CN203217962U - Transparent conductive glass having graphene layer - Google Patents
Transparent conductive glass having graphene layer Download PDFInfo
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- CN203217962U CN203217962U CN 201320167604 CN201320167604U CN203217962U CN 203217962 U CN203217962 U CN 203217962U CN 201320167604 CN201320167604 CN 201320167604 CN 201320167604 U CN201320167604 U CN 201320167604U CN 203217962 U CN203217962 U CN 203217962U
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- glass
- transparent conducting
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- antireflection layer
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Abstract
The utility model relates to a transparent conductive glass having a graphene layer. The transparent conductive glass comprises a glass substrate and a transparent conductive layer covered on the glass substrate, and the transparent conductive layer is formed by superposing the graphene layer and an antireflection layer. The transparent conductive glass has the advantages of low resistivity provision, transmissivity guarantee, and transparent conductive glass production cost reduction.
Description
Technical field
The utility model relates to a kind of transparent conducting glass, and more specifically, the utility model relates to a kind of transparent conducting glass that has graphene layer.
Background technology
Transparent conducting glass is a kind of laminated material, and it is to be substrate with glass, plates thereon with oxide, metal or oxide composite membrane.Transparent conducting glass not only has conductivity, and has light transmission simultaneously, is with a wide range of applications.
At present, transparent conducting glass is mainly used in flat-panel monitor, solar cell etc.The structure of existing transparent conducting glass normally is followed successively by the three-layer type glass structure of silicon dioxide, indium oxide, tin-doped indium oxide (ITO) from the inside to the outside.Yet the ITO that uses as nesa coating on this transparent conducting glass has used the rare metal indium, and the price continuous rise of this raw material indium makes the ITO price raise day by day.In addition, because the ITO quality is hard and frangible, so it can not satisfy the performance requirement of some new application (for example flexible LCD, organic solar batteries), and has the problem of operability difference.In addition, the complex process of preparation ITO need technologies such as spraying plating, evaporation, pulsed laser deposition, plating, so production cost is high.
In order to address these problems, the conductivity organic high molecular compound has been used in research.Yet though the conductivity organic high molecular compound can obtain the electrical property equal with ITO, unavoidable is that the transmissivity of the conductive membrane that obtains is low, thereby can't practical application.When using the conductivity organic high molecular compound, if wish to obtain the electrical property equal with ITO, then to compare transmissivity lower with ITO; If improve transmissivity, then cause poorly conductive.When transmissivity is low, when being used for display application, have the problem of visual discrimination degree variation.
Thereby, press for the novel transparent electro-conductive glass that can satisfy transmissivity and electric conductivity requirement simultaneously.
The utility model content
In order to overcome the above problems, the utility model provides a kind of transparent conducting glass, and this transparent conducting glass comprises glass baseplate and overlay on transparency conducting layer on the glass baseplate, and wherein, described transparency conducting layer is by graphene layer and antireflection layer is stacked forms.
In a preferred embodiment of the present utility model, described glass baseplate comprises quartz glass, vagcor, soda-lime glass, lead silicate glass, alumina silicate glass, borosilicate glass or phosphate glass.
In a preferred embodiment of the present utility model, the thickness of described glass baseplate is 0.1-30mm.
In a preferred embodiment of the present utility model, the thickness of described glass baseplate is 0.3-20mm.
In a preferred embodiment of the present utility model, the thickness of described glass baseplate is 0.5-15mm.
In a preferred embodiment of the present utility model, described optics antireflection layer material is TiO
2, SiO
2, MgF
2, PbS, ThF
4Or LaF
3
In a preferred embodiment of the present utility model, the thickness of described optics antireflection layer is 120nm to 700nm.
In a preferred embodiment of the present utility model, the thickness of described optics antireflection layer is 200nm to 600nm.
In a preferred embodiment of the present utility model, the thickness of described optics antireflection layer is 300nm to 400nm.
In a preferred embodiment of the present utility model, the thickness of described graphene layer is 10nm to 1000nm.
In a preferred embodiment of the present utility model, the thickness of described graphene layer is 30nm to 500nm.
In a preferred embodiment of the present utility model, the thickness of described graphene layer is 50nm to 200nm.
The utility model can guarantee transmissivity when low-resistivity is provided, and can reduce the cost of producing transparent conducting glass.
Description of drawings
Fig. 1 is the schematic diagram according to the transparent conducting glass of an embodiment of the utility model.
Should be understood that accompanying drawing only for illustrative purposes, do not draw in proportion utterly.
Embodiment
The utility model provides a kind of transparent conducting glass, and as shown in Figure 1, this electro-conductive glass 101 comprises glass baseplate 1 and overlay on transparency conducting layer 2 on the glass baseplate, and wherein transparency conducting layer 2 is by optics antireflection layer (non-conductive) 3 and 4 stacked compositions of graphene layer.
Has one deck graphene layer 4 at optics antireflection layer 3.Graphene (Graphene) is a kind of material of the individual layer laminated structure that is made of carbon atom, and it has good transparency, hardness, conductive coefficient and electric conductivity, and has good operability.The thickness of graphene layer 4 can be 10nm to 1000nm, is preferably 30nm to 500nm, is 50nm to 200nm more preferably, but should be understood that other thickness also are feasible.Can graphene layer 4 be applied on the optics antireflection layer 3 by several different methods, described method comprises for example chemical reduction method, chemical vapour deposition technique etc., but should be understood that additive method also is feasible.
By specific embodiment hereinafter, will more clearly understand the utility model.Yet should be understood that following examples do not make restriction to scope of the present utility model.
(1) prepares glass baseplate
Prepare a slice 10 * 10mm square glass base material 1, adopt deionized water that this glass baseplate 1 is cleaned up.This glass baseplate 1 is silicate plate glass, and thickness is 10mm, and transmitance is 89.5% (550nm).
(2) apply the optics antireflection layer
The using plasma sputtering method is TiO with antireflective material
2 Optics antireflection layer 3 be applied on the described glass baseplate on 1.This plasma sputtering method comprises the steps: that 1. make glass baseplate 1 by the plasma zone of Ti target is housed; 2.Ti target DC magnetically controlled DC sputtering TiO
2Optics antireflection layer 3.Wherein, background pressure 1 * 10
-3Pa, operating pressure 3 * 10
-1Pa, argon flow amount 100sccm, oxygen flow 80sccm, target power output 60KW, sputtering time are 75 minutes.
After the sputter, the thickness that records the optics antireflection layer 3 that applies is 220nm.
(3) apply graphene layer
Use hot-setting adhesive that graphene layer 4 is transferred on the optics antireflection layer 3.Concrete steps are: use chemical vapour deposition technique to grow graphene film at copper foil surface earlier, then with the even roller coating of hot-setting adhesive on optics antireflection layer 3, the Copper Foil that then will grow graphene film is fitted on the optics antireflection layer 3, after thermosetting Copper Foil is eroded.
The thickness that records the graphene layer 4 that applies is 55nm.
(4) detect
Carry out the photoelectric properties detection to making the transparent conducting glass that has graphene layer, the performance index parameter that records is as follows:
Surface resistance: 50 ohm
Transmitance: 93%
Thermal stability: 240
(1) prepares glass baseplate
Prepare a slice 10 * 10mm square glass base material 1, adopt deionized water that this glass baseplate 1 is cleaned up.This glass baseplate 1 is normal silicate plate glass, and thickness is 10mm, and transmitance is 89.5% (550nm).
(2) apply antireflection layer
The using plasma sputtering method is SiO with antireflective material
2 Optics antireflection layer 3 be applied on the described glass baseplate on 1.This plasma sputtering method comprises the steps: that 1. make glass baseplate 1 by the plasma zone of Si target is housed; 2.Si target DC magnetically controlled DC sputtering SiO
2Optics antireflection layer 3.Wherein, background pressure 1 * 10
-3Pa, operating pressure 4 * 10
-1Pa, argon flow amount 100sccm, oxygen flow 80sccm, target power output 65KW, sputtering time are 75 minutes.
After the sputter, the thickness that records the optics antireflection layer 3 that applies is 480nm.
(3) apply graphene layer
Use hot-setting adhesive that graphene layer 4 is transferred on the optics antireflection layer 3.Concrete steps are: use chemical vapour deposition technique to grow graphene film at copper foil surface earlier, then with the even roller coating of hot-setting adhesive on optics antireflection layer 3, the Copper Foil that then will grow graphene film is fitted on the optics antireflection layer 3, after thermosetting Copper Foil is eroded.
The thickness that records the graphene layer 4 that applies is 180nm.
(4) detect
Carry out the photoelectric properties detection to making the transparent conducting glass that has graphene layer, the performance index parameter that records is as follows:
Surface resistance: 60 ohm
Transmitance: 90%
Thermal stability: 200
Comparative example 1(ITO transparent conducting glass)
In comparative example 1, identical among the thickness of the length and width of ITO transparent conducting glass, glass baseplate 1 and the embodiment 1, and the thickness of the graphene layer 4 among the thickness of ITO layer and the embodiment 1 is identical, is all 55nm.After testing, the performance index of ITO transparent conducting glass are specific as follows:
Surface resistance: 150 ohm
Transmitance: 86%
Thermal stability: 300
Comparative example 2(ITO transparent conducting glass)
In comparative example 2, identical among the thickness of the length and width of ITO transparent conducting glass, glass baseplate 1 and the embodiment 2, and the thickness of the graphene layer 4 among the thickness of ITO layer and the embodiment 2 is identical, is all 180nm.After testing, the performance index of ITO transparent conducting glass are specific as follows:
Surface resistance: 180 ohm
Transmitance: 87%
Thermal stability: 280
Wherein, the detection method of surface resistance is: the whole zone of glass to be measured as test zone, then with test zone nine five equilibriums, is tested each area surface resistance respectively with the four point probe tester again.
The detection method of transmitance is: with whole regional nine five equilibriums of glass to be measured, measure glass in the transmitance of 550nm.
The method of measurement of thermal stability is: from the sample of a 4mm * 5mm of glass-cutting to be measured, the surface resistance of at first measuring this sample is Ro, then this sample is put into temperature and is 300 ± 30 ℃ container heating, constant temperature took out sample after 30 minutes, after treating the sample cooling, the surface resistance of measuring sample with the four point probe tester is R, and thermal stability is R/Ro.
By above embodiment as can be seen, have good light transmittance and electric conductivity than the existing transparent conducting glass that has graphene layer of the present utility model.
Should be understood that details or the method shown in that the application is not limited to list in the following explanation or the accompanying drawing.Should also be understood that the word and the term that use only are used for illustration purpose and should think restriction herein.
Although shown in the accompanying drawing and example embodiment described herein be at present preferred, should understand these embodiments and only provide by by way of example.Thereby the application is not limited to specific embodiments.The people who reads disclosure text will understand immediately, not have essence to depart under the situation of the novel teachings of the theme described in the present disclosure and advantage, and many remodeling all are feasible, and all these remodeling all are intended to be included in the application's the scope.Scope of the present utility model is only limited by appended claim.
Claims (12)
1. a transparent conducting glass is characterized in that, this transparent conducting glass comprises glass baseplate and overlay on transparency conducting layer on the glass baseplate, and wherein said transparency conducting layer is by the optics antireflection layer and graphene layer is stacked forms.
2. transparent conducting glass according to claim 1 is characterized in that, described glass baseplate comprises quartz glass, vagcor, soda-lime glass, lead silicate glass, alumina silicate glass, borosilicate glass or phosphate glass.
3. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described glass baseplate is 0.1-30mm.
4. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described glass baseplate is 0.3-20mm.
5. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described glass baseplate is 0.5-15mm.
6. transparent conducting glass according to claim 1 and 2 is characterized in that, described optics antireflection layer material is TiO
2, SiO
2, MgF
2, PbS, ThF
4Or LaF
3
7. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described optics antireflection layer is 120nm to 700nm.
8. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described optics antireflection layer is 200nm to 600nm.
9. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described optics antireflection layer is 300nm to 400nm.
10. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described graphene layer is 10nm to 1000nm.
11. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described graphene layer is 30nm to 500nm.
12. transparent conducting glass according to claim 1 and 2 is characterized in that, the thickness of described graphene layer is 50nm to 200nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320167604 CN203217962U (en) | 2013-04-03 | 2013-04-03 | Transparent conductive glass having graphene layer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320167604 CN203217962U (en) | 2013-04-03 | 2013-04-03 | Transparent conductive glass having graphene layer |
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|---|---|
| CN203217962U true CN203217962U (en) | 2013-09-25 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103984051A (en) * | 2014-05-23 | 2014-08-13 | 西北大学 | Electric control terahertz antireflection film based on graphene, manufacturing method and using method |
| WO2017103222A1 (en) * | 2015-12-17 | 2017-06-22 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Contrast-amplifying carriers using a two-dimensional material |
-
2013
- 2013-04-03 CN CN 201320167604 patent/CN203217962U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103984051A (en) * | 2014-05-23 | 2014-08-13 | 西北大学 | Electric control terahertz antireflection film based on graphene, manufacturing method and using method |
| CN103984051B (en) * | 2014-05-23 | 2016-04-20 | 西北大学 | Based on automatically controlled Terahertz antireflecting film and the preparation method of Graphene |
| WO2017103222A1 (en) * | 2015-12-17 | 2017-06-22 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Contrast-amplifying carriers using a two-dimensional material |
| FR3045826A1 (en) * | 2015-12-17 | 2017-06-23 | Commissariat Energie Atomique | CONTRAST AMPLIFIER ARRANGEMENTS USING TWO-DIMENSIONAL MATERIAL |
| US11635367B2 (en) | 2015-12-17 | 2023-04-25 | Centre National De La Recherche Scientifique (Cnrs) | Contrast-amplifying carriers using a two-dimensional material |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: CHANGZHOU 2D CARBON TECHNOLOGY CO., LTD. Free format text: FORMER NAME: 2D CARBON (CHANGZHOU) TECHNOLOGY CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: 213149 No. 6 Xiangyun Road, Wujin Economic Development Zone, Jiangsu, Changzhou Patentee after: 2D CARBON (CHANGZHOU) TECH Inc.,Ltd. Address before: 213149 No. 6 Xiangyun Road, Wujin Economic Development Zone, Jiangsu, Changzhou Patentee before: 2D CARBON (CHANGZHOU) TECH Co.,Ltd. |
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| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130925 |