CN1926474A - 确定辐射功率的方法和曝光设备 - Google Patents
确定辐射功率的方法和曝光设备 Download PDFInfo
- Publication number
- CN1926474A CN1926474A CNA2005800064106A CN200580006410A CN1926474A CN 1926474 A CN1926474 A CN 1926474A CN A2005800064106 A CNA2005800064106 A CN A2005800064106A CN 200580006410 A CN200580006410 A CN 200580006410A CN 1926474 A CN1926474 A CN 1926474A
- Authority
- CN
- China
- Prior art keywords
- radiation
- radiation source
- power
- test
- electromagnetic radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 248
- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000012360 testing method Methods 0.000 claims abstract description 140
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 89
- 238000005259 measurement Methods 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 18
- 230000007246 mechanism Effects 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 10
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 230000011514 reflex Effects 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 13
- 238000002310 reflectometry Methods 0.000 description 8
- 238000007670 refining Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2005/003390 WO2006102916A1 (de) | 2005-03-31 | 2005-03-31 | Verfahren zum ermitteln einer strahlungsleistung und eine belichtungsvorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1926474A true CN1926474A (zh) | 2007-03-07 |
CN100476595C CN100476595C (zh) | 2009-04-08 |
Family
ID=35541183
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005800064106A Expired - Fee Related CN100476595C (zh) | 2005-03-31 | 2005-03-31 | 确定辐射功率的方法和曝光设备 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7417736B2 (zh) |
CN (1) | CN100476595C (zh) |
WO (1) | WO2006102916A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109491211A (zh) * | 2017-09-13 | 2019-03-19 | 纽富来科技股份有限公司 | 带电粒子束描绘装置及消隐电路的故障诊断方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2949564C2 (de) | 1979-12-10 | 1981-11-12 | Gerhard Dr. 8012 Ottobrunn Busse | Einrichtung zur Messung der Strahlungsleistung von leisuntgsmodulierten optischen Sendern, insbesondere von Lasern |
US4830486A (en) * | 1984-03-16 | 1989-05-16 | Goodwin Frank E | Frequency modulated lasar radar |
US4828389A (en) * | 1987-04-21 | 1989-05-09 | Smiths Industries | Integrated triad optical rate sensor apparatus |
US5646733A (en) * | 1996-01-29 | 1997-07-08 | Medar, Inc. | Scanning phase measuring method and system for an object at a vision station |
CZ300055B6 (cs) * | 1996-09-05 | 2009-01-21 | Zpusob zjištování fázových a/nebo amplitudových informací o elektromagnetické vlne, fotonový smešovací prvek, usporádání smešovacích prvku a zarízeník provádení tohoto zpusobu | |
JPH1116816A (ja) * | 1997-06-25 | 1999-01-22 | Nikon Corp | 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法 |
US6777684B1 (en) * | 1999-08-23 | 2004-08-17 | Rose Research L.L.C. | Systems and methods for millimeter and sub-millimeter wave imaging |
TW567400B (en) | 2000-11-23 | 2003-12-21 | Asml Netherlands Bv | Lithographic projection apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured by the manufacturing method |
DE10158859B4 (de) | 2001-11-30 | 2004-02-19 | Fachhochschule Hildesheim/Holzminden/Göttingen | Verfahren und Vorrichtung zur Analyse und Überwachung der Lichtintensitätsverteilung über den Querschnitt eines Laserstrahls |
DE10204994B4 (de) * | 2002-02-05 | 2006-11-09 | Xtreme Technologies Gmbh | Anordnung zur Überwachung der Energieabstrahlung einer EUV-Strahlungsquelle |
DE10323664B4 (de) * | 2003-05-14 | 2006-02-16 | Carl Zeiss Smt Ag | Belichtungsvorrichtung mit Dosissensorik |
-
2005
- 2005-03-31 CN CNB2005800064106A patent/CN100476595C/zh not_active Expired - Fee Related
- 2005-03-31 US US10/599,428 patent/US7417736B2/en not_active Expired - Fee Related
- 2005-03-31 WO PCT/EP2005/003390 patent/WO2006102916A1/de not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109491211A (zh) * | 2017-09-13 | 2019-03-19 | 纽富来科技股份有限公司 | 带电粒子束描绘装置及消隐电路的故障诊断方法 |
CN109491211B (zh) * | 2017-09-13 | 2021-02-09 | 纽富来科技股份有限公司 | 带电粒子束描绘装置及消隐电路的故障诊断方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2006102916A1 (de) | 2006-10-05 |
CN100476595C (zh) | 2009-04-08 |
US20080037000A1 (en) | 2008-02-14 |
US7417736B2 (en) | 2008-08-26 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: Munich, Germany Patentee after: Infineon Technologies AG Address before: Munich, Germany Patentee before: Infineon Technologies AG |
|
TR01 | Transfer of patent right |
Effective date of registration: 20120920 Address after: Munich, Germany Patentee after: QIMONDA AG Address before: Munich, Germany Patentee before: Infineon Technologies AG |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20151223 Address after: German Berg, Laura Ibiza Patentee after: Infineon Technologies AG Address before: Munich, Germany Patentee before: QIMONDA AG |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090408 Termination date: 20160331 |
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CF01 | Termination of patent right due to non-payment of annual fee |