CN201063094Y - Modularized laser straight nicking device - Google Patents
Modularized laser straight nicking device Download PDFInfo
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- CN201063094Y CN201063094Y CN 200720072320 CN200720072320U CN201063094Y CN 201063094 Y CN201063094 Y CN 201063094Y CN 200720072320 CN200720072320 CN 200720072320 CN 200720072320 U CN200720072320 U CN 200720072320U CN 201063094 Y CN201063094 Y CN 201063094Y
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Abstract
The utility model relates to a modularized laser light direct incising device. The complete device adopts modularized design, which consists of a laser light modulating module, a light spot scanner, a laser light power detecting module, an automatic focusing module and a control and detecting module. The parallel laser light emitted from the laser is converged by the system into light spot focusing on the sample surface waiting for incising. The intensity of the laser light shooting to the sample surface can be controlled by computer and the sample movement can be controlled by computer at the same time, thereby the two dimensional figure with gray value distribution is formed in the sample surface. The utility model enables the direct forming of nano structure on the surface of optical or thermal resistance film material without mask, which has the characteristics of short processing period, high flexibility, wide application scale, high modularization degree, high precision processing and strong expansibility, etc.
Description
Technical field
The utility model relates to the nanoprocessing field, particularly a kind of modularized laser scribing device.
Background technology
At present just develop photoetching technique apace, satisfied the requirement that the characteristic dimension of micro-nano device further dwindles to a certain extent along the technology path of ultraviolet-deep ultraviolet-extreme ultraviolet.Yet the mask expense that is caused accounts for the problem that the total cost ratio is constantly ascended to heaven because personalization, short run and the update cycle of product shorten, and is still perplexing semicon industry.
The nanometer maskless photoetching technology is a kind of photoetching technique that need not mask, at the nanometer structure that can directly on light or thermal resistance membraneous material, form any shape of tens nanometer level under the control of computing machine, can obtain the relative configurations of conductor, semiconductor and insulator by the pattern inversion technique, can obtain widespread use in fields such as the nanofeature yardstick mask of nano-electrode, nanometer circuit, biologic medical nano-device, ultra-large circuit, microelectromechanical systems (MEMS) device, binary optical devices.The nanometer maskless photoetching technology has catered to the development trend that micro-nano device is made, and can overcome present photoetching technique because the mask cost constantly increases the difficulty of being brought.
Formerly in the technology, a kind of laser, direct-write integrated circuit production system is arranged (referring to patent of invention " laser, direct-write integrated circuit production system ", application number: 911016414).Adopt the rotation polygon prism to change the direction of light path in this system, then become luminous point to scan inscription beam convergence by f-θ lens.There is suitable advantage in this system, but range of application is comparatively narrow, only can be used in the integrated circuit manufacturing, and following deficiency is arranged in addition:
When 1, the sweep limit of f-θ lens combination was big, focal spot was also bigger; Focal spot hour, sweep limit is also little, and the two can't be taken into account, and has limited the range of application of this system.
2, do not have the automatic focus module in the system, be difficult to guarantee that sample surfaces is positioned at the object lens focal depth range all the time, can't guarantee to inscribe precision then.
Summary of the invention
The purpose of this utility model is to overcome the deficiency of above-mentioned technology formerly, and a kind of modularized laser scribing device is provided, and it should have degree of modularity height, the process-cycle is short, dirigibility is high, applied widely, characteristics such as machining precision is high and extendability is strong.
Basic design of the present utility model is:
A kind of modularized laser scribing device, package unit adopts modular design, is made of Laser Modulation module, spot scan module, laser power detection module, automatic focus module, control and detection module.The parallel laser that system sends laser instrument is converged to luminous point and focuses on sample surfaces to be inscribed, and the control sample moves in the laser intensity of control directive sample surfaces, can form the X-Y scheme with intensity profile at sample surfaces.
Technical solution of the present utility model is as follows:
A kind of modularized laser scribing device is characterized in that it is made of Laser Modulation module, spot scan module, laser power detection module, automatic focus module and control detection module:
Described Laser Modulation module comprises laser instrument and places acousto-optic modulator, first polarization spectroscope, first quarter-wave plate, beam expanding lens on the shoot laser direction of this laser instrument, wherein the long axis direction of first quarter-wave plate and polarization of incident light direction are at 45, and first polarization spectroscope and first quarter-wave plate constitute optoisolator;
Described spot scan module comprises spectrum spectroscope, object lens piezoelectric ceramic actuator, microcobjective, sample to be written, two-dimensional nano platform and one dimension motorized precision translation stage, described microcobjective is fixed on the described object lens piezoelectric ceramic actuator, sample to be written is fixed on the described two-dimensional nano platform, and this two-dimensional nano platform is fixed on again on the one dimension motorized precision translation stage;
Described laser power detection module comprises convergent lens and optical power detector;
Described automatic focus module is made up of semiconductor laser, second quarter-wave plate, second polarization spectroscope, optical filter, sphere convergent lens, cylinder convergent lens and four-quadrant photo detector, described second quarter-wave plate, second polarization spectroscope, optical filter, sphere convergent lens, cylinder convergent lens and four-quadrant photo detector and described spectrum spectroscope (201), microcobjective, the same optical axis of sample to be written;
Described control and detection module comprise a computing machine, this input end and computer links to each other with the output terminal of optical power detector and the output terminal of four-quadrant photo detector respectively, and the output terminal of this computing machine links to each other with laser instrument, acousto-optic modulator, object lens piezoelectric ceramic actuator, one dimension motorized precision translation stage and the control end of two-dimensional nano platform respectively.
Wherein the spectrum spectroscope has high reflectance to the laser that laser instrument sends, and is high permeability to the light of other wavelength, and microcobjective is fixed on the object lens piezoelectric ceramic actuator, and the object lens piezoelectric ceramic actuator can prolong optical path direction and carry out moving of nano-precision.Example platform is fixed on the two-dimensional nano platform, and the two-dimensional nano platform is fixed on the one dimension motorized precision translation stage.The two-dimensional nano platform is at the two dimensional motion that can make nano-precision under the control of computing machine in the plane perpendicular to optical path direction.The one dimension electric platforms can be done in a big way along optical path direction under the control of computing machine and move, to make things convenient for the clamping of sample.The laser beam that this module will be inscribed usefulness is converged to luminous point at sample surfaces, and controls sample and move along pre-determined route, realizes the scanning of luminous point at sample surfaces.
Described laser power detection module comprises convergent lens and optical power detector.Wherein power detector links to each other with computing machine, and the electric signal that characterizes luminous power is gathered by computing machine.This module monitors sees through the power of the spectroscopical a small amount of laser of spectrum, and with its power sampling as the inscription laser of spectrum spectroscope reflection, the output power of FEEDBACK CONTROL laser instrument after this signal of computer acquisition realizes that the laser power of directive sample surfaces keeps stable purpose.
Described automatic focus module is made up of semiconductor laser, second polarization spectroscope, second quarter-wave plate, optical filter, sphere convergent lens, cylinder convergent lens, four-quadrant photo detector.Wherein semiconductor laser sends the red line polarized light, and the major axis of second quarter-wave plate and the polarization direction of ruddiness are at 45, and second quarter-wave plate and second polarization spectroscope constitute isolator to ruddiness.Optical filter has high-transmission rate to ruddiness, and is almost nil to the optical transmission rate of other wavelength.This module realizes microcobjective is assembled the purpose that the luminous point that forms remains at sample surfaces, guarantees that with this line thickness and the degree of depth inscribed are consistent.
Described control and detection module comprise a computing machine.Laser instrument, acousto-optic modulator, one dimension motorized precision translation stage, two-dimensional nano platform, one dimension object lens piezoelectric ceramic actuator in this computer control, and detect the electric signal of optical power detector and four-quadrant photo detector.The signal of this module acquisition system each several part carries out each actuator in the control system after the analysis and judgement, coordinates other each module and carries out associative operation, realizes the purpose of systemic-function.
The course of work of the present utility model is:
The laser that laser instrument sends is by behind the acousto-optic modulator diffraction, and its positive one-level light is polarized the Amici prism reflection, then through directive spot scan module behind first quarter-wave plate and the beam expanding lens.This first polarization splitting prism and first quarter-wave plate constitute optoisolator, can the return laser light device from the sample surfaces laser light reflected.
The laser that laser instrument sends after expanding bundle through beam expanding lens, directive spectrum spectroscope.This spectrum spectroscope has high reflectance to the laser that laser instrument sends, and participates in inscribing so most laser is entered object lens by its reflection, and other has small part laser to be assembled by convergent lens after the transmission of spectrum spectroscope, and luminous point drops on the photodetector.Photodetector produces electric signal, and this electric signal amplifies the back by computer acquisition through amplifier, inscribes the power sampling of the laser of sample as participation in the system.
Be focused at sample surfaces from spectrum spectroscope laser light reflected by microcobjective, when the two-dimensional nano platform drives under the control of sample at computing machine when moving by pre-determined route, sample surfaces will be inscribed pre-designed pattern down.
In the imprinting process, be focused at sample surfaces all the time for guaranteeing the luminous point of inscribing usefulness, guarantee this point by the automatic focus module in the system.
The course of work of specifically, automatic focus module is as follows:
The red line polarization laser that semiconductor laser sends is polarized spectroscope reflection back and sees through quarter-wave plate and spectrum spectroscope, is focused at sample surfaces by microcobjective, through the sample reflection, returns along original optical path again.The red laser that this semiconductor laser sends is polarization vertically, the long axis direction of second quarter-wave plate is 45 ° with the angle of vertical direction, after seeing through, red laser becomes circularly polarized light, and from becoming the linearly polarized light of horizontal direction after the sample surfaces laser light reflected sees through second quarter-wave plate again, this light can see through second polarization spectroscope.The spectrum spectroscope has high-transmission rate to ruddiness, and ruddiness is not had influence substantially.The red laser that sees through second polarization spectroscope is assembled by spherical lens and cylindrical lens, and hot spot drops on the four-quadrant photo detector, and the light distribution of this hot spot on 4 quadrant detector is focussing error signal.4 quadrant detector is converted into electric signal with this focussing error signal, and after gathered by computing machine after the circuit amplification, computing machine carries out computing to this signal, and control one dimension motorized precision translation stage and object lens piezoelectric ceramic actuator, adjust the distance of microcobjective and sample surfaces, sample surfaces is on the focal plane of this microcobjective all the time.The laser of the inscription usefulness that the microcobjective that adopts in the system sends for laser instrument and the redness that semiconductor laser sends focusing laser have the same focal length, so system focuses under the sample surfaces situation at ruddiness, the laser that imprinting is used equally also can focus on sample surfaces.
Compare with technology formerly, the utlity model has following advantage:
1, the utility model has increased the automatic focus module, all can guarantee accurate focusing under static and current intelligence, has guaranteed the inscription precision.
2 utilize the light beam of another wavelength to carry out the focusing error detection, and the performance of focusing error detecting self is improved, and its work does not influence photoetching, can work all the time in principle; Help modularization; Photoetching process adaptability is strengthened;
3, package unit adopts modular design, and is easy to maintenance, and apparatus function is easy to expand upgrading, and each module can also be used for other device separately.
4, adopt high vertically aperture micro objective in this device, thereby reduced the size of measuring point, can process high-precision nano-scale figure.
5, adopt high precision nanometer platform as moving component in the system, because the resolution height, and have closed loop position feedback structure, can carry out accurate focusing action and displacement action.
6, system light path has independence with the sample scan module, can adopt the mode of changing scanning platform to obtain the inscription figure of different range and different accuracy, and system has very big dirigibility and practicality.
Description of drawings
Fig. 1 is the light path synoptic diagram of the utility model modularized laser scribing device.
Fig. 2 inscribes control flow chart for the utility model device
Embodiment
The utility model is described in further detail below in conjunction with drawings and Examples.
See also Fig. 1 earlier, Fig. 1 is the light path synoptic diagram of the utility model modularized laser scribing device.As seen from the figure, the utility model modularized laser scribing device is made of Laser Modulation module 1, spot scan module 2, laser power detection module 3, automatic focus module 4, control and detection module 5:
Described Laser Modulation module 1 comprises laser instrument 101 and the acousto-optic modulator 102, first polarization spectroscope 103, first quarter-wave plate 104, the beam expanding lens 105 that place on this laser light path direction.The vertical curve polarized light that laser instrument 101 sends is reflected by first polarization splitting prism 103 by positive one-level behind acousto-optic modulator 102 diffraction or negative one-level light, then sees through first quarter-wave plate 104 and the described spot scan module 2 of beam expanding lens 105 back directives.45 ° of the long axis direction of first quarter-wave plate 104 and the angles of vertical direction, laser by after become circularly polarized light, this laser is back by sample 204 surface reflections to be written by spot scan module 2, laser returns along former road, become the polarized light of level once more by first quarter-wave plate 104, go out from 103 transmissions of first polarization spectroscope, can not turn back in the laser instrument 101.
Described spot scan module 2 comprises spectrum spectroscope 201, object lens piezoelectric ceramic actuator 202, microcobjective 203, sample to be written 204, two-dimensional nano platform 205 and one dimension motorized precision translation stage 206.Microcobjective 203 is fixed on the object lens piezoelectric ceramic actuator 202, and object lens piezoelectric ceramic actuator 202 drives microcobjective 203 and carries out moving of nano-precision along optical path direction.Sample 204 to be written is fixed on the two-dimensional nano platform 205, and this two-dimensional nano platform 205 is fixed on the one dimension motorized precision translation stage 206.This two-dimensional nano platform 205 is made the two dimensional motion of nano-precision in the plane perpendicular to optical path direction under the control of computing machine 501.One dimension electric platforms 206 can be done in a big way along optical path direction under the control of computing machine 501 and move, with the clamping of convenient sample 204 to be written.The laser that laser instrument 101 sends after expanding bundle through beam expanding lens 105, directive spectrum spectroscope 201.The laser that 201 pairs of laser instruments 101 of this spectrum spectroscope send has high reflectance, participates in imprintings so most laser is entered object lens 203 by its reflection, and other has small part laser directive power detecting module 3 after 201 transmissions of spectrum spectroscope.
Described laser power detecting module 3 comprises convergent lens 302 and photodetector 301.The laser of directive power detecting module 3 is assembled by convergent lens 302, and luminous point drops on the photodetector 301.This photodetector 301 produces electric signal and amplifies the back by computing machine 501 collections through amplifier, power sampling as the laser that participates in the inscription sample in the system, this signal of system acquisition is used for the output power of FEEDBACK CONTROL laser instrument 101, to suppress the power excursion of laser instrument, guarantee that the laser power that participates in inscribing keeps stable.
Described automatic focus module 4 is made up of semiconductor laser 401, second quarter-wave plate 402, second polarization spectroscope 403, optical filter 404, sphere convergent lens 405, cylinder convergent lens 406, four-quadrant photo detector 407.Wherein semiconductor laser 401 sends the ruddiness of polarization vertically, by 403 reflections of second polarization spectroscope.The polarization direction of the major axis of second quarter-wave plate 402 and described red line polarized light is at 45, this red line polarization laser becomes circularly polarized light after by second quarter-wave plate 402, be focused at sample surfaces by object lens 203, after the Yan Yuanlu that is reflected again return, become horizontal polarization light after seeing through second quarter-wave plate 402, from 403 transmissions of second polarization spectroscope, see through optical filter 404, be converged to the surface that luminous point drops on four-quadrant photo detector 407 by sphere convergent lens 405 and cylindrical lens 406.404 pairs of ruddiness of optical filter have high-transmission rate, and are almost nil to the optical transmission rate of other wavelength, play the effect that the laser that stops laser instrument 101 to send arrives four-quadrant photo detector 407 surfaces.
Described control and detection module 5 comprise a computing machine 501.The electric signal that this computing machine 501 receives from optical power detector 301 and four-quadrant photo detector 407, and according to the transmitance of the power of the requirement control laser instrument 101 of laser lithography, acousto-optic modulator 102, one dimension motorized precision translation stage 206 the moving on a large scale of optical path direction, two-dimensional nano platform 205 perpendicular to the nano-precision in the plane of optical path direction move and one dimension object lens piezoelectric ceramic actuator 202 in high precision movement along optical path direction.
Annexation between the above each module as shown in Figure 1, the inscription laser that Laser Modulation module 1 is sent enters 2 participation inscriptions in the spot scan module, and there is a small amount of laser power detection module 3 to detect, the light that automatic focus module 4 is sent enters in the spot scan module 2 to realize automatic focus, control and detection module 5 controls also detect above each module, to realize systemic-function.
Below in conjunction with accompanying drawing the detailed process that sample is inscribed in this invention is described.
With sample to be inscribed 204 clampings on example platform 205, computing machine 501 control one dimension motorized precision translation stages 206 move near the focus of object lens 203 then, then open the semiconductor laser 401 of automatic focus module 4, prepare before reality is inscribed sample sample 204 leveling to be written.
The basic process of sample 204 leveling to be written is as follows:
It is regional as inscribing to select certain zone on sample 204 to be written, and selectes 3 unique points as this sample plane on this zone boundary, that is can guarantee that when being in focal plane of lens at these 3 the whole sample plane is all on focal plane of lens.Control two-dimensional nano platform mobile example is positioned under the focus spot of microcobjective 203 its a certain unique point, and the focus error signal joint example platform 205 according to autofocus system is measured is positioned within the focal depth range of object lens 203 this unique point.The adjustment example platform that uses the same method also is in the object lens focal depth range two other unique point on the sample.
After the sample leveling, carry out actual inscription.The inscription process is as follows:
At first computing machine 501 adopts multifunction card output DA simulating signal guide sound photomodulator 102, and making its transmitance to inscription laser is 0, opens the laser instrument 101 of inscribing usefulness afterwards.Computing machine 501 is chosen graphic file to be inscribed and is analyzed, and chooses the optimum path of inscribing, and inscribes sample 204 along the optimal path pointwise.During system a certain specific on inscribing sample, need carry out following operation: computing machine 501 control two-dimensional nano platforms 205 mobile examples are to specified point, computing machine 501 is according to focussing error signal FEEDBACK CONTROL object lens piezoelectric ceramic actuator 202 then, this inscription point on the sample plane accurately is in the focal depth range of object lens 203, then according to the transmitance of targeted graphical at the gray-scale value guide sound photomodulator 102 of this point, allow the surface of inscription laser directive sample 204 of certain intensity, the transmitance of readjusting acousto-optic modulator 102 after a period of time is 0, turn-offs laser.After having inscribed certain point, computing machine 501 control control two-dimensional nano platforms 205 mobile examples repeat said process and inscribe to down a bit, inscribe until sample to finish.
After having inscribed sample along the optimal path pointwise, computing machine 501 control one dimension electric platforms 206 mobile examples 204 just can take off sample afterwards and test or do other purposes away from object lens 203.
Show that through on probation the utility model can be directly in light or thermal resistance in the situation that does not need mask Thin-film material surface forms the nanometer structure, have the process-cycle short, flexibility is high, applied widely, The characteristics such as degree of modularity height, machining accuracy height, extensibility are strong, can be applicable to nano-electrode and The nanofeature yardstick mask of nanometer circuit, biologic medical nano-device, ultra-large circuit, little A plurality of high-technology fields such as electronic mechanical system (MEMS) device, binary optical device.
Claims (1)
1. modularized laser scribing device is characterized in that it is made of Laser Modulation module (1), spot scan module (2), laser power detection module (3), automatic focus module (4) and control detection module (5):
Described Laser Modulation module (1) comprises laser instrument (101) and places acousto-optic modulator (102), first polarization spectroscope (103), first quarter-wave plate (104), beam expanding lens (105) on the shoot laser direction of this laser instrument (101), wherein the long axis direction of first quarter-wave plate (104) and polarization of incident light direction are at 45, and first polarization spectroscope (103) and first quarter-wave plate (104) constitute optoisolator;
Described spot scan module (2) comprises spectrum spectroscope (201), object lens piezoelectric ceramic actuator (202), microcobjective (203), sample to be written (204), two-dimensional nano platform (205) and one dimension motorized precision translation stage (206), described microcobjective (203) is fixed on the described object lens piezoelectric ceramic actuator (202), sample to be written (204) is fixed on the described two-dimensional nano platform (205), and this two-dimensional nano platform (205) is fixed on again on the one dimension motorized precision translation stage (206);
Described laser power detection module (3) comprises convergent lens (302) and optical power detector (301);
Described automatic focus module (4) is by semiconductor laser (401), second quarter-wave plate (402), second polarization spectroscope (403), optical filter (404), sphere convergent lens (405), cylinder convergent lens (406) and four-quadrant photo detector (407) are formed, described second quarter-wave plate (402), second polarization spectroscope (403), optical filter (404), sphere convergent lens (405), cylinder convergent lens (406) and four-quadrant photo detector (407) and described spectrum spectroscope (201), microcobjective (203), the same optical axis of sample to be written (204);
Described control and detection module (5) comprise a computing machine (501), the input end of this computing machine (501) links to each other with the output terminal of optical power detector (301) and the output terminal of four-quadrant photo detector (407) respectively, and the output terminal of this computing machine (501) links to each other with laser instrument (101), acousto-optic modulator (102), object lens piezoelectric ceramic actuator (202), one dimension motorized precision translation stage (206) and the control end of two-dimensional nano platform (205) respectively.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 200720072320 CN201063094Y (en) | 2007-07-10 | 2007-07-10 | Modularized laser straight nicking device |
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| CN 200720072320 CN201063094Y (en) | 2007-07-10 | 2007-07-10 | Modularized laser straight nicking device |
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100463759C (en) * | 2007-07-10 | 2009-02-25 | 中国科学院上海光学精密机械研究所 | Modularized laser scribing device |
| CN101935014A (en) * | 2009-07-02 | 2011-01-05 | 国家纳米科学中心 | Method for preparing nano-lattice based on linear controllability of laser direct writing metal film |
| CN102064464A (en) * | 2010-11-26 | 2011-05-18 | 山西飞虹激光科技有限公司 | Reflected light damage preventing device for high-power semiconductor laser |
| CN102142384A (en) * | 2010-12-02 | 2011-08-03 | 深圳市华星光电技术有限公司 | Metal etching end point detection method and metal etching end point detection machine |
| CN102253605A (en) * | 2011-07-07 | 2011-11-23 | 中国科学院上海光学精密机械研究所 | Multiple parallel laser beam grating direct writing device and grating direct writing method |
| CN102424356A (en) * | 2011-11-24 | 2012-04-25 | 宁波大学 | Device and method for preparing metal nanoparticle microarray chip |
| CN102495534A (en) * | 2011-12-12 | 2012-06-13 | 中国科学院上海光学精密机械研究所 | Galvanometer type laser direct writing photoetching machine |
| CN106773538A (en) * | 2016-11-25 | 2017-05-31 | 天津津芯微电子科技有限公司 | Active Focusing mechanism, light path system and laser direct-write photoetching machine |
| CN108426586A (en) * | 2018-05-21 | 2018-08-21 | 浙江大学 | One kind being based on optical fibre gyro bandwidth test calibration method and calibrating installation |
| WO2020113664A1 (en) * | 2018-12-04 | 2020-06-11 | 中国科学院上海光学精密机械研究所 | Integrated super-resolution laser direct-writing device and direct-writing method |
| CN114924406A (en) * | 2022-07-22 | 2022-08-19 | 北京大学长三角光电科学研究院 | Micro reflector array processing method and system |
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- 2007-07-10 CN CN 200720072320 patent/CN201063094Y/en not_active Expired - Lifetime
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100463759C (en) * | 2007-07-10 | 2009-02-25 | 中国科学院上海光学精密机械研究所 | Modularized laser scribing device |
| CN101935014B (en) * | 2009-07-02 | 2014-01-15 | 国家纳米科学中心 | Method for preparing nano-lattice based on linear controllability of laser direct writing metal film |
| CN101935014A (en) * | 2009-07-02 | 2011-01-05 | 国家纳米科学中心 | Method for preparing nano-lattice based on linear controllability of laser direct writing metal film |
| CN102064464A (en) * | 2010-11-26 | 2011-05-18 | 山西飞虹激光科技有限公司 | Reflected light damage preventing device for high-power semiconductor laser |
| CN102142384A (en) * | 2010-12-02 | 2011-08-03 | 深圳市华星光电技术有限公司 | Metal etching end point detection method and metal etching end point detection machine |
| CN102142384B (en) * | 2010-12-02 | 2013-01-09 | 深圳市华星光电技术有限公司 | Metal etching end point detection method and metal etching end point detection machine |
| CN102253605A (en) * | 2011-07-07 | 2011-11-23 | 中国科学院上海光学精密机械研究所 | Multiple parallel laser beam grating direct writing device and grating direct writing method |
| CN102424356A (en) * | 2011-11-24 | 2012-04-25 | 宁波大学 | Device and method for preparing metal nanoparticle microarray chip |
| CN102424356B (en) * | 2011-11-24 | 2014-05-21 | 宁波大学 | Device and method for preparing metal nanoparticle microarray chip |
| CN102495534B (en) * | 2011-12-12 | 2013-12-25 | 中国科学院上海光学精密机械研究所 | Galvanometer type laser direct writing photoetching machine |
| CN102495534A (en) * | 2011-12-12 | 2012-06-13 | 中国科学院上海光学精密机械研究所 | Galvanometer type laser direct writing photoetching machine |
| CN106773538A (en) * | 2016-11-25 | 2017-05-31 | 天津津芯微电子科技有限公司 | Active Focusing mechanism, light path system and laser direct-write photoetching machine |
| CN108426586A (en) * | 2018-05-21 | 2018-08-21 | 浙江大学 | One kind being based on optical fibre gyro bandwidth test calibration method and calibrating installation |
| WO2020113664A1 (en) * | 2018-12-04 | 2020-06-11 | 中国科学院上海光学精密机械研究所 | Integrated super-resolution laser direct-writing device and direct-writing method |
| US11726407B2 (en) | 2018-12-04 | 2023-08-15 | Shanghai Institute Of Optics And Fine Mechanics, Chinese Academy Of Sciences | Integrated super-resolution laser direct-writing device and direct-writing method |
| CN114924406A (en) * | 2022-07-22 | 2022-08-19 | 北京大学长三角光电科学研究院 | Micro reflector array processing method and system |
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