CN1921010B - 光电存储器装置及其操作方法 - Google Patents
光电存储器装置及其操作方法 Download PDFInfo
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- CN1921010B CN1921010B CN200610115059.0A CN200610115059A CN1921010B CN 1921010 B CN1921010 B CN 1921010B CN 200610115059 A CN200610115059 A CN 200610115059A CN 1921010 B CN1921010 B CN 1921010B
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- 238000000034 method Methods 0.000 title claims abstract description 17
- 230000005693 optoelectronics Effects 0.000 title claims description 16
- 239000000463 material Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 6
- 230000008569 process Effects 0.000 claims description 5
- 230000009466 transformation Effects 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000002441 reversible effect Effects 0.000 claims description 3
- 230000008859 change Effects 0.000 abstract description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 16
- 238000003860 storage Methods 0.000 description 16
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 15
- 229910052721 tungsten Inorganic materials 0.000 description 15
- 239000010937 tungsten Substances 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000005622 photoelectricity Effects 0.000 description 8
- 239000004411 aluminium Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000003475 lamination Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 239000002131 composite material Substances 0.000 description 5
- 239000010949 copper Substances 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000002427 irreversible effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
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- 238000006386 neutralization reaction Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 241000931526 Acer campestre Species 0.000 description 1
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Images
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/004—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
- G11C13/047—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam using electro-optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/20—Multistable switching devices, e.g. memristors
- H10N70/257—Multistable switching devices, e.g. memristors having switching assisted by radiation or particle beam, e.g. optically controlled devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
- H10N70/801—Constructional details of multistable switching devices
- H10N70/881—Switching materials
- H10N70/883—Oxides or nitrides
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/004—Reading or sensing circuits or methods
- G11C2013/0054—Read is performed on a reference element, e.g. cell, and the reference sensed value is used to compare the sensed value of the selected cell
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Memories (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/161,941 US7768815B2 (en) | 2005-08-23 | 2005-08-23 | Optoelectronic memory devices |
US11/161,941 | 2005-08-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1921010A CN1921010A (zh) | 2007-02-28 |
CN1921010B true CN1921010B (zh) | 2010-05-26 |
Family
ID=37778698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200610115059.0A Active CN1921010B (zh) | 2005-08-23 | 2006-08-23 | 光电存储器装置及其操作方法 |
Country Status (3)
Country | Link |
---|---|
US (4) | US7768815B2 (zh) |
CN (1) | CN1921010B (zh) |
TW (1) | TW200709205A (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7768815B2 (en) | 2005-08-23 | 2010-08-03 | International Business Machines Corporation | Optoelectronic memory devices |
US8542518B2 (en) * | 2010-03-31 | 2013-09-24 | Hewlett-Packard Development Company, L.P. | Photo-responsive memory resistor and method of operation |
FR2981229B1 (fr) * | 2011-10-10 | 2013-12-27 | Commissariat Energie Atomique | Dispositif de conversion d'impulsions de courant en impulsions de tension. |
CN103559909B (zh) * | 2013-10-31 | 2016-06-01 | 中国科学院上海微系统与信息技术研究所 | 一种光电混合存储的相变存储器结构及其制备方法 |
CN103730573B (zh) * | 2014-01-15 | 2017-11-10 | 中国科学院宁波材料技术与工程研究所 | 一种光电多功能结构单元、其制备方法与应用 |
WO2016171700A1 (en) | 2015-04-23 | 2016-10-27 | Halliburton Energy Services, Inc. | Spectrally programmable memristor-based optical computing |
BR112017020042A2 (pt) | 2015-04-23 | 2018-06-05 | Halliburton Energy Services Inc | dispositivo óptico espectralmente programável e método óptico |
US11276460B2 (en) * | 2019-08-30 | 2022-03-15 | Globalfoundries Singapore Pte. Ltd. | Dye-sensitized optoelectronic memory |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410502A (en) * | 1993-07-21 | 1995-04-25 | U.S. Philips Corporation | Opto-electronic memory systems |
CN1622205A (zh) * | 2003-11-25 | 2005-06-01 | 惠普开发有限公司 | 分子光电子存储器 |
US20050162892A1 (en) * | 2002-02-11 | 2005-07-28 | Michel Bardouillet | One-time programmable memory cell |
Family Cites Families (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US759554A (en) * | 1904-01-22 | 1904-05-10 | William Ruthven | Gearing for washing-machines. |
IT959979B (it) * | 1972-06-28 | 1973-11-10 | Honeywell Inf Systems | Memoria associativa ottica |
US4653024A (en) * | 1984-11-21 | 1987-03-24 | Energy Conversion Devices, Inc. | Data storage device including a phase changeable material |
US5192631A (en) * | 1987-03-18 | 1993-03-09 | Dai Nippon Insatsu Kabushiki Kaisha | Variable electroconductivity material |
JP2584167B2 (ja) | 1992-01-17 | 1997-02-19 | 松下電器産業株式会社 | 光演算記憶装置 |
US5268973A (en) | 1992-01-21 | 1993-12-07 | The University Of Texas System | Wafer-scale optical bus |
GB9315125D0 (en) | 1993-07-21 | 1993-09-01 | Philips Electronics Uk Ltd | Opto-electronic memory system |
JPH07263647A (ja) * | 1994-02-04 | 1995-10-13 | Canon Inc | 電子回路装置 |
US5773316A (en) * | 1994-03-11 | 1998-06-30 | Fujitsu Limited | Method and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelength |
US5615143A (en) * | 1994-09-19 | 1997-03-25 | Cornell Research Foundation, Inc. | Optomechanical terabit data storage system |
US6040198A (en) * | 1995-11-30 | 2000-03-21 | Fujitsu Limited | Element concentration measuring method and apparatus, and semiconductor device fabrication method and apparatus |
US5825046A (en) * | 1996-10-28 | 1998-10-20 | Energy Conversion Devices, Inc. | Composite memory material comprising a mixture of phase-change memory material and dielectric material |
US6087674A (en) * | 1996-10-28 | 2000-07-11 | Energy Conversion Devices, Inc. | Memory element with memory material comprising phase-change material and dielectric material |
US6156220A (en) * | 1997-03-10 | 2000-12-05 | Ohlig; Albert H. | System and method for optically aligning films and substrates used in printed circuit boards |
FR2805902B1 (fr) * | 2000-03-03 | 2002-05-10 | Centre Nat Rech Scient | Dispositif optoelectronique semiconducteur a fonction de transfert modulable electriquement |
KR20020071027A (ko) * | 2000-11-27 | 2002-09-11 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 광학적 스위칭 장치 |
US6569705B2 (en) * | 2000-12-21 | 2003-05-27 | Intel Corporation | Metal structure for a phase-change memory device |
US6912330B2 (en) | 2001-05-17 | 2005-06-28 | Sioptical Inc. | Integrated optical/electronic circuits and associated methods of simultaneous generation thereof |
US7106622B2 (en) * | 2002-01-09 | 2006-09-12 | Intel Corporation | Phase-change memory device capable of preprogramming memory cells optically and reading/writing memory cells electrically |
US6850432B2 (en) * | 2002-08-20 | 2005-02-01 | Macronix International Co., Ltd. | Laser programmable electrically readable phase-change memory method and device |
US6873560B2 (en) | 2002-09-23 | 2005-03-29 | Paul D. Pavlichek | Optical memory device |
US6744088B1 (en) * | 2002-12-13 | 2004-06-01 | Intel Corporation | Phase change memory device on a planar composite layer |
US7471552B2 (en) * | 2003-08-04 | 2008-12-30 | Ovonyx, Inc. | Analog phase change memory |
US6927410B2 (en) * | 2003-09-04 | 2005-08-09 | Silicon Storage Technology, Inc. | Memory device with discrete layers of phase change memory material |
US7064409B2 (en) * | 2003-11-04 | 2006-06-20 | International Business Machines Corporation | Structure and programming of laser fuse |
EP1624459A1 (en) * | 2004-08-03 | 2006-02-08 | STMicroelectronics S.r.l. | Nonvolatile phase change memory device and biasing method therefor |
US7365355B2 (en) * | 2004-11-08 | 2008-04-29 | Ovonyx, Inc. | Programmable matrix array with phase-change material |
US20060249724A1 (en) * | 2005-05-06 | 2006-11-09 | International Business Machines Corporation | Method and structure for Peltier-controlled phase change memory |
US7504652B2 (en) * | 2005-07-13 | 2009-03-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Phase change random access memory |
US7768815B2 (en) | 2005-08-23 | 2010-08-03 | International Business Machines Corporation | Optoelectronic memory devices |
WO2007057972A1 (ja) * | 2005-11-21 | 2007-05-24 | Renesas Technology Corp. | 半導体装置 |
WO2007114355A1 (ja) * | 2006-03-31 | 2007-10-11 | Pioneer Corporation | プローブを用いた情報記憶装置 |
US7396757B2 (en) * | 2006-07-11 | 2008-07-08 | International Business Machines Corporation | Interconnect structure with dielectric air gaps |
US7642550B2 (en) * | 2006-07-25 | 2010-01-05 | Micron Technology, Inc. | Multi-layer structures for parameter measurement |
US7501648B2 (en) * | 2006-08-16 | 2009-03-10 | International Business Machines Corporation | Phase change materials and associated memory devices |
KR100807230B1 (ko) * | 2006-09-27 | 2008-02-28 | 삼성전자주식회사 | 상변화 물질층 및 이를 포함하는 상변화 메모리 장치 |
US7924692B2 (en) * | 2007-01-18 | 2011-04-12 | Seagate Technology Llc | Actuator assembly providing two-dimensional movement of a moveable element in a data storage device |
US20090039331A1 (en) * | 2007-08-07 | 2009-02-12 | International Business Machines Corporation | Phase change material structures |
US7645621B2 (en) * | 2007-10-16 | 2010-01-12 | International Business Machines Corporation | Optical inspection methods |
KR20090084561A (ko) * | 2008-02-01 | 2009-08-05 | 삼성전자주식회사 | 상변화 물질과 이를 포함하는 상변화 메모리 소자와 그제조 및 동작 방법 |
FR2935530B1 (fr) * | 2008-08-29 | 2012-05-04 | Commissariat Energie Atomique | Dispositif de memorisation de donnees a adressage optique. |
US8546898B2 (en) * | 2009-10-29 | 2013-10-01 | Hewlett-Packard Development Company, L.P. | Optoelectronic light exposure memory |
-
2005
- 2005-08-23 US US11/161,941 patent/US7768815B2/en not_active Expired - Fee Related
-
2006
- 2006-08-18 TW TW095130542A patent/TW200709205A/zh unknown
- 2006-08-23 CN CN200610115059.0A patent/CN1921010B/zh active Active
-
2010
- 2010-07-23 US US12/842,158 patent/US8288747B2/en active Active
-
2012
- 2012-07-26 US US13/558,541 patent/US20120287707A1/en not_active Abandoned
-
2013
- 2013-02-13 US US13/765,772 patent/US8945955B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410502A (en) * | 1993-07-21 | 1995-04-25 | U.S. Philips Corporation | Opto-electronic memory systems |
US20050162892A1 (en) * | 2002-02-11 | 2005-07-28 | Michel Bardouillet | One-time programmable memory cell |
CN1622205A (zh) * | 2003-11-25 | 2005-06-01 | 惠普开发有限公司 | 分子光电子存储器 |
Also Published As
Publication number | Publication date |
---|---|
TW200709205A (en) | 2007-03-01 |
US8945955B2 (en) | 2015-02-03 |
US8288747B2 (en) | 2012-10-16 |
US20130258765A1 (en) | 2013-10-03 |
US20120287707A1 (en) | 2012-11-15 |
US7768815B2 (en) | 2010-08-03 |
US20100290264A1 (en) | 2010-11-18 |
US20070051875A1 (en) | 2007-03-08 |
CN1921010A (zh) | 2007-02-28 |
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Effective date of registration: 20171109 Address after: Grand Cayman, Cayman Islands Patentee after: GLOBALFOUNDRIES INC. Address before: American New York Patentee before: Core USA second LLC Effective date of registration: 20171109 Address after: American New York Patentee after: Core USA second LLC Address before: American New York Patentee before: International Business Machines Corp. |
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