CN201645323U - Diamond dresser for chemical mechanical grinding - Google Patents
Diamond dresser for chemical mechanical grinding Download PDFInfo
- Publication number
- CN201645323U CN201645323U CN201020149837XU CN201020149837U CN201645323U CN 201645323 U CN201645323 U CN 201645323U CN 201020149837X U CN201020149837X U CN 201020149837XU CN 201020149837 U CN201020149837 U CN 201020149837U CN 201645323 U CN201645323 U CN 201645323U
- Authority
- CN
- China
- Prior art keywords
- diamond
- ring surface
- grinding
- emery wheel
- cmp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Polishing Bodies And Polishing Tools (AREA)
Abstract
The utility model discloses a diamond dresser for chemical mechanical grinding, which comprises a grinding wheel. A diamond grinding surface comprises an outer ring surface, a middle ring surface and an inner ring surface and is arranged on the grinding wheel; radial sections of the outer ring surface and the inner ring surface are circular arc-shaped; the middle ring surface adopts a plane; the outer ring surface, the middle ring surface and the inner ring surface are connected in sequence to form the diamond grinding surface; and a plurality of grooves are also formed on the diamond grinding surface along the radial direction of the grinding wheel and uniformly distributed on the diamond grinding surface. Through combining the arc-shaped surface and the plane, the availability of diamond is improved, the dressing quality is improved, and the service life of the diamond dresser is also prolonged. The grooves can hold chippings or powder generated during the grinding and are convenient for the immediate discharge of the chippings or the powder. The utility model also effectively keeps the buffering and feeding effect of a circular arc-shaped structure while improving the service life, ensures the normal use of a grinding cushion and avoids the abnormal damage of the grinding cushion.
Description
Technical field
The utility model relates to a kind of cmp device, relates in particular to a kind of cmp diamond truer.
Background technology
Development along with the miniaturization of various electronic device volume, the integrated level of IC industry is also in continuous lifting, this just need do multilayer and handle on wafer substrate, as optics development, etching, vapour deposition, high temperature process, ion implantation etc., and etching and deposition repeatedly carry out, and so the operation that all must pass through cmp (CMP) between each is improving constantly along with the high integration requirement, " number of plies " that crystal column surface is done is just many more, and the operation of CMP is also frequent and important all the more.Chemical mechanical planarization tool generally comprises grinding pad.For the high cutting power that keeps grinding pad, high pollution discharge capability, just must make grinding pad can remain rough structure on a kind of porous, the microcosmic, just to do online correction to grinding pad, the instrument of correction generally adopts the diamond corrector.In the present like product both domestic and external, mainly be that diamond working layers is set on emery wheel, and diamond working layers have only three kinds of structures: outer low and inner high ramp structure, arc structure and planar structure.All there are the shortcoming of high some serious wear in ramp structure and arc structure, and the diamond that makes real participation work reduces the life-span of product less than 5% greatly, causes waste.Though planar structure has the long life-span, but the extruding to grinding pad in the grinding makeover process lacks buffering, improper if pressurize, very easily grinding pad is caused breakage or microcosmic displacement, make grinding pad local " bubbling " phenomenon occur, make the grinding pad plane no longer smooth, when serious even can cause scrapping of wafer.
The utility model content
Technical problem to be solved in the utility model is at above-mentioned the deficiencies in the prior art, provides a kind of quality good, long service life, the cmp diamond truer good to the correction effect of grinding pad.
For solving the above-mentioned technical problem of final result, the technical solution adopted in the utility model is: a kind of cmp diamond truer, comprise emery wheel, described emery wheel is provided with diamond lap face, described diamond lap face comprises outer ring surface, middle anchor ring and inner ring surface, the radial section of outer ring surface and inner ring surface is a circular arc, and middle anchor ring is the plane, and outer ring surface, middle anchor ring and inner ring surface join successively and form diamond lap face.The combination on cambered surface and plane can improve adamantine utilization rate, improves and revises quality, has also prolonged the service life of cmp usefulness diamond truer.
As the further improved technical scheme of the utility model, described diamond lap face upper edge emery wheel radially also is provided with a plurality of grooves, and a plurality of grooves are evenly distributed on the diamond lap face.Chip or powder that groove is produced in the time of can holding grinding also make things convenient for the timely eliminating of chip or powder.
As the further improved technical scheme of the utility model, described groove asks to be eight.
As the further improved technical scheme of the utility model, described emery wheel is the middle circular emery wheel that is provided with through hole.Through hole is used to install the cmp diamond truer.
As the further improved technical scheme of the utility model, be provided with at least two locating holes near the inner ring surface inboard on the described emery wheel.Locating hole is used for installation and the location of cmp with diamond truer.
The utility model is provided with the multiple layer of diamond on emery wheel, promptly grind the workspace, grind the mode that the workspace adopts circular arc and plane to combine, the advantage of having gathered circular-arc workspace and plane formula workspace, therefore improving cmp with in the service life of diamond truer, also keep the effect of " the buffering feeding " of circular arc type structure effectively, guaranteed the normal use of grinding pad, avoided the improper damage of grinding pad.
Description of drawings
Fig. 1 is the structural representation of the utility model embodiment 1.
Fig. 2 is the structural representation of the utility model embodiment 1.
Fig. 3 is the structural representation of the utility model embodiment 1.
Fig. 4 is the structural representation of the utility model embodiment 1.
Fig. 5 is that the A-A of Fig. 4 is to cross-sectional schematic.
Fig. 6 is the enlarged diagram at B place among Fig. 5.
Fig. 7 is the groove schematic diagram in 4.
The specific embodiment
Below in conjunction with accompanying drawing the specific embodiment of the present utility model is described further.
Referring to Fig. 1, Fig. 2, Fig. 3 and Fig. 4, this cmp comprises that with diamond truer emery wheel 1 described emery wheel 1 is provided with diamond lap face, diamond lap face comprises outer ring surface 2, middle anchor ring 3 and inside and outside anchor ring 4, referring to Fig. 5 and Fig. 6, the radial section of outer ring surface 2 and inner ring surface 4 is a circular arc, middle anchor ring 3 is the plane, and outer ring surface 2, middle anchor ring 3 and inner ring surface 4 join successively gently, forms the ring-type diamond lap face along emery wheel 1 circumferential protrusions.Diamond lap face upper edge emery wheel 1 radially also is provided with a plurality of grooves 5, sees Fig. 7, and a plurality of grooves 5 are evenly distributed on the diamond lap face.Chip or powder that groove 5 is produced in the time of can holding grinding also make things convenient for the timely eliminating of chip or powder.The quantity of groove 5 can be decided with actual needs, and in the present embodiment, groove 5 is eight.Emery wheel 1 is the middle circular emery wheel that is provided with through hole 6, and promptly emery wheel 1 centre is axially arranged with the through hole 6 that is used to install this cmp usefulness diamond truer along it.Be provided with at least two locating holes 7 near inner ring surface 4 inboards on the emery wheel 1, the location that locating hole 7 can be used for this cmp when installing with diamond truer, the quantity of locating hole 7 also can be decided according to the general layout actual needs, is two locating holes 7 in the present embodiment.
Claims (5)
1. cmp diamond truer, comprise emery wheel (1), described emery wheel (1) is provided with diamond lap face, it is characterized in that: described diamond lap face comprises outer ring surface (2), middle anchor ring (3) and inner ring surface (4), the radial section of outer ring surface (2) and inner ring surface (4) is a circular arc, middle anchor ring (3) is the plane, and outer ring surface (2), middle anchor ring (3) and inner ring surface (4) join successively and form diamond lap face.
2. cmp diamond truer according to claim 1 is characterized in that: described diamond lap face upper edge emery wheel (1) radially also is provided with a plurality of grooves (5), and a plurality of grooves (5) are evenly distributed on the diamond lap face.
3. cmp diamond truer diamond truer according to claim 1 is characterized in that: described groove (5) is eight.
4. cmp diamond truer diamond truer according to claim 1 is characterized in that: described emery wheel (1) is provided with the circular emery wheel of through hole (6) for the centre.
5. cmp diamond truer diamond truer according to claim 1 is characterized in that: described emery wheel (1) is gone up near inner ring surface (4) inboard and is provided with at least two locating holes (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201020149837XU CN201645323U (en) | 2010-04-02 | 2010-04-02 | Diamond dresser for chemical mechanical grinding |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201020149837XU CN201645323U (en) | 2010-04-02 | 2010-04-02 | Diamond dresser for chemical mechanical grinding |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201645323U true CN201645323U (en) | 2010-11-24 |
Family
ID=43110533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201020149837XU Expired - Lifetime CN201645323U (en) | 2010-04-02 | 2010-04-02 | Diamond dresser for chemical mechanical grinding |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201645323U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105345665A (en) * | 2015-11-30 | 2016-02-24 | 郑州磨料磨具磨削研究所有限公司 | Finishing tool for ultra-hard grinding wheel for plane grinding and finishing method |
| CN105473283A (en) * | 2013-08-19 | 2016-04-06 | 圣戈班金刚石工具有限责任两合公司 | Form dressing roller |
| CN113714935A (en) * | 2021-08-16 | 2021-11-30 | 蚌埠高华电子股份有限公司 | Automatic polishing pad correction equipment and use method thereof |
-
2010
- 2010-04-02 CN CN201020149837XU patent/CN201645323U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105473283A (en) * | 2013-08-19 | 2016-04-06 | 圣戈班金刚石工具有限责任两合公司 | Form dressing roller |
| US9956665B2 (en) | 2013-08-19 | 2018-05-01 | Saint-Gobain Diamantwerkzeuge Gmbh | Form dressing roller |
| CN105345665A (en) * | 2015-11-30 | 2016-02-24 | 郑州磨料磨具磨削研究所有限公司 | Finishing tool for ultra-hard grinding wheel for plane grinding and finishing method |
| CN113714935A (en) * | 2021-08-16 | 2021-11-30 | 蚌埠高华电子股份有限公司 | Automatic polishing pad correction equipment and use method thereof |
| CN113714935B (en) * | 2021-08-16 | 2022-07-12 | 蚌埠高华电子股份有限公司 | Automatic polishing pad correction equipment and use method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: NANJING SANCHAO ADVANCED MATERIALS CO., LTD. Free format text: FORMER NAME: NANJING SANCHAO DIAMOND TOOLS CO., LTD. |
|
| CP03 | Change of name, title or address |
Address after: 211124, Jiangning Road, Chunhua District, Jiangsu City, Nanjing Province, Ze Cheng Road, No. 77 Patentee after: NANJING SANCHAO ADVANCED MATERIALS CO., LTD. Address before: 211124 tea street, Chunhua street, Jiangning District, Jiangsu, Nanjing Patentee before: Nanjing Sanchao Diamond Tools Co., Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20101124 |