CN201910408U - 一种8英寸晶圆切口氧化膜去除装置 - Google Patents
一种8英寸晶圆切口氧化膜去除装置 Download PDFInfo
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- CN201910408U CN201910408U CN 201020670813 CN201020670813U CN201910408U CN 201910408 U CN201910408 U CN 201910408U CN 201020670813 CN201020670813 CN 201020670813 CN 201020670813 U CN201020670813 U CN 201020670813U CN 201910408 U CN201910408 U CN 201910408U
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CN 201020670813 CN201910408U (zh) | 2010-12-10 | 2010-12-10 | 一种8英寸晶圆切口氧化膜去除装置 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102437043A (zh) * | 2011-12-15 | 2012-05-02 | 天津中环领先材料技术有限公司 | 采用划磨方式去除igbt用抛光片晶圆边缘氧化膜的方法 |
CN102569020A (zh) * | 2010-12-10 | 2012-07-11 | 有研半导体材料股份有限公司 | 一种8英寸晶圆切口氧化膜去除方法和装置 |
CN104089809A (zh) * | 2014-06-24 | 2014-10-08 | 京东方科技集团股份有限公司 | 一种膜层去除装置 |
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2010
- 2010-12-10 CN CN 201020670813 patent/CN201910408U/zh not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102569020A (zh) * | 2010-12-10 | 2012-07-11 | 有研半导体材料股份有限公司 | 一种8英寸晶圆切口氧化膜去除方法和装置 |
CN102569020B (zh) * | 2010-12-10 | 2015-01-14 | 有研新材料股份有限公司 | 一种8英寸晶圆切口氧化膜去除方法和装置 |
CN102437043A (zh) * | 2011-12-15 | 2012-05-02 | 天津中环领先材料技术有限公司 | 采用划磨方式去除igbt用抛光片晶圆边缘氧化膜的方法 |
CN104089809A (zh) * | 2014-06-24 | 2014-10-08 | 京东方科技集团股份有限公司 | 一种膜层去除装置 |
CN104089809B (zh) * | 2014-06-24 | 2016-05-04 | 京东方科技集团股份有限公司 | 一种膜层去除装置 |
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Owner name: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Free format text: FORMER OWNER: GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS Effective date: 20120129 Free format text: FORMER OWNER: GRINM SEMICONDUCTOR MATERIALS CO., LTD. Effective date: 20120129 |
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Effective date of registration: 20120129 Address after: 100088, 2, Xinjie street, Beijing Patentee after: GRINM Semiconductor Materials Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Co-patentee before: GRINM Semiconductor Materials Co., Ltd. Patentee before: General Research Institute for Nonferrous Metals |
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Owner name: GRINM ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: GRINM SEMICONDUCTOR MATERIALS CO., LTD. |
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Address after: 100088, 2, Xinjie street, Beijing Patentee after: YOUYAN NEW MATERIAL CO., LTD. Address before: 100088, 2, Xinjie street, Beijing Patentee before: GRINM Semiconductor Materials Co., Ltd. |
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