CN201144276Y - Plasma evaporation coating machine - Google Patents
Plasma evaporation coating machine Download PDFInfo
- Publication number
- CN201144276Y CN201144276Y CNU200720117837XU CN200720117837U CN201144276Y CN 201144276 Y CN201144276 Y CN 201144276Y CN U200720117837X U CNU200720117837X U CN U200720117837XU CN 200720117837 U CN200720117837 U CN 200720117837U CN 201144276 Y CN201144276 Y CN 201144276Y
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- CN
- China
- Prior art keywords
- vacuum chamber
- chamber body
- plated film
- film vacuum
- contained
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000008020 evaporation Effects 0.000 title claims abstract description 46
- 238000001704 evaporation Methods 0.000 title claims abstract description 46
- 238000000576 coating method Methods 0.000 title claims abstract description 22
- 239000011248 coating agent Substances 0.000 title claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 230000007246 mechanism Effects 0.000 claims abstract description 7
- 238000009413 insulation Methods 0.000 claims description 20
- 229910001120 nichrome Inorganic materials 0.000 claims description 12
- 230000008878 coupling Effects 0.000 abstract 2
- 238000010168 coupling process Methods 0.000 abstract 2
- 238000005859 coupling reaction Methods 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
A plasma evaporation coating machine relates to a vacuum coating machine. Aiming at the problem that the coating quality of the existing evaporation coating machine is difficult to ensure. The utility model discloses an one end dress of intake pipe (2) is in coating film vacuum chamber body (1), be equipped with room door (3) on coating film vacuum chamber body (1) lateral wall, pump package (4) are adorned on coating film vacuum chamber body (1), revolving stage device (5) are adorned in coating film vacuum chamber body (1), slewing mechanism (8) are connected with pivot (6), pivot (6) and revolving stage device (5) rigid coupling, pivot (6) are connected with matching case (10) and radio frequency plasma power (9), radio frequency antenna (12) that are equipped with work piece support function on revolving stage device (5) admittedly, evaporation source electrode (14) are adorned in the centre of coating film vacuum chamber body (1), set up between evaporation source electrode (14) heating wire (15), metal strip or metal rod material (16) have been placed in heating wire (15), the both ends of electrode cable (19) respectively with evaporation source (13) and evaporation source electrode (14) rigid coupling. The utility model discloses can improve plasma utilization ratio, coating film efficiency and rete quality greatly.
Description
Technical field
The utility model relates to a kind of vacuum plating unit, particularly is used for the vacuum plating unit to article coated usefulness of insulating plastics such as PP, PC, PET, PVC.
Background technology
The vacuum plating unit of plated films such as the existing shell that is used for mobile phone, DVD, MP3, PDA, button is made up of vacuum system, evaporation source and fixture system.In order to obtain comprehensive surface property, generally also need to spray layer protecting film behind the plastics plated film, so not only cause coating process flow process complexity, and be difficult to guarantee the quality of rete.Granted publication number for CN 2675685Y, Granted publication day be February 2 in 2005 day, be called the utility model patent of " being added with radio-frequency plasma polymeric evaporation coating machine "; can solve well and aluminize and the protective film coating problem of carrying out with machine, flow process is simple.They have adopted two radio-frequency antennas that symmetry is placed, and are cambered surface or the plane tabular bodies that is composited by stainless steel and red copper.Meeting generation self-biasing effect in the one side radio frequency discharge process can produce sputter effect by force to radio-frequency antenna when work, the particle that sputters out meeting pollution film layer, the quality of reduction plated film; Radio-frequency antenna is placed near vacuum-chamber wall on the other hand, and plasma body to workpiece surface, makes that near the plasma density the workpiece surface is low by diffusion motion, and efficient is not very high in the process of preparation protective membrane.Moreover because the layout of radio-frequency antenna can influence plasma distribution, plasma distribution may not be very even in the vacuum chamber, and there is some difference to make on the work support film quality of the workpiece of different positions.
The utility model content
The purpose of this utility model provides a kind of plasma evaporation coating equipment, and it can solve existing evaporation coating machine and have the problem that the film quality of different positions is variant on the workpiece, coating quality is difficult to guarantee.
The utility model by plated film vacuum chamber device, fitting device, etc. daughter source apparatus and evaporation source form; Described plated film vacuum chamber device is made up of plated film vacuum chamber body, inlet pipe, chamber door, pump group; Described fitting device is made up of rotation table device, rotating shaft, first insulating part, rotating mechanism, insulation dynamic seal; Described plasma source apparatus is made up of radio-frequency plasma power supply, match box, radio-frequency antenna with work support function; Described evaporation source is made up of evaporation power supply, evaporation source electrode, nichrome wire, metal strip or metal bar, second insulating part, electrode cable; The bottom face that one end of described inlet pipe passes plated film vacuum chamber body is contained in the plated film vacuum chamber body, plated film vacuum chamber body sidewall is provided with the chamber door, the input terminus of described pump group is contained on the sidewall of plated film vacuum chamber body and with plated film vacuum chamber body and is communicated with, described rotation table device is contained on the intravital bottom face of plated film vacuum chamber, the described output terminal that is arranged on the rotating mechanism of external of plated film vacuum chamber is connected by first insulating part with the input terminus of rotating shaft, the output terminal of rotating shaft passes the insulation dynamic seal that is contained in plated film vacuum chamber body bottom face and to be contained in the intravital rotation table device of plated film vacuum chamber affixed, rotating shaft is connected with the output stage of match box with the radio-frequency plasma power supply by the lead that is arranged on external of plated film vacuum chamber, be fixed with radio-frequency antenna on the described rotation table device with work support function, described at least two evaporation source electrodes are contained in the centre of plated film vacuum chamber body, be vertically arranged with the nichrome wire of one group of horizontal positioned between at least two evaporation source electrodes, the two ends of each nichrome wire are connected with the evaporation source electrode, be placed with metal strip or metal bar in each nichrome wire, one end of electrode cable is connected with the two ends of the evaporation power supply that is arranged on external of plated film vacuum chamber, and it is affixed that the other end of electrode cable passes the top of second isolator that is contained on the plated film vacuum chamber body top end face and evaporation source electrode.
The utlity model has following beneficial effect: 1, because radio-frequency antenna itself has the work support function, make work support self as plasma source, plasma body just produces around workpiece, improved workpiece plasma density, plasma body utilization ratio and plated film efficient on every side greatly, and the film quality of different positions is identical.2, in the evaporation coating process, after workpiece surface plated aluminum film or other metallic membranes, workpiece will be in conducting state with work support, and workpiece also becomes the part of radio-frequency antenna.In radio frequency discharge, not only can self produce plasma body, the self-biasing effect that the while produces owing to radio frequency discharge, thereby can produce certain sputter effect to workpiece surface, thus can play the effect of activation workpiece surface, further improve film quality.3, owing to produce plasma excitation on work support, in fact aluminium atom or other atoms of part evaporation also can obtain ionization, thereby increase film-substrate cohesion.4, the utlity model has advantage simple in structure, reliable operation, can satisfy the article coated specification of quality of insulating plastics such as PP, PC, PET, PVC.
Description of drawings
Fig. 1 is an one-piece construction front view of the present utility model; Fig. 2 is the A-A sectional view (pump group 4 and rotation table device 5 do not draw) of Fig. 1; Fig. 3 is the vertical view of gear 24 and ring gear 26 engagements; Fig. 4 is the front view (not drawing in order to the short support 20 of the insulation of steady bearing 22 with in order to the insulation high trestle 21 of support fixation internal wheel 26) of rotation table device.
Embodiment
Embodiment one: in conjunction with Fig. 1～Fig. 3 present embodiment is described, present embodiment by plated film vacuum chamber device, fitting device, etc. daughter source apparatus and evaporation source form; Described plated film vacuum chamber device is made up of plated film vacuum chamber body 1, inlet pipe 2, chamber door 3, pump group 4; Described fitting device is made up of rotation table device 5, rotating shaft 6, first insulating part 7, rotating mechanism 8, insulation dynamic seal 17; Described plasma source apparatus is made up of radio-frequency plasma power supply 9, match box 10, radio-frequency antenna 12 with work support function; Described evaporation source is made up of evaporation power supply 13, evaporation source electrode 14, nichrome wire 15, metal strip or metal bar 16, second insulating part 18, electrode cable 19; The bottom face that one end of described inlet pipe 2 passes plated film vacuum chamber body 1 is contained in the plated film vacuum chamber body 1, plated film vacuum chamber body 1 sidewall is provided with chamber door 3, the input terminus of described pump group 4 is contained on the sidewall of plated film vacuum chamber body 1 and with plated film vacuum chamber body 1 and is communicated with, described rotation table device 5 is contained on the bottom face in the plated film vacuum chamber body 1, the described output terminal that is arranged on the rotating mechanism 8 of plated film vacuum chamber body 1 outside is connected by first insulating part 7 with the input terminus of rotating shaft 6, it is affixed with the rotation table device 5 that is contained in the plated film vacuum chamber body 1 that the output terminal of rotating shaft 6 passes the insulation dynamic seal 17 that is contained in plated film vacuum chamber body 1 bottom face, rotating shaft 6 is connected with the output stage of match box 10 with radio-frequency plasma power supply 9 by the lead that is arranged on plated film vacuum chamber body 1 outside, be fixed with radio-frequency antenna 12 on the described rotation table device 5 with work support function, described at least two evaporation source electrodes 14 are contained in the centre of plated film vacuum chamber body 1, be vertically arranged with the nichrome wire 15 of one group of horizontal positioned between at least two evaporation source electrodes 14, the two ends of each nichrome wire 15 are connected with evaporation source electrode 14, be placed with metal strip or metal bar 16 in each nichrome wire 15, one end of electrode cable 19 is connected with the two ends of the evaporation power supply 13 that is arranged on plated film vacuum chamber body 1 outside, and it is affixed with the top of evaporation source electrode 14 that the other end of electrode cable 19 passes second isolator 18 that is contained on plated film vacuum chamber body 1 top end face.The internal diameter of the plated film vacuum chamber body 1 of present embodiment is Φ 800mm, the high 800mm of being.So be provided with, work support in the existing vacuum plating unit system is connected by the output stage of lead with the radio-frequency plasma power supply, make existing work support not only play the effect of supporting workpiece, meanwhile also play the effect that produces plasma body as radio-frequency antenna.
Embodiment two: in conjunction with Fig. 1 and Fig. 4 present embodiment is described, the rotation table device 5 of present embodiment is made up of the short support 20 of insulation, insulation high trestle 21, clutch shaft bearing 22, turntable 23, gear 24, bearing pack 25, ring gear 26, second bearing 27; Described in order to support the short support 20 of insulation of clutch shaft bearing 22, be packed on the bottom face in the plated film vacuum chamber body 1 in order to the insulation high trestle 21 of support fixation ring gear 26, insulate and clutch shaft bearing 22 and turntable 23 are housed from the bottom to top on the short support 20, on the insulation high trestle 21 ring gear 26 is housed, at least one and ring gear 26 meshed gears 24 are housed in the ring gear 26, be equipped with in the described plated film vacuum chamber body 1 and gear 24 the same number of radio-frequency antennas 12 with work support function, it is affixed with second bearing 27 that is contained in the turntable 23 upper surface circular holes that corresponding gear 24 is passed in each lower end with radio-frequency antenna 12 of work support function, be contained on the radio-frequency antenna with work support function 12 in the turntable 23 upper surface circular holes bearing pack 25 is housed, each has the radio-frequency antenna 12 of work support function with gear 24 is affixed accordingly, and it is affixed with the lower surface that is contained in the turntable 23 in the plated film vacuum chamber body 1 that the output terminal of rotating shaft 6 passes the insulation dynamic seal 17 that is contained on plated film vacuum chamber body 1 bottom face.So be provided with, can guarantee that the radio-frequency antenna 12 with work support function is also carrying out rotation in along with turntable 23 revolution, thereby guarantee that the film quality of different positions is identical on the workpiece.Other composition and annexation are identical with embodiment one.
Embodiment three: in conjunction with Fig. 1 present embodiment is described, the pump group 4 of present embodiment is made up of mechanical pump 28, molecular pump 29, first valve 30, second valve 31, push-pull valve 32, grating valve 33; The input terminus of described mechanical pump 28 is connected with the output terminal of grating valve 33 with molecular pump 29 respectively with second valve 31 by first valve 30, the input terminus of molecular pump 29 is connected with the output terminal of push-pull valve 32, the input terminus of push-pull valve 32 is connected with the output terminal of grating valve 33, and the input terminus of grating valve 33 is communicated with plated film vacuum chamber body 1.Simple in structure, reliable operation so is set.Other composition and annexation are identical with embodiment one.
Embodiment four: in conjunction with Fig. 1 and Fig. 3 present embodiment is described, present embodiment be contained at least one gear 24 in the ring gear 26 along the circle distribution of ring gear 26.So be provided with, can improve the stability of rotation table device.Other composition and annexation are identical with embodiment one.
Embodiment five: in conjunction with Fig. 3 present embodiment is described, six and ring gear 26 meshed gears 24 are housed in the ring gear 26 of present embodiment.So be provided with, not only can make things convenient for putting of workpiece, also improved working efficiency simultaneously.Other composition and annexation are identical with embodiment one or four.
Claims (5)
1, a kind of plasma evaporation coating equipment, it by plated film vacuum chamber device, fitting device, etc. daughter source apparatus and evaporation source form; It is characterized in that described plated film vacuum chamber device is made up of plated film vacuum chamber body (1), inlet pipe (2), chamber door (3), pump group (4); Described fitting device is made up of rotation table device (5), rotating shaft (6), first insulating part (7), rotating mechanism (8), insulation dynamic seal (17); Described plasma source apparatus is made up of radio-frequency plasma power supply (9), match box (10), radio-frequency antenna (12) with work support function; Described evaporation source is made up of evaporation power supply (13), evaporation source electrode (14), nichrome wire (15), metal strip or metal bar (16), second insulating part (18), electrode cable (19); The bottom face that one end of described inlet pipe (2) passes plated film vacuum chamber body (1) is contained in the plated film vacuum chamber body (1), plated film vacuum chamber body (1) sidewall is provided with chamber door (3), the input terminus of described pump group (4) is contained on the sidewall of plated film vacuum chamber body (1) and with plated film vacuum chamber body (1) and is communicated with, described rotation table device (5) is contained on the interior bottom face of plated film vacuum chamber body (1), the described output terminal that is arranged on the rotating mechanism (8) of plated film vacuum chamber body (1) outside is connected by first insulating part (7) with the input terminus of rotating shaft (6), it is affixed with the rotation table device (5) that is contained in the plated film vacuum chamber body (1) that the output terminal of rotating shaft (6) passes the insulation dynamic seal (17) that is contained in plated film vacuum chamber body (1) bottom face, rotating shaft (6) is connected with the output stage of match box (10) with radio-frequency plasma power supply (9) by the lead that is arranged on plated film vacuum chamber body (1) outside, be fixed with radio-frequency antenna (12) on the described rotation table device (5) with work support function, described at least two evaporation source electrodes (14) are contained in the centre of plated film vacuum chamber body (1), be vertically arranged with the nichrome wire (15) of one group of horizontal positioned between at least two evaporation source electrodes (14), the two ends of each nichrome wire (15) are connected with evaporation source electrode (14), be placed with metal strip or metal bar (16) in each nichrome wire (15), one end of electrode cable (19) is connected with the two ends of the evaporation power supply (13) that is arranged on plated film vacuum chamber body (1) outside, and it is affixed with the top of evaporation source electrode (14) that the other end of electrode cable (19) passes second isolator (18) that is contained on plated film vacuum chamber body (1) top end face.
2, a kind of plasma evaporation coating equipment according to claim 1 is characterized in that described rotation table device (5) is made up of insulation short support (20), insulation high trestle (21), clutch shaft bearing (22), turntable (23), gear (24), bearing pack (25), ring gear (26), second bearing (27); Described in order to support the short support of insulation (20) of clutch shaft bearing (22), insulation high trestle (21) in order to support fixation ring gear (26) is packed on the interior bottom face of plated film vacuum chamber body (1), insulate and clutch shaft bearing (22) and turntable (23) are housed from the bottom to top on the short support (20), on the insulation high trestle (21) ring gear (26) is housed, at least one and ring gear (26) meshed gears (24) are housed in the ring gear (26), be equipped with in the described plated film vacuum chamber body (1) and the same number of radio-frequency antenna (12) of gear (24) with work support function, it is affixed with second bearing (27) that is contained in the circular hole of turntable (23) upper surface that corresponding gear (24) is passed in each lower end with radio-frequency antenna (12) of work support function, be contained on the radio-frequency antenna with work support function (12) in the circular hole of turntable (23) upper surface bearing pack (25) is housed, each has the radio-frequency antenna (12) of work support function with gear (24) is affixed accordingly, and it is affixed with the lower surface that is contained in the turntable (23) in the plated film vacuum chamber body (1) that the output terminal of rotating shaft (6) passes the insulation dynamic seal (17) that is contained on plated film vacuum chamber body (1) bottom face.
3, a kind of plasma evaporation coating equipment according to claim 1 is characterized in that described pump group (4) is made up of mechanical pump (28), molecular pump (29), first valve (30), second valve (31), push-pull valve (32), grating valve (33); The input terminus of described mechanical pump (28) is connected with the output terminal of grating valve (33) with molecular pump (29) respectively with second valve (31) by first valve (30), the input terminus of molecular pump (29) is connected with the output terminal of push-pull valve (32), the input terminus of push-pull valve (32) is connected with the output terminal of grating valve (33), and the input terminus of grating valve (33) is communicated with plated film vacuum chamber body (1).
4, a kind of plasma evaporation coating equipment according to claim 2 is characterized in that the described circle distribution that is contained in interior at least one gear (24) of ring gear (26) along ring gear (26).
5, a kind of plasma evaporation coating equipment according to claim 4 is characterized in that being equipped with in the described ring gear (26) six and ring gear (26) meshed gears (24).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200720117837XU CN201144276Y (en) | 2007-12-28 | 2007-12-28 | Plasma evaporation coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200720117837XU CN201144276Y (en) | 2007-12-28 | 2007-12-28 | Plasma evaporation coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201144276Y true CN201144276Y (en) | 2008-11-05 |
Family
ID=40081148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU200720117837XU Expired - Fee Related CN201144276Y (en) | 2007-12-28 | 2007-12-28 | Plasma evaporation coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201144276Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104313545A (en) * | 2014-09-26 | 2015-01-28 | 马瑞利汽车零部件(芜湖)有限公司 | Storage rack of aluminizing machine |
| CN109553306A (en) * | 2018-12-04 | 2019-04-02 | 深圳市星三力光电科技有限公司 | A kind of glass touch screen cover board Vacuum Deposition AR, AF optical film processing unit (plant) |
| CN111218661A (en) * | 2019-12-31 | 2020-06-02 | 四川荣塑管业集团有限责任公司 | Vacuum coating machine |
| CN111254397A (en) * | 2020-03-06 | 2020-06-09 | 上海良勤实业有限公司 | Sputtering aluminum plating system and process for car lamp decorative ring |
-
2007
- 2007-12-28 CN CNU200720117837XU patent/CN201144276Y/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104313545A (en) * | 2014-09-26 | 2015-01-28 | 马瑞利汽车零部件(芜湖)有限公司 | Storage rack of aluminizing machine |
| CN109553306A (en) * | 2018-12-04 | 2019-04-02 | 深圳市星三力光电科技有限公司 | A kind of glass touch screen cover board Vacuum Deposition AR, AF optical film processing unit (plant) |
| CN109553306B (en) * | 2018-12-04 | 2021-09-14 | 深圳市星三力光电科技有限公司 | Glass touch screen cover plate vacuum plating AR, AF optical film processingequipment |
| CN111218661A (en) * | 2019-12-31 | 2020-06-02 | 四川荣塑管业集团有限责任公司 | Vacuum coating machine |
| CN111218661B (en) * | 2019-12-31 | 2022-04-29 | 四川荣塑管业集团有限责任公司 | Vacuum coating machine |
| CN111254397A (en) * | 2020-03-06 | 2020-06-09 | 上海良勤实业有限公司 | Sputtering aluminum plating system and process for car lamp decorative ring |
| CN111254397B (en) * | 2020-03-06 | 2022-02-11 | 上海良勤实业有限公司 | Sputtering aluminum plating system and process for car lamp decorative ring |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081105 Termination date: 20161228 |
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| CF01 | Termination of patent right due to non-payment of annual fee |