CN202951645U - Cleaning device used for cleaning etching plate - Google Patents
Cleaning device used for cleaning etching plate Download PDFInfo
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- CN202951645U CN202951645U CN 201220591871 CN201220591871U CN202951645U CN 202951645 U CN202951645 U CN 202951645U CN 201220591871 CN201220591871 CN 201220591871 CN 201220591871 U CN201220591871 U CN 201220591871U CN 202951645 U CN202951645 U CN 202951645U
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- cleaning device
- etching
- cleaning
- disk body
- etchable
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Abstract
The utility model provides a cleaning device used for cleaning an etching plate. The cleaning device used for cleaning the etching plate at least comprises a plate body, a stopping piece and a supporting piece, wherein the plate body is used for placing the etching plate, the plate body is provided with a smooth plate surface, a notch is formed in the edge of the plate body, the stopping piece is arranged at the edge of the smooth plate surface, and the supporting piece is used for supporting the plate body. When used for cleaning the etching plate, the cleaning device used for cleaning the etching plate can ensure the fact that the etching plate is not broken in a cleaning process due to touching and pressing, and therefore working efficiency is greatly improved and manufacture cost is effectively reduced. The cleaning device used for cleaning the etching plate is simple in structure, convenient to use and applicable to an industrial production process.
Description
Technical field
The utility model relates to technical field of semiconductors, particularly relates to a kind of cleaning device for cleaning the dry etch process etchable disc.
Background technology
Light emitting diode has that volume is little, efficient is high and the advantage such as the life-span is long, has a wide range of applications in fields such as traffic indication, outdoor panchromatic demonstrations.Especially utilize large-power light-emitting diodes may realize semiconductor solid lighting, cause mankind's revolution of history of throwing light on, thereby become gradually the study hotspot of present person in electronics.In order to obtain the LED of high brightness, key will improve internal quantum efficiency and the external quantum efficiency of device.At present, the chip light extraction efficiency is the principal element of limiting device external quantum efficiency, its main cause is that the refractive index difference between epitaxial material, backing material and air is larger, and the light that causes active area to produce can not be derived chip in the generation total reflection of different refractivity material interface.
The technology path of main flow is to come growing epitaxial with patterned substrate at present, this kind technology can be alleviated the stress that causes due to lattice mismatch in substrate and nitride epitaxial layer heteroepitaxial growth, reduce the density of GaN base epitaxial layer threading dislocation, improve the epitaxial crystal quality, reduce the non-radiative recombination center of semiconductive luminescent materials, enhanced rad is compound, to improve chip brightness.The preparation method of present this graph substrate is first to do with photoresist the little figure of periodic arrangement on Sapphire Substrate, recycling ICP(enhancing coupled plasma) dry etching technology is transferred to this photoetching offset plate figure on Sapphire Substrate, and this dry etching technology cooling most important to substrate in the process of etching, otherwise the high temperature that photoetching offset plate figure produces in can the process because of etching is out of shape, and then can't guarantee effective transfer of figure.as Fig. 1, the ICP etching is to adopt aluminium dish 5 to add quartz disk 4 to the cooling means of substrate at present, directly carry out cooling to sapphire the He cold Sapphire Substrate bottom of being passed into by the cold passage 6 of He, this method is cooling substrate effectively, can guarantee effective transfer of figure, but utilize this method after etching technics is completed, quartz disk 4 has a lot of residues, in order to guarantee the stability of technique, quartz disk 4 need to be cleaned up, and quartz disk 4 is very crisp, price is high again, be easy to it is broken up when scrubbing with brush, crushing, so need significant care when cleaning.
Therefore, make the real necessity that belongs to of a kind of cleaning device for cleaning the dry etch process etchable disc.
The utility model content
The shortcoming of prior art in view of the above, the purpose of this utility model is to provide a kind of cleaning device for the etching dish, the problem that easily etchable disc is broken up, crushes when being used for solving prior art etching dish.
Reach for achieving the above object other relevant purposes, the utility model provides a kind of cleaning device for the etching dish, described cleaning device for the etching dish comprises at least: be used for placing the disk body of etchable disc, it has smooth card and the edge has the first breach; Be arranged on the block piece at described smooth disk body edge; And the support member that supports described disk body.
Preferably, described the first breach comprises two square breach that are on the same diameter of described smooth card.
Preferably, described block piece comprises protruding ring, the second breach that this protruding ring has discharge outlet and connects with described breach.
Further, the low 0.3mm of the height of the described etchable disc of aspect ratio of described block piece.
Preferably, the internal diameter of described disk body is than the large 5mm of diameter of described etchable disc.
Preferably, the material of described disk body is PVC.
Preferably, described support member comprises the brace summer of base and connection base and disk body.
Better, described base is square.
Further, described brace summer be shaped as cylindrical.
As mentioned above, the cleaning device for the etching dish of the present utility model has following beneficial effect: can guarantee that etchable disc is not broken up, crushes in the process of cleaning, thereby greatly improve operating efficiency, effectively reduce manufacturing cost.And cleaning device of the present utility model is simple in structure, and is easy to use, is applicable to industrial processes.
Description of drawings
Fig. 1 is shown as the cooling device schematic diagram in existing dry etch process.
Fig. 2 is shown as the side view of the cleaning device for the etching dish of the present utility model.
Fig. 3 is shown as the top view of the cleaning device for the etching dish of the present utility model.
Fig. 4 is shown as the overall appearance figure of the cleaning device for the etching dish of the present utility model.
The element numbers explanation
The specific embodiment
Below by specific instantiation explanation embodiment of the present utility model, those skilled in the art can understand other advantages of the present utility model and effect easily by the disclosed content of this specification.The utility model can also be implemented or be used by the other different specific embodiment, and the every details in this specification also can be based on different viewpoints and application, carries out various modifications or change under spirit of the present utility model not deviating from.
See also Fig. 2 to Fig. 4.Need to prove, the diagram that provides in the present embodiment only illustrates basic conception of the present utility model in a schematic way, satisfy only show in graphic with the utility model in relevant assembly but not component count, shape and size drafting when implementing according to reality, during its actual enforcement, kenel, quantity and the ratio of each assembly can be a kind of random change, and its assembly layout kenel also may be more complicated.
As shown in the figure, the utility model provides a kind of cleaning device for the etching dish.Described cleaning device for the etching dish comprises at least: disk body 1, block piece 2, and support member 3.
Described disk body 1 is used for placing the etchable disc that needs cleaning, and this disk body 1 has smooth card 11 and the edge has the first breach 12.
Preferably, described the first breach 12 picks and places breach as etchable disc, is convenient to the placement of etchable disc and cleans rear the taking-up.More preferably, described the first breach 12 comprises two breach that are on the same diameter of described smooth card 11, and its shape is not limit, and preferably, includes but not limited to square, arc etc.
For example, as shown in Figure 3, described smooth card two of 11 left and right breach is etchable disc and picks and places breach, and it is square, and width is 20mm
As preferred embodiment a kind of, the internal diameter of described disk body 1 is larger than the diameter of described etchable disc, and as shown in Figure 2, the internal diameter of described disk body 1 is than the large 5mm of diameter of described etchable disc.
The material of described disk body 1 includes but not limited to PVC, lucite and Teflon etc., and preferably, the material of the present embodiment disk body 1 is PVC, and require card 11 smooth smooth, without burr, in order to avoid scratch, scuffing etchable disc.
In addition, the material of described etchable disc is not limit, and comprises quartz disk, aluminium dish, aluminum titanium alloy dish and tin titanium alloy dish etc.In the present embodiment, etchable disc is preferably quartz disk.
Described block piece 2 is arranged on the edge of described disk body 1, is used for stopping that etchable disc is skidded off by card 11.As a kind of preferred structure, described block piece 2 comprises protruding ring, and this protruding ring has discharge outlet 21 and picks and places with described etchable disc the second breach 22 that breach connects.In the present embodiment, discharge outlet 21 comprises two openings that are positioned on the same diameter of protruding ring, and that the shape of this opening includes but not limited to is square, arc etc.
Need to prove, the drainage pattern of the cleaning device that the utility model provides is not limited only to the discharge outlet 21 on protruding ring, for example, can also comprise mesh-shape hole body that is arranged on smooth card etc.
Preferably, the height of the described etchable disc of aspect ratio of described block piece 2 is low, to facilitate scrubbing of etchable disc.In the present embodiment, the height of the described etchable disc of aspect ratio of described block piece 2 hangs down 0.3mm.
Described support member 3 is used for supporting described disk body 1.Support member 3 comprises base 31 and brace summer 32.Wherein, described brace summer 32 is used for connecting base 31 and disk body 1, and the shape of brace summer 32 is not limit, and preferably, comprises cylindrical, cuboid etc.The shape of described base 31 is not limited to square, also comprises circle, triangle etc.
For example, as shown in the figure, brace summer is cylindrical, and its diameter is 20mm; Base is square, and size dimension is 290mm.
The implementation step of the cleaning device that the utility model provides in actual process comprises following at least:
At first, with the PVC material according to described structure and be sized to cleaning device as shown in Fig. 2 and 3.
Then, clamp the two ends of etchable disc with the etchable disc clamper, etchable disc is placed on lightly on the smooth card 11 of cleaning device by two square breach on the same diameter of disk body 1 again, the protruding ring at card 11 edges stops etchable disc, etchable disc can not dropped from smooth card 11 in the process of cleaning break into pieces.
At last, with special-purpose brush, etchable disc is scrubbed, until reach the clean requirement of technique.
In sum, the utility model provides a kind of cleaning device for the etching dish, the block piece of this device by arranging on smooth disk body, can guarantee that etchable disc is not broken up, crushes in the process of cleaning, can not drop from disk body yet, thereby greatly improve operating efficiency, effectively reduce manufacturing cost.And cleaning device of the present utility model is simple in structure, and is easy to use, is applicable to industrial processes.So the utility model has effectively overcome various shortcoming of the prior art and the tool high industrial utilization.
Above-described embodiment is illustrative principle of the present utility model and effect thereof only, but not is used for restriction the utility model.Any person skilled in the art scholar all can under spirit of the present utility model and category, modify or change above-described embodiment.Therefore, have in technical field under such as and know that usually the knowledgeable modifies or changes not breaking away from all equivalences of completing under spirit that the utility model discloses and technological thought, must be contained by claim of the present utility model.
Claims (9)
1. a cleaning device that is used for the etching dish, is characterized in that, described cleaning device comprises at least:
Be used for placing the disk body of etchable disc, it has smooth card and the edge has the first breach;
Be arranged on the block piece at described disk body edge and the support member that supports described disk body.
2. the cleaning device for the etching dish according to claim 1, it is characterized in that: described block piece comprises protruding ring, the second breach that it has discharge outlet and connects with described breach.
3. the cleaning device for the etching dish according to claim 1 is characterized in that: described support member comprises base and connects the brace summer of base and disk body.
4. the cleaning device for the etching dish according to claim 1, it is characterized in that: the internal diameter of described disk body is than the large 5mm of described etchable disc diameter.
5. the cleaning device for the etching dish according to claim 1 and 2, it is characterized in that: the height of the described etchable disc of aspect ratio of described block piece hangs down 0.3mm.
6. the cleaning device for the etching dish according to claim 1, it is characterized in that: the material of described disk body is PVC.
7. the cleaning device for the etching dish according to claim 3, it is characterized in that: described base is square.
8. the cleaning device for the etching dish according to claim 3, it is characterized in that: being shaped as of described brace summer is cylindrical.
9. the cleaning device for the etching dish according to claim 1, it is characterized in that: described the first breach comprises two square breach that are on the same diameter of described smooth card.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220591871 CN202951645U (en) | 2012-11-09 | 2012-11-09 | Cleaning device used for cleaning etching plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220591871 CN202951645U (en) | 2012-11-09 | 2012-11-09 | Cleaning device used for cleaning etching plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202951645U true CN202951645U (en) | 2013-05-29 |
Family
ID=48457240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220591871 Expired - Lifetime CN202951645U (en) | 2012-11-09 | 2012-11-09 | Cleaning device used for cleaning etching plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202951645U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104342757A (en) * | 2013-07-25 | 2015-02-11 | 北京大学 | Cylinder design capable of stably adopting BOE to etch SiO2 |
| CN112024512A (en) * | 2020-08-19 | 2020-12-04 | 京东方再生医学科技有限公司 | Cleaning device and cleaning assembly for cell membrane |
-
2012
- 2012-11-09 CN CN 201220591871 patent/CN202951645U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104342757A (en) * | 2013-07-25 | 2015-02-11 | 北京大学 | Cylinder design capable of stably adopting BOE to etch SiO2 |
| CN104342757B (en) * | 2013-07-25 | 2016-10-05 | 北京大学 | One stably uses BOE corrosion SiO2cylinder body |
| CN112024512A (en) * | 2020-08-19 | 2020-12-04 | 京东方再生医学科技有限公司 | Cleaning device and cleaning assembly for cell membrane |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130529 |