CN202830207U - Plating tank - Google Patents
Plating tank Download PDFInfo
- Publication number
- CN202830207U CN202830207U CN201220474162.5U CN201220474162U CN202830207U CN 202830207 U CN202830207 U CN 202830207U CN 201220474162 U CN201220474162 U CN 201220474162U CN 202830207 U CN202830207 U CN 202830207U
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- CN
- China
- Prior art keywords
- cell body
- plating tank
- electroplate liquid
- plating
- communicated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model discloses a plating tank comprising a tank body used for containing electroplate liquid, a stirring device and a circulating device. At least one are pipe is arranged on the bottom of the tank body along the horizontal direction. An air hole is formed in the air pipe. The opening mouth of the air hole inclines upwards by 30 to 45 degrees along the horizontal direction. The circulating device comprises a delivering tube and a pump driving the electroplate liquid to flow along the delivering tube. One end of the delivering tube is communicated with the bottom of the tank body. The other end of the delivering tube is communicated with the top portion of the tank body. By adopting a self-circulation system and the stirring device, the plating tank can enable the particulate materials in the electroplate liquid to be mixed evenly through mechanical stirring and are stirring in plating process. The circulation effect of the circulating device enables the particles depositing on the bottom to reenter the electroplate liquid and suspend in the electroplate liquid, so the sediment of the particles is reduced.
Description
Technical field
The utility model relates to a kind of electroplanting device, especially relates to a kind of plating tank of electroplating usefulness.
Background technology
Engine cylinder-body is because it is to move under the high-speed and high-temperature condition, inwall need to possess certain degree of hardness, has simultaneously wear-resisting and Wear vesistance, the engine art general choice satisfy the engine operation requirement in this method of inboard wall of cylinder block nickel plating-silicon carbide film, this coating satisfies the performance requriements of engine high strength, high abrasion fully, and electroplating process meets international relevant criterion fully.
Current; nickel plating-the carborundum craft of many Machinery Enterprises uses has been continued to use traditional immersion type electro-plating method substantially in the world; exactly cylinder directly is immersed in energising enforcement plating in the plating tank; there are some problems in this method: owing to have some particulate materials such as silicon-carbide particle etc. in the plating bath in the plating tank; these particles are easy to produce deposition; then it is unstable to cause in the electroplating process silicon-carbide particle in the cylinder inner cavity electroplate liquid to distribute, and makes in the coating silicon carbide disperse irregular and affect the crisis that engine moves.
The utility model content
The utility model is in order to overcome the deficiencies in the prior art, the plating tank that provides a kind of plating bath to stir, and the cylinder plated film thickness of electroplating through this plating tank is even, performance good.
To achieve these goals, the utility model is by the following technical solutions: a kind of plating tank, comprise cell body, whipping appts and circulation device for the splendid attire electroplate liquid, the bottom along continuous straight runs of cell body is provided with at least one blast main, this blast main is provided with pore, the opening along continuous straight runs of the pore 30-45 degree that is inclined upwardly; Described circulation device comprises the pump that transfer tube and driving plating bath flow along transfer tube, and an end of transfer tube is communicated with the bottom of cell body, and the other end is communicated with the top of cell body.
As preferably, described whipping appts comprises stirring rod, and this stirring rod is provided with at least one blade, and this blade is inclined upwardly.
As preferably, described cell body bottom is taper.
As preferably, be provided with the heating tube of at least one " L " shape in the cell body, one side of this heating tube is parallel with the cell body inwall, and the other side is parallel with the cell body bottom.
As preferably, described cell body is provided with liquid level charactron.
The utlity model has following advantage: this plating tank is provided with self-circulation system and whipping appts, in electroplating process, by mechanical stirring and pneumatic blending, particulate matter in the plating bath is mixed, the Circulation of circulation device makes the particle that is deposited in the bottom again enter solution and is suspended in the solution, thereby subtracts less granular precipitation.
Description of drawings
Fig. 1 is structural representation of the present utility model.
Embodiment
In order to make those skilled in the art person better understand the utility model scheme, below in conjunction with the accompanying drawing among the utility model embodiment, technical scheme among the utility model embodiment is carried out clear, complete description, obviously, described embodiment only is a part of embodiment of the present utility model, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that obtains under the creative work prerequisite, all should belong to the scope of the utility model protection.
As shown in Figure 1, a kind of plating tank, comprise cell body 1, whipping appts and circulation device for the splendid attire electroplate liquid, the bottom of cell body 1 is conical, and the bottom along continuous straight runs of cell body 1 is provided with 3, tops that are located at tapered bottom of 3 blast mains, middle part in tapered bottom, one this blast main 3 is provided with pore at the cone mouth place of tapered bottom, the opening along continuous straight runs of pore be inclined upwardly 40 the degree; Circulation device comprises the pump 52 that transfer tube 51 and driving plating bath flow along transfer tube 51, and an end of transfer tube 51 is communicated with the bottom of cell body 1, and the other end is communicated with the top of cell body 1; Whipping appts comprises stirring rod 6 and agitator motor 62, and the upper end of stirring rod 6 is connected with agitator motor, and this stirring rod 6 is provided with 4 groups of blades 61, wherein one group of blade is smaller, is located at the bell place of tapered bottom, and every group of blade 61 all is inclined upwardly, during rotation, form a holder power that makes progress.Be provided with the heating tube 2 of 4 " L " shapes in the cell body 1, one side of this heating tube 2 is parallel with cell body 1 inwall, and the other side is parallel with the cell body bottom.Cell body 1 is provided with liquid level charactron 7, is used for showing the plating bath liquid level.This apparatus structure is reasonable, in electroplating process, by mechanical stirring and pneumatic blending, particulate matter in the plating bath is mixed, the Circulation of circulation device makes the particle that is deposited in the bottom again enter solution and is suspended in the solution, thereby subtract less granular precipitation, guaranteed the even of plated film.
Claims (5)
1. plating tank, comprise cell body (1), whipping appts and circulation device for the splendid attire electroplate liquid, the bottom along continuous straight runs of cell body (1) is provided with at least one blast main (3), and this blast main (3) is provided with pore, the opening along continuous straight runs of the pore 30-45 degree that is inclined upwardly; Described circulation device comprises the pump (52) that transfer tube (51) and driving plating bath flow along transfer tube (51), and an end of transfer tube (51) is communicated with the bottom of cell body (1), and the other end is communicated with the top of cell body (1).
2. plating tank according to claim 1, it is characterized in that: described whipping appts comprises stirring rod (6), and this stirring rod (6) is provided with at least one blade (61), and this blade (61) is inclined upwardly.
3. plating tank according to claim 2 is characterized in that: be taper bottom the described cell body (1).
4. plating tank according to claim 3, it is characterized in that: be provided with the heating tube (2) of at least one " L " shape in the cell body (1), one side of this heating tube (2) is parallel with cell body (1) inwall, and the other side is parallel with the cell body bottom.
5. plating tank according to claim 4, it is characterized in that: described cell body (1) is provided with liquid level charactron (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220474162.5U CN202830207U (en) | 2012-09-18 | 2012-09-18 | Plating tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201220474162.5U CN202830207U (en) | 2012-09-18 | 2012-09-18 | Plating tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202830207U true CN202830207U (en) | 2013-03-27 |
Family
ID=47941961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201220474162.5U Expired - Lifetime CN202830207U (en) | 2012-09-18 | 2012-09-18 | Plating tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202830207U (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103643283A (en) * | 2013-12-09 | 2014-03-19 | 昆山亿诚化工容器有限公司 | Electroplating device with rotating electroplating bath |
| CN104846373A (en) * | 2014-02-13 | 2015-08-19 | 深南电路有限公司 | Micro etching processing system and related equipment |
| CN104988564A (en) * | 2015-06-30 | 2015-10-21 | 苏州华日金菱机械有限公司 | Multi-functional intelligent plating bath |
| CN108614026A (en) * | 2018-05-02 | 2018-10-02 | 重庆大学 | Electrochemistry teaching or testing equipment and its assemble method |
| CN110344104A (en) * | 2019-08-21 | 2019-10-18 | 山东新海表面技术科技有限公司 | Engine cylinder intracoelomic cavity electroplating device |
| CN110438478A (en) * | 2018-08-22 | 2019-11-12 | 盛青永致半导体设备(苏州)有限公司 | Chemical plating device and manufacturing method of metallized substrate |
| CN113832525A (en) * | 2021-08-06 | 2021-12-24 | 深圳市鑫达辉软性电路科技有限公司 | A heavy current flexible circuit board copper facing production line for 5G communication base station |
| CN115537903A (en) * | 2022-10-19 | 2022-12-30 | 暨南大学 | Composite electroplating equipment |
-
2012
- 2012-09-18 CN CN201220474162.5U patent/CN202830207U/en not_active Expired - Lifetime
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103643283A (en) * | 2013-12-09 | 2014-03-19 | 昆山亿诚化工容器有限公司 | Electroplating device with rotating electroplating bath |
| CN104846373A (en) * | 2014-02-13 | 2015-08-19 | 深南电路有限公司 | Micro etching processing system and related equipment |
| CN104846373B (en) * | 2014-02-13 | 2017-12-01 | 深南电路有限公司 | Microetch processing system and relevant device |
| CN104988564A (en) * | 2015-06-30 | 2015-10-21 | 苏州华日金菱机械有限公司 | Multi-functional intelligent plating bath |
| CN108614026A (en) * | 2018-05-02 | 2018-10-02 | 重庆大学 | Electrochemistry teaching or testing equipment and its assemble method |
| CN110438478A (en) * | 2018-08-22 | 2019-11-12 | 盛青永致半导体设备(苏州)有限公司 | Chemical plating device and manufacturing method of metallized substrate |
| CN110344104A (en) * | 2019-08-21 | 2019-10-18 | 山东新海表面技术科技有限公司 | Engine cylinder intracoelomic cavity electroplating device |
| CN113832525A (en) * | 2021-08-06 | 2021-12-24 | 深圳市鑫达辉软性电路科技有限公司 | A heavy current flexible circuit board copper facing production line for 5G communication base station |
| CN115537903A (en) * | 2022-10-19 | 2022-12-30 | 暨南大学 | Composite electroplating equipment |
| CN115537903B (en) * | 2022-10-19 | 2023-11-10 | 暨南大学 | Composite electroplating equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP03 | Change of name, title or address |
Address after: 312300 Liang Lake Industrial Park, Shangyu District, Shaoxing, Zhejiang, Shangyu Patentee after: ZHEJIANG FENGLONG ELECTRICAL MACHINERY Co.,Ltd. Address before: 312351 Zhejiang province Shaoxing city Shangyu city Liang Lake Industrial Park Lu Ze West Road Patentee before: SHAOXING FENGLONG ELECTRICAL MACHINERY Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130327 |