CN202849575U - Cylinder perfusion type nickel and silicon carbide electroplating device - Google Patents
Cylinder perfusion type nickel and silicon carbide electroplating device Download PDFInfo
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- CN202849575U CN202849575U CN 201220473757 CN201220473757U CN202849575U CN 202849575 U CN202849575 U CN 202849575U CN 201220473757 CN201220473757 CN 201220473757 CN 201220473757 U CN201220473757 U CN 201220473757U CN 202849575 U CN202849575 U CN 202849575U
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Abstract
The utility model discloses a cylinder perfusion type nickel and silicon carbide electroplating device which comprises an electroplating base, a plating solution tank, a cathode conducting rod and an anode conducting rod, wherein a cylinder to be plated is reversely placed on the electroplating base; a groove is arranged in the electroplating base; one end of the anode conducting rod is arranged in the groove, and the other end of the anode conducting rod extends into a cylinder hearth of the cylinder to be plated; the cathode conducting rod can be up and down movably arranged above the electroplating base; a feeding hole is formed in the electroplating base and is communicated with the plating solution groove through a flow divider valve; the flow divider valve comprises a plating solution inlet, a plating solution outlet and at least one reflowing hole; the plating solution outlet is communicated with the feeding hole; and the plating solution inlet and the reflowing hole are communicated with the plating tank. The cylinder perfusion type electronickelling and silicon carbide device also comprises a drive device for driving a plating solution to upwards flow along the inner wall of the cylinder to be plated and flow back to the plating solution tank from the top of the cylinder. The cylinder perfusion type electronickelling and silicon carbide device has the advantages of little plating solution pollution, long life cycle of the plating solution, no need of preparing a plurality of tanks of plating solutions, and reduced recycling time and cost of the plating solution.
Description
Technical field
The utility model relates to a kind of electroplanting device, especially relates to a kind of perfusion type electronickelling and silicon carbide device for the engine air inside wall of cylinder is electroplated.
Background technology
Engine cylinder-body is because it is to move under the high-speed and high-temperature condition, inwall need to possess certain degree of hardness, has simultaneously wear-resisting and Wear vesistance, the engine art general choice satisfy the engine operation requirement in this method of inboard wall of cylinder block metallizing chromium (Cr), development along with economic construction, people's living standard improves, people are day by day deep to the understanding of environment, Industrial products are also along with the reform renewal is being accelerated in social progress, cylinder electrodeposited chromium process uses sexavalent chrome more and more to cause the attention of society for the injury of environment, in order to address this problem, American-European a kind of technology that obtains " Ni-SiC " at inboard wall of cylinder block by plating in utility model 80-nineties of 20th century, and in a large amount of production, obtain by, through checking, this coating had both satisfied the engine high strength, the performance requriements of high abrasion has solved again the problem of electroplating process Pollutant Treatment, electroplates the nickel-silicon carbide process and meets international relevant criterion fully.Present this Novel electroplating technology needs mechanically finding broad application of high-mechanical property at some high-end engine cylinder-bodies and some.
The Ni-SiC composite plating is under specific electric field action, a certain amount of silicon-carbide particle charged and formed composite deposite of nickel codeposition of moment, this composite deposite has superior physical and mechanical properties and chemical stability, coating hardness reaches Hv400-Hv600, coating is attached on the engine inner wall, its wear resisting property can compare favourably with chromium fully, even above chromium coating, strengthening the rear coating wear-thickness of experiment in 300 hours only is 0.007mm, later stage is continued operation, and coating does not almost have more changeableization.
Current, nickel plating-the carborundum craft of many Machinery Enterprises uses has been continued to use traditional immersion type electro-plating method substantially in the world, exactly cylinder directly is immersed in energising enforcement plating in the electroplate liquid, there are some problems in this method: 1. during the surface that does not need to electroplate (surface-area amassed by surfacing approximately 10 times) is immersed in the electroplate liquid in electroplating process always, surface metal ion, can dissolve into electroplate liquid such as zinc, nickel, aluminium, pollute electroplate liquid, so that electroplate liquid shortening in work-ing life, increase metal ion content in the waste water, the wastewater treatment expense increases; In the electroplating process in the cylinder inner cavity electroplate liquid silicon-carbide particle distribute unstablely, it is irregular to exist in the coating silicon carbide to disperse, and affect the crisis that engine moves; 3. along with the concentration polarization of cylinder inner cavity solution increases, current efficiency descends; 4. the water for cleaning amount is large after electroplating, waste water resource.
The utility model content
The utility model provides a kind of rational in infrastructure, reliable in order to overcome the deficiencies in the prior art, and running cost is low, the electronickelling of cylinder perfusion type and the silicon carbide device of environmental protection.
To achieve these goals, the utility model is by the following technical solutions: the electronickelling of a kind of cylinder perfusion type and silicon carbide device, comprise and electroplate seat, bath trough, negative electrode conducting rod and conductive anode rod, cylinder to be plated is inverted on this plating seat, be provided with a groove in the described plating seat, one end of described conductive anode rod is located in this groove, and the other end is stretched in the cylinder thorax of cylinder to be plated; Described negative electrode conducting rod can be located at up or down and electroplate the seat top, and during plating, the negative electrode conducting rod moves to cylinder head to be plated, and the medullary ray of negative electrode conducting rod, conductive anode rod and cylinder to be plated is on same straight line; Electroplate seat and be provided with an inlet opening, this inlet opening is logical by a diverting valve and bath trough; Described diverting valve comprises plating bath import, plating bath outlet and at least one refluxing opening, and the plating bath outlet is communicated with inlet opening, and plating bath import, refluxing opening all are communicated with bath trough; Comprise that also one drives the drive unit that plating bath makes progress and flows and flow back into bath trough from cylinder head along cylinder inner wall to be plated.
As preferably, described top of electroplating seat is provided with at least one gas port tightness system, and the end of this gas port tightness system is corresponding to the gas port place of cylinder to be plated.
As preferably, also comprise a thrust-augmenting nozzle, this thrust-augmenting nozzle one end is corresponding to spark-plug hole place of cylinder head to be plated, and the other end is communicated with described bath trough.
As preferably, described bath trough comprises cell body, whipping appts and is used for the circulation device of circulating bath, and be provided with the heating tube of at least one " L " shape in the cell body, one side of this heating tube is parallel with the cell body inwall, and the other side is parallel bottom cell body; The bottom along continuous straight runs of cell body is provided with at least one blast main, and this blast main is provided with pore, the opening along continuous straight runs of pore be inclined upwardly 40 the degree.
As preferably, described circulation device comprises transfer tube and drives the pump that plating bath flows along transfer tube, and an end of transfer tube is communicated with the bottom of cell body, and the other end is communicated with the top of cell body.
As preferably, described whipping appts comprises stirring rod, and this stirring rod is provided with at least one blade, and this blade is inclined upwardly.
As preferably, described gas port tightness system comprises seal plug, cylinder and permanent seat, and seal plug and permanent seat are slidingly matched, and an end of seal plug is connected with cylinder.
As preferably, described drive unit is a water pump.
Before the plating, cylinder to be plated is inverted be fixed on first and is electroplated on the seat, electroplate the top of the conductive anode rod on the seat and stretched in the cylinder thorax of cylinder, be provided with certain spacing between conductive anode rod and the cylinder cylinder thorax inwall, the power supply flow of the electrolyte; Adopt the gas port tightness system will plate all gas ports of cylinder, block such as scavenging port, inlet mouth etc.; The negative electrode conducting rod is located at and is electroplated the seat top, when electroplating beginning, the negative electrode conducting rod is moved to cylinder head, and holding anode conducting rod, negative electrode conducting rod, cylinder three's medullary ray can guarantee the even thickness of cylinder inner wall electroplating film like this on same straight line; Turn on the power switch, electroplate liquid is under drive unit drives, and one second of every energising is with certain flow, it generally is the flow of 2.5L/min-_5L/min, according to the cylinder volume settings, at the uniform velocity from bath trough, flow out, from the plating bath ingress inflow of diverting valve, flow out from the plating bath exit, flow to electroplate the inlet opening on the seat, enter the inner chamber of cylinder along cell wall, begin to electroplate nickel-silicon carbide; In flowing, electroplate liquid flows out from the cylinder head spark-plug hole, concentrates to flow back into bath trough.
This electroplanting device makes the mobile fabulous of plating bath by adopting mobile plating bath, can not produce precipitation, and new plating bath is flowing into always, main salt can effectively be replenished, guaranteed the even of bath concentration, efficiently solve the problem of plating bath concentration polarization in traditional electroplating process.Evidence, the current efficiency of this device exceed more than 1 times of traditional immersion type, and this device is electroplated nickel-silicon carbide thickness 80 μ m only needs 18min-20min, and traditional immersion type is electroplated 80 μ m and needed 40min-50min.
This novel practical electroplanting device makes electroplate liquid be in all the time under the constant flow state at whole on period, when electroplate liquid is not worked at electroplanting device, plating bath import by diverting valve flows into, flow back to bath trough by refluxing opening again, at whole on period, it is mobile that plating bath remains, reduced the probability of silicon-carbide particle deposition.Therefore use the dispersiveness of silicon carbide in the plating nickel-silicon carbide coating that this Novel electroplating device obtains to be better than traditional immersion type method.
When electroplanting device stopped fully, the cylinder after plating is finished through this electroplanting device was owing to adopt inversion type, all the time be that oral area is placed down, residual electroplate liquid flows to very soon to be electroplated in the seat, and the refluxing opening by diverting valve flows back in the bath trough then, continue to use, avoid causing waste.
When cylinder is implemented to electroplate at this device, be in operation under the sealed state, the cylinder outside surface does not have electroplate liquid, and electroplate liquid can not polluted by electroless plating face material, and electroplate liquid prolongs more than one times work-ing life; And outside surface electroless plating liquid is residual after electroplating, the sorrow that outside surface is not corroded; Moreover, clean simply after electroplating, to change behind 100 cylinder/10L of water for cleaning amount, hot water is dry to be got final product, and changes behind 3000 cylinder/100L.
This device is in electroplating process, because adopt the system that circulates, plating bath can recycle, and only electroplate at cylinder inner wall, saved the consumption of plating bath, so the plating bath in the coating bath does not need again to add, generally be regularly to inspect by random samples the compartment time, add as required newer plating bath and get final product, not only saved plating bath, also reduced workload.
The suitability of this device is very wide, is fit to the cylinder of various different models.Electroplate the profile of seat and can do corresponding adjustment according to the difference of cylinder model, generally make according to actual cylinder bore and cylinder finish dimensional.
The power supply of this device is provided by anchor clamps, and anchor clamps control and power supply communication need are as follows:
1. power supply is provided is one group of independently normally opened contact to anchor clamps, and working condition is: requiring provides power supply up to ON, until work stops to OFF.
2. power requirement
2.1 the output Faradaic current was controllable when power supply will be received signal;
2.2 one group of independently normally opened contact and anchor clamps are exported in simultaneously timing, use and carry out moving below the anchor clamps, the contact is to ON.
The contact disconnected Faradaic current simultaneously to OFF when 2.3 timing arrived, this moment anchor clamps provide one group of power supply independently normally opened contact still keep ON.
2.4 during end-of-job anchor clamps provide one group of power supply independently normally opened contact to OFF.Power supply should be waited for next work beginning.
2.5 any state lower clamp provide power supply one group independently normally opened contact is to OFF the time power supply output that do not have.
The utility model electroplanting device operating parameters: current density A/dm
2=20-36; Temperature ℃=50～58; Sedimentation velocity μ m/min=4-6; PH value=4.2～4.6; Flow velocity L/dm
2.min=2.5～4.
In sum, the utlity model has following advantage:
1, the plating bath pollution is little, and the life cycle of plating bath is long, does not need standby number groove plating bath to use, and reduces solution regeneration time and expense.
2, flow of solution is good, has solved concentration polarization problem in the electroplating process, can be high by electric current, and be 300%-400% of rack plating.
3, cathodic polarization is good, and uniform film thickness cuts the waste.
4, the blank rate of silicon carbide is low, and below 25%, cladding wearability is stronger, can satisfy the requirement of the engine cylinder-body of high strength operation.
Description of drawings
Fig. 1 is structural representation of the present utility model.
Fig. 2 is the structural representation of the utility model diverting valve.
Fig. 3 is the structural representation of the utility model bath trough.
Embodiment
In order to make those skilled in the art person better understand the utility model scheme, below in conjunction with the accompanying drawing among the utility model embodiment, technical scheme among the utility model embodiment is carried out clear, complete description, obviously, described embodiment only is a part of embodiment of the present utility model, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that obtains under the creative work prerequisite, all should belong to the scope of the utility model protection.
As Figure 1-3, a kind of cylinder 045-0135 in the practical application is as cylinder to be plated.The electronickelling of a kind of cylinder perfusion type and silicon carbide device, comprise control device, bath trough 7, support 18 and be located at plating seat 1, negative electrode conducting rod 4 and conductive anode rod 5 on the support 18, cylinder 99 to be plated adopts to be inverted in and electroplates on the seat 1, electroplate in the seat 1 and have a groove, one end of conductive anode rod 5 is fixed on the bottom of this groove, and the other end is stretched in the cylinder thorax of cylinder to be plated.
Be right against place, plating seat 1 top on the support 18 and be provided with an anchor 44, be equipped with one on this anchor 44 and promote cylinder 9, the lower end that promotes cylinder 9 is connected with above-mentioned negative electrode conducting rod 4, and promotion cylinder 9 is electrically connected with control device, control device control promotes cylinder 9 and moves up and down, and negative electrode conducting rod 4 is moved up and down above cylinder to be plated; During plating, control device control cathode conducting rod 4 moves to the top of cylinder 99 to be plated, and the medullary ray that keeps negative electrode conducting rod 4, conductive anode rod 5 and cylinder to be plated 99 threes is on same straight line, the even thickness of plated film in the time of can guaranteeing to electroplate like this; Electroplate when finishing, control device control promotes cylinder 9 actions, makes negative electrode conducting rod 4 leave the top of cylinder 99 to be plated.The lower end of conductive anode rod 4 connects copper conductor to the anodal output of electroplating power supply.
Be positioned at the place, top of electroplating seat 1 on the support 18 two gas port tightness systems 2 are installed, the end of described two gas port tightness systems 2 corresponds respectively to inlet mouth and the exhaust ports of cylinder to be plated; This gas port tightness system comprises seal plug 81, cylinder 82 and permanent seat 83, and seal plug 81 passes permanent seat 83, and is slidingly matched with permanent seat 83, and an end and the cylinder 82 of seal plug 81 are connected, and cylinder 82 is electrically connected with control device; During plating, control device control cylinder 82 moves forward, makes seal plug 81 be aligned in inlet mouth and the exhaust ports of cylinder 99 to be plated, and inlet mouth and venting port are tightly sealed up.
The side of electroplating seat 1 has an inlet opening 11 near the bottom, and this inlet opening 11 communicates with the groove of electroplating seat 1, and this inlet opening 11 is communicated with diverting valve 6 by a flexible pipe 12, a threeway, and diverting valve 6 is communicated with bath trough 7 by a tubing 13; As shown in Figure 2, diverting valve 6 comprises reversing cylinder 64, reversing valve core 65, positioning pillars 66, plating bath import 61,62 and 2 refluxing openings 63 of plating bath outlet, and positioning pillars 66 is used for the movement length of constant reversing valve core 64; Plating bath outlet 62 is communicated with inlet opening 11, plating bath import 61, two refluxing openings 63 all are communicated with bath trough 7, one of them refluxing opening 63 sets low than the horizontal position of plating bath outlet 62, when stopping to electroplate, flow backwards the residual plating bath of returning on the cylinder 99 to be plated will be under action of gravity, flow to this refluxing opening 63 by plating bath outlet 61, flow back into bath trough 7 through this refluxing opening 63 again, prevent the waste of plating bath.This diverting valve 6 also is electrically connected with control device, and during plating, control device control diverting valve 6 gets reversing cylinder 64 actions, and reversing valve core 65 is communicated with plating bath imports 61 and plating bath outlet 62, and plating bath is entered smoothly; During cylinder 99 to be plated up and down, control device control diverting valve 6 is communicated with plating bath import 61 and is positioned at the refluxing opening 63 of low level, like this, plating bath is just from bath trough 7 interior outflows, flow back to again bath trough 7 through diverting valve 6, can guarantee that plating bath all keeps mobile in a whole day, effectively prevents the precipitation of silicon-carbide particle in the plating bath; When stopping to electroplate, 6 outlets 62 of connection plating bath and the refluxing opening 63 that is positioned at low level of control device control diverting valve when stopping feed liquor, can allow the interior residual plating bath of plating seat flow back in the bath trough 7 through plating bath outlet, refluxing opening 63.
This device also comprises a water pump, adopts in the present embodiment force (forcing) pump 15, and this force (forcing) pump is communicated with tubing 13, and the height of tubing 13 liquid feeding ends more than 1/3 place of bath trough 7 liquid level total heights, can from the access of cell body side, also can access from the top at least.At bath trough 7 interior placement one liquid level charactrons 16, proper liquid level is lower than or when surpassing limit value, plating bath is added, and this device need not to add new plating bath in electroplating process, only need the compartment time that plating bath is regularly inspected by random samples and get final product, add according to assay.Force (forcing) pump also is electrically connected with control device, is used for driving plating bath and electroplates seat 1 from the bath trough 7 interior flow directions, and upwards flow along the cylinder thorax inwall of cylinder 99 to be plated, flows out from the spark-plug hole at cylinder to be plated 99 tops again, flows back in the bath trough 7 through a thrust-augmenting nozzle 3.These thrust-augmenting nozzle 3 one ends are corresponding to spark-plug hole place of cylinder head to be plated, the other end is communicated with bath trough 7, the rear end of this thrust-augmenting nozzle 3 connects a water conservancy diversion cylinder 33, this water conservancy diversion cylinder 33 is fixed on the support 18, and is electrically connected with control device, during plating, the 33 forward actions of control device control water conservancy diversion cylinder, make the end of thrust-augmenting nozzle 3 near top spark-plug hole place of cylinder 99 to be plated, thrust-augmenting nozzle 3 is equipped with a sealing-ring, the stopping property of assurance device with cylinder head to be plated contact position; Electroplate when finishing, control device is controlled water conservancy diversion cylinder 33 again and is moved backward, makes thrust-augmenting nozzle 3 leave spark-plug hole place of cylinder 99 to be plated.
At least one flowrate control valve 14 also is installed on the tubing 13, and this flowrate control valve 14 also is electrically connected with control device, is used for the flow of control plating bath.
Certainly, for the method that allows plating bath flow back into bath trough 7 has a variety ofly, for example can be to open drainage trough etc. at support 18.
As shown in Figure 3, in the present embodiment, bath trough 7 comprises cell body 71, whipping appts and is used for the circulation device of circulating bath, the bottom of cell body 71 is taper, be arranged with the heating tube 72 of 4 " L " fonts in the cell body 71 in parallel, these heating tubes 72 all adopt steam heating, and every heating tube is connected with main team pipe to groove, the inwall of parallel with cell body 71 inwalls and the close cell body 71 in one side of every heating tube 72, the other side and cell body 71 along continuous straight runs settings; It is more even that the heating tube of " L " font is heated plating bath, and plating bath is circulating simultaneously, and the heating tube of " L " font more can make the temperature of plating bath keep evenly.
Be provided with 3 blast mains 73 at cell body 71 conical lower portion along continuous straight runs, wherein a taper hole place that is installed in tapered bottom accelerates to stir the plating bath that flows out; This blast main 73 is provided with pore, and the opening along continuous straight runs of the pore 40-45 degree that is inclined upwardly makes the pressurized air of ejection upwards be 40-45 degree angle, plating bath is carried out the side stir.
Circulation device comprises the pump 78 that transfer tube 79 and driving plating bath flow along transfer tube, and pump 78 is corrosion resistant, and an end of transfer tube 79 is communicated with the cone mouth place of the tapered bottom of cell body 71, and the other end is communicated with the top of cell body 71; Plating bath bottom from cell body 71 under the effect of pump 78 is back in the cell body 71, is conducive to flowing of plating bath, makes the silicon-carbide particle of a small amount of precipitation again enter solution and is suspended in the solution, thereby reduce the precipitation that can eliminate silicon-carbide particle.
Whipping appts comprises the stirring rod 75 of being located at cell body 71 central authorities, and the top of stirring rod 75 connects an agitator motor 74, and 4 groups of blades 76 are installed on this stirring rod 75 vertically successively, wherein one group smaller, be installed on the cone mouth place of cell body conical lower portion; This blade 76 is inclined upwardly, and such as the blade of exhaust fan, upwards generates holder power.Stirring rod with less than or equal to 60 turning/rotation of min speed, is suspended in the solution silicon-carbide particle under the effect of motor 74 equably.This whipping appts also is electrically connected with control device, by control device its rotating speed of unified control and start and stop.
This device operating parameters: current density A/dm
2=20-36; Temperature ℃=50～58; Sedimentation velocity μ m/min=4-6; PH value=4.2～4.6; Flow velocity L/dm
2.min=2.5～4.
The advantage of this device: 1, solution flows in cylinder inner cavity, and the electroless plating surface does not contact with solution, and tank liquor/product surface pollutes little, the tank liquor life cycle prolong 2 times or more than, do not need standby number groove plating bath to use, reduce solution regeneration time and expense, the more conventional immersion type of cost is electroplated low; 2, cleaning became simply after product was electroplated, and reduced water for cleaning more than 65%; 3, flow of solution is good, has solved concentration polarization problem in the electroplating process; Can be high by electric current, be 300% of rack plating.4, cathodic polarization is good, and uniform film thickness cuts the waste.5, the blank rate of silicon carbide is hanged down below 25%, and cladding wearability is stronger.Can satisfy the requirement of the engine cylinder-body of high strength operation.
Claims (10)
1. cylinder perfusion type electronickelling and silicon carbide device, comprise and electroplate seat (1), bath trough (7), negative electrode conducting rod (4) and conductive anode rod (5), cylinder to be plated is inverted on this plating seat (1), it is characterized in that: be provided with a groove in the described plating seat (1), one end of described conductive anode rod (5) is located in this groove, and the other end is stretched in the cylinder thorax of cylinder to be plated; Described negative electrode conducting rod (4) can be located at up or down and electroplate seat (1) top, and during plating, negative electrode conducting rod (4) moves to cylinder head to be plated, and the medullary ray of negative electrode conducting rod (4), conductive anode rod (5) and cylinder to be plated is on same straight line; Electroplate seat (1) and be provided with an inlet opening (11), this inlet opening (11) is communicated with bath trough (7) by a diverting valve (6); Described diverting valve (6) comprises plating bath import (61), plating bath outlet (62) and at least one refluxing opening (63), and plating bath outlet (62) is communicated with inlet opening (11), and plating bath import (61), refluxing opening (63) all are communicated with bath trough (7); Comprise that also one drives the drive unit that plating bath makes progress and flows and flow back into bath trough (7) from cylinder head along cylinder inner wall to be plated.
2. cylinder perfusion type according to claim 1 electronickelling and silicon carbide device, it is characterized in that: described top of electroplating seat (1) is provided with at least one gas port tightness system (2), and the end of this gas port tightness system (2) is corresponding to the gas port place of cylinder to be plated.
3. cylinder perfusion type according to claim 2 electronickelling and silicon carbide device, it is characterized in that: also comprise a thrust-augmenting nozzle (3), these thrust-augmenting nozzle (3) one ends are corresponding to spark-plug hole place of cylinder head to be plated, and the other end is communicated with described bath trough (7).
4. cylinder perfusion type according to claim 3 electronickelling and silicon carbide device, it is characterized in that: described bath trough (7) comprises cell body (71), whipping appts and is used for the circulation device of circulating bath, be provided with the heating tube (72) of at least one " L " shape in the cell body (71), one side of this heating tube (72) is parallel with cell body (71) inwall, and the other side is parallel with the cell body bottom; The bottom along continuous straight runs of cell body (71) is provided with at least one blast main (73), and this blast main (73) is provided with pore, the opening along continuous straight runs of pore be inclined upwardly 40 the degree.
5. cylinder perfusion type according to claim 4 electronickelling and silicon carbide device, it is characterized in that: described circulation device comprises transfer tube and drives the pump that plating bath flows along transfer tube, one end of transfer tube is communicated with the bottom of cell body (71), and the other end is communicated with the top of cell body (71).
6. cylinder perfusion type according to claim 5 electronickelling and silicon carbide device, it is characterized in that: described whipping appts comprises stirring rod (75), and this stirring rod (75) is provided with at least one blade (76), and this blade (76) is inclined upwardly.
7. cylinder perfusion type according to claim 6 electronickelling and silicon carbide device, it is characterized in that: described gas port tightness system comprises seal plug (81), cylinder (82) and permanent seat (83), seal plug (81) is slidingly matched with permanent seat (83), and an end of seal plug (81) is connected with cylinder (82).
8. cylinder perfusion type according to claim 7 electronickelling and silicon carbide device, it is characterized in that: described drive unit is a water pump.
9. cylinder perfusion type according to claim 8 electronickelling and silicon carbide device, the upper end of described conductive anode rod (5) are connected with one and promote cylinder (9).
10. cylinder perfusion type according to claim 9 electronickelling and silicon carbide device is characterized in that: also comprise a control device, this control device respectively with promote cylinder (9), water pump, cylinder (82) and diverting valve (6) and be electrically connected.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220473757 CN202849575U (en) | 2012-09-18 | 2012-09-18 | Cylinder perfusion type nickel and silicon carbide electroplating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220473757 CN202849575U (en) | 2012-09-18 | 2012-09-18 | Cylinder perfusion type nickel and silicon carbide electroplating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202849575U true CN202849575U (en) | 2013-04-03 |
Family
ID=47980794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220473757 Withdrawn - After Issue CN202849575U (en) | 2012-09-18 | 2012-09-18 | Cylinder perfusion type nickel and silicon carbide electroplating device |
Country Status (1)
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| CN (1) | CN202849575U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102828220A (en) * | 2012-09-18 | 2012-12-19 | 绍兴锋龙电机有限公司 | Perfusion type electronickelling and silicon carbide device for air cylinder |
| CN111441073A (en) * | 2020-05-11 | 2020-07-24 | 西北工业大学 | Plating cavity capable of improving uniformity of Ni-SiC composite plating layer on inner wall of hollow part |
-
2012
- 2012-09-18 CN CN 201220473757 patent/CN202849575U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102828220A (en) * | 2012-09-18 | 2012-12-19 | 绍兴锋龙电机有限公司 | Perfusion type electronickelling and silicon carbide device for air cylinder |
| CN102828220B (en) * | 2012-09-18 | 2015-02-25 | 绍兴锋龙电机有限公司 | Perfusion type electronickelling and silicon carbide device for air cylinder |
| CN111441073A (en) * | 2020-05-11 | 2020-07-24 | 西北工业大学 | Plating cavity capable of improving uniformity of Ni-SiC composite plating layer on inner wall of hollow part |
| CN111441073B (en) * | 2020-05-11 | 2022-03-25 | 西北工业大学 | Plating cavity capable of improving uniformity of Ni-SiC composite plating layer on inner wall of hollow part |
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