CN1986213B - 一种磁性耐磨镀膜的制作方法 - Google Patents

一种磁性耐磨镀膜的制作方法 Download PDF

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CN1986213B
CN1986213B CN200510121035.1A CN200510121035A CN1986213B CN 1986213 B CN1986213 B CN 1986213B CN 200510121035 A CN200510121035 A CN 200510121035A CN 1986213 B CN1986213 B CN 1986213B
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萧博元
林志泉
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Abstract

本发明提供一种磁性耐磨镀膜的制作方法，其包括步骤：将一基底在一化学镀镍设备中镀覆一化学镍层；在该化学镍层上镀覆一过渡层；及在一溅镀装置中在该过渡层上溅镀一类金刚石碳层。该方法所制作的镀膜质量好、附着力强、硬度高，耐磨损和耐腐蚀性能良好，并具有一定磁性功能。

Description

一种磁性耐磨镀膜的制作方法
【技术领域】
本发明涉及一种镀膜，特别涉及一种磁性耐磨镀膜及其制作方法。
【背景技术】
类金刚石碳(Diamond-Like Carbon，DLC)是指一系列主要以sp3键结结合的非晶态碳。类金刚石碳膜具有和钻石薄膜相似的高硬度、高导热性、宽光学透过范围、良好的电学性能、高表面光洁度以及良好的耐磨损性能等优良特性，因此，可应用的领域非常广泛，从电子元器件、光学元件、医疗器材到刀具、模具、机械零件等抗磨损的场合，其应用均深具潜力。
类金刚石碳膜应用时，为了降低类金刚石碳膜的内应力及增加其和基底之间的附着力，常采用在类金刚石碳膜和基底之间镀覆中间膜层的方法，通过适当中间膜层的组合，不仅可以使类金刚石碳膜与基底能够牢固附着，而且还可以使类金刚石碳膜的耐磨损和耐腐蚀性能得到进一步提升，甚至可以赋予类金刚石碳膜新特性。
随着科技日益进步发展，未来镀膜材料的应用不仅需要高硬度、耐磨损和耐腐蚀性能好的镀膜，同时也需要镀膜具备更多功能特性，如磁性等，以此来不断拓展类金刚石碳膜的应用领域。
因此，有必要提供一种磁性耐磨镀膜及其制作方法，以期能广泛应用于既需要具有磁性又要求耐磨损和耐腐蚀的领域。
【发明内容】
以下将以实施例说明一种磁性耐磨镀膜及其制作方法。
所述磁性耐磨镀膜，其包括一化学镍层，及一位于该化学镍层表面的类金刚石碳层。
所述磁性耐磨镀膜的制作方法包括以下步骤：将一基底在一化学镀镍设备中镀覆一化学镍层；在该化学镍层上镀覆一过渡层；及在一溅镀装置中在该过渡层上溅镀一类金刚石碳层。
上述镀膜及其制作方法，其优点在于：首先，所形成的多层镀膜结合了化学镍层和类金刚石碳层的优异特性，其硬度高，耐磨损性能和耐腐蚀性良好，并具有一定磁性功能，扩大了类金刚石碳镀膜的应用范围；其次，类金刚石碳层和基底之间的附着力得到进一步提升，延长了镀膜的使用寿命。
【附图说明】
图1是本实施例形成于基底上的磁性耐磨镀膜结构示意图。
图2是本实施例溅镀装置示意图。
图3是本实施例磁性耐磨镀膜的制作方法示意图。
【具体实施方式】
请参阅图1，本实施例所提供的磁性耐磨镀膜20的结构，其设置在基底10上依次包括：一化学镍层12、一过渡层14及一类金刚石碳层16。
该化学镍层12厚度范围为5～50微米。
该中间过渡层14为一优选层，其可以增加类金刚石碳层16和化学镍层12之间的附着力，提升磁性耐磨镀膜20的质量，过渡层14可为单层结构或多层结构，本实施例选用多层结构，该过渡层14包括一第一过渡层141及一第二过渡层142。该第一过渡层141的材质可选自铬、钛或钛化铬，本实施例为铬。该第二过渡层142的材质可选自氮化铬、氮化钛或氮化钛铬，本实施例为氮化铬。
请一并参阅图1、图2和图3，本实施例提供一磁性耐磨镀膜20的制作方法包括以下步骤：
第一步，在基底10上镀覆一化学镍层12。
首先，对基底10进行超音波脱脂和电解脱脂处理，将基底10表面的油脂等有机污物脱除；
其次，将基底10送入到化学镀镍设备中镀覆化学镍层，化学镍，也称无电解镍(Electroless Nickel)，其具有膜层均匀质量好、可镀覆在复杂工件上、具有磁性、耐腐蚀性能佳等特点。化学镀镍的镀液主要为硫酸镍、氯化镍溶液，在与还原剂共存的条件下靠自催化化学反应，在已经脱脂清洗的基底10表面沉积一化学镍层12，厚度范围为5～50微米。
然后，将已经镀覆了化学镍层12的基底10用温水进行清洗，以除去残留在化学镍层12上的化学溶液。
优选地，为了获得质量较好的镀覆质量，在基底10上镀覆化学镍层12之前可先对基底10进行预镀镍处理，在基底10表面形成一预镀镍层。预镀的镀液主要为氯化镍溶液，以2伏特直流电压加到预镀设备上进行预镀镍，预镀时间为30～60秒(s)。
优选地，为了提升化学镍层硬度，可对清洗后的化学镍层12热处理1小时(h)，热处理温度范围为350～450摄氏度(℃)。
第二步，在化学镍层12上镀覆一过渡层14，本步骤为本实施例的优选步骤。本实施例提供的过渡层14包括一第一过渡层141及一第二过渡层142。该第一过渡层141的材质可选自铬、钛或钛化铬，本实施例为铬。该第二过渡层142的材质可选自氮化铬、氮化钛或氮化钛铬，本实施例为氮化铬。
首先，在化学镍层12上镀覆一第一过渡层141，将已经镀覆了化学镍层12的基底10置于一溅镀装置30中。溅镀装置可为射频溅镀装置、直流溅镀装置或交流溅镀装置。
如图2所示的溅镀装置300，其包括：一溅镀腔30、一电源32、一偏压电源34，一第一电极工作台36、一第二电极工作台38，其与第一电极工作台成相对设置，该溅镀腔30的腔体侧壁上设置有一抽气口51、一进气口52，并分别通过一抽气控制阀61、一进气控制阀62进行气流控制。该电源32和第一电极工作台36及第二电极工作台38分别相连，可以选用射频电源、交流电源或直流电源，本实施例选用直流电源。该偏压电源34和第一电极工作台36相连，在第一电极工作台36上施加一负偏压，以负偏压加速正离子向基底10方向运动，该偏压电源34可以选用交流电源或直流电源，本实施例选用直流偏压电源。
基底10置于第一电极工作台36上，将一金属靶材40a置于第二电极工作台38上，该金属靶材40a可以是铬、钛或钛化铬，本实施例选用铬。
开启抽气控制阀61通过抽气口51将溅镀腔30内抽为真空状态，开启第一进气控制阀62通过进气口52通入一惰性气体进入溅镀腔30内，该惰性气体可选用如氩气、氪气、氙气、氡气，本实施例选用氩气。气体流量控制在范围1～100标准毫升/分钟(sccm)。
开启溅镀装置电源32。惰性氩气在电源32作用下形成300～1000瓦特(W)高能氩等离子体轰击金属靶材40a，使靶材表面溅射出原子到达基底101沉积。控制溅镀腔30内的溅镀温度，范围为室温～150摄氏度(℃)。控制溅镀腔30内的溅镀压力，范围为(1～10)×10-5帕斯卡(Pa)。控制溅镀时间，在化学镍层12上形成第一过渡层141，本实施例所形成的第一过渡层141为一金属铬层。
其次，在第一过渡层141上镀覆一第二过渡层142，原理类似于第一过渡层141的形成，仍然使用金属靶材40a，不同之处是需要开启进气控制阀62通过进气口52通入一惰性气体与氮气的混合气体进入溅镀腔30内，该惰性气体可选用如氩气、氪气、氙气、氡气，本实施例选用氩气。混合气体流量控制在范围1～100标准毫升/分钟(sccm)。惰性氩气与氮气的混合气体在电源作用下形成氩等离子体与氮等离子体的混合等离子体轰击金属靶材40a，溅射出的金属原子和氮等离子体反应形成金属氮化物。控制溅镀腔30内的溅镀温度，范围为室温～150摄氏度(℃)。控制溅镀腔30内的溅镀压力，范围为(1～10)×10-5帕斯卡(Pa)。控制溅镀时间，在第一过渡层141上形成第二过渡层142，本实施例所形成的第二过渡层142为一金属氮化铬层。
第三步，在过渡层14上镀覆一类金刚石碳层16。
原理类似于过渡层14的形成，不同之处是更换金属靶材40a为一碳靶材40b，并开启进气控制阀62通过进气口52通入一惰性气体与含氢气体的混合气体进入溅镀腔30内，该惰性气体可选用如氩气、氪气、氙气、氡气，本实施例选用氩气，该含氢气体可选用氢气、甲烷、乙炔，本实施例选用氢气。混合气体流量控制在范围1～100标准毫升/分钟(sccm)。惰性氩气与氢气的混合气体在电源作用下形成氩等离子体与氢等离子体的混合等离子体轰击碳靶材40b，溅射出的碳原子和氢等离子体反应，反应产物最后沉积在过渡层14，本实施例是沉积在过渡层14的第二过渡层142上。控制溅镀腔30内的溅镀温度，范围为室温～150摄氏度(℃)。控制溅镀腔30内的溅镀压力，范围为(1～10)×10-5帕斯卡(Pa)。控制溅镀时间，在第二过渡层142上形成一类金刚石碳层16。
上述镀膜及其制作方法，其优点在于：首先，所形成的多层镀膜由于结合了化学镍层与类金刚石碳层的优异特性，其硬度高，耐磨损性能和耐腐蚀性良好，并具有一定磁性功能，扩大了类金刚石碳膜的应用范围；其次，类金刚石碳层和基底之间的附着力得到进一步提升，延长了镀膜的使用寿命。

Claims (14)

1.一种磁性耐磨镀膜的制作方法，其包括以下步骤：
将一基底在一化学镀镍设备中镀覆一化学镍层；
在该化学镍层上镀覆一过渡层；及
在一溅镀装置中，在该过渡层上溅镀一类金刚石碳层。
2.如权利要求1所述的磁性耐磨镀膜的制作方法，其特征在于，在基底上镀覆化学镍层之前，先在基底表面镀覆一预镀镍层。
3.如权利要求2所述的磁性耐磨镀膜的制作方法，其特征在于，所述预镀镍层的镀覆时间为30～60秒。
4.如权利要求1所述的磁性耐磨镀膜的制作方法，其特征在于，在镀覆化学镍层之后，进一步包括将基底上镀覆的化学镍层在350～450摄氏度下进行热处理的步骤。
5.如权利要求4所述的磁性耐磨镀膜的制作方法，其特征在于，所述热处理时间为1小时。
6.如权利要求1所述的磁性耐磨镀膜的制作方法，其特征在于，所述类金刚石碳层于一惰性气体与含氢气体的混合溅镀气氛下溅镀而成。
7.如权利要求6所述的磁性耐磨镀膜的制作方法，其特征在于，所述惰性气体为氩气、氪气、氙气或氡气。
8.如权利要求6所述的磁性耐磨镀膜的制作方法，其特征在于，所述含氢气体为氢气、甲烷或乙炔。
9.如权利要求1所述的磁性耐磨镀膜的制作方法，其特征在于，所述过渡层是通过将镀覆有化学镍层的基底置于一溅镀装置中溅镀形成的。
10.如权利要求1或9所述的磁性耐磨镀膜的制作方法，其特征在于，溅镀过程中控制通入溅镀装置的形成等离子体气体的流量范围为1～100标准毫升/分钟。
11.如权利要求1或9所述的磁性耐磨镀膜的制作方法，其特征在于，溅镀过程中控制溅镀装置内溅镀温度范围为室温～150摄氏度。
12.如权利要求1或9所述的磁性耐磨镀膜的制作方法，其特征在于，溅镀过程中控制溅镀装置内溅镀压力范围为(1～10)×10-5帕斯卡。
13.如权利要求1所述的磁性耐磨镀膜的制作方法，其特征在于，所述过渡层包括一第一过渡层及一第二过渡层，在该化学镍层上镀覆过渡层时，先在化学镍层上镀覆第一过渡层，该第一过渡层的材质为铬、钛或钛化铬，再在第一过渡层上镀覆第二过渡层，该第二过渡层的材质为氮化铬、氮化钛或氮化钛铬。
14.如权利要求13所述的磁性耐磨镀膜的制作方法，其特征在于，在第一过渡层上镀覆第二过渡层之后，在该第二过渡层上溅镀所述类金刚石碳层。
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