CN201162037Y - Rotating magnetic field operated electrical arc ion arc plating source capable of governing speed and range - Google Patents
Rotating magnetic field operated electrical arc ion arc plating source capable of governing speed and range Download PDFInfo
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- CN201162037Y CN201162037Y CNU2008200116741U CN200820011674U CN201162037Y CN 201162037 Y CN201162037 Y CN 201162037Y CN U2008200116741 U CNU2008200116741 U CN U2008200116741U CN 200820011674 U CN200820011674 U CN 200820011674U CN 201162037 Y CN201162037 Y CN 201162037Y
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Abstract
The utility model belongs to the film preparation field, in particular to an arc ion arc plating source which is controlled by a rotating magnetic field whose speed and amplitude can be regulated, wherein a rotating magnetic generating device is arranged around a target material, which adopts a plurality of magnetic poles whose different angles are certain and which are mutually connected, and the magnetic poles are evenly distributed on the same circumference, the number of the magnetic pole is 4n or 3n, wherein n is bigger or is equal to 1, an integral magnetic return circuit frame is formed, an excitation coil is sleeved on a magnetic pole or is embedded in a groove gap between adjacent magnetic poles, a two-phase excitation whose phase difference is 90 degrees or a three-phase excitation whose phase difference is 120 degrees are adopted to supply electricity in turn, and a regulated rotating magnetic field is produced in space which is surrounded by magnetic poles. The arc ion arc plating source controls the movement of arc spot through the rotating magnetic field whose speed and amplitude can be regulated, which can improve the discharging form and the work stability of arc spots, improve the etching evenness and the capacity factor of target material, reduce the emission of big particles of the target materials, and can be used to prepare film with high quality and functional film, and broaden the application scope of arc ion plating.
Description
Technical field
The utility model relates to the film preparation field, specifically a kind of arc ion plating arc source of rotatingfield control of adjustable speed amplitude modulation, in order to improve the discharge type of arc spot, the motion of control arc spot, improve the target etching homogeneity, reduce or the oarse-grained emission of inhibition target, in order to prepare high-quality film.
Background technology
Arc ion plating is one of most important technology in industrial plated film production and the scientific research, because it is simple in structure, ionization level height (70%-80%), the projectile energy height, diffraction is good, can realize series of advantages such as low temperature depositing, arc ion plating (aip) is rapidly developed and obtains widespread use, show very big economic benefit and prospects for commercial application.
Arc ion plating is based on the coating technique of gas discharge plasma physical vapor deposition principle.This technology relies on the localized hyperthermia of the arc spot that produces on the cathode targets surface in the vacuum film coating chamber, make cathode material flash evaporation and ionization as target, produce degree of ionization height and the big plasma body of ion energy, on workpiece, add negative potential, can under the lower condition of workpiece Heating temperature, plate the good various ganoine thin films of one deck hardness height, dense structure and associativity at workpiece surface.
The behavior of vacuum arc is controlled by cathode spot.The Vacuum Arc light discharge is actually a series of arc event, because it recurs apace, to such an extent as to the impression of people's motion electric arc, the motion of cathode spot and arc root has determined whole electric Arc Motion, the order of adjacent arcs spot is lighted and is extinguished the motion that has constituted the arc spot.Small-sized (100～200 μ m of arc ion plating cathode spot
2), current density very high (10
5～10
7A/cm
2), have very high power density (10
16W/m
2), so cathode spot is as the intensive electronics, atoms metal, ion and at a high speed (1000m/s) metallic vapor emissive source time the, also continuous metal injection drop (macrobead).
Though arc ion plating (aip) has many good qualities,, had a strong impact on the performance and the life-span of coating and film owing to oarse-grained existence in the arc ion plating.Therefore the relevant influence on development that how to solve macrobead problem anticathode electric arc in the cathode arc plating is very big, becomes the main topic of later stage development, also becomes and hinders the bottleneck problem that arc ion plating (aip) more gos deep into widespread use.
The requirement that further develops of arc ion plating is considered in technological design oarse-grained place to go or inhibition, what application was more at present is the magnetic filtering technique, mainly be to utilize the difference of macrobead and metal ion mass-to-charge ratio to be blocked in macrobead outside the sedimentary province fully, though this method can satisfy the requirement of preparation high-quality thin film, but the magnetic filtering technique has reduced isoionic transmission efficiency, greatly reduce sedimentation rate, need to increase extra equipment simultaneously, take the very big device space, complex structure, can not realize that big area deposits this industrial requirements, cost is very high, is unfavorable for application.What the more important thing is that the magnetic filtering technique considers is the method that in the plasma body transmission course macrobead is excluded, be etc. to be used for taking stopgap measures after symptom occurs and the method for not effecting a permanent cure, and be a kind of method of passiveness therefore.
More positive way is the measure that consideration is dealt with problems from the source.Improve the discharge type of arc spot, improve the movement rate of arc spot, the reduction discharge power is concentrated the cathode spot place, and discharge power is distributed on the whole target surface, thereby reduces oarse-grained emission even do not have the particulate emission.
Be devoted to the work of this respect both at home and abroad always.Because the physical property of vacuum arc, adding electromagnetic field is the effective ways of control spots moving, the different magnetic field component is to the motion effects rule difference of arc spot, (transverse magnetic field when applying the magnetic field that is parallel to cathode target surface, see Fig. 1 (a)), arc spot is done the reversing motion (Retrograde motion) of contrary Ampere force, just opposite (the I * B), see Fig. 1 (b) of the direction of direction of motion and electric current power.The movement velocity of arc spot becomes parabolic relation with the intensity of transverse magnetic field, therefore can be used for improving the movement velocity of arc spot.(sharp magnetic field when magnetic field and cathode surface intersect at an angle θ, magnetic induction density B, see Fig. 1 (c)), then arc spot 1 drift motion (Robson drift) that in reversing motion, also superposes, the direction of drift motion is pointed to magnetic line of force in the folded acute angle theta of cathode target surface
BThe zone, acute angle rule that Here it is (Acuteangle principle), Fig. 1 (d).Among Fig. 1 (d), Ф
RRepresent the direction of spots moving and the angle between magnetic line of force and the target surface intersecting lens, θ
B≈ Ф
RThe acute angle rule can be used for the direction of motion of restriction arc spot, the position of the appearance of control arc spot on target surface, this rule to the control of spots moving, that the target etching gets homogeneity is extremely important.Above-mentioned rule is the basic law of magnetic field to the spots moving influence, also is the rule that Magnetic Field Design must be considered.
In the design in arc ion plating arc source, nearly all be unable to do without the design in magnetic field in the world,, all be unable to do without integrated use these two kinds of rules though the form in magnetic field is varied.Wherein using maximum modal modes has Russian arc source and controlled arc source structure, and this also is external popular two kinds of arc ion plating membrane techniquies.Though these structures can realize the effective control to the arc spot, the movement locus of restriction arc spot does not effectively improve the discharge type of arc spot, reaches satisfied effect.Wherein Russian arc source is more effective aspect utilizing at target, but because magnetic field configuration and target material structure, can not the emission of good restraining particulate; And controlled arc source also is being limited aspect the emission of minimizing particle, because they do not change the discharge type of cold cathode arc spot arc spot, and long-time etching can form the etching track at target surface, the waste target.
All Magnetic Field Design all are to consider to form certain magnetic field configuration on target surface, utilize the motion of acute angle rule restriction arc spot, utilize transverse component to improve the movement velocity of arc spot.Enlarge the area and the intensity of transverse component on the one hand as far as possible, on the one hand the motion of restriction arc spot.It is very difficult reaching satisfied effect.And all Magnetic Field Design all are static or quasi-static, and the variation in magnetic field itself (frequency, speed) is considered few to the influence of arc spot, therefore be the restriction that is difficult to breakthrough influence each other.
Ramalingam is at patent WO8503954 and US4,673, a kind of dynamic Magnetic Field Design thinking has been proposed in 477, can realize the even etching of arc spot on large-area target simple in structure substantially, this method is to change the distribution of magnetic field at target surface by permanent magnet in target mechanical rotation behind, thereby influences the arc spot in the etching position of target surface.But this method need increase by a cover complicated mechanical controlling organization; Simultaneously, the position property in magnetic field is fixed, intensity is difficult to reconcile, and is the change that a kind of motion of machinery causes DISTRIBUTION OF MAGNETIC FIELD, and adjustability is poor, can not improve the discharge of arc spot effectively, suppresses the particulate emission; And relate to problems such as sealing, cooling, therefore be difficult to apply.The arc ion plating arc source that needs dynamic rotatingfield a kind of innovation, that break through restriction and effective and that be easy to promote to control.
The utility model content
The purpose of this utility model is to break through traditional static or quasi-static Magnetic Field Design and mechanical dynamic magnetic field mentality of designing, a kind of arc ion plating arc source of rotatingfield control of the new type of adjustable velocity modulation width of cloth is provided, in order to discharge type and the job stability that improves the arc spot, the movement locus of control arc spot, improve target etching homogeneity and target utilization, reduce the oarse-grained emission of target,, expand the range of application of arc ion plating in order to prepare high-quality film and function film.
To achieve these goals, technical requirements of the present utility model is:
1. according to the influence rule of different magnetic field component to spots moving, concentrate the cathode spot place for the movement velocity, the reduction discharge power that improve the arc spot, the utility model must be able to provide the transverse magnetic field components that is parallel to target surface that can reconcile.
2. in order to improve the discharge stability of arc spot, keep the continuity of discharge, increase operation rate, the utility model must be able to keep the arc spot to move in target surface and can not go to and cause blow-out outside the target surface.
3. in order to improve target etching homogeneity and target utilization, the utility model must be able to make the arc spot in whole target surface etching rather than be limited in the certain location place and form the etching track.
4. in order to meet the demands 1,3, reduce discharge power and concentrate, the discharge power dispersive is distributed on the whole target surface, the utility model must can provide the transverse magnetic field components that covers the big area target surface as far as possible.
In order to satisfy above-mentioned requirements, the utility model proposes the mentality of designing of the dynamic rotatingfield of control spots moving.
Know-why of the present utility model is:
By designing a kind of rational rotatingfield structure, form rational rotatingfield position shape at target surface, rotatingfield is in moving process, space charge layer before the meeting anticathode spot, the distribution effect of ionic cloud, make the density maximum (key that the arc spot exists or restrikes) of ionic cloud distribute along with DISTRIBUTION OF MAGNETIC FIELD, motion and moving, thus make the position of arc spot that synchronous change also take place.When the frequency in magnetic field, intensity reach certain degree, might realize the uniform distribution of ionic cloud at whole target surface, the arc transfer that makes the discrete with cathode spot is distributed electric arc.
The principle of design of rotatingfield is:
Generally speaking, differ several (4n or the 3n of certain homogeneous angular in the space, n 〉=1) magnetic pole, and several (2 or 3) group magnet coil winding is housed on the magnetic pole, when in the magnet coil during by several groups of magnetizing currents that differ a phase bit (90 ° or 120 °), will produce the magnetic field of rotation in the space that this several magnetic pole surrounded, as Fig. 2; Wherein, the U among the figure, U ', V, V ', W, W ' are respectively the two ends of three-phase alternating current, the different DISTRIBUTION OF MAGNETIC FIELD figure constantly of (a)-(e) expression among the figure, and magnetic field is along with the cycle of electric current changes in continuous rotation as can be seen.The form in magnetic field is by the installation site decision of magnet coil, and the rotation frequency in magnetic field depends on the excitation inversion frequency of magnet coil, and the size of field intensity is then regulated by the size of magnetizing current.
According to above-mentioned principle, the technical solution of the utility model is:
A kind of arc ion plating arc source of rotatingfield control of adjustable speed amplitude modulation, be provided with generation device of rotating magnetic field at the target surrounding space, generation device of rotating magnetic field differs certain homogeneous angular for adopting, several (4n or the 3n that interconnect, n 〉=1) the even cloth of magnetic pole (high permeability materials) is on same circumference, form the electromagnetic circuit skeleton of an integral body, magnet coil is enclosed within on the magnetic pole or is embedded in the groove crack between the adjacent pole, adopt two-phase (90 ° of phase differential) or three-phase (120 ° of phase differential) excitation to power in proper order, in the space that magnetic pole surrounds, produce adjustable rotatingfield.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, the generation device of rotating magnetic field outward appearance is circular or square, be positioned over target around, coaxial with target, the effective area, magnetic field is around target surface, and generation device of rotating magnetic field is positioned in the vacuum chamber or outside the vacuum chamber, the generation device of rotating magnetic field position can be reconciled, polar cylinder or the square body of being shaped as, polar end shape is straight flange or arc.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, generation device of rotating magnetic field is symmetrically an installation magnetic conductive pole around the target, rectangular or obtuse angle, two limits of magnetic conductive pole, being shaped as of magnetic conductive pole is square or circular, the magnetic conductive pole bottom is connected on the magnetic guiding loop, and magnetic conductive pole and magnetic guiding loop form the electromagnetic circuit skeleton of an integral body; The magnet coil identical with the magnetic conductive pole number is installed in the middle portion of magnetic conductive pole, and the shape of shape and magnetic conductive pole is consistent, between magnet coil and the skeleton by insulation protection.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, generation device of rotating magnetic field is that magnetic pole is evenly distributed on the main body magnetic conduction passage of round sealed, form the electromagnetic circuit skeleton of an integral body, the material of skeleton is made of the material (electrical pure iron or synergetic punching press siliconized plate) of high magnetic permeability, size (the internal diameter of skeleton, external diameter, polar size) according to the target size, magnetic pole number and mounting means design, polar be shaped as square or circular, polar top end is straight flange or arc, symmetric sensing target material surface center; Magnet coil is enclosed within on the magnetic pole or is embedded between the adjacent pole in the groove crack, and the magnet coil identical with the magnetic pole number is installed on the magnetic pole, and shape is consistent with polar shape, between magnet coil and the skeleton by insulation protection.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, when magnet coil was enclosed within on the magnetic pole: magnet coil was divided into two groups, number of magnetic poles is 4n, n 〉=1, relative magnet coil is one group, magnet coil on the same group is connected into a galvanic circle, and the electric current of relative on the same group magnet coil in the same way or oppositely; Perhaps, magnet coil is divided into three groups, and number of magnetic poles is 3n, n 〉=1, and relative magnet coil is one group, magnet coil on the same group is connected into a galvanic circle, the reversal of current of relative on the same group magnet coil.
It is the three phase sine AC power excitation that 90 ° two-phase sinusoidal ac or phase differential are 120 ° that phase differential is adopted in the arc ion plating arc source of the rotatingfield of described adjustable speed amplitude modulation control, the magnet coil of two groups or three groups respectively.One of two groups of magnet coils terminate to the common port of two-phase excitation electric current, and the two-phase excitation electric current forms by single-phase thunder shake phase 90 ° (electric capacity splits phase); Perhaps draw by the Scott transformer.The coil that is divided into three groups can be used Y type or △ (trilateral) connection.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, be embedded in the magnet coil in the groove crack between the adjacent pole, be embedded in the groove crack between the adjacent pole by the motor stator winding regularity of distribution, the magnetizing current employing phase differential of winding is 120 ° three-phase alternating current source forcing, and winding can be used Y type or △ (trilateral) connection; Layout in the groove crack adopts individual layer, bilayer or single two-layer hybrid to arrange, the mode of connection of winding overhang adopts folded formula or ripple formula, the end shape of winding adopts chain type, staggered form, concentric type or folded formula, and different rule modes produces the rotatingfield of different numbers of poles and form.
The arc ion plating arc source of the rotatingfield of described adjustable speed amplitude modulation control places the outer generation device of rotating magnetic field of vacuum chamber to be enclosed within on the flange cover or body of heater pipeline outside the target, between flange cover or the body of heater pipeline by insulation protection.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, flange cover or body of heater pipeline adopt non-magnetic stainless steel to make, and flange cover or body of heater pipeline are hollow structure, logical water coolant protection; Coaxial between generation device of rotating magnetic field, flange cover or body of heater pipeline and the target three, generation device of rotating magnetic field flange overlap or the body of heater pipeline on the position adjustable.
The arc ion plating arc source of the rotatingfield control of described adjustable speed amplitude modulation, in the generation device of rotating magnetic field, the frequency of electric current is reconciled by frequency transformer, the size of voltage is reconciled by voltate regulator, in the space that magnetic pole surrounds, produce adjustable-speed, dynamic rotatingfield that intensity is adjustable on the target surface, speed is reconciled by the magnetizing current frequency, and intensity is reconciled by the magnetizing current size.
Dynamic rotation controlling magnetic field generating unit of the present utility model has following characteristics:
1. the generation of rotatingfield of the present utility model is passed through at target surrounding space (in the vacuum chamber or outside the vacuum chamber), employing differs certain homogeneous angular, several (the 4n that interconnect, n 〉=1 or 3n, n 〉=1) magnetic pole (high-permeability material) is evenly distributed on the same circumference, and adopt two-phase (90 ° of phase differential) simple alternating current or three-phase (120 ° of phase differential) simple alternating current excitation to power in proper order to the magnet coil (winding) that is enclosed within on the magnetic pole or be embedded in the groove crack between the adjacent pole, the frequency of electric current is reconciled by frequency transformer, the size of voltage is reconciled by voltate regulator, thereby in the space that magnetic pole surrounds, produce adjustable-speed (reconciling) on the target surface, the dynamic rotatingfield that intensity is adjustable (reconciling by the magnetizing current size) by the magnetizing current frequency.The utility model is by the motion of the rotatingfield control arc spot of adjustable speed amplitude modulation, can improve the discharge type and the job stability of arc spot, improve target etching homogeneity and target utilization, reduce the oarse-grained emission of target, in order to prepare high-quality film and function film, expand the range of application of arc ion plating.
The form of rotatingfield is by the installation site decision of magnet coil and magnetic pole (skeleton), be joined together to form whole magnetic circuit passage between the magnetic pole of the present utility model, generation device of rotating magnetic field can be installed in the vacuum chamber around the target, and the flange that perhaps is enclosed within outside the target puts.Magnet coil can be enclosed within on the magnetic pole (main for the less design of number of poles) or be embedded in the winding that forms various wiring forms in the groove crack between the adjacent pole according to certain rule.The generation device of rotating magnetic field of different modes has different characteristics, can select according to existence conditions.
2. generation device of rotating magnetic field outward appearance of the present utility model is circular or square, be positioned over target around, coaxial with target, the effective area, magnetic field is around target surface, device can be positioned in the vacuum chamber or outside the vacuum chamber.Polar cylinder or the square body of being shaped as, polar end shape is straight flange or arc.
3. the magnetic pole number of generation device of rotating magnetic field of the present utility model is that 4n or 3n (n 〉=1) are individual, the magnetic pole symmetry is evenly distributed in and connects on the magnet ring, magnetic pole and magnet ring form the electromagnetic circuit skeleton of an integral body, the material of skeleton is made of the material (electrical pure iron or synergetic punching press siliconized plate) of high magnetic permeability, size (the internal diameter of skeleton, external diameter, polar size) according to target size, magnetic pole number and mounting means design, the thickness of skeleton is unrestricted, can produce effectively field region for well.The polar size that is placed on the generation device of rotating magnetic field in the vacuum chamber is according to the size decision of the space between number and generation device of rotating magnetic field and the target, and the polar size that is placed on the outer generation device of rotating magnetic field of vacuum chamber is according to the size decision of the space between number and generation device of rotating magnetic field and the flange.
4. the magnet coil of generation device of rotating magnetic field of the present utility model can be enclosed within on the magnetic pole (less for number of poles, the situation that the space allows) or by the motor stator winding regularity of distribution be embedded in the groove crack between the adjacent pole (for the more situation of number of poles, be generally 6n, n 〉=2).Generally adopt the siliconized plate jet-bedding that iron loss is little, magnetic property good, thickness is 0.35～0.5mm to be overrided to form for the more skeleton of number of poles, the surface of siliconized plate scribbles insullac, and internal circular surfaces dashes equally distributed groove, and winding coil embeds in groove.Flute profile has forms such as opening, half opening, semi-closed port.
5. be enclosed within situation on the magnetic pole for magnet coil, coil is divided into two groups (for the magnetic pole number are 4n, n 〉=1 situation) or three groups (for the magnetic pole number is 3n, n 〉=1 situation), and relative coil is one group, and coil on the same group is connected into a galvanic circle.The electric current of relative on the same group coil (has only oppositely for the coil that is divided into three groups) in the same way or oppositely, but must guarantee that not series system on the same group is the same, just on the same group the sense of current of relative coil all is not in the same way or oppositely (all is reverse for the coil that is divided into three groups).It is the three phase sine AC power excitation that 90 ° two-phase sinusoidal ac or phase differential are 120 ° that the magnet coil of two groups or three groups adopts phase differential respectively; For situation in the groove crack that is embedded in by the motor stator winding regularity of distribution between the adjacent pole, the magnetizing current of winding employing phase differential is 120 ° three-phase alternating current source forcing.Be divided into three groups coil and be embedded in the groove crack winding and can use Y type or △ (trilateral) connection.
6. the magnet coil of generation device of rotating magnetic field of the present utility model adopts enameled wire to twine or the rule making, the winding around shape that is enclosed within on the magnetic pole is consistent with polar shape, the line of coil footpath, size, the number of turn are unrestricted, allow to make according to the space, the thickness of coil is less than polar length.Be embedded in winding coil in the magnetic pole groove can be single or and around rule, the line of winding footpath, size, the number of turn are unrestricted, with loosening for well at the groove internal fixing.Between coil and the skeleton by insulation protection.The magnet coil that is positioned over the generation device of rotating magnetic field in the vacuum chamber adopts QZY-2 high temperature varnish envelope curve to make the high temperature material of F that insulating material is used or H level.Place the outer generation device of rotating magnetic field of vacuum chamber without limits.
7. generation device of rotating magnetic field of the present utility model position can be reconciled, control power supply power supply by a cover frequency modulation and voltage modulation, the frequency of electric current is reconciled by frequency transformer, the size of voltage is reconciled by voltate regulator, by the speed of frequency modulation conciliation rotatingfield, reconcile the intensity size of rotatingfield by pressure regulation.
8. the two-phase excitation electric current of generation device of rotating magnetic field of the present utility model is by the two-phase frequency transformer, and voltate regulator is reconciled, and forms or by three phase converter, three-phase regulator is reconciled and drawn by the Scott transformer then by single-phase thunder shake phase (electric capacity splits phase).Three-phase excitation current of the present utility model is by three phase converter, and three-phase regulator is reconciled.
9. for situation in the groove crack that is embedded in by the motor stator winding regularity of distribution between the adjacent pole, the form of winding rule is unrestricted, and the layout in the groove crack can adopt layouts such as individual layer, bilayer, single two-layer hybrid; The mode of connection of winding overhang can adopt folded formula or ripple formula; The end shape of winding can adopt chain type, staggered form, concentric type and folded formula etc.Different rule modes can produce the rotatingfield of different numbers of poles and form.
10. the utility model places the outer generation device of rotating magnetic field of vacuum chamber to be enclosed within on the flange cover or body of heater pipeline outside the target; and between flange cover or the body of heater pipeline by insulation protection; flange cover or body of heater pipeline adopt non-magnetic stainless steel to make; flange cover or body of heater pipeline are hollow structure, logical water coolant protection.Coaxial between generation device of rotating magnetic field, flange cover or body of heater pipeline and the target three, generation device of rotating magnetic field flange overlap or the body of heater pipeline on the position adjustable.
The utlity model has following advantage:
1, the utility model has been broken through traditional static or quasi-static arc source Magnetic Field Design and mechanical dynamic magnetic field mentality of designing, a kind of arc ion plating arc source of rotatingfield control spots moving novel, adjustable speed amplitude modulation is provided, the discharge type and the job stability of arc spot have been realized improving, the movement locus and the speed of control arc spot, target etching homogeneity and target utilization have been improved, reduced the oarse-grained emission of target, satisfy the demand for preparing high-quality film and function film, expanded the range of application of arc ion plating.
2, the way of realization of generation device of rotating magnetic field of the present utility model and scheme are abundant, the rule mode that is embedded in the coil in the groove crack between the adjacent pole by the motor stator winding regularity of distribution is many, can produce the rotatingfield of different numbers of poles, different shape, realize the diversity of control spots moving, for the arc source of exploring new application of arc ion plating and exploitation different structure provides convenience.
3, generation device of rotating magnetic field of the present utility model can provide the rotation transverse magnetic field that covers whole target surface, target in conjunction with certain geometry, can realize the arc spot to remain on motion in the target surface and when can not go to target surface and cause blow-out outward, make the arc spot in whole target surface etching rather than be limited in the certain location place and form the etching track.And reduced concentrating of discharge power, and the discharge power dispersive is distributed on the whole target surface, realized the distributed arc discharge, broken through the magnetic field structure shortcoming of conventional arc ion plating and the restriction of application, obtained new progress and various possibility.
4, generation device of rotating magnetic field of the present utility model is by the control power supply power supply of a cover frequency modulation and voltage modulation, power frequency and adjustable size, provide speed of rotation and the size all can be separately or the rotatingfield of the conciliation of consonance, for the motion of controlling the arc spot provides multiple possibility.
5, the generation device of rotating magnetic field position outside being positioned over vacuum chamber is adjustable in the utility model, and the pyritous restriction has been avoided in the logical water coolant protection of flange.The independent making between generation device of rotating magnetic field and the flange, installing/dismounting is easy, only need put in the time of usefulness to get final product.
6, the arc ion plating arc source of rotatingfield of the present utility model control cooperates the focusing magnetic field that is applied near being used to pulsed bias on the sample, the sample and increases ion density to use jointly, can enlarge the scope of adjusting parameter, for the film for preparing different performance provides condition.Simultaneously, can reach the requirement of preparation high-quality thin film by adjusting parameter.
7, the generation device of rotating magnetic field in the arc ion plating arc source of rotatingfield control of the present utility model is with low cost, good looking appearance, and easy and simple to handle, the parameter variable range is big, is easy to scientific research field and industrial applying.
Description of drawings
Fig. 1 (a)-Fig. 1 (d) is the influence synoptic diagram of different magnetic field component to spots moving.Wherein, Fig. 1 (a) is for applying the transverse magnetic field that is parallel to cathode target surface; Fig. 1 (b) is the influence (reversing motion) of transverse magnetic field to the motion of arc spot; Fig. 1 (c) intersects sharp magnetic field at an angle for applying with cathode surface; Fig. 1 (d) is the influence (wedge angle rule) of sharp magnetic field to the motion of arc spot.
Fig. 2 is for producing the principle schematic of rotatingfield.
Fig. 3 (a)-Fig. 3 (b) is the synoptic diagram of embodiment 1 generation device of rotating magnetic field.Wherein, Fig. 3 (a) is the generation device of rotating magnetic field of two-phase alternating current excitation; Fig. 3 (b) is the generation device of rotating magnetic field of three-phase alternating current excitation;
Fig. 4 is the pilot circuit synoptic diagram of two-phase generation device of rotating magnetic field.
Fig. 5 (a)-Fig. 5 (b) is the transient magnetic field distributed mode graphoid that embodiment 1 generation device of rotating magnetic field produces.
Fig. 6 (a)-Fig. 6 (b) is the synoptic diagram in the arc ion plating arc source of embodiment 2 rotatingfields control.Wherein, Fig. 6 (a) is the generation device of rotating magnetic field synoptic diagram; Fig. 6 (b) is the synoptic diagram of position between generation device of rotating magnetic field and the target.
Fig. 7 (a)-Fig. 7 (d) is embodiment 2 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.
Fig. 8 is embodiment 3 generation device of rotating magnetic field synoptic diagram.
Fig. 9 (a)-Fig. 9 (d) is embodiment 3 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.
Figure 10 is embodiment 4 generation device of rotating magnetic field synoptic diagram.
Figure 11 (a)-Figure 11 (d) different transient magnetic field distributed mode graphoids constantly that are embodiment 4 generation device of rotating magnetic field in half current cycle.
Figure 12 (a)-Figure 12 (b) is the synoptic diagram of embodiment 5,6 generation device of rotating magnetic field.Wherein, Figure 12 (a) is the skeleton synoptic diagram of generation device of rotating magnetic field; The principle schematic that Figure 12 (b) takes place for rotatingfield.
Figure 13 (a)-Figure 13 (b) is the winding rule distribution schematic diagram of embodiment 5,6 generation device of rotating magnetic field.Wherein, Figure 13 (a) is 24 grooves, 2 utmost point individual layer concentric type winding cloth wiring scheme of embodiment 5; Figure 13 (b) is 24 grooves, 4 utmost point individual layer chain type winding cloth wiring scheme of embodiment 6.
Figure 14 (a)-Figure 14 (f) is embodiment 5 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.
Figure 15 is the pilot circuit synoptic diagram of three phase rotating field generating unit.
Figure 16 (a)-Figure 16 (b) is the movement locus synoptic diagram of arc spot under the rotation transverse magnetic field; Wherein, the spiral extension movement track of Figure 16 (a) arc spot; The screw-pinch movement locus of Figure 16 (b) arc spot.
Figure 17 is the acute angle synoptic diagram that the sensing target surface that forms is intersected on rotation transverse magnetic field magnetic line of force and target target edge.
Figure 18 (a)-Figure 18 (f) is embodiment 6 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.
Figure 19 (a)-Figure 19 (b) is the synoptic diagram of embodiment 7 generation device of rotating magnetic field.Wherein, Figure 19 (a) is the sandwich structure synoptic diagram that forms between generation device of rotating magnetic field, flange cover and the target three, and Figure 19 (b) is the side-view of Figure 19 (a).
Among the figure, 1 arc spot; 2 targets; 3 magnetic conductive poles; 4 magnetic guiding loops; 5 coils; 6 generation device of rotating magnetic field; 7 groove cracks; 8 spots moving tracks; 9 flanges; 10 magnetic poles.
Embodiment
Distribution plan below by embodiment and rotatingfield is described in further detail the utility model.
Embodiment 1:
Fig. 3 (a)-Fig. 3 (b) is the synoptic diagram of embodiment 1 generation device of rotating magnetic field of the present utility model.Wherein, Fig. 3 (a) is the generation device of rotating magnetic field of two-phase alternating current excitation; Fig. 3 (b) is the generation device of rotating magnetic field of three-phase alternating current excitation; Shown in Fig. 3 (a)-Fig. 3 (b) structure, symmetrically four or six magnetic conductive poles 3 of installation around the cylinder target 2 in vacuum chamber, rectangular or obtuse angle, two limits of magnetic conductive pole, being shaped as of magnetic conductive pole square or circular (this example is for square), size is according to the size decision of the space between target and the body of heater, and magnetic conductive pole is installed on the target shielding case (shielding case punching) on every side.Magnetic conductive pole 3 bottoms are connected on the magnetic guiding loop 4, and magnetic conductive pole 3 and magnetic guiding loop 4 form the electromagnetic circuit skeleton of an integral body, and the material of skeleton is made of the material (electrical pure iron or synergetic punching press siliconized plate) of high magnetic permeability.The top end of magnetic conductive pole 3 is straight flange or arc, and symmetric sensing target 2 centers, the zone between the top are the service areas that produces rotatingfield.The height of magnetic conductive pole is no more than target surface with the base, top and is advisable.
The coil 5 identical with magnetic conductive pole 3 numbers is installed in the middle portion of magnetic conductive pole 3; shape is consistent with the shape of magnetic conductive pole 3, and the line of coil footpath, size, the number of turn are unrestricted, allow to make according to the space; the thickness of coil is less than polar length, between coil and the skeleton by insulation protection.Coil adopts QZY-2 high temperature varnish envelope curve to make the high temperature material of F that insulating material is used or H level.Relative magnetic conductive pole 3 and coil 5 are one group, four magnetic conductive pole locus differ 90 °, be divided into two groups, six magnetic conductive pole locus differ 60 °, be divided into three groups, coil on the same group is connected into a galvanic circle, makes the electric current in the same way or oppositely (corresponding different Distribution of Magnetic Field) of relative on the same group coil, but must guarantee that not series system on the same group is the same, just on the same group the sense of current of relative coil all is not in the same way or oppositely.It is the three phase sine ac power supply that 90 ° two-phase sinusoidal ac or phase differential are 120 ° that the magnet coil of two groups or three groups adopts phase differential respectively.
Fig. 4 is the pilot circuit synoptic diagram of two-phase generation device of rotating magnetic field.Two-phase simple alternating current magnetizing current is by the two-phase frequency transformer, and voltate regulator is reconciled, and by 90 ° of single-phase thunder shake phases (electric capacity splits phase), can obtain phase differential and be 90 ° frequency adjustable, the two-phase of adjustable amplitude value.One of two groups of coils terminate to the common port of two-phase excitation electric current, just can obtain adjustable-speed by reconciling, 2 utmost points that intensity is adjustable (reversal of current of relative coil) or magnetic field, 4 pole tip angle (electric current of relative coil is in the same way), thus realization is to effective control of arc spot.
Three groups of coils of six magnetic conductive poles can adopt Y type or delta connection, and remaining three joints are by frequency adjustable, and the three phase sine AC-powered of adjustable amplitude value just can obtain adjustable-speed, the rotatingfield that intensity is adjustable by reconciling.
Embodiment 2:
Fig. 6 (a)-Fig. 6 (b) is the synoptic diagram in the arc ion plating arc source of embodiment 2 rotatingfields control.Wherein, Fig. 6 (a) is generation device of rotating magnetic field 6 synoptic diagram.Embodiment 2 also is the generation device of rotating magnetic field that is positioned over the two-phase electric control in the vacuum chamber, but as shown in the figure, four magnetic poles 10 are evenly distributed on the main body magnetic conduction passage of round sealed, form the electromagnetic circuit skeleton of an integral body, polar be shaped as square or circular, size is according to the decision of the size of the spatial between main body magnetic conduction passage and the target 2, and the material of skeleton is made of the material (electrical pure iron or synergetic punching press siliconized plate) of high magnetic permeability.The top end of magnetic pole 10 is straight flange or arc, symmetric sensing target 2 centre of surfaces.Fig. 6 (b) is the synoptic diagram of position between generation device of rotating magnetic field 6 and the target 2.Generation device of rotating magnetic field 6 and target 2 coaxial placements, the position can be reconciled, and forms effective rotatingfield zone with target surface and is advisable.
Identical with embodiment 1, four coils 5 are installed on four magnetic poles 10, and shape is consistent with polar shape; the line of coil footpath, size, the number of turn are unrestricted; allow to make according to the space, the thickness of coil is less than polar length, between coil and the skeleton by insulation protection.Coil adopts QZY-2 high temperature varnish envelope curve to make the high temperature material of F that insulating material is used or H level.Relative magnetic pole and coil are one group, coil on the same group is connected into a galvanic circle, make the electric current in the same way or oppositely (corresponding different Distribution of Magnetic Field) of relative on the same group coil, but must guarantee that not series system on the same group is the same, just on the same group the sense of current of relative coil all is not in the same way or oppositely.Adopt the pilot circuit of two-phase generation device of rotating magnetic field shown in Figure 4, the two-phase excitation electric current is by the two-phase frequency transformer, and voltate regulator is reconciled, by 90 ° of single-phase simple alternating current thunder shake phases (electric capacity splits phase), obtain phase differential and be 90 ° frequency adjustable, the two-phase of adjustable amplitude value.One of two groups of coils terminate to the common port of two-phase excitation electric current.Just can obtain adjustable-speed, 2 utmost points that intensity is adjustable (reversal of current of relative coil) or magnetic field, 4 pole tip angle (electric current of relative coil in the same way) by reconciling.Thereby realize effective control to the arc spot.
Fig. 7 (a)-Fig. 7 (d) is embodiment 2 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.Be 2 pole fields among the figure, magnetic field is along with the cycle variation of electric current constantly is being rotated as can be seen.But DISTRIBUTION OF MAGNETIC FIELD also is uneven, some constantly the magneticstrength at magnetic pole place greater than the magneticstrength of target center, and the different form differences in magnetic field constantly, but the rotatingfield that this generation device of rotating magnetic field produces is parallel with target surface, form the rotation transverse magnetic field that covers target surface, be the transverse magnetic field skewness, form is changeable.Can be used for influence or the less demanding industrial circle of the rotation transverse magnetic field of scientific research field research skewness to depositing operation.
Embodiment 3:
Accompanying drawing 8 is embodiment 3 generation device of rotating magnetic field synoptic diagram of the present utility model.Identical with embodiment 2, embodiment 3 also is the generation device of rotating magnetic field that is positioned over the two-phase electric control in the vacuum chamber.Skeleton structure as different from Example 2, embodiment 3 has eight magnetic poles 10 to be evenly distributed on the main body magnetic conduction passage of round sealed, forms the electromagnetic circuit skeleton of an integral body.Position between the material of polar shape, size, skeleton, generation device of rotating magnetic field skeleton and the target etc. is all identical with embodiment 2.Generation device of rotating magnetic field 6 also is coaxial placement with target 2, and the position can be reconciled, and forms effective rotatingfield zone with target surface and is advisable.The top end of magnetic pole 10 is straight flange or arc, symmetric sensing target 2 centre of surfaces.The requirement of the line footpath of coil, size, the number of turn, material, shape, insulation protection is identical with embodiment 2.
Have eight coils 5 to be installed on eight magnetic poles 10 as different from Example 2, between coil and the skeleton by insulation protection.Adjacent two magnetic poles and coil (eight magnetic pole and coil be divided into 4 pairs) are cascaded, make coil electric current in the same way, produce same polar magnetic field.The 4 pairs of magnetic poles and coil are divided into two groups, relative 2 pairs of magnetic poles and coil are one group, coil on the same group is connected into a galvanic circle, make the electric current in the same way or oppositely (corresponding different Distribution of Magnetic Field) of relative on the same group coil, but must guarantee that not series system on the same group is the same, just on the same group the sense of current of relative coil all is not in the same way or oppositely.The same pilot circuit that adopts two-phase generation device of rotating magnetic field shown in Figure 4, two-phase simple alternating current magnetizing current is by the two-phase frequency transformer, and voltate regulator is reconciled, by 90 ° of single-phase thunder shake phases (electric capacity splits phase), obtain phase differential and be 90 ° frequency adjustable, the two-phase of adjustable amplitude value.One of two groups of coils terminate to the common port of two-phase excitation electric current.Just can obtain adjustable-speed by reconciling, 2 utmost points that intensity is adjustable (reversal of current of relative coil) or magnetic field, 4 pole tip angle (electric current of relative coil is in the same way), thus realization is to effective control of arc spot.
Fig. 9 (a)-Fig. 9 (d) is embodiment 3 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.Be 2 pole fields among the figure, magnetic field is along with the cycle variation of electric current constantly is being rotated as can be seen.And DISTRIBUTION OF MAGNETIC FIELD is more even as different from Example 2, the magneticstrength at magnetic pole place and the magneticstrength of target center are more or less the same, the form in different magnetic fields constantly is basic identical, the rotatingfield that embodiment 3 generation device of rotating magnetic field produce is also parallel with target surface, form the rotation transverse magnetic field that covers target surface, transverse magnetic field distributes more even, if that size is done is bigger, make target be arranged in uniform transverse magnetic field zone, just can produce the rotation transverse magnetic field that covers target surface more uniformly.Can be used for influence or some industrial circle of scientific research field research rotation transverse magnetic field to depositing operation.
Embodiment 4:
Figure 10 is the synoptic diagram of the utility model embodiment 4 generation device of rotating magnetic field.Different with embodiment 2,3, embodiment 4 is the generation device of rotating magnetic field that are positioned over the three-phase electricity control in the vacuum chamber.Embodiment 3 has six magnetic poles to be evenly distributed on the main body magnetic conduction passage of round sealed, forms the electromagnetic circuit skeleton of an integral body.Position between the material of polar shape, size, skeleton, generation device of rotating magnetic field skeleton and the target etc. is all identical with embodiment 2.Generation device of rotating magnetic field 6 also is coaxial placement with target 2, and the position can be reconciled, and forms effective rotatingfield zone with target surface and is advisable.The top end of magnetic pole 10 is straight flange or arc, symmetric sensing target material surface center.The requirement of the line footpath of coil, size, the number of turn, material, shape, insulation protection is identical with embodiment 2.
Have six coils 5 to be installed on six magnetic poles 10 as different from Example 2, between coil and the skeleton by insulation protection.Relative magnetic pole and coil are one group, six magnetic poles and coil are divided into three groups, coil on the same group is connected into a galvanic circle, make the reversal of current of relative on the same group coil, the magnetic field that polarization is opposite, series system on the same group is not the same, and just on the same group the sense of current of relative coil is not reverse.Three groups of coils can adopt Y type or delta connection, and remaining three joints are by frequency adjustable, and adjustable amplitude value, phase differential are 120 ° three phase sine AC-powered, just can obtain adjustable-speed, the rotatingfield that intensity is adjustable by reconciling.
Figure 11 (a)-Figure 11 (d) different transient magnetic field distributed mode graphoids constantly that are embodiment 4 generation device of rotating magnetic field in half current cycle.As can be seen, among the figure 2 pole fields, magnetic field is along with the cycle variation of electric current constantly is being rotated.And different with embodiment 2,3 be that DISTRIBUTION OF MAGNETIC FIELD is more even, particularly at the center of generation device of rotating magnetic field, the position of target, magnetic field configuration is almost constant, is evenly distributed.The rotatingfield that embodiment 4 generation device of rotating magnetic field produce is parallel with target surface, forms the uniform rotation transverse magnetic field that covers target surface.Can be used for influence or the most of industrial circle of scientific research field research rotation transverse magnetic field to depositing operation and film performance.
Embodiment 5:
Analyze the rotatingfield analog result of comparing embodiment 2,3,4, the number of magnetic poles of generation device of rotating magnetic field has very big influence to the DISTRIBUTION OF MAGNETIC FIELD homogeneity as can be seen, and magnetic pole is many more, and it is tight more even to distribute, and the rotatingfield of generation is also even more.Adopting phase differential is that 120 ° three phase sine AC-powered is that the rotatingfield that produces of 90 ° two-phase sinusoidal ac power supply is even than phase differential, phase differential is that 90 ° two-phase electricity needs single-phasely split phase (the Scott transformer does not need, but the cost height), there is very big error, makes that the rotatingfield form that produces is changeable, inhomogeneous.Phase differential is that 120 ° three phase sine alternating-current can directly be taken at electrical network, is distributed symmetrically, and has satisfied the condition that produces Rotating with Uniform magnetic field.
The utility model is further innovated, proposed the identical and three phase sine alternating-current control that phase place is different of frequency multipole (being generally 6n, n 〉=2) generation device of rotating magnetic field mentality of designing and be committed to practice.For the many situations of number of poles, the scheme that adopts winding around to be enclosed within on the magnetic pole is infeasible, must adopt by the motor stator winding regularity of distribution to be embedded in the groove crack between the adjacent pole.
Figure 12 (a) is embodiment 5 generation device of rotating magnetic field synoptic diagram.Generation device of rotating magnetic field 6 also is coaxial placement with target 2, and the position can be reconciled, and forms effective rotatingfield zone with target surface and is advisable.The skeleton of the generation device of rotating magnetic field among the utility model embodiment has 24 magnetic poles 10 and groove crack 7.Skeleton generally adopts the siliconized plate jet-bedding that iron loss is little, magnetic property good, thickness is 0.35～0.5mm to be overrided to form, and the surface of siliconized plate scribbles insullac, and internal circular surfaces dashes equally distributed groove, and winding coil embeds in groove crack 7.Flute profile has forms such as opening, half opening, semi-closed port (being opening among the figure).Winding is embedded in the skeleton shown in Figure 12 (a), and the form of winding rule is a lot, and the layout in the groove crack can adopt layouts such as individual layer, bilayer, single two-layer hybrid; The mode of connection of winding overhang can adopt folded formula or ripple formula; The end shape of winding can adopt chain type, staggered form, concentric type and folded formula etc.Different rule modes can produce the rotatingfield of different numbers of poles (2,4,6,8 utmost point) and form.Figure 13 (a)-Figure 13 (b) is respectively two kinds of different winding rule modes.What the utility model embodiment adopted is 24 grooves, 2 utmost point individual layer concentric type winding cloth scott connections shown in Figure 13 (a), and winding was made up of several big or small coils that pitch does not wait in the same utmost point was organized mutually, and each coil loop in the utmost point is organized mutually is around the same center of circle.Figure 15 is the pilot circuit synoptic diagram of three phase rotating field generating unit.Three phase sine AC excitation electric current is by three phase converter, wave filter, and three-phase regulator is reconciled, and just can obtain phase differential and be 120 ° frequency adjustable, the three phase sine alternating-current of adjustable amplitude value.Winding can adopt Y type or delta connection, remaining three joints are by frequency adjustable, and adjustable amplitude value, phase differential are 120 ° three phase sine AC-powered, just can obtain adjustable-speed by reconciling, the uniform rotatingfield that intensity is adjustable, thus realization is to effective control of arc spot.
The principle schematic that Figure 12 (b) takes place for rotatingfield.As can be seen when feeding the three-phase symmetrical current in three phase windings, in the skeleton of generation device of rotating magnetic field, will produce a rotatingfield, when the three-phase symmetrical current was finished the variation of one-period (for 2 pole fields), the resultant magnetic field that they produced had also just rotated a week in the space.Obviously, the variation that tri-phase current goes round and begins again in time, and the rotation that is not also just stopping by the resultant magnetic field that tri-phase current produced.
Figure 14 (a)-Figure 14 (f) is embodiment 5 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.Along with the variation of current cycle, in the space of skeleton, can produce very even, the constant rotatingfield of form as can be seen.And because generation device of rotating magnetic field of the present utility model is coaxial with target, the magnetic field of generation covers fully and is parallel to whole target surface, and just this magnetic field is the rotation transverse magnetic field that is parallel to target surface that covers target surface uniformly fully.By different magnetic field the arc spot influenced rule as can be known, transverse magnetic field can make the arc spot do the reversing motion of contrary Ampere force, because the transverse magnetic field among the utility model embodiment is in continuous rotation, and speed and intensity size can be regulated, therefore can make the spiral motion on whole target surface of arc spot, Figure 16 (a)-Figure 16 (b) is the movement locus synoptic diagram of arc spot under the rotation transverse magnetic field; Wherein, the spiral extension movement track (spots moving track 8) of Figure 16 (a) arc spot; The screw-pinch movement locus (spots moving track 8) of Figure 16 (b) arc spot, the preceding half cycle and the second half of correspondence and rotatingfield respectively.The speed of spots moving can be by the speed of rotation in magnetic field and the size adjustment control in magnetic field.The utility model has been realized the etching motion of arc spot at whole target surface, target etching homogeneity and utilization ratio have been improved, simultaneously, improved the discharge type of arc spot effectively, if control proper, can realize new discharge type, disperse concentrating of discharge effectively, reduce the oarse-grained emission of drop.
The used target material structure of the utility model has certain target edge, the rotation transverse magnetic field that produces can intersect with the target edge, form the acute angle that points to target surface, Figure 17 is the sharp angle synoptic diagram of the target of rotation transverse magnetic field magnetic line of force and target 2 along the crossing sensing target surface that forms.By the different magnetic field component to spots moving influence rule (acute angle rule) as can be known, the arc spot will be limited in the target surface and be unlikely to go to target surface and cause arc extinguishing outward.Therefore, the target utilization has been satisfied in comprehensive action of the present utility model, discharge of arc spot and the various requirement of using.
The generation device of rotating magnetic field of the utility model embodiment is coaxial with target, and the effective area, magnetic field is around target surface, can be placed in the vacuum chamber or outside the vacuum chamber.The generation device of rotating magnetic field magnetic pole 10 of the utility model embodiment and groove crack 7 numbers are that 6n (n 〉=2) is individual, and present embodiment is 24.The winding coil of the utility model embodiment can be single or and around rule, the line of winding footpath, size, the number of turn are unrestricted, with loosening for well at the groove internal fixing.Between coil and the skeleton by insulation protection.The magnet coil that is positioned over the generation device of rotating magnetic field in the vacuum chamber adopts QZY-2 high temperature varnish envelope curve to make the high temperature material of F that insulating material is used or H level.Place the outer generation device of rotating magnetic field of vacuum chamber without limits.The generation device of rotating magnetic field position of the utility model embodiment can be moved.Place the outer generation device of rotating magnetic field of vacuum chamber to be enclosed within on the flange cover or body of heater pipeline outside the target; and between flange cover or the body of heater pipeline by insulation protection; flange cover or body of heater pipeline adopt non-magnetic stainless steel to make; flange cover or body of heater pipeline are hollow structure, logical water coolant protection.Coaxial between generation device of rotating magnetic field, flange cover or body of heater pipeline and the target three, generation device of rotating magnetic field flange overlap or the body of heater pipeline on the position adjustable.
The utility model embodiment application widely and scientific research and the industrial every field that needs the raising film quality and effectively control spots moving.
Embodiment 6:
Identical with embodiment 5, adopt the skeleton structure of same generation device of rotating magnetic field, shown in Figure 12 (a), same material (skeleton, coil, insulation) requirement, same power supply mode and pilot circuit, same mounting means etc.Different is that embodiment 6 adopts 24 grooves, 4 utmost point individual layer chain type winding cloth scott connections shown in the accompanying drawing 13 (c), and winding is made up of the single layer coil with same widths and shape, and its end such as cover are obtained end ring.Because different rule modes can form the magnetic field of different shape, Figure 18 (a)-Figure 18 (f) is embodiment 6 generation device of rotating magnetic field different transient magnetic field distributed mode graphoids constantly in a current cycle.As can be seen, what present embodiment produced is 4 pole fields of the rotation of an adjustable speed amplitude modulation, dredge outer close in the Distribution of Magnetic Field, form is constant, be covered in whole target surface and parallel fully with target surface, just the distribution at target surface is a close rotation transverse magnetic field outside interior the dredging, and can realize the different mode of motion of arc spot and the control of form, can be applied to influence and industrial some field to discharge of arc spot and depositing operation, the magnetic field of this form of scientific research.
Embodiment 7:
It is exactly arc spot discharge formation in its vicinity high-temperature zone that arc ions is coated with an important characteristic, can be radiated the elsewhere of vacuum chamber simultaneously, and the space of vacuum chamber is limited, space around the target also is limited, if therefore thinking is confined to will be difficult in the space limited in the vacuum chamber break through when carrying out the design of arc source.Rotatingfield for the control spots moving designs especially, generation device of rotating magnetic field is positioned over the words around the target in the vacuum chamber, can relate to the restriction of size, material etc., though under the situation of conditions permit, can obtain reasonable effect, but need the big area deposition for industrial production, under the situation of long term operation, will be restricted.In the face of more extensive simple application, need new innovation and breakthrough.
The skeleton of the generation device of rotating magnetic field among the utility model embodiment 7 has 24 magnetic poles 10 and groove crack 7; between target base and vacuum chamber duct wall, add a flange 9; shown in Figure 19 (a)-Figure 19 (b); flange 9 adopts non-magnetic stainless steel to make; flange is hollow tubular structure; external diameter is consistent with the external diameter of target 2 bases, and internal diameter is consistent with the internal diameter of vacuum chamber pipeline, the logical water coolant protection of flange.Generation device of rotating magnetic field 6 is enclosed within on the flange 9 outside the target 2, and between the flange cover by insulation protection.Coaxial between generation device of rotating magnetic field, flange cover and the target three, the sandwich structure of formation shown in Figure 19 (a), generation device of rotating magnetic field is adjustable in the position that flange puts.
The utility model embodiment application widely and scientific research and the industrial every field that needs the raising film quality and effectively control spots moving are the present utility model embodiment that we are implementing and are preparing to promote.
Claims (10)
1, a kind of arc ion plating arc source of rotatingfield control of adjustable speed amplitude modulation, it is characterized in that: be provided with generation device of rotating magnetic field at the target surrounding space, generation device of rotating magnetic field differs certain homogeneous angular for adopting, the even cloth of several magnetic poles that interconnects is on same circumference, number of magnetic poles is 4n or 3n, n 〉=1, form the electromagnetic circuit skeleton of an integral body, magnet coil is enclosed within on the magnetic pole or is embedded in the groove crack between the adjacent pole, the three phase excitation that two-phase that the employing phase differential is 90 ° or phase differential are 120 ° is powered in proper order, produces adjustable rotatingfield in the space that magnetic pole surrounds.
2, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 1, it is characterized in that: the generation device of rotating magnetic field outward appearance is for circular or square, be positioned over target around, coaxial with target, the effective area, magnetic field is around target surface, and generation device of rotating magnetic field is positioned in the vacuum chamber or outside the vacuum chamber, the generation device of rotating magnetic field position is adjustable, polar cylinder or the square body of being shaped as, polar end shape is straight flange or arc.
3, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 1, it is characterized in that: generation device of rotating magnetic field is symmetrically installation magnetic conductive pole around the target, rectangular or obtuse angle, two limits of magnetic conductive pole, being shaped as of magnetic conductive pole is square or circular, the magnetic conductive pole bottom is connected on the magnetic guiding loop, and magnetic conductive pole and magnetic guiding loop form the electromagnetic circuit skeleton of an integral body; The magnet coil identical with the magnetic conductive pole number is installed in the middle portion of magnetic conductive pole, and the shape of shape and magnetic conductive pole is consistent, between magnet coil and the skeleton by insulation protection.
4, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 1, it is characterized in that: generation device of rotating magnetic field is that magnetic pole is evenly distributed on the main body magnetic conduction passage of round sealed, form the electromagnetic circuit skeleton of an integral body, the material of skeleton is made of the material electrical pure iron or the synergetic punching press siliconized plate of high magnetic permeability, polar be shaped as square or circular, polar top end is straight flange or arc, symmetric sensing target material surface center; Magnet coil is enclosed within on the magnetic pole or is embedded between the adjacent pole in the groove crack, and the magnet coil identical with the magnetic pole number is installed on the magnetic pole, and shape is consistent with polar shape, between magnet coil and the skeleton by insulation protection.
5, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 1, it is characterized in that, when magnet coil was enclosed within on the magnetic pole: magnet coil was divided into two groups, number of magnetic poles is 4n, n 〉=1, relative magnet coil is one group, and magnet coil on the same group is connected into a galvanic circle, and the electric current of relative on the same group magnet coil in the same way or oppositely; Perhaps, magnet coil is divided into three groups, and number of magnetic poles is 3n, n 〉=1, and relative magnet coil is one group, magnet coil on the same group is connected into a galvanic circle, the reversal of current of relative on the same group magnet coil.
6, according to the arc ion plating arc source of the rotatingfield of the described adjustable speed amplitude modulation of claim 5 control, it is characterized in that: it is the three phase sine AC power excitation that 90 ° two-phase sinusoidal ac or phase differential are 120 ° that the magnet coil of two groups or three groups adopts phase differential respectively; One of two groups of magnet coils terminate to the common port of two-phase excitation electric current, and the two-phase excitation electric current forms for 90 ° by single-phase thunder shake phase; Perhaps draw three groups of magnet coils Y type or delta connections by the Scott transformer.
7, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 1, it is characterized in that: be embedded in the magnet coil in the groove crack between the adjacent pole, be embedded in the groove crack between the adjacent pole by the motor stator winding regularity of distribution, the magnetizing current employing phase differential of winding is 120 ° three-phase alternating current source forcing, winding Y type or delta connection; Layout in the groove crack adopts individual layer, bilayer or single two-layer hybrid to arrange, the mode of connection of winding overhang adopts folded formula or ripple formula, the end shape of winding adopts chain type, staggered form, concentric type or folded formula, and different rule modes produces the rotatingfield of different numbers of poles and form.
8, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 2; it is characterized in that: place the outer generation device of rotating magnetic field of vacuum chamber to be enclosed within on the flange cover or body of heater pipeline outside the target, between flange cover or the body of heater pipeline by insulation protection.
9, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 8 is characterized in that: flange cover or body of heater pipeline adopt non-magnetic stainless steel to make, and flange cover or body of heater pipeline are hollow structure, and logical water coolant is protected; Coaxial between generation device of rotating magnetic field, flange cover or body of heater pipeline and the target three, generation device of rotating magnetic field flange overlap or the body of heater pipeline on the position adjustable.
10, the arc ion plating arc source of controlling according to the rotatingfield of the described adjustable speed amplitude modulation of claim 1, it is characterized in that: in the generation device of rotating magnetic field, the frequency of electric current is reconciled by frequency transformer, the size of voltage is reconciled by voltate regulator, in the space that magnetic pole surrounds, produce adjustable-speed, dynamic rotatingfield that intensity is adjustable on the target surface, speed is reconciled by the magnetizing current frequency, and intensity is reconciled by the magnetizing current size.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200116741U CN201162037Y (en) | 2008-03-21 | 2008-03-21 | Rotating magnetic field operated electrical arc ion arc plating source capable of governing speed and range |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200116741U CN201162037Y (en) | 2008-03-21 | 2008-03-21 | Rotating magnetic field operated electrical arc ion arc plating source capable of governing speed and range |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101363115B (en) * | 2008-03-21 | 2011-11-23 | 中国科学院金属研究所 | Arc source of rotary magnetron arc ion plating |
| CN102758186A (en) * | 2011-04-26 | 2012-10-31 | 中国科学院金属研究所 | Electric arc ion plating apparatus |
| CN109365128A (en) * | 2018-11-08 | 2019-02-22 | 大连交通大学 | Magnetic particle field flow separator and method based on rotating excitation field |
-
2008
- 2008-03-21 CN CNU2008200116741U patent/CN201162037Y/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101363115B (en) * | 2008-03-21 | 2011-11-23 | 中国科学院金属研究所 | Arc source of rotary magnetron arc ion plating |
| CN102758186A (en) * | 2011-04-26 | 2012-10-31 | 中国科学院金属研究所 | Electric arc ion plating apparatus |
| CN102758186B (en) * | 2011-04-26 | 2014-07-09 | 中国科学院金属研究所 | Electric arc ion plating apparatus |
| CN109365128A (en) * | 2018-11-08 | 2019-02-22 | 大连交通大学 | Magnetic particle field flow separator and method based on rotating excitation field |
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