CN1909156A - Flexural probe type grid control cathode structural panel display device and its production technique - Google Patents
Flexural probe type grid control cathode structural panel display device and its production technique Download PDFInfo
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Abstract
The invention relates to a plate display in bended probe grid control cathode structure and relative production, wherein it comprises an anode glass panel, a cathode glass panel, and a sealing vacuum chamber surrounded by four glass frames; the anode glass panel is arranged with anode conductive layer and a fluorescent powder layer is above the conductive layer; a support wall structure and a gattering additional element are between the anode glass panel and the cathode glass panel; a control grid, a carbon nanometer tube cathode and bended probe grid control cathode structure are arranged on the cathode glass panel. The invention can effectively shorten the distance between grid and cathode, reduce the working voltage, strengthen the surface electric field on the carbon nanometer tube, improve the control efficiency and control function of grid and improve the display image quality of whole device, with lower cost and simple structure.
Description
Technical field
The invention belongs to the mutual crossing domain in Display Technique field, plane, microelectronics science and technology field, vacuum science and technical field and nanometer science and technology field, relate to the element manufacturing of panel field emission display, be specifically related to the content of element manufacturing aspect of the panel field emission display of carbon nanotube cathod, particularly a kind of flat-panel monitor of flexural probe type grid control cathode structural and manufacture craft thereof.
Background technology
Carbon nano-tube is a kind of tubulose material with unique geometric shape, it also is a kind of quite outstanding Field Emission Cathode Materials, this stems from its little tip curvature radius and high aspect rate, under the alive outside effect, do not need and outer energy, just can launch a large amount of electronics.And the field emission display device that utilizes carbon nano-tube to make as cathode material is a kind of novel flat device, it rolls into one the HD image quality of cathode ray tube, the ultrathin type of LCD and the advantages such as large tracts of land of plasma scope, becomes the hot topic research topic in flat panel display field already.In order further to reduce working voltage of device, so that combine with conventional integrated circuit, the field emission flat-panel display of making three-stage structure has become a kind of inexorable trend.
In the field emission display device of three-stage structure, when after applying appropriate voltage on the grid, will form powerful electric field strength on the carbon nano-tube top, force carbon nano-tube to launch a large amount of electronics.Therefore, grid structure plays very necessary control effect for the electronics emission of carbon nanotube cathod.On the one hand, need shorten the distance between grid and the carbon nanotube cathod as much as possible, so that reduction working voltage of device, the performance requirement that meets the low pressure flat device, but also to avoid causing the generation of short circuit phenomenon between the grid and cathode simultaneously, therefore prevent electrical break down, for the manufacture craft between grid and the negative electrode with make that structure still has than higher requirement; On the other hand, making grid can make full use of its controlled function of performance, increasing is to the electronics emission control of carbon nano-tube the time, also grid structure and carbon nanotube cathod structure organically to be combined, promote the Highgrade integration development of whole flat-panel display device, this also is one of problem that need think better of.
In addition, under the prerequisite of the field emission ability that does not influence carbon nanotube cathod as far as possible, also need further to reduce the cost of manufacture of whole flat-panel display device; When can carrying out the making of large area display spare, it is complicated to need also to make that device fabrication processes avoids, and helps carrying out business-like large-scale production.
Summary of the invention
The objective of the invention is to overcome existing shortcoming and defect in the middle of the above-mentioned flat-panel display device and provide a kind of with low cost, manufacturing process is reliable and stable, be made into the power height, the flat-panel monitor and the manufacture craft thereof of flexural probe type grid control cathode structural simple in structure.
The object of the present invention is achieved like this: a kind of flat-panel monitor of flexural probe type grid control cathode structural, comprise by cathode glass faceplate, anode glass panel and all around glass enclose the sealed vacuum chamber that frame constitutes; Anode conductive layer and the phosphor powder layer of preparation on anode conductive layer are arranged on the anode glass panel; Supporting wall structure between anode glass panel and cathode glass faceplate and getter subsidiary component have control grid, carbon nano-tube and flexural probe type grid control cathode structural on cathode glass faceplate.
The backing material of described flexural probe type grid control cathode structural is glass, just cathode glass faceplate; Metal level forms the cathode leg layer after the etching on the cathode glass faceplate; Silicon dioxide layer after the etching on the cathode glass faceplate has formed isolation one deck; Isolating one deck is a plane from its upper surface of vertical structure, and the side is perpendicular to the plane of cathode glass faceplate; Isolate in one deck and have circular port, expose the cathode leg layer of bottom; Silicon dioxide layer after the etching above isolation one deck forms isolates two layers; Isolate two layers from vertical structure on it plane be a plane, its lower plane also is a plane and isolates one deck and contact that its side then is a non-equilateral triangle shape, to the inner recess of isolating two layers; Isolating two layers is an inversion fish jar type from transversary, i.e. the diameter of upper shed is greater than the diameter of isolating one deck circular port, and mid portion is to inner recess, and the diameter of under shed is identical with the diameter of isolating one deck circular port; The metal level of isolating after the etching above two layers forms the grid lead layer; The grid lead layer is distributed on the upper surface and side of isolating two layers; The grid lead layer will stretch out isolates two layers side, presents vacant state, forms the flexural probe type shape; Silicon dioxide layer after the etching above the grid lead layer forms the grid cover layer; The grid cover layer is wanted complete cover grid trace layer, comprises the grid lead layer that is positioned at last summit portion, lateral parts and the overhanging portion of isolating two layers; Doped polysilicon layer after the etching above the cathode leg layer forms and promotes layer; Promoting layer is a semi-circular shape, and lower surface is that a plane and cathode leg layer contact, and its upper surface is a semi circular surface; Metal level after the etching above the lifting layer forms transition zone; Made of carbon nanotubes is on transition zone.
The fixed position of described flexural probe type grid control cathode structural is for being fixed on the cathode glass faceplate, and grid and negative electrode are integrated together, grid is positioned at the top of negative electrode, controlling the electronics emission of carbon nano-tube, the cathode leg layer is metal gold, silver, chromium, nickel, cobalt, tin, aluminium, and the grid lead layer is metal gold, silver, chromium, nickel, tin, molybdenum, cobalt, copper, aluminium.The doping type that promotes layer is the p type or is the n type that transition zone is metal gold, silver, nickel, cobalt, iron, molybdenum, tin, chromium, aluminium.
A kind of manufacture craft of flat-panel monitor of flexural probe type grid control cathode structural, its manufacture craft is as follows:
1) making of cathode glass faceplate: whole plate glass is carried out scribing, produce cathode glass faceplate;
2) making of cathode leg layer: on cathode glass faceplate, prepare a metal level, form the cathode leg layer after the etching;
3) making of isolation one deck: on cathode glass faceplate, prepare a silicon dioxide layer, form after the etching and isolate one deck; Isolating one deck is a plane from its upper surface of vertical structure, and the side is perpendicular to the plane of cathode glass faceplate; Isolate in one deck and have circular port, expose the negative electrode negative line layer of bottom;
4) isolate two layers making: on isolate one deck, prepare a silicon dioxide layer once more, form after the etching and isolate two layers;
5) making of grid lead layer: on the surface of two layers of isolation, prepare a metal level, form the grid lead layer after the etching; The grid lead layer is distributed on the upper surface and side of isolating two layers; The grid lead layer will stretch out isolates two layers side, presents vacant state, forms the flexural probe type shape;
6) the tectal making of grid: on the grid lead layer, prepare a silicon dioxide layer, form the grid cover layer after the etching; The grid cover layer is wanted complete cover grid trace layer, comprises the grid lead layer that is positioned at last summit portion, lateral parts and the overhanging portion of isolating two layers;
7) making of lifting layer: on the cathode leg layer, prepare a n type doped polysilicon layer, form after the etching and promote layer; Promoting layer is a semi-circular shape, and lower surface is that a plane and cathode leg layer contact, and its upper surface is a semi circular surface;
8) making of transition zone: prepare a metal level at the upper surface that promotes layer, form transition zone after the etching;
9) cleaning surfaces of flexural probe type grid control cathode structural is handled: clean is carried out on the surface to flexural probe type grid control cathode structural, removes impurity and dust;
10) preparation of carbon nano-tube: with made of carbon nanotubes on transition zone;
11) making of anode glass panel: whole plate glass is carried out scribing, produce the anode glass panel;
12) making of anode conductive layer: evaporation one deck tin indium oxide rete on the anode glass panel; Form anode conductive layer after the etching;
13) making of insulation paste layer: at the non-display area printing insulation paste layer of anode conductive layer;
14) making of phosphor powder layer: the viewing area printing phosphor powder layer on anode conductive layer;
15) device assembling: cathode glass faceplate, anode glass panel, supporting wall structure and glass are enclosed frame be assembled together, and getter is put in the middle of the cavity, fix with glass powder with low melting point;
16) finished product is made: the device that has assembled is carried out packaging technology form finished parts.
Described step 4 is specially on isolate one deck and prepares a silicon dioxide layer once more, forms after the etching and isolates two layers; Isolate two layers from vertical structure on it plane be a plane, its lower plane also is a plane and isolates one deck and contact that its side then is a non-equilateral triangle shape, to the inner recess of isolating two layers; Isolating two layers is an inversion fish jar type from transversary, i.e. the diameter of upper shed is greater than the diameter of isolating one deck circular port, and mid portion is to inner recess, and the diameter of under shed is identical with the diameter of isolating one deck circular port.
Described step 13 is specially the non-display area printing insulation paste layer at anode conductive layer, is used to prevent the parasitic electrons emission; Through overbaking, baking temperature: 150 ℃, the retention time: 5 minutes, afterwards, be placed on and carry out high temperature sintering in the sintering furnace, sintering temperature: 580 ℃, the retention time: 10 minutes.
Described step 14 is specially the viewing area printing phosphor powder layer on anode conductive layer; In the middle of baking oven, toast baking temperature: 120 ℃, the retention time: 10 minutes.
The device that described step 16 is specially having assembled carries out following packaging technology: toast in the middle of the sample device is put into baking oven; Carry out high temperature sintering in the middle of putting into sintering furnace; On exhaust station, carry out device exhaust, sealed-off, on the roasting machine that disappears, the getter of device inside bake and disappears, install pin formation finished parts at last additional.
The present invention has following good effect:
At first, in described flexural probe type grid control cathode structural,, will form powerful electric field strength on the carbon nano-tube top, force carbon nano-tube to launch a large amount of electronics when after applying appropriate voltage on the grid; Institute's electrons emitted is in the process of anode high degree of motion, also can be subjected to the further control of flexural probe type grid structure, function with focusing, therefore, the flexural probe type grid control structure combines the controlled function and the focusing function of grid, improve the control efficiency of grid, helped further to improve the image quality of device;
Secondly, in described flexural probe type grid control cathode structural, grid structure and cathode construction height are integrated together, favourable promotion the integrated development of integral device.Because not only being positioned at, the grid lead layer isolates two layers upper surface and side, also stretched out lateral parts, presented a kind of vacant state, the length of the part of being stretched out can be adjusted according to actual conditions, so just can further shorten distance between grid and cathode, thereby the reduction working voltage of device, the surface field intensity of enhancing carbon nano-tube;
The 3rd, in described flexural probe type grid control cathode structural, on the grid lead layer, made the grid cover layer, like this, can either avoid of the influence of other impurity for grid structure, can also avoid simultaneously the generation of short circuit phenomenon between the grid and cathode, improve the success rate that integral device is made;
In addition, in described flexural probe type grid control cathode structural, do not adopt special structure fabrication material, do not adopt special device making technics yet, this has just further reduced the cost of manufacture of whole flat-panel display device to a great extent, simplify the manufacturing process of device, can carry out large-area element manufacturing.
Description of drawings
Fig. 1 has provided the vertical structure schematic diagram of flexural probe type grid control cathode structural;
Fig. 2 has provided the transversary schematic diagram of flexural probe type grid control cathode structural;
Fig. 3 has provided the structural representation of the carbon nanotube field emission flat-panel screens of flexural probe type grid control cathode structural.
Embodiment
Below in conjunction with drawings and Examples the present invention is further specified, but the present invention is not limited to these embodiment.
Described a kind of flat-panel monitor that has flexural probe type grid control cathode structural, comprise by cathode glass faceplate 1, anode glass panel 10 and all around glass enclose the sealed vacuum chamber that frame 15 is constituted; Control grid 5, carbon nano-tube 9 and flexural probe type grid control cathode structural are arranged on cathode glass faceplate; Anode conductive layer 11 and the phosphor powder layer 13 of preparation on anode conductive layer are arranged on the anode glass panel; Supporting wall structure 14 between anode glass panel and cathode glass faceplate and getter subsidiary component 16.
Described flexural probe type grid control cathode structural comprises cathode glass faceplate 1, cathode leg layer 2, isolation one deck 3, two layer 4 of isolation, grid lead layer 5, grid cover layer 6, promotes layer 7, transition zone 8 and carbon nano-tube 9 parts.
The backing material of described flexural probe type grid control cathode structural is a glass, and as soda-lime glass, Pyrex, just cathode glass faceplate 1; Metal level forms cathode leg layer 2 after the etching on the cathode glass faceplate; Silicon dioxide layer after the etching on the cathode glass faceplate has formed isolation one deck 3; Isolating one deck is a plane from its upper surface of vertical structure, and the side is perpendicular to the plane of cathode glass faceplate; Isolate in one deck and have circular port, expose the cathode leg layer of bottom; Silicon dioxide layer after the etching above isolation one deck forms isolates two layer 4; Isolate two layers from vertical structure on it plane be a plane, its lower plane also is a plane and isolates one deck and contact that its side then is a non-equilateral triangle shape, to the inner recess of isolating two layers; Isolating two layers is an inversion fish jar type from transversary, i.e. the diameter of upper shed is greater than the diameter of isolating one deck circular port, and mid portion is to inner recess, and the diameter of under shed is identical with the diameter of isolating one deck circular port; The metal level of isolating after the etching above two layers forms grid lead layer 5; The grid lead layer is distributed on the upper surface and side of isolating two layers; The grid lead layer will stretch out isolates two layers side, presents vacant state, forms the flexural probe type shape; Silicon dioxide layer after the etching above the grid lead layer forms grid cover layer 6; The grid cover layer is wanted complete cover grid trace layer, comprises the grid lead layer that is positioned at last summit portion, lateral parts and the overhanging portion of isolating two layers; Doped polysilicon layer after the etching above the cathode leg layer forms and promotes layer 7; Promoting layer is a semi-circular shape, and lower surface is that a plane and cathode leg layer contact, and its upper surface is a semi circular surface; Metal level after the etching above the lifting layer forms transition zone 8; Carbon nano-tube 9 preparations are on transition zone.
The fixed position of described flexural probe type grid control cathode structural is for being fixed on the cathode glass faceplate, and grid and negative electrode be integrated together, and grid is positioned at the top of negative electrode, is controlling the electronics emission of carbon nano-tube.The cathode leg layer can be metallic gold, silver, chromium, nickel, cobalt, tin, aluminium.The grid lead layer can be metallic gold, silver, chromium, nickel, tin, aluminium, cobalt, copper, aluminium.The doping type that promotes layer can be the p type, also can be the n type.Transition zone can be metallic gold, silver, nickel, cobalt, iron, molybdenum, tin, chromium, aluminium.
A kind of manufacture craft that has the flat-panel monitor of flexural probe type grid control cathode structural, its manufacture craft is as follows:
1) making of cathode glass faceplate 1: to whole plate glass,, carry out scribing, produce cathode glass faceplate as soda-lime glass, Pyrex;
2) making of cathode leg layer 2: on cathode glass faceplate, prepare a metal level,, form the cathode leg layer after the etching as the metal nickel dam;
3) making of isolation one deck 3: on cathode glass faceplate, prepare a silicon dioxide layer, form after the etching and isolate one deck; Isolating one deck is a plane from its upper surface of vertical structure, and the side is perpendicular to the plane of cathode glass faceplate; Isolate in one deck and have circular port, expose the negative electrode negative line layer of bottom;
4) isolate two layer 4 making: on isolate one deck, prepare a silicon dioxide layer once more, form after the etching and isolate two layers;
5) making of grid lead layer 5: on the surface of two layers of isolation, prepare a metal level,, form the grid lead layer after the etching as metallic chromium layer; The grid lead layer is distributed on the upper surface and side of isolating two layers; The grid lead layer will stretch out isolates two layers side, presents vacant state, forms the flexural probe type shape;
6) making of grid cover layer 6: on the grid lead layer, prepare a silicon dioxide layer, form the grid cover layer after the etching; The grid cover layer is wanted complete cover grid trace layer, comprises the grid lead layer that is positioned at last summit portion, lateral parts and the overhanging portion of isolating two layers;
7) making of lifting layer 7: on the cathode leg layer, prepare a n type doped polysilicon layer, form after the etching and promote layer; Promoting layer is a semi-circular shape, and lower surface is that a plane and cathode leg layer contact, and its upper surface is a semi circular surface;
8) making of transition zone 8: prepare a metal level at the upper surface that promotes layer,, form transition zone after the etching as layer of metal cobalt;
9) cleaning surfaces of flexural probe type grid control cathode structural is handled: clean is carried out on the surface to flexural probe type grid control cathode structural, removes impurity and dust;
10) preparation of carbon nano-tube 9: with made of carbon nanotubes on transition zone;
11) making of anode glass panel 10: whole sodium calcium plate glass is carried out scribing, produce the anode glass panel;
12) making of anode conductive layer 11: evaporation one deck tin indium oxide rete on the anode glass panel; Form anode conductive layer after the etching;
13) making of insulation paste layer 12: at the non-display area printing insulation paste layer of anode conductive layer;
14) making of phosphor powder layer 13: the viewing area printing phosphor powder layer on anode conductive layer;
15) device assembling: cathode glass faceplate, anode glass panel, supporting wall structure 14 and glass are enclosed frame 15 be assembled together, and getter 16 is put in the middle of the cavity, fix with glass powder with low melting point.Around face glass, smeared glass powder with low melting point, fixed with clip;
16) finished product is made: the device that has assembled is carried out packaging technology form finished parts.
Described step 4 is specially on isolate one deck and prepares a silicon dioxide layer once more, forms after the etching and isolates two layers; Isolate two layers from vertical structure on it plane be a plane, its lower plane also is a plane and isolates one deck and contact that its side then is a non-equilateral triangle shape, to the inner recess of isolating two layers; Isolating two layers is an inversion fish jar type from transversary, i.e. the diameter of upper shed is greater than the diameter of isolating one deck circular port, and mid portion is to inner recess, and the diameter of under shed is identical with the diameter of isolating one deck circular port;
Described step 13 is specially the non-display area printing insulation paste layer at anode conductive layer, is used to prevent the parasitic electrons emission; Through overbaking (baking temperature: 150 ℃, retention time: 5 minutes) afterwards, be placed on and carry out high temperature sintering (sintering temperature: 580 ℃, retention time: 10 minutes) in the sintering furnace;
Described step 14 is specially the viewing area printing phosphor powder layer on anode conductive layer; In the middle of baking oven, toast (baking temperature: 120 ℃, the retention time: 10 minutes);
The device that described step 16 is specially having assembled carries out following packaging technology: toast in the middle of the sample device is put into baking oven; Carry out high temperature sintering in the middle of putting into sintering furnace; On exhaust station, carry out device exhaust, sealed-off, on the roasting machine that disappears, the getter of device inside bake and disappears, install pin formation finished parts at last additional.
Claims (8)
1, a kind of flat-panel monitor of flexural probe type grid control cathode structural, comprise by cathode glass faceplate [1], anode glass panel [10] and all around glass enclose the sealed vacuum chamber that frame [15] is constituted; Anode conductive layer [11] and the phosphor powder layer [13] of preparation on anode conductive layer are arranged on the anode glass panel; Supporting wall structure between anode glass panel and cathode glass faceplate [14] and getter subsidiary component [16] is characterized in that: control grid [5], carbon nano-tube [9] and flexural probe type grid control cathode structural are arranged on cathode glass faceplate.
2, the flat-panel monitor of flexural probe type grid control cathode structural according to claim 1 is characterized in that: the backing material of described flexural probe type grid control cathode structural is a glass, just cathode glass faceplate [1]; Metal level forms cathode leg layer [2] after the etching on the cathode glass faceplate; Silicon dioxide layer after the etching on the cathode glass faceplate has formed isolation one deck [3]; Isolating one deck is a plane from its upper surface of vertical structure, and the side is perpendicular to the plane of cathode glass faceplate; Isolate in one deck and have circular port, expose the cathode leg layer of bottom; Silicon dioxide layer after the etching above isolation one deck forms isolates two layers [4]; Isolate two layers from vertical structure on it plane be a plane, its lower plane also is a plane and isolates one deck and contact that its side then is a non-equilateral triangle shape, to the inner recess of isolating two layers; Isolating two layers is an inversion fish jar type from transversary, i.e. the diameter of upper shed is greater than the diameter of isolating one deck circular port, and mid portion is to inner recess, and the diameter of under shed is identical with the diameter of isolating one deck circular port; The metal level of isolating after the etching above two layers forms grid lead layer [5]; The grid lead layer is distributed on the upper surface and side of isolating two layers; The grid lead layer will stretch out isolates two layers side, presents vacant state, forms the flexural probe type shape; Silicon dioxide layer after the etching above the grid lead layer forms grid cover layer [6]; The grid cover layer is wanted complete cover grid trace layer, comprises the grid lead layer that is positioned at last summit portion, lateral parts and the overhanging portion of isolating two layers; Doped polysilicon layer after the etching above the cathode leg layer forms and promotes layer [7]; Promoting layer is a semi-circular shape, and lower surface is that a plane and cathode leg layer contact, and its upper surface is a semi circular surface; Metal level after the etching above the lifting layer forms transition zone [8]; Carbon nano-tube [9] preparation is on transition zone.
3, the flat-panel monitor of flexural probe type grid control cathode structural according to claim 2, it is characterized in that: the fixed position of described flexural probe type grid control cathode structural is for being fixed on the cathode glass faceplate, and grid and negative electrode are integrated together, grid is positioned at the top of negative electrode, controlling the electronics emission of carbon nano-tube, the cathode leg layer is metal gold, silver, chromium, nickel, cobalt, tin, aluminium, and the grid lead layer is metal gold, silver, chromium, nickel, tin, molybdenum, cobalt, copper, aluminium.The doping type that promotes layer is the p type or is the n type that transition zone is metal gold, silver, nickel, cobalt, iron, molybdenum, tin, chromium, aluminium.
4, a kind of manufacture craft of flat-panel monitor of flexural probe type grid control cathode structural is characterized in that, its manufacture craft is as follows:
1) making of cathode glass faceplate [1]: whole plate glass is carried out scribing, produce cathode glass faceplate;
2) making of cathode leg layer [2]: on cathode glass faceplate, prepare a metal level, form the cathode leg layer after the etching;
3) making of isolation one deck [3]: on cathode glass faceplate, prepare a silicon dioxide layer, form after the etching and isolate one deck; Isolating one deck is a plane from its upper surface of vertical structure, and the side is perpendicular to the plane of cathode glass faceplate; Isolate in one deck and have circular port, expose the negative electrode negative line layer of bottom;
4) making of isolation two layers [4]: on isolate one deck, prepare a silicon dioxide layer once more, form after the etching and isolate two layers;
5) making of grid lead layer [5]: on the surface of two layers of isolation, prepare a metal level, form the grid lead layer after the etching; The grid lead layer is distributed on the upper surface and side of isolating two layers; The grid lead layer will stretch out isolates two layers side, presents vacant state, forms the flexural probe type shape;
6) making of grid cover layer [6]: on the grid lead layer, prepare a silicon dioxide layer, form the grid cover layer after the etching; The grid cover layer is wanted complete cover grid trace layer, comprises the grid lead layer that is positioned at last summit portion, lateral parts and the overhanging portion of isolating two layers;
7) making of lifting layer [7]: on the cathode leg layer, prepare a n type doped polysilicon layer, form after the etching and promote layer; Promoting layer is a semi-circular shape, and lower surface is that a plane and cathode leg layer contact, and its upper surface is a semi circular surface;
8) making of transition zone [8]: prepare a metal level at the upper surface that promotes layer, form transition zone after the etching;
9) cleaning surfaces of flexural probe type grid control cathode structural is handled: clean is carried out on the surface to flexural probe type grid control cathode structural, removes impurity and dust;
10) preparation of carbon nano-tube [9]: with made of carbon nanotubes on transition zone;
11) making of anode glass panel [10]: whole plate glass is carried out scribing, produce the anode glass panel;
12) making of anode conductive layer [11]: evaporation one deck tin indium oxide rete on the anode glass panel; Form anode conductive layer after the etching;
13) making of insulation paste layer [12]: at the non-display area printing insulation paste layer of anode conductive layer;
14) making of phosphor powder layer [13]: the viewing area printing phosphor powder layer on anode conductive layer;
15) device assembling: cathode glass faceplate, anode glass panel, supporting wall structure [14] and glass are enclosed frame [15] be assembled together, and getter [16] is put in the middle of the cavity, fix with glass powder with low melting point;
16) finished product is made: the device that has assembled is carried out packaging technology form finished parts.
5, the manufacture craft of the flat-panel monitor of flexural probe type grid control cathode structural according to claim 4 is characterized in that: described step 4 is specially on isolate one deck and prepares a silicon dioxide layer once more, forms after the etching and isolates two layers; Isolate two layers from vertical structure on it plane be a plane, its lower plane also is a plane and isolates one deck and contact that its side then is a non-equilateral triangle shape, to the inner recess of isolating two layers; Isolating two layers is an inversion fish jar type from transversary, i.e. the diameter of upper shed is greater than the diameter of isolating one deck circular port, and mid portion is to inner recess, and the diameter of under shed is identical with the diameter of isolating one deck circular port.
6, the manufacture craft of the flat-panel monitor of flexural probe type grid control cathode structural according to claim 4 is characterized in that: described step 13 is specially the non-display area printing insulation paste layer at anode conductive layer, is used to prevent the parasitic electrons emission; Through overbaking, baking temperature: 150 ℃, the retention time: 5 minutes, afterwards, be placed on and carry out high temperature sintering in the sintering furnace, sintering temperature: 580 ℃, the retention time: 10 minutes.
7, the manufacture craft of the flat-panel monitor of flexural probe type grid control cathode structural according to claim 4 is characterized in that: described step 14 is specially the viewing area printing phosphor powder layer on anode conductive layer; In the middle of baking oven, toast baking temperature: 120 ℃, the retention time: 10 minutes.
8, the manufacture craft of the flat-panel monitor of flexural probe type grid control cathode structural according to claim 4 is characterized in that: the device that described step 16 is specially having assembled carries out following packaging technology: toast in the middle of the sample device is put into baking oven; Carry out high temperature sintering in the middle of putting into sintering furnace; On exhaust station, carry out device exhaust, sealed-off, on the roasting machine that disappears, the getter of device inside bake and disappears, install pin formation finished parts at last additional.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101807501A (en) * | 2010-03-15 | 2010-08-18 | 彩虹集团公司 | Method for producing film type FED (Field Emission Display) bottom substrate |
| CN101071726B (en) * | 2007-06-19 | 2011-03-23 | 中原工学院 | Flat-panel display device with multi-section bent line cathode structure and its preparing process |
-
2006
- 2006-08-02 CN CNB2006100485101A patent/CN100561648C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101071726B (en) * | 2007-06-19 | 2011-03-23 | 中原工学院 | Flat-panel display device with multi-section bent line cathode structure and its preparing process |
| CN101807501A (en) * | 2010-03-15 | 2010-08-18 | 彩虹集团公司 | Method for producing film type FED (Field Emission Display) bottom substrate |
| CN101807501B (en) * | 2010-03-15 | 2012-05-09 | 彩虹集团公司 | Method for producing film type FED (Field Emission Display) bottom substrate |
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| CN100561648C (en) | 2009-11-18 |
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