor calibrating gas and gaseous state calibrating gas, the utility model comprises gas bottle system 10, and described gas bottle system 10 comprises carrier gas bottle 11 and at least one gas cylinder of the raw material for the gas of supplying raw materials for carrier gas is provided; The gas outlet of described raw material gas cylinder is connected with mixing chamber 70 by the unstripped gas carrier pipe, and is provided for regulating the unstripped gas mass flow controller of controlling the unstripped gas feed flow on described unstripped gas carrier pipe; The gas outlet of carrier gas bottle 11 is connected with mixing chamber 70 by carrier gas carrier pipe 35, and the gas outlet of carrier gas bottle 11 is also by being connected with mixing chamber 70 to the hold-up steam conveying mechanism of the interior conveying liquid of mixing chamber 70 saturated vapor; Carrier gas carrier pipe 35 is provided with the carrier gas mass flow controller of controlling the carrier gas feed flow for regulating; Described mixing chamber 70 can evenly mix carrier gas, unstripped gas and/or hold-up steam, and exports required calibrating gas.
Particularly, described hold-up steam conveying mechanism comprises that at least one is for providing the vaporization chamber of hold-up steam, the air inlet of described vaporization chamber is connected with the gas outlet of carrier gas bottle 11 by gas-carrying evaporation chamber carrier pipe, and the gas outlet of vaporization chamber is connected with mixing chamber 70 by the hold-up vapor pipe; Gas-carrying evaporation chamber carrier pipe is provided with for controlling the vaporization chamber carrier gas wide range mass flow controller of carrier gas feed flow, and the two ends of described vaporization chamber carrier gas wide range mass flow controller are provided with and logical vaporization chamber carrier gas small-range mass flow controller in succession, and the hold-up vapor pipe is provided with the vaporization chamber discharge control valve.In the utility model embodiment, the described and logical parallel-connection structure formed in similar circuit that refers in succession, with for forming two paths of adjusting gas flow.
In the utility model embodiment, to comprise two raw material gas cylinders in gas bottle system 10, simultaneously, comprise in hold-up steam conveying mechanism that two vaporization chambers are that example is specifically described.Described two raw material gas cylinders comprise the first raw material gas cylinder 12 and the second raw material gas cylinder 13, the first raw material gas cylinder 12 is connected with mixing chamber 70 by the first unstripped gas carrier pipe 33, the first unstripped gas carrier pipe 33 is provided with the first unstripped gas control valve 22 and the first unstripped gas mass flow controller 54, wherein, the first unstripped gas control valve 22 is positioned at 54 of the first raw material gas cylinder 12 and the first unstripped gas mass flow controllers.The second raw material gas cylinder 13 is connected with mixing chamber 70 by the second unstripped gas carrier pipe 34, the second unstripped gas carrier pipe 34 is provided with the second unstripped gas control valve 23 and the second unstripped gas mass flow controller 55, the second unstripped gas control valves 23 between the second raw material gas cylinder 13 and the second unstripped gas mass flow controller 55.In addition, in the specific implementation, can be as required, at the interior raw material gas cylinder that varying number is set of gas bottle system 10, can provide different unstripped gas by different raw material gas cylinders, unstripped gas in the raw material gas cylinder is pure gas or the high concentration calibrating gas such as sulfur dioxide, hydrogen sulfide, carbon monoxide, carrier gas in carrier gas bottle 11 comprises high pure nitrogen or the clean air that does not contain composition to be measured or interfering material, carrier gas can be mixture, but must, not containing remaining lateral element or interfering material, can contain and measure irrelevant composition.
Two vaporization chambers comprise the first vaporization chamber 60 and the second vaporization chamber 61, described the first vaporization chamber 60 is connected with the gas outlet of carrier gas bottle 11 by the first gas-carrying evaporation chamber carrier pipe 36, the second vaporization chamber 61 is connected with the gas outlet of carrier gas bottle 11 by the second gas-carrying evaporation chamber carrier pipe 38, the first vaporization chamber 60 is connected with mixing chamber 70 by first liquid saturated vapor carrier pipe, and the second vaporization chamber 61 is connected with mixing chamber 70 by second liquid saturated vapor carrier pipe; In the specific implementation, the vaporization chamber of varying number can be set as required, by different vaporization chambers, can provide different hold-up steams, thereby finally configure different liquids saturated vapor calibrating gas.
The first gas-carrying evaporation chamber carrier pipe 36 is provided with the first vaporization chamber carrier gas wide range mass flow controller 51, the first vaporization chamber carrier gas small-range mass flow controller 56 that the two ends of described the first vaporization chamber carrier gas wide range mass flow controller 51 are provided with and lead in succession, described the first vaporization chamber carrier gas small-range mass flow controller 56 is installed on the first gas-carrying evaporation chamber and carries on arm 37, and the first gas-carrying evaporation chamber carries arm 37 to be connected with the first gas-carrying evaporation chamber carrier pipe 36.The second gas-carrying evaporation chamber carrier pipe 38 is provided with the second vaporization chamber carrier gas wide range mass flow controller 52, the second vaporization chamber carrier gas small-range mass flow controller 57 that the two ends of described the second vaporization chamber carrier gas wide range mass flow controller 52 are provided with and lead in succession, the second vaporization chamber carrier gas small-range mass flow controller 57 is installed on the second gas-carrying evaporation chamber and carries on arm 39, and the second gas-carrying evaporation chamber carries arm 39 to be connected with the second gas-carrying evaporation chamber carrier pipe 38.First liquid saturated vapor carrier pipe is provided with the first vaporization chamber discharge control valve 24, and second liquid saturated vapor carrier pipe is provided with the second vaporization chamber discharge control valve 25.Carrier gas carrier pipe 35 is provided with carrier gas control valve 21, and described carrier gas control valve 21 is between carrier gas mass flow controller 53 and carrier gas bottle 11.Gas output flow by the first vaporization chamber discharge control valve 24 and the second vaporization chamber discharge control valve 25 for the confined liquid saturated vapor, can guarantee while closing the first vaporization chamber discharge control valve 24 and the second vaporization chamber discharge control valve 25 that carrier gas stops enough time in corresponding vaporization chamber, help carrier gas to reach capacity in volatile liquid 66.In the real embodiment of the utility model, the gas outlet of carrier gas bottle 11 arranges solenoid electric valve 40, the port of export of described solenoid electric valve 40 is connected with the first gas-carrying evaporation chamber carrier pipe 36, the second gas-carrying evaporation chamber carrier pipe 38 and carrier gas carrier pipe 35 respectively, for realizing continuous carrier gas supply.
In the utility model embodiment, the first vaporization chamber carrier gas wide range mass flow controller 51, the second vaporization chamber carrier gas wide range mass flow controller 52, carrier gas mass flow controller 53, the first unstripped gas mass flow controller 54, the second unstripped gas mass flow controller 55, the first vaporization chamber carrier gas small-range mass flow controller 56 and the second vaporization chamber carrier gas small-range mass flow controller 57 form mass flow controller system 50, wherein, the first vaporization chamber carrier gas wide range mass flow controller 51, the second vaporization chamber carrier gas wide range mass flow controller 52, carrier gas mass flow controller 53, the first unstripped gas mass flow controller 54 and the second unstripped gas mass flow controller 55 are wide range mass flow controller (as range is 100ml/min), the first vaporization chamber carrier gas small-range mass flow controller 56 and the second vaporization chamber carrier gas small-range mass flow controller 57 are small-range mass flow controller (as range is 20ml/min).
In the utility model embodiment, carrier gas mass flow controller 53, vaporization chamber carrier gas wide range mass flow controller, vaporization chamber carrier gas small-range mass flow controller are for to carry out accurate measurement and control for the mass flow to gas or liquid, and it is comprised of parts such as flow sensor, flow control valve, amplification control circuit and current divider control channels usually.Wherein, carrier gas mass flow controller 53, vaporization chamber carrier gas wide range mass flow controller, vaporization chamber carrier gas small-range mass flow controller comprise thermal flowmeter or Coriolis-type flowmeter.
When the first vaporization chamber 60 is carried out to air inlet, carry out the coarse adjustment of gas transmission flow by the first vaporization chamber carrier gas wide range mass flow controller 51, by the first vaporization chamber carrier gas small-range mass flow controller 56, finely tuned, thereby accurately control the carrier gas flux that enters the first vaporization chamber 60, can guarantee that the volatile liquid 66 of carrier gas air-flow in the first vaporization chamber 60 stops long enough and reach capacity after the time, enter in mixing chamber 70 with carrier gas after allowing volatile liquid 66 volatilize simultaneously.In like manner, when the second vaporization chamber 61 is carried out to air inlet, carry out the coarse adjustment of gas transmission flow by the second vaporization chamber carrier gas wide range mass flow controller 52, by the second vaporization chamber carrier gas small-range mass flow controller 57, finely tuned, thereby accurately control the carrier gas flux that enters the second vaporization chamber 61, can guarantee that the volatile liquid 66 of carrier gas air-flow in the second vaporization chamber 61 stops long enough and reach capacity after the time, enter in mixing chamber 70 with carrier gas after allowing volatile liquid 66 volatilize simultaneously.
As shown in Figure 2: be the structure of vaporization chamber, in the utility model embodiment, the first vaporization chamber 60 adopts identical structure with the second vaporization chamber 61, particularly, described vaporization chamber comprises for the thermostatted water bathtub 62 of steady temperature is provided, be provided with fluid reservoir 65 in described thermostatted water bathtub 62, in described fluid reservoir 65, be provided with volatile liquid 66, be provided with in described volatile liquid 66 for slowing down the bubble deceleration body 67 of bubble velocity; Fluid reservoir 65 is provided with vaporization chamber air inlet pipe 63 and vaporization chamber escape pipe 64, described vaporization chamber air inlet pipe 63 and vaporization chamber escape pipe 64 all are connected with fluid reservoir 65, and an end of vaporization chamber air inlet pipe 63 stretches into the bottom of fluid reservoir 65, and be positioned at the below of described bubble deceleration body 67.
The volatile liquid 66 of carrier gas in vaporization chamber air inlet pipe 63 enters fluid reservoir 65, form bubble, slow down bubble velocity during through bubble deceleration body 67, make bubble stop after time enough reaches capacity the mist of emitting saturated volatilization gas and carrier gas, i.e. hold-up steam in volatile liquid 66.
The top of described fluid reservoir 65 is provided with addition funnel 68, and for supplementing of volatile liquid 66, described addition funnel 68 is provided with charging valve 69.Described vaporization chamber air inlet pipe 63, be deep into the fluid reservoir bottom, is positioned at bubble deceleration body below.Described bubble deceleration body 67, play the effect that slows down bubble velocity, and its shape can be spiral disk body or reticulate body.Described volatile liquid 66, can be the volatile liquids such as water or ethanol, is arranged in fluid reservoir 65, and liquid level to be to surpass bubble deceleration body 67, and be advisable lower than vaporization chamber air inlet pipe 63 and vaporization chamber escape pipe 64.When volatile liquid 66 is water, can measure join the humidity of calibrating gas.Described thermostatted water bathtub 62, for vaporization chamber provides isoperibol, create favorable conditions for volatile liquid 66 reaches capacity; Thermostatted water bathtub 62 coats the bottom of fluid reservoir 65.The measuring principle of the liquid saturated vapor calibrating gas of the utility model configuration can adopt peace to hold in the palm on business formula:
Wherein, be the vapour pressure of gas liquid phase, A
gas, B
gas, C
gasbe the characteristic constant in the Applicable temperature scope, T is the kelvin degree of volatile liquid 66.
As shown in Figure 3: described mixing chamber 70 comprises mixing chamber housing 74, is provided with the rotary body system 75 for gas uniform is mixed in described mixing chamber housing 74.Described rotary body system 75 comprises and is installed on the rotating cylinder 78 in mixing chamber housing 74 and is positioned at the pivoting leaf 79 on described rotating cylinder 78, rotating cylinder 78 and pivoting leaf 79 all can be in the interior rotations of mixing chamber housing 74, and the two ends of described rotating cylinder 78 are provided with the electro-motor for driving rotating cylinder 78 to rotate.Mixing chamber housing 74 is cylindric, the two ends of mixing chamber housing 74 are provided with end cap, the two end supports of rotating cylinder 78 is installed on corresponding end cap, electro-motor comprises the first electro-motor 76 and the second electro-motor 77, by the first electro-motor 76 and the second electro-motor 77, realizes driving rotating cylinder 78 and the rotation of pivoting leaf 79 in mixing chamber housing 74.One end of mixing chamber housing 74 is provided with mixing chamber air inlet pipe 71, the other end of mixing chamber housing 74 is provided with the first mixing chamber escape pipe 72 and the second mixing chamber escape pipe 73, by mixing chamber air inlet pipe 71, can connect the first unstripped gas carrier pipe 33, the second unstripped gas carrier pipe 34, carrier gas carrier pipe 35, first liquid saturated vapor carrier pipe and second liquid saturated vapor carrier pipe.Be connected with emptying output channel 31 by the first mixing chamber escape pipe 72, be connected with application output channel 32 by the second mixing chamber escape pipe 73, emptying output channel 31 is provided with emptying control valve 26.
When rotating cylinder 78 is rotated at mixing chamber housing 74, drive carrier gas, unstripped gas and/or the hold-up steam proportionally enter mixing chamber 70 and mix by rotation, thus the calibrating gas be uniformly mixed at the first mixing chamber escape pipe 72 and the second mixing chamber escape pipe 73.The first electro-motor 76 and the second electro-motor 77 drive the rotation mode of rotating cylinder 78 in mixing chamber housing 74 to can be one direction (clockwise or counterclockwise) rotation, also can be the clockwise and counterclockwise rotation that replaces.
Described pivoting leaf 79 1 sides are connected with rotating cylinder 78, and opposite side and mixing chamber housing 74 close contacts can prevent that gas from passing through from the inside edge of mixing chamber housing 74.The shape of pivoting leaf 79 can be designed as required, can be that spiral rotary is turned, ladder rotary body or flabellum rotary body etc.From mixing chamber 70, calibrating gas out is divided into two, and one makes the air pressure of mixing chamber 70 outputs approach atmospheric pressure by emptying output channel 31, and another is by application output channel 32, as accessible instrument to be measured carries out the operations such as instrument calibration or zeroing.
In the utility model embodiment, carrier gas control valve 21, the first unstripped gas control valve 22, the second unstripped gas control valve 23, the first vaporization chamber discharge control valve 24, the second vaporization chamber discharge control valve 25 and emptying control valve 26 have formed the gas control valve system.Emptying output channel 31, application output channel 32, the first unstripped gas carrier pipe 33, the second unstripped gas carrier pipe 34, carrier gas carrier pipe 35, the first gas-carrying evaporation chamber carrier pipe 36, the first gas-carrying evaporation chamber carry arm 37, the second gas-carrying evaporation chamber carrier pipe 38, the second gas-carrying evaporation chamber to carry arm 39, first liquid saturated vapor carrier pipe and second liquid saturated vapor carrier pipe to form gas distribution pipeline 30.
Distribution and the corresponding process concrete below by some are further described the utility model, particularly:
1), vaporization chamber gas reach capacity, the zeroing of gas zero clearing and instrument.
Close the first unstripped gas control valve 22 of the first raw material gas cylinder 12 and the second unstripped gas control valve 23 of the second raw material gas cylinder 13, close the first vaporization chamber discharge control valve 24 of the first vaporization chamber 60 and the second vaporization chamber discharge control valve 25 of the second vaporization chamber, open carrier gas control valve 21 and emptying control valve 26, solenoid electric valve 40 continues the carrier gas in supply carrier gas bottle 11.Carrier gas, by the first vaporization chamber carrier gas wide range mass flow controller 51 and the collaborative carrier gas flux of accurately controlling of the first vaporization chamber carrier gas small-range mass flow controller 56, enters in the first vaporization chamber 60 by vaporization chamber air inlet pipe 63.Now, carry out coarse adjustment by the first vaporization chamber carrier gas wide range mass flow controller 51, and the first vaporization chamber carrier gas small-range mass flow controller 56 is finely tuned, can guarantee to continue to enter the first vaporization chamber 60 than little airflow, and, under the effect of the interior bubble deceleration of the first vaporization chamber 60 body 67 and thermostatted water bathtub 62, in volatile liquid 66, reach capacity gradually.In like manner, identical with the situation of the operation of the first vaporization chamber 60 to the operation of the second vaporization chamber 61.
Simultaneously, carrier, by after solenoid electric valve 40 and carrier gas control valve 21, is controlled flows by carrier gas mass flow controller 53, and carrier enters in mixing chamber 70, can scavenge system in remaining gas, reach the effect of system gas zero clearing.
After keeping above-mentioned state certain hour (as 20min), can close emptying control valve 26, and survey instrument in the 32 back reception of application output channel, for the zeroing to instrument.
2), hold-up steam and carrier gas mix preparation standard gas.
Readjust the total flow of the first vaporization chamber carrier gas wide range mass flow controller 51 and the first vaporization chamber carrier gas small-range mass flow controller 56, and with the flow-rate ratio of carrier gas mass flow controller 53, open the first vaporization chamber discharge control valve 24 of the first vaporization chamber 60.Now by the first vaporization chamber carrier gas wide range mass flow controller 51 and the first vaporization chamber carrier gas small-range mass flow controller 56 coarse adjustment and fine setting, combined, co-controlling enters the flow of the first vaporization chamber 60.Gas saturation mode in the first vaporization chamber 60 is with described identical above.From the first vaporization chamber 60 out be the mist of the saturated vapor of carrier gas and volatile liquid 66, by the first vaporization chamber discharge control valve 24, enter mixing chamber 70; Simultaneously, carrier gas also enters into mixing chamber 70 by carrier gas carrier pipe 35, carrier gas mass flow controller 53.At this moment the first electro-motor 76 and the second electro-motor 77 are under external circuits is controlled, and driven rotary cylinder 78 and pivoting leaf 79 rotate, and make the mist that enters mixing chamber 70 fully mix.Again by the external application output channel 32 of the second mixing chamber escape pipe 73, for connecting the calibrating gas application apparatus such as instrument to be measured.When utilizing the second vaporization chamber 61 to carry out aforesaid operations, the operational correspondence with utilizing the first vaporization chamber 60 repeats no more herein.
Now, the concentration of volatile liquid 66 saturated vapors can be by the temperature (being the temperature of volatile liquid 66) of thermostatted water bathtub 62, and searches the An Tuoyin parameter list and calculated:
Wherein, C
satthe concentration of saturated vapor, P
satbe the pressure of saturated vapor, P is standard atmospheric pressure, A
gas, B
gas, C
gasbe the characteristic constant in the Applicable temperature scope of saturated vapor, T is the kelvin degree (T is in the Applicable temperature scope) of thermostatted water bathtub 62.
Finally join the concentration C of calibrating gas
mixby following formula, calculated:
V
airC
air+V
gasC
sat=V
mixC
mix
Wherein, V
gasthe vaporization chamber gas flow, V
aircarrier gas flux, C
aircarrier gas concentration, V
mixbe finally join the flow of calibrating gas.
3), vaporization chamber gas reach capacity, the zeroing of system gas zero clearing and instrument.
This process and embodiment 1) in situation basic identical, the time is controlled (as 15min) within the specific limits.The air-flow that enters the first vaporization chamber 60 and the second vaporization chamber 61 is still finely tuned by the low discharge mass flow controller of 20ml/min, and the large flow mass flow controller of 100ml/min carries out coarse adjustment.The gas of the first vaporization chamber 60 and the second vaporization chamber 61 reaches capacity, and the distribution that can be the hold-up steam calibrating gas of using back is prepared.Removing residual gas and instrument to be measured returns to zero consistent with the operation of embodiment 1.
4), gaseous feed gas and carrier gas mix preparation standard gas.
Regulate the flow-rate ratio of the first unstripped gas mass flow controller 54 and carrier gas mass flow controller 53, open the first unstripped gas control valve 22 of the first raw material gas cylinder 12.The interior gas of the first raw material gas cylinder 12 enters into mixing chamber 70 through the first unstripped gas control valve 22 and the first unstripped gas mass flow controller 54.Carrier gas in carrier gas bottle 11 enters mixing chamber 70 by solenoid electric valve 40, carrier gas control valve 21, carrier gas mass flow controller 53 under controlling.Under the effect of the rotary body system 75 in mixing chamber 70, mist is fully mixed.Again by the external application output channel 32 of the second mixing chamber escape pipe 73, for connecting the calibrating gas application apparatus such as instrument to be measured.Described distribution principle is common Devince By Dynamic Gas Ration Method, the unstripped gas of concentration known and carrier gas is continuously sent into to blender by a certain percentage and mix, thereby realize the continuous preparation of Standard Gases.
The utility model can be realized the configuration to hold-up steam calibrating gas by the structure of vaporization chamber, and then makes air distributing device that the configuration of hold-up steam calibrating gas and gaseous state calibrating gas is provided simultaneously.
The utility model is introduced mixing in operation of mixing chamber gas by mixing chamber 70 by the Stirring technology, by realizing the even rapid mixing of gas under rotating cylinder 78 and pivoting leaf 79 mating reactions, guarantees the accurate concentration of calibrating gas.
The utility model adopts solenoid electric valve 40, gas control valve system 20 and vaporization chamber carrier gas wide range mass flow controller, vaporization chamber carrier gas small-range mass flow controller co-controlling to enter the air-flow of vaporization chamber, realization combines with fine setting to the coarse adjustment of air-flow, more accurately control gas flow, for accurate configuration standard gas creates favorable conditions.
Claims (9)
1. a gas test system device for distributing standard gas, it is characterized in that: comprise gas bottle system (10), described gas bottle system (10) comprises carrier gas bottle (11) and at least one gas cylinder of the raw material for the gas of supplying raw materials for carrier gas is provided; The gas outlet of described raw material gas cylinder is connected with mixing chamber (70) by the unstripped gas carrier pipe, and is provided for regulating the unstripped gas mass flow controller of controlling the unstripped gas feed flow on described unstripped gas carrier pipe; The gas outlet of carrier gas bottle (11) is connected with mixing chamber (70) by carrier gas carrier pipe (35), and the gas outlet of carrier gas bottle (11) also by carrying the hold-up steam conveying mechanism of liquid saturated vapor to be connected with mixing chamber (70) in mixing chamber (70); Carrier gas carrier pipe (35) is provided with the carrier gas mass flow controller (53) of controlling the carrier gas feed flow for regulating.
2. gas test system device for distributing standard gas according to claim 1, it is characterized in that: described hold-up steam conveying mechanism comprises that at least one is for providing the vaporization chamber of hold-up steam, the air inlet of described vaporization chamber is connected with the gas outlet of carrier gas bottle (11) by gas-carrying evaporation chamber carrier pipe, and the gas outlet of vaporization chamber is connected with mixing chamber (70) by the hold-up vapor pipe; Gas-carrying evaporation chamber carrier pipe is provided with for controlling the vaporization chamber carrier gas wide range mass flow controller of carrier gas feed flow, and the two ends of described vaporization chamber carrier gas wide range mass flow controller are provided with and logical vaporization chamber carrier gas small-range mass flow controller in succession.
3. gas test system device for distributing standard gas according to claim 1 is characterized in that: described carrier gas carrier pipe (35) is provided with the carrier gas control valve (21) of carrying switch for controlling carrier gas; Described unstripped gas carrier pipe is provided with for controlling the unstripped gas control valve of unstripped gas switch.
4. gas test system device for distributing standard gas according to claim 2, it is characterized in that: described vaporization chamber comprises for the thermostatted water bathtub (62) of steady temperature is provided, be provided with fluid reservoir (65) in described thermostatted water bathtub (62), be provided with volatile liquid (66) in described fluid reservoir (65), be provided with in described volatile liquid (66) for slowing down the bubble deceleration body (67) of bubble velocity; Fluid reservoir (65) is provided with vaporization chamber air inlet pipe (63) and vaporization chamber escape pipe (64), described vaporization chamber air inlet pipe (63) and vaporization chamber escape pipe (64) all are connected with fluid reservoir (65), and an end of vaporization chamber air inlet pipe (63) stretches into the bottom of fluid reservoir (65), and be positioned at the below of described bubble deceleration body (67).
5. gas test system device for distributing standard gas according to claim 4, it is characterized in that: the top of described fluid reservoir (65) is provided with addition funnel (68), and described addition funnel (68) is provided with charging valve (69).
6. gas test system device for distributing standard gas according to claim 1, it is characterized in that: the gas outlet of described mixing chamber (70) is connected with emptying output channel (31) and application output channel (32), and described emptying output channel (31) is provided with emptying control valve (26).
7. gas test system device for distributing standard gas according to claim 1, it is characterized in that: described mixing chamber (70) comprises mixing chamber housing (74), is provided with the rotary body system (75) for gas uniform is mixed in described mixing chamber housing (74).
8. gas test system device for distributing standard gas according to claim 7, it is characterized in that: described rotary body system (75) comprises and is installed on the rotating cylinder (78) in mixing chamber housing (74) and is positioned at the pivoting leaf (79) on described rotating cylinder (78), rotating cylinder (78) and pivoting leaf (79) all can rotate in mixing chamber housing (74), and the two ends of described rotating cylinder (78) are provided with the electro-motor for driving rotating cylinder (78) to rotate.
9. gas test system device for distributing standard gas according to claim 4, it is characterized in that: the shape of described bubble deceleration body (67) comprises helical form or netted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013203763922U CN203329640U (en) | 2013-06-27 | 2013-06-27 | Standard gas mixing device for gas testing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013203763922U CN203329640U (en) | 2013-06-27 | 2013-06-27 | Standard gas mixing device for gas testing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203329640U true CN203329640U (en) | 2013-12-11 |
Family
ID=49698341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013203763922U Expired - Lifetime CN203329640U (en) | 2013-06-27 | 2013-06-27 | Standard gas mixing device for gas testing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203329640U (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103977739A (en) * | 2014-05-16 | 2014-08-13 | 中国环境科学研究院 | Atmospheric environment-concentration peroxide gas generation system and method thereof |
| CN104028130A (en) * | 2014-06-19 | 2014-09-10 | 大连大特气体有限公司 | Full-automatic standard gas production device |
| CN104587686A (en) * | 2014-12-31 | 2015-05-06 | 青岛路博宏业环保技术开发有限公司 | Concentration gas distributing device and concentration gas distributing method for organic waste gas |
| CN104807690A (en) * | 2015-04-21 | 2015-07-29 | 国家电网公司 | Preparation device and method of HF standard gas in SF6 (sulfur hexafluoride) gas |
| CN104807682A (en) * | 2015-04-21 | 2015-07-29 | 国家电网公司 | Preparation device and method of mineral oil content standard gas in SF6 (sulfur hexafluoride) gas |
| CN107796688A (en) * | 2016-08-29 | 2018-03-13 | 中国石油化工股份有限公司 | A kind of sample gas proportional diluter and sample gas dilution process |
| CN106362423B (en) * | 2016-09-26 | 2019-04-16 | 中国电子科技集团公司第四十八研究所 | A kind of liquid source vaporising device |
| CN109865440A (en) * | 2019-03-29 | 2019-06-11 | 国网山东省电力公司电力科学研究院 | A kind of standard gas preparation device |
| CN112424597A (en) * | 2018-07-27 | 2021-02-26 | 株式会社岛津制作所 | Analysis device |
-
2013
- 2013-06-27 CN CN2013203763922U patent/CN203329640U/en not_active Expired - Lifetime
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103977739A (en) * | 2014-05-16 | 2014-08-13 | 中国环境科学研究院 | Atmospheric environment-concentration peroxide gas generation system and method thereof |
| CN103977739B (en) * | 2014-05-16 | 2016-04-20 | 中国环境科学研究院 | A kind of atmospheric environment concentration peroxide gas generating system and method thereof |
| CN104028130A (en) * | 2014-06-19 | 2014-09-10 | 大连大特气体有限公司 | Full-automatic standard gas production device |
| CN104587686A (en) * | 2014-12-31 | 2015-05-06 | 青岛路博宏业环保技术开发有限公司 | Concentration gas distributing device and concentration gas distributing method for organic waste gas |
| CN104807690A (en) * | 2015-04-21 | 2015-07-29 | 国家电网公司 | Preparation device and method of HF standard gas in SF6 (sulfur hexafluoride) gas |
| CN104807682A (en) * | 2015-04-21 | 2015-07-29 | 国家电网公司 | Preparation device and method of mineral oil content standard gas in SF6 (sulfur hexafluoride) gas |
| CN104807690B (en) * | 2015-04-21 | 2017-09-15 | 国家电网公司 | A kind of SF6HF Standard Gases device for formulating and method in gas |
| CN107796688A (en) * | 2016-08-29 | 2018-03-13 | 中国石油化工股份有限公司 | A kind of sample gas proportional diluter and sample gas dilution process |
| CN106362423B (en) * | 2016-09-26 | 2019-04-16 | 中国电子科技集团公司第四十八研究所 | A kind of liquid source vaporising device |
| CN112424597A (en) * | 2018-07-27 | 2021-02-26 | 株式会社岛津制作所 | Analysis device |
| CN109865440A (en) * | 2019-03-29 | 2019-06-11 | 国网山东省电力公司电力科学研究院 | A kind of standard gas preparation device |
| CN109865440B (en) * | 2019-03-29 | 2021-08-31 | 国网山东省电力公司电力科学研究院 | Standard gas preparation device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203329640U (en) | Standard gas mixing device for gas testing system | |
| CN103341330A (en) | Standard gas distribution device for gas testing system | |
| CN101357305B (en) | Preparation device and method of low-concentration gas of certain humidity | |
| CN107486046B (en) | High-concentration organic matter standard mixed gas generating device and application method thereof | |
| US20050257828A1 (en) | In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration | |
| CN106237877B (en) | A kind of dynamic gas-liquid mixed distributing instrument | |
| CN103143293B (en) | Standard mixed gas preparation device | |
| CN107478494A (en) | A kind of standard gas distribution meter | |
| US6382227B1 (en) | Production of constant composition gas mixture streams | |
| CN106064026A (en) | Multicomponent gas mixing system | |
| CN107583477A (en) | A kind of eight passage sulfur hexafluoride dynamic air-distributing method and system | |
| US4114419A (en) | Method of testing an analyzer to determine the accuracy thereof and a volumetric primary standard apparatus for doing same | |
| CN203139972U (en) | Standard mixed gas preparation apparatus | |
| Mukhtar et al. | Assessment of ammonia adsorption onto Teflon and LDPE tubing used in pollutant stream conveyance | |
| CN114152551A (en) | Simulation experiment system and method for gas displacement and replacement of natural gas | |
| JPH01199133A (en) | Gas generation apparatus and method | |
| CN112540149A (en) | Gas generating device and method | |
| JP4354059B2 (en) | Standard gas generator | |
| WO2008069699A3 (en) | Device for metering a alkalizing reagent for a sodium analyser | |
| CN211374651U (en) | Bubbling device capable of quantifying and controlling vapor concentration | |
| RU2446005C1 (en) | Method for preparation of multi-component gas mixes | |
| RU2359267C2 (en) | Calibration method of gas analyser detectors, and device for realisation thereof | |
| RU2375694C1 (en) | Jet method for densit measuring | |
| CN207570961U (en) | A kind of liquid density measurement device | |
| RU2290635C1 (en) | Method for production of checking gas mixtures for calibrating and checking gas analyzers and device for its realization |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20131211 |