CN202297757U - Electromagnetic accelerating combined plasma auxiliary enhanced electron beam physical vapor deposition system - Google Patents
Electromagnetic accelerating combined plasma auxiliary enhanced electron beam physical vapor deposition system Download PDFInfo
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- CN202297757U CN202297757U CN2011204090259U CN201120409025U CN202297757U CN 202297757 U CN202297757 U CN 202297757U CN 2011204090259 U CN2011204090259 U CN 2011204090259U CN 201120409025 U CN201120409025 U CN 201120409025U CN 202297757 U CN202297757 U CN 202297757U
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Abstract
The utility model belongs to the technical field of physical vapor deposition technology and especially relates to an electromagnetic accelerating combined plasma auxiliary enhanced electron beam physical vapor deposition system. An upper pole plate and a lower pole plate are arranged in a vacuum chamber; a sample is mounted under the upper pole plate; a grid is arranged between the sample and the lower pole plate; an annular gas pipeline is arranged on the periphery of a deposition material bar; a cooling water pipeline is arranged in an inner circle of the gas pipeline; the upper pole plate and the lower pole plate are positive anodes; and the grid is a cathode. By utilizing the system provided by the utility model, an evaporated gaseous material has certain deposition rate and better directivity, so that the deposition rate and the deposition efficiency of the electron beam physical vapor deposition technology are efficiently increased and the bonding strength of a coating and a substrate is increased. Besides, for the deposition under a multi-crucible condition, a deposition coating in a specific area or a compound coating can be obtained by chamging a running path of particles by a magnetic field, so that the deposition effect is better.
Description
Technical field
The utility model belongs to the physical gas phase deposition technology field, and particularly a kind of electromagnetism quickens the auxiliary electro beam physics vapour deposition system that strengthens of associating plasma body.
Background technology
The electro beam physics vapour deposition technology has been paid close attention to because its unique deposition technique has received widely since 20th century, invented the eighties, and it is with a kind of evaporation coating method of electron beam as thermal source; With respect to other method for manufacturing thin film; It has the vaporator rate height, almost can evaporate all materials, and what obtained is organized as columnar crystal structure; Beam power is easy to regulate; Beam spot size and position are easy to control, help accurately controlling thickness and homogeneity, so its technology are with a wide range of applications.Yet, shortcoming such as the electro beam physics vapour deposition technology also has some shortcomings, and it is low to be mainly sedimentation rate, and sedimentation effect is low, and sedimentary motivating force is lower.
Summary of the invention
In order to utilize the advantage of electro beam physics vapour deposition technology; Reduce the influence that its shortcoming is brought; The utility model provides a kind of electromagnetism to quicken the auxiliary electro beam physics vapour deposition system that strengthens of associating plasma body; Promptly improve sedimentation rate and improve its directive property, thereby can improve the sedimentation rate and the sedimentation effect of electro beam physics vapour deposition technology effectively, and then improve coating and high base strength.
The technical scheme that the utility model adopts is:
Rotatable top crown and fixed bottom crown are set in Vakuumkammer, sample is installed on top crown, between sample and bottom crown, grid is set; In deposition a plurality of gas pipelines that distribute around the deposition charge bar are set around the charge bar, the cooling water pipeline that is provided with at the inner ring of gas pipeline; Wherein, top crown and bottom crown are positive electrode, and grid is a negative potential.
Said sample equates with the spacing of screen with the spacing and the lower electrode of grid.
Spacing between said sample and the lower electrode is 20-30cm; The spacing of said sample and top crown is less than 5cm.
The beneficial effect of the utility model is:
This equipment can make the gaseous material that is evaporated have certain sedimentation rate and directive property preferably; Thereby can improve the sedimentation rate and the sedimentation effect of electro beam physics vapour deposition technology effectively, and then improve coating and high base strength, in addition; For the deposition under many crucibles condition; If for the deposited coatings that obtains some specific region or in order to obtain compound coating, will be together with crossing the course that magnetic field changes particle, thus better deposition effect.
Description of drawings
Fig. 1 is the structural representation of the said system of the utility model;
Fig. 2 is the directed deposition and atomic synoptic diagram that quickens of plasma body.
Label among the figure:
The 1-sample; The 3-plasma body; The material that 4-is evaporated; The 5-grid; The 6a-top crown; The 6b-bottom crown; 7-deposits charge bar; The 8-gas pipeline; The 9-water coolant; The 10-Vakuumkammer.
Embodiment
The utility model provides a kind of electromagnetism to quicken the auxiliary electro beam physics vapour deposition system that strengthens of associating plasma body, below in conjunction with accompanying drawing and embodiment the utility model is described further.
The structure of native system is as shown in Figure 1; Rotatable top crown 6a and fixed bottom crown 6b are set in Vakuumkammer 10; Sample 1 is installed in position at a distance of 3cm on top crown 6a; Between sample 1 and bottom crown 6b, grid 5 is set, and sample 1 equates with the spacing of screen 5 with the spacing and the lower electrode 6a of grid 5, be 15cm.Upper surface and the flush of bottom crown 6b of deposition charge bar 7 are provided with annular gas pipeline 8 around deposition charge bar 7, at the cooling water pipeline 9 of the inner ring setting of gas pipeline; Wherein, top crown 6a and bottom crown 6b are positive electrode, and grid 5 is a negative potential.
During system works (when depositing), top crown 6a and bottom crown 6b connect positive electricity respectively, and grid 5 connects negative electricity, in gas pipeline 8, feed argon gas or nitrogen.Part electron beam 2 is mapped on the deposition charge bar 7, makes its volatilization, simultaneously with argon gas or nitrogen ionization, between the outlet of grid 5 and gas pipeline 8, forms plasma body 3.Under the effect of electric field of grid 5 and lower electrode 6b formation, plasma body 3 quickens, and the plasma body that is accelerated will clash into the material 4 that is evaporated, and gives an one of which acceleration stresses, makes it have certain speed, and has certain directive property.After being evaporated the gas material that is accelerated again simultaneously and the particle in the plasma body and passing grid 5, for fear of the Ar that is accelerated
+Or N
+And other particles are to the bombardment of sample 1; Between sample 1 and grid 5, apply a reversed electric field; Slow down through regulating the voltage between grid 5 and the top crown 6a, make the plasma body 3 that is accelerated, speed is close to zero or very little when making it arrive sample 1; Thereby avoid its bombardment to sample, its concrete working process is as shown in Figure 2.
Claims (3)
1. electromagnetism quickens the auxiliary electro beam physics vapour deposition system that strengthens of associating plasma body; It is characterized in that; Rotatable top crown (6a) and fixed bottom crown (6b) are set in Vakuumkammer (10); Go up installation sample (1) at top crown (6a), between sample (1) and bottom crown (6b), grid (5) is set; In deposition a plurality of gas pipelines (8) that distribute around the deposition charge bar are set around the charge bar, the cooling water pipeline (9) that is provided with at the inner ring of gas pipeline; Wherein, top crown (6a) and bottom crown (6b) are positive electrode, and grid (5) is a negative potential.
2. electromagnetism according to claim 1 quickens the auxiliary electro beam physics vapour deposition system that strengthens of associating plasma body, it is characterized in that said sample (1) equates with the spacing of screen (5) with the spacing and the lower electrode (6b) of grid (5).
3. electromagnetism according to claim 2 quickens the auxiliary electro beam physics vapour deposition system that strengthens of associating plasma body, it is characterized in that the spacing between said sample (1) and the lower electrode (6b) is 20-30cm; The spacing of said sample (1) and top crown (6a) is less than 5cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204090259U CN202297757U (en) | 2011-10-24 | 2011-10-24 | Electromagnetic accelerating combined plasma auxiliary enhanced electron beam physical vapor deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204090259U CN202297757U (en) | 2011-10-24 | 2011-10-24 | Electromagnetic accelerating combined plasma auxiliary enhanced electron beam physical vapor deposition system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202297757U true CN202297757U (en) | 2012-07-04 |
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ID=46366692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011204090259U Withdrawn - After Issue CN202297757U (en) | 2011-10-24 | 2011-10-24 | Electromagnetic accelerating combined plasma auxiliary enhanced electron beam physical vapor deposition system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202297757U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102383096A (en) * | 2011-10-24 | 2012-03-21 | 华北电力大学 | System for assisting enhancement of electron beam physical vapor deposition by adopting electromagnetism to accelerate united plasma |
-
2011
- 2011-10-24 CN CN2011204090259U patent/CN202297757U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102383096A (en) * | 2011-10-24 | 2012-03-21 | 华北电力大学 | System for assisting enhancement of electron beam physical vapor deposition by adopting electromagnetism to accelerate united plasma |
| CN102383096B (en) * | 2011-10-24 | 2014-07-09 | 华北电力大学 | System for assisting enhancement of electron beam physical vapor deposition by adopting electromagnetism to accelerate united plasma |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20120704 Effective date of abandoning: 20140709 |
|
| RGAV | Abandon patent right to avoid regrant |