CN202615114U - Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine - Google Patents
Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine Download PDFInfo
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- CN202615114U CN202615114U CN 201220249142 CN201220249142U CN202615114U CN 202615114 U CN202615114 U CN 202615114U CN 201220249142 CN201220249142 CN 201220249142 CN 201220249142 U CN201220249142 U CN 201220249142U CN 202615114 U CN202615114 U CN 202615114U
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Abstract
The utility model discloses a gas-tight sealing and gas-liquid separation recovery device for an immersion photoetching machine. The gas-tight sealing and gas-liquid separation recovery device is arranged between a projection objective group and a silicon chip in the immersion photoetching machine; the gas-tight sealing and gas-liquid separation recovery device comprises a sealing and injected liquid recovering device, a gas-liquid separation blade group and a liquid recovery blade group; and the sealing and injected liquid recovering device consists of an immersion unit front end cover and an immersion unit rear end cover. The gas-tight sealing and gas-liquid separation recovery device is used for completing sealing and injected liquid recovering functions on a gap flow field in the immersion photoetching machine and implementing the continuous and stable updating of the gap flow field. A gas-tight sealing structure is used at the edge of the gap flow field to prevent leakage of liquid; and a gas-liquid separation recovery structure is adopted to implement the separation and the respective recovery of gas and the liquid and two phases of gas and liquid flow are avoided being generated, so that the problem of vibration of a pipeline, which is caused by simultaneously recovery of the two phases of gas and liquid flow, is avoided. No matter which direction the silicon chip moves toward, the height of the liquid level in the device can be dynamically regulated by the gas-liquid separation recovery structure.
Description
Technical field
The utility model relates to sealing of a kind of flow field and retracting device, particularly relates to a kind of hermetic seal and gas-liquid separating and reclaiming device that is used for immersed photoetching machine.
Background technology
Litho machine is to make one of most crucial equipment of VLSI (very large scale integrated circuits), and modern litho machine optical lithography is main, and it utilizes optical system, and accurately projection and exposure had been coated with on the silicon chip of photoresist the figure on the mask.It comprises a LASER Light Source, an optical system, projection mask version, an alignment system and a silicon chip that scribbles photosensitive photoresist of being made up of graphics chip.
Liquid immersion lithography (Immersion Lithography) equipment is through in the end filling certain high refractive index liquid between a slice projection objective and the silicon chip; With respect to intermediate medium is the dry lithography machine of gas; Improve the numerical aperture (NA) of projection objective, thereby improved the resolution and the depth of focus of lithographic equipment.In the litho machine of future generation that has proposed, liquid immersion lithography is changed minimum to existing equipment, present dry lithography facility are had good inheritance.The at present normal scheme that adopts is local immersion method, is about in the regional area between the lower surface that liquid is limited in silicon chip top and last a slice projection objective, and keeps the liquid flow of steady and continuous.In stepping-scan-type lithographic equipment, silicon chip carries out scanning motion at a high speed in exposure process, and this athletic meeting is left the flow field with the liquid band in the exposure area, thereby causes leakage, and the liquid of leakage can form the water mark on photoresist, influence exposure quality.All there is the problem of biphase gas and liquid flow in existing gas sealing mechanism in removal process, both are put together to reclaim will cause the vibration of pipeline, thereby has a strong impact on the exposure quality.Therefore, must solve the vibration problem that causes by biphase gas and liquid flow in the removal process by emphasis in the immersion lithography.
In the present existing solution, the problem that emphasis solves is the sealing problem of filling liquid, adopts hermetic seal or liquid sealing member around the gap flow field between projection objective group end element and the silicon chip.The hermetic seal technology is on the periphery around the filling flow field, forms annular air curtain through applying gases at high pressure, and filling liquid is limited in certain border circular areas.The liquid sealing technology then is to utilize and the inconsistent third party's liquid of filling liquid (normally magnetic fluid or mercury etc.), seals around filling the flow field.But in these encapsulation scheme, all do not consider vibration problem, and not enough below existing:
(1) the liquid sealing mode has very harsh requirement to seal fluid, when guaranteeing that sealing property requires, also must guarantee seal fluid and dissolving each other of filling liquid, and photoresist (or Topcoat) and not counterdiffusion mutually of filling liquid.In substrate high-speed motion process, in a single day outside air or seal fluid are involved in or dissolve or be diffused in the filling liquid, all can produce negative influence to the exposure quality.
(2) existing hermetic adopts air curtain to be applied to around the fill fluid, causes the instability at edge, flow field, in stepping of substrate high speed and scanning process, possibly cause leak of liquid and sealing gas to entrainment in the flow field; Simultaneously, will form biphase gas and liquid flow when filling liquid and sealing gas reclaim together, cause vibration thus, influence the steady operation of exposure system.
Summary of the invention
In order to solve the flow field sealing problem in the local immersion lithography, the purpose of the utility model is to provide a kind of hermetic seal and gas-liquid separating and reclaiming device that is used for immersed photoetching machine, uses the hermetic seal structure to prevent the leakage of liquid at the edge, flow field.
The technical scheme that the utility model adopts is following:
The hermetic seal and the gas-liquid separating and reclaiming device that are equipped with between projection objective group and the silicon chip of the utility model in immersed photoetching machine; Described hermetic seal and gas-liquid separating and reclaiming device comprise sealing and fluid injection retracting device, gas-liquid separation sheet group and liquids recovery sheet group; Sealing and fluid injection retracting device are made up of submergence unit front end end cover and submergence unit rear end cap; Wherein:
1) submergence unit rear end cap:
Rear end cap has central through hole in the submergence unit; On outside seven concentric circless of the central through hole of submergence unit rear end cap, have the fluid injection groove of four five equilibriums respectively successively, two liquid recovery, two gas recovery grooves, two interior sealed gas-filling grooves, two interior sealing gas accumulator tanks, two external seal gas recovery grooves and two external seal gas injection grooves;
2) submergence unit front end end cover:
Front end end cover has central through hole in the submergence unit; The central through hole of submergence unit front end end cover outwards is nested with five ring-shaped continuous cylindrical cavities separately successively; Five ring-type cylindrical cavities outwards are followed successively by and reclaim vestibule, internal layer gas injection pressure cushion chamber, internal layer gas recovery chamber, outer gas recovery chamber and outer gas injection pressure cushion chamber; On the end face annulus of the submergence unit front end end cover between front end end cover central through hole and the recovery vestibule, having four identical fluid injection chambeies that the center symmetry is uniformly distributed with; All have the liquid injection hole array of along the circumferential direction arranging in four fluid injection chambeies; Reclaim on the vestibule inner bottom surface and have the recovery holes array, have the internal layer injecting hole array of along the circumferential direction arranging in the internal layer gas injection pressure cushion chamber, have the outer injecting hole array of along the circumferential direction arranging in the outer gas injection pressure cushion chamber; All have 12 grooves that the center symmetry is uniformly distributed with in internal layer gas recovery chamber and the outer gas recovery chamber, the recovery holes array is made up of the micropore that evenly gathers;
Front end end cover upper end, described submergence unit is the plane with the faying face of rear end cap lower end, submergence unit, and is fastenedly connected through screw;
3) gas-liquid separation sheet group:
Be stacked together by the gas-liquid separation sheet of seven annulars and form gas-liquid separation sheet group; The outside of seven gas-liquid separation sheets is close to the lateral wall that reclaims vestibule; Have the micropore that correspondence communicates and evenly gather on seven gas-liquid separation sheets; The inboard that is positioned at six following gas-liquid separation sheets in seven gas-liquid separation sheets has the inclined-plane towards submergence unit rear end cap continuously; Seven gas-liquid separation sheets are positioned at a nethermost gas-liquid separation sheet and contact with the recovery vestibule inner bottom surface of front end end cover, the micropore that has on seven gas-liquid separation sheets and corresponding the communicating of micropore of recovery holes array, and the multiple tracks microtubule road that is formed by micropore on seven gas-liquid separation sheets communicates with the gas recovery groove;
4) liquids recovery sheet group:
Be stacked together by the liquids recovery sheet of seven annulars and form liquids recovery sheet group; The inboard of seven liquids recovery sheets is close to the madial wall that reclaims vestibule; Have the micropore that correspondence communicates and evenly gather on seven liquids recovery sheets; The outside that seven liquids recovery sheets are positioned at nethermost two liquids recovery sheets has the inclined-plane towards silicon chip continuously; Seven liquids recovery sheets are positioned at a nethermost liquids recovery sheet and contact with the recovery vestibule inner bottom surface of front end end cover; The micropore that has on seven liquids recovery sheets and corresponding the communicating of micropore of recovery holes array, the multiple tracks microtubule road that is formed by micropore on seven liquids recovery sheets communicates with liquid recovery.
Described four fluid injection grooves communicate with separately fluid injection chamber respectively; Two interior sealed gas-filling grooves all communicate with internal layer gas injection pressure cushion chamber; Two interior sealing gas accumulator tanks all communicate with internal layer gas recovery chamber; External seal gas recovery groove all communicates with outer gas recovery chamber, and two external seal gas injection grooves all communicate with outer gas injection pressure cushion chamber.
Described liquid injection hole array, internal layer injecting hole array and outer injecting hole array are formed by the micropore of along the circumferential direction arranging.
The beneficial effect that the utlity model has is:
(1) recovery end adopts the pipeline that micropore is formed; Arrangement mode from inside to outside forms multiple tracks annulus pipeline array; What the position that contacts with the recovery holes array in the liquids recovery sheet group was continuous reclaims immersion liquid; The contact site does not have the inclined-plane, so that to reclaiming through the liquid after the gas-liquid separation.The liquid that reclaims flows into external pipeline through liquid recovery, realizes the recovery of liquid.
(2) the hermetic seal technology can be introduced biphase gas and liquid flow in the liquids recovery process; Cause the vibration of immersion system and the fluctuation in flow field; The optics consistance of immersion liquid caused have a strong impact on; The gas-liquid separation sheet group of utilizing the gas-liquid separation sheet to be formed by stacking is with the microtubule road imitation porous medium minimizing vibration of circle distribution.
(3) in the chamber that gas-liquid separation sheet group, submergence unit front end end cover, submergence unit rear end cap are formed, add negative pressure; When liquid exceeds the inclined-plane of gas-liquid separation sheet group; Liquid flows to the bottom of recovery structure under action of gravity; And gas passes through the gas recovery concentrated flow to external pipeline, thereby gas is separated.Realize separating and recovery respectively of gas and liquid, thereby the vibration problem that causes when having avoided biphase gas and liquid flow to reclaim together can obviously reduce the vibration of immersion system and the fluctuation in flow field.
(4) carry out in the high-velocity scanning process at silicon chip,, must cause the liquid level on silicon chip direction of motion to raise, and the liquid level of opposite side reduces owing to action of traction to liquid.If the untimely recovery in the position that liquid level is high then possibly cause leak of liquid can not make liquid level lower if yield is not reduced at the low position of liquid level, even suck air.The pipeline and the ramp structure of gas-liquid separation sheet group and liquids recovery sheet group are circle distribution; In the silicon chip motion; Ramp structure has the function of automatic adjusting liquid level; When a side liquid level raise, the part that exceeds the inclined-plane was returned from the inclined-plane and is flowed down, and flows to the low position of liquid withdrawal system and liquid level; When the opposite side liquid level reduced, liquid level was lower than the inclined-plane, and fluid preservation makes the liquid level of filling liquid have the dynamic self-adapting regulatory function in the pipeline of gas-liquid separation sheet group.
Description of drawings
Fig. 1 rough schematic view that to be the utility model assemble with projection lens set mutually.
Fig. 2 is the blast cross section view of the utility model.
Fig. 3 is the submergence unit front end end cover upward view of the utility model.
Fig. 4 is a submergence unit front end end cover three-dimensional view.
Fig. 5 is a submergence unit rear end cap three-dimensional view.
Fig. 6 is a liquids recovery sheet group three-dimensional view.
Fig. 7 is a gas-liquid separation sheet group three-dimensional view.
Fig. 8 is the utility model cross section view.
Fig. 9 is the partial cross sectional views that the utility model characterizes the gas-liquid separation part.
Among the figure: 1, projection lens set, 2, sealing and fluid injection retracting device, 2A, submergence unit front end end cover, 2B, submergence unit rear end cap, 3, silicon chip; 4, gas-liquid separation sheet group, 4A, the first gas-liquid separation sheet, 4B, the second gas-liquid separation sheet, 4C, the 3rd gas-liquid separation sheet, 4D, the 4th gas-liquid separation sheet; 4E, the 5th gas-liquid separation sheet, 4F, the 6th gas-liquid separation sheet, 4G, the 7th gas-liquid separation sheet, 5, liquids recovery sheet group, 5A, the first liquids recovery sheet; 5B, the second liquids recovery sheet, 5C, the 3rd liquids recovery sheet, 5D, the 4th liquids recovery sheet, 5E, the 5th liquids recovery sheet, 5F, the 6th liquids recovery sheet; 5G, the 7th liquids recovery sheet, 6A, fluid injection chamber, 6B, fluid injection groove, 6C, liquid injection hole array, 7, the recovery holes array; 7A, liquid recovery, 7B, gas recovery groove, 8A, internal layer gas injection pressure cushion chamber, 8B, interior sealed gas-filling groove, 8C, internal layer injecting hole array; 9A, internal layer gas recovery chamber, 9B, interior sealing gas accumulator tank, 10A, outer gas recovery chamber, 10B, external seal gas recovery groove; 11A, outer gas injection pressure cushion chamber, 11B, external seal gas injection groove, 11C, outer injecting hole array, 12, gap flow field.
Embodiment
Specify the practical implementation process of the utility model below in conjunction with accompanying drawing and embodiment.
As shown in Figure 1, hermetic seal of being equipped with between projection objective group 1 in immersed photoetching machine and the silicon chip 3 and gas-liquid separating and reclaiming device; Said hermetic seal and gas-liquid separating and reclaiming device comprise sealing and fluid injection retracting device 2, gas-liquid separation sheet group 4 and liquids recovery sheet group 5; Sealing and fluid injection retracting device 2 are made up of submergence unit front end end cover 2A and submergence unit rear end cap 2B; Wherein:
1) submergence unit rear end cap 2B:
As shown in Figure 5; Rear end cap 2B has central through hole in the submergence unit; Projection objective group 1 is passed from central through hole; On outside seven concentric circless of the central through hole of submergence unit rear end cap 2B, have the fluid injection groove 6B of four five equilibriums respectively successively, two liquid recovery 7A, two gas recovery groove 7B, two interior sealed gas-filling groove 8B, two interior sealing gas accumulator tank 9B, two external seal gas recovery groove 10B and two external seal gas injection groove 11B;
Four fluid injection groove 6B, two liquid recovery 7A, two gas recovery groove 7B, two interior sealed gas-filling groove 8B, two interior sealing gas accumulator tank 9B, two external seal gas recovery groove 10B and two external seal gas injection groove 11B duct through separately respectively are connected with exterior line; The inside at submergence unit rear end cap 2B is opened in the duct; Do not intersect mutually between the duct; The side at submergence unit rear end cap 2B is all opened in the outlet in duct; Duct groove inside and separately communicates, and outwards is connected with exterior line through the mode that is threaded, and the duct has the function that connects submergence unit rear end cap 2B interior groove and exterior line.Exterior line comprises liquid injecting tube road, liquids recovery pipeline, gas injection tube road, gas recovery pipeline, and liquid injection and recovery, the gas of accomplishing the submergence unit respectively inject and the recovery function.
2) submergence unit front end end cover 2A:
Like Fig. 2, Fig. 3, shown in Figure 4; Front end end cover 2A has central through hole in the submergence unit; Projection objective group 1 is passed from central through hole; The central through hole of submergence unit front end end cover 2A outwards is nested with five ring-shaped continuous cylindrical cavities separately successively; Five ring-type cylindrical cavities outwards are followed successively by and reclaim vestibule, internal layer gas injection pressure cushion chamber 8A, internal layer gas recovery chamber 9A, outer gas recovery chamber 10A and outer gas injection pressure cushion chamber 11A; On the end face annulus of the submergence unit front end end cover 2A between front end end cover central through hole and the recovery vestibule, having four identical fluid injection chamber 6A that the center symmetry is uniformly distributed with, all have the liquid injection hole array 6C that along the circumferential direction arranges in four fluid injection chamber 6A, reclaim on the vestibule inner bottom surface and have recovery holes array 7; Have the internal layer injecting hole array 8C that along the circumferential direction arranges in the internal layer gas injection pressure cushion chamber 8A; Have the outer injecting hole array 11C that along the circumferential direction arranges in the outer gas injection pressure cushion chamber 11A, all have 12 grooves that the center symmetry is uniformly distributed with in internal layer gas recovery chamber 9A and the outer gas recovery chamber 10A, recovery holes array 7 is made up of the micropore that evenly gathers; Front end end cover 2A upper end in described submergence unit is planar annular with the faying face of rear end cap 2B lower end, submergence unit, and is fastenedly connected through screw;
3) gas-liquid separation sheet group 4:
As shown in Figure 6, be stacked together by the gas-liquid separation sheet of seven annulars and form gas-liquid separation sheet group 4; Seven gas-liquid separation sheets are followed successively by the first gas-liquid separation sheet 4A, the second gas-liquid separation sheet 4B, the 3rd gas-liquid separation sheet 4C, the 4th gas-liquid separation sheet 4D, the 5th gas-liquid separation sheet 4E, the 6th gas-liquid separation sheet 4F and the 7th gas-liquid separation sheet 4G from top to bottom; The outside of seven gas-liquid separation sheets is close to the lateral wall that reclaims vestibule; Have the micropore that correspondence communicates and evenly gather on seven gas-liquid separation sheets; These micropores are stacked together and form and the perpendicular microtubule road of submergence cell operation face; The inboard that is positioned at six following gas-liquid separation sheets in seven gas-liquid separation sheets has the inclined-plane towards submergence unit rear end cap 2B continuously; Seven gas-liquid separation sheets are positioned at a nethermost gas-liquid separation sheet and contact with the recovery vestibule inner bottom surface of front end end cover 2A; The micropore that has on seven gas-liquid separation sheets and corresponding the communicating of micropore of recovery holes array 7, the multiple tracks microtubule road that is formed by micropore on seven gas-liquid separation sheets communicates with gas recovery groove 7B;
4) liquids recovery sheet group 5:
Be stacked together by the liquids recovery sheet of seven annulars and form liquids recovery sheet group 5; Seven liquids recovery sheets are followed successively by the first liquids recovery sheet 5A, the second liquids recovery sheet 5B, the 3rd liquids recovery sheet 5C, the 4th liquids recovery sheet 5D, the 5th liquids recovery sheet 5E, the 6th liquids recovery sheet 5F and the 7th liquids recovery sheet 5G from top to bottom; The inboard of seven liquids recovery sheets is close to the madial wall that reclaims vestibule; Have the micropore that correspondence communicates and evenly gather on seven liquids recovery sheets; These micropores are stacked together and form and the perpendicular microtubule road of submergence cell operation face; The outside that seven liquids recovery sheets are positioned at nethermost two liquids recovery sheets has the inclined-plane towards silicon chip 3 continuously; Seven liquids recovery sheets are positioned at a nethermost liquids recovery sheet and contact with the recovery vestibule inner bottom surface of front end end cover 2A, the micropore that has on seven liquids recovery sheets and corresponding the communicating of micropore of recovery holes array 7, and the multiple tracks microtubule road that is formed by micropore on seven liquids recovery sheets communicates with liquid recovery 7A.
Described four fluid injection groove 6B communicate with separately fluid injection chamber 6A respectively; Two interior sealed gas-filling groove 8B all communicate with internal layer gas injection pressure cushion chamber 8A; Two interior sealing gas accumulator tank 9B all communicate with internal layer gas recovery chamber 9A; External seal gas recovery groove 10B all communicates with outer gas recovery chamber 10A, and two external seal gas injection groove 11B all communicate with outer gas injection pressure cushion chamber 11A.
Like Fig. 3, shown in Figure 4, described liquid injection hole array 6C, internal layer injecting hole array 8C and outer injecting hole array 11C form by the micropore of along the circumferential direction arranging.
Fig. 1 has provided the working position of the utility model device in immersion lithographic system, and this device can be used in distribution repetition or step-scan lithographic equipment.In exposure process; The light (for example ArF PRK) that sends from light source passes through mask plate, projection objective group 1 of aiming at and the gap flow field 12 that is formed by the immersion liquid filling; Be radiated on the photoresist of silicon chip 3; It is carried out exposure-processed, the figure on the mask is transferred to accurately on the photoresist of silicon chip.Submergence unit rear end cap 2B fixes with clamping device, and clamping device can be regulated the height and the attitude of submergence unit, between submergence unit front end end cover 2A, submergence unit rear end cap 2B two parts faying face be planar annular, connected mode is a screw-driving.
As shown in Figure 2 is the blast cross section view of this device, and gas-liquid separation sheet group 4 is to be formed by stacking the thin slice that has the multiple tracks micropore with liquids recovery sheet group 5, and micropore aligns separately and forms the microtubule road.Wherein gas-liquid separation sheet group 4 is characteristics of the utility model; Thin slice and thin slice that does not have the inclined-plane of topmost of being had the inclined-plane by following six inboards are superimposed; The 7th gas-liquid separation sheet 5G contacts with submergence unit front end end cover 2A; The first gas-liquid separation sheet 5A contacts with submergence unit rear end cap 2B, and micropore aligns separately, thereby forms multiple tracks and the perpendicular fine pipeline of submergence cell operation face.4 following six the gas-liquid separation sector-meetings of gas-liquid separation sheet group form the inclined-plane towards submergence unit rear end cap 2B in the inboard; The level and smooth reduction in inclined-plane from outside to inside; Thereby guarantee that liquid level all can flow to the bottom at liquids recovery position along the inclined-plane at which direction rising liquid, realizes the continuous recovery of liquid.The 6th liquids recovery sheet 4F of liquids recovery sheet group and the outside of the 7th liquids recovery sheet 4G also are the inclined-planes that has porous, and are connected with the micropore of top liquids recovery sheet, form the liquids recovery pipeline perpendicular to submergence cell operation face.
Like Fig. 2, Fig. 3, Fig. 4, Fig. 5, Fig. 7, Fig. 8, shown in Figure 9, the submergence unit is made up of submergence unit front end end cover 2A, submergence unit rear end cap 2B, gas-liquid separation sheet group 4 and liquids recovery sheet group 5 four parts.Fluid injection groove 6B on the submergence unit rear end cap 2B is connected with the liquid injecting tube road through inner duct; Immersion liquid injects fluid injection groove 6B by the liquid injecting tube road; Pass through liquid fluid injection chamber 6A and liquid injection hole array 6C on the submergence unit front end end cover 2A on the way, liquid gets into and is full of the gap flow field 12 between lens combination 1 and the silicon chip 3, in liquid continuous continuous injection process; Liquid can flow around gap flow field, therefore need reclaim immersion liquid.Recovery holes array 7 on the submergence unit front end end cover 2A is between the gentle hermetically-sealed construction of fluid injection structure; The multiple tracks round that recovery holes array 7 is made up of micropore; Major function is to accomplish the recovery of liquids and gases; Immersion liquid upwards gets into liquids recovery sheet group 5, the seven liquids recovery sheet 5G outside through recovery holes array 7 and has the inclined-plane, and the planar section that does not have the inclined-plane contacts with the upper surface of recovery holes array 7; The micropore composition reclaim line of aliging separately, the immersion liquid in the continuous recovery gap flow field.Also have identical micropore on the 7th liquids recovery sheet 5G inclined-plane; And form reclaim line with top six liquids recovery sheets; Be used for reclaiming the liquid that flows down from gas-liquid separation sheet group 4, the 6th liquids recovery sheet 5F outside also has the inclined-plane, and the planar section of the 6th liquids recovery sheet 5F bottom contacts with the upper surface of the 7th liquids recovery sheet 5G; Be used for reclaiming the liquid of the 7th liquids recovery sheet 5G micropore; The 6th liquids recovery sheet 5F chamfered portion also has micropore, and forms reclaim line with five top liquids recovery sheets, is used for reclaiming the liquid that flows down from the inclined-plane of gas-liquid separation sheet group 4.First liquids recovery sheet 5A of liquids recovery sheet group 5 and submergence unit rear end cap 2B, submergence unit front end end cover 2A form the liquids recovery cavity; Submergence unit rear end cap 2B has two liquid recovery 7B in inside cavity; The inner duct of rear end cap 2B is connected with the outside liquid reclaim line liquid recovery 7B in the submergence unit through opening; Add that on the liquids recovery pipeline negative pressure just can be drawn into liquid recovery 7B from the bottom of liquids recovery sheet group 5 with liquid; Discharge the submergence unit through duct, liquids recovery pipeline, thereby accomplish the injection and the removal process of immersion liquid.
As shown in Figure 8, the hermetic seal structure of submergence unit is made up of two seals.The high speed priming meeting of silicon chip produces action of traction to liquid, thereby possibly cause the leakage of liquid, influences the operate as normal of etching system.Therefore add on the exterior periphery of gap flow field that the hermetic seal structure stops the leakage of liquid.Get into interior sealed gas-filling groove 8B, external seal gas injection groove 11B from the gases at high pressure in the source of the gas pipeline through gas injection pipeline and the inner duct of submergence unit rear end cap 2B; Get into internal layer gas injection pressure cushion chamber 8A, outer gas injection pressure cushion chamber 11A then respectively; The gas injection pressure cushion chamber is when suppressing the source of the gas pulsation; Can balanced in a circumferential direction high pressure gas field pressure, make internal layer injecting hole array 8C, outer injecting hole array 11C obtain more consistent initial gas injection pressure.The gas that from internal layer injecting hole array 8C, outer injecting hole array 11C, blows out can get into the internal layer gas injection pressure cushion chamber 8A of opposite side, outer gas injection pressure cushion chamber 11A; Thereby guarantee before contacting, to form air curtain, realize the circumferential seal of liquid with immersion liquid.The recovery of sealing gas then is through internal layer gas recovery chamber 9A, outer gas recovery chamber 10A; Get into interior sealing gas accumulator tank 9B, the external seal gas recovery groove 11B of submergence unit rear end cap 2B; Interior sealing gas accumulator tank 9B and external seal gas recovery groove 11B are connected with the extraneous gas reclaim line through the inner duct of submergence unit rear end cap 2B; On the gas recovery pipeline, add negative pressure, just can accomplish the recovery of sealing gas.
Like Fig. 2, Fig. 3, Fig. 4, Fig. 6, Fig. 7, Fig. 8, shown in Figure 9, when silicon chip 3 in the high-velocity scanning process, because silicon chip can produce action of traction to immersion liquid; Gap flow field 12 can a wall pressure uprise; One wall pressure step-down, the thing followed are that a side liquid increases in the submergence unit, and a side liquid reduces; Promptly a side liquid level raises, and the opposite side liquid level reduces.Liquid increases a side and will occur leaking as not strengthening yield, and liquid reduces by a side will make this side liquid still less as not reducing yield, even sucks air.Gas-liquid separation sheet group 4 is designed to distributed continuous inclined-plane along the circumferential direction, and the inclined-plane is rear end cap 2B towards the submergence unit, and promptly bevel altitude reduces from outside to inside successively.The fine pipeline of multiple tracks ring-type that the gas-liquid separation pipeline is made up of microtubule, gas-liquid separation pipeline are formed by stacking through seven gas-liquid separation sheets that have micropore perpendicular to submergence cell operation face.If the liquid level that raises exceeds the inclined-plane of gas-liquid separation sheet group 4, liquid flows to the bottom of liquids recovery sheet group 5 on inclined-plane, action of gravity lower edge.The 7th liquids recovery sheet 5G and the 6th liquids recovery sheet 5F outside has the inclined-plane in the liquids recovery sheet group 5, is convenient to liquid and can flows to liquids recovery pipeline bottom, reclaimed by liquids recovery sheet group 5, thus the independent recovery of realization immersion liquid.And at the low position of opposite side liquid level, liquid level does not exceed the inclined-plane, and immersion liquid just can not stay the inclined-plane and be recovered, thereby has stoped immersion liquid to continue to be recovered.Because ramp structure is a circle distribution; No matter silicon chip can both be realized above-mentioned functions toward which direction motion, makes this structure have the function of automatic adjusting liquid level, guarantees all to be flooded by immersion liquid bottom the liquids recovery pipeline; Thereby liquid is reclaimed and non-involvement gas separately.In the cavity that inclined-plane, liquids recovery sheet group 5 and the submergence unit rear end cap 2B of gas-liquid separation sheet group 4 form, add negative pressure simultaneously; Promptly on gas recovery groove 7B, add negative pressure; Make the gas in the immersion liquid separate through the micropore on the inclined-plane; Isolated gas is discharged from through gas recovery groove 7B and extraneous gas reclaim line, thereby the gas of having realized recovery section reclaims separately.This kind structure is separated the pipeline of back through separately with liquids and gases and is reclaimed separately, thus the biphase gas and liquid flow that forms when having avoided immersion liquid to reclaim with sealing gas, thus fluctuate in pipeline vibration and the flow field having avoided causing because of biphase gas and liquid flow.
Above-mentioned embodiment is used for the utility model of explaining; Rather than the utility model limited; In the protection domain of the spirit of the utility model and claim,, all fall into the protection domain of the utility model to any modification and the change that the utility model is made.
Claims (3)
1. a hermetic seal and gas-liquid separating and reclaiming device that is used for immersed photoetching machine, the hermetic seal and the gas-liquid separating and reclaiming device that are equipped with between projection objective group (1) in immersed photoetching machine and the silicon chip (3); It is characterized in that: said hermetic seal and gas-liquid separating and reclaiming device comprise sealing and fluid injection retracting device (2), gas-liquid separation sheet group (4) and liquids recovery sheet group (5); Sealing and fluid injection retracting device (2) are made up of submergence unit front end end cover (2A) and submergence unit rear end cap (2B); Wherein:
1) submergence unit rear end cap (2B):
Rear end cap (2B) has central through hole in the submergence unit; On outside seven concentric circless of the central through hole of submergence unit rear end cap (2B), have the fluid injection groove (6B) of four five equilibriums respectively successively, two liquid recovery (7A), two gas recovery grooves (7B), two interior sealed gas-filling grooves (8B), two interior sealing gas accumulator tanks (9B), two external seal gas recovery grooves (10B) and two external seal gas injection grooves (11B);
2) submergence unit front end end cover (2A):
Front end end cover (2A) has central through hole in the submergence unit; The central through hole of submergence unit front end end cover (2A) outwards is nested with five ring-shaped continuous cylindrical cavities separately successively; Five ring-type cylindrical cavities outwards are followed successively by and reclaim vestibule, internal layer gas injection pressure cushion chamber (8A), internal layer gas recovery chamber (9A), outer gas recovery chamber (10A) and outer gas injection pressure cushion chamber (11A); On the end face annulus of the submergence unit front end end cover (2A) between front end end cover central through hole and the recovery vestibule, having four identical fluid injection chambeies (6A) that the center symmetry is uniformly distributed with; All have the liquid injection hole array of along the circumferential direction arranging (6C) in four fluid injection chambeies (6A); Reclaim on the vestibule inner bottom surface and have recovery holes array (7); Have the internal layer injecting hole array of along the circumferential direction arranging (8C) in the internal layer gas injection pressure cushion chamber (8A); Have the outer injecting hole array of along the circumferential direction arranging (11C) in the outer gas injection pressure cushion chamber (11A), all have 12 grooves that the center symmetry is uniformly distributed with in internal layer gas recovery chamber (9A) and the outer gas recovery chamber (10A), recovery holes array (7) is made up of the micropore that evenly gathers;
Described submergence unit front end end cover (2A) upper end is the plane with the faying face of lower end, submergence unit rear end cap (2B), and is fastenedly connected through screw;
3) gas-liquid separation sheet group (4):
Be stacked together by the gas-liquid separation sheet of seven annulars and form gas-liquid separation sheet group (4); The outside of seven gas-liquid separation sheets is close to the lateral wall that reclaims vestibule; Have the micropore that correspondence communicates and evenly gather on seven gas-liquid separation sheets; The inboard that is positioned at six following gas-liquid separation sheets in seven gas-liquid separation sheets has the inclined-plane of the rear end cap (2B) towards the submergence unit continuously; Seven gas-liquid separation sheets are positioned at a nethermost gas-liquid separation sheet and contact with the recovery vestibule inner bottom surface of front end end cover (2A); The micropore that has on seven gas-liquid separation sheets and corresponding the communicating of micropore of recovery holes array (7), the multiple tracks microtubule road that is formed by micropore on seven gas-liquid separation sheets communicates with gas recovery groove (7B);
4) liquids recovery sheet group (5):
Be stacked together by the liquids recovery sheet of seven annulars and form liquids recovery sheet group (5); The inboard of seven liquids recovery sheets is close to the madial wall that reclaims vestibule; Have the micropore that correspondence communicates and evenly gather on seven liquids recovery sheets; The outside that seven liquids recovery sheets are positioned at nethermost two liquids recovery sheets has the inclined-plane towards silicon chip (3); Seven liquids recovery sheets are positioned at a nethermost liquids recovery sheet and contact with the recovery vestibule inner bottom surface of front end end cover (2A); The micropore that has on seven liquids recovery sheets and corresponding the communicating of micropore of recovery holes array (7), the multiple tracks microtubule road that is formed by micropore on seven liquids recovery sheets communicates with liquid recovery (7A).
2. a kind of hermetic seal and gas-liquid separating and reclaiming device that is used for immersed photoetching machine according to claim 1; It is characterized in that: described four fluid injection grooves (6B) communicate with separately fluid injection chamber (6A) respectively; Two interior sealed gas-filling grooves (8B) all communicate with internal layer gas injection pressure cushion chamber (8A); Two interior sealing gas accumulator tanks (9B) all communicate with internal layer gas recovery chamber (9A); External seal gas recovery groove (10B) all communicates with outer gas recovery chamber (10A), and two external seal gas injection grooves (11B) all communicate with outer gas injection pressure cushion chamber (11A).
3. a kind of hermetic seal and gas-liquid separating and reclaiming device that is used for immersed photoetching machine according to claim 1 is characterized in that: described liquid injection hole array (6C), internal layer injecting hole array (8C) and outer injecting hole array (11C) are formed by the micropore of along the circumferential direction arranging.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220249142 CN202615114U (en) | 2012-05-30 | 2012-05-30 | Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220249142 CN202615114U (en) | 2012-05-30 | 2012-05-30 | Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202615114U true CN202615114U (en) | 2012-12-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220249142 Withdrawn - After Issue CN202615114U (en) | 2012-05-30 | 2012-05-30 | Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine |
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| Country | Link |
|---|---|
| CN (1) | CN202615114U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102707580A (en) * | 2012-05-30 | 2012-10-03 | 浙江大学 | Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine |
| CN103465258A (en) * | 2013-09-13 | 2013-12-25 | 浙江大学 | Three-degree-of-freedom precision adjustment device based on flexible hinges |
| CN105045046A (en) * | 2015-08-03 | 2015-11-11 | 浙江大学 | Air-tight sealing and horizontal and vertical liquid injection and recovery device for immersion lithography machine |
| CN107991843A (en) * | 2017-12-21 | 2018-05-04 | 浙江启尔机电技术有限公司 | A kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine |
-
2012
- 2012-05-30 CN CN 201220249142 patent/CN202615114U/en not_active Withdrawn - After Issue
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102707580A (en) * | 2012-05-30 | 2012-10-03 | 浙江大学 | Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine |
| CN103465258A (en) * | 2013-09-13 | 2013-12-25 | 浙江大学 | Three-degree-of-freedom precision adjustment device based on flexible hinges |
| CN103465258B (en) * | 2013-09-13 | 2015-08-26 | 浙江大学 | A kind of Three-degree-of-freeprecision precision adjustment device based on flexible hinge |
| CN105045046A (en) * | 2015-08-03 | 2015-11-11 | 浙江大学 | Air-tight sealing and horizontal and vertical liquid injection and recovery device for immersion lithography machine |
| CN105045046B (en) * | 2015-08-03 | 2017-03-29 | 浙江大学 | A kind of hermetic seal and horizontal and vertical fluid injection retracting device for immersed photoetching machine |
| CN107991843A (en) * | 2017-12-21 | 2018-05-04 | 浙江启尔机电技术有限公司 | A kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine |
| CN107991843B (en) * | 2017-12-21 | 2023-07-21 | 浙江启尔机电技术有限公司 | Micro-channel gas-liquid separation and recovery device for immersion lithography machine |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20121219 Effective date of abandoning: 20140129 |
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| RGAV | Abandon patent right to avoid regrant |