CN201766766U - Device for generating plasmas uniformly in large area - Google Patents
Device for generating plasmas uniformly in large area Download PDFInfo
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- CN201766766U CN201766766U CN2010202793880U CN201020279388U CN201766766U CN 201766766 U CN201766766 U CN 201766766U CN 2010202793880 U CN2010202793880 U CN 2010202793880U CN 201020279388 U CN201020279388 U CN 201020279388U CN 201766766 U CN201766766 U CN 201766766U
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Abstract
The utility model discloses a device for generating plasmas uniformly in large area, comprising an inner electrode and an outer electrode, wherein the cylindrical opening of the outer electrode is provided with a sealing door; the outer electrode is sheathed outside the inner electrode; an air supply unit is internally provided with an air supply pipeline communicated with a clearance between the outer electrode and the inner electrode; a matched unit of a radio frequency power supply is internally provided with a radio frequency electrode connected on the inner electrode; and a vacuum unit is internally provided with an air pipeline communicated with the clearance between the inner electrode and the outer electrode. The device for generating plasmas uniformly in large area can generate rich active groups and meet the needs of erosion and polymerization application; and autobias exists on a high frequency electrode and can accelerate ions, so that the ions can obtain sufficiently high energy and be used for the projects and technologies of membrane preparation, surface treatment and the like.
Description
Technical field
The utility model relates to the plasma generating device field, is specially the device that a kind of large tracts of land evenly produces plasma.
Background technology
The plasma that is adopted in the material processed is the nonequilibrium plasma that is produced by the radio frequency low pressure discharge.This plasma the most significant characteristic be that different types of particle has different energy, the temperature that is electronics is very high, generally be (to be about several ten thousand degree) about the several electrons volt, and the temperature of ion and active particle group is very low, the existence of these high energy electrons just can cause non-equilibrium chemical reaction.The usually straight capacitive coupling discharge of high-frequency discharge, inductively-coupled discharge, microwave electron cyclotron resonance discharge, helicon discharge etc.The purpose of, large tracts of land fine for realizing and High-speed machining, plasma must possess characteristics such as low pressure, heavy caliber, high density.But increase bore, reduce the reduction that operating air pressure can cause plasma density.For capacitive coupling and inductively-coupled discharge, when material needs batch process, must increase sparking electrode area and spacing in addition.Because material is in the plasma discharge, how much that handles material will influence the plasma discharge characteristic, and further influence the consistency of handling material quality.Ecr plasma (ECR) or Helicon wave plasma (HWP) equipment increase the restriction that bore will be subjected to externally-applied magnetic field.
The utility model content
The purpose of this utility model provides the device that a kind of large tracts of land evenly produces plasma, and the plasma density that produces with the plasma device that solves prior art is low, to the problem of the weak effect of material processed.
In order to achieve the above object, the technical scheme that the utility model adopted is:
A kind of large tracts of land evenly produces the device of plasma, include cylindraceous in, external electrode, described external electrode one end is a nozzle, described tube port position is equipped with the hermatic door of sealing external electrode, it is characterized in that: in external electrode is enclosed within electrode outside and with the coaxial setting of interior electrode, in described, gapped in the middle of the external electrode, also include air supply unit, the radio-frequency power supply matching unit, vacuum unit, there is steam line to be connected on the described external electrode in the described air supply unit with outer, interior gaps between electrodes communicates, have in the described radio-frequency power supply matching unit radio frequency electrode pass external electrode and be connected described on the electrode, have in the described vacuum unit gas path pipe that is connected on the external electrode with in, gap between the external electrode is communicated with.
Described a kind of large tracts of land evenly produces the device of plasma, it is characterized in that: described air supply unit comprises a plurality of carrier gas bottles, flowmeter or needle-valve all are installed on the gas pipeline of each carrier gas bottle, the gas pipeline of a plurality of carrier gas bottles is combined into to be connected on the described external electrode behind No. one steam line and communicates with inside and outside gaps between electrodes, and gas supply electromagnetic valve also is installed on the described steam line.
Described a kind of large tracts of land evenly produces the device of plasma, it is characterized in that: described radio-frequency power supply matching unit comprises radio-frequency power supply and the adaptation that is electrically connected to each other, be connected with radio frequency electrode on the electric output of described adaptation, described radio frequency electrode is passed external electrode and is connected electrically on the described interior electrode.
Described a kind of large tracts of land evenly produces the device of plasma, it is characterized in that: described vacuum unit comprises filter, vacuum pump, Pirani gauge, described Pirani gauge is installed on the external electrode and stretches between the inside and outside electrode in the gap, the air inlet electromagnetically operated valve is installed on the admission line of described filter, on the pump-line of described vacuum pump the electromagnetically operated valve of bleeding is installed, the pump-line of described vacuum pump, the air duct of filter are combined into to be connected on the external electrode behind one road gas path pipe and are communicated with inside and outside gaps between electrodes.
Described a kind of large tracts of land evenly produces the device of plasma, it is characterized in that: described hermatic door center has window, and the glass window sheet of band preventing RF radiation shield copper mesh is installed in the window.
Described a kind of large tracts of land evenly produces the device of plasma, it is characterized in that: also be filled with multistage poly-tetrafluoro collets separated from one another in the described inside and outside gaps between electrodes.
Described a kind of large tracts of land evenly produces the device of plasma, it is characterized in that: radio-frequency power supply in described external electrode, the radio-frequency power supply matching unit and adaptation be ground connection respectively.
Each unit of the utility model is controlled by PLC, according to setting process, provides system each unit controls signal by PLC.Constitute air supply unit by steam line, gas supply electromagnetic valve, flowmeter or needle-valve and carrier gas bottle.Steam line links to each other with the ground connection external electrode, and air inlet is controlled by gas supply electromagnetic valve.Gases used flow can suitably increase and decrease flowmeter or needle-valve and carrier gas bottle quantity by flowmeter or noticeable degree at handling different materials or different application.
Constitute the radio-frequency power supply matching unit by radio frequency electrode, adaptation, radio-frequency power supply.Make the radio frequency incident power reach maximum by adjusting adaptation, and the reflection power minimum.By radio frequency electrode, the equal ground connection of adaptation, radio-frequency power supply and external electrode is with protection human body safety.
Pirani gauge, vacuum suction pipeline, air inlet electromagnetically operated valve, the electromagnetically operated valve of bleeding, vacuum pump, filter constitute vacuum unit.Pirani gauge is the vacuum measurement unit, and it and accessory circuit are used for the vacuum chamber internal gas pressure and measure.When vacuumizing, close the air inlet electromagnetically operated valve, vacuum chamber is evacuated to setting air pressure; Material processed finishes and closes the electromagnetically operated valve of bleeding, and opens the air inlet electromagnetically operated valve, by filter inwardly, between the external electrode in the vacuum chamber in gap air inlet to atmospheric pressure.
When air pressure range is 0.1 ~ 60Pa, between external electrode and interior electrode, produce the capacitance coupling plasma discharge, because external electrode is a ground connection, so the effective area of grounding electrode is greater than the area of high-frequency electrode.Can produce a negative Dc bias on the high-frequency electrode, the negative Dc bias speeding-up ion that utilizes on the high-frequency electrode to be produced also makes its bombardment substrate, accelerate surface reaction.And spread to the center by the space of high-frequency electrode, in whole vacuum cavity, form even high-density plasma.
When handling the film-type material, material can be put in the surface of electrode between external electrode and the interior electrode.And the material that has a certain volume in batch process is positioned over material in the high-frequency electrode cylindrical cavity during such as materials such as culture dish, blake bottles, material is not in interelectrode region of discharge, do not influence the flash-over characteristic of plasma, the quality of therefore handling material can obtain consistency preferably.
Capacitance coupling plasma need not externally-applied magnetic field and can discharge, it is simpler than the structure that need discharge by means of the Ecr plasma (ECR) or the Helicon wave plasma (HWP) of external magnetic field, so it can relatively easily obtain large-area plasma.
The utility model can be kept stabilized uniform glow discharge under the air pressure conditions of higher.Plasma density is higher, can produce abundant active group, satisfies the needs of etching and aggregated application; There is autobias on the high-frequency electrode, can makes it have sufficiently high energy so that be that project technologies such as film preparation or surface treatment are used by speeding-up ion; Can be applicable to fields such as plasma CVD, etching, cleaning and macromolecule material surface modification.
The utlity model has following advantage:
1. reaction speed is fast, temperature is low: gas discharge moment generation plasma reaction, and several seconds or a few minutes just can change the character on surface; Reaction is particularly suitable for macromolecular material near normal temperature.
2. energy height: have autobias on the high-frequency electrode, can make it have sufficiently high energy by speeding-up ion, so plasma is to have extraordinary chemically active high energy particle.
3. eurytopicity: various type of substrate all can be handled, and can both handle well as metal, semiconductor, oxide and most of macromolecular materials etc.
4. function is strong: because plasma treatment is carried out under vacuum, so the free path of the various active ions in the plasma is very long, their penetrating with penetrating power is very strong, can handle interlayer, tubule and blind hole.
5. environment-friendly type: the action of plasma process is gas-solid phase dry type reaction, not consume water resources, need not to add chemical reagent, to the environment noresidue.
Description of drawings
Fig. 1 is the utility model structural representation.
Embodiment
As shown in Figure 1.A kind of large tracts of land evenly produces the device of plasma, include interior electrode 2 cylindraceous, external electrode 1, external electrode 1 one ends are nozzle, tube port position is equipped with the hermatic door 3 of sealing external electrode 1, hermatic door 3 centers have window, and the glass window sheet 4 of band preventing RF radiation shield copper mesh 5 is installed in the window.In external electrode 1 is enclosed within electrode 2 outside and with interior electrode 2 coaxial settings, gapped in the middle of the inside and outside electrode 2,1, also be filled with multistage poly-tetrafluoro collets 6 separated from one another in the gap between the inside and outside electrode 2,1.Also include air supply unit, radio-frequency power supply matching unit, vacuum unit, have in the air supply unit steam line 7 be connected on the external electrode 1 with outer, interior electrode 1,2 between the gap communicate, have in the radio-frequency power supply matching unit radio frequency electrode 14 pass external electrode 1 and be connected on the electrode 2, have the gas path pipe 18 that is connected on the external electrode 1 to be communicated with in the vacuum unit with gap between the inside and outside electrode 2,1.
Air supply unit comprises a plurality of carrier gas bottles 11,12,13, flowmeter or needle-valve 8,9,10 all are installed on the gas pipeline of each carrier gas bottle, a plurality of carrier gas bottle gas pipelines be combined into be connected behind No. one steam line 7 on the external electrode 1 with inside and outside electrode 2,1 between the gap communicate, gas supply electromagnetic valve YV1 also is installed on the steam line 7.
The radio-frequency power supply matching unit comprises radio-frequency power supply 16 and the adaptation 15 that is electrically connected to each other, and is connected with radio frequency electrode 14 on the electric output of adaptation 15, and radio frequency electrode 14 is passed external electrode 1 and is connected electrically on the interior electrode 2.Radio-frequency power supply 16 in external electrode 1, the radio-frequency power supply matching unit and adaptation 15 be ground connection respectively.
Vacuum unit comprises filter 20, vacuum pump 19, Pirani gauge 17, Pirani gauge 17 is installed on the external electrode 1 and stretches between inside and outside 2,1 electrode in the gap, air inlet electromagnetically operated valve YV2 is installed on the admission line of filter 20, the electromagnetically operated valve YV3 that bleeds is installed on the pump-line of vacuum pump 19, the air duct of the pump-line of vacuum pump 19, filter 20 be combined into be connected behind one road gas path pipe 18 on the external electrode 1 with inside and outside electrode 2,1 between the gap be communicated with.
Specific embodiment one: bacteria culture bottle, culture dish hydrophily are improved
Being used for the biological consumptive material of medical treatment, is to be made by synthesizing polymeric material as great majority such as culture dish, blake bottles, and their surface has hydrophobicity, and the molecule that can not provide enough binding sites to make cell and biologically active effectively is combined in their surface.By changing carrier after the plasma treatment, as chemical constitution, surface energy and the surface charge on culture dish, blake bottle surface, make its surfaces externally and internally become hydrophilicly by hydrophobic, and obtain supportint cell and stick the ability of sprawling, improve cell proliferation quantity and speed, cultivate thereby be more suitable for cell.
During use, culture dish or blake bottle evenly are positioned in high-frequency electrode 2 cylindrical cavities, shut hermatic door, the PLC control program can be finished processing procedure by setting process:
At first vacuum pump begins to bleed, measure pressure in the vacuum chamber by vacuum gauge and accessory circuit, when pressure in it is closed the electromagnetically operated valve YV3 that bleeds during for 30Pa, open radio frequency source simultaneously, between external electrode and interior electrode, produce the capacitance coupling plasma discharge, because external electrode is a ground connection, can produce a negative Dc bias on the high-frequency electrode, the negative Dc bias speeding-up ion that utilizes on the high-frequency electrode to be produced makes it have sufficiently high energy, and spread to the center by the space of high-frequency electrode, in whole vacuum cavity, form homogeneous plasma.Radio frequency source power is 400 watts, and be 5 minutes discharge time.If pressure increases in processing procedure in the vacuum chamber, and the electromagnetically operated valve YV3 that then bleeds opens to keep pressure constant in the vacuum chamber.Close vacuum pump and radio frequency source then, open air inlet electromagnetically operated valve YV2 to the vacuum chamber air inlet, reach atmospheric pressure up to vacuum chamber, material processed finishes, and blake bottle, culture dish surface become hydrophily by original hydrophobicity.
For the enhancement process effect, after beginning to vacuumize when vacuum degree reaches the 10Pa left and right sides, adjust pressure-reducing valve and flowmeter or needle-valve, open gas supply electromagnetic valve YV1, in vacuum chamber, infeed oxygen, when vacuum degree reaches 30Pa, close YV1, start radio frequency source, this moment, discharge generation was rich in the plasma of oxonium ion and free radical, helped to improve the hydrophily of material.Other operating procedure is example as above.
Can change radio-frequency power supply and adaptation into the high-frequency ac Switching Power Supply to reduce the volume and weight of treatment facility in the present embodiment, processing time and power will adjust accordingly.
Specific embodiment two: A4 paper super hydrophobic surface preparation
Earlier with oxygen plasma A4 paper is carried out etching, because the effect of oxygen radical, A4 paper can obtain good roughness; Again with a certain proportion of CF
4And H
2Mixed gas plasma is handled the A4 paper after the etching, at surface deposition fluorocarbon film.Can make contact angle by this method greater than 150 °, have the well behaved super hydrophobic surface of very little contact angle hysteresis simultaneously.
During use, A4 paper is placed high-frequency electrode 2 cylinder outer surfaces, shut hermatic door, detailed process is as follows:
At first opening vacuum pump vacuumizes reative cell.When vacuum degree reaches the 10Pa left and right sides, adjust pressure-reducing valve and flowmeter or needle-valve, open gas supply electromagnetic valve YV1, in vacuum chamber, infeed oxygen, when vacuum degree reaches 30Pa, close YV1, start radio frequency source, processing time is 3 minutes, and this moment, A4 paper can obtain good roughness owing to the effect of oxygen radical.Turn off radio frequency source, close oxygen cylinder and needle-valve.
Once more reative cell is evacuated to about 10Pa.Open CF
4And H
2Gas cylinder is regulated pressure-reducing valve and flowmeter, to reative cell input CF
4And H
2, CF
4With H
2Volume ratio be 2: 1.When vacuum degree reaches 30Pa, close YV1, CF
4, H
2The gas cylinder cylinder valve starts radio frequency source, and the processing time is 3 minutes, and make it have super-hydrophobicity at A4 paper surface deposition fluorocarbon film this moment.
Reative cell is evacuated to 10Pa and continues 10min.
Close vacuum-pump power supply, open air inlet electromagnetically operated valve YV2, make reative cell pressure reach atmospheric pressure, material processed finishes.
Claims (7)
1. a large tracts of land evenly produces the device of plasma, include cylindraceous in, external electrode, described external electrode one end is a nozzle, described tube port position is equipped with the hermatic door of sealing external electrode, it is characterized in that: in external electrode is enclosed within electrode outside and with the coaxial setting of interior electrode, in described, gapped in the middle of the external electrode, also include air supply unit, the radio-frequency power supply matching unit, vacuum unit, there is steam line to be connected on the described external electrode in the described air supply unit with outer, interior gaps between electrodes communicates, have in the described radio-frequency power supply matching unit radio frequency electrode pass external electrode and be connected described on the electrode, have in the described vacuum unit gas path pipe that is connected on the external electrode with in, gap between the external electrode is communicated with.
2. a kind of large tracts of land according to claim 1 evenly produces the device of plasma, it is characterized in that: described air supply unit comprises a plurality of carrier gas bottles, flowmeter or needle-valve all are installed on the gas pipeline of each carrier gas bottle, the gas pipeline of a plurality of carrier gas bottles is combined into to be connected on the described external electrode behind No. one steam line and communicates with inside and outside gaps between electrodes, and gas supply electromagnetic valve also is installed on the described steam line.
3. a kind of large tracts of land according to claim 1 evenly produces the device of plasma, it is characterized in that: described radio-frequency power supply matching unit comprises radio-frequency power supply and the adaptation that is electrically connected to each other, be connected with radio frequency electrode on the electric output of described adaptation, described radio frequency electrode is passed external electrode and is connected electrically on the described interior electrode.
4. a kind of large tracts of land according to claim 1 evenly produces the device of plasma, it is characterized in that: described vacuum unit comprises filter, vacuum pump, Pirani gauge, described Pirani gauge is installed on the external electrode and stretches between the inside and outside electrode in the gap, the air inlet electromagnetically operated valve is installed on the admission line of described filter, on the pump-line of described vacuum pump the electromagnetically operated valve of bleeding is installed, the pump-line of described vacuum pump, the air duct of filter are combined into to be connected on the external electrode behind one road gas path pipe and are communicated with inside and outside gaps between electrodes.
5. a kind of large tracts of land according to claim 1 evenly produces the device of plasma, it is characterized in that: described hermatic door center has window, and the glass window sheet of band preventing RF radiation shield copper mesh is installed in the window.
6. a kind of large tracts of land according to claim 1 evenly produces the device of plasma, it is characterized in that: also be filled with multistage poly-tetrafluoro collets separated from one another in the described inside and outside gaps between electrodes.
7. a kind of large tracts of land according to claim 1 evenly produces the device of plasma, it is characterized in that: radio-frequency power supply in described external electrode, the radio-frequency power supply matching unit and adaptation be ground connection respectively.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202793880U CN201766766U (en) | 2010-07-27 | 2010-07-27 | Device for generating plasmas uniformly in large area |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010202793880U CN201766766U (en) | 2010-07-27 | 2010-07-27 | Device for generating plasmas uniformly in large area |
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| CN201766766U true CN201766766U (en) | 2011-03-16 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102361531A (en) * | 2011-10-26 | 2012-02-22 | 西安电子科技大学 | Device and method for generating large-area, uniform and non-magnetized plasmas |
| CN105925930A (en) * | 2016-06-07 | 2016-09-07 | 国网江苏省电力公司电力科学研究院 | Processing system used for improving outer insulting performance of composite insulating device |
| CN107426908A (en) * | 2017-07-13 | 2017-12-01 | 大连理工大学 | A kind of low pressure large area, high-density plasma generation device and production method |
| CN108341466B (en) * | 2013-05-01 | 2021-06-08 | Nch公司 | Method for treating water in flowing water system by plasma discharge |
| CN113905499A (en) * | 2021-08-30 | 2022-01-07 | 中国航天空气动力技术研究院 | Pneumatic-magnetic field scanning tubular arc plasma heater and using method thereof |
| CN113905499B (en) * | 2021-08-30 | 2024-05-03 | 中国航天空气动力技术研究院 | Pneumatic-magnetic field scanning tubular arc plasma heater and use method thereof |
-
2010
- 2010-07-27 CN CN2010202793880U patent/CN201766766U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102361531A (en) * | 2011-10-26 | 2012-02-22 | 西安电子科技大学 | Device and method for generating large-area, uniform and non-magnetized plasmas |
| CN102361531B (en) * | 2011-10-26 | 2013-07-03 | 西安电子科技大学 | Device and method for generating large-area, uniform and non-magnetized plasmas |
| CN108341466B (en) * | 2013-05-01 | 2021-06-08 | Nch公司 | Method for treating water in flowing water system by plasma discharge |
| CN105925930A (en) * | 2016-06-07 | 2016-09-07 | 国网江苏省电力公司电力科学研究院 | Processing system used for improving outer insulting performance of composite insulating device |
| CN107426908A (en) * | 2017-07-13 | 2017-12-01 | 大连理工大学 | A kind of low pressure large area, high-density plasma generation device and production method |
| CN113905499A (en) * | 2021-08-30 | 2022-01-07 | 中国航天空气动力技术研究院 | Pneumatic-magnetic field scanning tubular arc plasma heater and using method thereof |
| CN113905499B (en) * | 2021-08-30 | 2024-05-03 | 中国航天空气动力技术研究院 | Pneumatic-magnetic field scanning tubular arc plasma heater and use method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110316 Termination date: 20180727 |