CN1912177A - 加快镀膜机真空室达到高空度的方法 - Google Patents
加快镀膜机真空室达到高空度的方法 Download PDFInfo
- Publication number
- CN1912177A CN1912177A CN 200610030790 CN200610030790A CN1912177A CN 1912177 A CN1912177 A CN 1912177A CN 200610030790 CN200610030790 CN 200610030790 CN 200610030790 A CN200610030790 A CN 200610030790A CN 1912177 A CN1912177 A CN 1912177A
- Authority
- CN
- China
- Prior art keywords
- vacuum
- nitrogen
- vacuum chamber
- inflation valve
- coating equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000007747 plating Methods 0.000 title abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 62
- 239000007789 gas Substances 0.000 claims abstract description 34
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 31
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 239000011248 coating agent Substances 0.000 claims abstract description 22
- 238000005086 pumping Methods 0.000 claims abstract description 3
- 230000001105 regulatory effect Effects 0.000 claims abstract description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- QJGQUHMNIGDVPM-OUBTZVSYSA-N nitrogen-15 Chemical compound [15N] QJGQUHMNIGDVPM-OUBTZVSYSA-N 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 1
- 238000004904 shortening Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 6
- 230000008021 deposition Effects 0.000 description 3
- 238000005566 electron beam evaporation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229940054975 nitrogen 99.99 % Drugs 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006100307903A CN100494483C (zh) | 2006-09-04 | 2006-09-04 | 加快镀膜机真空室达到高真空度的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006100307903A CN100494483C (zh) | 2006-09-04 | 2006-09-04 | 加快镀膜机真空室达到高真空度的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1912177A true CN1912177A (zh) | 2007-02-14 |
CN100494483C CN100494483C (zh) | 2009-06-03 |
Family
ID=37721228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100307903A Expired - Fee Related CN100494483C (zh) | 2006-09-04 | 2006-09-04 | 加快镀膜机真空室达到高真空度的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN100494483C (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102787299A (zh) * | 2012-05-21 | 2012-11-21 | 杭州大和热磁电子有限公司 | 一种真空镀膜装置、真空镀膜控制系统及控制方法 |
CN110927240A (zh) * | 2019-11-22 | 2020-03-27 | 南京理工大学 | 一种超高真空系统的高纯nf3进气控制装置及方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1147445C (zh) * | 2000-12-09 | 2004-04-28 | 洛阳晶润镀膜玻璃有限公司 | 镀膜玻璃生产抽真空的方法 |
-
2006
- 2006-09-04 CN CNB2006100307903A patent/CN100494483C/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102787299A (zh) * | 2012-05-21 | 2012-11-21 | 杭州大和热磁电子有限公司 | 一种真空镀膜装置、真空镀膜控制系统及控制方法 |
CN102787299B (zh) * | 2012-05-21 | 2014-09-10 | 杭州大和热磁电子有限公司 | 一种真空镀膜装置、真空镀膜控制系统及控制方法 |
CN110927240A (zh) * | 2019-11-22 | 2020-03-27 | 南京理工大学 | 一种超高真空系统的高纯nf3进气控制装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
CN100494483C (zh) | 2009-06-03 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Weidali Industry (Shenzhen) Co. Ltd. Assignor: Shanghai Optical Precision Machinery Inst., Chinese Academy of Sciences Contract record no.: 2010440020154 Denomination of invention: Method for accelerating vacuum chamber of film coating machine to high degree vacuum Granted publication date: 20090603 License type: Exclusive License Open date: 20070214 Record date: 20100902 |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090603 Termination date: 20200904 |
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CF01 | Termination of patent right due to non-payment of annual fee |