CN203222616U - High-curvature arced cathode magnetron sputtering target - Google Patents
High-curvature arced cathode magnetron sputtering target Download PDFInfo
- Publication number
- CN203222616U CN203222616U CN 201320181124 CN201320181124U CN203222616U CN 203222616 U CN203222616 U CN 203222616U CN 201320181124 CN201320181124 CN 201320181124 CN 201320181124 U CN201320181124 U CN 201320181124U CN 203222616 U CN203222616 U CN 203222616U
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- CN
- China
- Prior art keywords
- sputtering target
- arced
- arc
- magnetron sputtering
- pedestal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The utility model discloses a high-curvature arced cathode magnetron sputtering target which is used for coating films on a warplane cockpit canopy. The sputtering target comprises an arced base rack, charging tubes, permanent magnets and a glow discharge electrode, wherein the arced base rack is a main part of the sputtering target, and the shape of the arced base rack is the key point in design of the sputtering target. The arced surface of the arced base rack is covered by a plurality of the permanent magnets. Two charging tubes are fixed on the end surface of the left side of the arced base rack through bolts; and the glow discharge electrode is fixed on the end surface of the right side through bolts. The shape of the high-curvature arced cathode magnetron sputtering target disclosed by the utility model meets the appearance of a plane cockpit canopy arced surface, rapid and uniform large-area film plating can be realized for a plane cockpit canopy with composite curved surfaces, and the conductivity and the light transmittance of the high-curvature arced cathode magnetron sputtering target are ensured.
Description
Technical field
The utility model relates to a kind of high curvature arc negative electrode magnetron sputtering target, particularly be a kind of high curvature arc negative electrode magnetron sputtering target for aviation field.
Background technology
The target that vacuum plating is at present adopted all is dull and stereotyped targets, can guarantee homogeneity for general plane plated film.But carry out large-area coating film to the airplane canopy of compound curved surface, planar targets is bigger with respect to the range difference distance of curved surface each point, can't guarantee the homogeneity of plated film, and then influence its electric conductivity and transmittance.Therefore need a kind of shape of design to meet the target of airplane canopy curved profile, with this realize fast, uniform large-area coating film.
The utility model content
The purpose of this utility model is to provide a kind of high curvature arc negative electrode magnetron sputtering target, realizes that the airplane canopy to compound curved surface carries out fast, uniform large-area coating film.
For realizing above-mentioned technical purpose, reach above-mentioned technique effect, the utility model is achieved through the following technical solutions:
A kind of high curvature arc negative electrode magnetron sputtering target comprises arc pedestal, gas-filled valve, permanent magnet, glow-discharge electrode.Described arc pedestal is the major portion of sputtering target, and its shape is the emphasis of the utility model design.The arc surface of described arc pedestal covers with many described permanent magnets.Described arc pedestal left end face two described gas-filled valves of bolting, its right end face described glow-discharge electrode of bolting.
Preferably, described arc pedestal is the stainless steel pedestal.
Preferably, described gas-filled valve is fixed on the described arc pedestal along described arc pedestal left end face, is used for charging in vacuum chamber working gas and shielding gas.
Preferably, described permanent magnet is closely to arrange with the powerful magnet of blocks of rectangle, is adsorbed on the arc surface of described arc pedestal, is used to provide uniform high-intensity magnetic field.
Preferably, described glow-discharge electrode is fixed on the described arc pedestal along described arc pedestal its right end face, is used for connecting external power, produces negative high voltage.
Technique scheme has following beneficial effect: this high curvature arc magnetron sputtering target is fixed on when plated film on the three-dimensional mobile target support, and is being carried by the orbiting motion of setting by it.Adopt high curvature magnetron sputtering cathode target, the airplane canopy of large-area compound curved surface is obtained evenly, plated film fast.
Above-mentioned explanation is the general introduction of technical solutions of the utility model, for can clearer understanding technique means of the present utility model, and can be implemented according to the content of specification sheets, below with embodiment of the present utility model and conjunction with figs. this patent is elaborated.
Description of drawings
Fig. 1 is the high curvature arc of the utility model negative electrode magnetron sputtering target synoptic diagram.
Embodiment
As shown in Figure 1, the high curvature arc of the utility model negative electrode magnetron sputtering target comprises arc pedestal 1, gas-filled valve 2, permanent magnet 3, glow-discharge electrode 4.Arc pedestal 1 is the major portion of sputtering target, and its shape is the emphasis of the utility model design, and its material is stainless steel.The arc surface of arc pedestal 1 covers with many permanent magnets 3.Wherein left end face is with bolting two gas-filled valves 2, and its right end face is with bolting glow-discharge electrode 4.
Gas-filled valve 2 is fixed on the arc pedestal 1 along arc pedestal 1 left end face, is used for charging in vacuum chamber working gas and shielding gas.
Permanent magnet 3 is closely to arrange with the powerful magnet of blocks of rectangle, is adsorbed on the arc surface of arc pedestal 1, is used to provide uniform high-intensity magnetic field.
Described glow-discharge electrode 4 is fixed on the arc pedestal 1 along arc pedestal 1 its right end face, is used for connecting external power, produces negative high voltage.
Above-mentioned example can not break away from some variations in addition under the scope of the present utility model, so that above explanation and the structure shown in the accompanying drawing should be considered as is exemplary, but not in order to limit claim of the present utility model.All equivalences of making according to the utility model change or modify, and all are encompassed in the protection domain of the present utility model.
Claims (5)
1. one kind high curvature arc negative electrode magnetron sputtering target, it is characterized in that: comprise arc pedestal, gas ducting, permanent magnet, glow-discharge electrode, the shape of described arc pedestal is circular arc, described arc pedestal arc surface covers with many described permanent magnets, described arc pedestal left end face two described gas-filled valves of bolting, its right end face described glow-discharge electrode of bolting.
2. high curvature arc negative electrode magnetron sputtering target according to claim 1, it is characterized in that: described arc pedestal is the stainless steel pedestal.
3. high curvature arc negative electrode magnetron sputtering target according to claim 2, it is characterized in that: described gas-filled valve is fixed on the described arc pedestal along described arc pedestal left end face.
4. high curvature arc negative electrode magnetron sputtering target according to claim 2 is characterized in that: described permanent magnet is closely to arrange with the powerful magnet of blocks of rectangle, is adsorbed on the arc surface of described arc pedestal.
5. high curvature arc negative electrode magnetron sputtering target according to claim 2, it is characterized in that: described glow-discharge electrode is fixed on the described arc pedestal along described arc pedestal its right end face.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320181124 CN203222616U (en) | 2013-04-12 | 2013-04-12 | High-curvature arced cathode magnetron sputtering target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320181124 CN203222616U (en) | 2013-04-12 | 2013-04-12 | High-curvature arced cathode magnetron sputtering target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203222616U true CN203222616U (en) | 2013-10-02 |
Family
ID=49249627
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320181124 Expired - Fee Related CN203222616U (en) | 2013-04-12 | 2013-04-12 | High-curvature arced cathode magnetron sputtering target |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203222616U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105369214A (en) * | 2014-10-13 | 2016-03-02 | 蒋绍洪 | Optical-level diamond-like film interval type cylinder coating device and method |
-
2013
- 2013-04-12 CN CN 201320181124 patent/CN203222616U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105369214A (en) * | 2014-10-13 | 2016-03-02 | 蒋绍洪 | Optical-level diamond-like film interval type cylinder coating device and method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131002 Termination date: 20190412 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |