CN203055970U - Chemical surface treatment apparatus of solar cell silicon wafer - Google Patents

Chemical surface treatment apparatus of solar cell silicon wafer Download PDF

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Publication number
CN203055970U
CN203055970U CN2013200297875U CN201320029787U CN203055970U CN 203055970 U CN203055970 U CN 203055970U CN 2013200297875 U CN2013200297875 U CN 2013200297875U CN 201320029787 U CN201320029787 U CN 201320029787U CN 203055970 U CN203055970 U CN 203055970U
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CN
China
Prior art keywords
liquid
shower nozzle
fluid reservoir
work nest
solar cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2013200297875U
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Chinese (zh)
Inventor
盛遵冰
黄云辉
卢小武
居建华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WUXI SIRUI ELECTRONIC EQUIPMENT TECHNOLOGY Co Ltd
Original Assignee
WUXI SIRUI ELECTRONIC EQUIPMENT TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WUXI SIRUI ELECTRONIC EQUIPMENT TECHNOLOGY Co Ltd filed Critical WUXI SIRUI ELECTRONIC EQUIPMENT TECHNOLOGY Co Ltd
Priority to CN2013200297875U priority Critical patent/CN203055970U/en
Application granted granted Critical
Publication of CN203055970U publication Critical patent/CN203055970U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The utility model relates to a chemical surface treatment apparatus of a solar cell silicon wafer. Several rollers are rotatably erected between two opposite groove walls of a working groove. Idler wheels are fixed on the rollers. A nozzle is arranged in the working groove. A liquid outlet of a liquid storage pot and a liquid inlet of the nozzle are connected through a liquid inlet pipe. The liquid inlet pipe is provided with a flowmeter. The working groove is provided with a return liquid outlet. The liquid storage pot is provided with a return liquid inlet. The return liquid outlet of the working groove and the return liquid inlet of the liquid storage pot are connected through a return liquid pipe. The return liquid pipe is provided with a recovery pump. The liquid storage pot is connoted with a liquid adding pipe. The liquid adding pipe is provided with a liquid adding valve. By using the apparatus of the utility model, chemical liquid consumption is saved and production cost is reduced. The apparatus of the utility model is simple and reliable. Maintenance is convenient.

Description

The chemical surface treatment device of silicon chip of solar cell
Technical field
The utility model relates to a kind of chemical surface treatment device, especially a kind of chemical surface treatment device of silicon chip of solar cell.
Background technology
When non-renewable energy resources such as electric power, coal, oil signal for help repeatedly, when energy problem became the bottleneck of restriction international community economic development day by day, more and more countries came into effect " sunlight program ", and the exploitation solar energy resources is sought the new power of economic development.Some high-caliber nuclear research institutions of Europe also begin to turn to regenerative resource.Under the promotion of international photovoltaic market great potential, the solar cell manufacturing industry of various countries falls over each other to drop into huge fund, enlarges to produce, to strive one seat.
Having in the manufacture of solar cells need be to the chemical treatment step on the single surface of cell silicon chip, and all is at present to reach the processing one side by the surface tension of adjusting chemical liquids, does not soak into other one side simultaneously.But this kind technology chemical liquids consumption is big, and has at cell silicon chip under the situation of warpage a little, can't carry out normal process.
Summary of the invention
The purpose of this utility model is to overcome the deficiencies in the prior art, provide a kind of simple in structure, can realize only single surface being handled and not be subjected to the chemical surface treatment device of silicon chip of solar cell of the influence of its angularity.
The technical scheme that provides according to the utility model, the chemical surface treatment device of described silicon chip of solar cell, it comprises work nest, fluid reservoir, flowmeter, reclaim pump and charging valve, rotating turret is provided with some roller bearings between relative two cell walls of work nest, at roller bearing roller is arranged fixedly, be provided with shower nozzle at work nest, link to each other by input duct between the liquid outlet of fluid reservoir and the inlet of shower nozzle, be provided with flowmeter in input duct, offer back the liquid outlet at work nest, be provided with back the liquid import at fluid reservoir, the liquid outlet of returning at work nest links to each other by back liquid pipeline with returning between the liquid import of fluid reservoir, be provided with the recovery pump at back liquid pipeline, be connected with liquid-feeding tube at fluid reservoir, be provided with charging valve at liquid-feeding tube.
Described shower nozzle is flat, and the liquid spraying outlet of shower nozzle is positioned at the top ends of shower nozzle, and the liquid-inlet of shower nozzle is positioned at the bottom of shower nozzle, and the width of shower nozzle is gradually from the bottom up, and increase arranges.
The tank bottom height of described fluid reservoir is positioned on the trough floor of work nest, and the liquid outlet of fluid reservoir is opened on the tank bottom of fluid reservoir.
The utlity model has following advantage:
1, avoids the frequent adjustment of chemical liquids composition and the waste of the chemical liquids that causes and manpower;
2, effectively improve the influence of battery silicon warp degree;
3, saved the consumption of chemical liquids, reduced production costs;
4, the utility model is simple and reliable, and is easy to maintenance.
Description of drawings
Fig. 1 is front view of the present utility model.
Fig. 2 is the left view of work nest in the utility model.
Embodiment
The utility model is described in further detail below in conjunction with specific embodiment.
The chemical surface treatment device of this silicon chip of solar cell, it comprises work nest 2, fluid reservoir 8, flowmeter 5, reclaim pump 6 and charging valve 7, rotating turret is provided with some roller bearings 3 between relative two cell walls of work nest 2, at roller bearing 3 roller 4 is arranged fixedly, be provided with shower nozzle 1 at work nest 2, link to each other by input duct between the inlet of the liquid outlet of fluid reservoir 8 and shower nozzle 1, be provided with flowmeter 5 in input duct, offer back the liquid outlet at work nest 2, be provided with back the liquid import at fluid reservoir 8, the liquid outlet of returning at work nest 2 links to each other by back liquid pipeline with returning between the liquid import of fluid reservoir 8, be provided with recovery pump 6 at back liquid pipeline, be connected with liquid-feeding tube at fluid reservoir 8, be provided with charging valve 7 at liquid-feeding tube.
Described shower nozzle 1 is flat, and the liquid spraying outlet of shower nozzle 1 is positioned at the top ends of shower nozzle 1, and the liquid-inlet of shower nozzle 1 is positioned at the bottom of shower nozzle 1, and the width of shower nozzle 1 is gradually from the bottom up, and increase arranges.
The tank bottom height of described fluid reservoir 8 is positioned on the trough floor of work nest 2, and the liquid outlet of fluid reservoir 8 is opened on the tank bottom of fluid reservoir 8.
, under the gravity effect, chemical liquid is overflowed by shower nozzle 1 top ends equably by fluid reservoir 8, soak into surface of the work.
Certainly; the utility model also can have other various embodiments; under the situation that does not deviate from this patent spirit and essence thereof; those of ordinary skill in the art can make various corresponding changes and distortion according to this patent, but these corresponding changes and distortion all should belong to the protection range of the appended claim of this patent.

Claims (3)

1. the chemical surface treatment device of a silicon chip of solar cell, it is characterized in that: it comprises work nest (2), fluid reservoir (8), flowmeter (5), reclaim pump (6) and charging valve (7), rotating turret is provided with some roller bearings (3) between relative two cell walls of work nest (2), at roller bearing (3) roller (4) is arranged fixedly, be provided with shower nozzle (1) at work nest (2), link to each other by input duct between the liquid outlet of fluid reservoir (8) and the inlet of shower nozzle (1), be provided with flowmeter (5) in input duct, offer back the liquid outlet at work nest (2), be provided with back the liquid import at fluid reservoir (8), the liquid outlet of returning at work nest (2) links to each other by back liquid pipeline with returning between the liquid import of fluid reservoir (8), be provided with recovery pump (6) at back liquid pipeline, be connected with liquid-feeding tube at fluid reservoir (8), be provided with charging valve (7) at liquid-feeding tube.
2. the chemical surface treatment device of silicon chip of solar cell as claimed in claim 1, it is characterized in that: described shower nozzle (1) is flat, the liquid spraying outlet of shower nozzle (1) is positioned at the top ends of shower nozzle (1), the liquid-inlet of shower nozzle (1) is positioned at the bottom of shower nozzle (1), and the width of shower nozzle (1) is gradually from the bottom up, and increase arranges.
3. the chemical surface treatment device of silicon chip of solar cell as claimed in claim 1, it is characterized in that: the tank bottom height of described fluid reservoir (8) is positioned on the trough floor of work nest (2), and the liquid outlet of fluid reservoir (8) is opened on the tank bottom of fluid reservoir (8).
CN2013200297875U 2013-01-21 2013-01-21 Chemical surface treatment apparatus of solar cell silicon wafer Expired - Fee Related CN203055970U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2013200297875U CN203055970U (en) 2013-01-21 2013-01-21 Chemical surface treatment apparatus of solar cell silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2013200297875U CN203055970U (en) 2013-01-21 2013-01-21 Chemical surface treatment apparatus of solar cell silicon wafer

Publications (1)

Publication Number Publication Date
CN203055970U true CN203055970U (en) 2013-07-10

Family

ID=48738893

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2013200297875U Expired - Fee Related CN203055970U (en) 2013-01-21 2013-01-21 Chemical surface treatment apparatus of solar cell silicon wafer

Country Status (1)

Country Link
CN (1) CN203055970U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016141649A1 (en) * 2015-03-10 2016-09-15 北京七星华创电子股份有限公司 Chemical liquid dispensing system and flow volume control method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016141649A1 (en) * 2015-03-10 2016-09-15 北京七星华创电子股份有限公司 Chemical liquid dispensing system and flow volume control method

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C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130710

Termination date: 20140121