CN202854484U - Photoresist coating equipment - Google Patents
Photoresist coating equipment Download PDFInfo
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- CN202854484U CN202854484U CN 201220575490 CN201220575490U CN202854484U CN 202854484 U CN202854484 U CN 202854484U CN 201220575490 CN201220575490 CN 201220575490 CN 201220575490 U CN201220575490 U CN 201220575490U CN 202854484 U CN202854484 U CN 202854484U
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- foreign matter
- coating equipment
- photoresist coating
- coated
- translation device
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Abstract
The utility model discloses photoresist coating equipment and relates to the technical field of a semiconductor technology, which is aimed at avoiding various adverse situations caused by foreign matters attached to a to-be-coated substrate when coating photoresist in the prior art. The photoresist coating equipment comprises a coating nozzle fixed below a nozzle translation device and also comprises a foreign matter removal device which is located above the to-be-coated substrate and used for spraying gas to the un-glued part of the upper surface of the to-be-coated substrate when gluing the upper surface of the to-be-coated substrate by use of the coating nozzle so that the foreign matter leaves the to-be-coated substrate along the moving direction of the nozzle translation device.
Description
Technical field
The utility model relates to the semiconductor process techniques field, relates in particular to a kind of photoresist coating equipment.
Background technology
Thin Film Transistor-LCD (TFT-LCD, Thin Film Transistor-Liquid CrystalDisplay) be the main flow display device that shows at present the field, it is the committed step of photoetching process that photoresist in the TFT-LCD manufacturing process applies, and the quality of its coating quality directly has influence on the performance quality of thin film transistor (TFT) array figure.
At present, photoresist applies main " gluing-whirl coating " technique that adopts.As shown in Figure 1, this technique at first is placed on substrate to be coated 11 on the operating platform, and the coater nozzle 12 that then will be fixed on nozzle translation device 13 belows by adjustment nozzle translation device 13 is adjusted to the correct position of substrate to be coated 11 tops; The photoresist feedway sprays photoresist with certain speed from coater nozzle 12 subsequently, and nozzle translation device 13 drives coater nozzle 12 translation above this substrate 11 simultaneously, thereby applies the photoresist 14 of one deck desired thickness at this substrate 11.
Before applying photoresist, substrate 11 to be coated very easily is infected with various foreign matters, such as molecule and organic contaminant in carrying and transportation.Because the existence of these foreign matters can cause the surface irregularity of substrate to be coated 11 after applying photoresist, thereby causes the generation of various unfavorable conditions, for example, the thin film transistor (TFT) array dimension of picture does not meet the demands, the opening circuit or short circuit etc. of interconnection line.Wherein, some unfavorable conditions unrepairable in subsequent technique can increase cost even can repair also.
The utility model content
Embodiment of the present utility model provides a kind of photoresist coating equipment, when having solved prior art substrate to be coated having been applied photoresist, and the problem that the foreign matter of being infected with on it can cause various unfavorable conditions to occur.
For achieving the above object, embodiment of the present utility model adopts following technical scheme:
A kind of photoresist coating equipment, comprise the coater nozzle that is fixed on nozzle translation device below, also comprise except foreign matter device, be positioned at substrate to be coated top, be used for using described coater nozzle in the described upper surface of base plate gluing to be coated, to the not gluing part gas jet of described upper surface of base plate to be coated, so that foreign matter breaks away from described substrate to be coated along the direction of motion of described nozzle translation device.
Preferably, describedly be synchronized with the movement along direction of motion and the described nozzle translation device of described nozzle translation device except foreign matter device.
Wherein, the described foreign matter device that removes is arranged on the described nozzle translation device.
Preferably, described photoresist coating equipment also comprises height adjustment mechanism; Described height adjustment mechanism one end is connected with described nozzle translation device, and the other end is connected with the described foreign matter device that removes, and is used for adjusting described except the distance between foreign matter device and the described substrate to be coated.
Wherein, described height adjustment mechanism is comprised of first connecting rod and the first screw rod, and described nozzle translation device has the hole that is complementary with first connecting rod, and described first connecting rod one end is fixedly connected with the described foreign matter device that removes, and the other end penetrates described hole; Described the first screw rod one end parts penetrates described nozzle translation device and is threaded with it, and presses closer on described first connecting rod.
Preferably, the described foreign matter device that removes comprises: draft tube, air chamber; One end of described draft tube is communicated with the source of the gas that is used for supplying with described gas, and the other end is communicated with described air chamber; Described air chamber has slit towards the surface of described substrate to be coated, and described gas sprays from described slit via described draft tube and described air chamber; The length of described slit is not less than the spreading width of described coater nozzle.
Wherein, the air intake opening sectional area of described air chamber is greater than the gas outlet sectional area of this air chamber.
Preferably, described draft tube is provided with gas flow control valve or pressure governor.
Preferably, described photoresist coating equipment also comprises angle adjusting mechanism; Described angle adjusting mechanism one end is connected with described nozzle translation device, and the other end is connected with the described foreign matter device that removes, and is used for adjusting the angle between gas injection direction and the described substrate to be coated.
Wherein, described angle adjusting mechanism is by second connecting rod, sleeve, rotating shaft, and third connecting rod and the second screw rod consist of; One end of described second connecting rod is fixed on the described nozzle translation device, and the other end is fixedly connected with the outside surface of described sleeve; Described rotating shaft one end is fixedly connected with described third connecting rod one end, and the other end penetrates described sleeve inner and described sleeve is flexibly connected; Described the second screw rod one end parts penetrates described sleeve and is threaded with it, and presses closer in described rotating shaft; The described third connecting rod other end is fixedly connected with the described foreign matter device that removes.
In a kind of photoresist coating equipment that the utility model embodiment provides, because except foreign matter device can be positioned at substrate to be coated top, when using coater nozzle to upper surface of base plate gluing to be coated, can be to the not gluing part gas jet of upper surface of base plate to be coated except foreign matter device, this gas can make foreign matter break away from substrate to be coated along the direction of motion of nozzle translation device.Like this so that can be before coater nozzle not be carried out the gluing operation, with the foreign bodies removal on the substrate to be coated except foreign matter device.Thereby avoided on it because there is surface irregularity problem behind the coating photoresist that causes in the foreign matter of being infected with, and then avoided the generation of various unfavorable conditions.
Description of drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art.
Fig. 1 is the schematic diagram of photoresist coating equipment in the prior art;
A kind of photoresist coating equipment schematic diagram that Fig. 2 provides for the utility model embodiment;
The another kind of photoresist coating equipment schematic diagram that Fig. 3 provides for the utility model embodiment;
Another photoresist coating equipment schematic diagram that Fig. 4 provides for the utility model embodiment;
Another photoresist coating equipment schematic diagram that Fig. 5 provides for the utility model embodiment;
Another photoresist coating equipment schematic diagram that Fig. 6 provides for the utility model embodiment.
Embodiment
The utility model provides a kind of photoresist coating equipment, as shown in Figure 2, comprise the coater nozzle 211 that is fixed on nozzle translation device 21 belows, also comprise except foreign matter device 212, be positioned at substrate to be coated 22 tops, be used for when using coater nozzle 211 to apply photoresist 24 to substrate 22 upper surfaces to be coated, to not gluing part 23 gas jet of substrate 22 upper surfaces to be coated, so that foreign matter breaks away from substrate 22 to be coated along the direction of motion of nozzle translation device 21.
In the photoresist coating equipment that the utility model embodiment provides, because except foreign matter device 212 is positioned at substrate to be coated 22 tops, when using coater nozzle 211 to apply photoresist 24 to substrate 22 upper surfaces to be coated, can be to not gluing part 23 gas jet of substrate 22 upper surfaces to be coated except foreign matter device 212, this gas can make foreign matter break away from substrate 22 to be coated along the direction of motion of nozzle translation device 21.Like this so that can be with the foreign bodies removal on the not gluing part 23 of substrate 22 upper surfaces to be coated except foreign matter device 212.Thereby the surface irregularity problem behind the coating photoresist of having avoided causing because of the foreign matter existence of being infected with on it, and then avoided various unfavorable conditions to occur.
In the photoresist coating equipment that above-described embodiment provides, referring to Fig. 2, except direction of motion and the nozzle translation device 21 of foreign matter device 212 along nozzle translation device 21 can be synchronized with the movement.Namely the direction except foreign matter device 212 and nozzle translation device 21 is all identical with velocity magnitude, so that substrate 22 upper surfaces to be coated the removing foreign matter constant area on the gluing part 23 is not constant, avoid removing the excessive velocities of foreign matter, the removing of one on the gluing part 23 foreign matter area does not fall to having foreign matter again.
Certainly, except the direction of motion of foreign matter device 212 along nozzle translation device 21 can not be synchronized with the movement with nozzle translation device 21 yet, except foreign matter device 212 movement velocitys can be greater than the movement velocity of nozzle translation device 21, so that substrate 22 upper surfaces to be coated not the removing foreign matter area on the gluing part 23 increase gradually, shortened removing foreign matter required time.
In the photoresist coating equipment that above-described embodiment provides, referring to Fig. 3, except foreign matter device 212 can be arranged on the nozzle translation device 21, be arranged so that like this to keep being synchronized with the movement except foreign matter device 212 and nozzle translation device 21, and direction of motion is all identical with speed.By adjusting except the distance size of foreign matter device 212 apart from coater nozzle 211, can avoid the two distance too long-range guided missile cause the dust that is eliminated and fall back to again on the substrate to be coated.
In the photoresist coating equipment that above-described embodiment provides, as shown in Figure 4, can also comprise height adjustment mechanism 41; Described height adjustment mechanism 41 1 ends are connected with nozzle translation device 21, the other end with is connected except foreign matter device 212, be used for adjusting the distance of removing between foreign matter device 212 and the substrate to be coated 22.
When substrate 22 upper surfaces to be coated when the foreign matter on the gluing part 23 is not many, can dwindle except the distance between foreign matter device 212 and the substrate to be coated 22, so that reduce and have stronger jet power from the gas that ejects except foreign matter device 212 and the distance between the substrate to be coated 22, remove better foreign matter thereby make except foreign matter device 212.
In the photoresist coating equipment that above-described embodiment provides, described height adjustment mechanism 41 can be comprised of first connecting rod 412 and the first screw rod 411, nozzle translation device 21 has the hole, and first connecting rod 412 1 ends are fixedly connected with removing foreign matter device 212, and the other end penetrates this hole; The first screw rod 411 1 end parts penetrate nozzle translation device 21 and are threaded with it, and press closer on connecting rod 411.
When needs increase or reduce except between foreign matter device 212 and the substrate to be coated 22 apart from the time, the length that can make first connecting rod 412 penetrate the hole reduces or increases, and the first screw rod 411 is screwed it is pressed closer on first connecting rod 412 again.
In the photoresist coating equipment that above-described embodiment provides, as shown in Figure 5, except foreign matter device 212 can comprise: draft tube 51, air chamber 52; One end of draft tube 51 is communicated with the source of the gas (not shown) that is used for supply gas, and the other end is communicated with air chamber 52; The surface towards substrate 22 to be coated of air chamber 52 has slit 53, and gas sprays from slit 53 via draft tube 51 and air chamber 52; The length of slit 53 is not less than the spreading width of coater nozzle 211.
Because an end of draft tube 51 can be communicated with the source of the gas (not shown), the other end can be communicated with air chamber 52, and the gas in the source of the gas (not shown) can be transported in the air chamber 52 continuously.Air chamber 52 can have slit 53 towards substrate to be coated 22 surfaces so that the gas in the air chamber 52 sprays to glass substrate 22 to be coated.When gas entered air chamber 52 from draft tube 51, gas can flow out from slit 53.Therefore and the length of slit 53 is not less than the spreading width of coater nozzle 211, and what the gas by slit 53 can be sprayed onto substrate 22 to be coated fully treats gluing part 22, with the foreign bodies removal of substrate 22 upper surfaces to be coated.
In the photoresist coating equipment that above-described embodiment provides, the air intake opening area of air chamber 52 can be greater than the gas outlet area of this air chamber 52, so that enter 52 gas flow at synchronization greater than the gas flow that flows out air chamber 52, when being stored in gases in the air chamber 52 from the ejection of above-mentioned gas outlet, make the better effects if of removing foreign matter thereby have larger pressure.
In the photoresist coating equipment that above-described embodiment provides, can be provided with gas flow control valve or pressure governor on the draft tube 51, can regulate the gas flow or the pressure that enter air chamber 52, when substrate 22 upper surfaces to be coated when the foreign matter on the gluing part 23 is not many, by adjusting above-mentioned gas flowrate control valve or pressure governor, thereby flow or the pressure that can increase the gas of ejection from air chamber 52 improve gas clean-up foreign matter ability, and then remove better foreign matter.
In the photoresist coating equipment that above-described embodiment provides, as shown in Figure 6, can also comprise second connecting rod 61, sleeve 62, rotating shaft 63, third connecting rod 64 and the second screw rod 65; One end of second connecting rod 61 is installed on the translation device 21, and the other end is fixedly connected with the outside surface of sleeve 62; Rotating shaft 63 is fixedly connected with third connecting rod 64 1 ends, and rotating shaft 63 other ends penetrate sleeve 62 inside and sleeve 62 is flexibly connected, so that rotating shaft 63 can be rotated in sleeve 62; Because the second screw rod 65 1 end parts penetrate sleeve 62 and are threaded with it, and press closer in rotating shaft 63, so that rotating shaft 63 is fixed with the relative position of sleeve 62 and no longer rotated.
Because except foreign matter device 212 is fixedly connected with third connecting rod 64 other ends, can be by adjusting the angle of rotating shaft 63 and vertical direction, adjust except the angle of foreign matter device 212 with vertical direction, thereby can according to the foreign matter on the not gluing part 23 of substrate 22 upper surfaces to be coated what, determine suitable angle.
Need to prove, above embodiment is not in the situation that conflict and can mutually be used in combination, and identical assembly has identical Reference numeral among Fig. 2 to Fig. 6.
The above; it only is embodiment of the present utility model; but protection domain of the present utility model is not limited to this; anyly be familiar with those skilled in the art in the technical scope that the utility model discloses; the variation that can expect easily or replacement all should be encompassed within the protection domain of the present utility model.Therefore, protection domain of the present utility model should be as the criterion with the protection domain of described claim.
Claims (10)
1. photoresist coating equipment, comprise the coater nozzle that is fixed on nozzle translation device below, it is characterized in that, also comprise except foreign matter device, be positioned at substrate to be coated top, be used for using described coater nozzle in the described upper surface of base plate gluing to be coated, to the not gluing part gas jet of described upper surface of base plate to be coated, so that foreign matter breaks away from described substrate to be coated along the direction of motion of described nozzle translation device.
2. photoresist coating equipment according to claim 1 is characterized in that, describedly is synchronized with the movement along direction of motion and the described nozzle translation device of described nozzle translation device except foreign matter device.
3. photoresist coating equipment according to claim 2 is characterized in that, the described foreign matter device that removes is arranged on the described nozzle translation device.
4. photoresist coating equipment according to claim 3 is characterized in that, also comprises height adjustment mechanism;
Described height adjustment mechanism one end is connected with described nozzle translation device, and the other end is connected with the described foreign matter device that removes, and is used for adjusting described except the distance between foreign matter device and the described substrate to be coated.
5. photoresist coating equipment according to claim 4, it is characterized in that, described height adjustment mechanism is comprised of first connecting rod and the first screw rod, described nozzle translation device has the hole that is complementary with first connecting rod, described first connecting rod one end is fixedly connected with the described foreign matter device that removes, and the other end penetrates described hole;
Described the first screw rod one end parts penetrates described nozzle translation device and is threaded with it, and presses closer on described first connecting rod.
6. photoresist coating equipment according to claim 1 is characterized in that, the described foreign matter device that removes comprises: draft tube, air chamber;
One end of described draft tube is communicated with the source of the gas that is used for supplying with described gas, and the other end is communicated with described air chamber;
Described air chamber has slit towards the surface of described substrate to be coated, and described gas sprays from described slit via described draft tube and described air chamber;
The length of described slit is not less than the spreading width of described coater nozzle.
7. photoresist coating equipment according to claim 6 is characterized in that, the air intake opening sectional area of described air chamber is greater than the gas outlet sectional area of this air chamber.
8. photoresist coating equipment according to claim 6 is characterized in that, described draft tube is provided with gas flow control valve or pressure governor.
9. photoresist coating equipment according to claim 3 is characterized in that, also comprises angle adjusting mechanism;
Described angle adjusting mechanism one end is connected with described nozzle translation device, and the other end is connected with the described foreign matter device that removes, and is used for adjusting the angle between gas injection direction and the described substrate to be coated.
10. photoresist coating equipment according to claim 9 is characterized in that, described angle adjusting mechanism is by second connecting rod, sleeve, rotating shaft, and third connecting rod and the second screw rod consist of;
One end of described second connecting rod is fixed on the described nozzle translation device, and the other end is fixedly connected with the outside surface of described sleeve;
Described rotating shaft one end is fixedly connected with described third connecting rod one end, and the other end penetrates described sleeve inner and described sleeve is flexibly connected;
Described the second screw rod one end parts penetrates described sleeve and is threaded with it, and presses closer in described rotating shaft;
The described third connecting rod other end is fixedly connected with the described foreign matter device that removes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220575490 CN202854484U (en) | 2012-11-02 | 2012-11-02 | Photoresist coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220575490 CN202854484U (en) | 2012-11-02 | 2012-11-02 | Photoresist coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202854484U true CN202854484U (en) | 2013-04-03 |
Family
ID=47985665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220575490 Expired - Lifetime CN202854484U (en) | 2012-11-02 | 2012-11-02 | Photoresist coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202854484U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104162496A (en) * | 2013-05-15 | 2014-11-26 | 上海和辉光电有限公司 | Slit coater |
| CN104898375A (en) * | 2015-06-12 | 2015-09-09 | 中国工程物理研究院激光聚变研究中心 | Photoresist blowing and coating device |
| CN108535962A (en) * | 2018-04-11 | 2018-09-14 | 蚌埠高华电子股份有限公司 | A kind of gluing constructional device of ito glass layer photoresist |
-
2012
- 2012-11-02 CN CN 201220575490 patent/CN202854484U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104162496A (en) * | 2013-05-15 | 2014-11-26 | 上海和辉光电有限公司 | Slit coater |
| CN104898375A (en) * | 2015-06-12 | 2015-09-09 | 中国工程物理研究院激光聚变研究中心 | Photoresist blowing and coating device |
| CN108535962A (en) * | 2018-04-11 | 2018-09-14 | 蚌埠高华电子股份有限公司 | A kind of gluing constructional device of ito glass layer photoresist |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130403 |