CN201910407U - Etching equipment - Google Patents
Etching equipment Download PDFInfo
- Publication number
- CN201910407U CN201910407U CN2011200275345U CN201120027534U CN201910407U CN 201910407 U CN201910407 U CN 201910407U CN 2011200275345 U CN2011200275345 U CN 2011200275345U CN 201120027534 U CN201120027534 U CN 201120027534U CN 201910407 U CN201910407 U CN 201910407U
- Authority
- CN
- China
- Prior art keywords
- wall surface
- peripheral wall
- vacuum chamber
- etching
- face
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Abstract
The utility model relates to etching equipment, comprising a reaction cavity seat, an electrode unit and a baffle unit, wherein the reaction cavity seat comprises a bottom wall surface, a top wall seat and a peripheral wall surface connected between the bottom wall surface and the top wall surface; and a vacuum cavity seat is defined together by the bottom wall surface, the top wall seat and the peripheral wall surface. The electrode unit is positioned in the vacuum chamber and comprises an upper electrode arranged on the top wall surface and a lower electrode arranged on the bottom wall surface. The baffle unit is positioned in the vacuum chamber and comprises a base plate layer and a thermal spraying coating; the base plate layer is close to and surrounds the peripheral wall surface; and the thermal spraying coating extends towards the direction far away from the peripheral wall surface from the base plate layer. In the etching equipment, by cladding of the thermal spraying coating, the etching resistance of the baffle unit can be improved and the service life of the baffle unit can be prolonged.
Description
Technical field
The utility model relates to a kind of etching machines, is meant a kind of component's life and etching machines that promotes opposing etching corrosive power of prolonging especially.
Background technology
Existing etching machines, comprise a vacuum etched cavity seat, be arranged in this vacuum etched cavity seat and between the upper and lower every a slice electric pole plate and a slice lower electrode plate, and several neighbour arrange the baffle plate in this vacuum etched cavity seat.Described baffle plate comprises an aluminium (Al) base material respectively, and an aluminium oxide rete that is positioned at the aluminium base surface and utilizes anodization (Anodizing) to produce.Described baffle plate is removably installed in the vacuum etched cavity seat, and avoids the direct and vacuum etched cavity block response of electricity slurry particle in etching process as a barrier.Yet, through behind the etchant flow of several batches, the residue that is produced in the etching process, for example: treat photoresistance on the etchant or metal fragment can toward around splash and be deposited on the aluminium oxide rete of baffle plate and build up formation one deck residue rete, when the thickness of this residue rete is excessive, the follow-up residue that carries out the etching generation again will more be difficult to continue accumulation, and can begin to have the phenomenon of peeling off to take place.So, when carrying out the etching of next batch, the residue chip will drop and treat on the etchant, produce defective (Defect) after successive process is finished.
Therefore, in use for some time, baffle plate can be removed, and cleans to remove the residue rete.Though clean the removable residue rete in back, cleaning process repeatedly also allows the aluminium oxide rete attenuation gradually on the baffle plate, even aluminium base is exposed.Just can weaken extracting ability when causing roughness to diminish, in addition,, just need carry out anodization to grow the aluminium oxide rete again if aluminium base is exposed to etch residues when the attenuation of aluminium oxide rete.Moreover, the aluminium oxide rete that anodization produces belongs to the texture of amorphous phase, the ability of its corrosion resistance and opposing electricity slurry bombardment a little less than, therefore, how to prolong the useful life that is exposed to the member in the electricity slurry environment, the probability that reduces the purchase new structural member is the purpose of this utility model to reduce cost.
Summary of the invention
The purpose of this utility model is to provide a kind of component's life and etching machines that promotes opposing etching corrosive power of prolonging.
Etching machines of the present utility model comprises a reaction chamber seat, an electrode unit, and a baffle plate unit.This reaction chamber seat comprises a diapire face, a roof face, and a peripheral wall surfaces that is connected between diapire face and roof face, and this diapire face, roof face and peripheral wall surfaces define a vacuum chamber jointly.This electrode unit is positioned at vacuum chamber, and comprises a top electrode that is installed on the roof face, and a bottom electrode that is installed on the diapire face.This baffle plate unit is positioned at vacuum chamber, and comprises a vicinity and around the substrate layer of this peripheral wall surfaces, and one be incorporated on the substrate layer and by substrate layer towards the meltallizing coating of extending away from the peripheral wall surfaces direction.
The thickness of meltallizing coating of the present utility model is 50～1000 microns, is concavo-convex aspect.
Meltallizing coating of the present utility model can be utilized electricity slurry plasma spraying and be that raw material comes meltallizing to form with the ceramic powders, and ceramic powder stock can be selected from: the carbide of the oxide of aluminium (Al), yttrium (Y), chromium (Cr), zirconium (Zr), titanium (Ti) and tungsten (W), chromium (Cr), titanium (Ti), vanadium (V), silicon (Si) etc. are formed.
The beneficial effects of the utility model are: by the coating of this meltallizing coating, can promote the opposing etching corrosive power of baffle plate unit, prolong the useful life of baffle plate unit.
Description of drawings
Fig. 1 is a cross-sectional schematic, shows a preferred embodiment of the utility model etching machines;
Fig. 2 is a partial sectional view, shows on the baffle plate unit of this preferred embodiment to have a meltallizing coating.
Embodiment
Below in conjunction with drawings and Examples the utility model is elaborated.
Consult Fig. 1 and Fig. 2, first preferred embodiment of the utility model etching machines comprises a reaction chamber seat 1, an electrode unit 2, and a baffle plate unit 3.
This reaction chamber seat 1 is made by aluminium (Al) material, and comprises after anodization (Anodizing) is handled and make the top layer all be coated with aluminium oxide (Al
2O
3) the diapire face 11 of rete, a roof face 12, and a peripheral wall surfaces 13 that is connected in 12 in diapire face 11 and roof face.This diapire face 11, roof face 12 define a vacuum chamber 14 jointly with peripheral wall surfaces 13.Can vacuumize the action with vacuum breaker in the described vacuum chamber 14 repeatedly, and specific etching gas is fed in the vacuum chamber 14.
This electrode unit 2 is positioned at vacuum chamber 14, and comprises a top electrode 21 that is installed on roof face 12, and a bottom electrode 22 that is installed on diapire face 11.Generally can apply a high frequency electric source (HF power) at top electrode 21 and 22 of bottom electrodes, make the etching gas in the vacuum chamber 14 produce dissociation reaction and change electricity slurry particle state into, and utilize at this bottom electrode 22 connection one bias voltage (Bias) power supplys, order electricity slurry particle quickens to carry out etching bombardment reaction towards the etchant (scheming not show) for the treatment of that is positioned at bottom electrode 22 tops.For other necessary member of etching machines, set forth emphasis because of non-technology of the present utility model, therefore no longer describe in detail.
This baffle plate unit 3 comprises a vicinity and around the substrate layer 31 of the peripheral wall surfaces 13 of reaction chamber seat 1, and one by substrate layer 31 towards the meltallizing coating 32 of extending away from peripheral wall surfaces 13 directions.This baffle plate unit 3 is removably installed in the reaction chamber seat 1, and generally for lightweight and the reactive consideration of etching gas, this substrate layer 31 is made by aluminium (Al) material.Before carrying out the meltallizing processing, can earlier substrate layer 31 be carried out grease or dirty cleaning, can utilize the mode of sandblast then, make this substrate layer 31 surface roughenings, so can increase to be coated surface area and improve and the tack of 32 of meltallizing coatings, when carrying out the meltallizing spraying, can utilize electricity slurry plasma spraying and be that raw material comes meltallizing to form this meltallizing coating 32 with the ceramic powders, ceramic powder stock can be selected from: aluminium (Al), yttrium (Y), chromium (Cr), zirconium (Zr), the oxide of titanium (Ti) and tungsten (W), chromium (Cr), titanium (Ti), vanadium (V), carbide of silicon (Si) or the like.In the present embodiment, be to be raw material with the aluminium oxide ceramics powder, make it under the condition of high temperature, become the particle of molten state, spray repeatedly and be overlapping on the substrate layer 31 by the aluminium oxide particles that high velocity air drives molten state when when beginning coating, with to form thickness be the meltallizing coating 32 of 50～1000 μ m after the room temperature natural cooling solidifies the back.
Because this meltallizing coating 32 is that the raw material made forms with the ceramic powders, therefore possesses heat-resisting quantity, and more excellent anti-electricity slurry corrosivity.And because the crystal structure of the aluminium oxide meltallizing coating after the meltallizing process 32 for having crystalline phase, compare with the existing amorphous phase aluminium oxide rete that utilizes anodization to produce, have better structural strength, abrasion performance characteristic, with the ability of opposing electricity slurry corrosion.Moreover as shown in Figure 2, this meltallizing coating 32 is concavo-convex aspect, therefore, just has roughness to a certain degree after the spraying, can improve in the etching process extracting ability for residual contaminants, to reach the purpose that promotes the etching cleanliness factor.
In sum, the utility model is by the plasma spraying meltallizing coating 32 that coating is made with the aluminium oxide ceramics powder on the substrate layer 31 of baffle plate unit 3, this meltallizing coating 32 more can be born the etching of electricity slurry, therefore, can prolong the useful life of baffle plate unit 3, so can reach the purpose of this utility model really.
Claims (3)
1. etching machines, comprise: one defines the reaction chamber seat of a vacuum chamber, an electrode unit that is positioned at this vacuum chamber, and a baffle plate unit that is positioned at this vacuum chamber; This reaction chamber seat comprises a diapire face, a roof face, and a peripheral wall surfaces that is connected between diapire face and roof face, and this diapire face, roof face and peripheral wall surfaces define this vacuum chamber jointly; This electrode unit comprises a top electrode that is installed on the roof face, and a bottom electrode that is installed on the diapire face; It is characterized in that: this baffle plate unit comprises a vicinity and around the substrate layer of this peripheral wall surfaces, and one is incorporated on the substrate layer and towards the meltallizing coating of extending away from this peripheral wall surfaces direction.
2. etching machines according to claim 1 is characterized in that: the thickness of this meltallizing coating is 50～1000 microns.
3. etching machines according to claim 1 and 2 is characterized in that: this meltallizing coating is concavo-convex aspect.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200275345U CN201910407U (en) | 2011-01-27 | 2011-01-27 | Etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011200275345U CN201910407U (en) | 2011-01-27 | 2011-01-27 | Etching equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201910407U true CN201910407U (en) | 2011-07-27 |
Family
ID=44302607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011200275345U Expired - Lifetime CN201910407U (en) | 2011-01-27 | 2011-01-27 | Etching equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201910407U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108227404A (en) * | 2018-01-11 | 2018-06-29 | 合肥微睿光电科技有限公司 | The base plate exposure machine platen of liquid crystal display equipment |
-
2011
- 2011-01-27 CN CN2011200275345U patent/CN201910407U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108227404A (en) * | 2018-01-11 | 2018-06-29 | 合肥微睿光电科技有限公司 | The base plate exposure machine platen of liquid crystal display equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100801913B1 (en) | Good plasma corrosion resistant spray-coated member, and production method thereof | |
| JP4970887B2 (en) | Method for recycling equipment components | |
| KR102213756B1 (en) | Rare-earth oxide based erosion resistant coatings for semiconductor application | |
| CN105431926B (en) | Plasma spray coating design using phase and stress control | |
| CN2893917Y (en) | Structural component with residues adhering treatment surface and substrate treatment chamber including the same | |
| JP4546447B2 (en) | Thermal spray coating coated member having excellent plasma erosion resistance and method for producing the same | |
| EP1524682B1 (en) | Component for vacuum apparatus, production method thereof and apparatus using the same | |
| WO2001000901A1 (en) | Corrosion resistant component of semiconductor processing equipment and method of manufacturing thereof | |
| CN113201718B (en) | Plating chamber inner wall component with sacrificial layer, preparation method and cleaning method thereof | |
| WO2007092611A2 (en) | Disposable liners for etch chambers and etch chamber components | |
| JP4546448B2 (en) | Thermal spray coating coated member having excellent plasma erosion resistance and method for producing the same | |
| JP2006303158A (en) | Component for vacuum apparatus | |
| CN201910407U (en) | Etching equipment | |
| CN103866286A (en) | Component used inside semiconductor substrate reaction chamber and manufacturing method thereof | |
| JP2011153373A (en) | Thin-film-forming apparatus, thin-film forming method and shielding component | |
| CN101503812B (en) | Differential arc oxidation method | |
| CN101429671B (en) | Preparation method of zirconium oxide coating on aluminum alloy surface | |
| KR101559112B1 (en) | Ceramic coating film of parts surface & manufacture method thereof | |
| JP3995994B2 (en) | Constituent member of jig for semiconductor manufacturing apparatus and manufacturing method thereof | |
| JP4095764B2 (en) | Metal material member for film forming apparatus and film forming apparatus using the same | |
| JP5089874B2 (en) | Plasma processing apparatus member and manufacturing method thereof | |
| JP4604640B2 (en) | Vacuum device parts, manufacturing method thereof, and apparatus using the same | |
| JP3149859U (en) | Plasma processing equipment | |
| JP2006057172A (en) | Thin film production apparatus and production method therefor | |
| JP4519416B2 (en) | Anti-contamination device for thin film forming equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110727 |
|
| CX01 | Expiry of patent term |