CN202240852U - 抛光液挡板 - Google Patents
抛光液挡板 Download PDFInfo
- Publication number
- CN202240852U CN202240852U CN201120374836XU CN201120374836U CN202240852U CN 202240852 U CN202240852 U CN 202240852U CN 201120374836X U CN201120374836X U CN 201120374836XU CN 201120374836 U CN201120374836 U CN 201120374836U CN 202240852 U CN202240852 U CN 202240852U
- Authority
- CN
- China
- Prior art keywords
- baffle plate
- polishing fluid
- plate
- polishing
- sub
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 174
- 239000007788 liquid Substances 0.000 title abstract 7
- 239000012530 fluid Substances 0.000 claims description 89
- 239000002689 soil Substances 0.000 claims description 9
- 230000006978 adaptation Effects 0.000 claims description 7
- 239000000126 substance Substances 0.000 abstract 1
- 230000004308 accommodation Effects 0.000 description 10
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 5
- 239000012141 concentrate Substances 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000003044 adaptive effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 241000826860 Trapezium Species 0.000 description 1
- 210000001124 body fluid Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
Images
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201120374836XU CN202240852U (zh) | 2011-09-28 | 2011-09-28 | 抛光液挡板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201120374836XU CN202240852U (zh) | 2011-09-28 | 2011-09-28 | 抛光液挡板 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN202240852U true CN202240852U (zh) | 2012-05-30 |
Family
ID=46102151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201120374836XU Expired - Lifetime CN202240852U (zh) | 2011-09-28 | 2011-09-28 | 抛光液挡板 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN202240852U (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106956218A (zh) * | 2017-02-21 | 2017-07-18 | 天津华海清科机电科技有限公司 | 用于抛光设备中的供液装置 |
CN107855913A (zh) * | 2017-12-02 | 2018-03-30 | 广东轻工机械二厂有限公司 | 一种多磨盘曲面抛光机 |
CN110153839A (zh) * | 2019-06-06 | 2019-08-23 | 中国工程物理研究院激光聚变研究中心 | 全口径抛光浸没式元件加工装置、加工方法及抛光机 |
-
2011
- 2011-09-28 CN CN201120374836XU patent/CN202240852U/zh not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106956218A (zh) * | 2017-02-21 | 2017-07-18 | 天津华海清科机电科技有限公司 | 用于抛光设备中的供液装置 |
CN107855913A (zh) * | 2017-12-02 | 2018-03-30 | 广东轻工机械二厂有限公司 | 一种多磨盘曲面抛光机 |
CN110153839A (zh) * | 2019-06-06 | 2019-08-23 | 中国工程物理研究院激光聚变研究中心 | 全口径抛光浸没式元件加工装置、加工方法及抛光机 |
CN110153839B (zh) * | 2019-06-06 | 2023-12-26 | 中国工程物理研究院激光聚变研究中心 | 全口径抛光浸没式元件加工装置、加工方法及抛光机 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED Free format text: FORMER OWNER: TSINGHUA UNIVERSITY Effective date: 20150204 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100084 HAIDIAN, BEIJING TO: 300350 JINNAN, TIANJIN |
|
TR01 | Transfer of patent right |
Effective date of registration: 20150204 Address after: 300350, No. 8, building 9, ha Hing Road, Haihe science and Technology Park, Jinnan District, Tianjin Patentee after: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED (HWATSING CO., LTD.) Address before: 100084 Haidian District 100084-82 mailbox Beijing Patentee before: Tsinghua University |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Polishing liquid baffle plate Effective date of registration: 20180206 Granted publication date: 20120530 Pledgee: Tsinghua Holdings Co., Ltd. Pledgor: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED (HWATSING CO., LTD.) Registration number: 2018120000003 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20191022 Granted publication date: 20120530 Pledgee: Tsinghua Holdings Co., Ltd. Pledgor: TIANJIN HWATSING TECHNOLOGY COMPANY LIMITED (HWATSING CO., LTD.) Registration number: 2018120000003 |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 300350, No. 8, building 9, ha Hing Road, Haihe science and Technology Park, Jinnan District, Tianjin Patentee after: Huahaiqingke Co.,Ltd. Address before: 300350, No. 8, building 9, ha Hing Road, Haihe science and Technology Park, Jinnan District, Tianjin Patentee before: TSINGHUA University |
|
CX01 | Expiry of patent term |
Granted publication date: 20120530 |
|
CX01 | Expiry of patent term |