CN1905126A - Organic electroluminescent device, and electronic devices therewith - Google Patents
Organic electroluminescent device, and electronic devices therewith Download PDFInfo
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/88—Dummy elements, i.e. elements having non-functional features
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Provided is a method of manufacturing an organic EL device forming an organic EL layer by discharging and applying an organic EL material by an ink-jet method on a substrate, with uniform thickness of an organic EL thin film between pixels within effective optical area and in respective pixels. The organic EL device is formed by forming a dummy area having dummy bank groups (43) having shape and pitches same as that of display pixels (42) around a display pixel area, applying an organic EL material ink composition (41) also on the display pixels area to form a organic EL thin film.
Description
Technical field
The present invention relates to organic electroluminescent (note is made EL in this manual) device and manufacture method thereof.
Background technology
The spontaneous luminescence escope of LCD instead just uses organic light-emitting component in accelerate development in recent years.About organic electroluminescent (note the is made EL in this manual) element that organic substance is used as luminescent material, flagship report following two kinds of methods: as Appl.Phys.Lett.51 (12), shown in 913 pages of 21S eptember 1987, form the method for low molecular organic EL Material (luminescent material) film with vapour deposition method; And, shown in 34 pages of 7 July 1997, apply the method for high molecular organic EL Material as Appl.Phys.Lett.71 (1).
As the device of colorize, under the situation of low molecular series material, adopt the method that forms across the different luminescent material of mask evaporation on desirable pixel.On the other hand, about high score subclass material, the colorize of the formation Micropicture of employing ink-jet method is noticeable.As the formation method of the organic EL that adopts ink-jet method, known following well-known example: the spy opens flat 7-235378, spy and opens flat 10-12377, spy and open flat 10-153967, spy and open that flat 11-40358, spy open flat 11-54270, the spy opens flat 11-339957, US006087196.
Because it is micron-sized drop that ink-jet method can spray, apply diameter with high-resolution, so can form the high fine pattern of organic EL Material.; the fine droplet drying that is coated on the substrate must be exceedingly fast, in addition, and the end of the area of application on substrate (upper end, lower end, right-hand member, left end); owing to force down from the branch of the solvent molecule of the fine droplet evaporation that is coated in the viewing area, so generally understand rapid draing.In addition, undertaken by the TFT element under the situation of active driving, aspect the relation of the shape of TFT element area or wiring etc., configuration, sometimes pixel can not all equally spaced dispose along X, Y direction, at the partial pressure difference that produces local solvent molecule evaporation on every side that is coated in the drop on each pixel.The difference that is coated in the drying time of the organic material liquid on such pixel causes that the thickness of the organic film in the pixel, between the pixel is irregular.Such thickness is irregular to become irregular etc. the irregular reason of demonstration of uneven luminance, glow color.
Summary of the invention
As the objective of the invention is to, spraying, be coated in organic EL Material in the manufacturing of the organic El device that forms organic EL layer on the electrode, provide a kind of surrounding environment of the organic EL Material solution that is coated in the pixel region that makes dry equably, reaching in the pixel between each pixel in effective optical region does not have the organic El device of brightness, glow color non-uniform phenomenon and the manufacture method of organic El device.
The manufacture method of Organnic electroluminescent device of the present invention, this Organnic electroluminescent device comprises and is formed with a plurality of and the effective optical region that shows relevant display pixel and disposes a plurality of and the dummy section that shows irrelevant empty pixel around above-mentioned effective optical region, it is characterized in that: the constituent that comprises electroluminescent organic material is coated to above-mentioned a plurality of display pixel and above-mentioned a plurality of empty pixel.
Adopt above-mentioned manufacture method,, can make the uniform film thickness that reaches between each pixel in the pixel effectively making the surrounding environment of the organic EL Material liquid that is coated in effective optical region dry equably in the optical region.In addition, so-called organic electro luminescent layer is meant luminous contributive layer, comprises hole injection layer, luminescent layer, electron injecting layer etc.In addition, so-called effectively optical region is under the situation of display unit at organic El device for example, represents effective optical region, is under the situation of lighting device at organic El device in addition, and expression is to the contributive zone of throwing light on.
The manufacture method of organic El device of the present invention is characterised in that: be formed with electrode at above-mentioned effective optical region, above-mentioned constituent is coated on the above-mentioned electrode.
Adopt above-mentioned manufacture method, in effective optical region, can suppress in the pixel of end drop than the pixel of inboard in droplet drying get soon terrifically, can make the thickness between effective optics pixel become even.
In addition, the manufacture method of organic El device of the present invention is characterised in that: above-mentioned electroluminescent organic material includes hole injection layer material ink component or luminescent layer ink component, removes above-mentioned solvent after the above-mentioned coating.
In addition, be preferably in the above-mentioned dead zone layer that forms by constituting with the same material of above-mentioned electrode, the constituent that will comprise above-mentioned electroluminescent organic material is coated on the above-mentioned layer.
Adopt above-mentioned manufacture method, even in the pixel of effective optical region end, also can make the surrounding environment of organic EL Material liquid of coating even, can suppress in the pixel of effective optical region end drop and get soon terrifically than droplet drying in the pixel of inboard, can make the thickness of the organic EL thin layer between each pixel of effective optical region even.
In addition, the manufacture method of organic El device of the present invention is characterised in that: be preferably in the plural effective optical region group that is made of above-mentioned effective optical region is set on the substrate, the dead zone is set respectively around each effective optical region, another dead zone also is set around above-mentioned effective optical region group simultaneously.
Here so-called dead zone is meant and show and the zone that it doesn't matter of throwing light on.Therefore, the organic EL layer that forms in the dead zone can be not luminous, if but to show and situation that illumination not have to influence under also can be luminous.
If adopt above-mentioned manufacture method, plural effective optical region then is set on a substrate, in last operation, cut off each effective optical region, under the situation of making plural organic El device, can make surrounding environment and other pixels of the organic EL Material liquid on the pixel that is coated in effective optical region end even equally, the interior drop of pixel of the effective optical region of energy inhibition end gets fast terrifically than droplet drying in the pixel of inboard, can make the thickness of the organic EL thin layer between the pixel even.Therefore, can with a plate base once make between each pixel and pixel in do not have a plurality of organic El devices of brightness, glow color non-uniform phenomenon.
In addition, the manufacture method of organic El device of the present invention is characterised in that: be preferably under the situation that applies the constituent that comprises above-mentioned electroluminescent organic material, apply effective optical region again after having applied the dead zone when beginning to apply, when coating finishes after having applied effective optical region, coating dead zone and finishing.
If adopt above-mentioned manufacture method, then begin the coating of electroluminescent organic material solution, and finish, so can stably carry out the coating of effective optical region therebetween in the dead zone from the dead zone.
In addition, the manufacture method of organic El device of the present invention is characterised in that: all each the area of application in the area of application preferably has equal interval.
Adopt above-mentioned manufacture method, in effective optical region, can make the surrounding environment of the organic EL Material liquid of coating in effective optical region dry equably, can make the thickness that reaches the interior organic EL thin layer of pixel between each pixel even.
In addition, the manufacture method of organic El device of the present invention is characterised in that: preferably uniformly-spaced to dispose adjacent above-mentioned electrode.Adopt above-mentioned manufacture method, in effective optical region, can make the surrounding environment of the organic EL Material liquid of coating in effective optical region dry equably, can make between effective optics pixel and each pixel in the thickness of organic EL thin layer even.
The manufacture method of organic El device of the present invention is a kind of manufacture method with Organnic electroluminescent device of the effective optical region that comprises the organic electro luminescent layer on a plurality of electrodes and the above-mentioned electrode, it is characterized in that: in the zone that should become above-mentioned effective optical region and in the zone beyond should becoming above-mentioned effective optical region, form above-mentioned electroluminescence layer.
In addition, the manufacture method of organic El device of the present invention is a kind of manufacture method with Organnic electroluminescent device of the effective optical region that comprises the organic electro luminescent layer on a plurality of electrodes and the above-mentioned electrode, it is characterized in that: in should becoming the zone that does not form above-mentioned electrode of above-mentioned effective optical region, be formed with organic electroluminescent layer.
In addition, if adopt the present invention, then can provide the organic El device that utilizes said method to make.In such organic El device, reaching in the pixel between each pixel in effective optical region does not have brightness, the uneven phenomenon of glow color, can realize that uniform EL shows.
Secondly, organic El device of the present invention comprises preferably and disposes a plurality of and the effective optical region that shows relevant display pixel and dispose a plurality of and the dummy section that shows irrelevant empty pixel around above-mentioned effective optical region that it is characterized in that: organic EL layer is formed at above-mentioned a plurality of display pixel and a plurality of above-mentioned empty pixel.
In addition, organic El device of the present invention is characterised in that: being preferably between above-mentioned a plurality of electrode has the embankment layer, in above-mentioned dead zone, above-mentioned organic EL layer be configured in by with above-mentioned embankment layer identical materials constitute the layer the top.
In addition, organic El device of the present invention is characterised in that: above-mentioned embankment layer preferably includes inorganic matter embankment layer and organic substance embankment layer, in above-mentioned dead zone, above-mentioned organic EL layer be configured in by with above-mentioned inorganic matter embankment layer identical materials constitute the layer the top.
In addition, be preferably formed as above-mentioned embankment layer between the above-mentioned organic electro luminescent layer that in above-mentioned dead zone, forms.
In addition, organic El device of the present invention is characterised in that: in above-mentioned dead zone, above-mentioned organic EL layer preferably be configured in by with above-mentioned organic substance embankment layer identical materials constitute the layer the top.
In addition, organic El device of the present invention is characterised in that: in above-mentioned dead zone, above-mentioned organic EL layer preferably be configured in by with above-mentioned electrode identical materials constitute the layer the top.
In addition, organic El device of the present invention is characterised in that: in above-mentioned effective optical region and above-mentioned dead zone, the interval of adjacent above-mentioned organic EL layer preferably equates.
In addition, organic El device of the present invention is characterised in that: be preferably in and form above-mentioned embankment layer between the organic electro luminescent layer that forms in the above-mentioned dead zone.
In addition, organic El device of the present invention is characterised in that: in above-mentioned effective optical region and above-mentioned dead zone, the interval of adjacent above-mentioned organic electro luminescent layer preferably equates.
In addition, organic El device of the present invention is characterised in that: the formation of above-mentioned effective optical region and above-mentioned dead zone is identical.
In addition, preferably a kind of Organnic electroluminescent device of organic El device of the present invention with the effective optical region that comprises the organic electro luminescent layer on a plurality of electrodes and above-mentioned each electrode, it is characterized in that: in the zone that should become above-mentioned effective optical region and in the zone beyond should becoming above-mentioned effective optical region, form above-mentioned electroluminescence layer.
In addition, preferably a kind of Organnic electroluminescent device of organic El device of the present invention with the effective optical region that comprises the organic electro luminescent layer on a plurality of electrodes and above-mentioned each electrode, it is characterized in that: in should becoming the zone that does not form above-mentioned electrode of above-mentioned effective optical region, be formed with organic electroluminescent layer.
In addition, if adopt the present invention, then can provide the electronic installation that has above-mentioned organic El device.If adopt such electronic installation, then can be implemented in and reach even EL demonstration and the illumination that does not have brightness, glow color non-uniform phenomenon in the pixel between each pixel.
Description of drawings
Fig. 1 is the profile of one of the manufacture method of the expression organic El device that adopts ink-jetting style example.
Fig. 2 is the profile of one of the manufacture method of the expression organic El device that adopts ink-jetting style of the present invention example.
Fig. 3 is the process chart of manufacture method of the organic El device of explanation embodiment 1.
Fig. 4 is the process chart of manufacture method of the organic El device of explanation embodiment 2.
Fig. 5 is the process chart of manufacture method of the organic El device of explanation embodiment 3.
Fig. 6 is the process chart of manufacture method of the organic El device of explanation embodiment 4.
Fig. 7 is the process chart of manufacture method of the organic El device of explanation embodiment 5.
Fig. 8 is the process chart of manufacture method of the organic El device of explanation embodiment 6.
Fig. 9 is the process chart of manufacture method of the organic El device of explanation embodiment 7.
Figure 10 is the figure of manufacture method of the organic El device of explanation embodiment 8, (A) is the plane graph of the substrate before hole injection layer forms, and (B) is the part sectioned view along the MM ' line in (A).
Figure 11 is the process chart of manufacture method of the organic El device of explanation embodiment 8.
Figure 12 is the figure of manufacture method of the organic El device of explanation embodiment 9, is the plane graph of the substrate before hole injection layer forms.
Figure 13 is the figure of manufacture method of the organic El device of explanation embodiment 9, is the schematic diagram of the track of expression ink gun.
Figure 14 is the figure of another manufacture method of the organic El device of explanation embodiment 9.
Figure 15 is the oblique view of the electronic installation of expression embodiment 10.
Embodiment
Below, use the description of drawings embodiments of the invention.In addition, provide the example that organic El device is used as display unit.
Adopting the manufacture method of the organic El device of ink-jetting style is a kind of like this method that forms hole injection/transport layer and luminescent layer, promptly hole injection layer material that will be made of the organic substance that forms pixel from ink gun ejection and luminescent material dissolve or are dispersed in ink component the solvent, are coated in and form figure on the transparency electrode.Form figure for ink droplet that will ejection accurately is coated in the pixel region of regulation, the partition (to call embankment in the following text) that pixel region is separated is set usually.
Fig. 1 represents to adopt the profile of one of the board structure that uses in the manufacturing of organic El device of ink-jetting style example.On glass substrate 10, be formed with the circuit element portion 11 ' of thin-film transistor (TFT) 11, go up the figure that forms the transparency electrode 12 that constitutes by ITO in this circuit element portion 11 '.In addition, stacked SiO2 embankment 13 and in dividing the zone of transparency electrode 12 by having the organic substance embankment 14 that the organic substance of scolding China ink or being scolded Mo Hualiao constitutes.The shape of embankment is that the opening shape of pixel can be a shape arbitrarily such as circular, oval, square, but because ink component has surface tension, so square bight is preferably rounded.The material of organic substance embankment 14 is not particularly limited, so long as have thermal endurance, scold fluidity, anti-black solvent borne, get final product with the superior material of the tight bond of basal substrate.Organic substance embankment 14 also can form like this: do not have material, for example fluorine series plastics of scolding fluidity originally even be not, but make organic resins such as normally used acrylic resin or polyimide resin form figure, process CF4 plasma treatment etc. make the surface scold liquefaction.Embankment is not limited to above-mentioned inorganic matter and the stacked structure of organic substance, but for example is being made of ITO under the situation of transparency electrode 14, and in order to improve the tight bond with transparency electrode 14, preferably the SiO2 embankment 13.It is just enough about 1～2 micron that the height of organic substance embankment 14 reaches.
Secondly, with reference to Fig. 2, adopt one of the manufacture method example of the organic El device of ink-jetting style along the cross-section structure explanation of each operation.
In Fig. 2 (A), the solution (ink component) that adopts ink-jetting style will comprise organic EL Material is coated on the pixel substrate of embankment structure and forms figure, forms organic EL film.From ink gun 16 ejection organic EL Material ink components 15, shown in this figure (B), make it to hit, be applied as figure.Carry out vacuum and/or heat treatment after the coating or utilize nitrogen current that solvent is removed, form organic EL thin layer 17 (this figure (C)).This organic EL thin layer 17 is the stacked films that are made of hole injection layer and luminescent layer.
At this moment, owing to around the display pixel of effective optical region (with the formation zone that shows relevant pixel) end, do not apply ink droplet, so the dividing potential drop of printing ink solvent molecule is lower on the pixel of inboard, solvent is dry rapidly, for example shown in Fig. 2 (C), between display pixel, produce the difference of thickness sometimes.
Therefore, dry equably in order to make the drop that is coated on each pixel, preferably ink component is also sprayed and be coated in effective optical region around, each drop that is coated on effective optical region is caused identical environment.In order to construct comparatively identical environment, preferably make the area of application of the organic material that supplies ink-jet bigger than effective optical region, for example, be preferably in the dead zone (forming and the zone that shows the empty pixel that has nothing to do) that being provided with of effective optical region has the embankment structure identical with the display pixel shape on every side.
In addition, more evenly dry for the ink component between the pixel that makes effective optical region, the interval of each the area of application in effective optical region is equated.Therefore, preferably also equally spaced dispose pixel.Causing each pixel separation to be along directions X and Y direction under the situation of different design, also can between the pixel of interval broad, spray ink droplet, so that the interval of the area of application is equated because TFT and wiring etc. are set.Preferably the empty pixel that has formed the embankment structure identical with the pixel portions shape can be set between this pixel.Even the shape of pixel is not a point-symmetric shape circular, that square is such, can be rectangle, runway shape, ellipse yet.Be configured under the situation of different interval along directions X and Y direction in rectangle, pixel that runway shape is such, even do not have the shape identical with pixel portions, the zone wide in pixel separation also can effectively form the area of application, makes the area of application that identical distance be arranged.
In addition, the present invention can not only be used for the demonstration of organic El device, and can be applicable to light-emitting device, the lighting device that organic EL is used as light source.
Below, be described more specifically the present invention with reference to embodiment, but the invention is not restricted to these embodiment.
(embodiment 1)
The substrate that uses in the present embodiment is 2 inches a TFT substrate, and all having disposed diameter with 70.5 microns spacing along X, Y direction on it is 30 microns circular pixel.This TFT substrate is made of glass substrate 25 and the circuit element portion with TFT26 that forms on this glass substrate 26 '.The part sectioned view (directions X) of TFT substrate right-hand member one side has been shown in Fig. 3 (A).Go up the transparency electrode 27 that formation is made of ITO in circuit element portion 26 ', go up formation by SiO in circuit element portion 26 '
2The embankment of embankment 28 and polyimides embankment 29 two-layer formations is so that separate this transparency electrode 27.TEOS (tetraethyl orthosilicate) with CVD method formation 150nm carries out composition with photoetching process, forms SiO
2Embankment 28.Photosensitive polyimide is coated in above it, by exposure, development, the formation thickness is 2 microns a polyimides embankment 29 again.In addition, the material that forms this embankment also can adopt the non-photosensitive material.
In addition, in Fig. 3, the zone that forms transparency electrode 27 is effective optical region, without SiO
2The zone that embankment 28 and polyimides embankment 29 are divided transparency electrode 27 is dead zone B.
Before ink-jet coating,, scold China ink to handle to polyimides embankment 29 by atmospheric plasma treatment.The condition of atmospheric plasma treatment is under atmospheric pressure, and with the power of 300W, the distance between electrode-substrate is 1mm, carry out oxygen plasma treatment, oxygen flow is 100ml/min, and helium gas flow is 10l/min, the workbench transfer rate is 10mm/s, then carries out CF
4Plasma treatment, CF
4Gas flow is 100ml/min.Helium gas flow is 10l/min, and the workbench transfer rate is 3mm/s, carries out and so forth.
Use the Bytron (registered trade mark) of Beyer Co., Ltd's system as the hole injection layer material, modulation is dispersed in isopropyl alcohol, the N-methyl pyrrolidone, 1 as polar solvent, ink component 30 in 3-dimethyl-2-imidazolone, along X, Y direction all with 70.5 microns spacing from ink gun (Ai Pusen corporate system MJ-930C) ejection, coating.At this moment, about around the display pixel, about with each many ejection 30 multirow of identical spacing.The part sectioned view of substrate right-hand member one side behind the figure of coating hole injection layer material ink component 30 has been shown in Fig. 3 (B).In effective optical region A, hole injection layer material ink component 30 is applied on the transparency electrode 27, and on the other hand, in the B of dead zone, hole injection layer material ink component 30 is applied on the polyimides embankment 29.
Secondly, under vacuum (1torr (133.3Pa)), room temperature, 20 minutes condition, remove and desolvate, then, in nitrogen, carry out 200 ℃ (on heating plates), 10 minutes heat treatment, shown in Fig. 3 (C), form hole injection layer 31.In effective optical region A, can form the hole injection layer 31 of uniform film thickness.
Secondly, as luminescent layer, use can be sent the poly-fluorenes based material of redness, green, blue light, modulates following 3 kinds of ink components: red light emitting layer ink component 32, green light emitting layer ink component 33, blue light-emitting layer ink component 34.Use cyclohexyl benzene as black solvent.Shown in Fig. 3 (C), spray these ink components 32,33,34 from ink gun, be applied as figure with 211.5 microns spacing, spacing on the directions X with 70.5 microns on the Y direction.At this moment, in the B of dead zone with about the same spacing, about each many ejection 21 row.
Secondly, at N
2In the atmosphere, on heating plate,, form luminescent layer 35,36,37 by 80 ℃, 5 minutes heat treatment.In effective optical region A, can form the luminescent layer 35,36,37 of uniform film thickness.
After having formed luminescent layer, shown in Fig. 3 (D), the Al layer of the LiF layer of the stacked formation of employing heating in vacuum vapour deposition method 2nm, the Ca layer of 20nm and 200nm utilizes epoxy resin 39 to encapsulate as negative electrode 38 at last.
Like this, can obtain effectively do not having brightness irregularities, the even organic El device that can evenly show of irregular colour among the optical region A.
(embodiment 2)
In the present embodiment, identical with embodiment 1 as shown in Figure 4, use the TFT substrate that around effective optical region A, has disposed dead zone B.This TFT substrate is made of glass substrate 25 and the circuit element portion with TFT26 that forms on this glass substrate 25 26 '.Go up in circuit element portion 26 ' in addition and form the transparency electrode 27 that constitutes by ITO, go up formation by SiO in circuit element portion 26 ' again
2The embankment of embankment 28 and polyimides embankment 29 two-layer formations is so that separate this transparency electrode 27.Like this, can effectively form display pixel 42 among the optical region A.
In addition, in the B of dead zone, be provided with from SiO
2The SiO that embankment extends
2Film 28 ' is simultaneously at this SiO
2Film 28 ' is gone up and is formed the empty pixel 43 identical with display pixel 42 shapes, that polyimides embankment 40 formations are set with identical spacing.The part sectioned view of substrate right-hand member one side has been shown among Fig. 4 (A).
Identical with embodiment 1, the spacing that has illustrated in Fig. 4 (B) with 70.5 microns is coated in the form that has formed figure on display pixel 42 and the empty pixel 43 with hole injection layer with ink component 41.Carry out drying, heat treatment similarly to Example 1, the thickness of the hole injection layer of formed display pixel 42 is uniform.
Secondly, will be coated on display pixel 42 and the empty pixel 43 by the luminescent layer ink component that poly-fluorenes based material constitutes similarly to Example 1 and form figure, the luminescent layer thickness that forms by drying is uniform in display pixel 42.The organic El device that has carried out after negative electrode formation, the encapsulation is not have brightness irregularities, the even uniform organic El device of demonstration of irregular colour in comprising effective optical region A of display pixel 42.
(embodiment 3)
In the present embodiment, identical with embodiment 1, use the TFT substrate that around effective optical region A, has disposed dead zone B.Shown in Fig. 5 (A), this TFT substrate is made of glass substrate 25 and the circuit element portion with TFT26 that forms on this glass substrate 25 26 '.In addition, go up the transparency electrode 27 that formation is made of ITO, go up formation by SiO in circuit element portion 26 ' again in circuit element portion 26 '
2The embankment of embankment 28 and polyimides embankment 29 two-layer formations is so that separate this transparency electrode 27.Do like this, can effectively form display pixel 42 among the optical region A.
In addition, in the circuit element portion 26 ' in the B of dead zone, empty pixel 44 identical with display pixel 42 shapes, only form polyimides embankment 29 with identical spacing is set.Fig. 5 (A) is the part sectioned view of substrate right-hand member one side.
Secondly, identical with embodiment 1, by atmospheric plasma treatment, scold China ink to handle to polyimides embankment 29.
Secondly, identical with embodiment 1 shown in Fig. 5 (B), all with 70.5 microns spacing, the ink component 30 that will comprise the hole injection layer material is coated on display pixel 42 and the empty pixel 44 and forms figure on X, Y direction.In effective optical region A, hole injection layer material ink component 30 is applied on the transparency electrode 27, and on the other hand, in the B of dead zone, hole injection layer material ink component 30 is applied in the circuit element portion 26 '.
Secondly, under vacuum (1torr (133.3Pa)), room temperature, 20 minutes condition, remove and desolvate, then, in nitrogen, carry out 200 ℃ (on heating plates), 10 minutes heat treatment, form the hole injection layer 31 shown in Fig. 5 (C).In effective optical region A, can form the hole injection layer 31 of uniform film thickness.
Secondly, identical with embodiment 1, modulate following 3 kinds of ink components: red light emitting layer ink component 32, green light emitting layer ink component 33, blue light-emitting layer ink component 34.Shown in Fig. 5 (C), spray these ink components 32,33,34 from ink gun, be applied as figure with 211.5 microns spacing, spacing on the directions X with 70.5 microns on the Y direction.At this moment, be preferably among the B of dead zone with about the same spacing, about each many ejection 21 row.
Secondly, at N
2In the atmosphere, on heating plate,, form luminescent layer 35,36,37 by 80 ℃, 5 minutes heat treatment.In effective optical region A, can form the luminescent layer 35,36,37 of uniform film thickness.
After having formed luminescent layer, shown in Fig. 5 (D), adopt Al layer that the heating in vacuum vapour deposition method forms the Ca layer of LiF layer, 20nm of 2nm and 200nm stackedly, utilize epoxy resin 39 to encapsulate at last as negative electrode 38.
Do like this, can obtain is not effectively having brightness irregularities, the even organic El device that can evenly show of irregular colour among the optical region A.
(embodiment 4)
In the present embodiment, identical with embodiment 1, use the TFT substrate that around effective optical region A, has disposed dead zone B.Shown in Fig. 6 (A), this TFT substrate is made of glass substrate 25 and the circuit element portion with TFT26 that forms on this glass substrate 25 26 '.In addition, go up formation by the transparency electrode 27 that ITO constitutes, form by SiO again in circuit element portion 26 '
2The embankment of embankment 28 and polyimides embankment 29 two-layer formations is so that separate this transparency electrode 27.Do like this, can effectively form display pixel 42 among the optical region A.
In addition, on the circuit element 26 ' in the B of dead zone, be provided with identical with display pixel 42 shapes, with identical spacing by stacked SiO
2Embankment 28 and polyimides embankment 29 are provided with sky pixel 45.Fig. 6 (A) is the part sectioned view of substrate right-hand member one side.
Secondly, identical with embodiment 1, pass through atmospheric plasma treatment, scold China ink to handle to polyimides embankment 29, in addition, shown in Fig. 6 (B), the ink component 30 that will comprise the hole injection layer material is coated on display pixel 42 and the empty pixel 45 and forms figure.In effective optical region A, hole injection layer material ink component 30 is applied on the transparency electrode 27, and on the other hand, in the B of dead zone, hole injection layer material ink component 30 is applied in the circuit element portion 26 '.
Secondly, under the condition identical, the solvent of hole injection layer material ink component 30 is removed, under the condition identical, heat-treated again, form the hole injection layer 31 shown in Fig. 6 (C) with embodiment 1 with embodiment 1.In effective optical region A, can form the hole injection layer 31 of uniform film thickness.
Secondly, identical with embodiment 1, modulate following 3 kinds of ink components: red light emitting layer ink component 32, green light emitting layer ink component 33, blue light-emitting layer ink component 34.Shown in Fig. 6 (C), spray each ink component 32,33,34 from ink gun.At this moment, in the B of dead zone with about the same spacing, about be equipped with many ejection 21 row.
Secondly, at N
2In the atmosphere, on heating plate,, form luminescent layer 35,36,37 by 80 ℃, 5 minutes heat treatment.In effective optical region A, can form the luminescent layer 35,36,37 of uniform film thickness.
After having formed luminescent layer, shown in Fig. 6 (D), the Al layer of the LiF layer of the stacked formation of employing heating in vacuum vapour deposition method 2nm, the Ca layer of 20nm and 200nm utilizes epoxy resin 39 to encapsulate as negative electrode 38 at last.
Do like this, can obtain is not effectively having brightness irregularities, the even organic El device that can evenly show of irregular colour among the optical region A.
(embodiment 5)
In the present embodiment, identical with embodiment 1, use the TFT substrate that around effective optical region A, has disposed dead zone B.Shown in Fig. 7 (A), this TFT substrate is made of glass substrate 25 and the circuit element portion with TFT26 that forms on this glass substrate 25 26 '.In addition, go up the transparency electrode 27 that formation is made of ITO, go up formation by SiO in circuit element portion 26 ' again in circuit element portion 26 '
2The embankment of embankment 28 and polyimides embankment 29 two-layer formations is so that separate this transparency electrode 27.Do like this, can effectively form display pixel 42 among the optical region A.
In addition, on the circuit element 26 ' in the B of dead zone, be provided with identical with display pixel 42 shapes, with identical spacing by stacked SiO
2Embankment 28 and polyimides embankment 29 are provided with sky pixel 46.In addition, in the circuit element portion 26 ' in the B of dead zone TFT26 is not set.The part sectioned view of substrate right-hand member one side has been shown in Fig. 7 (A).
Secondly, identical with embodiment 1, pass through atmospheric plasma treatment, scold China ink to handle to polyimides embankment 29, in addition, shown in Fig. 7 (B), the ink component 30 that will comprise the hole injection layer material is coated on display pixel 42 and the empty pixel 46 and forms figure.In effective optical region A, hole injection layer material ink component 30 is applied on the transparency electrode 27, and on the other hand, in the B of dead zone, hole injection layer material ink component 30 is applied in the circuit element portion 26 '.
Secondly, under the condition identical, the solvent of hole injection layer material ink component 30 is removed, under the condition identical, heat-treated again, form the hole injection layer 31 shown in Fig. 7 (C) with embodiment 1 with embodiment 1.In effective optical region A, can form the hole injection layer 31 of uniform film thickness.
Secondly, identical with embodiment 1, the modulation red light emitting layer is with ink component 32, green light emitting layer ink component 33, blue light-emitting layer ink component 34, shown in Fig. 7 (C), spray each ink component 32,33,34 from ink gun, be applied as figure.At this moment, in the B of dead zone with about the same spacing, about each many ejection 21 row.
Secondly, at N
2In the atmosphere, on heating plate,, form luminescent layer 35,36,37 by 80 ℃, 5 minutes heat treatment.In effective optical region A, can form the luminescent layer 35,36,37 of uniform film thickness.
After having formed luminescent layer, shown in Fig. 7 (D), the Al layer of the LiF layer of the stacked formation of employing heating in vacuum vapour deposition method 2nm, the Ca layer of 20nm and 200nm utilizes epoxy resin 39 to encapsulate as negative electrode 38 at last.
Do like this, can obtain is not effectively having brightness irregularities, the even organic El device that can evenly show of irregular colour among the optical region A.
In addition, the SiO that transparency electrode 27 is set and divides this transparency electrode 27
2 Embankment 28 and polyimides embankment 29, constitute empty pixel 46, except the TFT26 this point is not set, identical with the structure of display pixel 42, can be coated in display pixel 42 on the identical condition of situation under, make hole injection layer material ink component 30 dryings that are coated on the sky pixel 46, therefore in effective optical region A, can form film thickness hole injection layer 31 uniformly, the organic El device that can evenly show of can obtain there is not brightness irregularities, irregular colour is even.
(embodiment 6)
The display pixel district on the substrate that uses in the present embodiment and the part of empty pixel region have been shown among Fig. 8 (A).Fig. 8 (A) is the plane graph of substrate, not shown here TFT element.Diameter be 60 microns circular display pixel 50 along laterally (X) with 80 microns spacing, longitudinally (Y) with 240 microns spacing arrangement.It is that 80 microns, diameter are 60 microns empty embankment pixel 51 that spacing is arranged between the display pixel of vertical row, around effective optical region, up and down, about form the identical empty pixels 52 of 30 row shapes with 80 microns identical spacings.So far, use SiO equally
2The stacked embankment of embankment 53 and polyimides embankment 54 is divided display pixel, basic cross-section structure except pixel diameter, spacing and embodiment 1 or
Embodiment 2 is identical.
The hole injection layer material ink component 55 of all inciting somebody to action similarly to Example 1 with 80 microns spacing has been shown among Fig. 8 (B) has been coated in the form that has formed figure on display pixel 50 and the empty pixel 51,52.Form hole injection layer similarly to Example 1, even in luminescent layer, also identical with embodiment 1, form figure with vertical 80 microns spacing, horizontal 240 microns 3 kinds of luminescent layer constituents of spacing coating 56,57,58 respectively, form the luminescent layer stacked film by drying.The figure coating form of luminescent layer ink component has been shown among Fig. 8 (C).The organic El device that has carried out after negative electrode formation, the encapsulation is effectively not have brightness irregularities, the even demonstration uniform organic El device of irregular colour in the optical region.
(embodiment 7)
The effective optical region on the substrate that uses in the present embodiment and the part of dead zone have been shown among Fig. 9 (A).Fig. 9 (A) is the plane graph of substrate, not shown here TFT element.Transverse width be 50 microns, vertically width be 200 microns the pixel 60 of rectangle (top, angle is circular arc) along laterally (X) with 80 microns spacing, longitudinally (Y) with 290 microns spacing arrangement.Be spaced apart 30 microns between the horizontal pixel, be spaced apart 90 microns between the pixel longitudinally.Around display pixel 60..., up and down, about form the identical empty pixels 61 of 30 row shapes with the identical spacings of 80 microns, 290 microns.So far, use SiO equally
262, the stacked embankment of polyimides 63 is divided display pixel 60, and the basic cross-section structure except pixel diameter, spacing is identical with embodiment 1 or embodiment 2.
Will the hole injection layer material ink component 64 identical be coated on whole display pixels 60 and the empty pixel 61 and form figure, in addition, shown in Fig. 9 (B), also applied constituent 64 in central authorities between the pixel longitudinally and formed figures with embodiment 1.After the drying, though the hole injection layer in the formed pixel presents uniform thickness, under the situation that the central authorities between the pixel do not apply longitudinally, at the two ends longitudinally of pixel thickness thickening terrifically.
After having formed hole injection layer, identical with embodiment 1, also on luminescent layer, form figure with vertical 240 microns spacing, horizontal 290 microns 3 kinds of luminescent layer constituents of spacing coating 65,66,67 respectively, identical with the situation of hole injection layer, shown in Fig. 9 (C), also apply luminescent layer in central authorities between the pixel longitudinally and form figures with ink component 65,66,67.Therefore, the thickness of dried luminescent layer is uniform in pixel, between the pixel.The organic El device that has carried out after negative electrode formation, the encapsulation is effectively not have brightness irregularities, the even demonstration uniform organic El device of irregular colour in the optical region.
(embodiment 8)
The plane graph of the substrate that uses in the present embodiment has been shown in Figure 10 (A).Figure 10 (B) is the part sectioned view along the MM ' line among Figure 10 (A).Shown in Figure 10 (A) and Figure 10 (B), this substrate 101 is hole injection layer and luminescent layer substrates before forming, and it is by constituting in circuit element portion 103 that forms on the glass substrate 102 and the light-emitting component portion 104 that forms in circuit element portion 103.In light-emitting component portion 104, be provided with described display pixel in back and empty pixel, in addition, light-emitting component portion 104 is divided into effective optical region A that is made of display pixel groups and the dead zone B that is made of the empty pixel groups on every side that is configured in effective optical region A.
In addition, only form TFT element 105 and transparency electrode 108 in position corresponding to effective optical region A of light-emitting component portion 104.
Secondly, SiO
2Embankment 109 and polyimides embankment 110 are laminated on effective optical region A of light-emitting component portion 104.SiO
2 Embankment 109 and polyimides embankment 110 are set between the transparency electrode 108..., and the peristome 111 that surrounds transparency electrode 108 is set thus.
In addition, in the B of the dead zone of light-emitting component portion 104, have the SiO that on second interlayer dielectric 107, forms
2Film 109 ' and at SiO
2Film 109 ' is gone up the polyimides embankment 110 ' that forms.Utilize polyimides embankment 110 ' among the B of dead zone be provided with display pixel district A in the roughly the same empty pixel 111 ' of display pixel 111 shapes.
About being arranged on the quantity of the empty pixel 111 ' among the B of dead zone, be preferably in along three groups that empty pixel constitutes that are provided with between the width X ' of the directions X shown in Figure 10 (A) more than 10 groups by RGB.In addition, be preferably in the row that constitute by a plurality of empty pixel of RGB more than 10 row along being provided with between the width Y ' of the Y direction shown in Figure 10 (A).In addition, preferably make the empty pixel of width X ' and width Y ' equal and opposite in direction ground configuration.By such processing, can make near the drying condition of the pixel the central authorities that are arranged in the drying condition of the constituent printing ink of the pixel of the boundary vicinity of dead zone B and effective optical region A more consistent.In order to make the equal and opposite in direction of width X ' and width Y ', for example on the directions X with 70.5 microns spacing, formed under the situation of each pixel (display pixel, empty pixel all are) in the spacing with 211.5 microns on the Y direction, between width X ', form 30 row (group that is made of three empty pixels of RGB is the row of totally 10 groups of sizes) abreast with the Y direction, and the row parallel with directions X can form 10 line space pixels between width Y '.Therefore, the spacing of Y direction is 3 times of spacing of directions X, so the size of width X ' and width Y ' about equally.The quantity of empty pixel is not limited thereto, if but disadvantageously the quantity of empty pixel 111 ' is too much, then increase with showing irrelevant frame, and promptly display module increases.
Identical with embodiment 1, this substrate 101 is carried out atmospheric plasma treatment, scold China ink to handle to polyimides embankment 110,110 ', spray the ink component that comprises the hole injection layer material, be coated in upward formation figure of display pixel 111 and empty pixel 111 ' from ink gun.In display pixel 111, hole injection layer material ink component is applied on the transparency electrode 108, and on the other hand, in empty pixel 111 ', hole injection layer material ink component is applied to SiO
2On the film 109 '.
In addition, when ink gun ejection comprises the ink component of hole injection layer material, preferably prepare for example to have the ink gun with the nozzle rows of the width of horizontal (directions X among the figure) same degree of display element portion 104, make this ink gun from Figure 10 (A) while downside begin on substrate 101, to move and spray along the direction of arrow Y the figure.Therefore, the ejection of ink component is the such order of dead zone B of upside among the dead zone B of downside among the figure, effective optical region A, the figure in proper order, and the ejection that can make ink component finishes at dead zone B from dead zone B.Owing to behind dead zone B ejection constituent printing ink, effectively spraying among the optical region A, can make the ink component among effective optical region A dry equably.
Secondly, under the condition identical, the solvent of hole injection layer material ink component is removed, under the condition identical, heat-treated again, form the hole injection layer 131 shown in Figure 11 (A) with embodiment 1 with embodiment 1.
The outside at effective optical region A is provided with sky pixel 111 ', even it is also the same with display pixel 111 to this sky pixel 111 ', carry out ejection, the drying of constituent China ink oil, so can make near the drying condition of the display pixel 111 the central authorities that are positioned at the drying condition of the constituent printing ink of the display pixel 111 of the boundary vicinity of empty pixel B and effective optical region A roughly consistent, so be arranged in the hole injection layer 131 that also can form uniform film thickness with the display pixel 111 of the boundary vicinity of empty pixel B.Therefore spread all over the hole injection layer 131 that all effective optical region A can form uniform film thickness.
Next, identical with embodiment 1, from red, green, the blue luminescent layer ink component of ink gun ejection, be coated in upward formation figure of display pixel 111 and empty pixel 111 ', at N
2In the atmosphere, on heating plate,, form luminescent layer 135,136,137 by 80 ℃, 5 minutes heat treatment.In effective optical region A, identical with the situation of hole injection layer 131, can form the luminescent layer 135,136,137 of uniform film thickness.
In addition, when forming luminescent layer, the same with the situation of hole injection layer, preferably make ink gun begin on substrate 101, to spray while moving along the direction of arrow Y the figure from the downside of Figure 10 (A), the ejection that makes ink component is the such order of dead zone B of upside among the dead zone B of downside among the figure, effective optical region A, the figure in proper order, therefore the ejection that makes ink component finishes at dead zone B from dead zone B.The drying that therefore, can in all effective optical region A, comprise the ink component of luminescent layer equably.
After having formed luminescent layer, shown in Figure 11 (B), the Al layer of the LiF layer of the stacked formation of employing heating in vacuum vapour deposition method 2nm, the Ca layer of 20nm and 200nm utilizes epoxy resin 139 to encapsulate as negative electrode 138 at last.
Like this, can obtain effectively do not having brightness irregularities, the even organic El device that can evenly show of irregular colour among the optical region A.
(embodiment 9)
Figure 12 illustrates the plane graph of the substrate that uses in the present embodiment.As shown in figure 12, this substrate 201 is being that main body constitutes in the not shown circuit element portion that forms on the glass substrate 202 and a plurality of light-emitting component 204... of portion of forming in this circuit element portion.On the substrate 201 in Figure 12,16 204... of light-emitting component portion are configured to the rectangular of 4 row, 4 row.In each light-emitting component portion 204, be provided with not shown display pixel and the empty pixel identical with embodiment 8, in addition, each 204... of light-emitting component portion is divided into effective optical region A that is made of display pixel groups and the dead zone B that is made of the empty pixel groups on every side that is configured in effective optical region A.
Effectively the structure of display pixel 111 that illustrates among the structure of display pixel among the optical region A and the empty pixel among the B of dead zone and the embodiment 8 and empty pixel 111 ' is identical.In addition, also the structure with the circuit element portion 103 of embodiment 8 is identical for the structure of not shown circuit element portion.
After handling like this, on substrate 201, form the effective optical region group C that constitutes by a plurality of effective optical region A....
Along the single-point chain-dotted line among the figure this substrate 201 is cut at last, be divided into 16 little substrates.Therefore, can make a plurality of organic El devices simultaneously by a plate base.
In addition, on substrate 201, around effective optical region group C, form another dead zone D.
Be arranged on the quantity of the empty pixel among the D of dead zone, be preferably in along three groups that empty pixel constitutes that are provided with between the width X ' of directions X shown in Figure 12 more than 10 groups by RGB.In addition, be preferably in the row that constitute by a plurality of empty pixel of RGB more than 10 row along being provided with between the width Y ' of Y direction shown in Figure 12.
To the processing that this substrate 201 carries out similarly to Example 8, promptly scold China ink to handle to the polyimides embankment, comprise the ink component of hole injection layer material again from the ink gun ejection, be coated on display pixel and the empty pixel and form figure.
In addition, when ink gun ejection comprises the ink component of hole injection layer material, preferably prepare for example to have the ink gun with the nozzle rows of the width of horizontal (directions X among the figure) same degree of a display element portion 204, spray while make this ink gun begin the upside that the direction of arrow Y among the 204 upper edge figure of display element portion moves among the figure from the downside of Figure 12.The width of ink gun is not limited thereto, and also can be the integral multiple of the width of a display pixel portion 204.
The track of ink gun at this moment is for example shown in Figure 13 (A), make ink gun H move among the figure upside hypsokinesis tiltedly null to downside, side shifting once more makes progress, the track of indention, perhaps shown in Figure 13 (B), also can move to the rear flank along laterally sliding (null), move to downside then, be the track of bending.
Under above-mentioned situation, the ejection of ink component order all be along: dead zone D, B, effectively optical region A, dead zone B, D, dead zone D, B, effectively optical region A ..., the order of dead zone B, D carries out, and can make the ejection of ink component begin to finish to dead zone D from dead zone D.
In addition, as described in embodiment 8, also can prepare to have and the effective ink gun of the nozzle rows of the width of horizontal (directions X among the figure) same degree of optical region group C, spray while make this ink gun begin the upside that the direction of arrow Y among the 204 upper edge figure of display element portion moves among the figure from the downside of Figure 12.The ejection of ink component at this moment is in proper order: dead zone D, B, effective optical region A, dead zone B, D can make the ejection of ink component begin to finish to dead zone D from dead zone D.
Therefore, no matter be any situation,, in whole effectively optical region A, can carry out the drying of ink component equably owing in the D of dead zone, behind the ejection ink component, effectively spraying among the optical region A.
In addition; get at ink gun under the situation of track of zigzag track or bending; owing to must in the D of dead zone, spray after the null; even so in the null process, be filled into the printing ink in the ink gun state variation situation under; again effectively spraying among the optical region A, can stably carry out the ejection among effective optical region A thus after also in the D of dead zone, spraying in advance.
Secondly, remove the solvent of hole injection layer material ink component similarly to Example 1, heat-treat, form hole injection layer 131.
Owing to be provided with the empty pixel of dead zone B in the outside of effective optical region A, be provided with the empty pixel of another dead zone D again in its outside, so can make near the drying condition of the display pixel the central authorities that are positioned at the drying condition of the constituent printing ink of the display pixel of the boundary vicinity of dead zone B and effective optical region A roughly consistent, so also can form the uniform hole injection layer of thickness at the display pixel that is arranged in the boundary vicinity of empty pixel B.Therefore, spread all over the hole injection layer that all effective optical region A can form uniform film thickness.
Particularly owing to around effective optical region group C, being provided with dead zone D, so, also can form the hole injection layer of uniform film thickness even making by a plate base under the situation of a plurality of display unit.
Secondly, the same with embodiment 1, from red, green, the blue luminescent layer ink component of ink gun ejection, be coated on effective optical region and the dead zone and form figure, by heat treatment, form the RGB luminescent layer.In effective optical region A, identical with the situation of hole injection layer, can form the luminescent layer of uniform film thickness.
In addition, when forming luminescent layer, the same with the situation of hole injection layer, shown in Figure 13 (A) or Figure 13 (B), ink gun is sprayed while moving, make the ejection order of ink component identical with the situation of hole injection layer, therefore the ejection that can make ink component finishes at dead zone D from dead zone D.Therefore, can in all effective optical region A, carry out the drying of ink component equably.
After having formed luminescent layer, the Al layer of the LiF layer of the stacked formation of employing heating in vacuum vapour deposition method 2nm, the Ca layer of 20nm and 200nm utilizes epoxy resin to encapsulate as negative electrode at last.
Like this, can obtain effectively do not having brightness irregularities, the even organic El device that can evenly show of irregular colour among the optical region A.
In addition, though used macromolecular material as organic EL layer here, also can use low molecular material.Under the situation of using low molecular material, as shown in figure 14, preferably utilize and use the vapour deposition method of mask 71 to form organic EL layer.At this moment, use the mask of opening, make material form film, can realize the present invention corresponding to the zone of effective optical region E and corresponding to the zone (corresponding to the zone of dead zone F) beyond the effective optical region E.Under the situation of using vapour deposition method,, also can all effectively form uniform organic EL layer in the optical region by the dead zone is set.
(embodiment 10)
Secondly, any one the object lesson of electronic installation that has by in the organic El device of above-mentioned first to the 9th embodiment manufacturing be described.
Figure 15 (A) is the oblique view of one of expression mobile phone example.In Figure 15 (A), symbol 600 expression mobile phone bodies, any one the display part in the above-mentioned organic El device is used in symbol 601 expressions.
Figure 15 (B) is the oblique view of one of portable information processors such as expression word processor, personal computer example.In Figure 15 (B), symbol 700 expression information processors, input parts such as symbol 701 expression keyboards, symbol 703 expression information processor bodies, any one the display part in the above-mentioned organic El device is used in symbol 702 expressions.
Figure 15 (C) is the oblique view of one of expression Wristwatch-type electronic installation example.In Figure 15 (C), symbol 800 expression wrist-watch bodies, any one the display part in the above-mentioned organic El device is used in symbol 801 expressions.
Various electronic installations shown in Figure 15 (A)～(C) are to have any one the electronic installation of display part that uses in the above-mentioned organic El device, owing to have the feature of the organic El device of making among the embodiment 1～9 of front, so use any one organic El device, can both constitute the electronic installation of effect with display quality excellence.
As mentioned above, if employing the present invention, then with ink-jetting style organic EL Material sprayed, be coated on the substrate and form in the manufacturing of organic El device of organic EL layer, around display pixel area, import empty injection, coating region, in effective optical region, by equally spaced disposing the coating drop, be coated in the drying of the organic EL Material solution of pixel region equably, can provide a kind of effectively between the optical region pixel or do not have the uniform display unit of brightness, glow color non-uniform phenomenon and the manufacture method of display unit in each pixel.
Claims (5)
1. the manufacture method of an Organnic electroluminescent device, Organnic electroluminescent device in this manufacture method forms the zone and has used the organic electroluminescence device by using substrate that comprises a plurality of effective optical region groups, above-mentioned Organnic electroluminescent device forms the zone and comprises: dispose a plurality of and the effective optical region that shows relevant display pixel and with show the 1st irrelevant dummy section, this manufacture method is characterised in that, comprises the steps:
Around above-mentioned effective optical region group, form regional mode to surround above-mentioned a plurality of Organnic electroluminescent device, form the step of the 2nd dummy section;
In above-mentioned the 1st dummy section, above-mentioned the 2nd dummy section and above-mentioned display pixel, form the step of the composition that comprises electroluminescent organic material; And
Along above-mentioned Organnic electroluminescent device form the zone around, above-mentioned Organnic electroluminescent device is formed the zone carries out step of cutting.
2. the manufacture method of Organnic electroluminescent device as claimed in claim 1 is characterized in that:
Form the step of above-mentioned composition, comprising:
The 1st applying step, use electroluminescent organic material dissolved in solvent or decompose after composition, apply the 2nd composition in the part of above-mentioned the 1st dummy section;
The 2nd applying step applies the 1st composition in above-mentioned viewing area;
The 3rd applying step applies the 2nd composition at the remainder of above-mentioned the 1st dummy section.
3. the manufacture method of Organnic electroluminescent device as claimed in claim 2 is characterized in that:
In the step that forms above-mentioned composition,
Carry out continuously to above-mentioned the 3rd applying step from above-mentioned the 1st applying step,
Before or after from above-mentioned the 1st applying step to above-mentioned the 3rd applying step, also be included in the step that above-mentioned the 2nd dummy section applies the 3rd composition.
4. the manufacture method of Organnic electroluminescent device as claimed in claim 1 or 2 is characterized in that:
Above-mentioned display pixel comprises the transparency electrode that is connected with TFT,
In above-mentioned the 1st dummy section and above-mentioned the 2nd dummy section, dispose a plurality of display pixels relevant with demonstration.
5. the manufacture method of Organnic electroluminescent device as claimed in claim 4 is characterized in that:
Each of above-mentioned display pixel is spaced by the next door, forms above-mentioned the 1st composition in the zone that is separated by above-mentioned next door,
Each of above-mentioned empty pixel is spaced by the next door, forms above-mentioned the 2nd composition or the 3rd composition in the zone that is separated by above-mentioned next door.
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| CNB2005100560305A Division CN100481570C (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device and electronic devices therewith |
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| CNB2006101001613A Expired - Lifetime CN100502030C (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device, and electronic devices therewith |
| CNA2006101001581A Pending CN1905126A (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device, and electronic devices therewith |
| CNB2006101001666A Expired - Lifetime CN100470829C (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device, and electronic devices therewith |
| CN2006101001628A Expired - Lifetime CN1921136B (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device, and manufacture method thereof |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2006101001666A Expired - Lifetime CN100470829C (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device, and electronic devices therewith |
| CN2006101001628A Expired - Lifetime CN1921136B (en) | 2000-11-27 | 2001-11-26 | Organic electroluminescent device, and manufacture method thereof |
Country Status (2)
| Country | Link |
|---|---|
| JP (5) | JP4807392B2 (en) |
| CN (4) | CN100502030C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104091901A (en) * | 2014-06-24 | 2014-10-08 | 京东方科技集团股份有限公司 | OLED preparation method |
| CN105097882A (en) * | 2015-07-29 | 2015-11-25 | 京东方科技集团股份有限公司 | Pixel defining layer, organic electroluminescent device and manufacturing method thereof, and display apparatus |
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| KR101912255B1 (en) * | 2011-04-19 | 2018-10-29 | 코닌클리케 필립스 엔.브이. | Light output panel and device having the same |
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| KR102280423B1 (en) * | 2014-09-16 | 2021-07-22 | 엘지디스플레이 주식회사 | Organic light emitting diode display device |
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| JP3401356B2 (en) * | 1995-02-21 | 2003-04-28 | パイオニア株式会社 | Organic electroluminescent display panel and method of manufacturing the same |
| JP3059678B2 (en) * | 1995-07-14 | 2000-07-04 | キヤノン株式会社 | Method and apparatus for manufacturing color filter |
| EP1365443A3 (en) * | 1996-09-19 | 2004-11-17 | Seiko Epson Corporation | Matrix type display device and manufacturing method thereof |
| JP3899566B2 (en) * | 1996-11-25 | 2007-03-28 | セイコーエプソン株式会社 | Manufacturing method of organic EL display device |
| JPH10186123A (en) * | 1996-12-26 | 1998-07-14 | Asahi Glass Co Ltd | Manufacture of color filter, and color filter |
| KR100627091B1 (en) * | 1997-08-21 | 2006-09-22 | 세이코 엡슨 가부시키가이샤 | Active matrix display |
| JP3580092B2 (en) * | 1997-08-21 | 2004-10-20 | セイコーエプソン株式会社 | Active matrix display |
| JP3775048B2 (en) * | 1998-04-14 | 2006-05-17 | 松下電器産業株式会社 | Organic light emitting device |
| JP2000100564A (en) * | 1998-09-21 | 2000-04-07 | Sony Corp | Manufacture of organic el display |
| US6384529B2 (en) * | 1998-11-18 | 2002-05-07 | Eastman Kodak Company | Full color active matrix organic electroluminescent display panel having an integrated shadow mask |
| JP3900724B2 (en) * | 1999-01-11 | 2007-04-04 | セイコーエプソン株式会社 | Organic EL element manufacturing method and organic EL display device |
| EP1083775B1 (en) * | 1999-03-29 | 2010-10-13 | Seiko Epson Corporation | Composition comprising an organic electroluminescent material |
| JP4524810B2 (en) * | 1999-04-12 | 2010-08-18 | カシオ計算機株式会社 | Organic EL device |
| JP3814469B2 (en) * | 2000-07-10 | 2006-08-30 | キヤノン株式会社 | COLOR FILTER, COLOR FILTER MANUFACTURING METHOD AND DEVICE, MANUFACTURING METHOD FOR DISPLAY DEVICE HAVING COLOR FILTER, AND METHOD FOR MANUFACTURING DEVICE HAVING DISPLAY DEVICE |
| JP2002055220A (en) * | 2000-08-10 | 2002-02-20 | Canon Inc | Panel for display device, method and device for manufacturing panel for display device, liquid crystal display device having panel for display device, method for manufacturing the liquid crystal display device, device equipped with the liquid crystal display device and method for manufacturing the device, substrate having a plurality of recesses, method and device for manufacturing the substrate, color filter, method and device for manufacturing the color filter |
| US6949883B2 (en) * | 2001-12-06 | 2005-09-27 | Seiko Epson Corporation | Electro-optical device and an electronic apparatus |
| JP4630535B2 (en) * | 2003-11-14 | 2011-02-09 | 株式会社 日立ディスプレイズ | Manufacturing method of display device |
| JP2007234678A (en) * | 2006-02-27 | 2007-09-13 | Hitachi Displays Ltd | Organic el display |
-
2001
- 2001-11-26 CN CNB2006101001613A patent/CN100502030C/en not_active Expired - Lifetime
- 2001-11-26 CN CNA2006101001581A patent/CN1905126A/en active Pending
- 2001-11-26 CN CNB2006101001666A patent/CN100470829C/en not_active Expired - Lifetime
- 2001-11-26 CN CN2006101001628A patent/CN1921136B/en not_active Expired - Lifetime
-
2008
- 2008-10-06 JP JP2008259324A patent/JP4807392B2/en not_active Expired - Lifetime
- 2008-12-25 JP JP2008329471A patent/JP5282564B2/en not_active Expired - Lifetime
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2012
- 2012-10-17 JP JP2012229601A patent/JP5429346B2/en not_active Expired - Lifetime
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2013
- 2013-10-04 JP JP2013208953A patent/JP5692328B2/en not_active Expired - Lifetime
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- 2014-07-25 JP JP2014151586A patent/JP5880638B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104091901A (en) * | 2014-06-24 | 2014-10-08 | 京东方科技集团股份有限公司 | OLED preparation method |
| CN105097882A (en) * | 2015-07-29 | 2015-11-25 | 京东方科技集团股份有限公司 | Pixel defining layer, organic electroluminescent device and manufacturing method thereof, and display apparatus |
| CN105097882B (en) * | 2015-07-29 | 2018-03-06 | 京东方科技集团股份有限公司 | Pixel defining layer, organic electroluminescence device and preparation method thereof and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5692328B2 (en) | 2015-04-01 |
| JP2009064793A (en) | 2009-03-26 |
| CN1921136A (en) | 2007-02-28 |
| JP2009026771A (en) | 2009-02-05 |
| JP5429346B2 (en) | 2014-02-26 |
| JP5880638B2 (en) | 2016-03-09 |
| JP4807392B2 (en) | 2011-11-02 |
| JP2014220255A (en) | 2014-11-20 |
| JP2014026987A (en) | 2014-02-06 |
| CN100470829C (en) | 2009-03-18 |
| JP5282564B2 (en) | 2013-09-04 |
| CN1921135A (en) | 2007-02-28 |
| CN100502030C (en) | 2009-06-17 |
| JP2013038085A (en) | 2013-02-21 |
| CN1921137A (en) | 2007-02-28 |
| CN1921136B (en) | 2012-05-09 |
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