CN201962357U - 化学气相沉积设备 - Google Patents
化学气相沉积设备 Download PDFInfo
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- CN201962357U CN201962357U CN2010206831716U CN201020683171U CN201962357U CN 201962357 U CN201962357 U CN 201962357U CN 2010206831716 U CN2010206831716 U CN 2010206831716U CN 201020683171 U CN201020683171 U CN 201020683171U CN 201962357 U CN201962357 U CN 201962357U
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CN2010206831716U CN201962357U (zh) | 2010-12-27 | 2010-12-27 | 化学气相沉积设备 |
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CN201962357U true CN201962357U (zh) | 2011-09-07 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103540913A (zh) * | 2012-07-13 | 2014-01-29 | 晶元光电股份有限公司 | 应用于气相沉积的反应器 |
CN104862672A (zh) * | 2014-02-11 | 2015-08-26 | 朗姆研究公司 | 衬底处理装置喷头模块的滚珠丝杠喷头模块调节器组件 |
CN105483652A (zh) * | 2015-12-07 | 2016-04-13 | 武汉华星光电技术有限公司 | 化学气相沉积装置及其使用方法 |
CN106399974A (zh) * | 2016-10-10 | 2017-02-15 | 无锡宏纳科技有限公司 | 常压化学气相淀积反应腔 |
CN106480412A (zh) * | 2015-08-24 | 2017-03-08 | 圆益Ips股份有限公司 | 基板处理装置及基板处理方法 |
CN110187486A (zh) * | 2019-05-05 | 2019-08-30 | 南宁聚信众信息技术咨询有限公司 | 一种观察清晰的高效型芯片检测设备 |
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2010
- 2010-12-27 CN CN2010206831716U patent/CN201962357U/zh not_active Expired - Fee Related
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103540913A (zh) * | 2012-07-13 | 2014-01-29 | 晶元光电股份有限公司 | 应用于气相沉积的反应器 |
CN104862672A (zh) * | 2014-02-11 | 2015-08-26 | 朗姆研究公司 | 衬底处理装置喷头模块的滚珠丝杠喷头模块调节器组件 |
CN104862672B (zh) * | 2014-02-11 | 2019-02-01 | 朗姆研究公司 | 衬底处理装置喷头模块的滚珠丝杠喷头模块调节器组件 |
CN106480412A (zh) * | 2015-08-24 | 2017-03-08 | 圆益Ips股份有限公司 | 基板处理装置及基板处理方法 |
CN106480412B (zh) * | 2015-08-24 | 2019-02-05 | 圆益Ips股份有限公司 | 基板处理装置及基板处理方法 |
CN105483652A (zh) * | 2015-12-07 | 2016-04-13 | 武汉华星光电技术有限公司 | 化学气相沉积装置及其使用方法 |
CN105483652B (zh) * | 2015-12-07 | 2018-03-30 | 武汉华星光电技术有限公司 | 化学气相沉积装置及其使用方法 |
CN106399974A (zh) * | 2016-10-10 | 2017-02-15 | 无锡宏纳科技有限公司 | 常压化学气相淀积反应腔 |
CN110187486A (zh) * | 2019-05-05 | 2019-08-30 | 南宁聚信众信息技术咨询有限公司 | 一种观察清晰的高效型芯片检测设备 |
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130401 |
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Effective date of registration: 20130401 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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Granted publication date: 20110907 Termination date: 20181227 |
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