CN201796935U - Single surface etching equipment through corrosive acid - Google Patents
Single surface etching equipment through corrosive acid Download PDFInfo
- Publication number
- CN201796935U CN201796935U CN2010205474995U CN201020547499U CN201796935U CN 201796935 U CN201796935 U CN 201796935U CN 2010205474995 U CN2010205474995 U CN 2010205474995U CN 201020547499 U CN201020547499 U CN 201020547499U CN 201796935 U CN201796935 U CN 201796935U
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- China
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- etching
- height
- silicon sheet
- equipment
- single surface
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model relates to the technical field of silicon cell sheet manufacturing, in particular to single surface etching equipment through corrosive acid. The etching equipment comprises an etching channel, wherein a feeding end baffle plate used for controlling the height of medical liquid is arranged at the feeding end of the etching channel; and lower rollers used for conveying a silicon sheet are arranged in the etching channel. The height of the feeding end baffle plate of the etching channel is reduced to the height which is in accordance with the condition that the silicon sheet lower rollers are just submerged by the liquid surface of the medical liquid. The equipment can etch on a single surface and the silicon sheet is floated on the liquid surface, so that one surface of the silicon sheet has an etching effect and the other surface still has the own performance of the silicon sheet. The equipment contributes to the printing of a silk screen back electric field and the collection of current, so that the efficiency is increased; and the crushing rate is also reduced by etching on a single surface.
Description
Technical field
The utility model relates to the silicon cell manufacture technology field, particularly a kind of single face corrosive acid etching device.
Background technology
Present etching method and etching device are that silicon chip is fully immersed in the corrosion soup, reach the effect of removing silicon chip affected layer and making herbs into wool.What but diffusion was used is the single face diffusion, thus only the matte form of diffusingsurface there is requirement, promptly only need be to diffusingsurface making herbs into wool, and bilateral corrosion reduced the thickness of silicon chip, from yield and efficient, all loses.
The utility model content
Technical problem to be solved in the utility model is: existing etching device is improved, carry out single face corrosion making herbs into wool.
The technical scheme that its technical problem that solves the utility model adopts is: a kind of single face corrosive acid etching device, comprise texturing slot, material loading end at texturing slot has the material loading end-stopping plate that is used to control the soup height, in texturing slot, has the bottom roller of carrying silicon chip, reduce the height of the material loading end-stopping plate of texturing slot, this did not highly just have the height of silicon chip bottom roller for the liquid level that makes soup.
The beneficial effects of the utility model are: use this equipment to carry out single face making herbs into wool, a face has reached the effect of making herbs into wool, and another face is still the performance of silicon chip itself, and this helps the printing of silk screen back of the body electric field and the collection of electric current, thereby raises the efficiency; The broken rate of while single face making herbs into wool also reduction machine.
Description of drawings
Below in conjunction with the drawings and specific embodiments the utility model is described in further detail;
Fig. 1 is a structural representation of the present utility model;
Wherein: 1. texturing slot, 2. material loading end-stopping plate, 3. bottom roller, 4. silicon chip, 5. liquid level.
Embodiment
1 pair of the utility model is described in further detail in conjunction with the accompanying drawings now.This accompanying drawing is the schematic diagram of simplification, basic structure of the present utility model only is described in a schematic way, so it only shows the formation relevant with the utility model.
A kind of single face corrosive acid etching device, comprise texturing slot 1, material loading end at texturing slot 1 has the material loading end-stopping plate 2 that is used to control the soup height, in texturing slot 1, has the bottom roller 3 of carrying silicon chip 4, reduce the height of the material loading end-stopping plate 2 of texturing slot 1, reduce circular flow, make liquid level 5 just not have roller, silicon chip 4 swims on the liquid level 5.
Etching device with RENA Intex is an example, and the etching method of RENA Intex is that silicon chip 4 is immersed in the soup fully, and upper surface also is corroded and making herbs into wool.Also have upper roller on bottom roller 3, the purpose of upper roller is to press down silicon chip 4, makes silicon chip 4 not floating, keeps direction of advance.Adopt the design to transform this etching device, remove upper roller, reduce the height of texturing slot material loading end-stopping plate 2, reduce circular flow, make liquid level 5 just not have bottom roller 3, silicon chip 4 swims on the liquid level 5; Perhaps directly the Intex texturing slot is replaced with Inoxside etching groove, forms single face corrosion texturing slot.
Claims (1)
1. single face corrosive acid etching device, comprise texturing slot (1), material loading end at texturing slot (1) has the material loading end-stopping plate (2) that is used to control the soup height, it is characterized in that: the bottom roller (3) that in described texturing slot (1), has conveying silicon chip (4), reduce the height of the material loading end-stopping plate (2) of texturing slot (1), this did not highly just have the height of bottom roller (3) for the liquid level (5) that makes soup.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205474995U CN201796935U (en) | 2010-09-29 | 2010-09-29 | Single surface etching equipment through corrosive acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205474995U CN201796935U (en) | 2010-09-29 | 2010-09-29 | Single surface etching equipment through corrosive acid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201796935U true CN201796935U (en) | 2011-04-13 |
Family
ID=43851836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010205474995U Expired - Fee Related CN201796935U (en) | 2010-09-29 | 2010-09-29 | Single surface etching equipment through corrosive acid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201796935U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102764740A (en) * | 2012-07-02 | 2012-11-07 | 江阴新顺微电子有限公司 | Single-face acid immersion process suitable for back metallization pretreatment of semiconductor chip |
| CN103730347A (en) * | 2014-01-10 | 2014-04-16 | 海南英利新能源有限公司 | Recycled silicon wafer texturing method |
| CN108336189A (en) * | 2018-03-30 | 2018-07-27 | 上海思恩装备科技有限公司 | The wet-method etching device and method of substrate |
| CN108417669A (en) * | 2018-03-22 | 2018-08-17 | 西安交通大学 | A kind of etching method for Buddha's warrior attendant wire cutting polysilicon chip solar cell |
| CN110034211A (en) * | 2019-04-23 | 2019-07-19 | 苏州阿特斯阳光电力科技有限公司 | A method of reducing chain type texturing chemicals consumption |
-
2010
- 2010-09-29 CN CN2010205474995U patent/CN201796935U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102764740A (en) * | 2012-07-02 | 2012-11-07 | 江阴新顺微电子有限公司 | Single-face acid immersion process suitable for back metallization pretreatment of semiconductor chip |
| CN103730347A (en) * | 2014-01-10 | 2014-04-16 | 海南英利新能源有限公司 | Recycled silicon wafer texturing method |
| CN108417669A (en) * | 2018-03-22 | 2018-08-17 | 西安交通大学 | A kind of etching method for Buddha's warrior attendant wire cutting polysilicon chip solar cell |
| CN108336189A (en) * | 2018-03-30 | 2018-07-27 | 上海思恩装备科技有限公司 | The wet-method etching device and method of substrate |
| CN110034211A (en) * | 2019-04-23 | 2019-07-19 | 苏州阿特斯阳光电力科技有限公司 | A method of reducing chain type texturing chemicals consumption |
| CN110034211B (en) * | 2019-04-23 | 2021-03-12 | 苏州阿特斯阳光电力科技有限公司 | Method for reducing consumption of chain type texturing chemicals |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110413 Termination date: 20130929 |