CN107991843A - A kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine - Google Patents
A kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine Download PDFInfo
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- CN107991843A CN107991843A CN201711395115.5A CN201711395115A CN107991843A CN 107991843 A CN107991843 A CN 107991843A CN 201711395115 A CN201711395115 A CN 201711395115A CN 107991843 A CN107991843 A CN 107991843A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
- B01D45/02—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising gravity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
- B01D45/12—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by centrifugal forces
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- Chemical Kinetics & Catalysis (AREA)
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine.Reservoir channel, immersion flow field, liquids recovery module, gas-liquid recycling module and sealing gas supplying module are arranged in the submergence unit of immersed photoetching machine between submergence unit upper cover plate and submergence unit lower cover in the present invention, and projection lens set bottom camera lens is touched with fluid in immersion flow field in the middle part of submergence unit.Gap flow field is arranged between silicon chip substrate upper surface and submergence unit bottom surface.The present invention is while ensureing that effective flow field sealing maintains, and by the way that gas-liquid separation, subchannel are recycled, reduces the recycling runner caused by gas-liquid two-phase mixing recycling and conveying pipe vibration and its impact to gap flow field, improves the quality of silicon chip scan exposure.Effectively maintain the operating temperature field in exposure process constant.Immersion flow field recycling area is increased, with realizing stability and high efficiency fluid injection is recycled, and on the premise of exposure quality is ensured, improves the sweep speed of litho machine.
Description
Technical field
The invention belongs to fluid channel gas-liquid two-phase separating and reclaiming device technical field, is related to one kind and is used for immersed photoetching machine
Fluid channel gas-liquid separation retracting device.
Background technology
Litho machine is one of the Core equipment for manufacturing super large-scale integration, modern lithographic machine based on optical lithography,
It accurately projects the figure on mask plate using optical system and is exposed on the silicon chip of coating photoresist.It includes one
Laser light source, an optical system, one piece of projection mask being made of graphics chip, one light is scribbled to Barebone and one
The silicon chip of quick photoresist.
Relative to the dry lithography machine that intermediate medium is gas, immersion lithographic apparatus passes through in last a piece of projection objective
The liquid of certain high index of refraction is filled between silicon chip, projection objective is improved by improving the refractive index (n) of the gap medium
Numerical aperture (NA), so as to improve the resolution ratio and depth of focus of lithographic equipment.In the Next Generation Lithographies machine having pointed out, submergence
Formula photoetching changes minimum to existing equipment, has good inheritance to present dry lithography machine, so receiving significant attention.
Filling for immersion liquid, at present frequently with scheme be local immersion method, i.e., liquid is limited in above silicon chip and last
In regional area between the lower surface of a piece of projection objective.Keep optical homogeneity of the immersion liquid in exposure area and thoroughly
Lightness, is the basis for ensureing liquid immersion lithography exposure quality.For this reason, realize the real-time of immersion flow field often through fluid injection and recycling
Renewal, takes away exposure area, to ensure the height of immersion liquid in time by photochemical pollutant, amount of localized heat, micro-nano bubble etc.
It is pure homogeneous.
Meanwhile effectively to maintain to control immersion flow field border in the gap, existing apparatus often uses meniscus control+gas
The technical solution of body sealing.I.e. on the periphery around gap flow field, annular gas is formed by applying high pressure sealing gas
Curtain, liquid filling body is limited in certain circle or diamond shape flow field regions.But recycling runner is between immersion flow field and the external world
Between gas (high pressure gas that the atmosphere gas or gas sealing mechanism flowed naturally produces), using negative pressure recycling immersion liquid
During, biphase gas and liquid flow will inevitably be formed by recycling in runner.Biphase gas and liquid flow is easily unstable, especially for guarantor
The high pressure sealing air-flow demonstrate,proved effective collect of immersion liquid and applied, it will rapids of the aggravation two phase flow in recycling runner and pipeline
It is dynamic, and it is flowed with phase transition process with the generation of bubble with crumbling and fall.This will all cause the generation of vibration, impact projection
Gap flow field between above the end component and substrate of object lens；And in immersion lithographic system, two-phase flow is induced
Pipeline vibration intensity is big, amplitude versus frequency characte is complicated, it is difficult to which it is thoroughly isolated with complete machine, it will seriously affect exposure quality.
In current recovery structure, the general side for recycling or recycling runner bottom installation rule porous plate using microwell array
Gas-liquid two-phase is mixed recycling (for example, see Chinese patent 200810121872.8 and United States Patent (USP) US 8446563B2) by formula.This
Although kind of a mode can play the role of gas liquid two-phase flow rectification and mixed uniformly, triggered to suppressing gas-liquid two-phase
Effect of vibration it is limited.And gas-liquid flow-rate ratio difference will cause the significant changes of two phase flow signals, add recovery difficult, institute
The pipeline vibration of initiation is more complicated various, it is difficult to is eliminated by vibration isolation.Moreover, someone is (for example, see Chinese patent
200510093924.1) gas-liquid separation chamber or separation branch pipe are set by the recovery pipe outside submergence unit, will recycled
Gas-fluid two-phase mixture separation and recovery afterwards utilizes.But the gas-liquid separation positional distance biphase gas and liquid flow of this method forms source
Head is remote, and effective inhibitory action is played in the vibration that can not be triggered to the gas liquid two-phase flow in recycling runner.In recent years,
NIKON companies improve recycling flow passage structure (for example, see United States Patent (USP) US 2012/0257179A1 and US 8634055B2),
Firsts and seconds reclaiming chamber and multiple-limb recycling runner are designed, it is using porous member that each reclaiming chamber is disconnected from each other, pass through control
Whether gas phase and liquid phase processed realize the subchannel recycling of gas and liquid by corresponding porous member.Although the method can be by absolutely
Most of gas-fluid two-phase mixture separates and effectively reduces vibration, but in the continuous scanning process of silicon chip, it is difficult to ensure dynamic
The stability control of meniscus, and this implementation is larger for submergence control unit change, using single porous member,
Cause its complicated, manufacture and difficulty of processing are larger, it is difficult to maintain to realize in device in the immersion liquid of small size so complicated
Runner design, so as to limit the feasibility of the program in practical applications.
The content of the invention
It is an object of the invention to provide a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine.
The present invention includes silicon chip substrate, reservoir channel, immersion flow field, gap flow field, liquids recovery module, gas-liquid recycling mould
Block and sealing gas supplying module.Reservoir channel, immersion flow field, liquids recovery module, gas-liquid recycling module and the sealing
Gas supplying module is arranged in the submergence unit of immersed photoetching machine between submergence unit upper cover plate and submergence unit lower cover,
Projection lens set bottom camera lens is in contact with fluid in immersion flow field in the middle part of submergence unit.Gap flow field is arranged in silicon chip substrate
Between surface and submergence unit bottom surface.Liquids recovery module includes recycling round, liquids recovery cushion chamber, liquids recovery runner
With level liquid vacuum recovery system；Gas-liquid recycling module includes gas-liquid recycling runner, liquids recovery chamber, gas reclaiming chamber, multiple
Close porous media, secondary liquid vacuum recovery system and gas vacuum recovery system；Sealing gas supplying module includes blanket gas
Reason system is supplied at body injection chamber, sealing gas cushion chamber, hermetic seal round and sealing gas.
The submergence unit is generally cylindrical, its center of circle is immersion flow field；Using immersion flow field as the center of circle from inside to outside
Recycling round, the composite porous media of gas-liquid recycling module and the gas of sealing gas supplying module of liquids recovery module is distributed with
Seal round；There is difference in height in the composite porous media bottom surface of gas-liquid recycling module with submergence unit lower cover bottom surface, as gas-liquid
The gas-liquid recycling runner of recycling module.Gas-liquid recycling runner filled with composite porous media is positioned at recycling round and hermetic seal row
Between hole；Immersion flow field is arranged in the middle part of submergence unit, is up big and down small circular platform type flow field, is provided with along immersion flow field side
Circular ring shape reservoir channel, for the immersion liquid that immersion liquid processing system supplies continuously to be noted through outer connecting pipe road from reservoir channel
Enter to form immersion flow field.Had the gap between immersion flow field and silicon chip substrate, the immersion liquid in immersion flow field flows into the slit-shaped
Into gap flow field.
Liquids recovery module, gas-liquid recycling module and the sealing gas supplying module is to be set perpendicular to silicon chip substrate
The annulus column put.Liquids recovery module bottom is recycling round, and recycling round is touched with immersion liquid in gap flow field；Recycling row
It is liquids recovery cushion chamber above hole, is liquids recovery runner above liquids recovery cushion chamber；Liquids recovery runner and level-one liquid
Body vacuum recovery system is connected by hose.
Runner, the edge submergence of gas-liquid recycling runner and gap flow field are recycled for gas-liquid in the gas-liquid recycling module bottom
Liquid touches；It is composite porous media above gas-liquid recycling runner, composite porous media is divided into middle internal layer porous media recycling
Circle, and two outer layer porous media recycling circles for being separately positioned on internal layer porous media recycling circle inner and outer ring；Internal layer porous media
The cavity that recycling circle is formed with submergence unit upper cover plate is as liquids recovery chamber；Two outer layer porous media recycling circles and submergence are single
Two cavitys of first upper cover plate or submergence unit lower cover composition are as two gas reclaiming chambers.Liquids recovery chamber and secondary liquid
Vacuum recovery system is connected by hose, realizes the recycling of immersion liquid；Two gas reclaiming chambers are recycled with gas vacuum
System is connected by hose, realizes the recycling of sealing gas.
Chamber is injected in the sealing gas supplying module bottom for sealing gas, and sealing gas injection chamber is arranged on gap stream
The edge placement of field；It is sealing gas cushion chamber above sealing gas injection chamber, is arranged above sealing gas cushion chamber for hermetic seal
Hole；Hermetic seal round is connected with sealing gas processing feed system by hose.
Single recovery port aperture of the recycling round is 0.5~1mm, and number of rows is 2~8 rows.
The gas-liquid recycling width of flow path is 5~8mm.
The internal layer porous media recycling circle and two outer layer porous media recycling circle upper surface flush；Liquids recovery chamber
It is arranged on the upper top surface of internal layer porous media recycling circle；Two gas reclaiming chambers set two outer layer porous media recycling circles respectively
The two sides not being bonded with internal layer porous media recycling circle.
The outer layer porous media recycling circle of internal layer porous media recycling circle upper surface higher than two；Liquids recovery chamber is set
Put the upper top surface in internal layer porous media recycling circle；Two gas reclaiming chambers set what two outer layer porous media recycling were enclosed respectively
Upper top surface.
The internal layer porous media recycling circle uses the material of surface hydrophilicity；Outer layer porous media recycling circle is surface
Hydrophobic material.
The lower face non-horizontal surface of the outer layer porous media recycling circle, with the horizontal 10~45 ° of angle α.
The thickness of the internal layer porous media recycling circle is more than the thickness of two outer layers recycling circle.
The present invention is being ensured using immersion liquid and sealing gas separating and reclaiming device based on composite porous media filling
While effective flow field sealing maintains, by the way that gas-liquid separation, subchannel are recycled, it can effectively reduce since gas-liquid two-phase mixes back
Caused recycling runner and conveying pipe vibration and its impact to gap flow field are received, substantially reduces the fluctuation of immersion flow field,
So as to improve the quality of silicon chip scan exposure.By by gas-liquid quick separating, subchannel recycle, the present invention can substantially reduce due to
Liquid evaporation cooling harm caused by mixed gas-liquid flow, so as to effectively maintain the operating temperature field in exposure process constant.
Compared to traditional array hole way of recycling, the porous media of micrometer grade hole footpath of the present invention runner significantly increases leaching
Do not have flow field effectively to recycle area, acted on reference to hermetic seal, so that fluid injection is bound by submerging region, prevent it from departing from submergence unit
And occur leakage, it can be achieved that more stability and high efficiency fluid injection recycling, on the premise of exposure quality is ensured, litho machine can be improved
Sweep speed.
Brief description of the drawings
Fig. 1 is the rough schematic view that the present invention is mutually assembled with projection lens set；
Fig. 2 is a kind of using state structure diagram of the present invention；
Fig. 3 is another using state structure diagram of the present invention；
Fig. 4 is the present invention looks up structural representation that unit is submerged in Fig. 1；
Fig. 5 a are the structure diagram of composite porous media in embodiment one；
Fig. 5 b are the structure diagram of composite porous media in embodiment two.
Embodiment
The present invention is described in detail with reference to the accompanying drawings and examples.
As shown in Figure 1, unit 2 is submerged in immersed photoetching machine is located at 1 bottom surface of projection lens set, silicon chip substrate 3 is located at
2 bottom surface of unit is submerged, flow field 6 is had the gap between 3 upper surface of silicon chip substrate and submergence 2 bottom surface of unit.
As shown in Figures 2 and 3, a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine, including silicon chip lining
Bottom 3, reservoir channel 4, immersion flow field 5, gap flow field 6, liquids recovery module, gas-liquid recycling module and sealing gas supply mould
Block.Reservoir channel 4, immersion flow field 5, liquids recovery module, gas-liquid recycling module and sealing gas supplying module are arranged on submergence
In the submergence unit 2 of formula litho machine between submergence unit upper cover plate 2A and submergence unit lower cover 2B, 1 bottom mirror of projection lens set
Head is touched with fluid in immersion flow field 5 in the middle part of submergence unit.Gap flow field 6 is arranged on 3 upper surface of silicon chip substrate and submergence unit 2
Between bottom surface.
Liquids recovery module includes recycling round 7A, liquids recovery cushion chamber 7B, liquids recovery runner 7C and level liquid
Vacuum recovery system V1；Gas-liquid recycling module includes gas-liquid recycling runner 8A, liquids recovery chamber 8B, gas reclaiming chamber 8C, compound
Porous media 9, secondary liquid vacuum recovery system V2 and gas vacuum recovery system V3；Sealing gas supplying module includes sealing
Gas injection chamber 10A, sealing gas cushion chamber 10B, hermetic seal round 10C and sealing gas processing feed system 12.
As shown in figure 4, submergence unit 2 is generally cylindrical, its center of circle is immersion flow field 5；With immersion flow field 5 for the center of circle by
Recycle round 7A, the composite porous media 9 of gas-liquid recycling module and sealing gas interior and that liquids recovery module is distributed with outside supply
Hermetic seal round 10C to module；9 bottom surface of composite porous media of gas-liquid recycling module has with submergence unit lower cover 2B bottom surfaces
Difference in height, the gas-liquid recycling runner 8A as gas-liquid recycling module.Gas-liquid recycling runner 8A filled with composite porous media 9
Between round 7A and hermetic seal round 10C is recycled；Wherein, the single recovery port aperture for recycling round 7A is 0.5~1mm, number of rows
For 2~8 rows, gas-liquid recycling runner 8A width is 5~8mm.
Immersion flow field 5 is arranged on 2 middle part of submergence unit, is up big and down small circular platform type flow field, is set along 5 side of immersion flow field
Be equipped with circular ring shape reservoir channel 4, for by the immersion liquid that immersion liquid processing system 11 supplies through outer connecting pipe road from reservoir channel 4
It is continuously injected into form immersion flow field 5.Had the gap between immersion flow field 5 and silicon chip substrate 3, the immersion liquid in immersion flow field 5
Flow into the gap and form gap flow field 6.
Liquids recovery module, gas-liquid recycling module and sealing gas supplying module are to be set perpendicular to silicon chip substrate 3
Annulus column.Liquids recovery module bottom is recycling round 7A, and recycling round 7A is touched with immersion liquid in gap flow field 6；Recycling
It is liquids recovery cushion chamber 7B above round 7A, is liquids recovery runner 7C above liquids recovery cushion chamber 7B；Liquids recovery stream
Road 7C is connected with level liquid vacuum recovery system V1 by hose, achievees the purpose that to recycle immersion liquid.
Runner 8A is recycled in gas-liquid recycling module bottom for gas-liquid, and gas-liquid recycling runner 8A and the edge of gap flow field 6 submerge
Liquid touches；It is composite porous media 9 above gas-liquid recycling runner 8A, composite porous media 9 divides for middle internal layer porous media
Recycling circle 9A, and two outer layer porous media recycling circle 9B for being separately positioned on internal layer porous media recycling circle 9A inner and outer rings；It is interior
Layer porous media recycling circle 9A is with submerging the cavity of unit upper cover plate 2A compositions as liquids recovery chamber 8B；Two porous Jie of outer layer
Matter recycling circle 9B is recycled with submerging two cavitys of unit upper cover plate 2A or submergence unit lower cover 2B compositions as two gases
Chamber 8C.Liquids recovery chamber 8B is connected with secondary liquid vacuum recovery system V2 by hose, realizes the recycling of immersion liquid；Two
Gas reclaiming chamber 8C is connected with gas vacuum recovery system V3 by hose, realizes the recycling of sealing gas.
Along gas flow direction, chamber 10A, sealing gas injection chamber are injected in sealing gas supplying module bottom for sealing gas
10A is arranged on the edge placement of gap flow field 6；It is sealing gas cushion chamber 10B above sealing gas injection chamber 10A, blanket gas
It is hermetic seal round 10C above body cushion chamber 10B；Hermetic seal round 10C passes through hose with sealing gas processing feed system 12
Connection, realizes the input of sealing gas.
Gas-liquid recycling module has two kinds of implementation patterns：
Embodiment one, is composite porous media 9 above gas-liquid recycling runner 8A, composite porous media 9 divides as shown in Figure 5 a
Recycled for middle internal layer porous media and enclose 9A, and two outer layers for being separately positioned on internal layer porous media recycling circle 9A inner and outer rings are more
Hole dielectric film filter circle 9B；9A and two outer layer porous media recycling circle 9B upper surface flush is enclosed in the recycling of internal layer porous media；Liquid
Reclaiming chamber 8B is arranged on the upper top surface of internal layer porous media recycling circle 9A；Two gas reclaiming chamber 8C set two outer layers more respectively
Hole dielectric film filter circle 9B does not recycle the two sides that circle 9A is bonded with internal layer porous media.Two gas reclaiming chamber 8C and gas vacuum
Recovery system V3 is connected, and it is identical that the side that circle 9A is bonded therewith is highly recycled with internal layer porous media.
Embodiment two, is composite porous media 9 above gas-liquid recycling runner 8A, composite porous media 9 divides as shown in Figure 5 b
Recycled for middle internal layer porous media and enclose 9A, and two outer layers for being separately positioned on internal layer porous media recycling circle 9A inner and outer rings are more
Hole dielectric film filter circle 9B；The outer layer porous media recycling circle 9B of internal layer porous media recycling circle 9A upper surfaces higher than two；Liquid returns
Receive the upper top surface that chamber 8B is arranged on internal layer porous media recycling circle 9A；Two gas reclaiming chamber 8C set two outer layers porous respectively
The upper top surface of dielectric film filter circle 9B.
In above two designing scheme, circle 9A, porous Jie of outer layer in structure design are recycled compared to internal layer porous media
The lower face non-horizontal surface of matter recycling circle 9B, but be 10~45 ° with the horizontal an angle α, scope, this design is beneficial to
Gas by being preferentially absorbed into this outer layer porous media to suppress liquid to a certain extent.Internal layer porous media recycling circle 9A is used
The material (permeable medium) of surface hydrophilicity, the i.e. static contact angle with immersion liquid are less than 40 °.Internal layer porous media recycling circle
9A material surfaces can reach required hydrophily effect by hydrophilic coating processing, its characteristic having is：Inside it
Aperture is smaller, and average pore size scope is between 1 μm to 90 μm and much smaller than recycling channel size；Material porosity is higher, and greatly
In 50%；Internal layer porous media recycling circle 9A material therefors are using porous metals, cellular glass, porous plastics, porous ceramics, sea
Continuous shape material has the stratified material in chemical etching hole etc..Outer layer porous media recycling circle 9B uses the material of surface hydrophobic
Expect (hydrophobic medium), be more than 90 ° with the static contact angle of immersion liquid.Circle 9A is recycled compared to internal layer porous media, outer layer is more
Hole dielectric film filter circle 9B has following feature：Internal aperture is larger, but maximum diameter of hole should be less than 150 μm, and less than recycling
Channel size；Porosity is less than internal layer porous media, and less than 40%.
The thickness t1 of internal layer porous media recycling circle 9A is more than the thickness t2 of two outer layers recycling circle 9B, and this three layers recycling circle
Between contacted using physical impact, under suitable conditions, gas and liquid can be between two different porous media contact surfaces freely
Flowing, the medium inhomogeneities of contact surface can be ignored for the inhibition that fluid flows.
The course of work：The present apparatus can be applied in the lithographic equipment such as Step-and-repeat or stepping-scan-type.In exposure
During, from the light (ArF or F2 excimer laser) that light source (not provided in figure) is sent by the mask plate of alignment (in figure not
Provide), the gap flow field between projection lens set and lens-substrate full of immersion liquid, to workbench silicon chip substrate upper surface
Photoresist be exposed.
When immersed photoetching machine works, the immersion liquid that immersion liquid processing system supplies is led to through outer connecting pipe road from fluid injection
Road is continuously injected into the exposure area between projection lens set and silicon chip substrate, forms immersion flow field；Immersion liquid flows through afterwards
The gap submerged between unit matrix and silicon chip substrate forms gap flow field.Finally, immersion liquid is applied in the recycling row of negative pressure
Hole and gas-liquid recycling runner are recycled, and form flow passage.
Internal layer porous media upper surface outlet communicated with liquids recovery chamber, and with liquid vacuum recovery system (negative pressure source) phase
Connect, this negative pressure source is pressed less than the hydrophilic porous medium blistering pressure, so that gas is difficult to be inhaled into the porous media, only liquid phase
It can pass through.According to aperture capillary force calculation formula p=2 σ cos θ/r, (σ is gas-liquid interfacial surface tension, and θ is liquid at the same time
With porous media material surface contact angle, r is equivalent circle hole radius inside porous media material), capillary in internal layer porous media
Compared to outer two layers hydrophobic porous medium of power, it has stronger suction-operated to liquid, so the liquid to penetrating into hole
There to be stronger constraint effect.When liquid flows through connecing for hydrophilic internal layer porous media and hydrophobic outer two layers of porous media
When touching interface, fluid is subject to the adsorption capacity of water-wetted surface and the repulsive force of hydrophobic surface respectively, its formed resistance of making a concerted effort will
Outer layer porous media flows of the liquid from internal layer porous media to both sides are hindered, so the negative pressure effect applied in negative pressure source
Under, liquid will be recovered along overall upwardly direction.Outer two layers of porous media is communicated with gas reclaiming chamber, and and gas vacuum
Recovery system (recycling negative pressure source) is connected, and gas flows through porous media under the suction function and enters gas reclaiming chamber, so that most
Realize that gas-liquid separation is recycled eventually.In the case where internal layer porous media recycling circle is soaked by liquid, aperture is occupied, one is formed
" fluid-tight " acts on, and causes gas to be difficult to again pass by the recycling runner, and spreads outflow from the side.
The sealing gas of sealing gas processing feed system passes sequentially through sealing gas injection chamber and sealing gas cushion chamber
And hermetic seal round, air curtain is formed in gas-liquid recycling runner periphery, to prevent the liquid leakage of gap flow field and aid in recycling.
It is slow that most immersion liquid enters recycling under the recycling suction function of level liquid vacuum recovery system, via recycling round
Chamber is rushed, is finally discharged via the liquids recovery runner inside submergence unit upper cover plate.Liquids recovery runner leakage fluid dram passes through hose
It is connected with level liquid vacuum recovery system, is sucked away under the action of negative pressure resorption.Remaining is not recovered round absorption
Immersion liquid is recycled after circle absorbs under the effect of secondary liquid vacuum recovery system by internal layer porous media enters liquids recovery chamber
In be recovered.The gas mixed recycles the outer layer porous media in runner under the effect of gas vacuum recovery system, via gas-liquid
Recycling circle, which enters in gas reclaiming chamber, to be recovered.
Silicon chip substrate periodically carries out high-velocity scanning campaign in immersion flow field lower part, using projection lens set central axes in
The heart, is broadly divided into by paracentral scanning motion and deep return movement.When silicon chip substrate does height from outside to center
During fast radial motion, since immersion liquid acts on the adhesive attachment of silicon chip substrate, it will be transported to the left with silicon chip substrate
It is dynamic so that gap flow field internally migrates.At the same time, gas-liquid interface is gradually distance from gas-liquid recycling flow channel entry point, with reference to submergence
The suitably sized design of unit, right margin of gap flow field can be always held at recycling round and gas-liquid recycling stream during this
Moved between road.Therefore, impact of the homodromous sealing gas to the gap flow field border will greatly reduce and be difficult to shape
Into strong biphase gas and liquid flow so that immersion liquid can be recycled mainly by recycling round, and sealing gas can all pass through gas-liquid
Runner recycling is recycled, has achieveed the purpose that gas-liquid separation is recycled.
When silicon chip substrate is from center to exterior high-speed motion, in the molecule under the action of poly- power, silicon chip substrate will be to this
Liquid in gap flow field forms strong traction action, and causes partially submerged liquid to have little time to be returned by internal layer recycling round
Receive and flow into gas-liquid recycling runner.In outer layer gas-liquid recycling runner bottom, the immersion liquid moved from left to right with from right to left
Advertise sealing gas collision and with bubble generation with crumbling and fall, form violent biphase gas and liquid flow.Internal layer porous media
The distance for recycling the lower face distance submergence unit lower cover lower surface of circle is 1~3mm.Born in internal layer porous media recovered overhead
Under the suction of pressure and the hole capillary force collective effect of porous media, liquid in the biphase gas and liquid flow will imbibition it is more to internal layer
In the medium of hole.The negative pressure pressure difference that secondary liquid vacuum recovery system is applied is sufficiently large, so as in time continuously by the liquid
Body is drawn into liquids recovery chamber from porous media.But pressure difference is controlled at the same time less than hydrophilic inner layer porous media recycling loop material
The blistering pressure (capillary force between liquid and hydrophily aperture) of material, is passed through with the interstitial space for preventing gas from breaking through to have soaked
Internal layer porous media recycling circle enters in reclaiming chamber.The porosity of the porous media material should be greater than 50%, to reduce porous Jie
Choked flow effect of the matter solid skeletal to liquid, prevents fluid from being damaged by momentum mutation during the pore size of media to produce excessive pressure
Lose, advantageously ensure that enough organic efficiencies.
The recycling negative pressure of sealing gas vacuum recovery system is adjusted at the same time, is made it higher than hydrophobic outer layer porous media and is returned
The blistering pressure of circle is received, and less than the recycling negative pressure of secondary liquid vacuum recovery system.With reference to the porous media hydrophobic property and
Aperture response, the suction which is applied are not enough to suck immersion liquid in the porous media interstitial space, therefore
Only gas can be entered in outer layer gas reclaiming chamber by the porous media and is recovered.Recycle and enclose for outer layer porous media,
Even if liquid is inhaled into inside the porous media, since the influences such as gravity will not recycle seepage flow into outer layer gas easily
Chamber, but recycling runner lower part can be dropped to and then be inhaled into again in internal layer porous media recycling circle and recycled.Pass through this time
Gas-liquid two-phase can be separated recycling by receiving apparatus, and what gas-liquid two-phase mixing recycling triggered effectively in suppression recycling runner and pipeline shakes
The dynamic and interference effect to gap flow field.
Claims (8)
1. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine, including silicon chip substrate, reservoir channel, submergence
Flow field, gap flow field, liquids recovery module, gas-liquid recycling module and sealing gas supplying module；It is characterized in that：The note
Liquid passage, immersion flow field, liquids recovery module, gas-liquid recycling module and sealing gas supplying module are arranged on immersed photoetching machine
Submergence unit in submergence unit upper cover plate and submergence unit lower cover between, projection lens set bottom camera lens with submergence unit in
Fluid touches in portion's immersion flow field；Gap flow field is arranged between silicon chip substrate upper surface and submergence unit bottom surface；Liquid returns
Receiving module includes recycling round, liquids recovery cushion chamber, liquids recovery runner and level liquid vacuum recovery system；Gas-liquid recycles
Module includes gas-liquid recycling runner, liquids recovery chamber, gas reclaiming chamber, composite porous media, secondary liquid vacuum recovery system
With gas vacuum recovery system；Sealing gas supplying module includes sealing gas injection chamber, sealing gas cushion chamber, hermetic seal row
Hole and sealing gas processing feed system；
The submergence unit is generally cylindrical, its center of circle is immersion flow field；It is distributed from inside to outside using immersion flow field as the center of circle
Have liquids recovery module recycling round, gas-liquid recycling module composite porous media and sealing gas supplying module hermetic seal
Round；There is difference in height in the composite porous media bottom surface of gas-liquid recycling module with submergence unit lower cover bottom surface, is recycled as gas-liquid
The gas-liquid recycling runner of module；Filled with composite porous media gas-liquid recycling runner positioned at recycling round and hermetic seal round it
Between；Immersion flow field is arranged in the middle part of submergence unit, is up big and down small circular platform type flow field, immersion flow field side is provided with annulus
Shape reservoir channel, for the immersion liquid that immersion liquid processing system supplies to be continuously injected into shape from reservoir channel through outer connecting pipe road
Into immersion flow field；Had the gap between immersion flow field and silicon chip substrate, the immersion liquid in immersion flow field flows into the gap and forms seam
Clearance flow field；
Liquids recovery module, gas-liquid recycling module and the sealing gas supplying module is to be set perpendicular to silicon chip substrate
Annulus column；Liquids recovery module bottom is recycling round, and recycling round is touched with immersion liquid in gap flow field；Recycle on round
Face is liquids recovery cushion chamber, is liquids recovery runner above liquids recovery cushion chamber；Liquids recovery runner and level liquid are true
Empty recovery system is connected by hose；
The edge immersion liquid of runner, gas-liquid recycling runner and gap flow field is recycled for gas-liquid in the gas-liquid recycling module bottom
Touch；It is composite porous media above gas-liquid recycling runner, composite porous media is divided into middle internal layer porous media recycling circle, and
Two outer layer porous media recycling circles for being separately positioned on internal layer porous media recycling circle inner and outer ring；Internal layer porous media recycling circle
Cavity with submergence unit upper cover plate composition is as liquids recovery chamber；Two outer layer porous media recycling circles and submergence unit upper cover
Two cavitys of plate or submergence unit lower cover composition are as two gas reclaiming chambers；Liquids recovery chamber is returned with secondary liquid vacuum
Receipts system is connected by hose, realizes the recycling of immersion liquid；Two gas reclaiming chambers pass through with gas vacuum recovery system
Hose connects, and realizes the recycling of sealing gas；
Chamber is injected in the sealing gas supplying module bottom for sealing gas, and sealing gas injection chamber is arranged on gap flow field
Edge placement；It is sealing gas cushion chamber above sealing gas injection chamber, is hermetic seal round above sealing gas cushion chamber；Gas
Sealing round is fed through hose with sealing gas processing system and is connected.
2. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as claimed in claim 1, its feature exist
In：Single recovery port aperture of the recycling round is 0.5~1mm, and number of rows is 2~8 rows.
3. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as claimed in claim 1, its feature exist
In：The gas-liquid recycling width of flow path is 5~8mm.
4. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as claimed in claim 1, its feature exist
In：The internal layer porous media recycling circle and two outer layer porous media recycling circle upper surface flush；Liquids recovery chamber is set
In the upper top surface of internal layer porous media recycling circle；Two gas reclaiming chambers set respectively two outer layer porous medias recycling circle not with
The two sides of internal layer porous media recycling circle fitting.
5. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as claimed in claim 1, its feature exist
In：The outer layer porous media recycling circle of internal layer porous media recycling circle upper surface higher than two；Liquids recovery chamber is arranged on
The upper top surface of internal layer porous media recycling circle；Two gas reclaiming chambers set the upper top of two outer layer porous media recycling circles respectively
Face.
6. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as described in claim 1,4 or 5, it is special
Sign is：The internal layer porous media recycling circle uses the material of surface hydrophilicity；Outer layer porous media recycling circle is surface
Hydrophobic material.
7. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as described in claim 1,4 or 5, it is special
Sign is：The lower face non-horizontal surface of the outer layer porous media recycling circle, with the horizontal 10~45 ° of angle α.
8. a kind of fluid channel gas-liquid separation retracting device for immersed photoetching machine as described in claim 1,4 or 5, it is special
Sign is：The thickness of the internal layer porous media recycling circle is more than the thickness of two outer layers recycling circle.
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| CN201711395115.5A CN107991843B (en) | 2017-12-21 | 2017-12-21 | Micro-channel gas-liquid separation and recovery device for immersion lithography machine |
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